WO1999005341A1 - Revetement de filtres - Google Patents

Revetement de filtres Download PDF

Info

Publication number
WO1999005341A1
WO1999005341A1 PCT/IE1998/000060 IE9800060W WO9905341A1 WO 1999005341 A1 WO1999005341 A1 WO 1999005341A1 IE 9800060 W IE9800060 W IE 9800060W WO 9905341 A1 WO9905341 A1 WO 9905341A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
target
approximately
coating
intermetallic
Prior art date
Application number
PCT/IE1998/000060
Other languages
English (en)
Inventor
Roger Duffield
Stuart Hampshire
Joseph Doyle
Cormac Lyons
Martin Buggy
Michael Murphy
John Monaghan
Original Assignee
Klinair Environmental Technologies (Dublin) Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from IE980288A external-priority patent/IE980288A1/xx
Application filed by Klinair Environmental Technologies (Dublin) Limited filed Critical Klinair Environmental Technologies (Dublin) Limited
Priority to AU85574/98A priority Critical patent/AU8557498A/en
Publication of WO1999005341A1 publication Critical patent/WO1999005341A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
    • C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
    • C04B41/515—Other specific metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/16—Other self-supporting filtering material ; Other filtering material of organic material, e.g. synthetic fibres
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B01D39/2027—Metallic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D39/00—Filtering material for liquid or gaseous fluids
    • B01D39/14—Other self-supporting filtering material ; Other filtering material
    • B01D39/20—Other self-supporting filtering material ; Other filtering material of inorganic material, e.g. asbestos paper, metallic filtering material of non-woven wires
    • B01D39/2068—Other inorganic materials, e.g. ceramics
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09—Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2239/00—Aspects relating to filtering material for liquid or gaseous fluids
    • B01D2239/04—Additives and treatments of the filtering material
    • B01D2239/0471—Surface coating material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/25—Metals
    • C03C2217/27—Mixtures of metals, alloys
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering

Definitions

  • the invention relates to coating a substrate with a fluid filtration material to produce a filter element whereby filtration occurs upon contact of the fluid with the filtration element
  • the invention relates particularly, but not exclusively, to production of such a filter for a liquid such as oil
  • One object of the invention is to provide a filter which has a coating of filtration material with a uniform composition on a substrate
  • Another object is to provide a filter which maintains its integrity under difficult ambient conditions in which -
  • the filter may be subjected to chemical attack
  • the filter may be subjected to mechanical abrasion caused, for example, by sand m fluid being filtered
  • a process for producing a filter element comprising the steps of sputtermg a target metallic alloy to deposit an intermetallic coatmg on a substrate
  • the target material is in the delta phase region
  • the target material is an SbSn alloy
  • an Argon atmosphere is used, preferably the Argon pressure is approximately 10 ' mB . .
  • the coating is heat treated at a temperature in the range of 350°C and 390°C to optimise the crystalline structure Preferably the temperature is approximately 370°C
  • the heat treatment is carried out in an atmosphere of 5% H2 up to 100% H2 and the balance is N2
  • the atmosphere has a composition of
  • the heat treatment duration is 20 to 40 minutes and is preferably approximately 30 m utes
  • the sputtermg negative bias voltage is in the range of -500V to -2000V Preferably the voltage is approximately -1500V
  • the target to substrate distance is approximately 3cm
  • the substrate may have a three dimensional structure It may, for example, be of carbon fibre mate ⁇ al
  • Fig 1 is a diagram illustrating a sputtering system
  • Fig 2 is a phase diagram showing the target material used
  • Figs 3 and 4 are XRD analysis plots of sputtered filter coatings
  • Fig 5 is a diagram of a porous filter cell
  • the invention provides a process for coating an intermetallic material on a substrate whereby the coatmg is conductive and continuous
  • the purpose of the process is to produce a filter which adsorbs undesirable species onto its surface when the fluid containing the adsorbate comes into contact with it
  • the substrate may be an electrical insulator or a conductor
  • the coatmg is applied by physical vapour deposition
  • the substrates which could be used include borosihcate glass, mul te, carbon fibie, alumina, glass ceramics, graphite, or vitreous carbon
  • sputtermg is used to deposit an SbSn coatmg onto a substrate
  • a sputtermg system 1 used is illustrated
  • the system 1 comprises a sealed chamber 2 having a sputtermg gas inlet 3
  • a negatively biased electrode assembly 4 is mounted within the chamber 2, and is connected to a target Sn/Sb intermetallic material 5
  • Substrates of glass material 6 are supported on a holder 7
  • the chamber 2 is flushed through with Argon This clears the Argon supply hose lmes and the chamber of atmospheric gases The chamber 2 is then evacuated to approximately 10 2 mbar to minimise any atmospheric contaminants
  • the chamber is then backfilled with Argon to a pressure of approximately 10 ' mbar
  • a negative bias voltage in the range of-500V to -2000V is applied to the electrode 4 It has been found that a value of approximately -1500V is suitable
  • the target SbSn material is an equal Sb Sn intermetallic m the delta phase region of the Sb-Sn phase diagram, shown m Fig 2 Sputtering is initiated by a small number of stray Argon ions being accelerated towards the negatively-charged target 5 with sufficient energy to force the release of both target atoms and electrons.
  • the Sb and Sn atoms emitted from the target fall to the substrates 6. which are water-cooled by coolant circulated via valves 8.
  • a magnet assembly is mounted to enhance the deposition rate by concentrating electrons in the vicinity of the target.
  • the magnet assembly is mounted to force the electrons to circulate in front of the sputter target, thereby increasing the chances of an ionising collision in the vicinity of the target. This increases the number of ions available to impact on the target, leading to improved deposition rates of SbSn material.
  • This effect could also be achieved by reducing the Argon pressure to approximately 8 x 10 2 mbar.
  • the coating thickness achieved was 20 ⁇ m.
  • Table 1 sets out the composition of coating on the glass substrate when placed near the centre of the holder 7 withm the growth chamber 2.
  • Table 2 sets out the composition for a sample placed near the edge.
  • the sputtering technique has achieved an Sb:Sn ratio close to l.T wt% for both locations.
  • an amorphous substrate material may be used.
  • X-ray diffraction (XRD) analysis was carried out to analyse the crystalline structure of the sputtered coating.
  • the XRD could not be carried out on the coating while on the substrate because the XRD technique is complicated by thin film samples. Therefore, some coatings were removed from the substrate and ground to form a powder. This powder was then analysed by XRD. In the as-sputtered state the coating material was at least partially in the synthetic form of the stistaite SbSn intermetallic, as shown in Fig. 3.
  • the coatmg was then heat treated to reproduce the same form of the intermetallic as in an atomised powder and to ensure 100% crystallisation of the coating i.e. crystallise any residual amorphous material in the coating.
  • Heat treatments were carried out at temperatures between 350°C and 390°C for durations of 30 minutes, 1 hour, 2 hours, and 5 hours. Atmospheres of nitrogen/hydrogen mixtures were used. The reason for this is that the gas atmosphere removes any oxygen present in the furnace chamber and therefore prevents oxidation of the coating during the heat treatment. Initially a mixture of 5%H 2 /95%N 2 was used but some oxidation was experienced. In order to inhibit any occurrence of oxidation, the H 2 content was increased to 15%. It was found that the optimum heat treatment duration was 30 minutes.
  • the coating method employed achieves a true intermetallic crystalline structure in the delta phase. Also, there is excellent adherence to the substrate. Other advantages include the fact that the correct stistaite structure was achieved, and there was no measurable contamination.
  • the coating provides long range electrical conductivity. Also, because the coating is thin, large substrate surface areas may be coated using a relatively small quantity of target material.
  • the substrate may alternatively have a three-dimensional porous structure. Examples include a reticulated vitreous carbon material, and a ceramic foam material. These structures provide a high degree of porosity and surface area.
  • the substrate may alternatively be a carbon fibre material.
  • a filter may take the form of a cell 40 as illustrated in Fig. 5.
  • the cell 40 comprises the following:
  • the layer B acts as a cathodic electrode, and the layer D as an anodic electrode.
  • the available surface area may be increased by rolling and the shape may be set according to the particular conduit.
  • the invention provides for coating of filter substrates in a manner which is both uniform and provides additional resistance for the substrate.
  • the substrate may be of a metallic polymeric, or a ceramic nature.
  • an insulating buffer layer may be used. Aluminium may be used, for example.
  • any suitably reinforced polymer may be used provided the thermal chemical and mechanical conditions can be withstood.
  • a polyimide may be used. These conditions will be different in different situations and a substrate with optimum characteristics for the particular conditions will be chosen. It is envisaged, for example, that a ceramic substrate may be used for high temperature applications.
  • the substrate may be pre-heated. This may include a heating stage inside the sputtering chamber which would be used to heat the substrate durmg the deposition of the coatmg.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Structural Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Selon l'invention, on revêt des substrats (6) réalisés dans une matière comme de la céramique, à l'aide d'un matériau intermétallique. On obtient une structure cristalline intermétallique en pulvérisant une matière cible (5) à base de métaux intermétalliques Sb et Sn, en phase delta, et en utilisant une atmosphère d'argon à une pression de l'ordre de 10-1 millibars. Le potentiel de polarisation est de -1500 V et la distance matière cible/substrat, de l'ordre de 3 centimètres. On obtient ainsi une forme minérale de stistaïte intermétallique.
PCT/IE1998/000060 1997-07-21 1998-07-20 Revetement de filtres WO1999005341A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU85574/98A AU8557498A (en) 1997-07-21 1998-07-20 Coating of filters

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
IE970529 1997-07-21
IE970529 1997-07-21
IE980288A IE980288A1 (en) 1998-04-16 1998-04-16 A filter and method of producing same
IE980288 1998-04-16

Publications (1)

Publication Number Publication Date
WO1999005341A1 true WO1999005341A1 (fr) 1999-02-04

Family

ID=26320078

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IE1998/000060 WO1999005341A1 (fr) 1997-07-21 1998-07-20 Revetement de filtres

Country Status (2)

Country Link
AU (1) AU8557498A (fr)
WO (1) WO1999005341A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4202075A1 (fr) * 2021-12-21 2023-06-28 Omega SA Procédé de dépôt d'un revêtement sur un substrat

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4882232A (en) * 1984-01-25 1989-11-21 Sorapec Societe De Researche Et D'applications Electrtochimiques Porous metal structure and method of manufacturing of said structure
US5248079A (en) * 1988-11-29 1993-09-28 Li Chou H Ceramic bonding method
US5312664A (en) * 1992-05-21 1994-05-17 Eastman Kodak Company Optical recording media
WO1997027395A1 (fr) * 1996-01-22 1997-07-31 Klinair Environmental Technologies (Ireland) Limited Filtre a carburant et son procede de production

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4882232A (en) * 1984-01-25 1989-11-21 Sorapec Societe De Researche Et D'applications Electrtochimiques Porous metal structure and method of manufacturing of said structure
US5248079A (en) * 1988-11-29 1993-09-28 Li Chou H Ceramic bonding method
US5312664A (en) * 1992-05-21 1994-05-17 Eastman Kodak Company Optical recording media
WO1997027395A1 (fr) * 1996-01-22 1997-07-31 Klinair Environmental Technologies (Ireland) Limited Filtre a carburant et son procede de production

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4202075A1 (fr) * 2021-12-21 2023-06-28 Omega SA Procédé de dépôt d'un revêtement sur un substrat

Also Published As

Publication number Publication date
AU8557498A (en) 1999-02-16

Similar Documents

Publication Publication Date Title
CN101743338B (zh) 真空处理设备和真空处理方法
JP3027502B2 (ja) 耐摩耗性非晶質硬質膜及びその製造方法
TWI278523B (en) Method for manufacturing porous getter devices with reduced particle loss and devices so manufactured
JP2892231B2 (ja) Ｔｉ−Ｓｉ−Ｎ系複合硬質膜及びその製造方法
KR100336621B1 (ko) 고분자 기판 위의 인듐산화물 또는 인듐주석산화물 박막증착 방법
US5407548A (en) Method for coating a substrate of low resistance to corrosion
US5238741A (en) Silicon carbide filaments bearing a carbon layer and a titanium carbide or titanium boride layer
WO1999005341A1 (fr) Revetement de filtres
CN115029669B (zh) 一种采用液态金属高功率脉冲磁控溅射提高沉积效率的方法
CN108796493B (zh) 一种轻金属表面冷喷涂涂层的封孔改性方法
JP3281173B2 (ja) 高硬度薄膜及びその製造方法
US5637199A (en) Sputtering shields and method of manufacture
JPH0598423A (ja) チタンの酸化防止用のクロム被膜
IE980592A1 (en) Coating of filters
EP0423996B1 (fr) Filaments revêtus pour matériaux composites
Habib et al. Physical parameters affecting deposition rates of binary alloys in a magnetron sputtering system
Chin et al. Preparation of Si3N4 coatings by ion plating
JPS588640B2 (ja) スピ−カ−シンドウバンノセイゾウホウ
Dugdale DC glow discharge techniques for surface treatment and coating
JPH1112731A (ja) 高純度薄膜の形成方法
JP2854130B2 (ja) スパッタリングにより基板を被覆するための装置
RU2773044C1 (ru) Устройство магнетронного распыления
JPH0735564B2 (ja) 耐食性と密着性とに優れた金属表面薄膜の形成方法
JP4421180B2 (ja) 表面処理方法及び真空容器類
Grill Ion beam reactively sputtered silicon nitride coatings

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GE GH GM HR HU ID IL IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT UA UG US UZ VN YU ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW SD SZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
NENP Non-entry into the national phase

Ref country code: KR

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

122 Ep: pct application non-entry in european phase
NENP Non-entry into the national phase

Ref country code: CA