WO1998043269A1 - Procede de production de grilles-ecrans plates comprenant des materiaux getter non evaporables et grilles obtenues selon ce procede - Google Patents

Procede de production de grilles-ecrans plates comprenant des materiaux getter non evaporables et grilles obtenues selon ce procede Download PDF

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Publication number
WO1998043269A1
WO1998043269A1 PCT/IT1998/000066 IT9800066W WO9843269A1 WO 1998043269 A1 WO1998043269 A1 WO 1998043269A1 IT 9800066 W IT9800066 W IT 9800066W WO 9843269 A1 WO9843269 A1 WO 9843269A1
Authority
WO
WIPO (PCT)
Prior art keywords
process according
coated
neg
metal sheet
grids
Prior art date
Application number
PCT/IT1998/000066
Other languages
English (en)
Inventor
Alessio Corazza
Original Assignee
Saes Getters S.P.A.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saes Getters S.P.A. filed Critical Saes Getters S.P.A.
Priority to JP10545386A priority Critical patent/JP2000516389A/ja
Priority to EP98912701A priority patent/EP0907959A1/fr
Publication of WO1998043269A1 publication Critical patent/WO1998043269A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/148—Manufacture of electrodes or electrode systems of non-emitting electrodes of electron emission flat panels, e.g. gate electrodes, focusing electrodes or anode electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/94—Selection of substances for gas fillings; Means for obtaining or maintaining the desired pressure within the tube, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00—Electron emission display panels, e.g. field emission display panels

Definitions

  • the present invention relates to a process for the production of flat-screen grids coated with non-evaporable getter materials and to the grids thereby obtained.
  • a FED is obtained by welding two flat glass members along their perimeter. The welding is carried out by melting a low-melting glass paste with an operation called "frit-sealing". The resulting structure is formed of two mutually parallel surfaces at a distance ranging from a few tenths of millimeter to 2-3 millimeters.
  • molybdenum is provided on the inner surface, except for the edges, of the rear part; as well as a plurality of grid electrodes, placed in close proximity to the microcathodes, so that, by applying a small potential difference, a high electric field is obtained, capable of extracting electrons from the microcathodes.
  • the electronic current is accelerated towards the phosphors, placed on the inner surface, except for the edges, of the front part.
  • the zone wherein there are the phosphors, corresponding and opposite to the zone wherein there are the microcathodes, is the image formation zone.
  • the screen image is formed by selectively exciting only some phosphors.
  • the selective excitation of phosphors is obtained simply by selectively activating groups of microcathodes, since at these distances the electronic beam is sufficiently collimated.
  • one or more electric grids are necessary to exactly directing the electronic beam. These grids are generally formed of metal sheets of thickness ranging from 20 to 200 ⁇ m and of the same surface area as the screen, having a plurality of pinholes of size ranging from about 30 to 200 ⁇ m and spaced about 30-300 ⁇ m apart.
  • the FED internal space must be kept evacuated, at residual pressures not higher than 10 "3 mbar for hydrogen, and not higher than 10 "4 , preferably lower than 10 " mbar for other gases.
  • Gases of various types may be emitted by the same FED composing materials during its working.
  • non-evaporable getter materials also known as NEG, may be used, being capable of fixing gases such as O 2 , H 2 O, CO, CO 2 and N 2 .
  • the NEG devices are disposed inside the FEDs in form of little pills or thin layers on the edges of the zone wherein there are the cathodes.
  • Fig. 1 there is shown a possible grid coated with getter material, obtained according to the invention
  • a FED comprising a possible grid obtained with the process according to the invention.
  • the used sheet metal must show the usual features required for producing television-screens grids, namely must be easily formable and have a reduced vacuum gas-emission. Furthermore, it must have good adhesion properties for getter material powders.
  • the preferred materials for this purpose are nickel and its alloys, as nickel-chromium alloys, or the alloy named INVAR, formed of about 64% ⁇ by weight of iron and 36% by weight of nickel.
  • the sheet thickness generally ranges from about 20 to 100 ⁇ m.
  • the metal sheet must have at least the same surface area as the image formation zone.
  • the sheet surface is slightly larger than the surface of the image formation zone, such as to provide an outer edge not having holes made thereon, as hereinafter described.
  • This edge may be useful for fixing the sheet inside the FEDs, and may be coated with the NEG material deposit, thereby providing an additional amount of this material. Alternatively, the edge may be kept free from the NEG material deposit, thereby favoring the operations for fixing the grid to the FED structure.
  • intermediate solutions are possible, wherein the edge is only partly coated with the NEG material deposit, e.g. by coating two opposite side edges and keeping free the other two opposite side edges, thereby making a compromise between the above-mentioned advantages.
  • the metal sheet may be coated with getter material on one or both its sides.
  • all the various available techniques for producing supported thin layers of powders may be in principle used, such as the cold rolling, the spray techniques or the serigraphic technique.
  • the coating of metal supports with NEG materials by cold rolling is well known in the metallurgical field, while the spray coating is disclosed e.g. in patent application WO 95/23425 in the applicant's name. It is preferred to use the serigraphic technique, allowing to obtain the greatest uniformity of the getter material layer when operating on large surfaces.
  • a suspension of the material powders is prepared in a water-, alcohol- or hydroalcohol- suspending medium, wherein there are also amounts of high-boiling organic compounds, serving as viscosity adjusters, smaller than 1% of the total weight of the suspension.
  • the suspension thereby obtained is then spread onto a net screen made of plastic material, with ports of size ranging from 10 to 200 ⁇ m; the net screen is stretched on a rigid frame and kept at a distance from the substrate ranging from 0,5 to 2 mm.
  • the thickness of the NEG material layer after sinterization ranges preferably from 20 and 100 ⁇ m. Deposits of too little thickness make little getter material available. On the other hand, too much thick deposits make the coated sheet hard to be properly cut, for obtaining the grid holes. For the sake of grid mechanical stability, the deposit is preferably not thicker than the sheet. Furthermore, if the deposit is produced by spray or serigraphic technique and the sheet is coated on both its sides, the two deposits on the opposite sides have preferably the same or at least a similar thickness, in order to prevent sheet distortions in the subsequent deposit sinterization step.
  • the NEG material used for the sheet coating may be any of the known NEG materials, such as e.g. zirconium, titanium, niobium, hafnium, tantalum, tungsten metals, mixtures and alloys thereof comprising these or other metals, generally selected among those belonging to the first transition series and aluminium.
  • getter alloys disclosed in patents US 3,203,901, US 4,071,335, US 4,306,887, US 4,312,669, US 4,839,085, US 5,180,568; or zirconium-cobalt alloys containing about 75-90% by weight of zirconium, or alloys therefrom obtained by adding rare earths up to 10% of the total alloy weight; or further titanium-vanadium and titanium-chromium alloys containing about 70-80% by weight of titanium. It is particularly preferred the use of the alloy containing 70% by weight of zirconium, 24,6% by weight of vanadium and 5,4% by weight of iron, produced and sold by the applicant under the tradename of St 707.
  • the last process step consists of selectively removing parts of the NEG material-coated metal sheet, by making thereon the holes for the electron beams passage.
  • the holes are generally square-, rhombohedrical-, round- or elliptical- shaped, have size ranging from about 50 to 200 ⁇ m, and are spaced apart by metal members having width ranging from 50 to 300 ⁇ m. Since for a good image quality the holes must be as even as possible and have sharp and regular edges, it is preferable, in order to make these holes, to use the chemical-etching, which allows to have a cutting accuracy of about 10 ⁇ m.
  • the chemical-etching is the preferred technique in case of sheets coated with NEG material on a single side: in this case, the operations related to the chemical-etching technique are performed on the opposite side with respect to the side having the NEG material thereon.
  • the laser-cutting technique may be employed, being the preferred technique in case of sheets coated with NEG material on both their sides.
  • a cutting width of about 30 ⁇ m and a suitable accuracy for the production of FED grids are obtained.
  • the laser-cutting causes the sheet to locally melt; this avoids the presence of cutting burrs caused by mechanical cutting; further, this local melting cooperates to fix to the cutting edge the NEG material particles, which otherwise could be detached to generate metal powders inside the FED. Both the presence of burrs at the cutting edge and of loose powders may generate spurious electric fields, thus modifying the electron beam emission or transmission and adversely affecting the image formation.
  • the metal members spacing the grid holes apart are about 50-300 ⁇ m wide, it is preferable, in order to have at the end of the process a regular coating thereof, to use NEG materials powders having fine particle size, preferably smaller than about 50 ⁇ m for the grids with lower definition (holes size and metal members therebetween). As the grid definition increases, the maximum powders particle size which can be used decreases, and for the finer grids it is preferable to use powders having size smaller than about 20 ⁇ m.
  • the invention relates to the grids obtained with the above-mentioned process.
  • Grid 10 is formed of a metal sheet 11 coated on both its sides (12, 12') with NEG material deposits (13, 13'). On the sheet there is a plurality of holes 14, 14', .., spaced apart by metal members 15, 15', ..., having the NEG material thereon.
  • the NEG material is shown to coat only a portion of the two sides of sheet 11, but it is intended to coat the entire sheet.
  • the drawing represents a portion of the metal sheet without NEG material and with holes 14, 14', these holes are obtained, according to the process of the invention, only when the continuous sheet has been wholly coated with NEG material.
  • the exemplified grid has square-section holes for the electron flow passage, and is coated with a NEG material deposit on both its sides, but all the combinations of possible hole geometries and coating are allowed according to the invention.
  • Figure 2 a portion of a possible alternative grid according to the invention, wherein the edge is free from the NEG material coating, is shown in a plan view.
  • Grid 20 is formed of a sheet 21, having an outer edge 22 free from NEG material deposits, and middle zone 23 (enclosed by the hatched lines in the drawing) coated with NEG material deposit 24; also in this case, like in Figure 1 , deposit 24 is only partly represented.
  • zone 23 holes 25, 25' are made for the electron passage.
  • round holes disposed in a square screen pattern are exemplified, but all the combinations of possible hole shape and screen pattern are allowed, such as e.g. an hexagonal screen pattern of round holes.
  • FIG 3 the exploded view of a part of a FED comprising a grid of the invention is diagrammatically shown, having its edge free from NEG material as represented in Figure 2.
  • the FED is formed of a front glass portion 31 and a rear portion 32; grid 20 is placed between these two portions; on inner surface 33 of portion 32 there are the microcathodes (not shown in the drawing) disposed in zone 34; on inner surface 35 of portion 31, in correspondence with zone 34, there are the phosphors disposed in zone 36, being also the image formation zone; grid 20 is disposed such that zone 23 (wherein there are the holes and the NEG material deposit) is essentially equivalent to the projection of the image formation zone on the grid itself, with edge 22 outside of such projection zone.
  • the grids coated with getter materials of the invention perform the double task of directing the electron beam and of uniformly spreading the getter material inside the screen, thereby eliminating the mentioned problems of the prior art.
  • These grids could not be obtained e.g. by coating with getter materials pre- perforated metal sheets; in fact, when trying to sinterize NEG materials deposits on substrates with many close holes such as those required for FED grids, the substrate itself undergoes heavy distortions, likely due to the interactions occurring at high temperature between metal and getter material.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

La présente invention concerne un procédé de production de grilles-écrans plates revêtues de matériaux getter non évaporables, selon lequel une feuille de métal de même épaisseur que la grille résultante et de même aire superficielle que la zone de formation d'image est revêtue sur au moins un côté d'au moins un matériau getter non évaporable et selon lequel on enlève ensuite de manière sélective des parties de la feuille revêtue. L'invention se rapporte également à certains modes de réalisation de grilles produites selon ce procédé.
PCT/IT1998/000066 1997-03-25 1998-03-23 Procede de production de grilles-ecrans plates comprenant des materiaux getter non evaporables et grilles obtenues selon ce procede WO1998043269A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10545386A JP2000516389A (ja) 1997-03-25 1998-03-23 非蒸発型ゲッタ材料で被覆されたフラットスクリーン型グリッドの製造方法及びそれにより得られたグリッド
EP98912701A EP0907959A1 (fr) 1997-03-25 1998-03-23 Procede de production de grilles-ecrans plates comprenant des materiaux getter non evaporables et grilles obtenues selon ce procede

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITMI97A000701 1997-03-25
IT97MI000701A IT1290471B1 (it) 1997-03-25 1997-03-25 Processo per la produzione di griglie per schermi piatti ricoperte con materiali getter non evaporabili e griglie cosi' ottenute

Publications (1)

Publication Number Publication Date
WO1998043269A1 true WO1998043269A1 (fr) 1998-10-01

Family

ID=11376625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IT1998/000066 WO1998043269A1 (fr) 1997-03-25 1998-03-23 Procede de production de grilles-ecrans plates comprenant des materiaux getter non evaporables et grilles obtenues selon ce procede

Country Status (8)

Country Link
EP (1) EP0907959A1 (fr)
JP (1) JP2000516389A (fr)
KR (1) KR100371992B1 (fr)
CN (1) CN1220766A (fr)
IT (1) IT1290471B1 (fr)
RU (1) RU2199790C2 (fr)
TW (1) TW382734B (fr)
WO (1) WO1998043269A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1100107A2 (fr) * 1999-11-12 2001-05-16 Sony Corporation Getter, affichage à panneau plat et méthode pour sa fabrication
WO2002089174A2 (fr) * 2001-05-01 2002-11-07 Koninklijke Philips Electronics N.V. Lampe a decharge
EP1267379A1 (fr) * 2001-06-13 2002-12-18 Lg Electronics Inc. Composition de getter et dispositif d'affichage à émetteur de champ à cathode froide utilisant la même composition
CN103531414A (zh) * 2013-10-14 2014-01-22 南京三乐电子信息产业集团有限公司 一种栅控行波管栅网的皮秒脉冲激光切割制备方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115074669A (zh) * 2022-06-10 2022-09-20 南京华东电子真空材料有限公司 一种低温激活的大容量吸气薄膜

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB995821A (en) * 1963-01-23 1965-06-23 Philips Electronic Associated Improvements in and relating to electronic tubes
GB1139195A (en) * 1965-02-17 1969-01-08 Getters Spa Improvements in or relating to composite metallic bodies
EP0392615A1 (fr) * 1989-04-13 1990-10-17 Koninklijke Philips Electronics N.V. Tube image couleur et dispositif de reproduction d'image comportant un tel tube image couleur
EP0455162A2 (fr) * 1990-04-28 1991-11-06 Sony Corporation Dispositif de visualisation plat
WO1995023425A1 (fr) * 1994-02-28 1995-08-31 Saes Getters S.P.A. Ecran plat a emission de champ renfermant un degazeur, et son procede de fabrication

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB995821A (en) * 1963-01-23 1965-06-23 Philips Electronic Associated Improvements in and relating to electronic tubes
GB1139195A (en) * 1965-02-17 1969-01-08 Getters Spa Improvements in or relating to composite metallic bodies
EP0392615A1 (fr) * 1989-04-13 1990-10-17 Koninklijke Philips Electronics N.V. Tube image couleur et dispositif de reproduction d'image comportant un tel tube image couleur
EP0455162A2 (fr) * 1990-04-28 1991-11-06 Sony Corporation Dispositif de visualisation plat
WO1995023425A1 (fr) * 1994-02-28 1995-08-31 Saes Getters S.P.A. Ecran plat a emission de champ renfermant un degazeur, et son procede de fabrication

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1100107A2 (fr) * 1999-11-12 2001-05-16 Sony Corporation Getter, affichage à panneau plat et méthode pour sa fabrication
EP1100107A3 (fr) * 1999-11-12 2004-06-02 Sony Corporation Getter, affichage à panneau plat et méthode pour sa fabrication
WO2002089174A2 (fr) * 2001-05-01 2002-11-07 Koninklijke Philips Electronics N.V. Lampe a decharge
WO2002089174A3 (fr) * 2001-05-01 2003-02-27 Koninkl Philips Electronics Nv Lampe a decharge
US6800998B2 (en) 2001-05-01 2004-10-05 Koninklijke Philips Electronics N.V. Discharge lamp provided with a getter
US6943497B2 (en) 2001-05-01 2005-09-13 Koninklijke Philips Electronics N.V. Discharge lamp provided with a getter
EP1267379A1 (fr) * 2001-06-13 2002-12-18 Lg Electronics Inc. Composition de getter et dispositif d'affichage à émetteur de champ à cathode froide utilisant la même composition
US6753647B2 (en) 2001-06-13 2004-06-22 Lg Electronics Inc. Composition of getter and field emission display using the same
CN103531414A (zh) * 2013-10-14 2014-01-22 南京三乐电子信息产业集团有限公司 一种栅控行波管栅网的皮秒脉冲激光切割制备方法
CN103531414B (zh) * 2013-10-14 2016-03-02 南京三乐电子信息产业集团有限公司 一种栅控行波管栅网的皮秒脉冲激光切割制备方法

Also Published As

Publication number Publication date
CN1220766A (zh) 1999-06-23
JP2000516389A (ja) 2000-12-05
KR100371992B1 (ko) 2003-05-12
IT1290471B1 (it) 1998-12-04
TW382734B (en) 2000-02-21
EP0907959A1 (fr) 1999-04-14
ITMI970701A1 (it) 1998-09-25
KR20000015982A (ko) 2000-03-25
RU2199790C2 (ru) 2003-02-27

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