WO1997034030A1 - Solution for galvanic polishing of metal jewelry - Google Patents
Solution for galvanic polishing of metal jewelry Download PDFInfo
- Publication number
- WO1997034030A1 WO1997034030A1 PCT/IT1997/000055 IT9700055W WO9734030A1 WO 1997034030 A1 WO1997034030 A1 WO 1997034030A1 IT 9700055 W IT9700055 W IT 9700055W WO 9734030 A1 WO9734030 A1 WO 9734030A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- polishing
- solution
- cysteine
- thiourea
- solution according
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 5
- 239000002184 metal Substances 0.000 title claims abstract description 5
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 14
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 7
- 235000018417 cysteine Nutrition 0.000 claims abstract description 7
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000007864 aqueous solution Substances 0.000 claims abstract description 5
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 5
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 3
- 239000001257 hydrogen Substances 0.000 claims abstract description 3
- 239000000243 solution Substances 0.000 claims description 12
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 claims description 5
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 4
- ZQLBQWDYEGOYSW-UHFFFAOYSA-L copper;disulfamate Chemical group [Cu+2].NS([O-])(=O)=O.NS([O-])(=O)=O ZQLBQWDYEGOYSW-UHFFFAOYSA-L 0.000 claims description 4
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 claims description 3
- 239000004471 Glycine Substances 0.000 claims description 2
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 claims description 2
- FFEARJCKVFRZRR-BYPYZUCNSA-N L-methionine Chemical compound CSCC[C@H](N)C(O)=O FFEARJCKVFRZRR-BYPYZUCNSA-N 0.000 claims description 2
- 235000004279 alanine Nutrition 0.000 claims description 2
- 229930182817 methionine Natural products 0.000 claims description 2
- 235000006109 methionine Nutrition 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 abstract description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010437 gem Substances 0.000 description 5
- 229910001751 gemstone Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- JMANVNJQNLATNU-UHFFFAOYSA-N oxalonitrile Chemical compound N#CC#N JMANVNJQNLATNU-UHFFFAOYSA-N 0.000 description 2
- 229910001112 rose gold Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000008135 aqueous vehicle Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
Definitions
- the present invention relates to solutions used to polish jewelry and in particular an aqueous solution for the electrolytic polishing of articles made of precious metals.
- the polishing of metal articles is usually carried out according to various methods, such as mechanical polishing by means of abrasive implements such as grinding wheels, brushes, etc., treatment by means of suitable solvent liquids, electrolytic finishing through the action of electric current on the articles used as electrodes immersed in suitable solutions.
- the polishing usually carried out in goldsmith's workshops is an electrolytic polishing of jewels immersed in a solution containing essentially cyanide ions deriving from compounds such as cyanides and ferrocyanides of alkali metals, by the use of suitable equipment.
- the present invention aims therefore at providing a novel solution for polishing jewels, which is free of the above named drawbacks.
- the solution according to the present invention is basically formed by one or more organic compounds containing ionizable hydrogen and comprised in the group formed by thiourea, cysteine, methionine, alanine, glycine and their derivatives, mixed with sulfamic acid and a sulfamate dissolved in water;
- the polishing process carried out by such a solution is an anodic process wherein the jewel is used as the anode, and the polishing effect is obtained by removing little amounts of metal from the surface of the treated article.
- a particularly preferred solution comprises thiourea or cysteine, copper sulfamate and sulfamic acid dissolved in water or other aqueous vehicle in variable proportions according to the operating conditions, such as voltage, intensity, kind of electric current (direct, pulsating, etc.), bath temperature, treatment time, and so on.
- the operating conditions such as voltage, intensity, kind of electric current (direct, pulsating, etc.), bath temperature, treatment time, and so on.
- a red gold jewel connected to the anode of a direct current source so as to have a current density of 1 A/cm 2 is immersed in an aqueous solution containing 80 g/L of cysteine, 100 g/L of sulfamic acid and 100 g/L of copper sulfamate, with pH about 2, and is treated under voltage at a temperature of 80°C up to the attainment of the desired brilliance.
- a red gold jewel connected to the anode of a direct current source is immersed in an aqueous solution containing 50 g/L of thiourea, 60 g/L of sulfamic acid and 5 g/L of copper sulfamate, with pH about 1 , and is treated under a variable voltage of 16 V to 28 V according to its weighing into carats at a temperature of 80 °C up to the attainment of the desired brilliance.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Adornments (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AU19389/97A AU1938997A (en) | 1996-03-14 | 1997-03-11 | Solution for galvanic polishing of metal jewelry |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ITMI96A000494 | 1996-03-14 | ||
| IT96MI000494A IT1283246B1 (it) | 1996-03-14 | 1996-03-14 | Soluzione perfezionata per la brillantatura di gioielli in metallo |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1997034030A1 true WO1997034030A1 (en) | 1997-09-18 |
Family
ID=11373618
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/IT1997/000055 WO1997034030A1 (en) | 1996-03-14 | 1997-03-11 | Solution for galvanic polishing of metal jewelry |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU1938997A (cs) |
| IT (1) | IT1283246B1 (cs) |
| WO (1) | WO1997034030A1 (cs) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6592742B2 (en) * | 2001-07-13 | 2003-07-15 | Applied Materials Inc. | Electrochemically assisted chemical polish |
| US6653242B1 (en) | 2000-06-30 | 2003-11-25 | Applied Materials, Inc. | Solution to metal re-deposition during substrate planarization |
| WO2012172572A3 (en) * | 2011-06-15 | 2013-03-14 | Titan Industries Ltd | Non-cyanide based electro chemical polishing |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU652201A1 (ru) * | 1977-11-01 | 1979-03-15 | Всесоюзный Научно-Исследовательский Проектно-Конструкторский Институт Ювелирной Промышленности | Раствор дл электрохимического полировани изделий из сплавов золота |
| JPS5477239A (en) * | 1977-12-01 | 1979-06-20 | Kouei Kasei Kk | Electropolishing solution for gold* silver or alloys thereof |
| US4663005A (en) * | 1985-11-15 | 1987-05-05 | Edson Gwynne I | Electropolishing process |
| JPS62247100A (ja) * | 1986-04-19 | 1987-10-28 | Ijima Keijirou | 電解研磨液 |
-
1996
- 1996-03-14 IT IT96MI000494A patent/IT1283246B1/it active IP Right Grant
-
1997
- 1997-03-11 AU AU19389/97A patent/AU1938997A/en not_active Abandoned
- 1997-03-11 WO PCT/IT1997/000055 patent/WO1997034030A1/en active Application Filing
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU652201A1 (ru) * | 1977-11-01 | 1979-03-15 | Всесоюзный Научно-Исследовательский Проектно-Конструкторский Институт Ювелирной Промышленности | Раствор дл электрохимического полировани изделий из сплавов золота |
| JPS5477239A (en) * | 1977-12-01 | 1979-06-20 | Kouei Kasei Kk | Electropolishing solution for gold* silver or alloys thereof |
| US4663005A (en) * | 1985-11-15 | 1987-05-05 | Edson Gwynne I | Electropolishing process |
| JPS62247100A (ja) * | 1986-04-19 | 1987-10-28 | Ijima Keijirou | 電解研磨液 |
Non-Patent Citations (3)
| Title |
|---|
| DATABASE WPI Section Ch Week 7931, Derwent World Patents Index; Class E16, AN 79-56866B, XP002032163 * |
| DATABASE WPI Section Ch Week 7949, Derwent World Patents Index; Class M11, AN 79-88838B, XP002032164 * |
| PATENT ABSTRACTS OF JAPAN vol. 012, no. 128 (C - 489) 20 April 1988 (1988-04-20) * |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6653242B1 (en) | 2000-06-30 | 2003-11-25 | Applied Materials, Inc. | Solution to metal re-deposition during substrate planarization |
| US6592742B2 (en) * | 2001-07-13 | 2003-07-15 | Applied Materials Inc. | Electrochemically assisted chemical polish |
| WO2012172572A3 (en) * | 2011-06-15 | 2013-03-14 | Titan Industries Ltd | Non-cyanide based electro chemical polishing |
| CN103946429A (zh) * | 2011-06-15 | 2014-07-23 | 泰坦股份有限公司 | 非氰化物为基础的电化学抛光 |
| JP2014519559A (ja) * | 2011-06-15 | 2014-08-14 | タイタン インダストリーズ リミテッド | 非シアン化物ベースの電解研磨 |
Also Published As
| Publication number | Publication date |
|---|---|
| AU1938997A (en) | 1997-10-01 |
| IT1283246B1 (it) | 1998-04-16 |
| ITMI960494A0 (cs) | 1996-03-14 |
| ITMI960494A1 (it) | 1997-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4659438A (en) | Process for the treatment of stainless steel for a direct galvanic gold plating | |
| PT85460A (pt) | Processo para tratar graos de diamante e ferramentas realizadas com os diamantes tratados pelo processo | |
| PE50095A1 (es) | Proceso mejorado de extraccion hidrometalurgica | |
| US4740280A (en) | Electrolyte for electrochemically polishing metal surfaces | |
| ES2020279B3 (es) | Solucion, composicion y proceso de afino de superficies metalicas. | |
| JP3898801B2 (ja) | 銀製品の変色皮膜除去剤及び除去方法 | |
| MY117886A (en) | Method of nitriding ferrous metal parts having improved corrosion resistance. | |
| WO1997034030A1 (en) | Solution for galvanic polishing of metal jewelry | |
| FR2486109A1 (fr) | Bains electrolytiques pour retirer des depots metalliques a base d'amines, de composes nitres et de nitrates | |
| ATE11561T1 (de) | Verfahren zur verbesserung der plattierungseigenschaften von borreichem kubischen bornitrid. | |
| CA1163469A (en) | Gold alloy | |
| US2712524A (en) | Electropolishing of gold and gold alloys | |
| US2227454A (en) | Method of gold plating steel and ferrous alloys | |
| BR8707891A (pt) | Composicao de dispersao liquida para,e processo para,polimento de componentes ferrosos | |
| EP0102986B1 (en) | A non-abrasive metal cleaning agent | |
| US242338A (en) | Constant laval | |
| US5156892A (en) | Compositions for protecting metals, processes for their preparation, and methods of protecting metals | |
| US3296141A (en) | Bright dip compositions for the treatment of steel | |
| RU2127334C1 (ru) | Способ полирования меди и сплавов на ее основе | |
| RU1787174C (ru) | Способ очистки оборудовани | |
| Kondrashin et al. | Electrode Polarizability and Corrosion Stability of Copper and Alpha Brass Alloyed by As, P, Ni, and Au | |
| IL59207A (en) | Process for the recovery of cyanides from rinsing solutions of cyanide processes for electrodeposition of metals | |
| GB1573751A (en) | Silver preplating solution and process for plating | |
| KR100749861B1 (ko) | 은 소재의 형상물에 금도금한 제품의 내식성을 향상시키기위한 표면처리방법 | |
| SU1563877A1 (ru) | Электролит дл размерной электрохимической обработки |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): AL AM AT AU AZ BA BB BG BR BY CA CH CN CU CZ DE DK EE ES FI GB GE HU IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK TJ TM TR TT UA UG US UZ VN YU AM AZ BY KG KZ MD RU TJ TM |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GH KE LS MW SD SZ UG AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE BF BJ CF |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| REG | Reference to national code |
Ref country code: DE Ref legal event code: 8642 |
|
| NENP | Non-entry into the national phase |
Ref country code: CA |
|
| NENP | Non-entry into the national phase |
Ref country code: JP Ref document number: 97532413 Format of ref document f/p: F |
|
| 122 | Ep: pct application non-entry in european phase |