WO1997034030A1 - Solution for galvanic polishing of metal jewelry - Google Patents

Solution for galvanic polishing of metal jewelry Download PDF

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Publication number
WO1997034030A1
WO1997034030A1 PCT/IT1997/000055 IT9700055W WO9734030A1 WO 1997034030 A1 WO1997034030 A1 WO 1997034030A1 IT 9700055 W IT9700055 W IT 9700055W WO 9734030 A1 WO9734030 A1 WO 9734030A1
Authority
WO
WIPO (PCT)
Prior art keywords
polishing
solution
cysteine
thiourea
solution according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IT1997/000055
Other languages
English (en)
French (fr)
Inventor
Guiseppe Carrara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to AU19389/97A priority Critical patent/AU1938997A/en
Publication of WO1997034030A1 publication Critical patent/WO1997034030A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals

Definitions

  • the present invention relates to solutions used to polish jewelry and in particular an aqueous solution for the electrolytic polishing of articles made of precious metals.
  • the polishing of metal articles is usually carried out according to various methods, such as mechanical polishing by means of abrasive implements such as grinding wheels, brushes, etc., treatment by means of suitable solvent liquids, electrolytic finishing through the action of electric current on the articles used as electrodes immersed in suitable solutions.
  • the polishing usually carried out in goldsmith's workshops is an electrolytic polishing of jewels immersed in a solution containing essentially cyanide ions deriving from compounds such as cyanides and ferrocyanides of alkali metals, by the use of suitable equipment.
  • the present invention aims therefore at providing a novel solution for polishing jewels, which is free of the above named drawbacks.
  • the solution according to the present invention is basically formed by one or more organic compounds containing ionizable hydrogen and comprised in the group formed by thiourea, cysteine, methionine, alanine, glycine and their derivatives, mixed with sulfamic acid and a sulfamate dissolved in water;
  • the polishing process carried out by such a solution is an anodic process wherein the jewel is used as the anode, and the polishing effect is obtained by removing little amounts of metal from the surface of the treated article.
  • a particularly preferred solution comprises thiourea or cysteine, copper sulfamate and sulfamic acid dissolved in water or other aqueous vehicle in variable proportions according to the operating conditions, such as voltage, intensity, kind of electric current (direct, pulsating, etc.), bath temperature, treatment time, and so on.
  • the operating conditions such as voltage, intensity, kind of electric current (direct, pulsating, etc.), bath temperature, treatment time, and so on.
  • a red gold jewel connected to the anode of a direct current source so as to have a current density of 1 A/cm 2 is immersed in an aqueous solution containing 80 g/L of cysteine, 100 g/L of sulfamic acid and 100 g/L of copper sulfamate, with pH about 2, and is treated under voltage at a temperature of 80°C up to the attainment of the desired brilliance.
  • a red gold jewel connected to the anode of a direct current source is immersed in an aqueous solution containing 50 g/L of thiourea, 60 g/L of sulfamic acid and 5 g/L of copper sulfamate, with pH about 1 , and is treated under a variable voltage of 16 V to 28 V according to its weighing into carats at a temperature of 80 °C up to the attainment of the desired brilliance.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Adornments (AREA)
PCT/IT1997/000055 1996-03-14 1997-03-11 Solution for galvanic polishing of metal jewelry Ceased WO1997034030A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU19389/97A AU1938997A (en) 1996-03-14 1997-03-11 Solution for galvanic polishing of metal jewelry

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITMI96A000494 1996-03-14
IT96MI000494A IT1283246B1 (it) 1996-03-14 1996-03-14 Soluzione perfezionata per la brillantatura di gioielli in metallo

Publications (1)

Publication Number Publication Date
WO1997034030A1 true WO1997034030A1 (en) 1997-09-18

Family

ID=11373618

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IT1997/000055 Ceased WO1997034030A1 (en) 1996-03-14 1997-03-11 Solution for galvanic polishing of metal jewelry

Country Status (3)

Country Link
AU (1) AU1938997A (cs)
IT (1) IT1283246B1 (cs)
WO (1) WO1997034030A1 (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6592742B2 (en) * 2001-07-13 2003-07-15 Applied Materials Inc. Electrochemically assisted chemical polish
US6653242B1 (en) 2000-06-30 2003-11-25 Applied Materials, Inc. Solution to metal re-deposition during substrate planarization
WO2012172572A3 (en) * 2011-06-15 2013-03-14 Titan Industries Ltd Non-cyanide based electro chemical polishing

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU652201A1 (ru) * 1977-11-01 1979-03-15 Всесоюзный Научно-Исследовательский Проектно-Конструкторский Институт Ювелирной Промышленности Раствор дл электрохимического полировани изделий из сплавов золота
JPS5477239A (en) * 1977-12-01 1979-06-20 Kouei Kasei Kk Electropolishing solution for gold* silver or alloys thereof
US4663005A (en) * 1985-11-15 1987-05-05 Edson Gwynne I Electropolishing process
JPS62247100A (ja) * 1986-04-19 1987-10-28 Ijima Keijirou 電解研磨液

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU652201A1 (ru) * 1977-11-01 1979-03-15 Всесоюзный Научно-Исследовательский Проектно-Конструкторский Институт Ювелирной Промышленности Раствор дл электрохимического полировани изделий из сплавов золота
JPS5477239A (en) * 1977-12-01 1979-06-20 Kouei Kasei Kk Electropolishing solution for gold* silver or alloys thereof
US4663005A (en) * 1985-11-15 1987-05-05 Edson Gwynne I Electropolishing process
JPS62247100A (ja) * 1986-04-19 1987-10-28 Ijima Keijirou 電解研磨液

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 7931, Derwent World Patents Index; Class E16, AN 79-56866B, XP002032163 *
DATABASE WPI Section Ch Week 7949, Derwent World Patents Index; Class M11, AN 79-88838B, XP002032164 *
PATENT ABSTRACTS OF JAPAN vol. 012, no. 128 (C - 489) 20 April 1988 (1988-04-20) *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6653242B1 (en) 2000-06-30 2003-11-25 Applied Materials, Inc. Solution to metal re-deposition during substrate planarization
US6592742B2 (en) * 2001-07-13 2003-07-15 Applied Materials Inc. Electrochemically assisted chemical polish
WO2012172572A3 (en) * 2011-06-15 2013-03-14 Titan Industries Ltd Non-cyanide based electro chemical polishing
CN103946429A (zh) * 2011-06-15 2014-07-23 泰坦股份有限公司 非氰化物为基础的电化学抛光
JP2014519559A (ja) * 2011-06-15 2014-08-14 タイタン インダストリーズ リミテッド 非シアン化物ベースの電解研磨

Also Published As

Publication number Publication date
ITMI960494A0 (cs) 1996-03-14
AU1938997A (en) 1997-10-01
IT1283246B1 (it) 1998-04-16
ITMI960494A1 (it) 1997-09-14

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