WO1996040693A1 - Process for the synthesis of vinyl sulfenic acid derivatives - Google Patents

Process for the synthesis of vinyl sulfenic acid derivatives Download PDF

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Publication number
WO1996040693A1
WO1996040693A1 PCT/US1996/009460 US9609460W WO9640693A1 WO 1996040693 A1 WO1996040693 A1 WO 1996040693A1 US 9609460 W US9609460 W US 9609460W WO 9640693 A1 WO9640693 A1 WO 9640693A1
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alkyl
compound
hydrogen
formula
aryl
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PCT/US1996/009460
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French (fr)
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David W. Hoard
Wayne D. Luke
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Eli Lilly And Company
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Priority claimed from US08/482,692 external-priority patent/US5512701A/en
Priority claimed from US08/483,607 external-priority patent/US5514826A/en
Priority to JP9501774A priority Critical patent/JPH11507346A/en
Priority to BR9608847A priority patent/BR9608847A/en
Priority to NZ310241A priority patent/NZ310241A/en
Priority to AU61003/96A priority patent/AU698076B2/en
Application filed by Eli Lilly And Company filed Critical Eli Lilly And Company
Priority to PL96323907A priority patent/PL323907A1/en
Priority to IL12212796A priority patent/IL122127A/en
Priority to EA199800026A priority patent/EA000606B1/en
Priority to EP96918314A priority patent/EP0830362A4/en
Publication of WO1996040693A1 publication Critical patent/WO1996040693A1/en
Priority to MXPA/A/1997/009130A priority patent/MXPA97009130A/en
Priority to NO975633A priority patent/NO975633L/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/10Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C323/11Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C323/16Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and singly-bound oxygen atoms bound to the same carbon skeleton having the sulfur atoms of the thio groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton containing six-membered aromatic rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C313/08Sulfenic acids; Derivatives thereof
    • C07C313/18Sulfenamides
    • C07C313/20Sulfenamides having sulfur atoms of sulfenamide groups bound to acyclic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C321/00Thiols, sulfides, hydropolysulfides or polysulfides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D223/00Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom
    • C07D223/02Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom not condensed with other rings
    • C07D223/06Heterocyclic compounds containing seven-membered rings having one nitrogen atom as the only ring hetero atom not condensed with other rings with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D223/08Oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/52Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
    • C07D333/54Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C07D333/56Radicals substituted by oxygen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/0834Compounds having one or more O-Si linkage
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804Compounds having Si-O-C linkages

Definitions

  • the present invention is directed to a novel vinyl sulfenic acid derivatives and a new process for their synthesis. These compounds are useful for the synthesis of benzo [b] thiophenes, in particular 2-aryl-benzo [b] thiophenes .
  • Benzo fb] thiophenes have been prepared by a number of different synthetic routes.
  • One of the most widely used methods is the oxidative cyclization of o-mercaptocinnamic acids. This route is limited to the preparation of benzo[b] - thiophene-2-carboxylates .
  • 2-Phenylbenzo[b] thiophenes are prepared by acid-catalyzed cyclization of 2-phenylthioacetal- dehyde dialkyl acetals .
  • Unsubstituted benzo[b]thiophenes are prepared by catalytic condensation of styrene and sulfur.
  • Sulfenic acids have been postulated as key intermediates in a variety of chemical reactions; however, very few examples exist of the isolation of these compounds. See Shelton and Davis, J. Am . Chem . Soc , 89(3), 718-719 (1968) and Davis et al . , J. Am . Chem. Soc , 100, 2844 (1978) . Sulfenic acids have been generated in si tu, and intramolecularly or intermolecularly cyclyzed with olefins and acetylenes. See Mazzanti et al . , J. Chem. Soc , Perkin Trans . I, 3299-3004 (1944) and Davis et al . , J.
  • the present invention is directed to novel vinyl sulfenic acid derivatives: novel sulfenate silylesters, sulfenamides, and disulfides, and to a process for the synthesis of vinyl sulfenic acid derivatives. Specifically, the present invention is directed to a compound of the formula
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 4 is OSi(R) 3 , NR5R6, or SRg; each R is independently C 1 -C 6 alkyl, aryl, or arylalkyl;
  • R 5 and R ⁇ are independently hydrogen, -C ⁇ , alkyl, arylalkyl, or aryl, or R 5 and R ⁇ , together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; and
  • R 8 is C 1 -C 6 alkyl, aryl, or arylalkyl.
  • the present invention includes individually the E and Z isomers, or mixtures thereof, of the formula III compounds. These E and Z regioisomers are represented by the following structures:
  • Another aspect of the present invention is a process for preparing sulfenate silyl esters, sulfenamides, and disulfides.
  • the present invention is directed to a process for preparing a compound of the formula
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino;
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino;
  • R 4 is OSi(R) 3 , NR5R6, or SRs; each R is independently C 1 -C 6 alkyl, aryl, or arylalkyl; R 5 and R ⁇ are independently hydrogen, C 1 -C 6 alkyl, arylalkyl, or aryl; or R 5 and Re together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; and
  • Rs is Ci-C ⁇ alkyl, aryl, or arylalkyl; which comprises :
  • Ri and R 2 are as defined above, and
  • R 3 is a thermally-labile or acid-labile C 2 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl (C ⁇ -C ⁇ o alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
  • R l and R 2 are as defined above;
  • R 7 is OSi (R) 3 ; and each R is independently C 1 -C 6 alkyl, aryl, -or arylalkyl;
  • One aspect of the present invention is a process for the synthesis of the sulfenate silyl esters, the formula IV compounds.
  • the present invention relates to a process for preparing a compound of the formula
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 7 is OSi(R) 3 ,- and each R is independently Ci-C ⁇ alkyl, aryl, or arylalkyl; which comprises reacting a compound of the formula
  • R l and R 2 are as defined above, and
  • R 3 is a thermally-labile or acid-labile C 2 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl(C ⁇ C o alkyl) group; with a silylating reagent .
  • Another aspect of the present invention is a process for the synthesis of the sulfenamides, the formula V compounds.
  • the present invention relates to a process for preparing a compound of the formula
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, amino;
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, amino; and R5 and R ⁇ , are independently hydrogen, Ci-C ⁇ alkyl, arylalkyl, or aryl, or R 5 and R ⁇ together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethyli ine; comprising the steps of: (1) reacting a compound of the formula
  • Ri and R 2 are as defined above, and
  • R 3 is a thermally-labile or acid-labile C 2 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl (C 1 -C 10 alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
  • R l and R 2 are as defined above;
  • R 7 is OSi(R) 3 ,- and each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
  • Another aspect of the present invention is a process for the synthesis of the disulfides, the formula XIV compounds.
  • the present invention relates to a process for preparing a compound of the formula
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, amino;
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, amino
  • Rs is Ci-Cg alkyl, aryl, or arylalkyl
  • R l and R 2 are as defined above, and
  • R3 is a thermally-labile or acid-labile C 2 -C 10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
  • R l and R 2 are as defined above;
  • R 7 is OSi(R) 3 ,- and each R is independently Ci-C alkyl, aryl, or arylalkyl;
  • Another aspect of the present invention is a process for the synthesis of a compound of the formula
  • Rg is hydrogen, halo, amino, or hydroxyl
  • Rio is hydrogen, halo, amino, or hydroxyl
  • R ll and R 2 are independently C 1 -C 4 alkyl, or Rn and R 12 together with the adjacent nitrogen atom form a heterocyclic ring selected from the group consisting of pyrrolidino, piperidino, hexamethyleneimino, and morpholino; and
  • HX is HCl or HBr; comprising the steps of:
  • R l is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 2 is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino
  • R 4 is OSi(R) 3 , NR5Rg, or SRs; each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
  • R 5 and Rg are independently hydrogen, Ci-Cg alkyl, or aryl, or R 5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, and hexamethylimine; and
  • Rs is Ci-Cg alkyl, aryl, or arylalkyl; to prepare a benzothiophene compound of the formula
  • R and R2 are as defined above;
  • R l l R 12/ an d HX are as defined previously; and R1 3 is chloro, bromo, or hydroxyl; in the presence of BX' 3 , wherein X' is chloro or bromo;
  • the term "acid catalyst” represents a Lewis acid or a Br ⁇ nsted acid.
  • Representative Lewis acids are zinc chloride, zinc iodide, aluminum chloride, and aluminum bromide.
  • Br ⁇ nsted acids include: inorganic acids, such as sulfuric and phosphoric acids; carboxylic acids, such as acetic and trifluorocetic acids; sulfonic acids, such as methanesulfonic, benzenesulfonic, 1-naphthalenesulfonic, 1- butanesulfonic, ethanesulfonic, 4-ethylbenzenesulfonic, 1- hexanesulfonic, 1, 5-naphthalenedisulfonic, 1-octanesulfonic, camphorsulfonic, trifluoromethanesulfonic, and p-toluene ⁇ sulfonic acids; and polymeric arylsulfonic acids, such as Nafion®, Amberlyst®, or Amberlite®.
  • inorganic acids such as sulfuric and phosphoric acids
  • carboxylic acids such as acetic and trifluorocetic acids
  • sulfonic acids such as methanesulfonic
  • the preferred acids for use in catalyzing the processes of the present invention are sulfonic or polymeric sulfonic acids. More preferably, the acid catalysts are sulfonic acids, such as methanesulfonic acid, benezenesulfonic acid, camphorsulfonic acid, and p- toluenesulfonic acid. The most preferred acid catalyst is p- toluenesulfonic acid.
  • C 1 -C 4 alkoxy represents groups such as methoxy, ethoxy, n-propoxy, isopropoxy, n- butoxy, fc-butoxy, and like groups.
  • halo refers to fluoro, chloro, bromo, or iodo groups.
  • Ci-Cg alkyl represents a straight or branched alkyl chain having from one to six carbon atoms.
  • Typical C ⁇ Cg alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-pentyl, isopentyl, n-hexyl, 2-methylpentyl, and the like.
  • C 1 -C 4 alkyl represents a straight or branched alkyl chain having from one to four carbon atoms, and includes methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, i-butyl, and t-butyl.
  • aryl represents groups such as phenyl and substituted phenyl.
  • substituted phenyl represents a phenyl group substituted with one or more moieties chosen from the group consisting of halo, hydroxy, nitro, C 1 -C 4 alkyl, C 1 -C 4 alkoxy, trichloromethyl, and trifluoromethyl.
  • Examples of a substituted phenyl group include 4-chloro- phenyl, 2, 6-dichlorophenyl, 2, 5-dichlorophenyl, 3, 4-dichloro- phenyl, 3-chlorophenyl, 3-bromophenyl, 4-bromophenyl, 3,4- dibromophenyl, 3-chloro-4-fluorophenyl, 2-fluorophenyl, 4- hydroxyphenyl, 3-hydroxyphenyl, 2,4-dihydroxyphenyl, 3-nitro- phenyl, 4-nitrophenyl, 2, 4-dinitrophenyl, 4-methylphenyl, 4- ethylphenyl, 4-methoxyphenyl, 4-propylphenyl, 4-n-butyl- phenyl, 4-t-butylphenyl, 3-fluoro-2-methylphenyl, 2,3- difluorophenyl, 2, 6-difluorophenyl, 2, 6-dimethylphenyl, 2- flu
  • arylalkyl represents a C 1 -C 4 alkyl group bearing one or more aryl groups. Representatives of this group include benzyl, o-nitrobenzyl, p-nitrobenzyl, p- halobenzyl (such as p-chlorobenzyl, p-bromobenzyl, p- iodobenzyl), 1-phenylethyl, 2-phenylethyl, 3-phenylpropyl, 4- phenylbutyl, 2-methyl-2-phenylpropyl, (2, 6-dichlorophenyl) - methyl, bis (2, 6-dichlorophenyl)methyl, (4-hydroxyphenyl) - methyl, (2, 4-dinitrophenyl)methyl, diphenylmethyl, triphenylmethyl, (p-methoxyphenyl) -diphenylmethyl, bis (p- methoxyphenyl)methyl, bis (2-nitrophenyl)methyl, and the
  • arylalkoxy represents a C 1 -C 4 alkoxy group bearing one or more aryl groups. Representatives of this group include benzyloxy, o-nitrobenzyloxy, p-nitrobenzyloxy, p-halobenzyloxy (such as p-chlorobenzyloxy, p-bromobenzyloxy, p-iodobenzyloxy) , 1-phenylethoxy, 2-phenylethoxy, 3- phenylpropoxy, 4-phenylbutoxy, 2-methyl-2-phenylpropoxy, (2, 6-dichlorophenyl)methoxy, bis (2, 6-dichlorophenyl)methoxy, (4-hydroxyphenyl)methoxy, (2, 4-dinitrophenyl) ethoxy, diphenylmethoxy, triphenyl ethoxy, (p-methoxyphenyl) - diphenylmethoxy, bis (p-methoxyphenyl)methoxy,
  • thermally-labile or acid-labile C 2 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl(C -C ⁇ o alkyl) group represents a group that is readily removed from the sulfoxide (SO) group under heating or by treatment with the acid catalyst.
  • the thermally-labile or acid-labile C 2 -C 10 alkyl groups are straight or branched alkyl chains having from two to ten carbon atoms and having at least one beta-hydrogen atom.
  • thermally-labile or acid-labile C 2 -C 10 alkyl groups include ethyl, n-propyl, i-propyl, 1,1- dimethylpropoyl, n-butyl, sec-butyl, t-butyl, 1,1- di ethylbutyl, 2-methylbutyl, 3-methylbutyl, 1-methylbutyl, 1, 2-dimethylbutyl, 1, 3-dimethylbutyl, 2, 4-dimethylbutyl, 3,3- dimethylbutyl, n-pentyl, 1-methylpentyl, 2-methylpentyl, 3- methylpentyl, 4-methylpentyl, n-hexyl, and the like.
  • the thermally-labile or acid-labile C 4 -C 10 alkenyl groups are straight or branched alkenyl chains having from four to ten carbon atoms, at least one site of unsaturation, and either a beta-hydrogen or delta-hydrogen atom.
  • thermally-labile or acid-labile C 4 -C 10 alkenyl groups include 2-butenyl, 3-butenyl, 2-methyl-2-butenyl, 3-methyl-2-butenyl, 2-methyl-3-butenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 2- methyl-2-pentenyl, 3-methyl-2-pentenyl, 4-methyl-2-pentenyl, 2-methyl-3-pentenyl, 3-methyl-3-pentenyl, 4-methyl-3- pentenyl, 2-methyl-4-pentenyl, 3-methyl-4-pentenyl, 4-methyl- 4-pentenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, and the like.
  • thermally-labile or acid-labile aryl represents thermally-labile or acid-labile C 2 -C 10 alkyl groups additionally containing one or more aryl groups and aryl-substituted methyl groups.
  • Representative aryl (Ci- C 10 alkyl) groups include benzyl, diphenylmethyl, triphenylmethyl, p-methoxybenzyl, 2-phenylethyl, 2-phenyl- propyl, 3-phenylpropyl, and the like.
  • One group of products of the present invention are sulfenate silyl esters.
  • the formula III compounds, where R 4 is OSi(R) 3 and each R is independently C ⁇ Cg alkyl, aryl, or arylalkyl and the formula IV compounds are silyl esters of sulfenic acids.
  • the preferred sulfenate silyl esters are abbreviated using nomenclature well recognized in the chemical arts, as shown in the following table.
  • silylating reagent represents a compound, or a combination of compounds, used to convert the intermediate sulfenic acid to a sulfenate silyl ester.
  • Representative silylating reagents include bis (trialkylsilyl)ureas, such as 1,3-bis (trimethylsilyl)urea, 1, 3-bis (triethylsilyl)urea, 1,3- bis (dimethylisopropylsilyl)urea, 1,3-bis (triisopropyl- silyDurea, 1, 3-bis (diethylisopropylsilyl)urea, 1,3- bis (dimethylhexylsilyl)urea, and 1, 3-bis ( -butyldimethyl- silyl)urea; bis (triarylsilyl)ureas, such as 1,3-bis- (triphenylsilyl)urea; bis (diarylalkylsilyl)ureas, such 1,3
  • E and Z The formula III compounds exist in two regioisomeric forms, E and Z. These E and Z regioisomers are represented by the following structures:
  • a formula VII compound is converted to a styryl sulfide by reaction with a mercaptan of the formula HSR 3 in the presence of a Lewis acid.
  • the formula VIII compound is then oxidized to a styryl sulfoxide, a compound of formula II.
  • a formula VII compound wherein Ri and R 2 are as defined above, is treated with a Lewis acid, such as titanium(IV) chloride.
  • a Lewis acid such as titanium(IV) chloride.
  • This reaction is carried out in an anhydrous organic solvent, such as dry tetrahydrofuran, at a temperature of about 0°C to about 35°C.
  • an amine base and a mercaptan of the formula HSR 3 , where R 3 is a thermally-labile or acid labile C ⁇ -C ⁇ o alkyl, C 4 -C 10 alkenyl, or aryl(C ⁇ -C o alkyl) group.
  • the mercaptan and amine base are added as a solution in the reaction solvent.
  • a representative amine base is triethylamine. After the addition of the mercaptan and amine base, the reaction is generally heated to a temperature of about 35°C to about 65°C, preferably at about 50°C. The products of this reaction can be purified using techniques well known in the chemical arts, such as by crystallization or chromatography.
  • the formula VIII compound where Ri, R 2 , and R 3 are as defined above, is then oxidized to produce the formula II compounds.
  • Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m-chloroperoxybenzoic acid, and hydrogen peroxide.
  • This oxidation reaction is typically run in an organic solvent, such as toluene, methylene chloride, chloroform, or carbontetrachloride.
  • the reaction is generally carried out at a temperature of about -30°C to about 15°C, preferably at about -20°C.
  • the products of the reaction are easily purified by recrystallization.
  • R 3 is t-butyl
  • the crystalline product of this reaction sequence is the E regioisomer of formula II.
  • the Z regioisomer of the formula II compounds can be prepared selectively by a second route as shown in Scheme II.
  • a benzyl alcohol, a formula IX compound is reacted with a mercaptan of the formula R 3 SH to produce a benzyl sulfide, a formula X compound.
  • This benzyl sulfide is reacted with a strong base, forming a benzylic anion, which is condensed with a benzaldehyde.
  • This condensation product is reacted with an acid chloride and the resulting intermediate treated with a second strong base to produce a styryl sulfide, a formula VIIIZ compound.
  • This styryl sulfide is then oxidized with an oxidizing agent to produce the formula HZ compound.
  • the first step in the synthesis of the Z styryl sulfoxide compounds is the conversion of a benzyl alcohol to a benzyl sulfide, formula X compound.
  • Suitable Lewis acids for this transformation are zinc bromide, zinc chloride, zinc iodide, ferric chloride, titanium(IV) chloride, aluminum trichloride, and aluminum tribromide, preferably zinc iodide.
  • the reaction is generally carried out in an organic solvent, such as 1, 2-dichloroethane or methylene chloride. When the reaction is carried out at room temperature, the reaction is complete after about 18 hours.
  • the benzyl sulfide is reacted with a strong base to form a benzylic anion.
  • Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; and alkyllithiums, such as n- butyllithium, t-butyllithium, sec-butyllithium, and methyllithium.
  • the preferred strong base for this reaction is n-butyllithium.
  • the preferred solvent for this reaction is dry tetrahydrofuran.
  • the benzylic anion is condensed with a benzaldehyde to prepare an intermediate condensation product.
  • the benzaldehyde has the general formula p-Ri (CgH 4 )CHO, wherein Ri is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino.
  • Ri is hydrogen, C 1 -C 4 alkoxy, arylalkoxy, halo, or amino.
  • the benzylic anion is prepared and the condensation product is formed in si tu by adding the benzaldehyde to the cold solution of the benzylic anion.
  • the condensation product is treated with an acid chloride to produce an intermediate compound.
  • Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1- butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N, N-dimethylaminocarbonyl chloride; preferably a sulfonyl chloride.
  • methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product.
  • This intermediate compound is reacted with a second strong base to produce a styryl sulfide, a formula VIIIZ compound where Ri, R 2 , and R 3 are as defined above.
  • Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide.
  • the preferred strong base for this reaction is potassium t-butoxide. Generally, this reaction is carried out at about 15°C to about room temperature, preferably at room temperature.
  • the styryl sulfide is oxidized to prepare the corresponding styryl sulfoxide.
  • Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m- chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide.
  • the oxidizing agent is peracetic acid.
  • This oxidation is typically carried out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform; preferably methylene chloride.
  • This oxidation can be carried out at a temperature of about -40°C to about 0°C.
  • the benzyl sulfide intermediate (formula X compound) can be used to produce a mixture of E and Z isomers of the styryl sulfoxides, the formula II compounds. This synthesis is outlined is Scheme 3.
  • the benzyl sulfide prepared as described above, is oxidized to produce the corresponding benzyl sulfoxide.
  • This benzyl sulfoxide is reacted with a strong base, and the resulting anion condensed with a benzaldehyde.
  • the condensation product is reacted with an acid chloride and the resulting intermediate compound reacted with a second strong base to produce the styryl sulfoxide.
  • the benzyl sulfide the formula X compound, wherein R 2 is as defined above and R 3 is a thermally-labile or acid- labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C1 0 alkyl) group having a tertiary carbon atom adjacent to the sulfur atom, is oxidized to produce the corresponding benzyl sulfoxide, formula XI compound.
  • Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and J ⁇ - chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide.
  • the oxidizing agent is peracetic acid.
  • This oxidation is typically carried out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform; preferably at a temperature of about -30°C to about 5°C.
  • organic solvent such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform
  • Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec-butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide.
  • the preferred base for this transformation is n-butyllithium.
  • This deprotonation reaction is carried out in a dry organic solvent, such as tetrahydrofuran or 1, 2-dimethoxyethane, at a temperature of about -25°C.
  • the benzylic anion is condensed, without isolation, with a benzaldehyde compound of the formula p-Ri (CgH 4 ) CHO, wherein Ri is as defined above.
  • Ri is as defined above.
  • about one equivalent of the benzaldehyde is added to the cold solution prepared as described in the preceding paragraph.
  • the resulting diastereomeric mixture of condensation products may be isolated, or preferably used in the next step without isolation.
  • the condensation product is reacted with an acid chloride to produce an intermediate compound.
  • the condensation product is optionally treated with a base, such as n-butyllithium, and reacted with an acid chloride.
  • Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1-butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N/ N-dimethylaminocarbonyl chloride; preferably a sulfonyl chloride.
  • the acid chloride is added to the cold reaction mixture, then the resulting mixture is allowed to warm to room temperature.
  • methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product, which eliminates the need to add additional base.
  • the resulting intermediate compound is reacted with a second strong base to produce the E and Z styryl sulfoxides, formula II compounds where Ri, R 2 , and R 3 are as defined above.
  • second strong bases for this elimination reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t- butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide.
  • the preferred base for this transformation is potassium t-butoxide.
  • a 20% excess, such as 1.2 equivalents, of the second base are added.
  • this reaction is carried out at a temperature of about 15°C to about room temperature, preferably at room temperature.
  • the compounds of the present invention can be prepared from the formula II compounds.
  • the novel sulfenate silyl esters are prepared from the styryl sulfoxides as shown in Scheme 4.
  • the sulfenate silyl esters where Ri, R 2 , and R 7 are as defined above and R 3 is a thermally-labile or acid labile C 1 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl (C 1 -C 10 alkyl) group, are prepared by reacting a formula II compound with a silylating reagent.
  • Suitable solvents for this reaction include benzene, toluene, xylene, and high-boiling, halogenated hydrocarbon solvents, having a boiling point greater than or equal to 80°C, such as 1, 1, 2-trichloroethane.
  • Suitable silylating reagents include bis (trialkylsilyl)ureas, such as 1,3-bis (trimethylsilyl)urea, 1,3-bis (triethylsilyl) - urea, 1, 3-bis (dimethylisopropylsilyl) -urea, 1,3-bis (t-butyl- dimethylsilyl)urea; bis (triarylsilyl) -ureas, such as 1,3- bis (triphenylsilyl)urea; bis (dialkylaryl-silyl) ureas, such 1, 3-bis (diphenylmethylsilyl)urea; and hexaalkyldisilylzanes, such as hexamethyldisilylzane; or combination of a hexaalkyldisilylzane and a catalytic amount of a chlorotrialkylsilane, such as chlorotrimethylsilane.
  • the final concentration, after complete addition, of the formula II compound is about 0.001 M to about 0.5 M.
  • a slight excess, such as ten percent, of the silylating reagent is used. This reaction can be carried out at about 80°C to about 140°C for about ten minutes to about two hours. Because the Z isomer reacts much faster than the corresponding E isomer, the use of only the Z isomer as the starting compound requires less time for complete transformation.
  • the sulfenate silyl ester where Ri, R 2 , and R 7 are as defined above, is prepared from the styryl sulfoxide and, preferably without isolation or purification, reacted with an amine of the formula HNRsRg, wherein R 5 and Rg as defined above.
  • the sulfenate silyl ester is prepared,- the reaction solution cooled to about 0°C to about 50°C, and treated with the amine.
  • one to two equivalents of the amine are used.
  • the conversion from the silyl ester to the sulfenamide is typically complete after about two hours to about eight hours.
  • the resulting sulfenamides can be purified using standard organic techniques, such as silica-gel chromatography.
  • novel disulfides are prepared from the sulfenate silyl esters as shown in Scheme 6.
  • the sulfenate silyl ester where Ri, R 2 , and R 7 are as defined above, is prepared from the styryl sulfoxide and, preferably without isolation or purification, reacted with a mercaptan of the formula HSRs, where Rs is as defined above, in the presence of an amine base.
  • the sulfenate silyl ester is prepared, the reaction solution allowed to cool to room temperature, and the reaction mixture treated with a solution containing the mercaptan and amine base.
  • the solvent for this mercaptan/amine solution is the same as the solvent for the sulfenate silyl ester-containing mixture.
  • Representative amine bases include triethylamine, diisopropylethylamine, pyridine, morpholine, N-methyl ⁇ morpholine, and collidine.
  • the conversion of the sulfenate silyl ester is typically complete after about one to about eight hours.
  • the resulting disulfides can be purified using standard organic techniques, such as silica-gel chroma ⁇ tography.
  • the sulfenate silyl esters, sulfenamides, or disulfides are treated with acid catalysts to produce the formula I compounds.
  • Suitable acid catalysts for this reaction include Lewis acids or Br ⁇ nsted acids.
  • Representative Lewis acids include zinc chloride, zinc iodide, aluminum chloride, and aluminum bromide.
  • Br ⁇ nsted acids include inorganic acids, such as sulfuric and phosphoric acids; carboxylic acids, such as acetic and trifluoroacetic acids; sulfonic acids, such as methanesulfonic, benzenesulfonic, 1-naphthalenesulfonic, 1- butanesulfonic, ethanesulfonic, 4-ethylbenzenesulfonic, 1- hexanesulfonic, 1, 5-naphthalenedisulfonic, 1-octanesulfonic, camphorsulfonic, trifluoromethanesulfonic, and p-toluene- sulfonic acids; and polymeric arylsulfonic acids, such as Nafion®, Amberlyst®, or Amberlite®.
  • the more preferred acid catalysts are sulfonic acids, such as methanesulfonic acid, benezene-sulfonic acid, camphorsulfonic, and p- toluenesulfonic acid.
  • the most preferred acid catalyst is p- toluenesulfonic acid.
  • a solution of the acid catalyst in an organic solvent such as toluene, benzene, xylene, or a high-boiling halogenated hydrocarbon solvent, such as 1, 1, 2-trichloroethane, is heated to about 80°C to about 140°C, and treated with a solution of the sulfenate silyl ester, sulfenamide, or disulfide in the same solvent.
  • an excess amount of the acid catalyst is used, preferably three equivalents of the acid.
  • the final concentration of the starting compound is about 0.01 M to about 0.2 M, preferably 0.05 M.
  • best yields are obtained when the sulfenate silyl ester is slowly added to the heated acid solution over a period of about 15 minutes to about three hours.
  • residual water is removed from the reaction solution by the use of a Dean-Stark trap or Soxhlet extractor.
  • styryl sulfoxides are also useful for the preparation of a benzothiophene styryl sulfide as shown in Scheme 8.
  • benzothiophene styryl sulfides where Ri and R 2 are as defined above, are prepared from the styryl sulfoxides.
  • a solution of the styryl sulfoxide, where Ri and R 2 are as defined above and R 3 is a thermally- labile or acid labile C 1 -C 10 alkyl, C 4 -C 10 alkenyl, or aryl(C ⁇ -C ⁇ o alkyl) group is added to a solution of an acid catalyst at a temperature of about 100°C to about 140°C, where the acid catalyst is defined above.
  • the concentration of acid catalyst is dependent on the final concentration of the formula II compound and the rate of addition of the formula II compound.
  • the acid concentration is about 0.002 M.
  • the acid concentration is about 0.05 M and is added over 30 minutes.
  • the Formula I compound wherein Ri and R 2 are hydrogen, C 1 -C 4 alkoxy, or arylalkoxy, is acyiated with the formula XII compound, wherein R 13 is chloro or hydroxy, in the presence of boron trichloride or boron tribromide; boron trichloride is preferred.
  • the reaction can be carried out in a variety of organic solvents, such as chloroform, methylene chloride, 1, 2-dichloroethane, 1, 2, 3-dichloropropane, 1, 1, 2, 2-tetra- chloroethane, 1, 2-dichlorobenzene, chlorobenzene, and fluorobenzene.
  • the preferred solvent for this synthesis is 1, 2-dichloroethane.
  • the reaction is carried out at a temperature of about -10°C to about 25°C, preferably at 0°C.
  • the reaction is best carried out at a concentration of the benzothiophene formula I compound of about 0.2 M to about 1.0 M.
  • the acylation reaction is generally complete after about two hours to about eight hours.
  • the acyiated benzothiophene preferably is converted to a formula XIII compound, wherein R 5 and/or Rg are hydroxy, without isolation of the product from the acylation reaction.
  • This conversion is performed by adding additional boron trichloride or boron tribromide and heating the reaction mixture.
  • two to five molar equivalents of boron trichloride are added to the reaction mixture, most preferably three molar equivalents .
  • This reaction is carried out at a temperature of about 25°C to about 40°C, preferably at 35°C. The reaction is generally complete after about 4 hours to about 48 hours.
  • the acylation reaction or acylation/dealkylation reaction is quenched with an alcohol or a mixture of alcohols.
  • Suitable alcohols for use in quenching the reaction include methanol, ethanol, and isopropanol.
  • the acylation/dealkylation reaction mixture is ⁇ added to a 95:5 mixture of ethanol and methanol (3A ethanol) .
  • the 3A ethanol can be at room temperature or heated to reflux, preferably at reflux.
  • the quench is performed in this manner, the Formula XIII compound conveniently crystallizes from the resulting alcoholic mixture.
  • Proton nuclear magnetic resonance ( 1 H NMR) spectra and 13 C nuclear magnetic resonance ( 13 C NMR) spectra were obtained on a Bruker AC-300 FTNMR spectrometer at 300.135 MHz or at 75.469 MHz for proton and carbon, respectively, or a GE QE-300 spectrometer at 300.15 MHz.
  • Silica-gel flash chromatography was performed as described by Still et al . using Silica Gel 60 (230-400 mesh, E. Merck) .
  • Still et al . J. Org. Chem. , 43, 2923 (1978) .
  • Elemental analyses for carbon, hydrogen, and nitrogen were determined on a Control Equipment Corporation 440 Elemental Analyzer.
  • Elemental analyses for sulfur were determined on a Brinkman Colorimetric Elemental Analyzer. Melting points were determined in open glass capillaries on a Mel-Temp II melting point apparatus or a Mettler FP62 Automatic instrument, and are uncorrected.
  • Field desorption mass spectra were obtained using a Varian Instruments VG 70-SE or VG ZAB-3F mass spectrometer.
  • High resolution free atom bombardment mass spectra were obtained using a Varian Instruments VG ZAB-2SE mass spectrometer.
  • % potency peak area - b sample volume (mL; m sample weight (mg)
  • the amount (percentage) of solvent, such as 1,2- dichloroethane, present in the crystalline material was determined by gas chromatography.
  • a sample of the crystalline solid (50 mg) was weighed into a 10-mL volumetric flask, and dissolved in a solution of 2-butanol (0.025 mg/mL) in dimethylsulfoxide.
  • a sample of this solution was analyzed on a gas chromatograph using a DB Wax column (30 m x 0.53 mm ID, 1 m particle) , with a column flow of 10 mL/min and flame ionization detection.
  • the column temperature was heated from 35°C to 230°C over a 12 minute period.
  • the amount of solvent was determined by comparison to the internal standard (2- butanol) .
  • a solution of desoxyanisoin (12.82 g) in tetrahydrofuran (100 mL) was treated with titanium (IV) chloride (10.43 g) .
  • titanium (IV) chloride 10.43 g
  • the reaction mixture was cooled to maintain the temperature below 35°C.
  • the resulting mixture was stirred at 30°C.
  • this mixture was treated with a solution of 2-methyl-2-propane- thiol (6.76 mL) and triethylamine (16.70 mL) in tetrahydro- furan (15 mL) .
  • the resulting mixture was stirred at 50°C.
  • Example IIA The crystalline compound prepared as described in Example IA was dissolved in toluene (150 mL) , and the resulting solution cooled to about -20°C. The cold solution was treated with peracetic acid (32% w/w in dilute acetic acid, 1.24 g) over ten minutes. The resulting mixture was extracted with saturated sodium sulfite and brine. The organic phase was concentrated in vacuo . The residue was recrystallized from ethyl acetate/heptane to give 14.11 g of the title compound. Melting point 104°C (dec) .
  • Example 2A (2.51 g) in tetrahydrofuran (50 mL) was cooled to about -20°C. This cold solution was treated with a solution of n-butyllithium in hexane (1.6 M, 7.47 L) over ten minutes. The resulting solution was allowed to warm to about 0°C over 35 minutes. This cold solution was treated with p- anisaldehyde (1.46 mL) . After an additional 15 minutes, the reaction solution was treated with methanesulfonyl chloride (0.95 mL) . The resulting reaction was allowed to warm to room temperature.
  • reaction mixture was treated with a solution of potassium t- butoxide in tetrahydrofuran (1.0 M, 12.0 L) .
  • reaction was quenched by the addition of IN hydrochloric acid (12.0 mL) .
  • the organic phase was separated, dried over magnesium sulfate, filtered, and concentrated to an oil (4.4 g) .
  • Example 2B The compound from Example 2B was converted to the title compound using the procedure substantially as described in Example IB.
  • Example 3B (10.0 g) in tetrahydrofuran (140 mL) was cooled to about -30° to -25°C (dry ice/acetone bath) . This cold solution was treated with n-butyllithium in cyclohexane (1.6 M, 27.65 mL) over 25 minutes. After stirring for 35 minutes, the reaction mixture was treated with p-anisaldehyde (5.4 mL) . The dry ice/acetone bath was removed and the reaction allowed to warm to about 20°C. This mixture was treated with methanesulfonyl chloride (3.5 mL) . The temperature of the reaction rose from about 20° to about 35°C upon addition of the methanesulfonyl chloride.
  • Example 1 (1.74 g) and 1, 3-bis (trimethylsilyl)urea (578 mg) in toluene (54 mL) was heated to reflux. After 1.5 hours, the reaction was allowed to cool to room temperature, and treated with dimethylamine (2.80 mL, 2.0 M in tetrahydro- furan) . After an additional two hours, the reaction solution was evaporated to dryness to give a 7:1 mixture of E/Z regio ⁇ isomers of the title compounds.
  • Late-elutmg Isomer i H NMR (CDCI 3 ) d 7.90 (d, IH) , 7.62 (d, 2H) , 7.24 (IH), 7.08 (d, 2H) , 7.02 (dd, IH) , 6.96 (d, 2H) , 6.74-6.71 (d, 2H) , 6.70 (d, 2H) , 6.55 (d, 2H) , 6.21 (s, IH) , 3.86 (s, 3H) , 3.85 (s, 3H) , 3.76 (s, 3H) , 3.67 (s, 3H) .
  • the compound (early-elutmg isomer) prepared as described in Example 10 (125 mg) was added to a refluxing solution of p-toluenesulfonic acid monohydrate (4.2 mg) m toluene (1.5 mL) . After six hours, methanesulfonic acid (7.5 mL) was added to the reaction mixture. After an additional hour, the reaction mixture was allowed to cool to room temperature. The resulting mixture was diluted with acetonitrile and assayed by HPLC, showing a 71.1% m s tu yield of the title compound.
  • Example 12 6-Hydroxy-2- (4-hydroxyphenyl) -3- [4- (2-p ⁇ per ⁇ dmoethoxy) - benzoyl]benzo [b] thiophene Hydrochloride 1, 2-D ⁇ chloroethane Solvate A. Preparation of Ethyl 4- (2-P ⁇ per ⁇ dmoethoxy)benzoate A mixture of ethyl 4-hydroxybenzoate (8.31 g) , l-(2- chloroethyl)piperidine monohydrochloride (10.13 g) , potassium carbonate (16.59 g) , and methyl ethyl ketone (60 L) was heated to 80°C.
  • Example 12A A solution of the compound prepared as described in Example 12A (about 13.87 g) in methanol (30 mL) was treated with 5 N sodium hydroxide (15 mL) , and heated to 40°C. After 4 1/2 hours, water (40 L) was added. The resulting mixture was cooled to 5-10°C, and concentrated hydrochloric acid
  • Example 12B (30.01 g) and dimethylformamide (2 mL) in methylene chloride (500 mL) was treated with oxalyl chloride (10.5 mL) over a 30-35 minute period. After stirring for about 18 hours, the reaction was assayed for completion by HPLC analysis. Additional oxalyl chloride may be added to the reaction if the starting carboxylic acid is present. Upon completion, the reaction solution was evaporated to dryness in vacuo . The residue was dissolved in methylene chloride (200 mL) , and the resulting solution evaporated to dryness. This dissolution/evaporation procedure was repeated to give the title compound as a solid.
  • Example 8 or 9 (2.92 g), the compound prepared as described in Example 12C (3.45 g) , and 1,2-dichloroethane (52 L) was cooled to about 0°C. Boron trichloride gas was condensed into a cold graduated cylinder (2.8 mL) , and added to the cold mixture described above. After eight hours at 0°C, the reaction mixture was treated with additional boron trichloride (2.8 L) . The resulting solution was heated to 35°C. After 16 hours, the reaction was complete.

Abstract

The present invention is directed to novel vinyl sulfenic acid derivatives, and to a new process for the synthesis of novel vinyl sulfenic acid derivatives. These compounds are useful for the synthesis of benzo[b]thiophenes, in particular 2-aryl-benzo[b]thiophenes.

Description

Process for the Synthesis of Vinyl Sulfenic Acid Derivatives
The present invention is directed to a novel vinyl sulfenic acid derivatives and a new process for their synthesis. These compounds are useful for the synthesis of benzo [b] thiophenes, in particular 2-aryl-benzo [b] thiophenes .
Benzo fb] thiophenes have been prepared by a number of different synthetic routes. One of the most widely used methods is the oxidative cyclization of o-mercaptocinnamic acids. This route is limited to the preparation of benzo[b] - thiophene-2-carboxylates . 2-Phenylbenzo[b] thiophenes are prepared by acid-catalyzed cyclization of 2-phenylthioacetal- dehyde dialkyl acetals . Unsubstituted benzo[b]thiophenes are prepared by catalytic condensation of styrene and sulfur. 3- Substituted benzo [b] thiophenes are prepared by acid-catalyzed cyclization of arylthiomethyl ketones; however, this route is limited to the preparation of 3-alkylbenzo [b] thiophenes . See Campaigne, "Thiophenes and their Benzo Derivatives: (iii) Synthesis and Applications, " in Comprehensive Heterocyclic Chemistry (Katritzky and Rees, eds.), Volume IV, Part III, 863-934 (1984) . 3-Chloro-2-phenylbenzo [b] thiophene is prepared by the reaction of diphenylacetylene with sulfur dichloride. Barton and Zika, J. Org. Chem. , 35, 1729-1733 (1970) . Benzo[b] hiophenes have also been prepared by pyrolysis of styryl sulfoxides. However, low yields and extremely high temperatures make this route unsuitable for production-scale syntheses. See Ando, J. Chem. Soc , Chem. Co m. , 704-705 (1975) .
Sulfenic acids have been postulated as key intermediates in a variety of chemical reactions; however, very few examples exist of the isolation of these compounds. See Shelton and Davis, J. Am . Chem . Soc , 89(3), 718-719 (1968) and Davis et al . , J. Am . Chem. Soc , 100, 2844 (1978) . Sulfenic acids have been generated in si tu, and intramolecularly or intermolecularly cyclyzed with olefins and acetylenes. See Mazzanti et al . , J. Chem. Soc , Perkin Trans . I, 3299-3004 (1944) and Davis et al . , J. Org. Chem. , 45, 1650-1653 (1980) . A series of trimethylsilyl arenesulfenates have been prepared from the coresponding N- benzylidenearenesulfinamides; however, the yield of the trimethylsilyl ester was generally very low. Davis et al . , J. Org. Chem. , 45, 1650-1653 (1980) .
The preparation of 6-hydroxy-2- (4-hydroxyphenyl)benzo- [b]thiophenes was described in U.S. Patent Nos. 4,133,814 and 4,380,635. One process described in these patents is the acid-catalyzed intramolecular cyclization/rearrangement of a - (3-methoxyphenylthio) -4-methoxyacetophenone. The reaction of this starting compound in neat polyphosphoric acid at about 85°C to about 90°C gives an approximate 3:1 mixture of two regioisomeric products: 6-methoxy-2- (4- methoxyphenyl) -benzo [b] thiophene and 4-methoxy-2- (4- methoxyphenyl) enzo[b] -thiophene. These isomeric benzo [b] thiophenes co-precipitate from the reaction mixture, producing a mixture containing both compounds . To obtain a single regioisomer, the regioisomers must be separated, such as by chromatography or fractional crystallization. Therefore, there currently exists a need for an efficient and regiospecific synthesis of 2-arylbenzo [b] thiophenes from readily available starting materials.
The present invention is directed to novel vinyl sulfenic acid derivatives: novel sulfenate silylesters, sulfenamides, and disulfides, and to a process for the synthesis of vinyl sulfenic acid derivatives. Specifically, the present invention is directed to a compound of the formula
Figure imgf000004_0001
HI
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R4 is OSi(R)3, NR5R6, or SRg; each R is independently C1-C6 alkyl, aryl, or arylalkyl;
R5 and Rβ are independently hydrogen, -Cς, alkyl, arylalkyl, or aryl, or R5 and Rς, together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; and
R8 is C1-C6 alkyl, aryl, or arylalkyl. Thus, the present invention includes individually the E and Z isomers, or mixtures thereof, of the formula III compounds. These E and Z regioisomers are represented by the following structures:
Figure imgf000005_0001
Another aspect of the present invention is a process for preparing sulfenate silyl esters, sulfenamides, and disulfides. The present invention is directed to a process for preparing a compound of the formula
Figure imgf000005_0002
III
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R4 is OSi(R)3, NR5R6, or SRs; each R is independently C1-C6 alkyl, aryl, or arylalkyl; R5 and Rδ are independently hydrogen, C1-C6 alkyl, arylalkyl, or aryl; or R5 and Re together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; and
Rs is Ci-Cδ alkyl, aryl, or arylalkyl; which comprises :
(1) reacting a compound of the formula
O
Figure imgf000006_0001
wherein:
Ri and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (Cχ-Cιo alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000006_0002
wherein:
Rl and R2 are as defined above;
R7 is OSi (R) 3; and each R is independently C1-C6 alkyl, aryl, -or arylalkyl;
(2) optionally reacting said sulfenate silyl ester with an amine of the formula HNR5R6 wherein R5 and Re are as defined above; or (3) optionally reacting said sulfenate silyl ester with a mercaptan of the formula HSRβ, where Rg is as defined above, in the presence of an amine base.
One aspect of the present invention is a process for the synthesis of the sulfenate silyl esters, the formula IV compounds. In particular, the present invention relates to a process for preparing a compound of the formula
Figure imgf000007_0001
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R7 is OSi(R)3,- and each R is independently Ci-Cδ alkyl, aryl, or arylalkyl; which comprises reacting a compound of the formula
Figure imgf000007_0002
II
wherein:
Rl and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι~C o alkyl) group; with a silylating reagent .
Another aspect of the present invention is a process for the synthesis of the sulfenamides, the formula V compounds. In particular, the present invention relates to a process for preparing a compound of the formula
Figure imgf000008_0001
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino; and R5 and Rς, are independently hydrogen, Ci-Cβ alkyl, arylalkyl, or aryl, or R5 and Rβ together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethyli ine; comprising the steps of: (1) reacting a compound of the formula
Figure imgf000008_0002
wherein: Ri and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000009_0001
wherein:
Rl and R2 are as defined above;
R7 is OSi(R)3,- and each R is independently Ci-Cg alkyl, aryl, or arylalkyl; and
(2) reacting said sulfenate silyl ester with an amine of the formula HNRsRg wherein R5 and Rg are as defined above. Another aspect of the present invention is a process for the synthesis of the disulfides, the formula XIV compounds. In particular, the present invention relates to a process for preparing a compound of the formula
Figure imgf000009_0002
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino; and
Rs is Ci-Cg alkyl, aryl, or arylalkyl
comprising the steps of:
(1) reacting a compound of the formula
Figure imgf000010_0001
wherein:
Rl and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000010_0002
wherein:
Rl and R2 are as defined above; and
R7 is OSi(R)3,- and each R is independently Ci-C alkyl, aryl, or arylalkyl; and
(2) reacting said sulfenate silyl ester with a mercaptan of the formula HSRs, where Rg is as defined above, in the presence of an amine base.
Another aspect of the present invention is a process for the synthesis of a compound of the formula
Figure imgf000011_0001
XIII wherein:
Rg is hydrogen, halo, amino, or hydroxyl;
Rio is hydrogen, halo, amino, or hydroxyl;
Rll and R 2 are independently C1-C4 alkyl, or Rn and R12 together with the adjacent nitrogen atom form a heterocyclic ring selected from the group consisting of pyrrolidino, piperidino, hexamethyleneimino, and morpholino; and
HX is HCl or HBr; comprising the steps of:
(a) cyclizing in the presence of an acid catalyst a compound of the formula
Figure imgf000011_0002
III wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R4 is OSi(R)3, NR5Rg, or SRs; each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
R5 and Rg are independently hydrogen, Ci-Cg alkyl, or aryl, or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, and hexamethylimine; and
Rs is Ci-Cg alkyl, aryl, or arylalkyl; to prepare a benzothiophene compound of the formula
Figure imgf000012_0001
wherein R and R2 are as defined above;
(b) acylating said benzothiophene compound with an acylating agent of the formula
Figure imgf000012_0002
wherein:
R ll R12/ and HX are as defined previously; and R13 is chloro, bromo, or hydroxyl; in the presence of BX'3, wherein X' is chloro or bromo;
(c) when Ri and/or R2 is C1-C4 alkoxy or arylalkoxy, dealkylating one or more phenolic groups of the acylation product of step (b) by reacting with additional BX ' 3 , wherein X1 is as defined above; and
(d) isolating the formula XIII compound.
The term "acid catalyst" represents a Lewis acid or a Brønsted acid. Representative Lewis acids are zinc chloride, zinc iodide, aluminum chloride, and aluminum bromide.
Representative Brønsted acids include: inorganic acids, such as sulfuric and phosphoric acids; carboxylic acids, such as acetic and trifluorocetic acids; sulfonic acids, such as methanesulfonic, benzenesulfonic, 1-naphthalenesulfonic, 1- butanesulfonic, ethanesulfonic, 4-ethylbenzenesulfonic, 1- hexanesulfonic, 1, 5-naphthalenedisulfonic, 1-octanesulfonic, camphorsulfonic, trifluoromethanesulfonic, and p-toluene¬ sulfonic acids; and polymeric arylsulfonic acids, such as Nafion®, Amberlyst®, or Amberlite®. The preferred acids for use in catalyzing the processes of the present invention are sulfonic or polymeric sulfonic acids. More preferably, the acid catalysts are sulfonic acids, such as methanesulfonic acid, benezenesulfonic acid, camphorsulfonic acid, and p- toluenesulfonic acid. The most preferred acid catalyst is p- toluenesulfonic acid.
In the above formula, the term "C1-C4 alkoxy" represents groups such as methoxy, ethoxy, n-propoxy, isopropoxy, n- butoxy, fc-butoxy, and like groups. The term "halo" refers to fluoro, chloro, bromo, or iodo groups.
The term "Ci-Cg alkyl" represents a straight or branched alkyl chain having from one to six carbon atoms. Typical C ~ Cg alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-pentyl, isopentyl, n-hexyl, 2-methylpentyl, and the like. The term "C1-C4 alkyl" represents a straight or branched alkyl chain having from one to four carbon atoms, and includes methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, i-butyl, and t-butyl.
The term "aryl" represents groups such as phenyl and substituted phenyl. The term "substituted phenyl" represents a phenyl group substituted with one or more moieties chosen from the group consisting of halo, hydroxy, nitro, C1-C4 alkyl, C1-C4 alkoxy, trichloromethyl, and trifluoromethyl. Examples of a substituted phenyl group include 4-chloro- phenyl, 2, 6-dichlorophenyl, 2, 5-dichlorophenyl, 3, 4-dichloro- phenyl, 3-chlorophenyl, 3-bromophenyl, 4-bromophenyl, 3,4- dibromophenyl, 3-chloro-4-fluorophenyl, 2-fluorophenyl, 4- hydroxyphenyl, 3-hydroxyphenyl, 2,4-dihydroxyphenyl, 3-nitro- phenyl, 4-nitrophenyl, 2, 4-dinitrophenyl, 4-methylphenyl, 4- ethylphenyl, 4-methoxyphenyl, 4-propylphenyl, 4-n-butyl- phenyl, 4-t-butylphenyl, 3-fluoro-2-methylphenyl, 2,3- difluorophenyl, 2, 6-difluorophenyl, 2, 6-dimethylphenyl, 2- fluoro-5-methylphenyl, 2 , 4, 6-trifluorophenyl, 2-trifluoro- methylphenyl, 2-chloro-5-trifluoromethylphenyl, 3,5-bis- (trifluoromethyl)phenyl, 2-methoxyphenyl, 3-methoxyphenyl, 3, 5-dimethoxyphenyl, 4-hydroxy-3-methylphenyl, 3, 5-dimethyl, 4-hydroxyphenyl, 2-methyl-4-nitrophenyl, 4-methoxy-2-nitro- phenyl, and the like.
The term "arylalkyl" represents a C1-C4 alkyl group bearing one or more aryl groups. Representatives of this group include benzyl, o-nitrobenzyl, p-nitrobenzyl, p- halobenzyl (such as p-chlorobenzyl, p-bromobenzyl, p- iodobenzyl), 1-phenylethyl, 2-phenylethyl, 3-phenylpropyl, 4- phenylbutyl, 2-methyl-2-phenylpropyl, (2, 6-dichlorophenyl) - methyl, bis (2, 6-dichlorophenyl)methyl, (4-hydroxyphenyl) - methyl, (2, 4-dinitrophenyl)methyl, diphenylmethyl, triphenylmethyl, (p-methoxyphenyl) -diphenylmethyl, bis (p- methoxyphenyl)methyl, bis (2-nitrophenyl)methyl, and the like.
The term "arylalkoxy" represents a C1-C4 alkoxy group bearing one or more aryl groups. Representatives of this group include benzyloxy, o-nitrobenzyloxy, p-nitrobenzyloxy, p-halobenzyloxy (such as p-chlorobenzyloxy, p-bromobenzyloxy, p-iodobenzyloxy) , 1-phenylethoxy, 2-phenylethoxy, 3- phenylpropoxy, 4-phenylbutoxy, 2-methyl-2-phenylpropoxy, (2, 6-dichlorophenyl)methoxy, bis (2, 6-dichlorophenyl)methoxy, (4-hydroxyphenyl)methoxy, (2, 4-dinitrophenyl) ethoxy, diphenylmethoxy, triphenyl ethoxy, (p-methoxyphenyl) - diphenylmethoxy, bis (p-methoxyphenyl)methoxy, bis (2- nitrophenyl)methoxy, and the like.
The term "thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(C -Cιo alkyl) group" represents a group that is readily removed from the sulfoxide (SO) group under heating or by treatment with the acid catalyst. The thermally-labile or acid-labile C2-C10 alkyl groups are straight or branched alkyl chains having from two to ten carbon atoms and having at least one beta-hydrogen atom. Representative thermally-labile or acid-labile C2-C10 alkyl groups include ethyl, n-propyl, i-propyl, 1,1- dimethylpropoyl, n-butyl, sec-butyl, t-butyl, 1,1- di ethylbutyl, 2-methylbutyl, 3-methylbutyl, 1-methylbutyl, 1, 2-dimethylbutyl, 1, 3-dimethylbutyl, 2, 4-dimethylbutyl, 3,3- dimethylbutyl, n-pentyl, 1-methylpentyl, 2-methylpentyl, 3- methylpentyl, 4-methylpentyl, n-hexyl, and the like. The thermally-labile or acid-labile C4-C10 alkenyl groups are straight or branched alkenyl chains having from four to ten carbon atoms, at least one site of unsaturation, and either a beta-hydrogen or delta-hydrogen atom. Representative thermally-labile or acid-labile C4-C10 alkenyl groups include 2-butenyl, 3-butenyl, 2-methyl-2-butenyl, 3-methyl-2-butenyl, 2-methyl-3-butenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 2- methyl-2-pentenyl, 3-methyl-2-pentenyl, 4-methyl-2-pentenyl, 2-methyl-3-pentenyl, 3-methyl-3-pentenyl, 4-methyl-3- pentenyl, 2-methyl-4-pentenyl, 3-methyl-4-pentenyl, 4-methyl- 4-pentenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, and the like. The term thermally-labile or acid-labile aryl (Cι~ C10 alkyl) represents thermally-labile or acid-labile C2-C10 alkyl groups additionally containing one or more aryl groups and aryl-substituted methyl groups. Representative aryl (Ci- C10 alkyl) groups include benzyl, diphenylmethyl, triphenylmethyl, p-methoxybenzyl, 2-phenylethyl, 2-phenyl- propyl, 3-phenylpropyl, and the like.
One group of products of the present invention are sulfenate silyl esters. In particular, the formula III compounds, where R4 is OSi(R)3 and each R is independently Cι~ Cg alkyl, aryl, or arylalkyl, and the formula IV compounds are silyl esters of sulfenic acids. The preferred sulfenate silyl esters are abbreviated using nomenclature well recognized in the chemical arts, as shown in the following table.
Table 1 abbreviation silyl group
TMS trimethylsilyl
TES triethylsilyl TIPS triisopropylsilyl
DMIPS dimethylisopropylsilyl
DEIPS diethylisopropylsilyl TDS dimethylhexylsilyl TBDMS t-butyldimethylsilyl TBDPS t-butyldiphenylsilyl TBS tribenzylsilyl TPS triphenylsilyl DPMS diphenyl ethy1sily1 TBMPS t-butyldi (methoxyphenyl) silyl
The term "silylating reagent" represents a compound, or a combination of compounds, used to convert the intermediate sulfenic acid to a sulfenate silyl ester. Representative silylating reagents include bis (trialkylsilyl)ureas, such as 1,3-bis (trimethylsilyl)urea, 1, 3-bis (triethylsilyl)urea, 1,3- bis (dimethylisopropylsilyl)urea, 1,3-bis (triisopropyl- silyDurea, 1, 3-bis (diethylisopropylsilyl)urea, 1,3- bis (dimethylhexylsilyl)urea, and 1, 3-bis ( -butyldimethyl- silyl)urea; bis (triarylsilyl)ureas, such as 1,3-bis- (triphenylsilyl)urea; bis (diarylalkylsilyl)ureas, such 1,3- bis (diphenyl ethylsilyl)urea and 1, 3-bis ( t-butyldiphenyl- silyl) urea; and hexaalkyldisilylzanes, such as hexamethyldisilylzane; or combination of a hexaalkyl- disilylzane and a catalytic amount of a chlorotrialkylsilane, such as chlorotrimethylsilane.
The formula III compounds exist in two regioisomeric forms, E and Z. These E and Z regioisomers are represented by the following structures:
Figure imgf000016_0001
HIE The starting compounds for the processes of the present invention can be prepared by a number of routes. One method for preparing the formula II compounds is shown in Scheme 1.
Scheme 1
Figure imgf000017_0001
Generally, a formula VII compound is converted to a styryl sulfide by reaction with a mercaptan of the formula HSR3 in the presence of a Lewis acid. The formula VIII compound is then oxidized to a styryl sulfoxide, a compound of formula II.
More specifically, a formula VII compound, wherein Ri and R2 are as defined above, is treated with a Lewis acid, such as titanium(IV) chloride. This reaction is carried out in an anhydrous organic solvent, such as dry tetrahydrofuran, at a temperature of about 0°C to about 35°C. After about 15 minutes to about one hour, the reaction mixture is treated with an amine base and a mercaptan of the formula HSR3, where R3 is a thermally-labile or acid labile Cι-Cχo alkyl, C4-C10 alkenyl, or aryl(Cι-C o alkyl) group. Preferably, the mercaptan and amine base are added as a solution in the reaction solvent. A representative amine base is triethylamine. After the addition of the mercaptan and amine base, the reaction is generally heated to a temperature of about 35°C to about 65°C, preferably at about 50°C. The products of this reaction can be purified using techniques well known in the chemical arts, such as by crystallization or chromatography.
The formula VIII compound, where Ri, R2, and R3 are as defined above, is then oxidized to produce the formula II compounds. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m-chloroperoxybenzoic acid, and hydrogen peroxide. This oxidation reaction is typically run in an organic solvent, such as toluene, methylene chloride, chloroform, or carbontetrachloride. When a peracid is used as the oxidant, the reaction is generally carried out at a temperature of about -30°C to about 15°C, preferably at about -20°C. The products of the reaction are easily purified by recrystallization. When R3 is t-butyl, the crystalline product of this reaction sequence is the E regioisomer of formula II.
When R3 has a tertiary carbon adjacent to the sulfur atom, the Z regioisomer of the formula II compounds can be prepared selectively by a second route as shown in Scheme II.
Scheme 2
Figure imgf000018_0001
Generally, a benzyl alcohol, a formula IX compound, is reacted with a mercaptan of the formula R3SH to produce a benzyl sulfide, a formula X compound. This benzyl sulfide is reacted with a strong base, forming a benzylic anion, which is condensed with a benzaldehyde. This condensation product is reacted with an acid chloride and the resulting intermediate treated with a second strong base to produce a styryl sulfide, a formula VIIIZ compound. This styryl sulfide is then oxidized with an oxidizing agent to produce the formula HZ compound.
The first step in the synthesis of the Z styryl sulfoxide compounds is the conversion of a benzyl alcohol to a benzyl sulfide, formula X compound. The reaction of the formula IX compound, where R2 is as defined above, with a mercaptan of the formula R3SH, wherein R3 is a thermally- labile or- acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C 0 alkyl) group having a tertiary carbon atom adjacent to the sulfur atom, in the presence of a Lewis acid produces the benzyl sulfide, a formula X compound. Suitable Lewis acids for this transformation are zinc bromide, zinc chloride, zinc iodide, ferric chloride, titanium(IV) chloride, aluminum trichloride, and aluminum tribromide, preferably zinc iodide. The reaction is generally carried out in an organic solvent, such as 1, 2-dichloroethane or methylene chloride. When the reaction is carried out at room temperature, the reaction is complete after about 18 hours. The benzyl sulfide is reacted with a strong base to form a benzylic anion. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; and alkyllithiums, such as n- butyllithium, t-butyllithium, sec-butyllithium, and methyllithium. The preferred strong base for this reaction is n-butyllithium. The preferred solvent for this reaction is dry tetrahydrofuran. When n-butyllithium is used as the strong base, the reaction is carried out at a temperature of about -35°C to about -15°C.
The benzylic anion is condensed with a benzaldehyde to prepare an intermediate condensation product. The benzaldehyde has the general formula p-Ri (CgH4)CHO, wherein Ri is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino. Preferably, the benzylic anion is prepared and the condensation product is formed in si tu by adding the benzaldehyde to the cold solution of the benzylic anion. The condensation product is treated with an acid chloride to produce an intermediate compound. Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1- butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N, N-dimethylaminocarbonyl chloride; preferably a sulfonyl chloride. Preferably, methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product.
This intermediate compound is reacted with a second strong base to produce a styryl sulfide, a formula VIIIZ compound where Ri, R2, and R3 are as defined above. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred strong base for this reaction is potassium t-butoxide. Generally, this reaction is carried out at about 15°C to about room temperature, preferably at room temperature.
The styryl sulfide is oxidized to prepare the corresponding styryl sulfoxide. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m- chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide. Preferably the oxidizing agent is peracetic acid. This oxidation is typically carried out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform; preferably methylene chloride. This oxidation can be carried out at a temperature of about -40°C to about 0°C.
Alternatively, when R3 has a tertiary carbon adjacent to the sulfur atom, the benzyl sulfide intermediate (formula X compound) can be used to produce a mixture of E and Z isomers of the styryl sulfoxides, the formula II compounds. This synthesis is outlined is Scheme 3.
Scheme 3
Figure imgf000021_0001
The benzyl sulfide, prepared as described above, is oxidized to produce the corresponding benzyl sulfoxide. This benzyl sulfoxide is reacted with a strong base, and the resulting anion condensed with a benzaldehyde. The condensation product is reacted with an acid chloride and the resulting intermediate compound reacted with a second strong base to produce the styryl sulfoxide.
The benzyl sulfide, the formula X compound, wherein R2 is as defined above and R3 is a thermally-labile or acid- labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group having a tertiary carbon atom adjacent to the sulfur atom, is oxidized to produce the corresponding benzyl sulfoxide, formula XI compound. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and JΏ- chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide. Preferably the oxidizing agent is peracetic acid. This oxidation is typically carried out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform; preferably at a temperature of about -30°C to about 5°C. The benzyl sulfoxide, formula XI compound wherein R2 and R3 are as defined above, is reacted with a strong base to produce a benzylic anion. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec-butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred base for this transformation is n-butyllithium. This deprotonation reaction is carried out in a dry organic solvent, such as tetrahydrofuran or 1, 2-dimethoxyethane, at a temperature of about -25°C.
The benzylic anion is condensed, without isolation, with a benzaldehyde compound of the formula p-Ri (CgH4) CHO, wherein Ri is as defined above. Preferably, about one equivalent of the benzaldehyde is added to the cold solution prepared as described in the preceding paragraph. The resulting diastereomeric mixture of condensation products may be isolated, or preferably used in the next step without isolation.
The condensation product is reacted with an acid chloride to produce an intermediate compound. The condensation product is optionally treated with a base, such as n-butyllithium, and reacted with an acid chloride. Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1-butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N/ N-dimethylaminocarbonyl chloride; preferably a sulfonyl chloride. The acid chloride is added to the cold reaction mixture, then the resulting mixture is allowed to warm to room temperature. Preferably, methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product, which eliminates the need to add additional base.
The resulting intermediate compound is reacted with a second strong base to produce the E and Z styryl sulfoxides, formula II compounds where Ri, R2, and R3 are as defined above. Representative second strong bases for this elimination reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t- butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred base for this transformation is potassium t-butoxide. Preferably, a 20% excess, such as 1.2 equivalents, of the second base are added. Generally, this reaction is carried out at a temperature of about 15°C to about room temperature, preferably at room temperature.
The compounds of the present invention can be prepared from the formula II compounds. The novel sulfenate silyl esters are prepared from the styryl sulfoxides as shown in Scheme 4.
Scheme 4
Figure imgf000024_0001
Generally, the sulfenate silyl esters, where Ri, R2, and R7 are as defined above and R3 is a thermally-labile or acid labile C1-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group, are prepared by reacting a formula II compound with a silylating reagent. Suitable solvents for this reaction include benzene, toluene, xylene, and high-boiling, halogenated hydrocarbon solvents, having a boiling point greater than or equal to 80°C, such as 1, 1, 2-trichloroethane. Suitable silylating reagents include bis (trialkylsilyl)ureas, such as 1,3-bis (trimethylsilyl)urea, 1,3-bis (triethylsilyl) - urea, 1, 3-bis (dimethylisopropylsilyl) -urea, 1,3-bis (t-butyl- dimethylsilyl)urea; bis (triarylsilyl) -ureas, such as 1,3- bis (triphenylsilyl)urea; bis (dialkylaryl-silyl) ureas, such 1, 3-bis (diphenylmethylsilyl)urea; and hexaalkyldisilylzanes, such as hexamethyldisilylzane; or combination of a hexaalkyldisilylzane and a catalytic amount of a chlorotrialkylsilane, such as chlorotrimethylsilane. For best results, the final concentration, after complete addition, of the formula II compound is about 0.001 M to about 0.5 M. Preferably, a slight excess, such as ten percent, of the silylating reagent is used. This reaction can be carried out at about 80°C to about 140°C for about ten minutes to about two hours. Because the Z isomer reacts much faster than the corresponding E isomer, the use of only the Z isomer as the starting compound requires less time for complete transformation.
The novel sulfenamides are prepared from the sulfenate silyl esters as shown in Scheme 5. Scheme 5
Figure imgf000025_0001
Generally, the sulfenate silyl ester, where Ri, R2, and R7 are as defined above, is prepared from the styryl sulfoxide and, preferably without isolation or purification, reacted with an amine of the formula HNRsRg, wherein R5 and Rg as defined above. Typically, the sulfenate silyl ester is prepared,- the reaction solution cooled to about 0°C to about 50°C, and treated with the amine. Preferably, one to two equivalents of the amine are used. The conversion from the silyl ester to the sulfenamide is typically complete after about two hours to about eight hours. The resulting sulfenamides can be purified using standard organic techniques, such as silica-gel chromatography.
The novel disulfides are prepared from the sulfenate silyl esters as shown in Scheme 6.
Scheme 6
Figure imgf000025_0002
Generally, the sulfenate silyl ester, where Ri, R2, and R7 are as defined above, is prepared from the styryl sulfoxide and, preferably without isolation or purification, reacted with a mercaptan of the formula HSRs, where Rs is as defined above, in the presence of an amine base. Preferably, the sulfenate silyl ester is prepared, the reaction solution allowed to cool to room temperature, and the reaction mixture treated with a solution containing the mercaptan and amine base. The solvent for this mercaptan/amine solution is the same as the solvent for the sulfenate silyl ester-containing mixture. Representative amine bases include triethylamine, diisopropylethylamine, pyridine, morpholine, N-methyl ¬ morpholine, and collidine. The conversion of the sulfenate silyl ester is typically complete after about one to about eight hours. The resulting disulfides can be purified using standard organic techniques, such as silica-gel chroma¬ tography.
The intermediate sulfenate silyl esters, sulfenamides, and disulfides are useful for the synthesis of 2-arylbenzo- [b] thiophenes as shown in Scheme 7.
Scheme 7
Figure imgf000026_0001
Generally, the sulfenate silyl esters, sulfenamides, or disulfides are treated with acid catalysts to produce the formula I compounds. Suitable acid catalysts for this reaction include Lewis acids or Brønsted acids. Representative Lewis acids include zinc chloride, zinc iodide, aluminum chloride, and aluminum bromide.
Representative Brønsted acids include inorganic acids, such as sulfuric and phosphoric acids; carboxylic acids, such as acetic and trifluoroacetic acids; sulfonic acids, such as methanesulfonic, benzenesulfonic, 1-naphthalenesulfonic, 1- butanesulfonic, ethanesulfonic, 4-ethylbenzenesulfonic, 1- hexanesulfonic, 1, 5-naphthalenedisulfonic, 1-octanesulfonic, camphorsulfonic, trifluoromethanesulfonic, and p-toluene- sulfonic acids; and polymeric arylsulfonic acids, such as Nafion®, Amberlyst®, or Amberlite®. The more preferred acid catalysts are sulfonic acids, such as methanesulfonic acid, benezene-sulfonic acid, camphorsulfonic, and p- toluenesulfonic acid. The most preferred acid catalyst is p- toluenesulfonic acid. Typically, a solution of the acid catalyst in an organic solvent, such as toluene, benzene, xylene, or a high-boiling halogenated hydrocarbon solvent, such as 1, 1, 2-trichloroethane, is heated to about 80°C to about 140°C, and treated with a solution of the sulfenate silyl ester, sulfenamide, or disulfide in the same solvent. An excess amount of the acid catalyst is used, preferably three equivalents of the acid. For best results, the final concentration of the starting compound is about 0.01 M to about 0.2 M, preferably 0.05 M. Furthermore, best yields are obtained when the sulfenate silyl ester is slowly added to the heated acid solution over a period of about 15 minutes to about three hours. For best results, residual water is removed from the reaction solution by the use of a Dean-Stark trap or Soxhlet extractor.
The styryl sulfoxides are also useful for the preparation of a benzothiophene styryl sulfide as shown in Scheme 8.
Scheme 8
Figure imgf000027_0001
These benzothiophene styryl sulfides, where Ri and R2 are as defined above, are prepared from the styryl sulfoxides. Generally, a solution of the styryl sulfoxide, where Ri and R2 are as defined above and R3 is a thermally- labile or acid labile C1-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group, is added to a solution of an acid catalyst at a temperature of about 100°C to about 140°C, where the acid catalyst is defined above. The concentration of acid catalyst is dependent on the final concentration of the formula II compound and the rate of addition of the formula II compound. When the styryl sulfoxide is at a final concentration of about 0.2 M and is added over six hours, the acid concentration is about 0.002 M. When the styryl sulfoxide is at a final concentration of about 0.05 M and is added over 30 minutes, the acid concentration is about
0.025 M. Significant quantities of the formula VI compounds are present in the reaction after about one to two hours. Longer reaction times lead to the production of the formula I compounds . These formula VI compounds may be subsequently converted to the formula I compounds by treatment with additional acid, such as about 0.5 to about three equivalents, and heating to about 100°C to about 140°C. The concentration of the formula VI compound is in the range of about 0.01 M to about 0.5 M. Suitable solvents for both the formation of the formula VI compounds and their conversion to formula I compounds include toluene, xylene, and 1, 2-dichloroethane.
The formula I compounds are useful as intermediates in the synthesis of a series of 3-aroyl-2-arylbenzo [b] - thiophenes. U.S. Patent Nos. 4,133,814 and 4,418,068, which are incorporated herein by reference, described these 3- aroyl-2-arylbenzo [b] thiophenes, as well as methods for their preparation from the formula I compounds. An improved synthesis of a group of these 3-aroyl-2-arylbenzo[b] - thiophenes from the formula I compounds, wherein Ri and R2 are hydrogen, C1-C4 alkoxy, or arylalkoxy, is outlined in Scheme 9. Scheme 9
Figure imgf000029_0001
The Formula I compound, wherein Ri and R2 are hydrogen, C1-C4 alkoxy, or arylalkoxy, is acyiated with the formula XII compound, wherein R13 is chloro or hydroxy, in the presence of boron trichloride or boron tribromide; boron trichloride is preferred. The reaction can be carried out in a variety of organic solvents, such as chloroform, methylene chloride, 1, 2-dichloroethane, 1, 2, 3-dichloropropane, 1, 1, 2, 2-tetra- chloroethane, 1, 2-dichlorobenzene, chlorobenzene, and fluorobenzene. The preferred solvent for this synthesis is 1, 2-dichloroethane. The reaction is carried out at a temperature of about -10°C to about 25°C, preferably at 0°C. The reaction is best carried out at a concentration of the benzothiophene formula I compound of about 0.2 M to about 1.0 M. The acylation reaction is generally complete after about two hours to about eight hours.
When R and/or R2 is a C1-C4 alkoxy or arylalkoxy group, the acyiated benzothiophene preferably is converted to a formula XIII compound, wherein R5 and/or Rg are hydroxy, without isolation of the product from the acylation reaction. This conversion is performed by adding additional boron trichloride or boron tribromide and heating the reaction mixture. Preferably, two to five molar equivalents of boron trichloride are added to the reaction mixture, most preferably three molar equivalents . This reaction is carried out at a temperature of about 25°C to about 40°C, preferably at 35°C. The reaction is generally complete after about 4 hours to about 48 hours.
The acylation reaction or acylation/dealkylation reaction is quenched with an alcohol or a mixture of alcohols. Suitable alcohols for use in quenching the reaction include methanol, ethanol, and isopropanol.
Preferably, the acylation/dealkylation reaction mixture is ■ added to a 95:5 mixture of ethanol and methanol (3A ethanol) .
The 3A ethanol can be at room temperature or heated to reflux, preferably at reflux. When the quench is performed in this manner, the Formula XIII compound conveniently crystallizes from the resulting alcoholic mixture.
Generally, 1.25 mL to 3.75 mL of alcohol per millimole of the benzothiophene starting material are used. The following examples further illustrate the present invention. The examples are not intended to be limiting to the scope of the invention in any respect, and should not be so construed. All experiments were run under positive pressure of dry nitrogen. All solvents and reagents were used as obtained. The percentages are generally calculated on a weight (w/w) basis; except for high performance liquid chromatography (HPLC) solvents which are calculated on a volume (v/v) basis. Proton nuclear magnetic resonance (1H NMR) spectra and 13C nuclear magnetic resonance (13C NMR) spectra were obtained on a Bruker AC-300 FTNMR spectrometer at 300.135 MHz or at 75.469 MHz for proton and carbon, respectively, or a GE QE-300 spectrometer at 300.15 MHz. Silica-gel flash chromatography was performed as described by Still et al . using Silica Gel 60 (230-400 mesh, E. Merck) . Still et al . , J. Org. Chem. , 43, 2923 (1978) . Elemental analyses for carbon, hydrogen, and nitrogen were determined on a Control Equipment Corporation 440 Elemental Analyzer. Elemental analyses for sulfur were determined on a Brinkman Colorimetric Elemental Analyzer. Melting points were determined in open glass capillaries on a Mel-Temp II melting point apparatus or a Mettler FP62 Automatic instrument, and are uncorrected. Field desorption mass spectra (FDMS) were obtained using a Varian Instruments VG 70-SE or VG ZAB-3F mass spectrometer. High resolution free atom bombardment mass spectra (FABMS) were obtained using a Varian Instruments VG ZAB-2SE mass spectrometer. The in si tu yields of 6-methoxy-2- (4-methoxyphenyl) - benzo[b] thiophene were determined by high performance liquid chromatography (HPLC) in comparison to an authentic sample of this compound prepared by published synthetic routes. See U.S. Patent No. 4,133,814. Generally, samples of the reaction mixture was diluted with acetonitrile and the diluted sample assayed by HPLC using a Zorbax® RX-C8 column (4.6 mm x 25 cm) with UV detection (280 nm) . The following linear-gradient solvent system was used for this analysis:
Gradient Solvent System
Time (min) A (%) B (%)
0 50 50
2 50 50 20 20 80
35 20 80
37 50 50
45 50 50
A: 0.01 M aqueous sodium phosphate (pH 2.0)
B. acetonitrile
The amount (percentages) of 6-hydroxy-2- (4- hydroxyphenyl) -3- [4- (2-piperidinoethoxy)benzoyl]benzo- [b]thiophene hydrochloride in the crystalline material
(potency) was determined by the following method. A sample of the crystalline solid (5 mg) was weighed into a 100-mL volu etric flask, and dissolved in a 70/30 (v/v) mixture of 75 mM potassium phosphate buffer (pH 2.0) and acetonitrile. An aliquot of this solution (10 m L) was assayed by high performance liquid chromatography, using a Zorbax® Rx-C8 column (25 cm x 4.6 mm ID, 5 m particle) and UV detection (280 nm) . The following gradient solvent system was used:
Gradient Solvent System (Potency)
T Tiimmee ( (mmiinn)) A A ((%' ) B (%)
0 70 30
12 70 30
14 25 75
16 70 30 2 255 7 700 30
A: 75 mM KH2P0 buffer (pH 2.0) B: acetonitrile
The percentage of 6-hydroxy-2- (4-hydroxyphenyl) -3- [4- (2- piperidinoethoxy)benzoyl]benzo[b] thiophene hydrochloride in the sample was calculated using the peak area, slope (m) , and intercept (b) of the calibration curve with the following equation:
% potency = peak area - b sample volume (mL; m sample weight (mg)
The amount (percentage) of solvent, such as 1,2- dichloroethane, present in the crystalline material was determined by gas chromatography. A sample of the crystalline solid (50 mg) was weighed into a 10-mL volumetric flask, and dissolved in a solution of 2-butanol (0.025 mg/mL) in dimethylsulfoxide. A sample of this solution was analyzed on a gas chromatograph using a DB Wax column (30 m x 0.53 mm ID, 1 m particle) , with a column flow of 10 mL/min and flame ionization detection. The column temperature was heated from 35°C to 230°C over a 12 minute period. The amount of solvent was determined by comparison to the internal standard (2- butanol) .
Example 1
E-t-Butyl 4,4 ' -Dimethoxystilbenyl Sulfoxide
A. Preparation of E-t-Butyl 4, 4 ' -Dimethoxystilbenyl Sulfide
A solution of desoxyanisoin (12.82 g) in tetrahydrofuran (100 mL) was treated with titanium (IV) chloride (10.43 g) . During the dropwise addition of titanium (IV) chloride, the reaction mixture was cooled to maintain the temperature below 35°C. Upon complete addition, the resulting mixture was stirred at 30°C. After an additional 30 minutes, this mixture was treated with a solution of 2-methyl-2-propane- thiol (6.76 mL) and triethylamine (16.70 mL) in tetrahydro- furan (15 mL) . The resulting mixture was stirred at 50°C.
After two hours, the mixture was added to ten percent sodium carbonate (500 mL) . The resulting mixture was extracted with methylene chloride. The combined methylene chloride extracts were dried over magnesium sulfate, filtered, and concentrated in vacuo to give 17.2 g of an oil, which crystallized upon cooling to room temperature. This crystalline material was recrystallized from hot ethanol to give 12.3 g of the title compound. Melting point 71-73°C.
Analysis calculated for C2oH24θ2S: C, 73.13; H, 7.36; S, 9.76. Found: C, 73.37; H, 7.51; S, 9.87.
B. Preparation of E-t-Butyl 4,4 ' -Dimethoxystilbenyl
Sulfoxide
The crystalline compound prepared as described in Example IA was dissolved in toluene (150 mL) , and the resulting solution cooled to about -20°C. The cold solution was treated with peracetic acid (32% w/w in dilute acetic acid, 1.24 g) over ten minutes. The resulting mixture was extracted with saturated sodium sulfite and brine. The organic phase was concentrated in vacuo . The residue was recrystallized from ethyl acetate/heptane to give 14.11 g of the title compound. Melting point 104°C (dec) .
Analysis calculated for C20H24O3S: C, 69.74; H, 7.02; S, 9.31. Found: C, 69.47; H, 7.04; S, 9.54.
Example 2
Z-t-Butyl 4,4 ' -Dimethoxystilbenyl Sulfoxide A. Preparation of t-Butyl 4-Methoxybenzyl Sulfide
A mixture of 4-methoxybenzyl alcohol (10.13 g) and zinc iodide (11.7 g) in 1, 2-dichloroethane (120 mL) was treated with 2-methyl-2-propanethiol (9.92 L) in one portion. The resulting mixture was stirred at room temperature. After about 18 hours, the reaction was diluted with water (100 L) and methylene chloride (100 mL) . The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated in vacuo to give 14.4 g of an oil.
!H NMR (CDCI3) : d 7.28 (d, 2H) , 6.85 (d, 2H) , 3.77 (s, 3H) , 3.73 (s, 2H) , 1.36 (s, 9H) .
13C NMR (CDCI3) : d 130, 114, 56, 35, 32. Analysis calculated for C 28OS: C, 68.52; H, 8.63. Found: C, 68.80 ; H, 8.67.
B. Preparation of Z-t-Butyl 4, 4 'Dimethoxystilbenyl Sulfide
A solution of the compound prepared as described in
Example 2A (2.51 g) in tetrahydrofuran (50 mL) was cooled to about -20°C. This cold solution was treated with a solution of n-butyllithium in hexane (1.6 M, 7.47 L) over ten minutes. The resulting solution was allowed to warm to about 0°C over 35 minutes. This cold solution was treated with p- anisaldehyde (1.46 mL) . After an additional 15 minutes, the reaction solution was treated with methanesulfonyl chloride (0.95 mL) . The resulting reaction was allowed to warm to room temperature. After an additional 45 minutes, the reaction mixture was treated with a solution of potassium t- butoxide in tetrahydrofuran (1.0 M, 12.0 L) . After an additional 45 minutes, the reaction was quenched by the addition of IN hydrochloric acid (12.0 mL) . The organic phase was separated, dried over magnesium sulfate, filtered, and concentrated to an oil (4.4 g) .
XH NMR (CDC13) : 7.95 (d, H) , 7.05 (s, H) , 6.9 (d, H) , 6.8 (dd, 2H) , 3.75 (s, 3H) , 0.95 (s, 9H) .
13C NMR (CDCI3) : d 153, 139, 137, 114, 56, 32.
C. Preparation of Z-t-Butyl 4,4 ' -Dimethoxystilbenyl
Sulfoxide
The compound from Example 2B was converted to the title compound using the procedure substantially as described in Example IB.
!H NMR (CDCI3) : d 7.61 (d, H) , 7.56 (d, H) , 7.1 (s, H) , 6.9 (dd, 2H) , 3.83 (s, 3H) , 1.05 (s, 9H) .
13C NMR (CDCI3) : d 142, 132.5, 131, 118, 117, 56, 24. Analysis calculated for C20H24O3S: C, 69.74; H, 7.02. Found: C, 69.98; H, 6.94.
Example 3
E and Z-t-Butyl 4, 4 ' -Dimethoxystilbenyl Sulfoxide A. Preparation of t-Butyl 4-Methoxybenzyl Sulfide
A mixture of 4-methoxybenzyl alcohol (10.13 g) and zinc iodide (11.7 g) in 1, 2-dichloroethane (120 L) was treated with 2-methyl-2-propanethiol (9.92 mL) in one portion. The resulting mixture was stirred at room temperature. After about 18 hours, the reaction was diluted with water (100 L) and methylene chloride (100 mL) . The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated in vacuo to give 14.4 g of an oil.
!H NMR (CDCI3) : d 7.28 (d, 2H) , 6.85 (d, 2H) , 3.77 ( s , 3H ) , 3 . 73 ( s , 2H ) , 1 . 3 6 ( s , 9H ) .
13C NMR (CDC13 ) : d 130 , 114 , 56 , 35 , 32 .
Analysis calculated for Cι28OS: C, 68.52; H, 8.63. Found: C, 68.80; H, 8.67.
B. Preparation of t-Butyl 4-Methoxybenzyl Sulfoxide
A solution of the compound prepared as described in Example 3A (14.4 g) in 1, 2-dichloroethane (50 mL) was cooled to about 5°C and the cold solution treated with peracetic acid (32% w/w in dilute acetic acid, 14.2 mL) over 30 minutes. Upon complete addition of the peracetic acid, the reaction was treated with brine and sodium bicarbonate. The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated to a yellow precipitate. This residue was treated with hexane (100 mL) and the resulting mixture stirred at room temperature. After about 18 hours, the mixture was filtered and the solids washed with hexane (100 mL) . The solid material was dried in vacuo to give 14.07 g of the title compound. Melting point 124-126°C. XH NMR (CDCI3) : d 7.26 (d, 2H) , 6.89 (d, 2H) , 3.79 (d, H) , 3.78 (s, 3H) , 3.58 (d, H) , 1.3 (s, 9H) . 13C NMR (CDCI3) : d 132, 114, 56, 53, 23. Analysis calculated for Ci2802S: C, 63.68; H, 8.02. Found: C, 63.72; H, 7.93.
C. Preparation of E and Z-t-Butyl 4, 4 ' -Dimethoxystilbenyl
Sulfoxide
A solution of the compound prepared as described in
Example 3B (10.0 g) in tetrahydrofuran (140 mL) was cooled to about -30° to -25°C (dry ice/acetone bath) . This cold solution was treated with n-butyllithium in cyclohexane (1.6 M, 27.65 mL) over 25 minutes. After stirring for 35 minutes, the reaction mixture was treated with p-anisaldehyde (5.4 mL) . The dry ice/acetone bath was removed and the reaction allowed to warm to about 20°C. This mixture was treated with methanesulfonyl chloride (3.5 mL) . The temperature of the reaction rose from about 20° to about 35°C upon addition of the methanesulfonyl chloride. The mixture was cooled to about 25°C, then treated with potassium t- butoxide in tetrahydrofuran (1 M, 50.9 mL) . After stirring for an additional 35 minutes, the reaction was treated with IN hydrochloric acid (51.0 mL) . The phases were separated, and the organic layer dried over magnesium sulfate, filtered, and concentrated to an oil (16.67 g) . This material was used in the next step without further purification. The carbon and proton NMR spectra were similar to that obtained for the compound prepared as described in Examples 1 and 2.
Example 4 E and Z-Trimethylsilyl 4, 4 ' -Dimethoxystilbenyl Sulfenate
A mixture of the compound prepared as described in Example 1 (350 mg) and 1, 3-bis (trimethylsilyl)urea (116 mg) in toluene (11 L) was heated to reflux. After 1.5 hours, the reaction mixture was allowed to cool to room temperature, filtered, and the filtrate concentrated in vacuo to give a 7:1 mixture of E/Z regioisomers of the title compounds.
FDMS: m/z = 361 (M+l) .
E Isomer: iH NMR (dg-benzene) : d 7.39 (d, 2H) , 7.10 (d, 2H) , 6.68
(d, 2H) , 6.68 (s, IH) , 6.57 (d, 2H) , 3.18 (s, 3H) , 3.17
(s, 3H) , 0.23 (s, 9H) .
Z Isomer: iH NMR (d6-benzene) : d 7.71 (d, 2H) , 7.31 (d, 2H) , 6.85
(d, 2H) , 6.79 (d, 2H) , 6.60 (s, IH) , 3.28 (s, 3H) , 3.26
(s, 3H) , -0.05 (s, 9H) .
Example 5
E and Z-Trimethylsilyl 4,4 ' -Dimethoxystilbenyl Sulfenate A mixture of the compound prepared as described in Example 2 and 1, 3-bis (trimethylsilyl)urea in toluene was heated to reflux. After ten minutes, the mixture was allowed to cool, filtered, and concentrated in vacuo to give a 7:1 mixture of E/Z regioisomers of the title compounds.
E Isomer:
Cl3 NMR (d6-benzene, 8°C) : d 160.49, 158.53, 141.54, 131.97, 129.91, 129.65, 125.59, 116.41, 114.68, 113.98, 54.56, -0.09.
Example 6
E and Z-N, N-Dimethyl-4 , 4 ' -Dimethoxystilbenyl Sulfenamide
A mixture of the compound prepared as described in
Example 1 (1.74 g) and 1, 3-bis (trimethylsilyl)urea (578 mg) in toluene (54 mL) was heated to reflux. After 1.5 hours, the reaction was allowed to cool to room temperature, and treated with dimethylamine (2.80 mL, 2.0 M in tetrahydro- furan) . After an additional two hours, the reaction solution was evaporated to dryness to give a 7:1 mixture of E/Z regio¬ isomers of the title compounds. This residual mixture was purified using silica-gel flash chromatography, eluting with a mixture of ethyl acetate/hexane (9:1), to give 1.06 g of the title compounds as an 8:1 mixture of E/Z regioisomers.
FDMS: m/z = 315 (M+) .
Analysis calculated for C18H21ΝO2S: C, 68.54; H, 6.71; N, 4.44. Found: C, 68.40; H, 6.69; N, 4.22.
E Isomer:
XH NMR (d6-benzene) : d 7.44 (d, 2H) , 7.11 (d, 2H) , 6.99 (s, IH) , 6.71 (d, 2H) , 6.56 (d, 2H) , 3.22 (s, 3H) , 3.18 (s, 3H) , 2.66 (s, 6H) . 13C NMR (dg-benzene) : d 160.00, 158.83, 139,70, 131.48, 130.78, 130.51, 129.94, 123.77, 114.55, 113.97, 54.63, 54.61, 48.17.
Z Isomer: iH NMR (dg-benzene) : d 7.61 (d, 4H) , 6.82 (d, 2H) , 6.80 (d, 2H) , 6.80 (s, IH) , 3.32 (s, 3H) , 3.27 (s, 3H) , 2.41 (s, 6H) .
13C NMR (dg-benzene) : d 159.89, 159.30, 139.76, 136.46,
131.94, 131.82, 130.22, 130.20, 113.83, 113.76, 54.81, 54.73,
48.61
Example 7
E and Z-N-Benzyl-4,4 ' -Dimethoxystilbenyl Sulfenamide
A mixture of the compound prepared as described in Example 1 (1.74 g) and 1,3-bis (trimethylsilyl)urea (578 mg) in toluene (54 mL) was heated to reflux. After 1.5 hours, the reaction was allowed to cool to room temperature, and treated with benzylamine (0.575 mL) . After an additional two hours, the reaction solution was evaporated to dryness to give a 7:1 mixture E/Z of regioisomers of the title compounds. This residual mixture was purified using silica- gel flash chromatography, eluting with a mixture of ethyl acetate/hexane (7:1), to give 1.06 g of the title compounds as a 6:1 mixture of E/Z regioisomers.
Analysis calculated for C23H23ΝO2S: C, 73.18; H, 6.14; N, 3.71. Found: C, 73.16; H, 6.18; N, 3.50
E Isomer:
XH NMR (dg-benzene) : d 7.41 (d, 2H) , 7.13 (d, 2H) , 7.12-7.03
(m, 5H) , 6.87 (s, IH) , 6.71 (d, 2H) , 6.59 (d, 2H) , 3.89
(d, 2H) , 3.23 (s, 3H) , 3.20 (s, 3H) , 2.71 (t, IH) . 13C NMR (dg-benzene) : d 159.98, 158.91, 140.53, 139.77, 131.45, 130.50, 129.87, 128.77, 128.66, 128.59, 127.53, 123.10, 114.74, 114.02, 56.14, 54.69, 54.64.
Z Isomer: iH NMR (dg-benzene) : d 7.59 (d, 2H) , 7.53 (d, 2H) , 7.01-6.91
( , 5H) , 6.83 (s, IH) , 6.79 (d, 2H) , 6.77 (d, 2H) , 3.62
(d, 2H) , 3.31 (s, 3H) , 3.27 (s, 3H) , 2.82 (t, IH) .
13C NMR (dg-benzene) : d 160.05, 159.14, 140.48, 139.27, 132.50, 131.32, 130.04, 129.86, 128.87, 128.58, 128.46, 127.49, 114.48, 114.00, 56.23, 54.90, 54.78.
Example 8 6-Methoxy-2- (4-methoxyphenyl)benzo [b] thiophene
A solution of p-toluenesulfonic acid monohydrate (552 mg) was added to toluene (15 mL) and heated to reflux, and water was removed by allowing it to collect in a Dean- Stark trap. This refluxing solution was treated with a solution of the regioisomeric compounds prepared as described in Example 4 (523 mg) in toluene (15 mL) over 15 minutes. Upon complete addition, an aliquot was removed for HPLC analysis. This analysis showed a 46.6% in si tu yield of the title compound.
Example 9
6-Methoxy-2- (4-methoxyphenyl)benzo [b] thiophene
A solution of p-toluenesulfonic acid monohydrate
(1.26 g) in toluene (20 L) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. A solution of the regioisomeric compounds prepared as described in Example 6 (650 mg) in toluene (9 mL) was added to the refluxing acid solution over 1.8 hours. The reaction solution was treated with ethanol (10 mL) , and the resulting mixture allowed to cool to room temperature. The resulting slurry was stirred at room temperature. After about 18 hours, the mixture was cooled to about 5°C, and filtered to give 290 mg of the title compound. Melting point 199-200°C.
iH NMR (dg-DMSO) : d 7.67 (d, IH) , 7.64 (d, 2H) , 7.61 (s, IH) , 7.52 (d, IH) , 7.01 (d, 2H) , 6.98 (dd, IH) , 3.81 (s, 3H) , 3.79 (s, 3H) .
Analysis calculated for Cι6Hi4θ2S : C , 71 . 09 ; H, 5 .22 . Found : C , 71 . 09 ; H, 5 . 27 .
Example 10
E and Z-3-(4, 4 ' -Dimethoxystilbenyl sulfide) -6-methoxy-2- (4- methoxyphenyl)benzo[b]thiophene
A solution of p-toluenesulfonic acid monohydrate (552 mg) in toluene (111 mL) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. A solution of the compound prepared as described in Example 1 (10 g) in toluene (34 mL) was added to the refluxing acid solution over six hours. After an additional two hours, the mixture was cooled to 0°C. After an additional 18 hours, the cold mixture was filtered to remove the precipitated 6- methoxy-2- (4-methoxyphenyl)benzo[b]thiophene. The filtrate was extracted with an equal volume of saturated sodium bicarbonate solution. The organic phase was separated, dried over sodium sulfate, filtered, and concentrated in vacuo to give 4.8 g of an orange oil. This oil was divided into two parts and each purified using silica-gel flash chromato¬ graphy, eluting with hexane/ethyl acetate (3.5:1) . The fractions contained in the desired regioisomers were concentrated to an oil . This oil was treated with diethyl ether to selectively crystallize the early-eluting regio- isomer (155 mg) . The mother liquor from these crystal¬ lizations were enriched in the late-eluting regioisomer. Early-eluting Isomer iH NMR (CDCI3) : d 7.71 (d, 2H) , 7.64 (d, IH) , 7.46 (d, 2H) ,
7.06 (d, IH) , 6.94 (d, 2H) , 6.92 (d, 2H) , 6.90 (m, IH) , 6.85
(d, 2H) , 6.59 (s, IH) , 6.45 (d, 2H) , 3.86 (s, 3H) , 3.85 (s, 3H) , 3.80 (s, 3H) , 3.66 (s, 3H) .
High resolution FABMS calculated for C32H29O4S2 (MH+) 541.1507. Found: 541.1491.
Late-elutmg Isomer iH NMR (CDCI3) : d 7.90 (d, IH) , 7.62 (d, 2H) , 7.24 (IH), 7.08 (d, 2H) , 7.02 (dd, IH) , 6.96 (d, 2H) , 6.74-6.71 (d, 2H) , 6.70 (d, 2H) , 6.55 (d, 2H) , 6.21 (s, IH) , 3.86 (s, 3H) , 3.85 (s, 3H) , 3.76 (s, 3H) , 3.67 (s, 3H) .
FDMS: m/z = 540 (m+!
Example 11
6-Methoxy-2- ( -methoxyphenyl)benzo [b] thiophene
The compound (early-elutmg isomer) prepared as described in Example 10 (125 mg) was added to a refluxing solution of p-toluenesulfonic acid monohydrate (4.2 mg) m toluene (1.5 mL) . After six hours, methanesulfonic acid (7.5 mL) was added to the reaction mixture. After an additional hour, the reaction mixture was allowed to cool to room temperature. The resulting mixture was diluted with acetonitrile and assayed by HPLC, showing a 71.1% m s tu yield of the title compound.
Example 12 6-Hydroxy-2- (4-hydroxyphenyl) -3- [4- (2-pιperιdmoethoxy) - benzoyl]benzo [b] thiophene Hydrochloride 1, 2-Dιchloroethane Solvate A. Preparation of Ethyl 4- (2-Pιperιdmoethoxy)benzoate A mixture of ethyl 4-hydroxybenzoate (8.31 g) , l-(2- chloroethyl)piperidine monohydrochloride (10.13 g) , potassium carbonate (16.59 g) , and methyl ethyl ketone (60 L) was heated to 80°C. After one hour, the mixture was cooled to about 55°C and treated with additional 1- (2-chloroethyl) - piperidine monohydrochloride (0.92 g) . The resulting mixture was heated to 80°C. The reaction was monitored by thin layer chromatography (TLC) , using silica-gel plates and ethyl acetate/acetonitrile/triethylamine (10:6:1, v/v) . Additional portions of 1- (2-chloroethyl)piperidine hydrochloride are added until the starting 4-hydroxybenzoate ester is consumed. Upon complete reaction, the reaction mixture was treated with water (60 mL) and allowed to cool to room temperature. The aqueous 1-ayer was discarded and the organic layer concentrated in vacuo at 40°C and 40 mm Hg. The resulting oil was used in the next step without further purification.
B. Preparation of 4- (2-Piperidinoethoxy)benzoic
Acid Hydrochloride
A solution of the compound prepared as described in Example 12A (about 13.87 g) in methanol (30 mL) was treated with 5 N sodium hydroxide (15 mL) , and heated to 40°C. After 4 1/2 hours, water (40 L) was added. The resulting mixture was cooled to 5-10°C, and concentrated hydrochloric acid
(18 mL) was added slowly. The title compound crystallized during acidification. This crystalline product was collected by filtration, and dried in vacuo at 40-50°C to give 83% yield of the title compound. Melting point 270-271°C.
C. Preparation of 4- (2-Piperidinoethoxy)benzoyl
Chloride Hydrochloride
A solution of the compound prepared as described in
Example 12B (30.01 g) and dimethylformamide (2 mL) in methylene chloride (500 mL) was treated with oxalyl chloride (10.5 mL) over a 30-35 minute period. After stirring for about 18 hours, the reaction was assayed for completion by HPLC analysis. Additional oxalyl chloride may be added to the reaction if the starting carboxylic acid is present. Upon completion, the reaction solution was evaporated to dryness in vacuo . The residue was dissolved in methylene chloride (200 mL) , and the resulting solution evaporated to dryness. This dissolution/evaporation procedure was repeated to give the title compound as a solid.
D. Preparation of 6-Hydroxy-2- (4-hydroxyphenyl) -3- [4- (2- piperidinoethoxy)benzoyl]benzo[b] thiophene Hydrochloride
1, 2-Dichloroethane Solvate
A mixture of the compound prepared as described in
Example 8 or 9 (2.92 g), the compound prepared as described in Example 12C (3.45 g) , and 1,2-dichloroethane (52 L) was cooled to about 0°C. Boron trichloride gas was condensed into a cold graduated cylinder (2.8 mL) , and added to the cold mixture described above. After eight hours at 0°C, the reaction mixture was treated with additional boron trichloride (2.8 L) . The resulting solution was heated to 35°C. After 16 hours, the reaction was complete.
Methanol (30 mL) was treated with the reaction mixture from above over a 20-minute period, causing the methanol to reflux. The resulting slurry was stirred at 25°C. After one hour, the crystalline product was filtered, washed with cold methanol (8 mL) , and dried at 40°C in vacuo to give 5.14 g of the title compound. Melting point 225°C. Potency (HPLC) : 86.8%
1,2-Dichloroethane (gas chromatography) : 6.5%
Example 13
6-Methoxy-2- (4-methoxyphenyl)benzo [b]thiophene
A solution of p-toluenesulfonic acid monohydrate (1.05 g) in toluene (20 mL) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. A solution of the regioisomeric compounds prepared as described in Example 7 (780 mg) in toluene (9 mL) was added to the refluxing acid solution over ten minutes. After one hour, the reaction solution was treated with ethanol (10 mL) , and the resulting mixture allowed to cool to room temperature. The resulting slurry was stirred at room temperature. After about 18 hours, the mixture was filtered to give 149 mg of the title compound. Melting point 199- 200°C.
Analysis calculated for C16H14O2S: C, 71.09; H, 5.22. Found: C, 71.05; H, 5.22.
Example 14 E and Z-4,4 ' -Dimethoxystilbenyl Ethyl Disulfide
A solution of the regioisomeric compounds prepared as described in Example 4 (1.83 g) in toluene (54 mL) was treated with ethanethiol (0.433 mL) and triethylamine (0.715 mL) . After about 2.5 hours at room temperature, the reaction solution was evaporated to dryness in vacuo to give a mixture of regioisomers. The residue was purified using silica-gel chromatography, eluting with ethyl acetate/hexane (9:1), to give 1.14 g of a 5.7:1 mixture of E/Z regioisomers of the title compounds.
Analysis calculated for C18H20O2S2: C, 65.03; H, 6.06. Found: C, 65.32; H, 6.28.
E Isomer:
iH NMR (d6-benzene) : d 7.35 (d, 2H) , 7.19 (s, IH) , 7.05 (d, 2H) , 6.72 (d, 2H) , 6.54 (d, 2H) , 3.21 (s, 3H) , 3.14 (s, 3H) , 2.39 (q, 2H) , 1.09 (t, 3H) . 13C NMR (d6-benzene) : d 160.09, 159.16, 135.95, 131.71, 130.61, 130.16, 129.48, 126.88, 114.54, 113.99, 54.64, 54.61, 32.29, 14.33.
Z Isomer:
iH NMR (d6-benzene) : d 7.67 (d, 2H) , 7.58 (d, 2H) , 6.90 (s, IH) , 6.83 (d, 2H) , 6.80 (d, 2H) , 3.30 (s, 3H) , 3.28 (s, 3H) , 2.26 (q, 2H) , 0.94 (t, 3H) .
i3C NMR (dg-benzene) : d 159.98, 159.53, 137.58, 134.03, 132.79, 131.69, 130.45, 113.91, 113.87, 54.79, 54.73, 32.61, 14.25.
Example 15
6-Methoxy-2- (4-methoxyphenyl) enzo [b] thiophene
A solution of p-toluenesulfonic acid monohydrate (1.21 g) in toluene (20 mL) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. A solution of the regioisomeric compounds prepared as described in Example 14 (685 mg, 5.7:1 regioisomeric mixture) in toluene (9 mL) was added to the refluxing acid solution over 1.8 hours. An aliquot of the mixture was analyzed by HPLC, showing a 23.2% in si tu yield of the title compound.

Claims

We claim :
1. A compound of the formula
Figure imgf000047_0001
III
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; 2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R4 is OSi(R)3, NR5Rg, or SRs; each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
R5 and Rg are independently hydrogen, Ci-Cg alkyl, arylalkyl, or aryl; or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, orpholine, or hexamethylimine; and
Rs is Cι~Cg alkyl, aryl, or arylalkyl.
2. The compound of Claim 1 wherein:
Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
3. The compound of Claim 2 wherein: R4 is OSi (R)3; and each R is independently Ci-Cg alkyl, aryl, or arylalkyl.
4. The compound of Claim 3 wherein R4 is OTMS, OTES, OTIPS, ODMIPS, ODEIPS, OTDS, OTBDMS, OTBDPS, OTBS, OTPS, ODPMS, or OTBMPS.
5. The compound of Claim 4 wherein R4 is OTMS, OTES,
ODMIPS, ODEIPS, OTBDMS, OTBS, or OTPS.
6. The compound of Claim 5 wherein R and R2 are C1-C4 alkoxy.
7. The compound of Claim 6 wherein Ri and R2 are methoxy, and R4 is OTMS.
8. The compound of Claim 2 wherein: R4 is NRsRg; and
R5 and Rg are independently hydrogen, Cι~Cg alkyl, arylalkyl, or aryl; or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, and hexamethylimine.
9. The compound of Claim 8 wherein R5 and Rg are independently hydrogen, Ci-Cg alkyl, or arylalkyl; or R5 and Rg together with the nitrogen atom form a ring selected from piperidine and pyrrolidine.
10. The compound of Claim 9 wherein Ri and R2 are C1-C4 alkoxy.
11. The compound of Claim 10 wherein Ri and R2 are methoxy, and R5 and Rg are methyl.
12. The compound of Claim 10 wherein Ri and R2 are methoxy, R5 is hydrogen, and Rg is benzyl.
13. The compound of Claim 2 wherein: R4 is SRs; and Rs is Ci-Cg alkyl, aryl, or arylalkyl.
14. The compound of Claim 13 wherein Rs is Cι~Cg alkyl or arylalkyl.
15. The compound of Claim 14 wherein Rs is Ci-Cg alkyl.
16. The compound of Claim 15 wherein Ri and R2 are C1-C4 alkoxy.
17. The compound of Claim 16 wherein Ri and R2 are methoxy, and Rs is ethyl.
18. A process for preparing a compound of the formula
Figure imgf000049_0001
III
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R4 is OSi(R)3, NRsRg, or SRs; each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
R5 and Re are independently hydrogen, Ci-Cg alkyl, arylalkyl, or aryl; or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; and s is Ci-Cg alkyl, aryl, or arylalkyl; which comprises:
(1) reacting a compound of the formula
0
Figure imgf000049_0002
II
wherein:
Rl and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι~Cιo alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000050_0001
wherein:
Rl and R2 are as defined above;
R7 is OSi (R)3; and each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
(2) optionally reacting said sulfenate silyl ester with an amine of the formula HNRsRg wherein R5 and Rg are as defined above; or
(3) optionally reacting said sulfenate silyl ester with a mercaptan of the formula HSRs, wherein Rs is as defined above, in the presence of an amine base.
19. The process of Claim 1 for preparing a compound of the formula
Figure imgf000050_0002
wherein: R is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; 2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R7 is OSi(R)3,- and each R is independently Ci-C alkyl, aryl, or arylalkyl; which comprises reacting a compound of the formula
Figure imgf000051_0001
wherein: Ri and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group; with a silylating reagent.
20. The process of Claim 19 wherein:
Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
21. The process of Claim 20 wherein: R7 is OTMS, OTES, OTIPS, ODMIPS, ODEIPS, OTDS, OTBDMS, OTBDPS, OTBS, OTPS, ODPMS, or OTBMPS.
22. The process of Claim 21 wherein the silylating reagent is a bis (trialkylsilyl)urea or a combination of a hexaalkyl- disilylzane and a catalytic amount of a chlorotrialkylsilane, and R is Ci-Cg alkyl.
23. The process of Claim 22 wherein the silylating reagent is bis (trimethylsilyl)urea and R is methyl.
24. The process of Claim 23 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group.
25. The process of Claim 24 wherein Ri and R2 are methoxy, and R3 is t-butyl.
26. The process of Claim 18 for preparing a compound of the formula
Figure imgf000052_0001
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino; and
R5 and Rg are independently hydrogen, Ci-Cg alkyl, or aryl, or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, or hexamethylimine; comprising the steps of:
(1) reacting a compound of the formula
Figure imgf000052_0002
wherein:
R and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000052_0003
wherein:
Rl and R2 are as defined above; R7 is OSi ( R) 3 ; and each R is independently C ~Cg alkyl, aryl, or arylalkyl; and
(2) reacting said sulfenate silyl ester with an amine of the formula HNRsRg wherein R5 and Rg are as defined above.
27. The process of Claim 26 wherein:
Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
28. The process of Claim 27 wherein the silylating reagent is bis (trimethylsilyl)urea and R is methyl.
29. The process of Claim 28 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group.
30. The process of Claim 29 wherein R and R2 are methoxy, and R3 is t-butyl.
31. The process of Claim 30 wherein R5 and Rg are independently hydrogen, Ci-Cg alkyl, or aryl.
32. The process of Claim 31 wherein R5 and Rg are methyl, or R5 is hydrogen and Rg is benzyl.
33. The process of Claim 18 for preparing a compound of the formula
Figure imgf000053_0001
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, amino; and R8 is Ci-Cg alkyl, aryl, or arylalkyl
comprising the steps of:
(1) reacting a compound of the formula
0
Figure imgf000054_0001
wherein:
R and R2 are as defined above, and
R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group; with a silylating reagent to produce a sulfenate silyl ester of the formula
Figure imgf000054_0002
wherein:
Rl and R2 are as defined above; R7 is OSi(R)3,- and each R is independently Ci-Cg alkyl, aryl, or arylalkyl; and
(2) reacting said sulfenate silyl ester with a mercaptan of the formula HSRs, where Rs is as defined above, in the presence of an amine base.
34. The process of Claim 33 wherein: Ri is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
35. The process of Claim 34 wherein the amine base is triethylamine, diisopropylethylamine, or pyridine.
36. The process of Claim 35 wherein the silylating reagent is bis (trimethylsilyl)urea and R is methyl.
37. The process of Claim 36 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group.
38. The process of Claim 37 wherein the amine base is triethylamine.
39. The process of Claim 38 wherein Ri and R2 are methoxy and R3 is t-butyl.
40. The process of Claim 39 wherein Rs is Cι~Cg alkyl.
41. The process of Claim 40 wherein Rs is ethyl.
42. Another aspect of the present invention is a process for the synthesis of a compound of the formula
Figure imgf000055_0001
XIII wherein: R9 is hydrogen, halo, amino, or hydroxyl; RlO is hydrogen, halo, amino, or hydroxyl; R11 and R 2 are independently C1-C4 alkyl, or Rn and R12 together with the adjacent nitrogen atom form a heterocyclic ring selected from the group consisting of pyrrolidino, piperidino, hexamethyleneimino, and morpholino; and HX is HCl or HBr; comprising the steps of:
(a) cyclizing in the presence of an acid catalyst a compound of the formula
Figure imgf000056_0001
III wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R4 is OSi(R)3, NRsRg, or SRs; each R is independently Ci-Cg alkyl, aryl, or arylalkyl;
R5 and Rβ are independently hydrogen, Ci-Cg alkyl, or aryl, or R5 and Rg together with the nitrogen atom form a ring selected from piperidine, pyrrolidine, morpholine, and hexamethylimine; and
Rs is Ci-Cg alkyl, aryl, or arylalkyl; to prepare a benzothiophene compound of the formula
Figure imgf000056_0002
wherein Ri and R2 are as defined above;
(b) acylating said benzothiophene compound with an acylating agent of the formula
Figure imgf000057_0001
wherein :
Rll' R l2' and HX are as defined previously; and R13 is chloro, bromo, or hydroxyl; in the presence of BX'3, wherein X' is chloro or bromo;
(c) when Ri and/or R2 is C1-C4 alkoxy or arylalkoxy, dealkylating one or more phenolic groups of the acylation product of step (b) by reacting with additional BX'3, wherein X' is as defined above; and, optionally,
(d) isolating the formula XIII compound.
PCT/US1996/009460 1995-06-07 1996-06-04 Process for the synthesis of vinyl sulfenic acid derivatives WO1996040693A1 (en)

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EP96918314A EP0830362A4 (en) 1995-06-07 1996-06-04 Process for the synthesis of vinyl sulfenic acid derivatives
EA199800026A EA000606B1 (en) 1995-06-07 1996-06-04 Vinyl sulfenic acid derivatives and process for their synthesis
BR9608847A BR9608847A (en) 1995-06-07 1996-06-04 Process for the synthesis of vinyl sulfenic acid derivatives
NZ310241A NZ310241A (en) 1995-06-07 1996-06-04 Process for the synthesis of vinyl sulfenic acid derivatives
AU61003/96A AU698076B2 (en) 1995-06-07 1996-06-04 Process for the synthesis of vinyl sulfenic acid derivatives
JP9501774A JPH11507346A (en) 1995-06-07 1996-06-04 Synthetic method of vinylsulfenic acid derivative
PL96323907A PL323907A1 (en) 1995-06-07 1996-06-04 Method of synthesising derivatives of vinylsulphenic acids
IL12212796A IL122127A (en) 1995-06-07 1996-06-04 VINYL SULFENIC ACID DERIVATIVES, PROCESS FOR THEIR PREPARATION, AND THEIR USE IN THE SYNTHESIS OF BENZO[b] THIOPHENES
MXPA/A/1997/009130A MXPA97009130A (en) 1995-06-07 1997-11-26 Process for the synthesis of acid derivatives vinilsulfen
NO975633A NO975633L (en) 1995-06-07 1997-12-04 Process for the Synthesis of Vinyl Sulfonic Acid Derivatives

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US08/482,692 US5512701A (en) 1995-06-07 1995-06-07 Process for the synthesis of vinyl sulfenic acid derivatives
US08/483,607 1995-06-07
US08/483,607 US5514826A (en) 1995-06-07 1995-06-07 Vinyl sulfenic acid derivatives

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964734B2 (en) 2002-09-30 2011-06-21 A/S Gea Farmaceutisk Fabrik Raloxifene acid addition salts and/or solvates thereof, improved method for purification of said raloxifene acid addition salts and/or solvates thereof and pharmaceutical compositions comprising these

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SG106558A1 (en) * 1995-06-07 2004-10-29 Lilly Co Eli Vinyl sulfoxides and a process for their synthesis
BR9608579A (en) * 1995-06-07 1999-01-05 Lilly Co Eli Vinyl sulfoxides and a process for their synthesis

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4380635A (en) * 1981-04-03 1983-04-19 Eli Lilly And Company Synthesis of acylated benzothiophenes
US4835297A (en) * 1985-12-10 1989-05-30 Degussa Aktiengesellschaft Method of preparing sulfenic acid chlorides and sulfenic acid esters

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL65379A0 (en) * 1981-04-03 1982-05-31 Lilly Co Eli Process for preparing acylated benzothiophenes

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4380635A (en) * 1981-04-03 1983-04-19 Eli Lilly And Company Synthesis of acylated benzothiophenes
US4835297A (en) * 1985-12-10 1989-05-30 Degussa Aktiengesellschaft Method of preparing sulfenic acid chlorides and sulfenic acid esters

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0830362A4 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7964734B2 (en) 2002-09-30 2011-06-21 A/S Gea Farmaceutisk Fabrik Raloxifene acid addition salts and/or solvates thereof, improved method for purification of said raloxifene acid addition salts and/or solvates thereof and pharmaceutical compositions comprising these

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