AU697352B2 - Vinyl sulfoxides and a process for their synthesis - Google Patents
Vinyl sulfoxides and a process for their synthesisInfo
- Publication number
- AU697352B2 AU697352B2 AU60920/96A AU6092096A AU697352B2 AU 697352 B2 AU697352 B2 AU 697352B2 AU 60920/96 A AU60920/96 A AU 60920/96A AU 6092096 A AU6092096 A AU 6092096A AU 697352 B2 AU697352 B2 AU 697352B2
- Authority
- AU
- Australia
- Prior art keywords
- alkyl
- labile
- compound
- alkoxy
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000000034 method Methods 0.000 title claims description 36
- 230000015572 biosynthetic process Effects 0.000 title description 18
- 238000003786 synthesis reaction Methods 0.000 title description 17
- HQSMEHLVLOGBCK-UHFFFAOYSA-N 1-ethenylsulfinylethene Chemical class C=CS(=O)C=C HQSMEHLVLOGBCK-UHFFFAOYSA-N 0.000 title description 4
- -1 benzylic anion Chemical class 0.000 claims description 120
- 150000001875 compounds Chemical class 0.000 claims description 89
- 229910052739 hydrogen Inorganic materials 0.000 claims description 45
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims description 38
- 125000003118 aryl group Chemical group 0.000 claims description 37
- 239000001257 hydrogen Substances 0.000 claims description 37
- 125000000217 alkyl group Chemical group 0.000 claims description 36
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 35
- 125000002102 aryl alkyloxo group Chemical group 0.000 claims description 33
- 125000005843 halogen group Chemical group 0.000 claims description 27
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical group [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 26
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 25
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 claims description 21
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical group CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 claims description 20
- 125000001843 C4-C10 alkenyl group Chemical group 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- FCEHBMOGCRZNNI-UHFFFAOYSA-N thianaphthalene Natural products C1=CC=C2SC=CC2=C1 FCEHBMOGCRZNNI-UHFFFAOYSA-N 0.000 claims description 16
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 15
- 229910052717 sulfur Inorganic materials 0.000 claims description 15
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 claims description 14
- 239000007859 condensation product Substances 0.000 claims description 13
- 150000002148 esters Chemical class 0.000 claims description 13
- 239000007800 oxidant agent Substances 0.000 claims description 13
- 125000004434 sulfur atom Chemical group 0.000 claims description 13
- LUFPJJNWMYZRQE-UHFFFAOYSA-N benzylsulfanylmethylbenzene Chemical compound C=1C=CC=CC=1CSCC1=CC=CC=C1 LUFPJJNWMYZRQE-UHFFFAOYSA-N 0.000 claims description 12
- 239000012359 Methanesulfonyl chloride Substances 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 11
- 239000002184 metal Substances 0.000 claims description 11
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 claims description 11
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical group [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 11
- 239000000047 product Substances 0.000 claims description 11
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 claims description 10
- 239000003377 acid catalyst Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 9
- 150000004703 alkoxides Chemical class 0.000 claims description 8
- HTMQZWFSTJVJEQ-UHFFFAOYSA-N benzylsulfinylmethylbenzene Chemical compound C=1C=CC=CC=1CS(=O)CC1=CC=CC=C1 HTMQZWFSTJVJEQ-UHFFFAOYSA-N 0.000 claims description 8
- 238000005917 acylation reaction Methods 0.000 claims description 7
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 7
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims description 6
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 5
- 125000001246 bromo group Chemical group Br* 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 5
- 230000010933 acylation Effects 0.000 claims description 4
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- QARBMVPHQWIHKH-KHWXYDKHSA-N methanesulfonyl chloride Chemical group C[35S](Cl)(=O)=O QARBMVPHQWIHKH-KHWXYDKHSA-N 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 claims description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 54
- 239000000243 solution Substances 0.000 description 40
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 39
- 239000000203 mixture Substances 0.000 description 33
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 31
- 239000002585 base Substances 0.000 description 28
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 25
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 24
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 20
- 239000011541 reaction mixture Substances 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 16
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 14
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000000543 intermediate Substances 0.000 description 10
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical group CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 8
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 8
- QARBMVPHQWIHKH-UHFFFAOYSA-N methanesulfonyl chloride Chemical compound CS(Cl)(=O)=O QARBMVPHQWIHKH-UHFFFAOYSA-N 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 150000003462 sulfoxides Chemical class 0.000 description 8
- 229930192474 thiophene Natural products 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 7
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 7
- 235000019341 magnesium sulphate Nutrition 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- 239000000523 sample Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000002841 Lewis acid Substances 0.000 description 6
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 6
- 150000007517 lewis acids Chemical class 0.000 description 6
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 description 6
- ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 150000003577 thiophenes Chemical class 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 150000001721 carbon Chemical group 0.000 description 5
- 238000004128 high performance liquid chromatography Methods 0.000 description 5
- 239000012074 organic phase Substances 0.000 description 5
- 239000007858 starting material Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- MSHFRERJPWKJFX-UHFFFAOYSA-N 4-Methoxybenzyl alcohol Chemical compound COC1=CC=C(CO)C=C1 MSHFRERJPWKJFX-UHFFFAOYSA-N 0.000 description 4
- HRWAGCVMOGWQJF-UHFFFAOYSA-N 6-methoxy-2-(4-methoxyphenyl)-1-benzothiophene Chemical compound C1=CC(OC)=CC=C1C1=CC2=CC=C(OC)C=C2S1 HRWAGCVMOGWQJF-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 4
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 4
- 239000012346 acetyl chloride Substances 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 4
- 229940093499 ethyl acetate Drugs 0.000 description 4
- 235000019439 ethyl acetate Nutrition 0.000 description 4
- LZWQNOHZMQIFBX-UHFFFAOYSA-N lithium;2-methylpropan-2-olate Chemical compound [Li+].CC(C)(C)[O-] LZWQNOHZMQIFBX-UHFFFAOYSA-N 0.000 description 4
- UBJFKNSINUCEAL-UHFFFAOYSA-N lithium;2-methylpropane Chemical compound [Li+].C[C-](C)C UBJFKNSINUCEAL-UHFFFAOYSA-N 0.000 description 4
- WGOPGODQLGJZGL-UHFFFAOYSA-N lithium;butane Chemical compound [Li+].CC[CH-]C WGOPGODQLGJZGL-UHFFFAOYSA-N 0.000 description 4
- AZVCGYPLLBEUNV-UHFFFAOYSA-N lithium;ethanolate Chemical compound [Li+].CC[O-] AZVCGYPLLBEUNV-UHFFFAOYSA-N 0.000 description 4
- DVSDBMFJEQPWNO-UHFFFAOYSA-N methyllithium Chemical compound C[Li] DVSDBMFJEQPWNO-UHFFFAOYSA-N 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 4
- KJIFKLIQANRMOU-UHFFFAOYSA-N oxidanium;4-methylbenzenesulfonate Chemical compound O.CC1=CC=C(S(O)(=O)=O)C=C1 KJIFKLIQANRMOU-UHFFFAOYSA-N 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 150000004965 peroxy acids Chemical class 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 4
- 239000012312 sodium hydride Substances 0.000 description 4
- 229910000104 sodium hydride Inorganic materials 0.000 description 4
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 4
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 3
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 150000001263 acyl chlorides Chemical class 0.000 description 3
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- CSKNSYBAZOQPLR-UHFFFAOYSA-N benzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=CC=C1 CSKNSYBAZOQPLR-UHFFFAOYSA-N 0.000 description 3
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 3
- HSDAJNMJOMSNEV-UHFFFAOYSA-N benzyl chloroformate Chemical compound ClC(=O)OCC1=CC=CC=C1 HSDAJNMJOMSNEV-UHFFFAOYSA-N 0.000 description 3
- WEDIIKBPDQQQJU-UHFFFAOYSA-N butane-1-sulfonyl chloride Chemical compound CCCCS(Cl)(=O)=O WEDIIKBPDQQQJU-UHFFFAOYSA-N 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- 239000002178 crystalline material Substances 0.000 description 3
- FRYHCSODNHYDPU-UHFFFAOYSA-N ethanesulfonyl chloride Chemical compound CCS(Cl)(=O)=O FRYHCSODNHYDPU-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- XDBOBNVQEBSKFO-UHFFFAOYSA-N magnesium;di(propan-2-yl)azanide Chemical compound CC(C)N(C(C)C)[Mg]N(C(C)C)C(C)C XDBOBNVQEBSKFO-UHFFFAOYSA-N 0.000 description 3
- XMJHPCRAQCTCFT-UHFFFAOYSA-N methyl chloroformate Chemical compound COC(Cl)=O XMJHPCRAQCTCFT-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- DRINJBFRTLBHNF-UHFFFAOYSA-N propane-2-sulfonyl chloride Chemical compound CC(C)S(Cl)(=O)=O DRINJBFRTLBHNF-UHFFFAOYSA-N 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- ODZPKZBBUMBTMG-UHFFFAOYSA-N sodium amide Chemical compound [NH2-].[Na+] ODZPKZBBUMBTMG-UHFFFAOYSA-N 0.000 description 3
- 150000003460 sulfonic acids Chemical class 0.000 description 3
- WMXCDAVJEZZYLT-UHFFFAOYSA-N tert-butylthiol Chemical compound CC(C)(C)S WMXCDAVJEZZYLT-UHFFFAOYSA-N 0.000 description 3
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- VFLQQZCRHPIGJU-UHFFFAOYSA-N 1-(2-chloroethyl)piperidine;hydron;chloride Chemical compound Cl.ClCCN1CCCCC1 VFLQQZCRHPIGJU-UHFFFAOYSA-N 0.000 description 2
- DWWPNYJVBBEWCN-UHFFFAOYSA-N 1-(tert-butylsulfanylmethyl)-4-methoxybenzene Chemical compound COC1=CC=C(CSC(C)(C)C)C=C1 DWWPNYJVBBEWCN-UHFFFAOYSA-N 0.000 description 2
- 125000005916 2-methylpentyl group Chemical group 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000012267 brine Substances 0.000 description 2
- 229920001429 chelating resin Polymers 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 238000006900 dealkylation reaction Methods 0.000 description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 2
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- NUVBSKCKDOMJSU-UHFFFAOYSA-N ethylparaben Chemical compound CCOC(=O)C1=CC=C(O)C=C1 NUVBSKCKDOMJSU-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001819 mass spectrum Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- BKXVVCILCIUCLG-UHFFFAOYSA-N raloxifene hydrochloride Chemical compound [H+].[Cl-].C1=CC(O)=CC=C1C1=C(C(=O)C=2C=CC(OCCN3CCCCC3)=CC=2)C2=CC=C(O)C=C2S1 BKXVVCILCIUCLG-UHFFFAOYSA-N 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 229960001866 silicon dioxide Drugs 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 239000012453 solvate Substances 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- 238000000825 ultraviolet detection Methods 0.000 description 2
- VNDYJBBGRKZCSX-UHFFFAOYSA-L zinc bromide Chemical compound Br[Zn]Br VNDYJBBGRKZCSX-UHFFFAOYSA-L 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- SICBLYCPRWNHHP-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanone Chemical compound C1=CC(OC)=CC=C1CC(=O)C1=CC=C(OC)C=C1 SICBLYCPRWNHHP-UHFFFAOYSA-N 0.000 description 1
- APMJBTGDXWLDED-UHFFFAOYSA-N 1,2-dichloroethane;[6-hydroxy-2-(4-hydroxyphenyl)-1-benzothiophen-3-yl]-[4-(2-piperidin-1-ylethoxy)phenyl]methanone;hydrochloride Chemical compound Cl.ClCCCl.C1=CC(O)=CC=C1C1=C(C(=O)C=2C=CC(OCCN3CCCCC3)=CC=2)C2=CC=C(O)C=C2S1 APMJBTGDXWLDED-UHFFFAOYSA-N 0.000 description 1
- KNKRKFALVUDBJE-UHFFFAOYSA-N 1,2-dichloropropane Chemical compound CC(Cl)CCl KNKRKFALVUDBJE-UHFFFAOYSA-N 0.000 description 1
- 125000005918 1,2-dimethylbutyl group Chemical group 0.000 description 1
- CNJULPHJOVELAY-UHFFFAOYSA-N 1-(tert-butylsulfinylmethyl)-4-methoxybenzene Chemical compound COC1=CC=C(CS(=O)C(C)(C)C)C=C1 CNJULPHJOVELAY-UHFFFAOYSA-N 0.000 description 1
- DYSJMQABFPKAQM-UHFFFAOYSA-N 1-benzothiophene-2-carboxylic acid Chemical class C1=CC=C2SC(C(=O)O)=CC2=C1 DYSJMQABFPKAQM-UHFFFAOYSA-N 0.000 description 1
- 125000004343 1-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- 125000001917 2,4-dinitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C(=C1*)[N+]([O-])=O)[N+]([O-])=O 0.000 description 1
- ADKCFCOXELVRJV-UHFFFAOYSA-N 2-(4-methoxyphenyl)-1-benzothiophene Chemical compound C1=CC(OC)=CC=C1C1=CC2=CC=CC=C2S1 ADKCFCOXELVRJV-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000004198 2-fluorophenyl group Chemical group [H]C1=C([H])C(F)=C(*)C([H])=C1[H] 0.000 description 1
- 125000006040 2-hexenyl group Chemical group 0.000 description 1
- 125000004204 2-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C(OC([H])([H])[H])C([H])=C1[H] 0.000 description 1
- 125000006029 2-methyl-2-butenyl group Chemical group 0.000 description 1
- 125000006049 2-methyl-2-pentenyl group Chemical group 0.000 description 1
- 125000006031 2-methyl-3-butenyl group Chemical group 0.000 description 1
- 125000006053 2-methyl-3-pentenyl group Chemical group 0.000 description 1
- 125000006056 2-methyl-4-pentenyl group Chemical group 0.000 description 1
- 125000004493 2-methylbut-1-yl group Chemical group CC(C*)CC 0.000 description 1
- 125000006024 2-pentenyl group Chemical group 0.000 description 1
- LBMHPHUSGIEGHJ-UHFFFAOYSA-N 2-phenyl-1-benzothiophene Chemical class S1C2=CC=CC=C2C=C1C1=CC=CC=C1 LBMHPHUSGIEGHJ-UHFFFAOYSA-N 0.000 description 1
- ODNFQADBSZFWFO-UHFFFAOYSA-N 2-phenylethanethial Chemical compound S=CCC1=CC=CC=C1 ODNFQADBSZFWFO-UHFFFAOYSA-N 0.000 description 1
- PDXIRRHBYATHAH-UHFFFAOYSA-N 3-(2-sulfanylphenyl)prop-2-enoic acid Chemical class OC(=O)C=CC1=CC=CC=C1S PDXIRRHBYATHAH-UHFFFAOYSA-N 0.000 description 1
- 125000006275 3-bromophenyl group Chemical group [H]C1=C([H])C(Br)=C([H])C(*)=C1[H] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- CMJCKTXYMMDNCW-UHFFFAOYSA-N 3-chloro-2-phenyl-1-benzothiophene Chemical compound S1C2=CC=CC=C2C(Cl)=C1C1=CC=CC=C1 CMJCKTXYMMDNCW-UHFFFAOYSA-N 0.000 description 1
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- 125000004208 3-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C([H])C(*)=C1[H] 0.000 description 1
- 125000004207 3-methoxyphenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(OC([H])([H])[H])=C1[H] 0.000 description 1
- 125000006050 3-methyl-2-pentenyl group Chemical group 0.000 description 1
- 125000006054 3-methyl-3-pentenyl group Chemical group 0.000 description 1
- 125000006057 3-methyl-4-pentenyl group Chemical group 0.000 description 1
- 125000005917 3-methylpentyl group Chemical group 0.000 description 1
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- WHKJLXLFQNXNNR-UHFFFAOYSA-N 4-(2-piperidin-1-ylethoxy)benzoyl chloride;hydrochloride Chemical compound Cl.C1=CC(C(=O)Cl)=CC=C1OCCN1CCCCC1 WHKJLXLFQNXNNR-UHFFFAOYSA-N 0.000 description 1
- 125000006281 4-bromobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Br)C([H])([H])* 0.000 description 1
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 125000004860 4-ethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006042 4-hexenyl group Chemical group 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 125000006051 4-methyl-2-pentenyl group Chemical group 0.000 description 1
- 125000003119 4-methyl-3-pentenyl group Chemical group [H]\C(=C(/C([H])([H])[H])C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006058 4-methyl-4-pentenyl group Chemical group 0.000 description 1
- OCKGFTQIICXDQW-ZEQRLZLVSA-N 5-[(1r)-1-hydroxy-2-[4-[(2r)-2-hydroxy-2-(4-methyl-1-oxo-3h-2-benzofuran-5-yl)ethyl]piperazin-1-yl]ethyl]-4-methyl-3h-2-benzofuran-1-one Chemical compound C1=C2C(=O)OCC2=C(C)C([C@@H](O)CN2CCN(CC2)C[C@H](O)C2=CC=C3C(=O)OCC3=C2C)=C1 OCKGFTQIICXDQW-ZEQRLZLVSA-N 0.000 description 1
- 125000006043 5-hexenyl group Chemical group 0.000 description 1
- COVZYZSDYWQREU-UHFFFAOYSA-N Busulfan Chemical compound CS(=O)(=O)OCCCCOS(C)(=O)=O COVZYZSDYWQREU-UHFFFAOYSA-N 0.000 description 1
- YIIMEMSDCNDGTB-UHFFFAOYSA-N Dimethylcarbamoyl chloride Chemical compound CN(C)C(Cl)=O YIIMEMSDCNDGTB-UHFFFAOYSA-N 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- PQLAYKMGZDUDLQ-UHFFFAOYSA-K aluminium bromide Chemical compound Br[Al](Br)Br PQLAYKMGZDUDLQ-UHFFFAOYSA-K 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000005418 aryl aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 125000005605 benzo group Chemical group 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- JRXXLCKWQFKACW-UHFFFAOYSA-N biphenylacetylene Chemical group C1=CC=CC=C1C#CC1=CC=CC=C1 JRXXLCKWQFKACW-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000010537 deprotonation reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- 239000012470 diluted sample Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- GEBZGEGHFMUFJA-UHFFFAOYSA-N ethyl 4-(2-piperidin-1-ylethoxy)benzoate Chemical compound C1=CC(C(=O)OCC)=CC=C1OCCN1CCCCC1 GEBZGEGHFMUFJA-UHFFFAOYSA-N 0.000 description 1
- 235000010228 ethyl p-hydroxybenzoate Nutrition 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000001640 fractional crystallisation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- CMVTYSMYHSVDIU-UHFFFAOYSA-N hydron;4-(2-piperidin-1-ylethoxy)benzoic acid;chloride Chemical compound Cl.C1=CC(C(=O)O)=CC=C1OCCN1CCCCC1 CMVTYSMYHSVDIU-UHFFFAOYSA-N 0.000 description 1
- 238000003402 intramolecular cyclocondensation reaction Methods 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- PYLWMHQQBFSUBP-UHFFFAOYSA-N monofluorobenzene Chemical compound FC1=CC=CC=C1 PYLWMHQQBFSUBP-UHFFFAOYSA-N 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 238000007243 oxidative cyclization reaction Methods 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000006503 p-nitrobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1[N+]([O-])=O)C([H])([H])* 0.000 description 1
- 125000000636 p-nitrophenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)[N+]([O-])=O 0.000 description 1
- 125000005489 p-toluenesulfonic acid group Chemical group 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 229920000137 polyphosphoric acid Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000008057 potassium phosphate buffer Substances 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- MDGWZLQPNOETLH-UHFFFAOYSA-N raloxifene core Chemical class C1=CC(O)=CC=C1C1=CC2=CC=C(O)C=C2S1 MDGWZLQPNOETLH-UHFFFAOYSA-N 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical class [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 description 1
- PUGUQINMNYINPK-UHFFFAOYSA-N tert-butyl 4-(2-chloroacetyl)piperazine-1-carboxylate Chemical compound CC(C)(C)OC(=O)N1CCN(C(=O)CCl)CC1 PUGUQINMNYINPK-UHFFFAOYSA-N 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000004360 trifluorophenyl group Chemical group 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229940102001 zinc bromide Drugs 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/54—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
- C07D333/56—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C317/18—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/50—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
- C07D333/52—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes
- C07D333/54—Benzo[b]thiophenes; Hydrogenated benzo[b]thiophenes with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Saccharide Compounds (AREA)
Description
Vinyl Sulfoxides And A Process For Their Synthesis
The present invention is directed to novel vinyl sulfoxides and to a new process for the synthesis of same, in particular diarylvinyl sulfoxides. These compounds are useful for the synthesis of benzo[b] thiophenes .
Benzo[b] thiophenes have been prepared by a number of different synthetic routes. One of the most widely used methods is the oxidative cyclization of o-mercaptocinnamic acids. This route is limited to the preparation of benzo[b] - thiophene-2-carboxylates. 2-Phenylbenzo[b]thiophenes are prepared by acid-catalyzed cyclization of 2-phenylthioacetal- dehyde dialkyl acetals . Unsubstituted benzo[b]thiophenes are prepared by catalytic condensation of styrene and sulfur. 3- Substituted benzo[b]thiophenes are prepared by acid-catalyzed cyclization of arylthiomethyl ketones; however, this route is limited to the preparation of 3-alkylbenzo[b] thiophenes. See Campaigne, "Thiophenes and their Benzo Derivatives: (iii) Synthesis and Applications, " in Comprehensive Heterocyclic Chemistry (Katritzky and Rees, eds.), Volume IV, Part III, 863-934 (1984) . 3-Chloro-2-phenylbenzo[b]thiophene is prepared by the reaction of diphenylacetylene with sulfur dichloride. Barton and Zika, J. Org. Chem . , 35, 1729-1733 (1970) . Benzo[b]thiophenes have also been prepared by pyrolysis of styryl sulfoxides. However, low yields and extremely high temperatures make this route unsuitable for production-scale syntheses. See Ando, J. Chem. Soc , Chem. Comm., 704-705 (1975) .
The preparation of 6-hydroxy-2- (4-hydroxyphenyl)benzo- [b]thiophenes was described in U.S. Patent Nos. 4,133,814 and 4,380,635. One process described in these patents is the acid-catalyzed intramolecular cyclization/rearrangement of α - (3-methoxyphenylthio) -4-methoxyacetophenone. The reaction of this starting compound in neat polyphosphoric acid at about 85°C to about 90°C gives an approximate 3:1 mixture of two regioisomeric products: 6-methoxy-2- (4-methoxyphenyl) - benzo[b]thiophene and 4-methoxy~2- (4-methoxyphenyl)benzo[b] -
thiophene. These isomeric benzo[b] thiophenes co-precipitate from the reaction mixture, producing a mixture containing both compounds. To obtain a single regioisomer, the regioisomers must be separated, such as by chromatography or fractional crystallization. Therefore, there currently exists a need for an efficient and regiospecific synthesis of 2-arylbenzo[b] thiophenes from readily available starting materials . The compounds of the present invention are useful for the efficient and regiospecific synthesis of 2-arylbenzo- [b] thiophenes from readily available starting materials.
The present invention is directed to novel vinyl sulfoxides and to a new process for their synthesis, in particular diarylvinyl sulfoxides. Specifically, the present invention is directed to a compound of the formula
II wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R3 is a thermally-labile or acid-labile C2-Cιo alkyl, C4-C10 alkenyl, or aryl(C -Cιo alkyl) group. Thus, the present invention includes individually the E and Z isomers, or mixtures thereof, of the formula II compounds. These E and Z regioisomers are represented by the following structures:
Another aspect of the present invention is a process for preparing a compound of the formula
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R3 is a thermally-labile or acid-labile C2-Cιo alkyl, C4- C10 alkenyl, or aryl(Cι-Cιo alkyl) group having a tertiary carbon atom adjacent to the sulfur atom; comprising the steps of:
(1) oxidizing a benzyl sulfide of the formula:
wherein R2 and R3 are as defined above; with an oxidizing agent to produce a benzyl sulfoxide of the formula:
wherein R2 and R3 are as defined above;
(2) reacting said benzyl sulfoxide with a strong base to form a benzylic anion;
(3) condensing said benzylic anion with a benzaldehyde of the formula
wherein Ri is as defined above;
(4) reacting the condensation product from step 3 with an acid chloride to produce an ester of the formula
wherein:
Rl, R2, and R3 are as defined above; and
R is C0(Cι-C6 alkyl) , CO(aryl) , CO(arylalkyl) , S02(Cι-C6 alkyl) , S02(aryl), S02 (arylalkyl) , C02 (Cι-C6 alkyl) , C02(aryl), CO2 (arylalkyl) , or CON(Cι-Cδ alkyl) 2; and
(5) treating said ester with a second strong base.
The E and Z regioisomers the formula II compounds are represented by the following structures :
Another aspect of the present invention is a process for the regioselective synthesis of the Z isomer of the formula II compounds. In particular, the present invention relates to a process for preparing a compound of the formula
IIZ wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R3 is a thermally-labile or acid-labile C2-Cιo alkyl, C4- C10 alkenyl, or aryl(Cι-Cιo alkyl) group having a tertiary carbon atom adjacent to the sulfur atom; comprising the steps of:
(1) reacting a benzyl sulfide of the formula:
wherein R2 and R3 are as defined above; with a strong base to form a benzylic anion;
(2) condensing said benzylic anion with a benzaldehyde of the formula
wherein R is as defined above;
(3) reacting the condensation product from step 2 with an acid chloride to produce an ester of the formula
wherein:
Rl R2 and R3 are as defined above; and
R4 is CO(Cι-C6 alkyl), CO(aryl), CO(arylalkyl) , Sθ2(Cι-C6 alkyl), S02(aryl), S02 (arylalkyl) , C02(Cι-C6 alkyl), C02(aryl), C0 (arylalkyl) , or CON(Cι-C6 alkyl) 2;
(4) treating said ester with a second strong base to produce a styryl sulfide of the formula
wherein Ri, R2, and R3 are as defined above; and (5) oxidizing said styryl sulfide with an oxidizing agent.
Yet another aspect of the present invention is a process for the synthesis of a compound of the formula
wherein:
R8 is hydrogen, halo, amino, or hydroxyl;
Rg is hydrogen, halo, amino, or hydroxyl;
R5 and Rς are independently C1-C4 alkyl, or R5 and Re together with the adjacent nitrogen atom form a heterocyclic ring selected from the group consisting of pyrrolidino, piperidino, hexamethyleneimino, and morpholino; and
HX is HCl or HBr; comprising the steps of:
(a) cyclizing in the presence of an acid catalyst a compound of the formula
wherein:
Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;
R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and
R3 is a thermally-labile or acid-labile C2-C10 alkyl,
C4-C10 alkenyl, or aryl (C1-C10 alkyl) group to prepare a benzothiophene compound of the formula
wherein Ri and R2 are as defined above;
(b) acylating said benzothiophene compound with an acylating agent of the formula
wherein:
R5, Rg, and HX are as defined previously; and R7 is chloro, bromo, or hydroxyl; in the presence of BX'3, wherein X' is chloro or bromo;
(c) when Ri and/or R2 is C1-C4 alkoxy or arylalkoxy, dealkylating one or more phenolic groups of the acylation product of step (b) by reacting with additional BX '3, wherein X' is as defined above; and
(d) isolating the formula XII compound.
The term "Ci-Cg alkyl" represents a straight or branched alkyl chain having from one to six carbon atoms. Typical Cι~ Cg alkyl groups include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, t-butyl, n-pentyl, isopentyl, n-hexyl, 2-methylpentyl, and the like. The term "C1-C4 alkyl" represents a straight or branched alkyl chain having from one
to four carbon atoms, and includes methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, i-butyl, and t-butyl.
The term "C1-C4 alkoxy" represents groups such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, t-butoxy, and like groups. The term "halo" refers to fluoro, chloro, bromo, or iodo groups.
The term "aryl" represents groups such as phenyl and substituted phenyl. The term "substituted phenyl" represents a phenyl group substituted with one or more moieties chosen from the group consisting of halo, hydroxy, nitro, C1-C4 alkyl, C1-C4 alkoxy, trichloromethyl, and trifluoromethyl. Examples of a substituted phenyl group include 4-chloro- phenyl, 2, 6-dichlorophenyl, 2, 5-dichlorophenyl, 3,4-dichloro¬ phenyl, 3-chlorophenyl, 3-bromophenyl, 4-bromophenyl, 3,4- dibromophenyl, 3-chloro-4-fluorophenyl, 2-fluorophenyl, 4- hydroxyphenyl, 3-hydroxyphenyl, 2,4-dihydroxyphenyl, 3-nitro- phenyl, 4-nitrophenyl, 2, 4-dinitrophenyl, 4-methylphenyl, 4- ethylphenyl, 4-methoxyphenyl, 4-propylphenyl, 4-n-butyl- phenyl, 4-t-butylphenyl, 3-fluoro-2-methylphenyl, 2,3- difluorophenyl, 2, 6-difluorophenyl, 2, 6-dimethylphenyl, 2- fluoro-5-methylphenyl, 2,4, 6~trifluorophenyl, 2-trifluoro- methylphenyl, 2-chloro-5-trifluoromethylphenyl, 3,5-bis- (trifluoromethyl)phenyl, 2-methoxyphenyl, 3-methoxyphenyl, 3, 5-dimethoxyphenyl, 4-hydroxy-3-methylphenyl, 3, 5-dimethyl, 4-hydroxyphenyl, 2-methyl-4-nitrophenyl, 4-methoxy-2-nitro- phenyl, and the like.
The term "arylalkyl" represents a C1-C4 alkyl group bearing one or more aryl groups. Representatives of this group include benzyl, o-nitrobenzyl, p-nitrobenzyl, p- halobenzyl (such as p-chlorobenzyl, p-bromobenzyl, p- iodobenzyl) , 1-phenylethyl, 2-phenylethyl, 3-phenylpropyl, 4- phenylbutyl, 2-methyl-2-phenylpropyl, (2,6- dichlorophenyl)methyl, bis (2, 6-dichlorophenyl) ethyl, (4- hydroxyphenyl)methyl, (2, 4-dinitrophenyl)methyl, diphenylmethyl, triphenylmethyl, (p-methoxyphenyl) - diphenylmethyl, bis (p-methoxyphenyl)methyl, bis (2- nitrophenyl)methyl, and the like.
The term "arylalkoxy" represents a C1-C4 alkoxy group bearing one or more aryl groups. Representatives of this group include benzyloxy, o-nitrobenzyloxy, p-nitrobenzyloxy, p-halobenzyloxy (such as p-chlorobenzyloxy, p-bromobenzyloxy, p-iodobenzyloxy) , 1-phenylethoxy, 2-phenylethoxy, 3- phenylpropoxy, 4-phenylbutoxy, 2-methyl-2-phenylpropoxy, (2, 6-dichlorophenyl)methoxy, bis (2, 6-dichlorσphenyl)methoxy, (4-hydroxyphenyl)methoxy, (2, 4-dinitropheny1)methoxy, diphenylmethoxy, triphenylmethoxy, (p-methoxyphenyl) - diphenylmethoxy, bis (p-methoxyphenyl)methoxy, bis (2- nitrophenyl)methoxy, and the like.
The term "thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι~Cιo alkyl) group" represents a group that is readily removed from the sulfoxide (SO) group under heating or by treatment with the acid catalyst. The thermally-labile or acid-labile C2-C10 alkyl groups are straight or branched alkyl chains having from two to ten carbon atoms and having at least one beta-hydrogen atom. Representative thermally-labile or acid-labile C2-C10 alkyl groups include ethyl, n-propyl, i-propyl, 1, 1-dimethyl- propyl, n-butyl, sec-butyl, t-butyl, 1, 1-dimethylbutyl, 2- methylbutyl, 3-methylbutyl, 1-methylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,4-dimethylbutyl, 3,3-dimethylbutyl, n- pentyl, 1-methylpentyl, 2-methylpentyl, 3-methylpentyl, 4- methylpentyl, n-hexyl, and the like. The thermally-labile or acid-labile C4-C10 alkenyl groups are straight or branched alkenyl chains having from four to ten carbon atoms, at least one site of unsaturation, and either a beta-hydrogen or delta-hydrogen atom. Representative thermally-labile or acid-labile C4-C10 alkenyl groups include 2-butenyl, 3- butenyl, 2-methyl-2-butenyl, 3-methyl-2-butenyl, 2-methyl-3- butenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 2-methyl-2- pentenyl, 3-methyl-2-pentenyl, 4-methyl-2-pentenyl, 2-methyl- 3-pentenyl, 3-methyl-3-pentenyl, 4-methyl-3-pentenyl, 2- methyl-4-pentenyl, 3-methyl-4-pentenyl, 4-methyl-4-pentenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, and the like. The term thermally-labile or acid-labile aryl(Cι-Cιo alkyl)
represents thermally-labile or acid-labile C2-C10 alkyl groups additionally containing one or more aryl groups and aryl- substituted methyl groups. Representative aryl (C1-C10 alkyl) groups include benzyl, diphenylmethyl, triphenylmethyl, p- methoxybenzyl, 2-phenylethyl, 2-phenyl-propyl, 3-phenyl¬ propyl, and the like. The term "thermally-labile or acid- labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group having a tertiary carbon atom adjacent to the sulfur atom" includes, but is not limited to, such groups as t- butyl, 1, 1-dimethylpropyl, 1, 1-dimethylbutyl, 1-ethyl-l- methylpropyl, 1,1-dimethylpentyl, 1-ethyl-1-methylbutyl, 1,1- diethylpropyl, 1, 1-dimethylhexyl, triphenylmethyl, and the like.
The term "acid chloride" includes acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1-butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N,iV-dimethylaminocarbonyl chloride. Preferably the acid chloride is a sulfonyl chloride. More preferably, the acid chloride is methanesulfonyl chloride. The compounds of the present invention can be prepared by a number of routes. One method for preparing the formula II compounds is shown in Scheme 1.
Scheme 1
Generally, a formula IX compound is converted to a styryl sulfide by reaction with a mercaptan of the formula HSR3 in the presence of a Lewis acid. The formula III compound is then oxidized to a styryl sulfoxide, a compound of formula II compound.
More specifically, a formula IX compound, wherein Ri and R2 are as defined above, is treated with a Lewis acid, such as titanium(IV) chloride. This reaction is carried out in an anhydrous organic solvent, such as dry tetrahydrofuran, at a temperature of about 0°C to about 35°C. After about fifteen minutes to about one hour, the reaction mixture is treated with an amine base and a mercaptan of the formula HSR3, where R3 is as defined above. Preferably, the mercaptan and amine base are added as a solution in the reaction solvent. A representative amine base is triethylamine. After the addition of the mercaptan and amine base, the reaction is generally heated to a temperature of about 35°C to about 65°C, preferably at about 50°C. The products of this reaction can be purified using techniques well known in the chemical arts, such as by crystallization or chromatography.
The formula III compound, where Ri, R2, and R3 are as defined above, is then oxidized to produce the formula II compounds. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m-chloroperoxybenzoic
acid, and hydrogen peroxide. This oxidation reaction is typically run in an organic solvent, such as toluene, methylene chloride, chloroform, or carbon tetrachloride. When a peracid is used as the oxidant, the reaction is generally carried out at a temperature of about -30°C to about 15°C, preferably at about -20°C. The products of the reaction are easily purified by recrystallization. When R3 is t-butyl, the crystalline product of this reaction sequence is the E regioisomer of formula II.
When R3 has a tertiary carbon adjacent to the sulfur atom, the Z regioisomer of the formula II compounds can be prepared selectively by a route as shown in Scheme 2.
Scheme 2
IIZ
Generally, a benzyl alcohol, a formula V compound, is reacted with a mercaptan of the formula R3SH to produce a benzyl sulfide, a formula VI compound. This benzyl sulfide is reacted with a strong base, forming a benzylic anion, which is condensed with a benzaldehyde. This condensation product is reacted with an acid chloride and the resulting intermediate ester treated with a second strong base to produce a styryl sulfide, a formula IIIZ compound. This
styryl sulfide is then oxidized with an oxidizing agent to produce the formula IIZ compound.
The first step in the synthesis of the Z styryl sulfoxide compounds is the conversion of a benzyl alcohol to a benzyl sulfide, formula VI compound. The reaction of the formula V compound, where R2 is as defined above, with a mercaptan of the formula R3SH, wherein R3 is a thermally- labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group having a tertiary carbon atom adjacent to the sulfur atom, in the presence of a Lewis acid produces the benzyl sulfide, a formula VI compound. Suitable Lewis acids for this transformation are zinc bromide, zinc chloride, zinc iodide, ferric chloride, titanium(IV) chloride, aluminum trichloride, and aluminum tribromide, preferably zinc iodide. The reaction is generally carried out in an organic solvent, such as 1,2-dichloroethane or methylene chloride. When the reaction is carried out at room temperature, the reaction is complete after about 18 hours.
The benzyl sulfide is reacted with a strong base to form a benzylic anion. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; and alkyllithiums, such as n- butyllithium, t-butyllithium, sec-butyllithium, and methyllithium. The preferred strong base for this reaction is n-butyllithium. The preferred solvent for this reaction is dry tetrahydrofuran. When n-butyllithium is used as the strong base, the reaction is carried out at a temperature of about -35°C to about -15°C. The benzylic anion is condensed with a benzaldehyde to prepare an intermediate condensation product. The benzaldehyde has the general formula Rι(CgH4)CHO, wherein Ri is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino. Preferably, the benzylic anion is prepared and the condensation product is formed in si tu by adding the benzaldehyde to the cold solution of the benzylic anion.
The condensation product is treated with an acid chloride to produce an intermediate ester. Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1- butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p-toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N,V-dimethylaminocarbonyl chloride; preferably a sulfonyl chloride. Preferably, methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product.
This intermediate ester is reacted with a second strong base to produce a styryl sulfide, a formula IIIZ compound where Ri, R2, and R3 are as defined above. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred strong base for this reaction is potassium t-butoxide. Generally, this reaction is carried out at about 15°C to about room temperature, preferably at room temperature.
The styryl sulfide is oxidized to prepare the corresponding styryl sulfoxide. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m- chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide. Preferably the oxidizing agent is peracetic acid. This oxidation is typically carried out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1, 2-dichloroethane, or chloroform; preferably methylene chloride. This oxidation can be carried out at a temperature of about -40°C to about 0°C.
Alternatively, when R3 has a tertiary carbon adjacent to the sulfur atom, the benzyl sulfide intermediate (formula VI compound) can be used to produce a mixture of E and Z isomers of the styryl sulfoxides, the formula II compounds. This synthesis is outlined in Scheme 3.
Scheme 3
The benzyl sulfide, prepared as described above, is oxidized to produce the corresponding benzyl sulfoxide. This benzyl sulfoxide is reacted with a strong base, and the resulting anion condensed with a benzaldehyde. The condensation product is reacted with an acid chloride and the resulting intermediate ester reacted with a second strong base to produce the styryl sulfoxide.
The benzyl sulfide, the formula VI compound, wherein R2 is as defined above and R3 is a thermally-labile or acid- labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C 0 alkyl) group having a tertiary carbon atom adjacent to the sulfur atom, is oxidized to produce the corresponding benzyl sulfoxide, formula X compound. Suitable oxidizing agents for this reaction are peracids, such as peracetic acid and m- chloroperoxybenzoic acid; organic peroxides, such as t-butyl peroxide; and hydrogen peroxide. Preferably the oxidizing agent is peracetic acid. This oxidation is typically carried
out in an organic solvent, such as toluene, benzene, xylene, methanol, ethanol, methylacetate, ethylacetate, methylene chloride, 1,2-dichloroethane, or chloroform; preferably at a temperature of about -30°C to about 5°C. The benzyl sulfoxide, formula X compound wherein R2 and R3 are as defined above, is reacted with a strong base to produce a benzylic anion. Suitable strong bases for this reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t-butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec-butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred base for this transformation is n-butyllithium. This deprotonation reaction is carried out in a dry organic solvent, such as tetrahydrofuran or 1,2-dimethoxyethane, at a temperature of about -25°C.
The benzylic anion is condensed, without isolation, with a benzaldehyde compound of the formula p-Ri (C6H4)CHO, wherein Ri is as defined above. Preferably, about one equivalent of the benzaldehyde is added to the cold solution prepared as described in the preceding paragraph. The resulting diastereomeric mixture of condensation products may be isolated, or preferably used in the next step without isolation.
The condensation product is optionally treated with a base, such as n-butyllithium, and reacted with an acid chloride. Representative acid chlorides include acyl chlorides, such as acetyl chloride and benzoyl chloride; sulfonyl chlorides, such as methanesulfonyl chloride, benzenesulfonyl chloride, 1-butanesulfonyl chloride, ethanesulfonyl chloride, isopropylsulfonyl chloride, and p- toluenesulfonyl chloride; alkoxycarbonyl chlorides, such as methoxycarbonyl chloride and benzyloxycarbonyl chloride; and dialkylaminocarbonyl chlorides, such as N, N- dimethylaminocarbonyl chloride; preferably a sulfonyl chloride. The acid chloride is added to the cold reaction
mixture, then the resulting mixture is allowed to warm to room temperature. Preferably, methanesulfonyl chloride is added to the reaction mixture shortly after formation of the condensation product, which eliminates the need to add additional base.
The resulting intermediate ester is reacted with a second strong base to produce the E and Z styryl sulfoxides, formula II compounds where Ri, R2, and R3 are as defined above. Representative second strong bases for this elimination reaction include metal alkoxides, such as sodium methoxide, sodium ethoxide, lithium ethoxide, lithium t- butoxide, and potassium t-butoxide; sodium hydride; alkyllithiums, such as n-butyllithium, t-butyllithium, sec- butyllithium, and methyllithium; and metal amides, such as sodium amide, magnesium diisopropylamide, and lithium diisopropylamide. The preferred base for this transformation is potassium t-butoxide. Preferably, a 20% excess, such as 1.2 equivalents, of the second base are added. Generally, this reaction is carried out at a temperature of about 15°C to about room temperature, preferably at room temperature. The intermediate styryl sulfoxides are useful for the synthesis of 2-arylbenzo[b] thiophenes as shown in Scheme 4.
Scheme 4
Generally, the intermediate styryl sulfoxide compounds are heated and treated with acid catalysts to produce the formula I compounds. Suitable acid catalysts for this reaction include Lewis acids or Brønsted acids. Representative Lewis acids include zinc chloride, zinc
iodide, aluminum chloride, and aluminum bromide. Representative Brønsted acids include inorganic acids, such as sulfuric and phosphoric acids; carboxylic acids, such as acetic and trifluoroacetic acids; sulfonic acids, such as methanesulfonic, benzenesulfonic, 1-naphthalenesulfonic, 1- butanesulfonic, ethanesulfonic, 4-ethylbenzenesulfonic, 1- hexanesulfonic, 1, 5-naphthalenedisulfonic, 1-octanesulfonic, camphorsulfonic, trifluoromethanesulfonic, and p-toluene¬ sulfonic acids; and polymeric arylsulfonic acids, such as Nafion®, Amberlyst®, or Amberlite®. The more preferred acid catalysts are sulfonic acids, such as methanesulfonic acid, benezene-sulfonic acid, camphorsulfonic, and p- toluenesulfonic acid. The most preferred acid catalyst is p- toluenesulfonic acid. Typically, a solution of the acid catalyst in organic solvent, such as toluene, benzene, xylene, or a high-boiling halogenated hydrocarbon solvents, such as 1,1,2-trichloro-ethane, is heated to about 80° to about 140°C, and treated with a solution of the styryl sulfoxide in the same solvent. An excess amount of the acid catalyst is used, preferably two equivalents of the acid. For best results, the final concentration of the starting compound is about 0.01 M to about 0.2 M, preferably 0.05 M. Furthermore, best yields are obtained when the styryl sulfoxide is slowly added to the heated acid solution over a period of about 20 minutes to about three hours. For best results, residual water is removed from the reaction solution by the use of a Dean-Stark trap or Soxhlet extractor, and the reaction is purged with purified nitrogen.
The formula I compounds are useful as intermediates in the synthesis of a series of 3-aroyl-2-arylbenzo[b] - thiophenes. U.S. Patent Nos. 4,133,814 and 4,418,068, which are incorporated herein by reference, described these 3- aroyl-2-arylbenzo[b]thiophenes, as well as methods for their preparation from the formula I compounds. An improved synthesis of a group of these 3-aroyl-2-arylbenzo[b] - thiophenes from the formula I compounds, wherein Ri and R2 are hydrogen, C1-C4 alkoxy, or arylalkoxy, is outlined in
Scheme 5.
Scheme 5
The benzothiophene Formula I compound, wherein Ri and R2 are hydrogen, C1-C4 alkoxy, or arylalkoxy, is acylated with the formula XI compound, wherein R7 is chloro or hydroxy, in the presence of boron trichloride or boron tribromide; boron trichloride is preferred. The reaction can be carried out in a variety of organic solvents, such as chloroform, methylene chloride, 1, 2-dichloroethane, 1, 2, 3-dichloropropane, 1,1,2,2- tetra-chloroethane, 1, 2-dichlorobenzene, chlorobenzene, and fluorobenzene. The preferred solvent for this synthesis is 1,2-dichloroethane. The reaction is carried out at a temperature of about -10°C to about 25°C, preferably at 0°C. The reaction is best carried out at a concentration of the benzothiophene formula I compound of about 0.2 M to about 1.0 M. The acylation reaction is generally complete after about two hours to about eight hours.
When Ri and/or R2 is a C1-C4 alkoxy or arylalkoxy group, the acylated benzothiophene, is converted to a formula XI compound wherein Rs and/or R9 are hydroxy, without isolation of the product from the acylation reaction. This conversion
is performed by adding additional boron trihalide or boron tribromide and heating the reaction mixture. Preferably, two to five molar equivalents of boron trihalide are added to the reaction mixture, most preferably three molar equivalents. This reaction is carried out at a temperature of about 25°C to about 40°C, preferably at 35°C. The reaction is generally complete after about 4 to 48 hours.
The acylation reaction or acylation/dealkylation reaction is quenched with an alcohol or a mixture of alcohols. Suitable alcohols for use in quenching the reaction include methanol, ethanol, and isopropanol. Preferably, the acylation/dealkylation reaction mixture is added to a 95:5 mixture of ethanol and methanol (3A ethanol). The 3A ethanol can be at room temperature or heated to reflux, preferably at reflux. When the quench is performed in this manner, the Formula XII compound conveniently crystallizes from the resulting alcoholic mixture. Generally, 1.25 mL to 3.75 mL of alcohol per millimole of the benzothiophene starting material are used. The following examples further illustrate the present invention. The examples are not intended to be limiting to the scope of the invention in any respect, and should not be so construed. All experiments were run under positive pressure of dry nitrogen. All solvents and reagents were used as obtained. The percentages are generally calculated on a weight (w/w) basis; except for high performance liquid chromatography (HPLC) solvents which are calculated on a volume (v/v) basis. Proton nuclear magnetic resonance (1H NMR) spectra and 13C nuclear magnetic resonance spectra (13C NMR) were obtained on a Bruker AC-300 FTNMR spectrometer at 300.135 MHz or a GE QE-300 spectrometer at 300.15 MHz. Silica-gel flash chromatography was performed as described by Still et al . using Silica Gel 60 (230-400 mesh, E. Merck) . Still et al . , J. Org. Chem. , 43, 2923 (1978) . Elemental analyses for carbon, hydrogen, and nitrogen were determined on a Control Equipment Corporation 440 Elemental Analyzer. Elemental analyses for sulfur were determined on a Brinkman
Colorimetric Elemental Analyzer. Melting points were determined open glass capillaries on a Mel-Temp II melting point apparatus or a Mettler FP62 Automatic instrument, and are uncorrected. Field desorption mass spectra (FDMS) were obtained using a Varian Instruments VG 70-SE or VG ZAB-3F mass spectrometer. High resolution free atom bombardment mass spectra (FABMS) were obtained using a Varian Instruments VG ZAB-2SE mass spectrometer.
The in si tu yields of 6-methoxy-2- (4- methoxyphenyl)benzo [b]thiophene were determined by high performance liquid chromatography (HPLC) in comparison to an authentic sample of this compound prepared by published synthetic routes. See U.S. Patent No. 4,133,814. Generally, samples of the reaction mixture was diluted with acetonitrile and the diluted sample assayed by HPLC using a Zorbax RX-C8 column (4.6 mm x 25 cm) with UV detection (280 nm) . The following linear-gradient solvent system was used for this analysis :
Gradient Solvent System
0 50 50
2 50 50 20 20 80
35 20 80
37 50 50
45 50 50
A: 0.01 M aqueous sodium phosphate (pH 2.0) B. acetonitrile
The amount (percentages) of 6-hydroxy-2- (4- hydroxyphenyl) -3- [4- (2-pιperιdmoethoxy)benzoyl] - benzo[b]thiophene hydrochloride m the crystalline material (potency) was determined by the following method. A sample of the crystalline solid (5 mg) was weighed into a 100-mL volumetric flask, and dissolved in a 70/30 (v/v) mixture of
75 mM potassium phosphate buffer (pH 2.0) and acetonitrile. An aliquot of this solution (10 μ L) was assayed by high performance liquid chromatography, using a Zorbax Rx-C8 column (25 cm x 4.6 mm ID, 5 μparticle) and UV detection (280 nm) . The following gradient solvent system was used:
Gradient Solvent System (Potency)
Time (min) A (%) B (%) 0 70 30
12 70 30
14 25 75
16 70 30
25 70 30
A: 75 mM KH2P04 buffer (pH 2.0) B: acetonitrile
The percentage of 6-hydroxy-2- (4-hydroxyphenyl) -3- [4- (2- piperidinoethoxy)benzoyl]benzo[b]thiophene hydrochloride in the sample was calculated using the peak area, slope (m) , and intercept (b) of the calibration curve with the following equation:
% potency = peak area - b sample volume (mL) x m sample weight (mg)
The amount (percentage) of solvent, such as 1,2- dichloroethane, present in the crystalline material was determined by gas chromatography. A sample of the crystalline solid (50 mg) was weighed into a 10-mL volumetric flask, and dissolved in a solution of 2-butanol (0.025 mg/mL) in dimethylsulfoxide. A sample of this solution was analyzed on a gas chromatograph using a DB Wax column (30 m x 0.53 mm ID, 1 μ particle) , with a column flow of 10 mL/min and flame ionization detection. The column temperature was heated from
35°C to 230°C over a 12 minute period. The amount of solvent was determined by comparison to the internal standard (2- butanol) .
Example 1
E-t-Butyl 4, 4 ' -Dimethoxystilbenyl Sulfoxide A. Preparation of E-t-Butyl 4, 4 ' -Dimethoxystilbenyl
Sulfide
A solution of desoxyanisoin (12.82 g) in tetrahydrofuran (100 mL) was treated with titanium (IV) chloride (10.43 g) . During the dropwise addition of titanium (IV) chloride, the reaction mixture was cooled to maintain the temperature below 35°C. Upon complete addition, the resulting mixture was stirred at 30°C. After an additional 30 minutes, this mixture was treated with a solution of 2-methyl-2-propane- thiol (6.76 mL) and triethylamine (16.70 mL) in tetrahydro¬ furan (15 mL) . The resulting mixture was stirred at 50°C. After two hours, the mixture was added to ten percent sodium carbonate (500 mL) . The resulting mixture was extracted with methylene chloride. The combined methylene chloride extracts were dried over magnesium sulfate, filtered, and concentrated in vacuo to give 17.2 g of an oil, which crystallized upon cooling to room temperature. This crystalline material was recrystallized from hot ethanol to give 12.3 g of the title compound. Melting point 71-73°C.
Analysis calculated for C20H24O2S: C, 73.13; H, 7.36; S, 9.76. Found: C, 73.37; H, 7.51; S, 9.87.
B. Preparation of E-t-Butyl 4, 4 ' -Dimethoxystilbenyl
Sulfoxide
The crystalline compound prepared as described in Example IA was dissolved in toluene (150 mL) , and the resulting solution cooled to about -20°C. The cold solution was treated with peracetic acid (32% w/w in dilute acetic acid, 1.24 g) over ten minutes. The resulting mixture was
extracted with saturated sodium sulfite and brine. The organic phase was concentrated in vacuo . The residue was recrystallized from ethyl acetate/heptane to give 14.11 g of the title compound. Melting point 104°C (dec) . Analysis calculated for C20H24O3S: C, 69.74; H, 7.02; S, 9.31. Found: C, 69.47; H, 7.04; S, 9.54.
Example 2
Z-t-Butyl 4, ' -Dimethoxystilbenyl Sulfoxide A. Preparation of t-Butyl 4-Methoxybenzyl Sulfide
A mixture of 4-methoxybenzyl alcohol (10.13 g) and zinc iodide (11.7 g) in 1, 2-dichloroethane (120 mL) was treated with 2-methyl-2-propanethiol (9.92 mL) in one portion. The resulting mixture was stirred at room temperature. After about 18 hours, the reaction was diluted with water (100 mL) and methylene chloride (100 mL) . The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated in vacuo to give 14.4 g of an oil. !H NMR (CDCI3) : δ7.28 (d, 2H) , 6.85 (d, 2H) , 3.77
(s, 3H) , 3.73 (s, 2H) , 1.36 (s, 9H) .
13C NMR (CDCI3) : 5130, 114, 56, 35, 32.
Analysis calculated for Cι2Hι8OS: C, 68.52; H, 8.63.
Found: C, 68.8; H, 8.67.
B. Preparation of Z-t-Butyl 4, 4 'Dimethoxystilbenyl Sulfide
A solution of the compound prepared as described in Example 2A (2.51 g) in tetrahydrofuran (50 mL) was cooled to about -20°C. This cold solution was treated with a solution of n-butyllithium in hexane (1.6 M, 7.47 mL) over ten minutes. The resulting solution was allowed to warm to about 0°C over 35 minutes. This cold solution was treated with p- anisaldehyde (1.46 mL) . After an additional 15 minutes, the reaction solution was treated with methanesulfonyl chloride (0.95 mL) . The resulting reaction was allowed to warm to room temperature. After an additional 45 minutes, the
reaction mixture was treated with a solution of potassium t- butoxide in tetrahydrofuran (1.0 M, 12.0 mL) . After an additional 45 minutes, the reaction was quenched by the addition of IN hydrochloric acid (12.0 mL) . The organic phase was separated, dried over magnesium sulfate, filtered, and concentrated to an oil (4.4 g) .
!H NMR (CDCI3) : δ7.95 (d, H) , 7.05 (s, H) , 6.9 (d, H) ,
6.8 (dd, 2H) , 3.75 (s, 3H) , 0.95 (s, 9H) .
13C NMR (CDCI3) : δl53, 139, 137, 114, 56, 32.
C. Preparation of Z-t-Butyl 4, 4 ' -Dimethoxystilbenyl
Sulfoxide
The compound from Example 2B was converted to the title compound using the procedure substantially as described in Example IB.
XH NMR (CDCI3) : δ7.61 (d, H) , 7.56 (d, H) , 7.1 (s, H) ,
6.9 (dd, 2H) , 3.83 (s, 3H) , 1.05 (s, 9H) .
13C NMR (CDCI3): δl42, 132.5, 131, 118, 117, 56, 24. Analysis calculated for C20H24O3S: C , 69.74; H, 7.02.
Found: C, 69.98; H, 6.94.
Example 3
E and Z-t-Butyl 4, 4 ' -Dimethoxystilbenyl Sulfoxide A. Preparation of t-Butyl 4-Methoxybenzyl Sulfide
A mixture of 4-methoxybenzyl alcohol (10.13 g) and zinc iodide (11.7 g) in 1, 2-dichloroethane (120 mL) was treated with 2-methyl-2-propanethiol (9.92 mL) in one portion. The resulting mixture was stirred at room temperature. After about 18 hours, the reaction was diluted with water (100 mL) and methylene chloride (100 mL) . The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated in vacuo to give 14.4 g of an oil. iH NMR (CDCI3) : δ7.28 (d, 2H) , 6.85 (d, 2H) , 3.77
(s, 3H) , 3.73 (s, 2H) , 1.36 (s, 9H) .
13C NMR (CDCI3) : δl30, 114, 56, 35, 32.
Analysis calculated for C12H18OS: C, 68.52; H, 8.63. Found: C, 68.8; H, 8.67.
B. Preparation of t-Butyl 4-Methoxybenzyl Sulfoxide
A solution of the compound prepared as described in Example 3A (14.4 g) in 1,2-dichloroethane (50 mL) was cooled to about 5°C and the cold solution treated with peracetic acid (32% w/w in dilute acetic acid, 14.2 mL) over 30 minutes. Upon complete addition of the peracetic acid, the reaction was treated with brine and sodium bicarbonate. The organic phase was removed, dried over magnesium sulfate, filtered, and concentrated to a yellow precipitate. This residue was treated with hexane (100 mL) and the resulting mixture stirred at room temperature. After about 18 hours, the mixture was filtered and the solids washed with hexane (100 mL) . The solid material was dried in vacuo to give 14.07 g of the title compound. Melting point 124-126°C. !H NMR (CDCI3) : δ7.26 (d, 2H) , 6.89 (d, 2H) , 3.79 (d, H) , 3.78 (s, 3H) , 3.58 (d, H) , 1.3 (s, 9H) . 13C NMR (CDCI3) : δl32, 114, 56, 53, 23.
Analysis calculated for Ci2Hι80 S : C , 63 . 68 ; H , 8 . 02 .
Found : C , 63 . 72 ; H , 7 . 93 .
C. Preparation of E and Z-t-Butyl 4,4 ' -Dimethoxystilbenyl
Sulfoxide
A solution of the compound prepared as described in Example 3B (10.0 g) in tetrahydrofuran (140 mL) was cooled to about -30° to -25°C (dry ice/acetone bath) . This cold solution was treated with n-butyllithium in cyclohexane (1.6 M, 27.65 mL) over 25 minutes. After stirring for 35 minutes, the reaction mixture was treated with p-anisaldehyde (5.4 mL) . The dry ice/acetone bath was removed and the reaction allowed to warm to about 20°C. This mixture was treated with methanesulfonyl chloride (3.5 mL) . The temperature of the reaction rose from about 20° to about 35°C
upon addition of the methanesulfonyl chloride. The mixture was cooled to about 25°C, then treated with potassium t- butoxide in tetrahydrofuran (1 M, 50.9 mL) . After stirring for an additional 35 minutes, the reaction was treated with IN hydrochloric acid (51.0 mL) . The phases were separated; and the organic layer dried over magnesium sulfate, filtered, and concentrated to an oil (16.67 g) . This material was used in the next step without further purification. The carbon and proton NMR spectra were similar to that obtained for the compound prepared as described in Examples 1 and 2.
Example 4
Z-t-Butyl 4,4 ' -Dimethoxystilbenyl Sulfoxide
A solution of the compound prepared as described in
Example 3B (3.0 g) in tetrahydrofuran (40 mL) was cooled to about -15°C. This cold solution was treated with n- butyllithium in cyclohexane (1.6 M, 8.3 mL) over 15 minutes. After stirring for ten minutes, the reaction mixture was warmed to 0°C, and treated with p-anisaldehyde (1.61 mL) .
The ice bath was removed and the reaction allowed to warm to about room temperature. This mixture was treated with acetyl chloride (0.95 mL) . After about one hour, the reaction mixture was treated with potassium t-butoxide in tetrahydrofuran (1 M, 16.0 mL) . After stirring for an additional 1.5 hours, the reaction was treated with IN hydrochloric acid (17.0 mL) . The phases were separated, and the organic layer dried over magnesium sulfate, filtered, and concentrated to an oil (5.26 g) . This material was used without further purification. The carbon and proton NMR spectra were similar to that obtained for the compound prepared as described in Example 2.
Example 5 6-Methoxy-2- (4-methoxyphenyl)benzo[b] thiophene
A solution of p-toluenesulfonic acid monohydrate
(2.25 g) in toluene (60 mL) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. Using a nitrogen gas purge vented through the top of the condenser, a solution of the compound prepared as described in Example 1 (2.04 g) in toluene (33 mL) was added to the refluxing acid solution over 1.5 hours. The resulting mixture was cooled to about 5°C under the nitrogen purge, then treated with water (8 mL) . The resulting slurry was stirred for three hours. The slurry was filtered, and the crystalline product washed with water (8 mL) and acetone
(8 mL) . The crystalline product was dried in vacuo at 40°C for about 18 hours to give 1.30 g of the title compound as a light tan solid. This compound was identical to the compound prepared by a published route. Melting Point 196-199°C.
Example 6 6-Methoxy-2- (4-methoxyphenyl)benzo[b]thiophene
A solution of p-toluenesulfonic acid monohydrate (2.49 g) in toluene (108 mL) was heated to reflux, and water was removed by allowing it to collect in a Dean-Stark trap. A solution of the compound prepared as described in Example 1 (9.00 g) in toluene (32 mL) was added to the refluxing acid solution over six hours. Upon complete addition, absolute ethanol (35 mL) was added to the reaction solution, and the resulting mixture was allowed to cool to room temperature. After about 18 hours, a precipitate was isolated by filtration. This precipitate was washed with toluene/ absolute ethanol (4:1, 29 mL) , and dried in vacuo at 40°C for about 18 hours to give 4.86 g of a solid. This compound was identical to the compound prepared by a published route. Melting point 199-200°C.
Example 7
6-Hydroxy-2- (4-hydroxyphenyl) -3- [4- (2-piperidinoethoxy) - benzoyl]benzo[b]thiophene Hydrochloride 1, 2-Dichloroethane Solvate A. Preparation of Ethyl 4- (2-Piperidinoethoxy)benzoate
A mixture of ethyl 4-hydroxybenzoate (8.31 g) , l-(2- chloroethyl)piperidine monohydrochloride (10.13 g) , potassium carbonate (16.59 g) , and methyl ethyl ketone (60 mL) was heated to 80°C. After one hour, the mixture was cooled to about 55°C and treated with additional 1- (2-chloroethyl) - piperidine monohydrochloride (0.92 g) . The resulting mixture was heated to 80°C. The reaction was monitored by thin layer chromatography (TLC) , using silica-gel plates and ethyl acetate/acetonitrile/triethylamine (10:6:1, v/v) . Additional portions of 1- (2-chloroethyl)piperidine hydrochloride are added until the starting 4-hydroxybenzoate ester is consumed. Upon complete reaction, the reaction mixture was treated with water (60 mL) and allowed to cool to room temperature. The aqueous layer was discarded and the organic layer concentrated in vacuo at 40°C and 40 mm Hg. The resulting oil was used in the next step without further purification.
B. Preparation of 4- (2-Piperidinoethoxy)benzoic Acid Hydrochloride
A solution of the compound prepared as described in Example 7A (about 13.87 g) in methanol (30 mL) was treated with 5 N sodium hydroxide (15 L) , and heated to 40°C. After 4 1/2 hours, water (40 mL) was added. The resulting mixture was cooled to 5-10°C, and concentrated hydrochloric acid (18 mL) was added slowly. The title compound crystallized during acidification. This crystalline product was collected by filtration, and dried in vacuo at 40-50°C to give 83% yield of the title compound. Melting point 270-271°C.
C. Preparation of 4- (2-Piperidinoethoxy)benzoyl Chloride Hydrochloride A solution of the compound prepared as described in Example 7B (30.01 g) and dimethylformamide (2 mL) in methylene chloride (500 mL) was treated with oxalyl chloride (10.5 mL) over a 30-35 minute period. After stirring for about 18 hours, the reaction was assayed for completion by HPLC analysis. Additional oxalyl chloride may be added to the reaction if the starting carboxylic acid is present. Upon completion, the reaction solution was evaporated to dryness in vacuo . The residue was dissolved in methylene chloride (200 mL) , and the resulting solution evaporated to dryness. This dissolution/evaporation procedure was repeated to give the title compound as a solid. The title compound may be stored as a solid or as a 0.2 M solution in methylene chloride (500 mL) .
D. Preparation of 6-Hydroxy-2- (4-hydroxyphenyl) -3- [4- (2- piperidinoethoxy)benzoyl]benzo[b] thiophene Hydrochloride
1, 2-Dichloroethane Solvate A mixture of the compound prepared as described in
Example 5 or β (2.92 g), the compound prepared as described in Example 7C (3.45 g) , and 1,2-dichloroethane (52 mL) was cooled to about 0°C. Boron trichloride gas was condensed into a cold graduated cylinder (2.8 mL) , and added to the cold mixture described above. After eight hours at 0°C, the reaction mixture was treated with additional boron trichloride (2.8 mL) . The resulting solution was heated to 35°C. After 16 hours, the reaction was complete.
Methanol (30 mL) was treated with the reaction mixture from above over a 20-minute period, causing the methanol to reflux. The resulting slurry was stirred at 25°C. After one hour, the crystalline product was filtered, washed with cold methanol (8 mL) , and dried at 40°C in vacuo to give 5.14 g of the title compound. Melting point 225°C. Potency: 86.8%
1,2-Dichloroethane: 6.5% (gas chromatography)
Claims (37)
- We claim:A compound of the formula0wherein:Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group.
- 2. A compound as claimed in Claim 1 wherein:Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
- 3. A compound as claimed in Claim 2 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl or aryl (C1-C10 alkyl) group.
- 4. A compound as claimed in Claim 3 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group.
- A compound as claimed in Claim 4 wherein: Rl is hydrogen or C1-C4 alkoxy; and R2 is hydrogen or C1-C4 alkoxy.
- 6. A compound as claimed in Claim 5 wherein and R2 are C1-C4 alkoxy.
- 7. A compound as claimed in Claim 6 wherein R3 is t-butyl.
- 8. A compound as claimed in Claim 5 wherein Ri and R2 are methoxy.
- 9. A compound as claimed in Claim 1 of the formulawherein:Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; andR3 is a thermally-labile or acid-labile C2-Cιo alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group.
- 10. A compound as claimed in Claim 10 wherein R and R2 are methoxy, and R3 is t-butyl.
- 11. A compound as claimed in Claim 1 of the formulaIIZwherein:Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; and R3 is a thermally-labile or acid-labile C2-C10 alkyl, C4-C10 alkenyl, or aryl (C1-C10 alkyl) group.
- 12. A compound as claimed in Claim 11 wherein Ri and R2 are methoxy, and R3 is t-butyl.
- 13. A process for preparing a compound of the formula0II wherein:R is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; andR3 is a thermally-labile or acid-labile C2-C10 alkyl, C4- C10 alkenyl, or aryl(Cι-Cιo alkyl) group having a tertiary carbon atom adjacent to the sulfur atom; comprising the steps of:(1) oxidizing a benzyl sulfide of the formula:wherein R2 and R3 are as defined above; with an oxidizing agent to produce a benzyl sulfoxide of the formula:wherein R2 and R3 are as defined above; (2) reacting said benzyl sulfoxide with a first strong base to form a benzylic anion;(3) condensing said benzylic anion with a benzaldehyde of the formulawherein R is as defined above;(4) reacting the condensation product from step 3 with an acid chloride to produce an ester of the formulawherein:Rl, R2, and R3 are as defined above; andR4 is CO(Cι-Cg alkyl), CO (aryl) , CO (arylalkyl) , S02(Cι~Cg alkyl), S02(aryl) , S02 (arylalkyl) , C02 (Ci-Cg alkyl) , Cθ2(aryl) , CO2 (arylalkyl) , or CON(Cι-Cg alkyl) ; and(5) treating said ester with a second strong base.
- 14. The process of Claim 13 wherein:Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
- 15. The process of Claim 14 wherein R3 is a thermally-labile or acid-labile C2-Cιo alkyl or aryl(Cι-Cιo alkyl) group, having a tertiary carbon atom adjacent to the sulfur atom.
- 16. The process of Claim 15 wherein the oxidizing agent is peracetic acid.
- 17. The process of Claim 16 wherein the first stong base is an alkyllithium.
- 18. The process of Claim 17 wherein the first strong base is n-butyllithium.
- 19. The process of Claim 17 wherein the acid chloride is a sulfonyl chloride, and R4 is SO2 (Ci-Cg alkyl), Sθ2(aryl), or SO2 (arylalkyl) ..
- 20. The process of Claim 19 wherein the sulfonyl chloride is methanesulfonyl chloride.
- 21. The process of Claim 17 wherein the second strong base is a metal alkoxide.
- 22. The process of Claim 19 wherein the metal alkoxide is potassium t-butoxide.
- 23. The process of Claim 22 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group, having a tertiary carbon atom adjacent to the sulfur atom.
- 24. The process of Claim 17 wherein Ri and R2 are methoxy, and R3 is t-butyl.
- 25. A process for preparing a compound of the formulaIIZ wherein:Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; andR3 is a thermally-labile or acid-labile C2-C o alkyl, C4- C10 alkenyl, or aryl (C1-C10 alkyl) group having a tertiary- carbon atom adjacent to the sulfur atom; comprising the steps of: (1) reacting a benzyl sulfide of the formula:wherein R2 and R3 are as defined above; with a first strong base to form a benzylic anion;(2) condensing said benzylic anion with a benzaldehyde of the formulawherein Ri is as defined above;(3) reacting the condensation product from step 2 with an acid chloride to produce an ester of the formula -3iwherein:Rl, R2, and R3 are as defined above; andR4 is CO(Cι-Cg alkyl), CO(aryl), CO(arylalkyl) , SO2 (Ci-Cβ alkyl), Sθ2<aryl), SO2 (arylalkyl) , CO2 (C\-Ce alkyl), C02(aryl), C02 (arylalkyl) , or CON(Cι-Cg alkyl)2;(4) treating said ester with a second strong base to produce a styryl sulfide of the formula;wherein Ri, R2, and R3 are as defined above; and (5) oxidizing said styryl sulfide with an oxidizing agent.
- 26. The process of Claim 25 wherein:Rl is hydrogen, C1-C4 alkoxy, or arylalkoxy; and R2 is hydrogen, C1-C4 alkoxy, or arylalkoxy.
- 27. The process of Claim 26 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl or aryl(Cι-Cιo alkyl) group, having a tertiary carbon atom adjacent to the sulfur atom.
- 28. The process of Claim 26 wherein the oxidizing agent is peracetic acid.
- 29. The process of Claim 28 wherein the first stong base is an alkyllithium.
- 30. The process of Claim 29 wherein the first strong base is n-butyllithium.
- 31. The process of Claim 29 wherein the acid chloride is a sulfonyl chloride, and R4 is SO2 (Ci-Cg alkyl), Sθ2(aryl), or SO2 (arylalkyl) .
- 32. The process of Claim 31 wherein the sulfonyl chloride is methanesulfonyl chloride.
- 33. The process of Claim 29 wherein the second strong base is a metal alkoxide.
- 34. The process of Claim 33 wherein the metal alkoxide is potassium t-butoxide.
- 35. The process of Claim 34 wherein R3 is a thermally-labile or acid-labile C2-C10 alkyl group, having a tertiary carbon atom adjacent to the sulfur atom.
- 36. The process of Claim 29 wherein Ri and R2 are methoxy, and R3 is t-butyl.
- 37. A process for preparing a compound of the formulaXII wherein: Rδ is hydrogen, halo, amino, or hydroxyl;R9 is hydrogen, halo, amino, or hydroxyl;R5 and Rg are independently C1-C4 alkyl, or R5 and Rg together with the adjacent nitrogen atom form a heterocyclic ring selected from the group consisting of pyrrolidino, piperidino, hexamethyleneimino, and morpholino; andHX is HCl or HBr; comprising the steps of:(a) cyclizing in the presence of an acid catalyst a compound of the formula0wherein:Rl is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino;R2 is hydrogen, C1-C4 alkoxy, arylalkoxy, halo, or amino; andR3 is a thermally-labile or acid-labile C2-C 0 alkyl, C4-C10 alkenyl, or aryl(Cι-Cιo alkyl) group to prepare a benzothiophene compound of the formulawherein Ri and R2 are as defined above;(b) acylating said benzothiophene compound with an acylating agent of the formula wherein:R5, Rg, and HX are as defined previously; and R7 is chloro, bromo, or hydroxyl; in the presence of BX'3, wherein X" is chloro or bromo;(c) when R and/or R2 is C1-C4 alkoxy or arylalkoxy, dealkylatmg one or more phenolic groups of the acylation product of step (b) by reacting with additional B '3, wherein X' is as defined above; and(d) optionally isolating the formula XII compound.
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US08/478,706 US5659087A (en) | 1995-06-07 | 1995-06-07 | Diarylvinyl sulfoxides |
US08/483130 | 1995-06-07 | ||
PCT/US1996/009163 WO1996040691A1 (en) | 1995-06-07 | 1996-06-04 | Vinyl sulfoxides and a process for their synthesis |
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BR (1) | BR9608579A (en) |
CA (1) | CA2220145A1 (en) |
CZ (1) | CZ393097A3 (en) |
EA (1) | EA000405B1 (en) |
HU (1) | HUP9900922A3 (en) |
IL (1) | IL122090A0 (en) |
NO (2) | NO975578D0 (en) |
NZ (1) | NZ310179A (en) |
PL (1) | PL324035A1 (en) |
TR (3) | TR199701510T1 (en) |
WO (1) | WO1996040691A1 (en) |
Families Citing this family (2)
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EP1173160B1 (en) * | 1999-04-02 | 2005-06-22 | Temple University of the Commonwealth System of Higher Education | (e)-styryl sulfone anticancer agents |
US7964734B2 (en) | 2002-09-30 | 2011-06-21 | A/S Gea Farmaceutisk Fabrik | Raloxifene acid addition salts and/or solvates thereof, improved method for purification of said raloxifene acid addition salts and/or solvates thereof and pharmaceutical compositions comprising these |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU6100396A (en) * | 1995-06-07 | 1996-12-30 | Eli Lilly And Company | Process for the synthesis of vinyl sulfenic acid derivatives |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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US5512701A (en) * | 1995-06-07 | 1996-04-30 | Eli Lilly And Company | Process for the synthesis of vinyl sulfenic acid derivatives |
US5514826A (en) * | 1995-06-07 | 1996-05-07 | Eli Lilly And Company | Vinyl sulfenic acid derivatives |
-
1996
- 1996-06-04 KR KR1019970708842A patent/KR19990022362A/en not_active Application Discontinuation
- 1996-06-04 EP EP96918211A patent/EP0830361A4/en not_active Ceased
- 1996-06-04 WO PCT/US1996/009163 patent/WO1996040691A1/en not_active Application Discontinuation
- 1996-06-04 NZ NZ310179A patent/NZ310179A/en unknown
- 1996-06-04 BR BR9608579A patent/BR9608579A/en not_active Application Discontinuation
- 1996-06-04 TR TR97/01510T patent/TR199701510T1/en unknown
- 1996-06-04 IL IL12209096A patent/IL122090A0/en unknown
- 1996-06-04 CN CN96196167A patent/CN1192741A/en active Pending
- 1996-06-04 CZ CZ973930A patent/CZ393097A3/en unknown
- 1996-06-04 AU AU60920/96A patent/AU697352B2/en not_active Ceased
- 1996-06-04 HU HU9900922A patent/HUP9900922A3/en unknown
- 1996-06-04 PL PL96324035A patent/PL324035A1/en unknown
- 1996-06-04 TR TR1998/01495T patent/TR199801495T2/en unknown
- 1996-06-04 TR TR1998/01494T patent/TR199801494T2/en unknown
- 1996-06-04 EA EA199800028A patent/EA000405B1/en not_active IP Right Cessation
- 1996-06-04 JP JP9501552A patent/JPH11507061A/en active Pending
- 1996-06-04 CA CA002220145A patent/CA2220145A1/en not_active Abandoned
-
1997
- 1997-12-03 NO NO975578A patent/NO975578D0/en not_active Application Discontinuation
-
2000
- 2000-11-27 NO NO20005987A patent/NO20005987D0/en not_active Application Discontinuation
- 2000-12-15 CN CN00130779A patent/CN1341596A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU6100396A (en) * | 1995-06-07 | 1996-12-30 | Eli Lilly And Company | Process for the synthesis of vinyl sulfenic acid derivatives |
Also Published As
Publication number | Publication date |
---|---|
EA000405B1 (en) | 1999-06-24 |
NO20005987D0 (en) | 2000-11-27 |
HUP9900922A2 (en) | 1999-07-28 |
BR9608579A (en) | 1999-01-05 |
NO975578L (en) | 1997-12-03 |
IL122090A0 (en) | 1998-04-05 |
WO1996040691A1 (en) | 1996-12-19 |
CN1341596A (en) | 2002-03-27 |
HUP9900922A3 (en) | 2000-06-28 |
PL324035A1 (en) | 1998-05-11 |
TR199801494T2 (en) | 1998-09-21 |
EP0830361A1 (en) | 1998-03-25 |
KR19990022362A (en) | 1999-03-25 |
EP0830361A4 (en) | 1998-12-30 |
AU6092096A (en) | 1996-12-30 |
EA199800028A1 (en) | 1998-08-27 |
CN1192741A (en) | 1998-09-09 |
NZ310179A (en) | 1999-09-29 |
CZ393097A3 (en) | 1998-06-17 |
JPH11507061A (en) | 1999-06-22 |
NO5987A (en) | 1997-12-03 |
NO975578D0 (en) | 1997-12-03 |
TR199701510T1 (en) | 1998-03-21 |
CA2220145A1 (en) | 1996-12-19 |
TR199801495T2 (en) | 1998-09-21 |
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MK14 | Patent ceased section 143(a) (annual fees not paid) or expired |