WO1996037898A1 - Appareillage destine au conditionnement de faisceaux de rayons x - Google Patents

Appareillage destine au conditionnement de faisceaux de rayons x Download PDF

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Publication number
WO1996037898A1
WO1996037898A1 PCT/SK1996/000009 SK9600009W WO9637898A1 WO 1996037898 A1 WO1996037898 A1 WO 1996037898A1 SK 9600009 W SK9600009 W SK 9600009W WO 9637898 A1 WO9637898 A1 WO 9637898A1
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WO
WIPO (PCT)
Prior art keywords
diffractors
equipment
diffraction
crystal
successive
Prior art date
Application number
PCT/SK1996/000009
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English (en)
Inventor
Dusan KORYTÁR
Original Assignee
Korytar Dusan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korytar Dusan filed Critical Korytar Dusan
Publication of WO1996037898A1 publication Critical patent/WO1996037898A1/fr

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Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

Definitions

  • the presented invention relates to the equipment for X-ray beam conditioning, mainly for apparatus for X-ray diffractometiy.
  • crystal monochroma ⁇ ors or monochrocollimators significantly decreasing the angular divergence and wavelength spread of the X-ray beam coming from the X-ray tube are used in various areas of X-ray diffractometry. This decrease is due to the diffraction in one, usually horizontal plane.
  • the angular setting for a given wavelength according to the X-ray tube used and for a given crystal (mostly silicon or germanium) is given in the first approximation by the Bragg law.
  • the X-ray beam formed in this way falls at the sample attached to a precise goniometer allowing to measure with high angular resolution the diffraction curves characterizing the structure of a sample.
  • the advanced high resolution diffractometers utilize for the monochromatization and collimation three or four symmetrical or asymmetrical coplanar diffractions.
  • the monochrccollimator with three diffractions is based on two independent goniometers.
  • a channel-cut monolithic block with two diffractions in non-dispersive setting is attached to the first one, and to the second one a single crystal with the third diffraction set dispersively.
  • the monochrocollimator with four diffractions uses two goniometers, too.
  • a monolithic block with two diffractors in non-dispersive setting is attached to each of them while these two blocks are arranged dispersively relatively one to the other.
  • the advantage of this monochrocollimator is also the fact that the outcoming X-ray beam continues in the direction of the beam falling at the monochrocollimator from the X-ray generator.
  • this monochrocollimator contains at least three diffractors formed by the crystal walls of the leading channels.
  • the arrangement of the diffractors is such that the successive diffraction cones of symmetrical diffractors or deformed diffraction cones of asymmetrical diffractors share at least one generator.
  • the angle between the successive generators is just the vertex angle of its diffraction cone.
  • the reflection cones of this reflector share at least one generator with neighbouring diffractors or reflectors. At the same time, for each reflector the angle between the successive generators is just the vertex angle of the corresponding reflection cone.
  • the monochrocollimator is monolithic, formed from the only crystal. Coupling of the vertex angles of the diffraction cones of successive symmetrical or asymmetrical diffractors and/or between a symmetrical and an asymmetrical diffractor can be provided also by a rigid joint of two equal crystal materials or different ones. The joint is formed at the cut faces of these materials.
  • the main advantage of the monochrocollimator according to the invention is the fact that due to its compact form there is no need of two goniometers to adjust the angular position of two separate crystal blocks, which allows its miniaturization. In due course it has higher mechanical and thermomechanical stability and allows higher precision of the measurements and at the same time simpler manipulation and shorter time to prepare the measurements When using the asymmetrical diffractors it allows the beam com ⁇ ress ion or expansion in one direction at the decreased loss of intensity.
  • Fig.1 shows a monolithic monochrocollimator where four symmetrical diffractors are prepared in one crystal
  • Fig. 2 shows a monohthic monochrocolli mator where four symmetrical diffractors and one reflector are prepared in one crystal
  • Fig.3 shows a compact monochrocollimator prepared by joining two different crystal materials and consisting of two symmetrical and one asymmetrical diffractors.
  • the equipment for X-ray beam conditioning is attached either to the body of the goniometer or directly in the X-ray tube of the X-ray diffractometer.
  • the equipment for X-ray beam conditioning is attached either to the body of the goniometer or directly in the X-ray tube of the X-ray diffractometer.
  • ⁇ 0.178892 nm.
  • suitable combination of the lattice parameter, diffraction vectors, and the outward normals to the active surfaces of the diffractors for a given wavelength and for the required angular resolution and wavelength dispersion of the beam outcoming the monochrocollimator.
  • s I (-0.788;-0.616;0.000)
  • s II (0.788;0.616;0.000)
  • s III (0.999;0.040;0.013)
  • s IV (-0.999;-0.040;-0.013)
  • the primary beam from the X-ray generator about 1 mm wide, and with high angular divergence and wavelength dispersion falls in the channel 4 onto the crystal wall 11.
  • the secondary beam 3 with significantly decreased angular divergence and wavelength dispersion (spread) within the K ⁇ 1 line.
  • Secondary beam 3 conditioned in this way probes the measured sample (e.g. semiconductor substrate, heterostructure, multilayer, polycrystalline layer) attached to the goniometer of a high resolution diffractometer.
  • a monocrystal of silicon 12 is used as the crystal material in the example depicted in Fig.2.
  • the leading channels 4 are formed in such a way that for example after the second diffraction at the diffractor 52 the X-ray beam 21 passing through the transition channel 4 hits the wall of the monocrystal sihcon 12 under the angle lower than the critical angle (about 0.26 deg) by which fact the total reflection occurs and the small change of the direction of the passing X-ray beam 21 enables together with the further diffractions at diffractors 52 the optimal setting of the parameters of the secondary beam 3.
  • the monochrocollimator consists of two different monocrystal materials, namely monocrystal of germanium 11 and silicon 12, faces of which , cut under precisely adjusted angles, are bonded forming a rigid joint 7.
  • the cut angles correspond to the vertex angles of their diffraction cones.
  • the primary beam 2 after two symmetrical diffractions at walls of the germaniiim crystal 11 in transition channel 4 hits the asymmetric diffractor 53 in the transition channel 4 at the wail of the silicon crystal 12 which causes its about 100 times compression in which way the secondary beam 3 is adequately formed before its incidence at the tested sample.
  • the monochrocollimator according to the invention is advantageously exploitable at high resolution diffractometers and reflectometers used to characterize monocrystal and polycrystal materials and layers , as well as multilayers. It may be used for neutron and ⁇ - radiation considering the corresponding wavelengths.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

Appareillage destiné au conditionnement de faisceaux de rayons X, comprenant un monochromateur-collimateur compact constitué d'au moins trois dispositifs de diffraction (51) formés par les parois du matériau cristallin (11) dans les passages de guidage (4). L'agencement est tel que les cônes de diffraction successifs des dispositifs de diffraction (51) ont au moins une génératrice commune et que, pour chacun desdits dispositifs (51), l'angle entre les génératrices successives est précisément l'angle du sommet de son cône de diffraction.
PCT/SK1996/000009 1995-05-23 1996-05-20 Appareillage destine au conditionnement de faisceaux de rayons x WO1996037898A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SK68395A SK68395A3 (en) 1995-05-23 1995-05-23 Device for x-ray beam-forming
SKPV0683-95 1995-05-23

Publications (1)

Publication Number Publication Date
WO1996037898A1 true WO1996037898A1 (fr) 1996-11-28

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Application Number Title Priority Date Filing Date
PCT/SK1996/000009 WO1996037898A1 (fr) 1995-05-23 1996-05-20 Appareillage destine au conditionnement de faisceaux de rayons x

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SK (1) SK68395A3 (fr)
WO (1) WO1996037898A1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19945773A1 (de) * 1999-09-24 2001-04-12 Geesthacht Gkss Forschung Vorrichtung zum Monochromatisieren von Neutronen- oder Röntgenstrahlen
WO2005116771A2 (fr) * 2004-05-27 2005-12-08 Infineon Technologies Ag Selecteur de longueur d'onde pour la plage des rayons x a faible energie et la plage des ultraviolets extremes
EP1739687A2 (fr) * 2005-06-30 2007-01-03 Rigaku Corporation Monochromateur et analyseur à rayons X

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU373605A1 (ru) * 1970-11-03 1973-03-12 Способ рентгеноструктурного анализа
EP0635716A1 (fr) * 1993-07-19 1995-01-25 Koninklijke Philips Electronics N.V. Monochromateur asymétrique à 4 cristaux
WO1995005725A1 (fr) * 1993-08-16 1995-02-23 Commonwealth Scientific And Industrial Research Organisation Optique amelioree pour rayons x destinee notamment a l'imagerie a contraste de phase

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU373605A1 (ru) * 1970-11-03 1973-03-12 Способ рентгеноструктурного анализа
EP0635716A1 (fr) * 1993-07-19 1995-01-25 Koninklijke Philips Electronics N.V. Monochromateur asymétrique à 4 cristaux
WO1995005725A1 (fr) * 1993-08-16 1995-02-23 Commonwealth Scientific And Industrial Research Organisation Optique amelioree pour rayons x destinee notamment a l'imagerie a contraste de phase

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 197402, Derwent World Patents Index; Class J04, AN 1974-03076V, XP002013387 *
DATABASE WPI Section PQ Week 199511, Derwent World Patents Index; Class P81, AN 1995-080968, XP002013386 *
KORYTAR D: "Basic equations for multiple successive diffraction and angle distortion minimization in X-ray magnifiers", CZECHOSLOVAK JOURNAL OF PHYSICS, MAY 1990, CZECHOSLOVAKIA, vol. 40, no. 5, ISSN 0011-4626, pages 495 - 512, XP000600378 *

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19945773A1 (de) * 1999-09-24 2001-04-12 Geesthacht Gkss Forschung Vorrichtung zum Monochromatisieren von Neutronen- oder Röntgenstrahlen
DE19945773C2 (de) * 1999-09-24 2002-02-07 Geesthacht Gkss Forschung Vorrichtung zum Monochromatisieren von Neutronen- oder Röntgenstrahlen
WO2005116771A2 (fr) * 2004-05-27 2005-12-08 Infineon Technologies Ag Selecteur de longueur d'onde pour la plage des rayons x a faible energie et la plage des ultraviolets extremes
WO2005116771A3 (fr) * 2004-05-27 2006-06-08 Infineon Technologies Ag Selecteur de longueur d'onde pour la plage des rayons x a faible energie et la plage des ultraviolets extremes
EP1739687A2 (fr) * 2005-06-30 2007-01-03 Rigaku Corporation Monochromateur et analyseur à rayons X
EP1739687A3 (fr) * 2005-06-30 2009-08-19 Rigaku Corporation Monochromateur et analyseur à rayons X
US7684543B2 (en) 2005-06-30 2010-03-23 Rigaku Corporation X-ray beam conditioning device and X-ray analysis apparatus

Also Published As

Publication number Publication date
SK68395A3 (en) 1997-05-07

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