WO1993001517A1 - Liquid crystal display and method of manufacturing said display - Google Patents
Liquid crystal display and method of manufacturing said display Download PDFInfo
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- WO1993001517A1 WO1993001517A1 PCT/JP1992/000842 JP9200842W WO9301517A1 WO 1993001517 A1 WO1993001517 A1 WO 1993001517A1 JP 9200842 W JP9200842 W JP 9200842W WO 9301517 A1 WO9301517 A1 WO 9301517A1
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- liquid crystal
- spacer
- transparent conductive
- film
- crystal display
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13392—Gaskets; Spacers; Sealing of cells spacers dispersed on the cell substrate, e.g. spherical particles, microfibres
Definitions
- the present invention relates to a liquid crystal display device having a liquid crystal layer provided between two transparent insulating substrates and a method for manufacturing the liquid crystal display device.
- a liquid crystal display device having a liquid crystal layer provided between two transparent insulating substrates and a method for manufacturing the liquid crystal display device.
- the conventional liquid crystal display device 1 is manufactured as follows. First, an alkali elution preventing barrier film 3 is applied to both surfaces of each of two glass substrates 2. Also, a color filter 4 and the like are formed on the alkali elution preventing barrier film 3 on one substrate. On top of this, a transparent conductive film 5 is formed in a vacuum thin film process by sputtering so that the pixels can be turned on and off, and the upper surface is covered with an alignment film 6 to form two substrates. .
- a spacer 8 made of bead-like plastic or cylindrical glass fiber, etc. of several ⁇ to several tens yam is randomly arranged so that the liquid crystal layer 7 can maintain uniform dimensions.
- the other substrate is pasted thereon so that the alignment film 6 faces each other, and the liquid crystal is injected into the gap maintained by the spacer 8. in this way
- the polarizing film 9 is formed on both sides of one liquid crystal cell thus formed, and the liquid crystal display device 1 is configured.
- the spacer 8 Since the size of the spacer 8 varies, the thickness of the liquid crystal layer 7 varies according to the size of the spacer 8, and there is a limit in making the thickness of the liquid crystal layer 7 uniform. . 2. Since the spacer 8 has a minimum diameter of 10 to 15 mm, there is a limit in making the liquid crystal layer 7 thinner and improving the responsiveness. 3. Since the spacers 8 are randomly placed and arranged on the alignment film 6, the arrangement of the liquid crystal layers 7 in the gaps maintained by the spacers 8 is also random, and the liquid crystal layers 7 There is a limit in improving the display accuracy of.
- the present invention has been made in view of such problems of the conventional technology, and aims to make the thickness of the liquid crystal layer uniform, and to make the liquid crystal layer thinner to improve the responsiveness.
- Another object of the present invention is to provide a liquid crystal display device and a method for manufacturing the liquid crystal display device, which can improve the display accuracy of the liquid crystal layer by accurately arranging the liquid crystal layer and improving the display accuracy of the liquid crystal layer. ing.
- two facing transparent insulating substrates a transparent conductive film provided on each of the opposing surfaces of the transparent insulating substrates, A spacer for forming a space between the two transparent conductive films,
- a liquid crystal display device comprising: a liquid crystal layer filled in a space; and the spacer is formed on at least one of the transparent conductive films.
- a transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates used to face each other, and the two transparent insulating substrates are faced via a spacer
- a method of manufacturing a liquid crystal display device including a liquid crystal layer present in a space formed by a spacer a method of forming a transparent conductive film on one surface of one of the two transparent insulating substrates is provided.
- Step 1 a second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates, and a step of forming the transparent conductive film in the first step.
- a transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates used to face each other, and the two transparent insulating substrates are opposed to each other via a spacer. Let it be formed in a space A method of manufacturing a liquid crystal display device comprising a liquid crystal layer in a space defined by a first step of forming a transparent conductive film on one of the two transparent insulating substrates on one surface side thereof. A second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates; and a mask on a predetermined portion of the transparent conductive film formed in the first step.
- the spacer is sandwiched between a transparent conductive film between two transparent insulating substrates to form a space for a liquid crystal layer. Since the spacer is formed of an oxide film, the thickness of the film can be easily adjusted. The thickness of the liquid crystal layer can be made uniform by adjusting the thickness of the spacer uniformly. Further, since the spacer is formed of an oxide film, a thin film having a thickness of, for example, about 6 ⁇ can be manufactured. As a result, the liquid crystal layer can be made thinner, and the response can be improved.
- the spacer is formed of an oxide film, it can be arranged at a predetermined position with high accuracy by using a mask. As a result, the liquid crystal layer in the gap maintained by the spacer is positioned at a predetermined position. The display accuracy of the liquid crystal layer can be improved.
- the transparent insulating substrate is made of a flexible transparent plastic, a liquid crystal display device that is durable against bending can be obtained.
- a spacer is formed by forming a mask on a predetermined portion of a spacer oxide film and removing a non-mask portion by etching. Can be arranged at a predetermined position with high accuracy. Therefore, the liquid crystal layer can be arranged at a predetermined position, and the display accuracy of the liquid crystal layer can be improved.
- FIG. 1 is a sectional view showing a liquid crystal display device according to a first embodiment of the present invention.
- FIG. 2 is a cross-sectional view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
- FIG. 3 is a cross-sectional view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
- FIG. 4 is a perspective view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
- FIG. 5 shows a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
- FIG. 6 is a plan view showing a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
- FIG. 7 is a perspective view showing a transparent insulating substrate used in the liquid crystal display device according to the second embodiment of the present invention.
- FIG. 8 is a sectional view showing a conventional liquid crystal display device. BEST MODE FOR CARRYING OUT THE INVENTION Various embodiments of the present invention will be described below with reference to the drawings.
- FIG. 1 to 6 show a first embodiment of the present invention.
- This embodiment is an example of a liquid crystal display device having a thin film transistor (TFT) for turning on and off a pixel.
- TFT thin film transistor
- the liquid crystal display device 10 of the present embodiment has a liquid crystal cell and a polarizing plate.
- the liquid crystal cell consists of two glass substrates 11a and 11b, an alkaline elution preventing barrier film 12, a black matrix 13 and a color filter 14 and a color filter.
- the paper coat 15 of the reflector 14, the transparent conductive films 16 a and 16 b, the alignment film 17, the spacer 18, the liquid crystal layer 19, and the polarizing film 20 And a source / drain metal film 31, an omic contact film 32, an etching stopper 33, a carrier film 34, and a dielectric film 35 constituting the thin film transistor 30.
- a gate electrode film 36 is a gate electrode film 36.
- the liquid crystal display device 10 is manufactured by the following steps.
- a transparent conductive film 16a made of IT ⁇ (indium tin oxide) is formed on the overcoat 15 of the transparent insulating substrate 21a by a vacuum thin film process by sputtering. As shown in FIG. 6, the transparent conductive film 16a is formed as a pattern in which a plurality of transparent conductive films are arranged in parallel at equal intervals to form an electrode. Each transparent electrode 16a has a terminal 16c at its end.
- IT ⁇ indium tin oxide
- a spacer oxide film 18a for providing the spacer 18 is deposited to a thickness of 6 inches.
- a silicon oxide film is used as the spacer oxide film 18a.
- This silicon oxide film can be formed by, for example, a plasma CVD method, a sputtering method, or the like.
- the film is formed by a plasma CVD method. That is, the S i H 4 and N_ ⁇ 2 using a gas that is diluted with A r, in 1 0 0 ° ( ⁇ 2 0 0 substrate temperature ° C, forming a film of the S i ⁇ 2.
- a negative photoresist 22 is formed on the spacer oxide film 18a.
- a photomask is placed in place over the negative photoresist 22.
- Form 23 As shown in the plan view of FIG. 6, the light-transmitting region of the photomask 23 is a center position surrounded by each electrode of the liquid crystal display device 10 to be manufactured.
- the translucent regions of the photomask 23 are regularly arranged, for example, in a matrix.
- the negative photo resist 22 is irradiated with light in a state where the photo mask 23 is provided. After the exposure, development is performed to remove the negative photoresist 22 covered with the photomask 23. The photo resist 22 is left as a mask on the exposed portion.
- etching is performed by a dry etching method using a gas such as CF 4 or the like, as shown in FIG. 3, for a spacer which is not covered by the negative photoresist 22.
- the unmasked portion of the oxide film 18a is removed, and the remaining spacer oxide film 18a forms a spacer 18.
- the spacers 18 are formed at regular intervals according to the position of the photomask 23 and have a constant size.
- the substrate is washed to remove the photoresist 22 as a mask.
- An alignment film 17 is formed in a portion where the spacer 18 does not exist, and a liquid crystal layer 19 is injected thereon.
- an alkali elution prevention barrier film 12 is applied to both sides and sintered, and the other transparent insulating substrate 2 1 Prepare b.
- a gate electrode film 36 is formed on a part of one surface of the transparent insulating substrate 21b.
- a dielectric film 35 is formed on the gate electrode film 36 and on the alkali elution preventing barrier film 12 by using a plasma CVD device.
- a transparent The light conductive film 16b is formed by sputtering. As shown in FIG. 6, the transparent conductive film 16b is formed as a pattern in which a plurality of transparent conductive films are arranged in parallel at equal intervals to form an electrode. Each transparent conductive film 16 b has a terminal 16 c at an end. These electrodes are arranged so as to be orthogonal to the electrodes of the transparent insulating substrate 21a.
- a carrier film 34 is formed above the gate electrode film 36 via a dielectric film 35, and an etching stopper 33 is formed on a part of the carrier film 34.
- An ohmic 'contact film 32 is formed on the carrier film 34 so as to cover the etching stopper 33.
- a source / drain metal film 31 is formed on the ohmic contact film 32, and the orientation film 1 covers the source / drain metal film 31 and the transparent conductive film 16b.
- Source 'drain metal film 31, ohmic contact film 32, etching stopper 33, carrier film 34, dielectric film 35, and gate electrode film 36 constitutes the thin-film transistor 30.
- the other prepared transparent insulating substrate 21b is placed on the spacer 18 and the liquid crystal layer 19 of the transparent insulating substrate 21a, with the transparent conductive films 16a and 16b inside. And stick them together.
- a polarizing film 20 is formed on both sides of the manufactured liquid crystal cell to constitute a liquid crystal display device 10.
- the two transparent insulating substrates 21a and 21b are arranged with the transparent conductive films 16a and 16b facing each other. A gap between each transparent conductive film 16a and 16b A space between them. In the space between the transparent conductive films 16a and 16b, a liquid crystal layer 19 is interposed in a region where the spacer 18 does not exist.
- a spacer 18 is sandwiched between transparent conductive films 16 a and 16 b between two transparent insulating substrates 21 a and 21 b, and a liquid crystal layer 19 is present.
- Form a space for The spacer 18 is formed of an oxide film. Therefore, it is easy to adjust the thickness of the film.
- the thickness of the liquid crystal layer 19 can be made uniform by adjusting the thickness of the spacer 18 uniformly.
- the spacer 18 is formed by a film forming technique, it can be manufactured as thin as about 6 ⁇ . As a result, the liquid crystal layer 19 can be made thinner, and the response can be improved.
- a mask of the photo resist 22 is formed on a predetermined portion of the oxide film 18a for a spacer, and an unmasked portion is removed by etching. Since the spacer 18 is formed, the spacer 18 can be arranged at a predetermined position with high accuracy. Therefore, the liquid crystal layer 19 can be arranged at a predetermined position in the space held by the spacer 18, and the accuracy of the shape of the pixels of the liquid crystal layer 19 can be improved. As a result, the manufactured liquid crystal display device 10 can display with high accuracy.
- a transparent plate material for a substrate As a transparent plate material for a substrate, a transparent insulating substrate 21 a, which is formed by applying an alkali elution preventing barrier film 12 on both sides of a glass substrate 11 a, 11 b, is used. 2 lb is used.
- the transparent insulating substrate 41 is made of a flexible transparent plastic material.
- the transparent plastic is, for example, a polymer material such as polyester and polyimide.
- Products such as IC cards, card-type calculators, and pagers may be handled fairly violently.
- the glass substrate may be damaged by the application of bending force.
- the spacer can be fixedly arranged by the film forming technology, so that the transparent insulating substrate
- the surface of the liquid crystal display device can be bent to a flat surface, a concave surface, or a convex surface.
- a liquid crystal display device suitable for realizing a screen can be manufactured.
- This embodiment shows another method of manufacturing a liquid crystal display device.
- a transparent insulating substrate similar to that of the first embodiment is prepared, and a transparent conductive film is formed on one surface of the transparent insulating substrate.
- the photo resist mask is formed by printing.
- Another transparent insulating substrate similar to that of the first embodiment is placed on the spacer and the liquid crystal layer with the transparent conductive film inside, and bonded together with the transparent conductive film inside.
- a polarizing film is formed on both sides of the manufactured liquid crystal cell to constitute a liquid crystal display device.
- the spacer 18 may be formed by forming a mask on a predetermined portion of the transparent conductive film and growing an oxide film on a non-mask portion of the transparent conductive film.
- the present invention is not limited thereto.
- a film of another insulating material may be used.
- a silicon nitride film can be used.
- the thickness of the oxide film is 6 m, but the present invention is not limited to this.
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Abstract
A liquid crystal display and a method of manufacturing said display for improving display accuracy of liquid crystal layers by making the thichnesses of said layers uniform, reducing said thicknesses for better response capability, and setting said layers in more exact arrangement. A transparent electrically conductive film (16a) is formed on one surface of a transparent insulating substrate (21a). Said substrate (21a) is coated for insulation with oxidized film (18a) for spacer. Masks are formed on specified parts of said oxidized film (18a) for spacer. Non-masked parts of said oxidized film (18a) are etched to form spacers (18). Then, the masks (22) are removed. Liquid cyrstal layers (19) are put into spaces in which the spacers (18) are present. The other transparent insulating substrate (21b) is arranged on the spacers (18) and liquid crystal layers (19) with a transparent electrically conductive film (16b) directed inside.
Description
明 細 書 液晶表示装置および液晶表示装置の製造方法 技術分野 本発明は、 2枚の透明絶縁基板の間に液晶層を設けて構成さ れる液晶表示装置および液晶表示装置の製造方法に関する。 背景技術 従来の液晶表示装置と しては、 例えば図 8 に示すようなもの がある。 TECHNICAL FIELD The present invention relates to a liquid crystal display device having a liquid crystal layer provided between two transparent insulating substrates and a method for manufacturing the liquid crystal display device. BACKGROUND ART As a conventional liquid crystal display device, for example, there is one as shown in FIG.
すなわち、 従来の液晶表示装置 1 は、 次のように して製造さ れる。 まず、 2枚のガラス基板 2 のそれぞれの両面にアルカ リ 溶出防止バリヤ膜 3 を塗布する。 また、 一方の基板のアルカ リ 溶出防止バリ ヤ膜 3上に、 カラ一フィルタ 4等を形成する。 そ の上に、 透明導電膜 5 をスパッタ リ ングによる真空薄膜ブロセ スで形成して画素のオン オフを行なえるように し、 その上を 配向膜 6 で覆って、 2枚の基板を形成する。 That is, the conventional liquid crystal display device 1 is manufactured as follows. First, an alkali elution preventing barrier film 3 is applied to both surfaces of each of two glass substrates 2. Also, a color filter 4 and the like are formed on the alkali elution preventing barrier film 3 on one substrate. On top of this, a transparent conductive film 5 is formed in a vacuum thin film process by sputtering so that the pixels can be turned on and off, and the upper surface is covered with an alignment film 6 to form two substrates. .
その一方の基板の上に、 液晶層 7 が均一の寸法を保てるよう 数 μ πι〜数十 ya mのビーズ状プラスチッ クまたは円筒状グラス フ ァイバ一等から成るスぺーサ 8 をランダムに配する。 その上 に、 配向膜 6 が向き合う よう にして他方の基板を貼 り合わせ、 スぺーサ 8 によ リ保たれた間隙に液晶を注入する。 このように
してできた 1 枚の液晶セルの両面に偏光膜 9 を形成して、 液晶 表示装置 1 が構成されている。 On one of the substrates, a spacer 8 made of bead-like plastic or cylindrical glass fiber, etc. of several μπι to several tens yam is randomly arranged so that the liquid crystal layer 7 can maintain uniform dimensions. . The other substrate is pasted thereon so that the alignment film 6 faces each other, and the liquid crystal is injected into the gap maintained by the spacer 8. in this way The polarizing film 9 is formed on both sides of one liquid crystal cell thus formed, and the liquid crystal display device 1 is configured.
しかしながら、 このような従来の技術では、 以下の 3つの問 題点があつた。 However, such conventional techniques have the following three problems.
すなわち、 1 . スぺーサ 8 の大きさにパラツキがあるため、 スぺーサ 8 の大きさに従って液晶層 7 の厚さもパラツキ、 液晶 層 7 の厚さの均一化を図るうえで限界があった。 2 . スぺーサ 8 は、 最小でも 1 0 〜 1 5 ΠΙの径を有するため、 液晶層 7 を よ り薄く し、 応答性を良好にするうえで限界があった。 3 . ス ぺーサ 8 は配向膜 6 の上にランダムに投入されて配されるため, スぺーサ 8 によ リ保たれた間隙内の液晶層 7 の配置もランダム とな り、 液晶層 7 の表示精度を改善する上で限界があった。 発明の開示 本発明は、 このような従来の技術が有する問題点に着目 して なされたもので、 液晶層の厚さの均一化を図 り、 また、 液晶層 をよ り薄く して応答性を良好にし、 さ らに、 液晶層の配置を正 確に して液晶層の表示精度を改善することができるように した 液晶表示装置および液晶表示装置の製造方法を提供すること を 目的と している。 That is, 1. Since the size of the spacer 8 varies, the thickness of the liquid crystal layer 7 varies according to the size of the spacer 8, and there is a limit in making the thickness of the liquid crystal layer 7 uniform. . 2. Since the spacer 8 has a minimum diameter of 10 to 15 mm, there is a limit in making the liquid crystal layer 7 thinner and improving the responsiveness. 3. Since the spacers 8 are randomly placed and arranged on the alignment film 6, the arrangement of the liquid crystal layers 7 in the gaps maintained by the spacers 8 is also random, and the liquid crystal layers 7 There is a limit in improving the display accuracy of. DISCLOSURE OF THE INVENTION The present invention has been made in view of such problems of the conventional technology, and aims to make the thickness of the liquid crystal layer uniform, and to make the liquid crystal layer thinner to improve the responsiveness. Another object of the present invention is to provide a liquid crystal display device and a method for manufacturing the liquid crystal display device, which can improve the display accuracy of the liquid crystal layer by accurately arranging the liquid crystal layer and improving the display accuracy of the liquid crystal layer. ing.
上記目的を達成するため本発明によれば、 2枚の対面する透 明絶縁基板と、 各透明絶縁基板の対向面にそれぞれ設けられた 透明導電膜と、 上記対向する透明導電膜の間に挟まれて配置さ れ、 両透明導電膜間に空間を形成するためのスぺーザと、 上記
空間に充填される液晶層と を有し、 上記スぺ一サは、 上記透明 導電膜の少なく とも一方の上に成膜されたものであるこ と を特 徴とする液晶表示装置が提供される。 In order to achieve the above object, according to the present invention, two facing transparent insulating substrates, a transparent conductive film provided on each of the opposing surfaces of the transparent insulating substrates, A spacer for forming a space between the two transparent conductive films, A liquid crystal display device, comprising: a liquid crystal layer filled in a space; and the spacer is formed on at least one of the transparent conductive films. .
また、 本発明によれば、 対面させて用いる 2枚の透明絶縁基 板の各対向面側に、 それぞれ透明導電膜を形成し、 2枚の透明 絶縁基板をスぺーサを介して対面させ、 スぺーザで形成される 空間に液晶層を存在させて構成される液晶表示装置の製造方法 において、 上記 2枚の透明絶縁基板の一方について、 その一方 の面側に透明導電膜を形成する第 1 の工程と、 上記 2枚の透明 絶縁基板の他方について、 その一方の面側に透明導電膜を形成 する第 2 の工程と、 前記第 1 の工程で透明導電膜が形成された 前記透明絶縁基板について、 該透明導電膜上に、 スぺーサ用酸 化膜で絶縁被覆する第 3 の工程と、 前記スぺーサ用酸化膜の所 定部分にマスク を形成する第 4 の工程と、 前記スぺ一サ用酸化 膜の非マスク部分をエッチング処理によ り除去し、 酸化膜スぺ ーサを形成する第 5 の工程と、 前記マスク を除去する第 6 のェ 程と、 前記酸化膜スぺーザの存在しない空間に液晶層を注入す る第 7 の工程と、 前記第 7 の工程で透明導電膜が形成された透 明絶縁基板を、 前記透明導電膜を内側に して前記酸化膜スぺー サおよび前記液晶層の上に配置する第 8 の工程と を有するこ と を、 特徴とする液晶表示装置の製造方法が提供される。 Further, according to the present invention, a transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates used to face each other, and the two transparent insulating substrates are faced via a spacer, In a method of manufacturing a liquid crystal display device including a liquid crystal layer present in a space formed by a spacer, a method of forming a transparent conductive film on one surface of one of the two transparent insulating substrates is provided. Step 1, a second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates, and a step of forming the transparent conductive film in the first step. A third step of insulatingly covering the substrate with a spacer oxide film on the transparent conductive film; a fourth step of forming a mask on a predetermined portion of the spacer oxide film; The unmasked portion of the oxide film for the sensor is etched. A fifth step of removing and forming an oxide film spacer; a sixth step of removing the mask; and a seventh step of injecting a liquid crystal layer into a space where the oxide film spacer does not exist. And an eighth step of disposing the transparent insulating substrate, on which the transparent conductive film is formed in the seventh step, on the oxide film spacer and the liquid crystal layer with the transparent conductive film inside. A method for manufacturing a liquid crystal display device, comprising:
さ らに、 本発明によれば、 対面させて用いる 2枚の透明絶縁 基板の各対向面側に、 それぞれ透明導電膜を形成し、 2枚の透 明絶縁基板をスぺーサを介して対面させ、 スぺ一ザで形成され
る空間に液晶層を存在させて構成される液晶表示装置の製造方 法において、 上記 2枚の透明絶縁基板の一方について、 その一 方の面側に透明導電膜を形成する第 1 の工程と、 上記 2枚の透 明絶縁基板の他方について、 その一方の面側に透明導電膜を形 成する第 2の工程と、 前記第 1 の工程で形成された透明導電膜 の所定部分にマス ク を形成する第 3 の工程と、 前記透明導電膜 の非マスク部分に、 酸化膜スぺーサを成長させる第 4 の工程と、 前記マスク を除去する第 5 の工程と、 前記酸化膜スぺ一サの存 在しない空間に液晶層を注入する第 6 の工程と、 前記第 2 のェ 程で透明導電膜が形成された透明絶縁基板を、 前記透明導電膜 を内側にして前記酸化膜スぺーサおよび前記液晶層の上に配置 する第 7の工程とを有すること を、 特徴とする液晶表示装置の 製造方法が提供される。 Further, according to the present invention, a transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates used to face each other, and the two transparent insulating substrates are opposed to each other via a spacer. Let it be formed in a space A method of manufacturing a liquid crystal display device comprising a liquid crystal layer in a space defined by a first step of forming a transparent conductive film on one of the two transparent insulating substrates on one surface side thereof. A second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates; and a mask on a predetermined portion of the transparent conductive film formed in the first step. A third step of forming an oxide film spacer on a non-mask portion of the transparent conductive film; a fifth step of removing the mask; and a third step of removing the mask. A sixth step of injecting a liquid crystal layer into a space in which no transparent film is present, and the transparent insulating substrate on which the transparent conductive film has been formed in the second step, and And a seventh step of disposing the liquid crystal layer on the liquid crystal layer. A method for manufacturing a liquid crystal display device is provided.
前記スぺーサは、 2枚の透明絶縁基板の間の透明導電膜の間 に挟まれ、 液晶層のための空間を形成する。 スぺーサは、 酸化 膜で形成されるため、 膜の厚さの調整が容易である。 スぺーサ の厚さを均一に調整することによって、 液晶層の厚さの均一化 を図ることができる。 また、 スぺーサは、 酸化膜で形成される ため、 例えば、 6 μ πι程度の薄いものを製造するこ とができる。 これによつて、 液晶層をよ リ薄いものと し、 応答性を良好にす ることができる。 The spacer is sandwiched between a transparent conductive film between two transparent insulating substrates to form a space for a liquid crystal layer. Since the spacer is formed of an oxide film, the thickness of the film can be easily adjusted. The thickness of the liquid crystal layer can be made uniform by adjusting the thickness of the spacer uniformly. Further, since the spacer is formed of an oxide film, a thin film having a thickness of, for example, about 6 μπι can be manufactured. As a result, the liquid crystal layer can be made thinner, and the response can be improved.
さ らに、 スぺーサは、 酸化膜で形成されるため、 マスク を用 いれば、 所定の位置に高い精度で配置することができる。 これ によ り、 スぺーサによ り保たれた間隙内の液晶層を所定の位置
に配置することができ、 液晶層の表示精度を改善するこ とがで きる。 Further, since the spacer is formed of an oxide film, it can be arranged at a predetermined position with high accuracy by using a mask. As a result, the liquid crystal layer in the gap maintained by the spacer is positioned at a predetermined position. The display accuracy of the liquid crystal layer can be improved.
透明絶縁基板が可撓性の透明プラスチッ クから構成される場 合には、 曲げに対し丈夫な液晶表示装置とするこ とができる。 When the transparent insulating substrate is made of a flexible transparent plastic, a liquid crystal display device that is durable against bending can be obtained.
液晶表示装置は、 スぺーサ用酸化膜の所定部分にマスク を形 成し、 非マスク部分をエッチング処理によ り除去するこ とによ つて、 スぺーザが形成されるため、 スぺーサを所定の位置に高 い精度で配置するこ とができる。 従って、 液晶層を所定の位置 に配置するこ とができ、 液晶層の表示精度を改善するこ とがで きる。 In a liquid crystal display device, a spacer is formed by forming a mask on a predetermined portion of a spacer oxide film and removing a non-mask portion by etching. Can be arranged at a predetermined position with high accuracy. Therefore, the liquid crystal layer can be arranged at a predetermined position, and the display accuracy of the liquid crystal layer can be improved.
液晶表示装置は、 透明導電膜の所定部分にマスク を形成し、 透明導電膜の非マスク部分に酸化膜を成長させることによって スぺーサを形成してもよい。 図面の簡単な説明 図 1 は、 本発明の第 1 実施例の液晶表示装置を示す断面図で ある。 In the liquid crystal display device, a spacer may be formed by forming a mask on a predetermined portion of the transparent conductive film and growing an oxide film on an unmasked portion of the transparent conductive film. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a sectional view showing a liquid crystal display device according to a first embodiment of the present invention.
図 2 は、 本発明の第 1 実施例の液晶表示装置の製造工程を示 す断面図である。 FIG. 2 is a cross-sectional view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
図 3 は、 本発明の第 1 実施例の液晶表示装置の製造工程を示 す断面図である。 FIG. 3 is a cross-sectional view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
図 4 は、 本発明の第 1 実施例の液晶表示装置の製造工程を示 す斜視図である。 FIG. 4 is a perspective view illustrating a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
図 5 は、 本発明の第 1 実施例の液晶表示装置の製造工程を示
す斜視図である。 FIG. 5 shows a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention. FIG.
図 6 は、 本発明の第 1 実施例の液晶表示装置の製造工程を示 す平面図である。 FIG. 6 is a plan view showing a manufacturing process of the liquid crystal display device according to the first embodiment of the present invention.
図 7 は、 本発明の第 2実施例の液晶表示装置で用いられる透 明絶縁基板を示す斜視図である。 FIG. 7 is a perspective view showing a transparent insulating substrate used in the liquid crystal display device according to the second embodiment of the present invention.
図 8 は、 従来例の液晶表示装置を示す断面図である。 発明を実施するための最良の形態 以下、 図面に基づき本発明の各種実施例を説明する。 FIG. 8 is a sectional view showing a conventional liquid crystal display device. BEST MODE FOR CARRYING OUT THE INVENTION Various embodiments of the present invention will be described below with reference to the drawings.
図 1 〜図 6 は本発明の第 1 実施例を示している。 本実施例は、 画素のオンオフを行なう薄膜トランジスタ ( T F T ) を有する 液晶表示装置の例である。 1 to 6 show a first embodiment of the present invention. This embodiment is an example of a liquid crystal display device having a thin film transistor (TFT) for turning on and off a pixel.
図 1 に示すように、 本実施例の液晶表示装置 1 0 は、 液晶セ ルと偏光板と を有する。 液晶セルは、 2枚のガラス基板 1 1 a, 1 1 b と、 アルカ リ溶出防止バリ ヤ膜 1 2 と、 ブラッ クマ ト リ ク ス 1 3 と、 カ ラーフ ィ ノレタ 1 4 と 、 カ ラー フ ィ フレタ 1 4 のォ ーパ一コー ト 1 5 と、 透明導電膜 1 6 a , 1 6 b と、 配向膜 1 7 と、 スぺーサ 1 8 と、 液晶層 1 9 と、 偏光膜 2 0 と、 薄膜 卜 ランジスタ 3 0 を構成するソース · ドレイ ンメ タル膜 3 1 、 ォ 一ミ ッ ク · コンタ ク 卜膜 3 2、 エッチングス ト ッパー 3 3 、 キ ャ リャ膜 3 4、 誘電膜 3 5 およびゲー ト電極膜 3 6 と を有して いる。 As shown in FIG. 1, the liquid crystal display device 10 of the present embodiment has a liquid crystal cell and a polarizing plate. The liquid crystal cell consists of two glass substrates 11a and 11b, an alkaline elution preventing barrier film 12, a black matrix 13 and a color filter 14 and a color filter. The paper coat 15 of the reflector 14, the transparent conductive films 16 a and 16 b, the alignment film 17, the spacer 18, the liquid crystal layer 19, and the polarizing film 20 And a source / drain metal film 31, an omic contact film 32, an etching stopper 33, a carrier film 34, and a dielectric film 35 constituting the thin film transistor 30. And a gate electrode film 36.
液晶表示装置 1 0 は、 以下の工程によ り製造される。 The liquid crystal display device 10 is manufactured by the following steps.
1 枚のガラス基板 1 1 aの両面に、 S i 02 から成るアル力
リ溶出防止バリ ヤ膜 1 2 を塗布し焼結して、 透明絶縁基板 2 1 a を構成する。 透明絶縁基板 2 1 a の一方の面に、 C r等を蒸 着し、 該 C r膜をフォ ト リ ソ グラフ法によ り必要箇所を残すこ と によ り、 ブラッ クマ ト リ ク ス 1 3 を形成する。 次に、 これら の上からカラーフ ィ ノレタ 1 4 を印刷する。 さ らに、 カラーフ ィ ルタ 1 4 の上に、 アク リル、 ウ レタ ン樹脂等の合成樹脂を用い たオーバーコー ト 1 5 を形成する。 Al force consisting of S i 0 2 on both sides of one glass substrate 1 1 a The re-elution prevention barrier film 12 is applied and sintered to form the transparent insulating substrate 21a. Cr is evaporated on one surface of the transparent insulating substrate 21a, and the Cr film is left by photolithography to leave necessary parts, thereby achieving a black matrix. Form 1 3. Next, a color filter 14 is printed from above. Further, an overcoat 15 is formed on the color filter 14 using a synthetic resin such as an acrylic resin or a urethane resin.
透明絶縁基板 2 1 a のオーバーコー ト 1 5 の上に、 I T 〇 (酸化イ ンジウム · スズ) から成る透明導電膜 1 6 a をスパッ タ リ ングによる真空薄膜プロセスで形成する。 透明導電膜 1 6 a は、 図 6 に示すよう に、 複数本が等間隔で並行配置されるパ タ ー ン と して形成されて電極を構成する。 各透明電極 1 6 a は、 それらの端部に端子 1 6 c を有する。 A transparent conductive film 16a made of IT 基板 (indium tin oxide) is formed on the overcoat 15 of the transparent insulating substrate 21a by a vacuum thin film process by sputtering. As shown in FIG. 6, the transparent conductive film 16a is formed as a pattern in which a plurality of transparent conductive films are arranged in parallel at equal intervals to form an electrode. Each transparent electrode 16a has a terminal 16c at its end.
基板の上に、 スぺーサ 1 8 を設けるためのスぺーサ用酸化膜 1 8 a を 6 inの厚さで堆積する。 スぺーサ用酸化膜 1 8 a と しては、 シ リ コン酸化膜が用い られる。 このシ リ コ ン酸化膜は、 例えば、 プラズマ C V D法、 スパッ タ リ ング法等によって成膜 する こ とができる。 こ こでは、 プラズマ C V D法によって成膜 している。 すなわち、 S i H 4および N〇 2 を A r で稀釈したガ ス を用いて、 1 0 0 ° ( 〜 2 0 0 °Cの基板温度で、 S i 〇 2 を成 膜する。 On the substrate, a spacer oxide film 18a for providing the spacer 18 is deposited to a thickness of 6 inches. As the spacer oxide film 18a, a silicon oxide film is used. This silicon oxide film can be formed by, for example, a plasma CVD method, a sputtering method, or the like. Here, the film is formed by a plasma CVD method. That is, the S i H 4 and N_〇 2 using a gas that is diluted with A r, in 1 0 0 ° (~ 2 0 0 substrate temperature ° C, forming a film of the S i 〇 2.
図 4 に示すよう に、 スぺーサ用酸化膜 1 8 a の上にネガ形フ オ ト レジス ト 2 2 を形成する。 図 2、 図 5 および図 6 に示すよ う に、 ネガ形フォ ト レジス ト 2 2 の上の所定部分にフォ トマス
ク 2 3 を形成する。 フォ トマスク 2 3 の透光領域は、 図 6 の平 面図に示すように、 製造される液晶表示装置 1 0 の各電極が囲 む中心位置である。 このフォ トマスク 2 3 の透光領域は、 規則 的に、 例えば、 マ ト リ クス状に、 配される。 As shown in FIG. 4, a negative photoresist 22 is formed on the spacer oxide film 18a. As shown in Figures 2, 5, and 6, a photomask is placed in place over the negative photoresist 22. Form 23. As shown in the plan view of FIG. 6, the light-transmitting region of the photomask 23 is a center position surrounded by each electrode of the liquid crystal display device 10 to be manufactured. The translucent regions of the photomask 23 are regularly arranged, for example, in a matrix.
フォ トマスク 2 3 が設けられた状態で、 ネガ形フォ ト レジス ト 2 2 に光照射する。 露光後、 現像して、 フォ トマスク 2 3で 覆われたネガ形フォ ト レジス 卜 2 2 を除去する。 露光した所定 部分には、 フォ ト レジス ト 2 2 がマスク と して残る。 The negative photo resist 22 is irradiated with light in a state where the photo mask 23 is provided. After the exposure, development is performed to remove the negative photoresist 22 covered with the photomask 23. The photo resist 22 is left as a mask on the exposed portion.
次に、 例えば、 C F 4等のガスを用いて、 ドライエッチング 法によ りエッチング処理すると、 図 3 に示すように、 ネガ形フ ォ ト レジス 卜 2 2 によ り覆われないスぺーサ用酸化膜 1 8 aの 非マスク部分が除去され、 残ったスぺーサ用酸化膜 1 8 a は、 スぺ一サ 1 8 を形成する。 スぺーサ 1 8 は、 フォ トマスク 2 3 の位置に応じて、 等間隔で、 一定寸法に形成される。 基板を洗 净して、 マスク と したフォ ト レジス ト 2 2 を除去する。 スぺー サ 1 8 の存在しない部分に、 配向膜 1 7 を形成し、 その上に、 液晶層 1 9 を注入する。 Next, for example, when etching is performed by a dry etching method using a gas such as CF 4 or the like, as shown in FIG. 3, for a spacer which is not covered by the negative photoresist 22. The unmasked portion of the oxide film 18a is removed, and the remaining spacer oxide film 18a forms a spacer 18. The spacers 18 are formed at regular intervals according to the position of the photomask 23 and have a constant size. The substrate is washed to remove the photoresist 22 as a mask. An alignment film 17 is formed in a portion where the spacer 18 does not exist, and a liquid crystal layer 19 is injected thereon.
—方、 他の 1 枚のガラス基板 1 l b については、 図 1 に示す ように、 その両面に、 アルカ リ溶出防止バリ ヤ膜 1 2 を塗布し 焼結して、 他の透明絶縁基板 2 1 b を準備する。 透明絶縁基板 2 1 bの一方の面の一部に、 ゲ一 卜電極膜 3 6 を形成する。 ゲ 一卜電極膜 3 6 を覆う と共に、 アルカ リ溶出防止バリ ヤ膜 1 2 の上に、 プラズマ C V D装置を用いて誘電膜 3 5 を形成する。 On the other hand, for 1 lb of another glass substrate, as shown in Fig. 1, an alkali elution prevention barrier film 12 is applied to both sides and sintered, and the other transparent insulating substrate 2 1 Prepare b. A gate electrode film 36 is formed on a part of one surface of the transparent insulating substrate 21b. A dielectric film 35 is formed on the gate electrode film 36 and on the alkali elution preventing barrier film 12 by using a plasma CVD device.
透明絶縁基板 2 l aの誘電膜 3 5の上に、 I T Oから成る透
明導電膜 1 6 b をスパッ タ リ ングによ り形成する。 図 6 に示す よう に、 透明導電膜 1 6 b は、 複数本が等間隔で並行配置され るパタ ー ン と して形成されて電極を構成する。 各透明導電膜 1 6 b は、 端部に端子 1 6 c を有する。 これらの電極は、 透明絶 縁基板 2 1 a の電極と直交するよ う に配置される。 On the dielectric film 35 of the transparent insulating substrate 2 la, a transparent The light conductive film 16b is formed by sputtering. As shown in FIG. 6, the transparent conductive film 16b is formed as a pattern in which a plurality of transparent conductive films are arranged in parallel at equal intervals to form an electrode. Each transparent conductive film 16 b has a terminal 16 c at an end. These electrodes are arranged so as to be orthogonal to the electrodes of the transparent insulating substrate 21a.
ゲー ト電極膜 3 6 の上方に、 誘電膜 3 5 を介 してキヤ リ ャ膜 3 4 を形成し、 その一部にエッチングス ト ッパー 3 3 を形成す る。 エッチングス ト ッパー 3 3 を覆って、 キヤ リ ャ膜 3 4 の上 に、 ォー ミ ッ ク ' コ ンタ ク ト膜 3 2 を形成する。 ォー ミ ッ ク · コンタ ク ト膜 3 2 の上に、 ソース · ドレイ ンメ タル膜 3 1 を形 成し、 ソース · ドレイ ンメ タル膜 3 1 と透明導電膜 1 6 b を覆 つて配向膜 1 7 を形成する。 A carrier film 34 is formed above the gate electrode film 36 via a dielectric film 35, and an etching stopper 33 is formed on a part of the carrier film 34. An ohmic 'contact film 32 is formed on the carrier film 34 so as to cover the etching stopper 33. A source / drain metal film 31 is formed on the ohmic contact film 32, and the orientation film 1 covers the source / drain metal film 31 and the transparent conductive film 16b. Form 7.
ソース ' ドレイ ンメ タル膜 3 1 と、 ォー ミ ッ ク · コンタ ク 卜 膜 3 2 と、 エッチングス ト ッパー 3 3 と、 キヤ リ ャ膜 3 4 と、 誘電膜 3 5 と、 ゲー ト電極膜 3 6 とは、 薄膜 ト ラ ンジスタ 3 0 を構成している。 Source 'drain metal film 31, ohmic contact film 32, etching stopper 33, carrier film 34, dielectric film 35, and gate electrode film 36 constitutes the thin-film transistor 30.
この準備した他の透明絶縁基板 2 1 b を、 透明絶縁基板 2 1 a のスぺーサ 1 8 および液晶層 1 9 の上に配置し、 透明導電膜 1 6 a , 1 6 b を内側に して貼 り合せる。 製造された液晶セル の両面に偏光膜 2 0 を形成して、 液晶表示装置 1 0 が構成され る。 The other prepared transparent insulating substrate 21b is placed on the spacer 18 and the liquid crystal layer 19 of the transparent insulating substrate 21a, with the transparent conductive films 16a and 16b inside. And stick them together. A polarizing film 20 is formed on both sides of the manufactured liquid crystal cell to constitute a liquid crystal display device 10.
こ う して製造された液晶表示装置 1 0 では、 2 枚の透明絶縁 基板 2 1 a, 2 1 b が、 透明導電膜 1 6 a, 1 6 b を、 対面さ せて配置される。 各透明導電膜 1 6 a, 1 6 b の間には、 スぺ
ーサ 1 8が挟まれ、 両者間に一定間隔の空間を構成している。 各透明導電膜 1 6 a, 1 6 b間の空間には、 スぺーサ 1 8 の存 在しない領域に、 液晶層 1 9 が挟まれて存在する。 In the liquid crystal display device 10 thus manufactured, the two transparent insulating substrates 21a and 21b are arranged with the transparent conductive films 16a and 16b facing each other. A gap between each transparent conductive film 16a and 16b A space between them. In the space between the transparent conductive films 16a and 16b, a liquid crystal layer 19 is interposed in a region where the spacer 18 does not exist.
図 1 において、 スぺーサ 1 8 は、 2枚の透明絶縁基板 2 1 a , 2 1 bの間の透明導電膜 1 6 a , 1 6 b の間に挟まれ、 液晶層 1 9 が存在するための空間を形成する。 スぺーサ 1 8 は、 酸化 膜で形成される。 このため、 膜の厚さの調整が容易である。 ス ぺ一サ 1 8 の厚さ を均一に調整することによって、 液晶層 1 9 の厚さの均一化を図ることができる。 In FIG. 1, a spacer 18 is sandwiched between transparent conductive films 16 a and 16 b between two transparent insulating substrates 21 a and 21 b, and a liquid crystal layer 19 is present. Form a space for The spacer 18 is formed of an oxide film. Therefore, it is easy to adjust the thickness of the film. The thickness of the liquid crystal layer 19 can be made uniform by adjusting the thickness of the spacer 18 uniformly.
また、 スぺーサ 1 8 は、 成膜技術で形成されるため、 6 μ πι 程度まで薄いものを製造することができる。 これによつて、 液 晶層 1 9 をよ り薄いものと し、 応答性を良好にするこ とができ る。 Further, since the spacer 18 is formed by a film forming technique, it can be manufactured as thin as about 6 μπι. As a result, the liquid crystal layer 19 can be made thinner, and the response can be improved.
さらに、 液晶表示装置 1 0 は、 スぺ一サ用酸化膜 1 8 aの所 定部分にフォ 卜 レジス ト 2 2 のマスク を形成し、 非マスク部分 をエッチング処理によ り除去するこ とによって、 スぺーサ 1 8 が形成されるため、 スぺーサ 1 8 を所定の位置に高い精度で配 置することができる。 従って、 スぺーサ 1 8 に リ保たれた空 間内で、 液晶層 1 9 を所定の位置に配置することができ、 液晶 層 1 9 の画素の形状の精度を改善するこ とができる。 これによ り、 製造された液晶表示装置 1 0では、 精度の高い表示を行な う ことができる c Further, in the liquid crystal display device 10, a mask of the photo resist 22 is formed on a predetermined portion of the oxide film 18a for a spacer, and an unmasked portion is removed by etching. Since the spacer 18 is formed, the spacer 18 can be arranged at a predetermined position with high accuracy. Therefore, the liquid crystal layer 19 can be arranged at a predetermined position in the space held by the spacer 18, and the accuracy of the shape of the pixels of the liquid crystal layer 19 can be improved. As a result, the manufactured liquid crystal display device 10 can display with high accuracy. C
次に、 本発明の第 2実施例について説明する。 Next, a second embodiment of the present invention will be described.
本実施例では、 液晶表示装置 1 0の他の構成を示すものであ
る。 In this embodiment, another configuration of the liquid crystal display device 10 is shown. You.
第 1 実施例では、 基板用の透明板材と して、 ガラス基板 1 1 a , 1 1 bの両面にアルカ リ溶出防止バリ ヤ膜 1 2 を塗布して 構成される透明絶縁基板 2 1 a, 2 l bが用いられるている。 これに対して、 本実施例では、 透明絶縁基板 4 1 を、 可撓性を 有する透明プラスチッ ク材から構成するものである。 透明ブラ スチッ クは、 例えば、 ポリエステル、 ポリ イ ミ ド等の高分子材 である。 In the first embodiment, as a transparent plate material for a substrate, a transparent insulating substrate 21 a, which is formed by applying an alkali elution preventing barrier film 12 on both sides of a glass substrate 11 a, 11 b, is used. 2 lb is used. On the other hand, in the present embodiment, the transparent insulating substrate 41 is made of a flexible transparent plastic material. The transparent plastic is, for example, a polymer material such as polyester and polyimide.
I Cカー ドやカー ド型電卓、 ポケッ トベル等の製品は、 かな り乱暴に取扱われるこ とがある。 これらに用いられる液晶表示 装置では、 曲げの力が加わることによって、 ガラス基板が破損 するおそれがある。 Products such as IC cards, card-type calculators, and pagers may be handled fairly violently. In the liquid crystal display devices used in these, the glass substrate may be damaged by the application of bending force.
これに対して、 前記実施例の方法では、 スぺ一サを、 成膜技 術によって固定的に配置するこ とができるため、 透明絶縁基板 On the other hand, in the method of the above embodiment, the spacer can be fixedly arranged by the film forming technology, so that the transparent insulating substrate
1 を、 可撓性を有し、 薄く 、 比較的柔らかい透明プラスチッ クによ り構成しても、 スぺーザが移動しない。 このため、 安定 した液晶層を形成することができる。 従って、 透明絶縁基板 4 1 が可撓性の透明プラスチッ クから構成される場合には、 よ り 薄く 、 かつ、 曲げに対し丈夫な液晶表示装置とするこ とができ る。 Even if 1 is formed of a flexible, thin, and relatively soft transparent plastic, the spacer does not move. For this reason, a stable liquid crystal layer can be formed. Therefore, when the transparent insulating substrate 41 is made of a flexible transparent plastic, a liquid crystal display device which is thinner and more durable against bending can be obtained.
また、 透明絶縁基板を、 可撓性のある、 薄い、 透明プラスチ ッ クから構成することによ り、 液晶表示装置の面を、 平面のほ か、 凹面または凸面に曲げることが可能となる。 例えば、 図 7 に示すような曲面を有する透明絶縁基板 4 1 を用いて、 超大型
-1 - Further, by forming the transparent insulating substrate from a flexible, thin, transparent plastic, the surface of the liquid crystal display device can be bent to a flat surface, a concave surface, or a convex surface. For example, using a transparent insulating substrate 41 having a curved surface as shown in FIG. -1-
画面の実現に適した液晶表示装置を製造するこ とができる。 A liquid crystal display device suitable for realizing a screen can be manufactured.
次に、 本発明の第 3実施例について説明する。 Next, a third embodiment of the present invention will be described.
本実施例では、 液晶表示装置の他の製造方法を示すものであ る。 This embodiment shows another method of manufacturing a liquid crystal display device.
図 1 〜図 3 に示すよう に、 第 1 実施例と同様の透明絶縁基板 を準備し、 透明絶縁基板の一方の面上に透明導電膜を形成する 次に、 透明導電膜の所定部分にネガ形フォ ト レジス 卜のマスク を印刷によ り形成する。 As shown in FIGS. 1 to 3, a transparent insulating substrate similar to that of the first embodiment is prepared, and a transparent conductive film is formed on one surface of the transparent insulating substrate. The photo resist mask is formed by printing.
ネガ形フォ ト レジス トに光照射した後、 現像する。 露光した 所定部分には、 フォ ト レジス トがマスク と して残る。 フオ ト レ ジス 卜によ り覆われない透明導電膜の非マスク部分に、 酸化膜 を成長させて、 スぺーサを形成させる。 スぺーサを形成後、 フ ォ 卜 レジス 卜のマスク を除去する。 スぺーザの存在しない領域 に、 配向膜を形成し、 その上から液晶層を注入する。 After irradiating the negative photo resist, develop. The photo resist is left as a mask at the exposed predetermined portion. An oxide film is grown on an unmasked portion of the transparent conductive film that is not covered by the photoresist to form a spacer. After the spacer is formed, the photo resist mask is removed. An alignment film is formed in a region where no spacer exists, and a liquid crystal layer is injected from above.
次に、 第 1 実施例と同様の他の透明絶縁基板を、 透明導電膜 を内側にしてスぺ一サおよび液晶層の上に配置し、 透明導電膜 を内側にして、 貼り合せる。 製造された液晶セルの両面に偏光 膜を形成して、 液晶表示装置が構成される。 Next, another transparent insulating substrate similar to that of the first embodiment is placed on the spacer and the liquid crystal layer with the transparent conductive film inside, and bonded together with the transparent conductive film inside. A polarizing film is formed on both sides of the manufactured liquid crystal cell to constitute a liquid crystal display device.
このように、 液晶表示装置は、 透明導電膜の所定部分にマス ク を形成し、 透明導電膜の非マスク部分に酸化膜を成長させる ことによって、 スぺーサ 1 8 を形成してもよい。 As described above, in the liquid crystal display device, the spacer 18 may be formed by forming a mask on a predetermined portion of the transparent conductive film and growing an oxide film on a non-mask portion of the transparent conductive film.
上記実施例では、 スぺーサと して、 S i 0 2を用いる例を示 したが、 本発明は、 これに限られない。 他の絶縁性物質の膜を 用いてもよい。 例えば、 窒化シリ コン膜を用いることができる。
また、 上記実施例では、 酸化膜の厚さ を 6 mと したが、 本 発明は、 これに限定されない。
In the above embodiment, as the spacer, but shows an example of using the S i 0 2, the present invention is not limited thereto. A film of another insulating material may be used. For example, a silicon nitride film can be used. Further, in the above embodiment, the thickness of the oxide film is 6 m, but the present invention is not limited to this.
Claims
1 . 2枚の対面する透明絶縁基板と、 1. two facing transparent insulating substrates,
各透明絶縁基板の対向面にそれぞれ設けられた透明導電膜と 上記対向する透明導電膜の間に挟まれて配置され、 両透明導 電膜間に空間を形成するためのスぺーザと、 A transparent conductive film provided on the opposing surface of each transparent insulating substrate, and a spacer disposed between the transparent conductive films facing each other to form a space between the two transparent conductive films;
上記空間に充填される液晶層と を有し、 上記スぺーサは、 上 記透明導電膜の少なく とも一方の上に成膜されたものであるこ と を特徴とする液晶表示装置。 A liquid crystal display device, comprising: a liquid crystal layer filled in the space; and the spacer is formed on at least one of the transparent conductive films.
2 . 請求項 1 記載の液晶表示装置において、 2. The liquid crystal display device according to claim 1,
上記スぺーサは、 酸化膜である。 The spacer is an oxide film.
3 . 請求項 2記載の液晶表示装置において、 3. The liquid crystal display device according to claim 2,
上記酸化膜は、 シリ コン酸化膜である。 The oxide film is a silicon oxide film.
4 . 請求項 1 記載の液晶表示装置において、 4. The liquid crystal display device according to claim 1,
上記 2枚の透明絶縁基板は、 可撓性を有する板材である。 The two transparent insulating substrates are plate materials having flexibility.
5 . 請求項 4記載の液晶表示装置において、 5. The liquid crystal display device according to claim 4,
上記 2枚の透明絶縁基板は、 プラスチック材である。 The two transparent insulating substrates are made of a plastic material.
6 . 請求項 4記載の液晶表示装置において、 6. The liquid crystal display device according to claim 4,
上記 2枚の透明絶縁基板は、 曲面を有するものである。 The two transparent insulating substrates have curved surfaces.
7 . 対面させて用いる 2枚の透明絶縁基板の各対向面側に、 それぞれ透明導電膜を形成し、 2枚の透明絶縁基板をスぺーサ を介して対面させ、 スぺ一ザで形成される空間に液晶層を存在
させて構成される液晶表示装置の製造方法において、 7. A transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates that are used to face each other, and the two transparent insulating substrates are faced via a spacer, and are formed by a spacer. Liquid crystal layer in space In the method for manufacturing a liquid crystal display device configured by
上記 2枚の透明絶縁基板の一方について、 その一方の面側に 透明導電膜を形成する第 1 の工程と、 A first step of forming a transparent conductive film on one side of one of the two transparent insulating substrates,
上記 2枚の透明絶縁基板の他方について、 その一方の面側に 透明導電膜を形成する第 2 の工程と、 A second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates,
前記第 1 の工程で透明導電膜が形成された前記透明絶縁基板 について、 該透明導電膜上に、 スぺーサ用酸化膜で絶縁被覆す る第 3 の工程と、 A third step of insulatingly covering the transparent conductive film with a spacer oxide film on the transparent insulating substrate on which the transparent conductive film is formed in the first step;
前記スぺーサ用酸化膜の所定部分にマスク を形成する第 4 の 工程と、 A fourth step of forming a mask on a predetermined portion of the spacer oxide film;
前記スぺ一サ用酸化膜の非マスク部分をエッチング処理によ リ 除去し、 酸化膜スぺーサを形成する第 5 の工程と、 A fifth step of removing an unmasked portion of the oxide film for the spacer by etching to form an oxide film spacer;
前記マスク を除去する第 6 の工程と、 A sixth step of removing said mask;
前記酸化膜スぺーザの存在しない空間に液晶層 を注入する第 7 の工程と、 A seventh step of injecting a liquid crystal layer into a space where the oxide film spacer does not exist;
前記第 2 の工程で透明導電膜が形成された透明絶縁基板を、 前記透明導電膜を内側に して前記酸化膜スぺーサおよび前記液 晶層の上に配置する第 8 の工程と An eighth step of disposing the transparent insulating substrate, on which the transparent conductive film is formed in the second step, on the oxide film spacer and the liquid crystal layer with the transparent conductive film inside;
を有するこ と を特徴とする液晶表示装置の製造方法。 A method for manufacturing a liquid crystal display device, comprising:
8 . 請求項 7 記載の液晶表示装置の製造方法において、 スぺーサ用酸化膜は、 シ リ コン酸化膜である。 8. In the method of manufacturing a liquid crystal display device according to claim 7, the spacer oxide film is a silicon oxide film.
9 . 対面させて用いる 2 枚の透明絶縁基板の各対向面側に、 それぞれ透明導電膜を形成し、 2 枚の透明絶縁基板をスぺーサ
を介して対面させ、 スぺーザで形成される空間に液晶層を存在 させて構成される液晶表示装置の製造方法において、 9. A transparent conductive film is formed on each of the opposing surfaces of the two transparent insulating substrates to be used facing each other, and the two transparent insulating substrates are spacers. A liquid crystal display device comprising a liquid crystal layer in a space formed by a spacer,
上記 2枚の透明絶縁基板の一方について、 その一方の面側に 透明導電膜を形成する第 1 の工程と、 A first step of forming a transparent conductive film on one side of one of the two transparent insulating substrates,
上記 2枚の透明絶縁基板の他方について、 その一方の面側に 透明導電膜を形成する第 2 の工程と、 A second step of forming a transparent conductive film on one surface side of the other of the two transparent insulating substrates,
前記第 1 の工程で形成された透明導電膜の所定部分にマスク を形成する第 3 の工程と、 A third step of forming a mask on a predetermined portion of the transparent conductive film formed in the first step;
前記透明導電膜の非マスク部分に、 酸化膜スぺ一サを成長さ せる第 4 の工程と、 A fourth step of growing an oxide film spacer on a non-mask portion of the transparent conductive film;
前記マスク を除去する第 5 の工程と、 A fifth step of removing the mask;
前記酸化膜スぺーザの存在しない空間に液晶層を注入する第 6 の工程と、 A sixth step of injecting a liquid crystal layer into a space where the oxide film spacer does not exist;
前記第 2 の工程で透明導電膜が形成された透明絶縁基板を、 前記透明導電膜を内側に して前記酸化膜スぺーサおよび前記液 晶層の上に配置する第 7 の工程と A seventh step of disposing the transparent insulating substrate on which the transparent conductive film is formed in the second step on the oxide film spacer and the liquid crystal layer with the transparent conductive film inside;
を有するこ とを特徴とする液晶表示装置の製造方法。 A method for manufacturing a liquid crystal display device, comprising:
1 0 . 請求項 9記載の液晶表示装置の製造方法において、 スぺーサ用酸化膜は、 シリ コン酸化膜である。
10. In the method for manufacturing a liquid crystal display device according to claim 9, the spacer oxide film is a silicon oxide film.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16307791A JPH0527223A (en) | 1991-07-03 | 1991-07-03 | Liquid crystal display device and manufacture of the same |
JP3/163077 | 1991-07-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1993001517A1 true WO1993001517A1 (en) | 1993-01-21 |
Family
ID=15766748
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1992/000842 WO1993001517A1 (en) | 1991-07-03 | 1992-07-03 | Liquid crystal display and method of manufacturing said display |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPH0527223A (en) |
AU (1) | AU2231892A (en) |
WO (1) | WO1993001517A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5710097A (en) * | 1996-06-27 | 1998-01-20 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4483916B2 (en) | 2007-09-11 | 2010-06-16 | トヨタ自動車株式会社 | Torque tube |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5695217A (en) * | 1979-12-28 | 1981-08-01 | Seiko Instr & Electronics Ltd | Liquid crystal display device |
JPS6254227A (en) * | 1985-09-02 | 1987-03-09 | Victor Co Of Japan Ltd | Liquid crystal cell |
JPS62262024A (en) * | 1986-05-07 | 1987-11-14 | Nec Corp | Liquid crystal display panel |
JPS6348525A (en) * | 1986-08-18 | 1988-03-01 | Fujitsu Ltd | Formation of spacer for gap of liquid crystal display panel |
-
1991
- 1991-07-03 JP JP16307791A patent/JPH0527223A/en active Pending
-
1992
- 1992-07-03 AU AU22318/92A patent/AU2231892A/en not_active Abandoned
- 1992-07-03 WO PCT/JP1992/000842 patent/WO1993001517A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5695217A (en) * | 1979-12-28 | 1981-08-01 | Seiko Instr & Electronics Ltd | Liquid crystal display device |
JPS6254227A (en) * | 1985-09-02 | 1987-03-09 | Victor Co Of Japan Ltd | Liquid crystal cell |
JPS62262024A (en) * | 1986-05-07 | 1987-11-14 | Nec Corp | Liquid crystal display panel |
JPS6348525A (en) * | 1986-08-18 | 1988-03-01 | Fujitsu Ltd | Formation of spacer for gap of liquid crystal display panel |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5710097A (en) * | 1996-06-27 | 1998-01-20 | Minnesota Mining And Manufacturing Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
US5976698A (en) * | 1996-06-27 | 1999-11-02 | 3M Innovative Properties Company | Process and materials for imagewise placement of uniform spacers in flat panel displays |
Also Published As
Publication number | Publication date |
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JPH0527223A (en) | 1993-02-05 |
AU2231892A (en) | 1993-02-11 |
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