WO1986000252A1 - Method for electrodeposition of metal and granular abrasive on a tool - Google Patents

Method for electrodeposition of metal and granular abrasive on a tool Download PDF

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Publication number
WO1986000252A1
WO1986000252A1 PCT/JP1984/000517 JP8400517W WO8600252A1 WO 1986000252 A1 WO1986000252 A1 WO 1986000252A1 JP 8400517 W JP8400517 W JP 8400517W WO 8600252 A1 WO8600252 A1 WO 8600252A1
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WIPO (PCT)
Prior art keywords
cathode chamber
abrasive grains
metal
anolyte
tool
Prior art date
Application number
PCT/JP1984/000517
Other languages
French (fr)
Japanese (ja)
Inventor
Masatoshi Funakubo
Naomi Yoshihara
Original Assignee
Funasaw Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Funasaw Co., Ltd. filed Critical Funasaw Co., Ltd.
Publication of WO1986000252A1 publication Critical patent/WO1986000252A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02Combined electrolytic and electrophoretic processes with charged materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0018Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for by electrolytic deposition

Definitions

  • the present invention relates to a method for manufacturing an electrodeposited tool, and more particularly to a method for eutectoidally fixing abrasive grains together with a precipitated metal onto a base metal of an electrodeposited tool by an electric tool.
  • this type of electrodeposition tool has been mainly manufactured by the following method (Japanese Patent Laid-Open No. 58-66668, Japan).
  • (A) A method in which the abrasive grains are suspended while suspending the abrasive grains in the liquid and the plating solution, and the abrasive grains are prayed together with the metal.
  • (C) A method in which abrasive grains are bonded to a base metal in advance using an adhesive, and a base treatment using a chemical plating is performed or not, and further, an electric plating is used to fix it.
  • the electrolytic cell used for the production of electrodeposition tools is usually immersed in the cathode (metal) and the anode without specially partitioning the electric plating bath contained in the bath. It has a configuration in which adhesion is performed while stirring with an impeller provided inside.
  • the method (C) has disadvantages such as a decrease in the adhesive strength of the abrasive grains. Therefore, these conventional methods require the abrasive grains to be uniformly and firmly fixed on the base metal under stable operating conditions. Was difficult.
  • the present invention solves the above-mentioned disadvantages of the prior art, and in particular, stabilizes plating conditions such as PH and metal concentration in an electric plating bath, thereby improving the plating metal efficiency.
  • the amount of co-folding of the abrasive grains can be controlled to a fixed amount, and the abrasive grains used as a work-in-progress can be fixed to the minimum while maintaining the minimum necessary. It is an object of the present invention to provide a method capable of producing an electrodeposited tool capable of fully exhibiting functions of various tools such as shearing property with high efficiency, economically and continuously.
  • the present inventors have made intensive studies on the production of an electrodeposition tool, and as a result, installed a cathode chamber of a specific configuration in an air plating bath, and a part of the anolyte was transferred to the cathode chamber. It was found that this could be achieved by circulating the solution into the bath and keeping the catholyte level slightly higher than the anolyte level. '
  • a tool base having a predetermined shape of a metal resist is immersed in an electric plating bath to which abrasive grains have been added, and the abrasive grains together with a prayer metal are used as the tool base.
  • a cathode chamber is provided in the electric plating bath so as to partially protrude from the liquid level, and a part of the anolyte is circulated and injected into the cathode chamber from above.
  • FIG. 1 is an explanatory view schematically showing an example of an electrolytic cell used in the method of the present invention
  • FIG. 2 is a perspective view illustrating the assembly of the cathode chamber in the electrolytic cell shown in FIG. 1,
  • FIG. 3 is a new surface view of the cutting edge portion of the band saw blade after completion of the attachment and attachment of the abrasive grains in the embodiment of the present invention.
  • the electrolytic cell used in the method of the present invention is provided with a cathode chamber partly protruding from the liquid level in an electric plating bath, and circulating a part of the anolyte into the cathode chamber from above.
  • the structure is such that the liquid in the catholyte compartment is replaced by the catholyte surface being higher than the anolyte surface (head difference) and i5 is refluxed to the anolyte compartment.
  • FIG. 1 is a schematic explanatory view showing the outline of an electrolytic cell used in the method of the present invention.
  • is an electrolytic cell, which is composed of an anode chamber 7 and a cathode chamber 4, in which an anode metal plate 2 is arranged at the bottom, while a tool base 3 as a cathode is shaded.
  • Powered in room 4 is an electrolytic cell, which is composed of an anode chamber 7 and a cathode chamber 4, in which an anode metal plate 2 is arranged at the bottom, while a tool base 3 as a cathode is shaded.
  • a conduit 1 ′ ′ is provided on one side wall of the electrolytic cell 1, and an injection pipe 10 is connected to the conduit 1 ′ via a pump 9 made of a material which is not subject to electrolytic corrosion, so that a part of the anolyte is removed.
  • the liquid is sucked up by the pump 9 and introduced into the injection pipe 10, and injected from the many pores or narrow slits provided in the injection pipe into the cathode electrode chamber 4 over the entire surface.
  • the conduit 10 ′ and the injection pipe 10 may be made of an acid-resistant pipe, and a filter may be connected in series with the pump 9.
  • the metal plate 2 of the anode is set at a position corresponding to the cathode surface to which the abrasive grains are to be fixed, such as the left and right surfaces or the bottom surface or both sides of the metal plate, according to the shape of the metal plate of the mounting tool to be manufactured. Cut.
  • the metal plate 2 is wrapped in advance with a suitable mesh cross 2 '. It is desirable to get a copy.
  • the cathode chamber 4 is provided with a tetrone or polyethylene inside or outside a frame 5 which is appropriately assembled from wood, plastic sock, or the like.
  • Filter cloth or filter paper (hereinafter collectively referred to as “cross”), which is made of an acid-resistant cloth or paper, etc., and distributes microscopic gaps over the entire surface to the extent that the abrasive grains contained inside do not pass through. ) Is in close contact.
  • Abrasive grains are formed at the bottom of the cathode chamber to form an abrasive layer 8.
  • the height of the abrasive layer 8 is controlled by a layer 3 ′ for fixing the abrasive grains of the base metal 3, ie, masking.
  • Abrasive grains are introduced so as to form a layer that is slightly higher than the portion 3 ′ that is not formed, and the portion where the abrasive grains are desired to be fixed is completely buried in the abrasive layer 8.
  • This injection amount is used to suppress the pH rise in the cathode chamber so that the pH of the solution in the cathode chamber is maintained at a PH value appropriate for the present invention (for example, 2 to 4), and to control the abrasive layer at the bottom of the cathode chamber. It is desirable to control 8 so that it does not spread. In order to reliably prevent the diffusion of the abrasive layer, it is preferable to inject the anolyte from the pores or slits of the injection pipe 10 in a shower shape.
  • the liquid level Sc in the cathode chamber is slightly higher than the liquid level Sa in the anode chamber 7 due to the resistance of the cross 6 (for example, 5 ⁇ 10 mm).
  • the resistance of the cross 6 for example, 5 ⁇ 10 mm.
  • most of the anolyte injected into the cathode chamber is replaced by the liquid in the cathode chamber due to the head difference (S c ⁇ S a), and is lower than the injected anolyte ⁇ ⁇ .
  • S c ⁇ S a head difference
  • the ⁇ ⁇ in the cathode chamber is always maintained in this way by simply performing the same anolyte solution management as in normal plating work. Appropriate conditions can be maintained.
  • the cathode chamber uses a cross in which the minute gaps are distributed over the entire surface, if there is no reflux of the anolyte, the permeation in the paint is insufficient.
  • the concentration of the metal ion in the cathode chamber decreases and ⁇ ⁇ Rises, making it impossible to maintain proper plating conditions or causing variations. Especially abrasive This tendency is remarkable as the particle size becomes finer.
  • a basic salt may be generated on the cathode surface, and the metal deposition itself may be completely stopped.
  • the present embodiment relates to the manufacture of a band saw blade having a diamond layer at the cutting edge, but various types such as diamond, cubic boron nitride, fine ceramics, etc. It goes without saying that the present invention can be applied to the case where other various tools are manufactured using the same abrasive grain.
  • a band saw blade was manufactured by the following steps using the electrolytic cell shown in FIGS.
  • the surface is polished with a buff or the like to form a base metal.
  • electrolytic finger removal or chemical finger removal is performed, and further, pickling is performed.
  • the activation treatment is performed by electrolysis or acid pickling.
  • ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ May be omitted and omitted.
  • the base metal that has undergone co-praying electrolysis for fixing the abrasive is
  • the final electrodeposition is carried out in the same electrode bath with the same composition as in the above (1) and the same electrolysis bath and electrolysis conditions in the entire cathode chamber or in the same electrode tank from which the abrasive grains have been removed from the cathode chamber, or in an electrolytic tank prepared separately.
  • the electrolysis time in this case varies greatly depending on the grain size of the abrasive grains, but depending on the application, etc., the coverage of the abrasive grains by the plated metal is about 60 to 90%. Determine the time and perform electrolysis.
  • the present invention particularly provides a cathode chamber of a specific configuration in an electric plating bath, and circulates a part of the anolyte into the cathode chamber from above and supplies it to the bottom. Since the abrasive grains are maintained without diffusing, it is possible to stabilize and control the plating conditions such as PH and metal concentration in the cathode chamber. The amount of grain prayer can be controlled to a fixed amount, and grinding on the base metal
  • O PI Grain sticking can be achieved uniformly and evenly.
  • the abrasive grains are simply introduced into the chamber and a fixed height is set at the bottom thereof.
  • the layer is automatically maintained in a layered state, and the same effect as agitation is exerted by the reflux of the liquid between the layers, stabilizing the plating conditions in the cathode chamber.
  • it is economical because only the necessary minimum amount of abrasive grains needs to be prepared.
  • the operating conditions can be controlled and stabilized, it is possible to provide an optimal method for manufacturing an electrodeposited tool, for example, enabling an electrodeposited tool to be manufactured intermittently. And can be.
  • the method for manufacturing an electrodeposited tool according to the present invention includes the use of a diamond, a cubic boron nitride, and a fin as a base for various tools such as grinding, polishing, and cutting.
  • Abrasives such as ramix are fixed together with nickel, copper, and other metals, and are suitable for electrodeposition to produce shine.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Polishing Bodies And Polishing Tools (AREA)

Abstract

A method in which a granular abrasive, together with a deposited metal, is deposited on a base metal for an electrodeposition on a tool by electroplating. A cathode chamber (4) is provided in an electrolytic tank (1) in such a manner that a portion of the cathode chamber (4) projects beyond the anolyte surface Sa. A granular abrasive layer (8) is formed on the bottom of the cathode chamber (4). A portion of an anolyte in an anode chamber (7) is circularly poured into the cathode chamber (4) from the upper side thereof such that a head difference (Sc-Sa) is formed between the catholyte surface Sc and the anolyte surface Sa, whereby such plating conditions as the pH of the catholyte and the metal concentration are controlled such that the granular abrasive (8) is deposited on a base metal (3) without diffusing the granular abrasive layer (8). The method is suitably employed to manufacture an electrodeposition plated tool in such a manner that a granular abrasive, such as diamond, cubic boron nitride or fine ceramic is deposited on a base metal for various grinding, polishing or cutting tools, together with a metal, such as nickel or copper.

Description

明 細 書 電着工具の製造方法 技術分野  Description Electroplated tool manufacturing method Technical field
本発明は、 電着工具の製造方法に係 り 、 よ り 詳細には、 電気 メ ジ キによ リ電着工具の台金上に砥粒を析出金属と共に共析固 着する方法に関する 。  The present invention relates to a method for manufacturing an electrodeposited tool, and more particularly to a method for eutectoidally fixing abrasive grains together with a precipitated metal onto a base metal of an electrodeposited tool by an electric tool.
背景技術  Background art
従来、 この種の電着工具は、 主と して以下に示すよ う な方法 で製造されていた(特開昭 5 8 — 6 6 6 6 8 号、 日本国)。  Conventionally, this type of electrodeposition tool has been mainly manufactured by the following method (Japanese Patent Laid-Open No. 58-66668, Japan).
( A ) メ, ジ キ液中に砥粒を懸濁させ乍ら鼋着を行い、 金属と 共に砥粒を共祈させる方法、  (A) A method in which the abrasive grains are suspended while suspending the abrasive grains in the liquid and the plating solution, and the abrasive grains are prayed together with the metal.
( B ) メ ジ キ液中に予め化学メ ジ キ を施 した砥粒を懸濁させ 乍 ら電着を行い、 砥粒を共祈させる方法、  (B) a method of performing electrodeposition while suspending abrasive grains that have been previously subjected to chemical magic in a mechanical liquid, and causing the abrasive grains to pray together;
( C ) 砥粒を予め接着剤で台金上に接着 し、 化学メ ツ キ によ る下地処理を施すか或いは施さ ないま ま、 更に これを電気メ ッ キで固定する方法。  (C) A method in which abrasive grains are bonded to a base metal in advance using an adhesive, and a base treatment using a chemical plating is performed or not, and further, an electric plating is used to fix it.
また、 電着工具の製造に際 して用 い る電解槽は、 通常、 中に 収容する電気メ ツ キ浴を格別に仕切る こ と な く 、 陰極(台金) と 陽極を浸漬 し、 浴中に設けたイ ンペラ一によ り撹拌しつつ鼋着 を行う構成を有 している。  In addition, the electrolytic cell used for the production of electrodeposition tools is usually immersed in the cathode (metal) and the anode without specially partitioning the electric plating bath contained in the bath. It has a configuration in which adhesion is performed while stirring with an impeller provided inside.
し か し乍ら、 (A )方法では砥粒の配合比の調整が極めて困難 であ り 、 また( B )の方法では砥粒の密着性 · 結合力が不十分で  However, in the method (A), it is extremely difficult to adjust the compounding ratio of the abrasive grains, and in the method (B), the adhesion and bonding force of the abrasive grains are insufficient.
OMPI あ り、 更に( C )の方法では砥粒の接着強度が弱まる等々の欠点 があるため、 これらの従来方法では安定した操業条件下で砥粒 を均一、 強固に台金上に固着する こ とが困難であっ た。 OMPI In addition, the method (C) has disadvantages such as a decrease in the adhesive strength of the abrasive grains. Therefore, these conventional methods require the abrasive grains to be uniformly and firmly fixed on the base metal under stable operating conditions. Was difficult.
本発明は、 叙上の従来技術の有する欠点を解消 し、 特に電気 メ ツ キ浴内の P H、 金属濃度などのメ ツ キ条件を確実に安定化 する こ と によっ てメ ツ キ金属に対する砥粒の共折量を一定量に 制御でき、 かつ、 仕掛り 品と して使用する砥粒を必要最低限に 抑えつつ均一 · 平均に台金上に固着でき、 研削性、 研磨性、 切 断性など各種工具の機能を十分に発揮し得る電着工具を高能率 で経済的に、 しかも連続的に製造し得る方法を提供する こ と を 目的とするものである。  The present invention solves the above-mentioned disadvantages of the prior art, and in particular, stabilizes plating conditions such as PH and metal concentration in an electric plating bath, thereby improving the plating metal efficiency. The amount of co-folding of the abrasive grains can be controlled to a fixed amount, and the abrasive grains used as a work-in-progress can be fixed to the minimum while maintaining the minimum necessary. It is an object of the present invention to provide a method capable of producing an electrodeposited tool capable of fully exhibiting functions of various tools such as shearing property with high efficiency, economically and continuously.
発明の開示  Disclosure of the invention
か ゝ る 目的達成のため、 本発明者等は電着工具の製造につい て鋭意検討した結果、 特定構成の陰極室を鼋気メ ツ キ浴に設置 し、 陽極液の一部をこの陰極室へ循澴注入し陰極液面を陽極液 面よ り若干高く保ちつつ鼋着を行う こ と によ リ可能である こ と を見い出 した。 '  In order to achieve such an object, the present inventors have made intensive studies on the production of an electrodeposition tool, and as a result, installed a cathode chamber of a specific configuration in an air plating bath, and a part of the anolyte was transferred to the cathode chamber. It was found that this could be achieved by circulating the solution into the bath and keeping the catholyte level slightly higher than the anolyte level. '
即ち、 本発明は、 所定形状のメ ツ キ レジス ト を施した工具台 金を、 砥粒を加えた電気メ ツ キ浴中に浸漬して、 該砥粒を祈出 金属と共に前記工具台金上に共祈固着せしめる方法において、 前記電気メ ツ キ浴中に該液面よ り一部突出 した陰極室を特設し この陰極室中に上方よ り陽極液の一部を循澴注入して底部に該 砥粒を維持しつつ、 電着する こ と によ り前記工具台金上に砥粒 を固着せしめる こ と を特徵とする電着工具の製造方法、 を要旨  That is, in the present invention, a tool base having a predetermined shape of a metal resist is immersed in an electric plating bath to which abrasive grains have been added, and the abrasive grains together with a prayer metal are used as the tool base. In the above method, a cathode chamber is provided in the electric plating bath so as to partially protrude from the liquid level, and a part of the anolyte is circulated and injected into the cathode chamber from above. A method of manufacturing an electrodeposited tool, characterized by fixing the abrasive grains on the tool base by performing electrodeposition while maintaining the abrasive grains at the bottom.
ΟΜΡΙ とするも のである。 ΟΜΡΙ It is said that.
図面の簡単な説明  BRIEF DESCRIPTION OF THE FIGURES
第 1 図は本発明方法に用いる電解槽の一例を概略的に示す説 明図、  FIG. 1 is an explanatory view schematically showing an example of an electrolytic cell used in the method of the present invention,
第 2 図は第 1 図に示した電解槽における陰極室の組立て を説 明する斜視図、  FIG. 2 is a perspective view illustrating the assembly of the cathode chamber in the electrolytic cell shown in FIG. 1,
第 3 図は本発明の実施例で砥粒固着鼋着を完了 した後の帯鋸 刃の刃先部分の新面図である。  FIG. 3 is a new surface view of the cutting edge portion of the band saw blade after completion of the attachment and attachment of the abrasive grains in the embodiment of the present invention.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
10 以下に本発明を図面を参照 しつつ詳細に説明する。 10 Hereinafter, the present invention will be described in detail with reference to the drawings.
本発明方法に用いる電解槽は、 電気メ ツ キ浴中に該液面よ り 一部突出 した陰極室を設ける と共に、 この陰極室にその上方か ら陽極液の一部を循璟注入 して陰極液面を陽極液面よ-り 高 く 倮 つ こ と (ヘ ッ ド差)によ り 陰極室中の液を置換 しつつ、 陽極室に i 5還流する構成とする も のであ る 。  The electrolytic cell used in the method of the present invention is provided with a cathode chamber partly protruding from the liquid level in an electric plating bath, and circulating a part of the anolyte into the cathode chamber from above. The structure is such that the liquid in the catholyte compartment is replaced by the catholyte surface being higher than the anolyte surface (head difference) and i5 is refluxed to the anolyte compartment.
第 1 図は、 本発明方法に用い る電解槽のー钶を示 し た概唣説 明図である 。 図中、 丄 は電解槽であっ て、 陽極室 7 と陰極室 4 と か ら成 り 、 この陽極室 7 には底部に陽極金属板 2 が配置され 一方、 陰極である工具台金 3 は陰搔室 4 に配蘆されて、 電源  FIG. 1 is a schematic explanatory view showing the outline of an electrolytic cell used in the method of the present invention. In the figure, 丄 is an electrolytic cell, which is composed of an anode chamber 7 and a cathode chamber 4, in which an anode metal plate 2 is arranged at the bottom, while a tool base 3 as a cathode is shaded.配 Powered in room 4
20 1 1 に接続さ れている。 更に、 電解槽 1 の一方の側壁には導管 1 〇 ' を配設し、 これに電蝕を受けない材質のポン プ 9 を介し て注入管 1 0 を接続 して、 陽極液の一部をポンプ 9 によ り 吸上 げて注入管 1 0 に導入 し、 この注入管に設けた多数の細孔又は 細いス リ ッ 卜 から陰'極室 4 に向けてそのほ 全面に注入する。 Connected to 20 1 1. Further, a conduit 1 ′ ′ is provided on one side wall of the electrolytic cell 1, and an injection pipe 10 is connected to the conduit 1 ′ via a pump 9 made of a material which is not subject to electrolytic corrosion, so that a part of the anolyte is removed. The liquid is sucked up by the pump 9 and introduced into the injection pipe 10, and injected from the many pores or narrow slits provided in the injection pipe into the cathode electrode chamber 4 over the entire surface.
O PI , 0 前記導管 1 0 ' 及び注入管 1 0 は耐酸性のパイ プで構成 し、 ま たポンプ 9 に直列に濾過機を介接しても よ い。 O PI, 0 The conduit 10 ′ and the injection pipe 10 may be made of an acid-resistant pipe, and a filter may be connected in series with the pump 9.
なお、 陽極の金属板 2 は、 製造する鼋着工具の台金形状に応 じて、 その台金の左右両面又は底面或いはその両側な ど砥粒を 固着させるべき陰極面に対応する位置にセ ッ トする。 その際、 陽極の金属板 2 から発生する ス ラ ッ ジがメ ッ キ液中に拡散する のを防止するために、 陽極金属板 2 は予め適当なメ ッ シュの ク ロ ス 2 ' で包んでお く こ と が望ま しい。  The metal plate 2 of the anode is set at a position corresponding to the cathode surface to which the abrasive grains are to be fixed, such as the left and right surfaces or the bottom surface or both sides of the metal plate, according to the shape of the metal plate of the mounting tool to be manufactured. Cut. At this time, in order to prevent the sludge generated from the metal plate 2 of the anode from diffusing into the solution, the metal plate 2 is wrapped in advance with a suitable mesh cross 2 '. It is desirable to get a copy.
さて、 一方、 陰極室 4 は、 第 2 図に示すよ う に、 木材、 プラ スチ ソ ク な どで適宜形状に組み立てた枠 5 の内又は外側に、 テ ト ロ ン、 ポ リ エチ レ ンな どの耐酸性の布又は紙で内部に収容す る砥粒が通過しない程度の極微間隙を全面に分布せし めて成る 濾布又は濾紙(以下、 総称 して「ク ロ ス」と記载する)を密着 した 構成と なっ ている。 こ の陰極室の底部には砥粒を揷入 して砥粒 層 8 を形成する が、 その高さ は、 台金 3 の砥粒を固着させる層 3 ' 、 即ち、 マ ス キ ン グ していない部分 3 ' よ り も若干高い層 と な る よ う に砥粒を揷入 し、 砥粒の固着を所望する 部分が完全 に砥粒層 8 中に埋つ た形とする。  On the other hand, as shown in FIG. 2, the cathode chamber 4 is provided with a tetrone or polyethylene inside or outside a frame 5 which is appropriately assembled from wood, plastic sock, or the like. Filter cloth or filter paper (hereinafter collectively referred to as “cross”), which is made of an acid-resistant cloth or paper, etc., and distributes microscopic gaps over the entire surface to the extent that the abrasive grains contained inside do not pass through. ) Is in close contact. Abrasive grains are formed at the bottom of the cathode chamber to form an abrasive layer 8. The height of the abrasive layer 8 is controlled by a layer 3 ′ for fixing the abrasive grains of the base metal 3, ie, masking. Abrasive grains are introduced so as to form a layer that is slightly higher than the portion 3 ′ that is not formed, and the portion where the abrasive grains are desired to be fixed is completely buried in the abrasive layer 8.
なお、 長尺の台金 3 を連続的に処理する場合には、 陰極室 4 の側壁に台金 3 の搬入 ' 搬出口 を設ける と共に、 砥粒補袷装置 を適宜箇所に併設する こ と は勿論であ る。  In the case of continuously processing the long base metal 3, it is necessary to provide a loading / unloading port for the base metal 3 on the side wall of the cathode chamber 4, and to install a grain filling device at an appropriate place. Of course.
このよ う な構成の電解槽の操業に当たっ ては、 前述のよ う に 陽極液の一部がポンプ 9 によ リ 注入管 1 0 か ら陰極室 4 に上方 から注入され、 こ れ に よ リ 陰極室内の液が陰極室ク ロ ス 6 を通 o In the operation of the electrolytic cell having such a configuration, a part of the anolyte is injected into the cathode chamber 4 from above from the injection pipe 10 into the cathode chamber 4 by the pump 9 as described above. Recover the liquid in the cathode chamber through cathode chamber cross 6. o
して陽極室 7 へと還流される。 こ の注入量は、 陰極室内の液の P H を本メ ツ キに適当な P H値(例えば、 2 〜 4 )に保つよ う に 陰極室内の P H上昇を抑える と共に、 陰極室底部の砥粒層 8 を 拡散しない程度にコ ン ト ロールする こ と が望ま しい。 砥粒層の 拡散を確実に防止する には、 注入管 1 0 の細孔又はス リ ッ ト か ら の陽極液を シ ャ ワ ー状に注入する と よ い。 この場合、 注入量 が多く ても、 その一部が陰極室上縁よ リ オーバー フ ロー して再 び陽極室に還流 し、 し か し砥粒層が拡散する こ と がないので、 注入量の調整によ る陰極室内の P H制御を容易に行う こ と がで さ る。 Then, it is refluxed to the anode chamber 7. This injection amount is used to suppress the pH rise in the cathode chamber so that the pH of the solution in the cathode chamber is maintained at a PH value appropriate for the present invention (for example, 2 to 4), and to control the abrasive layer at the bottom of the cathode chamber. It is desirable to control 8 so that it does not spread. In order to reliably prevent the diffusion of the abrasive layer, it is preferable to inject the anolyte from the pores or slits of the injection pipe 10 in a shower shape. In this case, even if the injection amount is large, a part of the injection amount overflows from the upper edge of the cathode chamber and returns to the anode chamber again, but the abrasive layer is not diffused. This makes it easy to control the PH in the cathode chamber by adjusting the pH.
また、 陽極液の一部循環注入に際 しては、 陰極室内の液面 S c はその ク ロ ス 6 の抵抗によ り 陽極室 7 の液面 S aよ リ 若干 高 く (例えば、 5 〜 1 0 m m程度)保たれる。 この結果、 陰極室内 に注入された陽極液は、 その大部分がそのへ ッ ド差( S c— S a ) によ り 陰極室内の液と置換 して注入陽極液 ρ Η よ り も若千 ρ Η の高い液と して陽極室 7 に還流する - このため、 通常の メ ツ キ 作業時と 同様の液管理を陽極液で行 う だけで陰極室内の Ρ Η を 常時本メ ツ キに適当な条件に維持する こ と ができ る 。 即ち、 陰 極室には前述の よ う に極微間隙を 全面に分布せ し めたク ロ ス を 使用する為に、 若し陽極液の還流がなければメ ッ キ液中の透過 が不充分と なる虞れがあ り 、 この場合陰極に祈出する金属に見 合っ た金属イ オ ン が陽極液か ら補給さ れない為、 陰極室内の金 属イ オ ン濃度が減少する と共に ρ Ηが上昇 し適正な メ ツ キ条件 を保持できな く なっ た り 、 ばらつ き が生 じ た り する。 特に砥粒 が細かく なる程この傾向が著し く 、 場合によっ ては、 陰極面に 塩基性塩が発生 し金属の析出そのものが完全に停止する こ と も あ る。 When the anolyte is partially circulated, the liquid level Sc in the cathode chamber is slightly higher than the liquid level Sa in the anode chamber 7 due to the resistance of the cross 6 (for example, 5 ~ 10 mm). As a result, most of the anolyte injected into the cathode chamber is replaced by the liquid in the cathode chamber due to the head difference (S c−S a), and is lower than the injected anolyte ρ Η. Reflux into the anode chamber 7 as a solution with high ρ--For this reason, the 管理 の in the cathode chamber is always maintained in this way by simply performing the same anolyte solution management as in normal plating work. Appropriate conditions can be maintained. In other words, as described above, since the cathode chamber uses a cross in which the minute gaps are distributed over the entire surface, if there is no reflux of the anolyte, the permeation in the paint is insufficient. In this case, since the metal ion corresponding to the metal praying to the cathode is not supplied from the anolyte, the concentration of the metal ion in the cathode chamber decreases and ρ Η Rises, making it impossible to maintain proper plating conditions or causing variations. Especially abrasive This tendency is remarkable as the particle size becomes finer. In some cases, a basic salt may be generated on the cathode surface, and the metal deposition itself may be completely stopped.
し か し、 本発明の方法のよ う な陽極液の還流を行なえば上記 の問題点は完全に解消 し、 微細な砥粒を用いた場合でも均一且 つ正常な電着が行なわれ充分満足すべき結果を得る こ と ができ る。  However, if the anolyte is refluxed as in the method of the present invention, the above-mentioned problem is completely solved, and even when fine abrasive grains are used, uniform and normal electrodeposition can be performed, and thus, satisfactory results can be obtained. You can get the results you need.
実施例  Example
次に本発明方法の一実施例を示す。 なお、 本実施例はダイ ヤ モ ン ド層を刃先に有する帯鋸刃の製造についてのも のである が ダイ ヤモン ド、 立方晶窒化ホ ウ素、 フ ァ イ ンセ ラ ミ ッ ク スな ど の種々 の砥粒 を甩いて他の各種工具を製造する場合にも適用で き る こ と は言う までも ない。  Next, an embodiment of the method of the present invention will be described. Note that the present embodiment relates to the manufacture of a band saw blade having a diamond layer at the cutting edge, but various types such as diamond, cubic boron nitride, fine ceramics, etc. It goes without saying that the present invention can be applied to the case where other various tools are manufactured using the same abrasive grain.
こ の実施例では、 第 1 図及び第 2 図に示した電解槽を利用 し 以下の各工程によ り 帯鋸刃 を製造 した。  In this example, a band saw blade was manufactured by the following steps using the electrolytic cell shown in FIGS.
Ϊ 炭 ^鋼、 ステン レ ス鋼な どの ¾性を 有する M料を 、 製造 すべき ェ具の形状、 硬度な どに加工処理後、 表面をバ フ な どで 研磨 し、 台金にする。  M After processing a metal material such as charcoal steel or stainless steel, which has a certain hardness, into the shape and hardness of the tool to be manufactured, the surface is polished with a buff or the like to form a base metal.
? 砥粒の電着が不要な部分を メ ツ キ用 レ ジス ト · イ ン キ を 用い、 通常の方法でマ ス キ ン グする。  ? Mask the areas where electrodeposition of the abrasive grains is not necessary using a resist ink for plating in the usual way.
続いて、 通常の メ ツ キ前処理と 同様、 電解脱指又は化学 脱指を行い、 更に酸洗を行う 。 なお、 材料がステ ン レ スの場合 には、 電解又は酸漬によ り 活性化処理を行う 。  Subsequently, in the same manner as in the normal plating pretreatment, electrolytic finger removal or chemical finger removal is performed, and further, pickling is performed. When the material is stainless steel, the activation treatment is performed by electrolysis or acid pickling.
次の条件で、 下地メ ツ キ を行う 。 なお、 これは必要に応  Underground plating is performed under the following conditions. Note that this is necessary
OMPI OMPI
― ·■ ^― じて行い、 省略 しても よ い。 ― · ■ ^ ― May be omitted and omitted.
電解液 塩 100 - 200 g/ H  Electrolyte salt 100-200 g / H
塩化ニ ッケル 200 - 300 g/ β  Nickel chloride 200-300 g / β
電解条件 ^ππ.  Electrolysis conditions ^ ππ.
陰極電流密度 3 〜 20 A /d m  Cathode current density 3 to 20 A / dm
1 〜 5 分間  1-5 minutes
⑤ 直ちに酸、 水洗を行う 。  直 ち に Immediately wash with acid and water.
B) 次の条件で砥粒固着のた沢めの複合メ ジ キ を行う 。 まず、 陰極室内に予め沸騰水処理な どで親水化 したダイ ヤモン ド砥粒 約 4 0 以上のもの を必要量揷入 して、 砥粒を固着すべき台金 部分が完全に砥粒層に埋ま る よ う にする 。 次に下記浴組成の メ ツ キ液を電解槽の場極室及び陰極室に必要量入れ、 適温.に昇 温し た後、 ポンプによ り 陽極液の一部を注入管を介 し て陰極室 に 方から シ ャ ヮー状に全面注入す る。  B) Under the following conditions, a large amount of composite medium with abrasive grains fixed is performed. First, a required amount of diamond abrasive particles, which have been hydrophilized by boiling water treatment or the like, are introduced into the cathode chamber in a required amount, and the base metal to which the abrasive particles are to be fixed is completely formed in the abrasive layer. Try to fill it. Next, the required amount of the plating solution having the following bath composition is charged into the cathode chamber and the cathode chamber of the electrolytic cell, and heated to an appropriate temperature. Then, a part of the anolyte is pumped through an injection pipe. Inject the entire surface into the cathode chamber in a shaping manner.
浴組成 硫酸ニ ッ ケル 24Q〜 320 g/ 5  Bath composition Nickel sulfate 24Q-320 g / 5
塩化二 ッ ケル 45 〜 90 g/ &  Nickel chloride 45 to 90 g / &
硼 酸 30 〜 80 g/ β  Boric acid 30 to 80 g / β
 light
電解条件 dm 30 〜 70 °C  Electrolysis conditions dm 30 to 70 ° C
P H 2.0 〜 4.5  P H 2.0 to 4.5
陰極電流密度 1 〜 12 A /d m2 Cathode current density 1 to 12 A / dm 2
電解時間 約 30 〜 90 分間  Electrolysis time about 30 to 90 minutes
(砥粒の粒度によ り 大幅に異な る) 仕上電解 : 砥粒固着のための共祈電解を完了 した台金は  Finishing electrolysis: The base metal that has undergone co-praying electrolysis for fixing the abrasive is
OMPI 陰極室全体又は砥粒を陰極室から取 り 除いた同一の電箨槽か、 或いは別に準備した電解槽にて上記⑥と 同一組成の電解浴及び 電解条件で仕上げの電着を行う 。 この場合の電解時間は、 砥粒 の粒度によ り大幅に異なる が、 用途な どに'応 じ、 メ ツ キ金属に よる砥粒の被覆率が約 6 0〜 9 0 % になる よ う に時間を決定 し 電解を行う 。 OMPI The final electrodeposition is carried out in the same electrode bath with the same composition as in the above (1) and the same electrolysis bath and electrolysis conditions in the entire cathode chamber or in the same electrode tank from which the abrasive grains have been removed from the cathode chamber, or in an electrolytic tank prepared separately. The electrolysis time in this case varies greatly depending on the grain size of the abrasive grains, but depending on the application, etc., the coverage of the abrasive grains by the plated metal is about 60 to 90%. Determine the time and perform electrolysis.
⑧ ί士上げ電解を完了 した台金は、 直ちに水洗、 乾燥 し、 メ ツ キによ り 吸蔵される微量水素によ る水素脆性が特に問題と さ れる よ う な場合には、 2 0 0 °Cで約 4時間の熱処理を施す。  台 The base metal after completion of the electrolysis is immediately washed with water and dried. If hydrogen embrittlement due to the trace amount of hydrogen absorbed by the metal plating is particularly problematic, 200 Heat treatment at about ° C for about 4 hours.
⑨ 台金に レジス ト ' イ ン キが残っ てい る場合には、 これを 剥離 し、 必要があれば、 シンナーな どで洗浄 し、 レ ジス ト ' ィ ン キ を完全に除去する。  場合 If any resist ink remains on the base metal, remove it and, if necessary, clean it with thinner, etc., to completely remove the resist ink.
·® 工具と して後加工(帯鋸刃の場合、 エ ン ド レ ス加工) を必 要とする と きは、 所要の後加工を行っ て製品にする 。 なお、 ェ 程'!;の完 了後に得 られた帯鋸刀の刃先部は、 第 _ 3 図に示すよ う に、 台金 3 のマスキング した部分 1 3 を除く 側底面にニ ッ ケル メ ツ キ層 1 2 を介 してダイ ヤモン ド粒 _ 8 が均一に固^さ れてお り 、 良好であっ た。 . · ® When post-processing (end processing in the case of a band saw blade) is required as a tool, perform the required post-processing to produce a product. In addition, the process! ; Cutting edge of the band saw sword obtained complete After the completion of, Remind as to the _ 3 Figure, via a two-Tsu Kell main star key layer 1 2 basolateral except masked portion 1 3 of the base metal 3 As a result, the diamond grains _ 8 were uniformly hardened, which was good. .
以 h詳述したよ う に 、 本発明は, 電気メ ツ キ浴中に特定構成 の陰極室を特に設け、 陽極液の一部を その陰搔室中に上方よ り 循環注入して底部に砥粒を拡散する こ と な く 維持する も のであ る から、 陰極室内の P H、 金属濃度な どの メ ツ キ条件を安定化 し制御する こ と ができ、 したがっ て、 メ ツ キ金属に対する砥粒 の共祈量を一定量に制御する こ と ができ、 かつ、 台金上への砥  As described in detail below, the present invention particularly provides a cathode chamber of a specific configuration in an electric plating bath, and circulates a part of the anolyte into the cathode chamber from above and supplies it to the bottom. Since the abrasive grains are maintained without diffusing, it is possible to stabilize and control the plating conditions such as PH and metal concentration in the cathode chamber. The amount of grain prayer can be controlled to a fixed amount, and grinding on the base metal
O PI 粒の固着を均一、 平均に達成する こ と ができ る。 また、 従来の よ う に砥粒を均一にメ ツ キ浴内に分布させる ため に撹拌する な どの必要もな く 、 単に陰搔室内に砥粒を揷入するだけでその底 部に一定高さ の層状に 自動的に維持され、 かつ、 該層の間を.液 が還流する こ と によ り撹拌と 同様の効果が発揮されるので、 陰 極室内の メ ッ キ条件の安定化に寄与するのみな らず、 使用砥粒 を必要最低限で準備すればよ く 、 経済的であ る。 更には, 操業 条件を制御 して安定化する こ と ができ る ので、 電着工具を違続 的に製造する こ と を可能にする等々、 電着工具の製造に最適な 方法を提供する こ と ができ る 。 O PI Grain sticking can be achieved uniformly and evenly. Also, unlike the conventional method, there is no need to agitate the abrasive grains to distribute them uniformly in the plating bath. Instead, the abrasive grains are simply introduced into the chamber and a fixed height is set at the bottom thereof. The layer is automatically maintained in a layered state, and the same effect as agitation is exerted by the reflux of the liquid between the layers, stabilizing the plating conditions in the cathode chamber. In addition to contributing, it is economical because only the necessary minimum amount of abrasive grains needs to be prepared. Furthermore, since the operating conditions can be controlled and stabilized, it is possible to provide an optimal method for manufacturing an electrodeposited tool, for example, enabling an electrodeposited tool to be manufactured intermittently. And can be.
産業上の利用可能性  Industrial applicability
以上.の よ う に、 本発明に係る電着工具の製造方法は、 研削、 研磨、 切断等々 の各種工具の台金 とにダイ ヤモ ン ド、 立方晶窒 化ホ ウ素、 フ ァ イ ンセ ラ ミ ッ ク ス等々 の砥粒を 二 ッ ケル、 銅な どの金属と共に共祈固着 して電着によ り 匸具を製造する のに適  As described above, the method for manufacturing an electrodeposited tool according to the present invention includes the use of a diamond, a cubic boron nitride, and a fin as a base for various tools such as grinding, polishing, and cutting. Abrasives such as ramix are fixed together with nickel, copper, and other metals, and are suitable for electrodeposition to produce shine.
て い  Is
、 ^ WIPO ¾ν , ^ WIPO ¾ν

Claims

請 求 の 範 囲  The scope of the claims
1 所定形状のメ ツ キ レジス ト を施した工具台金を、 砥粒を 加えた電気メ ツ キ浴中に浸潰して、 該涵粒を析出金属と共に前 記工具台金上に共折固着せしめる方法において、 前記電気メ ッ キ浴中に該液面よ り一部突出 した陰極室を特設し、 この陰極室 中に上方よ り陽極液の一部を循瓖注入して底部に該砥粒を維持 しつつ、 鼋着する こ と によ り前記工具台金上に砥粒を固着せし める こ と を特墩とする電着工具の製造方法。  (1) A tool base having a predetermined shape of a metal resist is immersed in an electric plating bath to which abrasive grains have been added, and the recharged grains are fixed together with the deposited metal on the tool base. In this method, a catholyte chamber is provided specially in the electromechanical bath so as to partially protrude from the liquid level, and a part of the anolyte is circulated and injected into the catholyte chamber from above and the abrasive is provided on the bottom. A method for manufacturing an electrodeposited tool, characterized by fixing abrasive grains on the tool base by attaching while maintaining the grains.
2 前記陰極室は、 内部に収容する砥粒が通過しない程度の 極微間隙を全面に分布せしめた布又は紙を枠に密着してなる請 求の範囲第 1項記载の方法。  2. The method according to claim 1, wherein the cathode chamber is in close contact with a frame with a cloth or paper in which ultrafine gaps are distributed over the entire surface such that abrasive grains contained therein do not pass through.
3 前記布又は紙は耐酸性の布又は紙である請求の範囲第 2 項記載の方法。  3. The method according to claim 2, wherein the cloth or paper is an acid-resistant cloth or paper.
4 訪記砥粒の層の高さは、 少な く とも、 砥粒を固着すべき 前記工具台金の部分の高さよ り大き くする請求の範囲第 1項記 载の方法。  4. The method according to claim 1, wherein the height of the layer of the visiting abrasive grains is at least larger than the height of the portion of the tool base to which the abrasive grains are to be fixed.
δ 前記陽極液の一部は前記陰極室中に上方よ リ シャ ヮー状 に注入する請求の範囲第 1項記載の方法。  The method according to claim 1, wherein a part of the anolyte is injected into the cathode chamber from above in a rechargeable manner.
6 前記陽極液の一部は、 前記陰極室の上方に設けた注入管 の細孔よ り注入される請求の範囲第 5項記載の方法。  6. The method according to claim 5, wherein a part of the anolyte is injected through pores of an injection pipe provided above the cathode chamber.
7 前記陽搔液の一部は、 ポンプによ りパイ プを介して前記 陰極室に循環される請求の範囲第 1項、 第 2項、 第 3項、 第 5 項又は第 6項記載の方法。  7. The method according to claim 1, wherein a part of the aqueous solution is circulated to the cathode chamber through a pipe by a pump. Method.
OMPI WIPO ^ OMPI WIPO ^
PCT/JP1984/000517 1984-06-25 1984-10-29 Method for electrodeposition of metal and granular abrasive on a tool WO1986000252A1 (en)

Applications Claiming Priority (2)

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JP59/129349 1984-06-25
JP12934984A JPS619600A (en) 1984-06-25 1984-06-25 Manufacture of electrodeposited tool

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* Cited by examiner, † Cited by third party
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EP0281004A1 (en) * 1987-03-04 1988-09-07 Ernst Winter & Sohn (Gmbh & Co.) Cutting segment for a saw for machining stone
US20090260994A1 (en) * 2008-04-16 2009-10-22 Frederick Joslin Electro chemical grinding (ecg) quill and method to manufacture a rotor blade retention slot

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63194786A (en) * 1987-02-04 1988-08-11 株式会社デンソー Washing method and device
IT1283819B1 (en) * 1996-08-21 1998-04-30 Diamond Pauber Srl PROCEDURE FOR THE PRODUCTION OF A DIAMOND WIRE FOR USE IN CUTTING STONE MATERIALS AND DIAMOND WIRE WITH IT PRODUCED
WO2013072687A2 (en) * 2011-11-16 2013-05-23 Nanoridge Materials, Incorporated Conductive metal enhanced with conductive nanomaterial
CN105177678B (en) * 2015-10-09 2017-08-29 华晶精密制造股份有限公司 Sand plates liquid device on diamond cutting secant

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JPS51754B1 (en) * 1970-04-28 1976-01-10

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US4079552A (en) * 1974-11-06 1978-03-21 Fletcher J Lawrence Diamond bonding process

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JPS51754B1 (en) * 1970-04-28 1976-01-10

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See also references of EP0185091A4 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0281004A1 (en) * 1987-03-04 1988-09-07 Ernst Winter & Sohn (Gmbh & Co.) Cutting segment for a saw for machining stone
US20090260994A1 (en) * 2008-04-16 2009-10-22 Frederick Joslin Electro chemical grinding (ecg) quill and method to manufacture a rotor blade retention slot
US9174292B2 (en) * 2008-04-16 2015-11-03 United Technologies Corporation Electro chemical grinding (ECG) quill and method to manufacture a rotor blade retention slot

Also Published As

Publication number Publication date
EP0185091A4 (en) 1987-07-13
JPS619600A (en) 1986-01-17
EP0185091A1 (en) 1986-06-25

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