USD958401S1 - Ion shield plate for plasma processing device - Google Patents

Ion shield plate for plasma processing device Download PDF

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Publication number
USD958401S1
USD958401S1 US29/759,815 US202029759815F USD958401S US D958401 S1 USD958401 S1 US D958401S1 US 202029759815 F US202029759815 F US 202029759815F US D958401 S USD958401 S US D958401S
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US
United States
Prior art keywords
plasma processing
shield plate
processing device
ion shield
ion
Prior art date
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US29/759,815
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English (en)
Inventor
Kazuumi Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Tech Corp
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Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: TANAKA, KAZUUMI
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE PREVIOUSLY RECORDED ON REEL 054827 FRAME 0829. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS' INTEREST. Assignors: KAZUUMI, TANAKA
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CORRECTIVE ASSIGNMENT TO CORRECT THE ORDER OF THE INVENTOR'S NAME PREVIOUSLY RECORDED ON REEL 055602 FRAME 0969. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT OF THE ASSIGNORS' INTEREST. Assignors: TANAKA, KAZUUMI
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US29/759,815 2020-05-27 2020-11-25 Ion shield plate for plasma processing device Active USD958401S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2020-10384F JP1678330S (cs) 2020-05-27 2020-05-27
JP2020-010384D 2020-05-27

Publications (1)

Publication Number Publication Date
USD958401S1 true USD958401S1 (en) 2022-07-19

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ID=74312455

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US29/759,815 Active USD958401S1 (en) 2020-05-27 2020-11-25 Ion shield plate for plasma processing device

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US (1) USD958401S1 (cs)
JP (1) JP1678330S (cs)
TW (1) TWD212326S (cs)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1031079S1 (en) * 2021-10-07 2024-06-11 iRoma Scents A.B. Ltd. Multi-chamber canister

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* Cited by examiner, † Cited by third party
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USD997893S1 (en) 2021-09-28 2023-09-05 Applied Materials, Inc. Shadow ring lift plate
USD997894S1 (en) 2021-09-28 2023-09-05 Applied Materials, Inc. Shadow ring lift assembly
JP1713113S (cs) 2021-11-26 2022-04-20
JP1712507S (cs) 2021-11-26 2022-04-13
USD1030687S1 (en) 2022-05-31 2024-06-11 Asm Ip Holding B.V. Susceptor
USD1067204S1 (en) 2022-05-31 2025-03-18 Asm Ip Holding B.V. Susceptor
USD1073758S1 (en) 2022-10-13 2025-05-06 Lam Research Corporation Baffle for substrate processing system
USD1076837S1 (en) 2023-01-19 2025-05-27 Lam Research Corporation Baffle

Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD675330S1 (en) * 2010-07-23 2013-01-29 Apollo Industrial Co., Ltd. Plate valve for bubble generator
US20160122995A1 (en) * 2014-11-03 2016-05-05 Micah Corder Drain cover
USD776295S1 (en) * 2014-11-04 2017-01-10 Charles River Laboratories, Inc. Base
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD900760S1 (en) * 2018-07-24 2020-11-03 Hitachi High-Tech Corporation Ion shield plate for semiconductor manufacturing apparatus
USD901714S1 (en) * 2017-12-05 2020-11-10 Hamamatsu Photonics K.K. Cover for culture vessel
USD901407S1 (en) * 2018-07-24 2020-11-10 Hitachi High-Tech Corporation Integrated type ion shield for semiconductor manufacturing apparatus
USD907235S1 (en) * 2017-09-18 2021-01-05 University Of Hertfordshire Higher Education Corporation Enclosure for dissolution system
USD924824S1 (en) * 2018-07-24 2021-07-13 Hitachi High-Tech Corporation Ion shield plate base for semiconductor manufacturing apparatus
USD927015S1 (en) * 2019-10-02 2021-08-03 Anthony Joseph Thomas Skirted petri dish

Patent Citations (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD675330S1 (en) * 2010-07-23 2013-01-29 Apollo Industrial Co., Ltd. Plate valve for bubble generator
US20160122995A1 (en) * 2014-11-03 2016-05-05 Micah Corder Drain cover
USD776295S1 (en) * 2014-11-04 2017-01-10 Charles River Laboratories, Inc. Base
USD794753S1 (en) * 2016-04-08 2017-08-15 Applied Materials, Inc. Showerhead for a semiconductor processing chamber
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD907235S1 (en) * 2017-09-18 2021-01-05 University Of Hertfordshire Higher Education Corporation Enclosure for dissolution system
USD901714S1 (en) * 2017-12-05 2020-11-10 Hamamatsu Photonics K.K. Cover for culture vessel
USD877931S1 (en) * 2018-05-09 2020-03-10 Moleculight, Inc. Dispenser for a darkening drape
USD900760S1 (en) * 2018-07-24 2020-11-03 Hitachi High-Tech Corporation Ion shield plate for semiconductor manufacturing apparatus
USD901407S1 (en) * 2018-07-24 2020-11-10 Hitachi High-Tech Corporation Integrated type ion shield for semiconductor manufacturing apparatus
USD924824S1 (en) * 2018-07-24 2021-07-13 Hitachi High-Tech Corporation Ion shield plate base for semiconductor manufacturing apparatus
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD927015S1 (en) * 2019-10-02 2021-08-03 Anthony Joseph Thomas Skirted petri dish

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Clean your SEM/TEM Samples and TEM Specimen Holders: Evactron® Easy Plasma SoftClean (EPSC). Online, published date unknown. Retrieved on Mar. 28, 2022 from URL: https://www.azom.com/equipment-details.aspx?EquipID=7728. *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005245S1 (en) * 2021-04-19 2023-11-21 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1008986S1 (en) * 2021-04-26 2023-12-26 Hitachi High-Tech Corporation Ion shield plate for plasma processing apparatus
USD1031079S1 (en) * 2021-10-07 2024-06-11 iRoma Scents A.B. Ltd. Multi-chamber canister

Also Published As

Publication number Publication date
TWD212326S (zh) 2021-06-21
JP1678330S (cs) 2021-02-01

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