USD703160S1 - Grounded electrode for a plasma processing apparatus - Google Patents
Grounded electrode for a plasma processing apparatus Download PDFInfo
- Publication number
- USD703160S1 USD703160S1 US29/397,274 US201129397274F USD703160S US D703160 S1 USD703160 S1 US D703160S1 US 201129397274 F US201129397274 F US 201129397274F US D703160 S USD703160 S US D703160S
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- US
- United States
- Prior art keywords
- processing apparatus
- plasma processing
- grounded electrode
- grounded
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
Claims (1)
- I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011001651 | 2011-01-27 | ||
JP2011-001651 | 2011-01-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD703160S1 true USD703160S1 (en) | 2014-04-22 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/397,274 Active USD703160S1 (en) | 2011-01-27 | 2011-07-14 | Grounded electrode for a plasma processing apparatus |
Country Status (1)
Country | Link |
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US (1) | USD703160S1 (en) |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD741823S1 (en) * | 2013-07-10 | 2015-10-27 | Hitachi Kokusai Electric Inc. | Vaporizer for substrate processing apparatus |
USD786201S1 (en) * | 2015-10-19 | 2017-05-09 | Tymphany Hk Limited | Heat sink for woofer |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD828419S1 (en) * | 2016-02-23 | 2018-09-11 | Joy Global Underground Mining Llc | Idler roller |
USD830434S1 (en) * | 2015-12-28 | 2018-10-09 | Ntn Corporation | Inner ring for tapered roller bearing |
USD847982S1 (en) * | 2016-02-04 | 2019-05-07 | Atos Medical Ab | Heat exchanger base plate |
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD907593S1 (en) * | 2017-01-20 | 2021-01-12 | Hitachi High-Tech Corporation | Discharge chamber for a plasma processing apparatus |
USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
USD916038S1 (en) * | 2019-03-19 | 2021-04-13 | Hitachi High-Tech Corporation | Grounded electrode for a plasma processing apparatus |
USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
USD981459S1 (en) * | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
US12080522B2 (en) | 2020-04-22 | 2024-09-03 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
USD1042373S1 (en) * | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
USD1042374S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
US12100577B2 (en) | 2019-10-25 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
-
2011
- 2011-07-14 US US29/397,274 patent/USD703160S1/en active Active
Cited By (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD741823S1 (en) * | 2013-07-10 | 2015-10-27 | Hitachi Kokusai Electric Inc. | Vaporizer for substrate processing apparatus |
USD802790S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
USD802545S1 (en) * | 2015-06-12 | 2017-11-14 | Hitachi High-Technologies Corporation | Lower chamber for a plasma processing apparatus |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD786201S1 (en) * | 2015-10-19 | 2017-05-09 | Tymphany Hk Limited | Heat sink for woofer |
USD830434S1 (en) * | 2015-12-28 | 2018-10-09 | Ntn Corporation | Inner ring for tapered roller bearing |
USD830435S1 (en) | 2015-12-28 | 2018-10-09 | Ntn Corporation | Inner ring for tapered roller bearing |
USD861757S1 (en) | 2015-12-28 | 2019-10-01 | Ntn Corporation | Inner ring for tapered roller bearing |
USD847982S1 (en) * | 2016-02-04 | 2019-05-07 | Atos Medical Ab | Heat exchanger base plate |
USD828419S1 (en) * | 2016-02-23 | 2018-09-11 | Joy Global Underground Mining Llc | Idler roller |
USD908755S1 (en) | 2016-02-23 | 2021-01-26 | Joy Global Underground Mining Llc | Idler roller |
USD907593S1 (en) * | 2017-01-20 | 2021-01-12 | Hitachi High-Tech Corporation | Discharge chamber for a plasma processing apparatus |
USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
USD916038S1 (en) * | 2019-03-19 | 2021-04-13 | Hitachi High-Tech Corporation | Grounded electrode for a plasma processing apparatus |
USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
US12100577B2 (en) | 2019-10-25 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
US12080522B2 (en) | 2020-04-22 | 2024-09-03 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
USD981459S1 (en) * | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
USD1042373S1 (en) * | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
USD1042374S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
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