USD678745S1 - Spinning insert polishing pad - Google Patents
Spinning insert polishing pad Download PDFInfo
- Publication number
- USD678745S1 USD678745S1 US29/396,834 US201129396834F USD678745S US D678745 S1 USD678745 S1 US D678745S1 US 201129396834 F US201129396834 F US 201129396834F US D678745 S USD678745 S US D678745S
- Authority
- US
- United States
- Prior art keywords
- polishing pad
- spinning insert
- insert polishing
- spinning
- new design
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The stippling on the upper surface is meant to represent a pattern that extends uniformly across the entire surface.
Claims (1)
- The ornamental design for a spinning insert polishing pad, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/396,834 USD678745S1 (en) | 2011-07-07 | 2011-07-07 | Spinning insert polishing pad |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/396,834 USD678745S1 (en) | 2011-07-07 | 2011-07-07 | Spinning insert polishing pad |
Publications (1)
Publication Number | Publication Date |
---|---|
USD678745S1 true USD678745S1 (en) | 2013-03-26 |
Family
ID=47892566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/396,834 Active USD678745S1 (en) | 2011-07-07 | 2011-07-07 | Spinning insert polishing pad |
Country Status (1)
Country | Link |
---|---|
US (1) | USD678745S1 (en) |
Cited By (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD738177S1 (en) * | 2012-10-31 | 2015-09-08 | Kwh Mirka Ltd | Backing pad |
USD786519S1 (en) * | 2015-01-28 | 2017-05-09 | Kwh Mirka Ltd | Machine polishing pad |
USD795666S1 (en) * | 2014-06-06 | 2017-08-29 | Diamond Tool Supply, Inc. | Polishing pad |
US10011999B2 (en) | 2014-09-18 | 2018-07-03 | Diamond Tool Supply, Inc. | Method for finishing a surface using a grouting pan |
US10246885B2 (en) | 2014-09-18 | 2019-04-02 | Husqvarna Construction Products North America, Inc. | Grouting pan assembly with reinforcement ring |
USD852601S1 (en) * | 2017-04-24 | 2019-07-02 | Ehwa Diamond Ind. Co., Ltd. | Polishing pad |
USD854902S1 (en) | 2016-09-23 | 2019-07-30 | Husqvarna Construction Products North America, Inc. | Polishing or grinding pad |
US10414012B2 (en) | 2017-01-13 | 2019-09-17 | Husqvarna Construction Products North America, Inc. | Grinding pad apparatus |
USD873517S1 (en) * | 2017-07-21 | 2020-01-21 | 3M Innovative Properties Company | Floor scrubbing pad |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
US10667665B2 (en) | 2015-09-24 | 2020-06-02 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
US10710214B2 (en) | 2018-01-11 | 2020-07-14 | Husqvarna Ab | Polishing or grinding pad with multilayer reinforcement |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD919396S1 (en) | 2017-08-30 | 2021-05-18 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD927952S1 (en) * | 2017-08-30 | 2021-08-17 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946845S1 (en) * | 2018-07-19 | 2022-03-22 | 3M Innovative Properties Company | Floor pad |
USD958626S1 (en) * | 2017-08-30 | 2022-07-26 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD1000928S1 (en) * | 2022-06-03 | 2023-10-10 | Beng Youl Cho | Polishing pad |
USD1001749S1 (en) * | 2020-05-13 | 2023-10-17 | University Of South Florida | Base plate for a foot pedal |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1021595S1 (en) * | 2022-08-31 | 2024-04-09 | Smart, Llc | Polishing pad |
-
2011
- 2011-07-07 US US29/396,834 patent/USD678745S1/en active Active
Cited By (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD740637S1 (en) * | 2012-10-31 | 2015-10-13 | Kwh Mirka Ltd | Backing pad |
USD738177S1 (en) * | 2012-10-31 | 2015-09-08 | Kwh Mirka Ltd | Backing pad |
USD873108S1 (en) * | 2014-06-06 | 2020-01-21 | Husqvarna Ab | Polishing pad |
USD795666S1 (en) * | 2014-06-06 | 2017-08-29 | Diamond Tool Supply, Inc. | Polishing pad |
USD837015S1 (en) * | 2014-06-06 | 2019-01-01 | Husqvarna Construction Products North America, Inc. | Polishing pad |
US10011999B2 (en) | 2014-09-18 | 2018-07-03 | Diamond Tool Supply, Inc. | Method for finishing a surface using a grouting pan |
US10246885B2 (en) | 2014-09-18 | 2019-04-02 | Husqvarna Construction Products North America, Inc. | Grouting pan assembly with reinforcement ring |
USD786519S1 (en) * | 2015-01-28 | 2017-05-09 | Kwh Mirka Ltd | Machine polishing pad |
US11084140B2 (en) | 2015-09-24 | 2021-08-10 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
US10667665B2 (en) | 2015-09-24 | 2020-06-02 | Husqvarna Ab | Method of using polishing or grinding pad assembly |
USD873782S1 (en) * | 2016-05-17 | 2020-01-28 | Electro Scientific Industries, Inc | Component carrier plate |
USD854902S1 (en) | 2016-09-23 | 2019-07-30 | Husqvarna Construction Products North America, Inc. | Polishing or grinding pad |
USD933440S1 (en) * | 2016-09-23 | 2021-10-19 | Husqvarna Ab | Polishing or grinding pad |
US10414012B2 (en) | 2017-01-13 | 2019-09-17 | Husqvarna Construction Products North America, Inc. | Grinding pad apparatus |
USD852601S1 (en) * | 2017-04-24 | 2019-07-02 | Ehwa Diamond Ind. Co., Ltd. | Polishing pad |
USD873517S1 (en) * | 2017-07-21 | 2020-01-21 | 3M Innovative Properties Company | Floor scrubbing pad |
USD919396S1 (en) | 2017-08-30 | 2021-05-18 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD927952S1 (en) * | 2017-08-30 | 2021-08-17 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disk, spacer, reinforcement and pad |
USD958626S1 (en) * | 2017-08-30 | 2022-07-26 | Husqvarna Ab | Polishing or grinding pad assembly with abrasive disks, reinforcement and pad |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US10710214B2 (en) | 2018-01-11 | 2020-07-14 | Husqvarna Ab | Polishing or grinding pad with multilayer reinforcement |
USD902165S1 (en) * | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946845S1 (en) * | 2018-07-19 | 2022-03-22 | 3M Innovative Properties Company | Floor pad |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD1001749S1 (en) * | 2020-05-13 | 2023-10-17 | University Of South Florida | Base plate for a foot pedal |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1000928S1 (en) * | 2022-06-03 | 2023-10-10 | Beng Youl Cho | Polishing pad |
USD1021595S1 (en) * | 2022-08-31 | 2024-04-09 | Smart, Llc | Polishing pad |
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