USD489740S1 - Electrostatic chuck - Google Patents

Electrostatic chuck Download PDF

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Publication number
USD489740S1
USD489740S1 US29/183,948 US18394803F USD489740S US D489740 S1 USD489740 S1 US D489740S1 US 18394803 F US18394803 F US 18394803F US D489740 S USD489740 S US D489740S
Authority
US
United States
Prior art keywords
electrostatic chuck
view
elevational view
electrostatic
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/183,948
Inventor
Keisuke Okugawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Niterra Co Ltd
Original Assignee
NGK Spark Plug Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Spark Plug Co Ltd filed Critical NGK Spark Plug Co Ltd
Assigned to NGK SPARK PLUG CO., LTD. reassignment NGK SPARK PLUG CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKUGAWA, KEISUKE
Application granted granted Critical
Publication of USD489740S1 publication Critical patent/USD489740S1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a perspective view of the top, front and right side of an electrostatic chuck showing my new design;
FIG. 2 is a front elevational view thereof, the rear elevational view being a mirror image thereof;
FIG. 3 is a right side elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is a sectional view taking along the line 7—7 in FIG. 5.

Claims (1)

  1. The ornamental design for a electrostatic chuck, as shown and described.
US29/183,948 2002-12-20 2003-06-20 Electrostatic chuck Expired - Lifetime USD489740S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002035562 2002-12-20
JP2002-035562 2002-12-20

Publications (1)

Publication Number Publication Date
USD489740S1 true USD489740S1 (en) 2004-05-11

Family

ID=32211484

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/183,948 Expired - Lifetime USD489740S1 (en) 2002-12-20 2003-06-20 Electrostatic chuck

Country Status (1)

Country Link
US (1) USD489740S1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1057675S1 (en) * 2021-04-12 2025-01-14 Lam Research Corporation Pedestal for a substrate processing system
USD1117120S1 (en) * 2023-07-07 2026-03-10 Lam Research Corporation Pedestal for a substrate processing system
USD1117121S1 (en) * 2023-07-07 2026-03-10 Lam Research Corporation Pedestal for a substrate processing system

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5535090A (en) 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
US5656093A (en) 1996-03-08 1997-08-12 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
US5825607A (en) 1996-05-08 1998-10-20 Applied Materials, Inc. Insulated wafer spacing mask for a substrate support chuck and method of fabricating same
US5838528A (en) 1995-07-10 1998-11-17 Watkins-Johnson Company Electrostatic chuck assembly
USD406852S (en) 1997-11-14 1999-03-16 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device
USD407073S (en) 1997-12-24 1999-03-23 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
USD420023S (en) 1999-01-09 2000-02-01 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device
USD420022S (en) 1997-12-24 2000-02-01 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
USD425919S (en) 1997-11-14 2000-05-30 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device
US6081414A (en) 1998-05-01 2000-06-27 Applied Materials, Inc. Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5535090A (en) 1994-03-03 1996-07-09 Sherman; Arthur Electrostatic chuck
US5838528A (en) 1995-07-10 1998-11-17 Watkins-Johnson Company Electrostatic chuck assembly
US5656093A (en) 1996-03-08 1997-08-12 Applied Materials, Inc. Wafer spacing mask for a substrate support chuck and method of fabricating same
US5825607A (en) 1996-05-08 1998-10-20 Applied Materials, Inc. Insulated wafer spacing mask for a substrate support chuck and method of fabricating same
USD406852S (en) 1997-11-14 1999-03-16 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device
USD425919S (en) 1997-11-14 2000-05-30 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device
USD407073S (en) 1997-12-24 1999-03-23 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
USD420022S (en) 1997-12-24 2000-02-01 Applied Materials, Inc. Electrostatic chuck with improved spacing and charge migration reduction mask
US6081414A (en) 1998-05-01 2000-06-27 Applied Materials, Inc. Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system
USD420023S (en) 1999-01-09 2000-02-01 Applied Materials, Inc. Electrostatic chuck with improved spacing mask and workpiece detection device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1057675S1 (en) * 2021-04-12 2025-01-14 Lam Research Corporation Pedestal for a substrate processing system
USD1117120S1 (en) * 2023-07-07 2026-03-10 Lam Research Corporation Pedestal for a substrate processing system
USD1117121S1 (en) * 2023-07-07 2026-03-10 Lam Research Corporation Pedestal for a substrate processing system

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