USD489740S1 - Electrostatic chuck - Google Patents
Electrostatic chuck Download PDFInfo
- Publication number
- USD489740S1 USD489740S1 US29/183,948 US18394803F USD489740S US D489740 S1 USD489740 S1 US D489740S1 US 18394803 F US18394803 F US 18394803F US D489740 S USD489740 S US D489740S
- Authority
- US
- United States
- Prior art keywords
- electrostatic chuck
- view
- elevational view
- electrostatic
- chuck
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Description
FIG. 1 is a perspective view of the top, front and right side of an electrostatic chuck showing my new design;
FIG. 2 is a front elevational view thereof, the rear elevational view being a mirror image thereof;
FIG. 3 is a right side elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof; and,
FIG. 7 is a sectional view taking along the line 7—7 in FIG. 5.
Claims (1)
- The ornamental design for a electrostatic chuck, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002035562 | 2002-12-20 | ||
| JP2002-035562 | 2002-12-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD489740S1 true USD489740S1 (en) | 2004-05-11 |
Family
ID=32211484
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/183,948 Expired - Lifetime USD489740S1 (en) | 2002-12-20 | 2003-06-20 | Electrostatic chuck |
Country Status (1)
| Country | Link |
|---|---|
| US (1) | USD489740S1 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1057675S1 (en) * | 2021-04-12 | 2025-01-14 | Lam Research Corporation | Pedestal for a substrate processing system |
| USD1117120S1 (en) * | 2023-07-07 | 2026-03-10 | Lam Research Corporation | Pedestal for a substrate processing system |
| USD1117121S1 (en) * | 2023-07-07 | 2026-03-10 | Lam Research Corporation | Pedestal for a substrate processing system |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5535090A (en) | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
| US5656093A (en) | 1996-03-08 | 1997-08-12 | Applied Materials, Inc. | Wafer spacing mask for a substrate support chuck and method of fabricating same |
| US5825607A (en) | 1996-05-08 | 1998-10-20 | Applied Materials, Inc. | Insulated wafer spacing mask for a substrate support chuck and method of fabricating same |
| US5838528A (en) | 1995-07-10 | 1998-11-17 | Watkins-Johnson Company | Electrostatic chuck assembly |
| USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| USD407073S (en) | 1997-12-24 | 1999-03-23 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| USD420023S (en) | 1999-01-09 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| USD420022S (en) | 1997-12-24 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| USD425919S (en) | 1997-11-14 | 2000-05-30 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| US6081414A (en) | 1998-05-01 | 2000-06-27 | Applied Materials, Inc. | Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
-
2003
- 2003-06-20 US US29/183,948 patent/USD489740S1/en not_active Expired - Lifetime
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5535090A (en) | 1994-03-03 | 1996-07-09 | Sherman; Arthur | Electrostatic chuck |
| US5838528A (en) | 1995-07-10 | 1998-11-17 | Watkins-Johnson Company | Electrostatic chuck assembly |
| US5656093A (en) | 1996-03-08 | 1997-08-12 | Applied Materials, Inc. | Wafer spacing mask for a substrate support chuck and method of fabricating same |
| US5825607A (en) | 1996-05-08 | 1998-10-20 | Applied Materials, Inc. | Insulated wafer spacing mask for a substrate support chuck and method of fabricating same |
| USD406852S (en) | 1997-11-14 | 1999-03-16 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| USD425919S (en) | 1997-11-14 | 2000-05-30 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
| USD407073S (en) | 1997-12-24 | 1999-03-23 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| USD420022S (en) | 1997-12-24 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing and charge migration reduction mask |
| US6081414A (en) | 1998-05-01 | 2000-06-27 | Applied Materials, Inc. | Apparatus for improved biasing and retaining of a workpiece in a workpiece processing system |
| USD420023S (en) | 1999-01-09 | 2000-02-01 | Applied Materials, Inc. | Electrostatic chuck with improved spacing mask and workpiece detection device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD1057675S1 (en) * | 2021-04-12 | 2025-01-14 | Lam Research Corporation | Pedestal for a substrate processing system |
| USD1117120S1 (en) * | 2023-07-07 | 2026-03-10 | Lam Research Corporation | Pedestal for a substrate processing system |
| USD1117121S1 (en) * | 2023-07-07 | 2026-03-10 | Lam Research Corporation | Pedestal for a substrate processing system |
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