USD1109711S1 - Gas nozzle for a substrate processing apparatus - Google Patents

Gas nozzle for a substrate processing apparatus

Info

Publication number
USD1109711S1
USD1109711S1 US29/961,397 US202429961397F USD1109711S US D1109711 S1 USD1109711 S1 US D1109711S1 US 202429961397 F US202429961397 F US 202429961397F US D1109711 S USD1109711 S US D1109711S
Authority
US
United States
Prior art keywords
processing apparatus
substrate processing
gas nozzle
view
along line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/961,397
Other languages
English (en)
Inventor
Taketoshi MORIYA
Yusaku OKAJIMA
Mika URUSHIHARA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Application granted granted Critical
Publication of USD1109711S1 publication Critical patent/USD1109711S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

US29/961,397 2024-03-08 2024-09-05 Gas nozzle for a substrate processing apparatus Active USD1109711S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2024004873F JP1774817S (enExample) 2024-03-08 2024-03-08
JP2024-004873D 2024-03-08

Publications (1)

Publication Number Publication Date
USD1109711S1 true USD1109711S1 (en) 2026-01-20

Family

ID=91672187

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/961,397 Active USD1109711S1 (en) 2024-03-08 2024-09-05 Gas nozzle for a substrate processing apparatus

Country Status (2)

Country Link
US (1) USD1109711S1 (enExample)
JP (1) JP1774817S (enExample)

Citations (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD258309S (en) * 1978-08-14 1981-02-17 Leighton Joseph T Gas fuel burner for fireplaces
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
USD447921S1 (en) * 2001-01-09 2001-09-18 Gary Ray Beltz Plant water nozzle attachment
USD502985S1 (en) * 2003-03-11 2005-03-15 Johannes Petrus Coetzee Katzke Nozzle
US20070131168A1 (en) * 2005-10-31 2007-06-14 Hisashi Gomi Gas Supplying unit and substrate processing apparatus
US20090205631A1 (en) * 2008-02-20 2009-08-20 Kao Hsung Tsung Gas burner head
US20090291566A1 (en) * 2005-08-05 2009-11-26 Masaaki Ueno Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semiconductor Device Manufacturing Method
USD613116S1 (en) * 2009-08-10 2010-04-06 W.C. Bradley Co. Universal fit bar burner
USD617870S1 (en) * 2005-08-19 2010-06-15 Stoneage, Inc. Self regulating fluid bearing high pressure rotary nozzle
US20110098841A1 (en) * 2008-03-27 2011-04-28 Tokyo Electron Limited Gas supply device, processing apparatus, processing method, and storage medium
USD645118S1 (en) * 2010-05-25 2011-09-13 Caldwell Tanks, Inc. Nozzle tubing having offset nozzles
US20150240359A1 (en) * 2014-02-25 2015-08-27 Asm Ip Holding B.V. Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same
CN303532538S (enExample) * 2015-12-30
US20170051408A1 (en) * 2015-07-17 2017-02-23 Hitachi Kokusai Electric Inc. Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
US20180087156A1 (en) * 2016-09-27 2018-03-29 Tokyo Electron Limited Gas Introduction Mechanism and Processing Apparatus
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD889596S1 (en) * 2017-12-27 2020-07-07 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD901564S1 (en) * 2019-01-28 2020-11-10 Kokusai Electric Corporation Gas inlet attachment for wafer processing apparatus
US11020760B2 (en) * 2016-02-15 2021-06-01 Kokusai Electric Corporation Substrate processing apparatus and precursor gas nozzle
USD924953S1 (en) * 2018-07-19 2021-07-13 Kokusai Electric Corporation Gas inlet attachment for substrate processing apparatus
USD964443S1 (en) * 2020-08-18 2022-09-20 Kokusai Electric Corporation Gas inlet attachment for wafer processing apparatus
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD991416S1 (en) * 2022-06-25 2023-07-04 Jiangsu Mingqian Intellectual Property Co., Ltd. Threaded connection pipe
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus
USD1042731S1 (en) * 2022-05-30 2024-09-17 Kokusai Electric Corporation Gas nozzle for semiconductor manufacturing equipment
USD1084222S1 (en) * 2023-07-14 2025-07-15 Lg Electronics Inc. Nozzle for water purifier

Patent Citations (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN303532538S (enExample) * 2015-12-30
USD258309S (en) * 1978-08-14 1981-02-17 Leighton Joseph T Gas fuel burner for fireplaces
US4880163A (en) * 1987-01-27 1989-11-14 Asahi Glass Company, Ltd. Gas feeding nozzle for a chemical vapor deposition apparatus
USD447921S1 (en) * 2001-01-09 2001-09-18 Gary Ray Beltz Plant water nozzle attachment
USD502985S1 (en) * 2003-03-11 2005-03-15 Johannes Petrus Coetzee Katzke Nozzle
US20090291566A1 (en) * 2005-08-05 2009-11-26 Masaaki Ueno Substrate Processing Apparatus, Coolant Gas Supply Nozzle and Semiconductor Device Manufacturing Method
USD617870S1 (en) * 2005-08-19 2010-06-15 Stoneage, Inc. Self regulating fluid bearing high pressure rotary nozzle
US20070131168A1 (en) * 2005-10-31 2007-06-14 Hisashi Gomi Gas Supplying unit and substrate processing apparatus
US20090205631A1 (en) * 2008-02-20 2009-08-20 Kao Hsung Tsung Gas burner head
US20110098841A1 (en) * 2008-03-27 2011-04-28 Tokyo Electron Limited Gas supply device, processing apparatus, processing method, and storage medium
USD613116S1 (en) * 2009-08-10 2010-04-06 W.C. Bradley Co. Universal fit bar burner
USD645118S1 (en) * 2010-05-25 2011-09-13 Caldwell Tanks, Inc. Nozzle tubing having offset nozzles
US20150240359A1 (en) * 2014-02-25 2015-08-27 Asm Ip Holding B.V. Gas Supply Manifold And Method Of Supplying Gases To Chamber Using Same
US10364498B2 (en) * 2014-03-31 2019-07-30 Kabushiki Kaisha Toshiba Gas supply pipe, and gas treatment equipment
USD783351S1 (en) * 2015-05-28 2017-04-11 Hitachi Kokusai Electric Inc. Gas nozzle substrate processing apparatus
US20170051408A1 (en) * 2015-07-17 2017-02-23 Hitachi Kokusai Electric Inc. Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium
USD828091S1 (en) * 2016-01-29 2018-09-11 Hitachi Kokusai Electric, Inc. Gas supply nozzle
US11020760B2 (en) * 2016-02-15 2021-06-01 Kokusai Electric Corporation Substrate processing apparatus and precursor gas nozzle
US20180087156A1 (en) * 2016-09-27 2018-03-29 Tokyo Electron Limited Gas Introduction Mechanism and Processing Apparatus
USD889596S1 (en) * 2017-12-27 2020-07-07 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD888196S1 (en) * 2018-07-05 2020-06-23 Kokusai Electric Corporation Gas nozzle for substrate processing apparatus
USD924953S1 (en) * 2018-07-19 2021-07-13 Kokusai Electric Corporation Gas inlet attachment for substrate processing apparatus
USD890572S1 (en) * 2018-07-19 2020-07-21 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD901564S1 (en) * 2019-01-28 2020-11-10 Kokusai Electric Corporation Gas inlet attachment for wafer processing apparatus
USD965740S1 (en) * 2020-07-27 2022-10-04 Kokusai Electric Corporation Gas supply nozzle for substrate processing apparatus
USD964443S1 (en) * 2020-08-18 2022-09-20 Kokusai Electric Corporation Gas inlet attachment for wafer processing apparatus
USD1020668S1 (en) * 2021-06-16 2024-04-02 Kokusai Electric Corporation Gas injector for substrate processing apparatus
USD1042731S1 (en) * 2022-05-30 2024-09-17 Kokusai Electric Corporation Gas nozzle for semiconductor manufacturing equipment
USD991416S1 (en) * 2022-06-25 2023-07-04 Jiangsu Mingqian Intellectual Property Co., Ltd. Threaded connection pipe
USD1084222S1 (en) * 2023-07-14 2025-07-15 Lg Electronics Inc. Nozzle for water purifier

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Linde launches advanced gas delivery system to control Cold Spray Additive Manufacturing,https://www.metal-am.com/linde-launches-advanced-gas-delivery-system-to-control-cold-spray-additive-manufacturing/, Mar. 28, 2023. (Year: 2023). *

Also Published As

Publication number Publication date
JP1774817S (enExample) 2024-07-05

Similar Documents

Publication Publication Date Title
USD1051867S1 (en) Confinement liner for a substrate processing chamber
USD965740S1 (en) Gas supply nozzle for substrate processing apparatus
USD1062835S1 (en) Dash cam
USD981971S1 (en) Boat of substrate processing apparatus
USD965945S1 (en) Delivery box
USD1009121S1 (en) Photo booth
USD888196S1 (en) Gas nozzle for substrate processing apparatus
USD965542S1 (en) Boat of substrate processing apparatus
USD1053606S1 (en) Curtain
USD1052548S1 (en) Gas diffuser
USD1011225S1 (en) Halloween decoration
USD1099858S1 (en) Electrode plate for semiconductor manufacturing apparatus
USD1040208S1 (en) Camera
USD1006983S1 (en) Nasal irrigator nozzle
USD1067961S1 (en) Pipe inspection camera
USD1021028S1 (en) Bidet apparatus
USD1071886S1 (en) Substrate support for a substrate processing chamber
USD1053605S1 (en) Curtain cover
USD1073783S1 (en) Electronic piano
USD1109711S1 (en) Gas nozzle for a substrate processing apparatus
USD1020668S1 (en) Gas injector for substrate processing apparatus
USD964443S1 (en) Gas inlet attachment for wafer processing apparatus
USD1062994S1 (en) Shower head
USD1095377S1 (en) Wheel
USD1042731S1 (en) Gas nozzle for semiconductor manufacturing equipment