US9960127B2 - High-power amplifier package - Google Patents
High-power amplifier package Download PDFInfo
- Publication number
- US9960127B2 US9960127B2 US15/158,163 US201615158163A US9960127B2 US 9960127 B2 US9960127 B2 US 9960127B2 US 201615158163 A US201615158163 A US 201615158163A US 9960127 B2 US9960127 B2 US 9960127B2
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- US
- United States
- Prior art keywords
- power
- microwave circuit
- laminate
- transistor
- heat slug
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1902—Structure including thick film passive components
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19105—Disposition of discrete passive components in a side-by-side arrangement on a common die mounting substrate
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F2203/00—Indexing scheme relating to amplifiers with only discharge tubes or only semiconductor devices as amplifying elements covered by H03F3/00
- H03F2203/20—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers
- H03F2203/21—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
- H03F2203/211—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
- H03F2203/21131—Indexing scheme relating to power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers the input bias voltage of a power amplifier being controlled, e.g. by a potentiometer or an emitter follower
Definitions
- the technology relates to packaged, high-power microwave circuitry, such as high-power microwave amplifiers.
- Gallium-nitride semiconductor material has received appreciable attention in recent years because of its desirable electronic and electro-optical properties.
- Gallium nitride (GaN) has a wide, direct bandgap of about 3.4 eV that corresponds to the blue wavelength region of the visible spectrum.
- LEDs Light-emitting diodes
- LDs laser diodes
- These devices can emit visible light ranging from the violet to red regions of the visible spectrum.
- gallium nitride Because of its wide bandgap, gallium nitride is more resistant to avalanche breakdown and has a higher intrinsic field strength compared to more common semiconductor materials, such as silicon and gallium arsenide. In addition, gallium nitride is able to maintain its electrical performance at higher temperatures as compared to other semiconductors, such as silicon or gallium arsenide. GaN also has a higher carrier saturation velocity compared to silicon. Additionally, GaN has a Wurtzite crystal structure, is a hard material, has a high thermal conductivity, and has a much higher melting point than other conventional semiconductors such as silicon, germanium, and gallium arsenide. Accordingly, GaN is useful for high-speed, high-voltage, high-power, and high-power applications. For example, gallium-nitride materials may be used as active circuit components in semiconductor amplifiers for radio-frequency (RF) communications, radar, and microwave applications.
- RF radio-frequency
- a packaging assembly includes a laminate having microwave circuitry and cut-outs that allow direct mounting of high-power components, such as GaN transistors, on a heat slug in the package. Wire bonds can provide connections between the high-power components and microwave circuitry on the laminate.
- the direct mounting of the high-power components to the heat slug can provide improved thermal dissipation, so that higher power operation may be achieved, and permit flexibility in design of the microwave circuitry. For example, the microwave circuit's design may be iterated more rapidly and components may be exchanged in a partially assembled package to tune the circuit to a particular application, all without affecting or exchanging the high-power components.
- Some embodiments relate to a high-power microwave circuit assembled in a package comprising a microwave circuit formed on a laminate, a case supporting conductive leads that are connected to the microwave circuit, and a heat slug connected to the case and extending from an interior region of the case to an exterior region of the case. There may be one or more cut-outs in the laminate. A first power transistor may be mounted directly on the heat slug within a cut-out of the laminate and connected to the microwave circuit.
- Some embodiments relate to a method of assembling a high-power amplifier in a package.
- the method may comprise a combination of acts including, but not limited to: mounting a power transistor on a heat slug; separately placing a laminate with a microwave circuit over the heat slug, wherein the power transistor is located within a cut-out in the laminate; electrically connecting terminals of the power transistor to the microwave circuit with interconnects that extend through the cut-out to the microwave circuit; and forming a case that connects to the heat slug and encloses the microwave circuit.
- a high-power microwave circuit assembled in a package comprising: a microwave circuit formed on a laminate; a case supporting conductive leads that are connected to the microwave circuit; a heat slug connected to the case and extending from an interior region of the case to an exterior region of the case; a cut-out in the laminate; and a first power transistor mounted directly on the heat slug within the cut-out of the laminate and connected to the microwave circuit.
- a high-power amplifier circuit wherein the first power transistor is capable of outputting power levels between 50 W and 100 W at duty cycles greater than 50% without significant degradation of the amplifier's performance.
- a high-power amplifier circuit wherein the first power transistor is capable of outputting power levels between 100 W and 200 W at duty cycles greater than 50% without significant degradation of the amplifier's performance.
- a high-power amplifier circuit wherein the first power transistor comprises GaN.
- a high-power amplifier circuit further comprising a second power transistor mounted directly on the heat slug in a second cut-out in the laminate and having an output connected to an input of the first power transistor.
- a high-power amplifier circuit further comprising a second power transistor mounted directly on the heat slug in a second cut-out in the laminate and connected in parallel with the first power transistor in a Doherty configuration.
- a high-power amplifier circuit wherein the package complies with specifications for a standardized package.
- a high-power amplifier circuit wherein the microwave circuit comprises conductive interconnects, at least one resistor, and at least three capacitors.
- a high-power amplifier circuit wherein the laminate is mounted directly on the heat slug.
- a high-power amplifier circuit wherein there is more than one wire bond connecting in parallel one terminal of the first power transistor to the microwave circuit.
- a high-power amplifier circuit further comprising second wire bonds that connect the conductive leads to the microwave circuit, wherein the second wire bonds are of the same diameter as the first wire bonds and connected in the same way as the first wire bonds.
- a high-power amplifier circuit wherein a height differential between bonding pads on the first power transistor and conductive interconnects on the microwave circuit is between approximately 5 mils and approximately 20 mils.
- Method embodiments may include, but not be limited to, one or more of the following acts suitably combined.
- a method of assembling a high-power amplifier in a package comprising acts of: mounting a power transistor on a heat slug; separately placing a laminate with a microwave circuit over the heat slug, wherein the power transistor is located within a cut-out in the laminate; electrically connecting terminals of the power transistor to the microwave circuit with interconnects that extend through the cut-out to the microwave circuit; and forming a case that connects to the heat slug and encloses the microwave circuit.
- a method of further comprising electrically connecting leads that extend through the case to the microwave circuit, wherein a same process is used to electrically connect the terminals of the power transistor to the microwave circuit and electrically connect the leads to the microwave circuit.
- a method, of, wherein the process comprises wire bonding.
- a method, wherein placing the laminate over the heat slug comprises mounting the laminate directly to the heat slug.
- microwave circuit includes at least one resistor and at least three capacitors.
- a method further comprising interchanging one of the at least three capacitors for a capacitor of a different value to tune operation of the high-power amplifier.
- a method, wherein forming the case comprises forming the case to comply with specifications for a standardized package.
- FIG. 1 depicts one approach to dissipating heat from a packaged power transistor
- FIG. 2A depicts a plan view of a high-power amplifier package, according to some embodiments.
- FIG. 2B depicts an elevation view corresponding to the section line of FIG. 2A , according to some embodiments
- FIG. 3 shows an example circuit for a two-stage, high-power amplifier package
- FIG. 4A depicts a structure associated with assembly of a high-power amplifier package, according to some embodiments.
- FIG. 4B depicts a structure associated with assembly of a high-power amplifier package, according to some embodiments.
- FIG. 4C depicts a structure associated with assembly of a high-power amplifier package, according to some embodiments.
- FIG. 4D depicts a structure associated with assembly of a high-power amplifier package, according to some embodiments.
- transistors comprising gallium nitride material are useful for high-speed, high-voltage, and high-power applications because of the favorable material properties of gallium nitride.
- Some applications relating to RF communications, radar, and microwaves can place demanding performance requirements on devices that include gallium-nitride transistors. For example, some applications may require high-power transistors capable of amplifying signals to power levels between approximately 50 Watts and approximately 200 Watts.
- FIG. 1 One approach to dissipating heat from a packaged power transistor is depicted in FIG. 1 .
- the drawing depicts a power transistor 140 and electrical components 130 (e.g., a capacitor, inductor, or resistor) of a circuit that is formed on a laminate 120 .
- a plurality of thermally conductive vias 123 may be formed in the laminate to improve heat transfer from the power transistor 140 to a heat slug 107 .
- the power transistor 140 may be manufactured as a surface-mount die that may be readily mounted on the laminate with other electrical components to form a microwave circuit.
- the laminate may be soldered to a printed circuit board (PCB).
- PCB printed circuit board
- via farms may not provide adequate thermal dissipation for some high-power components in certain applications. For example, where a power transistor of an amplifier outputs signals at power levels over 50 W, via farms may inadequately dissipate heat from the transistor so that the transistor's performance degrades. For example, the gain linearity or drain efficiency may degrade. Additionally, the via farms may take up an appreciable area of the laminate making it difficult to mount more than two discrete capacitors on the laminate within the package. This can make it difficult or impossible to implement impedance matching within the package for the microwave circuit.
- a turn-around time for changes in a MMIC design can be months. This is because there is no way to readily retune a MMIC, so that the MMIC needs to be refabricated.
- turn-around times for redesign of laminate circuitry can be days.
- high-power components 142 , 144 may be mounted directly on a heat slug 107 through cut-outs 125 in a laminate 120 .
- Wire bonds 115 may be used to connect between terminals on the high-power components and microwave circuitry on the laminate 120 .
- the direct mounting of the high-power components on the heat slug can improve heat dissipation into the heat slug and allow the components to operate at higher power levels than is possible for conventionally packaged, high-power devices.
- a device having direct mounting of transistors on the heat slug 107 may operate at power levels between about 50 W and about 100 W at duty cycles greater than 50% without appreciable performance degradation (e.g., without appreciable degradation of gain, linearity, or drain efficiency).
- a device having direct mounting of transistors on the heat slug 107 may operate at power levels between about 100 W and about 200 W at duty cycles greater than 50% without appreciable performance degradation due to heating.
- a power transistor mounted on a laminate typically exhibits a gain reduction of about 0.5 dB to about 1 dB due to heating considerations for pulsed and continuous-wave operation compared to a transistor mounted directly on a heat slug.
- the transistor For a laminate-mounted transistor, there is a higher thermal resistance to the heat slug.
- the increased thermal resistance causes the transistor to get hotter and limits its maximum operating temperature. Therefore, the transistor must be operated at reduced gain values (by about 0.5 dB to about 1 dB) to avoid overheating and damaging the transistor.
- Direct mounting of the transistor on the heat slug can allow higher-power operation to recover about 0.5 dB to about 1 dB of gain.
- direct mounting and “mounted directly on the heat slug” refer to bonding, adhering, or otherwise attaching a transistor or other high-power component directly to the heat slug through a cut-out in the laminate.
- the high-power components 142 , 144 may comprise high-power GaN transistors, such as a high-power, depletion-mode, high-electron-mobility transistor (HEMT), high-voltage GaN-on-Si FET, and high-voltage heterojunction bipolar transistor (HBT).
- a transistor may be formed as a junction field-effect transistor (JFET) or low-voltage HBT.
- JFET junction field-effect transistor
- Other transistor architectures may be used in other embodiments.
- Other transistor architectures may include, but not be limited to, metal-oxide-semiconductor field-effect transistor (MOSFET) and metal-insulator-semiconductor field-effect transistor (MISFET).
- the high-power components 142 , 144 may be of mixed types.
- a first stage of an amplifier may comprise first component 142 that is a low-voltage transistor (e.g., a 5V HBT) and a second stage may comprise a second component 144 that is a 50V GaN-on-Si FET.
- high-power components may include, but not be limited to, high-power GaN diodes, LEDs or laser diodes, high-power thyristors or other similar or different high-power devices which may or may not be formed from GaN.
- gallium nitride material refers to gallium nitride (GaN) and any of its alloys, such as aluminum gallium nitride (Al x Ga (1 ⁇ x) N), indium gallium nitride (In y Ga (1 ⁇ y) N), aluminum indium gallium nitride (Al x In y Ga (1 ⁇ x ⁇ y) N), gallium arsenide phosporide nitride (GaAs x P y N (1 ⁇ x ⁇ y) ), aluminum indium gallium arsenide phosporide nitride (Al x In y Ga (1 ⁇ x ⁇ y) As a P b N (1 ⁇ a ⁇ b) ), amongst others.
- the gallium nitride material has a high concentration of gallium and includes little or no amounts of aluminum and/or indium.
- the sum of (x+y) may be less than 0.4 in some implementations, less than 0.2 in some implementations, less than 0.1 in some implementations, or even less in other implementations.
- an active layer in which a transistor channel is formed may have a composition of GaN.
- Gallium nitride materials may be doped n-type or p-type, or may be intrinsic. Suitable gallium nitride materials are described in U.S. Pat. No. 6,649,287, which is incorporated herein by reference in its entirety.
- a high-power package 200 may include an outer case 105 , a laminate 120 mounted within the case 105 that includes microwave circuitry and cut-outs 125 , a heat slug 107 mounted in the case, and one or more conductive pins or leads 110 extending through the case walls, at least some of which provide electrical connections to circuitry on the laminate.
- the laminate circuitry may comprise discrete components 130 (e.g., resistors, diodes, capacitors, inductors, etc.) and include patterned conductive interconnects 135 .
- the laminate may comprise multiple levels of conductive interconnects and one or more ground planes separated by dielectric material.
- the laminate may have a thickness between approximately 5 mils and approximately 30 mils, according to some embodiments, though other thicknesses may be used in some cases.
- suitable laminates are produced by Rogers Corporation of Rogers, Conn., such as the RO3000® laminates.
- a suitable laminate may have a high dielectric constant (e.g., greater than 2), and be formed from a ceramic-filled polytetrafluoroethylene (PTFE) composite, though other laminate compositions may be used in some cases.
- a laminate 120 may include cut-outs 125 that provide openings through the laminate. There may be conductive interconnects or bond pads for wire bonds formed adjacent to the cut-outs.
- a high-power component may be formed as a semiconductor die and may be mounted directly on an underlying heat slug 107 .
- One or more wire bonds may be made between terminals on each high-power component and adjacent conductive interconnects or bond pads that connect to conductive interconnects on the laminate 120 .
- first item When using the terms “on,” “adjacent,” or “over” in to describe the relative locations of a first item and a second item (e.g., structure A is adjacent to structure B), there may or may not be intervening material between the first item and the second item.
- first item When a first item is described as being “immediately” on, adjacent to, or over a second item, essentially no intervening material is present.
- first item When a first item is described as being “on” or “over” a second item, the first item may cover the entire second item, or a portion of the second item.
- the heat slug 107 may comprise any suitable material that exhibits a high thermal conductivity, such as copper or aluminum, though other materials may be used.
- the heat slug may extend through the case 105 , so that it can directly contact an external heat sink.
- the package 200 may include holes or other features that allow the package to be screwed or otherwise securely fastened to an instrument board, for example, so that the heat slug 107 makes intimate contact with a heat sink on the instrument board.
- the heat slug 107 may provide a ground plane or reference potential for circuitry on the laminate.
- the case 105 may comprise a plastic or molded epoxy in some embodiments, and the package may be formed in a standardized shape (e.g., a TO-272 package, an AC-400 package, an AC-780 package etc.).
- the case 105 may extend or be over-molded above the laminate to enclose the laminate 120 and high-power components 142 , 144 .
- the high-power components 142 , 144 By providing cut-outs 125 in the laminate 120 , mounting of the high-power devices 142 , 144 is separated from assembly of the laminate.
- high-power components formed from materials other than Si contribute higher costs to packaged high-power devices.
- some components e.g., resistors, capacitors, inductors, impedance-matching networks, voltage bias networks, etc.
- SMDs surface-mount devices
- the high-power components 142 , 144 can be made small in size compared to a MMIC, and therefore reduce costs.
- revising a MMIC can require one or several months of turn-around time and loss of an expensive device.
- revising laminate circuitry without integrated high-power components, can entail only several days of delay.
- discrete components on a laminate may be changed more readily (prior to assembly in a package or after partial assembly in a package) to fine tune packaged devices for a particular application or frequency range when expensive high-power devices are not integrated on the laminate. For example, there is no risk of damaging the high-power devices when interchanging discrete components on the laminate.
- An additional benefit of mounting the high-power components on the heat slug within the cut-outs is that the cut-outs can occupy less area than via farms, so that more laminate area is available for impedance-matching and/or filtering circuitry.
- power management circuitry may be included inside the package 200 .
- MMIC technology typically has limited breakdown voltages (in the range of 50 V to 100 V) for integrated capacitors. To increase the capacitance breakdown voltage to over 200 V, the capacitor's dielectric layer would need to become significantly thicker (e.g., at least double).
- Current SMD capacitors which can be used on a laminate, can have breakdown voltages as high as 500 V.
- SMD inductors or inductors 118 patterned from a conductive layer on the laminate can exhibit appreciably higher Q values than inductors formed on a MMIC, and are of lower cost. SMD and laminate inductors can exhibit lower loss and handle higher current levels than MMIC inductors.
- the laminate 120 may also be mounted directly on the heat slug 107 , as depicted in FIG. 2B , or it may be mounted within a few mils above the heat slug.
- a height differential between bonding pads on a high-power component 142 and conductive interconnects 135 on the laminate is reduced.
- the height differential may be between about 5 mils and about 20 mils. This can allow a same electrical connection process (e.g., wire or ribbon bonding) to be used for making electrical connections between the high-power component and microwave circuitry on the laminate and between leads 110 and the microwave circuitry.
- a high-power component 142 , 144 mounted in a package 200 may include a plurality of bond wires 115 connected to a same terminal of the component, as depicted in FIG. 2A .
- the wire bonds may be spaced apart on a regular pitch in some cases, or may be spaced on an irregular pitch.
- the pitch of bond wires 115 connected to a same terminal may be between approximately 0.1 mm and approximately 0.5 mm.
- the bond wires may comprise gold or any other suitable metal.
- the bond wires may be connected to conductive interconnects or bond pads using a ball bond or wedge bond for example. In some cases, ribbon bonds may be used instead of, or in addition to, bond wires.
- a high-power amplifier package 200 may include one or more impedance-matching networks and/or biasing networks.
- An impedance-matching network may transform input and output impedances to and from a high-power transistor, for example, to match impedances of adjacent circuitry to which the transistor connects.
- an impedance-matching network connected to a gate of a power transistor may transform the input impedance of the transistor to an impedance value (e.g., approximately 50 Ohms) that better matches an output impedance of upstream circuitry to which the gate connects.
- Impedance-matching networks may comprise any suitable combination of resistors, capacitors, inductors, and transmission line segments, and may be designed to approximately match impedances at a selected operating frequency (sometimes referred to as a “fundamental frequency”) or over frequency range for the amplifier.
- An operating frequency may be between approximately 500 MHz and approximately 6 GHz, according to some implementations, or may be between approximately 1 GHz and approximately 6 GHz, though some embodiments may be designed for lower or higher frequencies.
- a high-power amplifier package 200 may further include capacitive shunts and/or filters to reduce or terminate power at the second harmonic and/or higher harmonics of the fundamental frequency, or to suppress noise.
- a voltage bias network may be included in a high-power amplifier package 200 .
- a voltage bias network may include a separate negative voltage generator die, for example, that is soldered or otherwise connected to circuitry on the laminate 120 .
- the voltage bias network may be configured to generate and provide an appropriate negative gate bias to the GaN power transistors prior to biasing drains of the power transistors, so as to avoid damaging the power transistors.
- the voltage bias network may generate one or more negative bias levels from a fixed voltage input received by the package 200 .
- FIG. 3 depicts just one example of amplification circuitry 300 that may be included in a high-power amplifier package 200 , though the invention is not limited only to amplifiers.
- a high-power amplifier may be a multistage amplifier having a first power transistor PT 1 and a second power transistor PT 2 .
- Wire bonds within the package 200 may contribute inductances L 1 -L 6 to the circuit.
- Discrete capacitors C 1 -C 12 and resistors R 1 , R 2 (which may be surface mount components) may be included in the circuit for impedance matching, biasing, and filtering.
- resistors R 1 , R 2 and capacitors C 2 , C 8 may be arranged to bias the gates of transistors PT 1 , PT 2 .
- Shunt capacitors C 5 , C 6 and C 11 , C 12 may be arranged to suppress harmonics at the outputs of the transistors.
- the circuitry 300 may further include transmission line segments 310 of selected lengths that rotate impedance values at gate inputs of the transistors to better match output impedances of upstream circuits.
- the amplifier circuitry 300 may be tuned to a desired operating frequency or frequency range by selecting resistor and capacitor component values for a particular operating frequency or frequency range. Inductance values may be changed by adding or removing bond wires to bond-wire groups where two or more wire bonds are made to a same terminal, for example. In some implementations, discrete inductors may be included in the circuit. Transmission line segment lengths and properties may be changed by changing a laminate design.
- the tuning process for a microwave circuit may be performed with the assistance of numerical simulation or using empirical methods.
- tuning may be implemented using a software tool such as Advanced Design System (ADS) available from Keysight Technologies, Inc. of Santa Rosa, Calif.
- ADS Advanced Design System
- Other suitable software tools include, but are not limited to NI AWR Design Environment available from AWR Corporation of El Segundo, Calif. and Sonnet® software tools available from Sonnet Software of North Syracuse, N.Y.
- Some embodiments may include heterojunction transistors comprising SiC, SiGe, GaAs, InP, and CdTe.
- Direct mounting of high-power transistors on heat slugs in power-amplifier packages may be useful for various types of amplifiers including, but not limited to, class-A, class-B, class-J, class-F, inverse class-F, class-AB, and Doherty amplifiers.
- a Doherty amplifier configuration may be included within the package 200 where transistors in the parallel amplification paths are mounted directly on the heat slug.
- FIG. 4A to FIG. 4D There are various processes that may be used to assemble high-power amplifier packages, such as the package 200 depicted in FIG. 2A . Structures associated with methods for assembling a packaged high-power amplifier are depicted in FIG. 4A to FIG. 4D .
- a method for assembling a packaged high-power amplifier may comprise mounting a power transistor 143 directly on a heat slug 107 , as depicted in FIG. 4A .
- the power transistor may be adhered, bonded, or otherwise placed in thermal contact with the heat slug.
- the heat slug may be mounted within or otherwise connected to a case 105 in some embodiments. In other embodiments, the case may be formed or attached around the heat slug after the power transistor and/or laminate is/are mounted over the heat slug.
- a method of assembly may comprise mounting a laminate 120 with microwave circuitry over the heat slug, such that the power transistor 143 is located within a cut-out 125 of the laminate, as depicted in FIG. 4B .
- the laminate may, or may not, contact the heat slug.
- Conductive leads 110 may be mounted adjacent to the laminate and microwave circuitry.
- a method of assembly may comprise making electrical connections between terminals on the power transistor 143 and the microwave circuitry, and between the leads 110 and the microwave circuitry, as depicted in FIG. 4C .
- the electrical connections may be made using a same wire-bonding process (e.g., using bond wires having a same diameter and bonded in the same manner).
- a discrete component 130 may be replaced with a component 132 of a different value (e.g., different capacitance or different resistance) after the laminate has been mounted to tune operation of the microwave circuitry to a particular application (e.g., a particular operating frequency, frequency range, or gain characteristic).
- a method of assembly may include enclosing the laminate and power transistor with an upper case 106 .
- the upper case may be bonded to the lower case 105 , or may be formed by over-molding in place.
- an interior region 410 may be filled with an insulating material, or may be filled by the upper case material.
- the terms “approximately” and “about” may be used to mean within ⁇ 20% of a target dimension in some embodiments, within ⁇ 10% of a target dimension in some embodiments, within ⁇ 5% of a target dimension in some embodiments, and yet within ⁇ 2% of a target dimension in some embodiments.
- the terms “approximately” and “about” may include the target dimension.
- the technology described herein may be embodied as a method, of which at least some acts have been described.
- the acts performed as part of the method may be ordered in any suitable way. Accordingly, embodiments may be constructed in which acts are performed in an order different than described, which may include performing some acts simultaneously, even though described as sequential acts in illustrative embodiments. Additionally, a method may include more acts than those described, in some embodiments, and fewer acts than those described in other embodiments.
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- Computer Hardware Design (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
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Abstract
Description
Claims (15)
Priority Applications (3)
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US15/158,163 US9960127B2 (en) | 2016-05-18 | 2016-05-18 | High-power amplifier package |
PCT/US2016/049813 WO2017200561A1 (en) | 2016-05-18 | 2016-09-01 | High-power amplifier package |
US15/935,996 US10700023B2 (en) | 2016-05-18 | 2018-03-26 | High-power amplifier package |
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US15/158,163 US9960127B2 (en) | 2016-05-18 | 2016-05-18 | High-power amplifier package |
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US15/935,996 Continuation US10700023B2 (en) | 2016-05-18 | 2018-03-26 | High-power amplifier package |
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US20170338194A1 US20170338194A1 (en) | 2017-11-23 |
US9960127B2 true US9960127B2 (en) | 2018-05-01 |
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US15/158,163 Active US9960127B2 (en) | 2016-05-18 | 2016-05-18 | High-power amplifier package |
US15/935,996 Active US10700023B2 (en) | 2016-05-18 | 2018-03-26 | High-power amplifier package |
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US15/935,996 Active US10700023B2 (en) | 2016-05-18 | 2018-03-26 | High-power amplifier package |
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US (2) | US9960127B2 (en) |
WO (1) | WO2017200561A1 (en) |
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US10700023B2 (en) | 2016-05-18 | 2020-06-30 | Macom Technology Solutions Holdings, Inc. | High-power amplifier package |
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Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1599852A (en) | 1977-02-17 | 1981-10-07 | Varian Associates | Package for holding a composite semiconductor device |
EP0563873A2 (en) | 1992-04-03 | 1993-10-06 | Matsushita Electric Industrial Co., Ltd. | High frequency ceramic multi-layer substrate |
US5519252A (en) | 1992-07-24 | 1996-05-21 | Fuji Electric Co., Ltd. | Power semiconductor device employing pin block connection arrangement for facilitated and economized manufacture |
US5703399A (en) | 1995-11-15 | 1997-12-30 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor power module |
US5796165A (en) | 1996-03-19 | 1998-08-18 | Matsushita Electronics Corporation | High-frequency integrated circuit device having a multilayer structure |
JPH10242377A (en) | 1997-02-25 | 1998-09-11 | Hitachi Ltd | High-frequency power amplifier module |
JPH11150228A (en) | 1997-11-18 | 1999-06-02 | Oki Electric Ind Co Ltd | Ic bare-chip mounting structure |
EP1085594A2 (en) | 1999-09-17 | 2001-03-21 | Kabushiki Kaisha Toshiba | High frequency circuit apparatus |
US6291880B1 (en) | 1998-02-12 | 2001-09-18 | Hitachi, Ltd. | Semiconductor device including an integrally molded lead frame |
WO2003037048A1 (en) | 2001-10-22 | 2003-05-01 | Micro Mobio Corporation | Multilayer rf amplifier module |
US20030102494A1 (en) | 2001-11-30 | 2003-06-05 | Hitachi, Ltd. | Semiconductor device |
US7061080B2 (en) | 2001-06-11 | 2006-06-13 | Fairchild Korea Semiconductor Ltd. | Power module package having improved heat dissipating capability |
US20060138654A1 (en) | 2004-12-24 | 2006-06-29 | Kabushiki Kaisha Toshiba | Semiconductor device |
US20110100681A1 (en) | 2008-04-28 | 2011-05-05 | Peter Kimmich | Substrate-mounted circuit module having components in a plurality of contacting planes |
US20120032190A1 (en) * | 2010-08-06 | 2012-02-09 | Kabushiki Kaisha Toshiba | Package and fabrication method of the same |
US20130175628A1 (en) | 2012-01-05 | 2013-07-11 | Harris Corporation, Corporation Of The State Of Delaware | Electronic device including electrically conductive body for esd protection and related methods |
US20140191809A1 (en) | 2012-05-25 | 2014-07-10 | Panasonic Corporation | Radio frequency amplifier circuit |
WO2015028839A1 (en) | 2013-08-29 | 2015-03-05 | Freescale Semiconductor, Inc. | Integrated solid state microwave power generation modules |
US20150311332A1 (en) | 2013-12-13 | 2015-10-29 | Dynax Semiconductor, Inc. | Semiconductor device and method of manufacturing the same |
CN204836090U (en) | 2015-06-29 | 2015-12-02 | 苏州英诺迅科技股份有限公司 | GaAs and LDMOSGaN mix integrated microwave power amplifier based on BT base plate |
US9252067B1 (en) | 2006-01-25 | 2016-02-02 | Lockheed Martin Corporation | Hybrid microwave integrated circuit |
US20160056150A1 (en) | 2013-03-27 | 2016-02-25 | Panasonic Intellectual Property Management Co., Ltd. | Power semiconductor element |
Family Cites Families (95)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2167271B1 (en) | 1972-01-11 | 1977-04-01 | Staver Co | |
FR2516311B1 (en) | 1981-11-06 | 1985-10-11 | Thomson Csf | BASE FOR MOUNTING A SEMICONDUCTOR PELLET ON THE BASE OF AN ENCAPSULATION BOX, AND METHOD FOR PRODUCING THE BASE |
JPS5879773A (en) | 1981-11-06 | 1983-05-13 | Fujitsu Ltd | Field-effect transistor |
JPS59163865A (en) | 1983-03-08 | 1984-09-14 | Toshiba Corp | Gate turn-off thyristor |
DE3718684A1 (en) | 1987-06-04 | 1988-12-22 | Licentia Gmbh | SEMICONDUCTOR BODY |
JPH01149461A (en) | 1987-12-04 | 1989-06-12 | Nec Corp | Semiconductor device |
US4842699A (en) | 1988-05-10 | 1989-06-27 | Avantek, Inc. | Method of selective via-hole and heat sink plating using a metal mask |
JP3026087B2 (en) | 1989-03-01 | 2000-03-27 | 豊田合成株式会社 | Gas phase growth method of gallium nitride based compound semiconductor |
US4985742A (en) | 1989-07-07 | 1991-01-15 | University Of Colorado Foundation, Inc. | High temperature semiconductor devices having at least one gallium nitride layer |
US5449930A (en) | 1990-08-01 | 1995-09-12 | Zhou; Guo-Gang | High power, compound semiconductor device and fabrication process |
JP2505065B2 (en) | 1990-10-04 | 1996-06-05 | 三菱電機株式会社 | Semiconductor device and manufacturing method thereof |
JP2696095B2 (en) | 1990-10-27 | 1998-01-14 | 豊田合成株式会社 | Method of manufacturing gallium nitride based compound semiconductor light emitting device |
US5192987A (en) | 1991-05-17 | 1993-03-09 | Apa Optics, Inc. | High electron mobility transistor with GaN/Alx Ga1-x N heterojunctions |
JP3352712B2 (en) | 1991-12-18 | 2002-12-03 | 浩 天野 | Gallium nitride based semiconductor device and method of manufacturing the same |
JPH06310547A (en) | 1993-02-25 | 1994-11-04 | Mitsubishi Electric Corp | Semiconductor device and manufacture thereof |
US5393993A (en) | 1993-12-13 | 1995-02-28 | Cree Research, Inc. | Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices |
JP3753747B2 (en) | 1993-12-27 | 2006-03-08 | 豊田合成株式会社 | Gallium nitride compound semiconductor laser diode |
US5679152A (en) | 1994-01-27 | 1997-10-21 | Advanced Technology Materials, Inc. | Method of making a single crystals Ga*N article |
US5592501A (en) | 1994-09-20 | 1997-01-07 | Cree Research, Inc. | Low-strain laser structures with group III nitride active layers |
US5523589A (en) | 1994-09-20 | 1996-06-04 | Cree Research, Inc. | Vertical geometry light emitting diode with group III nitride active layer and extended lifetime |
JP3557011B2 (en) | 1995-03-30 | 2004-08-25 | 株式会社東芝 | Semiconductor light emitting device and manufacturing method thereof |
JPH08307001A (en) | 1995-04-28 | 1996-11-22 | Mitsubishi Electric Corp | Semiconductor laser diode and method of manufacture |
US5739554A (en) | 1995-05-08 | 1998-04-14 | Cree Research, Inc. | Double heterojunction light emitting diode with gallium nitride active layer |
DE69622277T2 (en) | 1995-09-18 | 2003-03-27 | Hitachi, Ltd. | SEMICONDUCTOR MATERIAL, METHOD FOR PRODUCING SEMICONDUCTOR MATERIAL AND SEMICONDUCTOR DEVICE |
JP3396356B2 (en) | 1995-12-11 | 2003-04-14 | 三菱電機株式会社 | Semiconductor device and method of manufacturing the same |
US5874747A (en) | 1996-02-05 | 1999-02-23 | Advanced Technology Materials, Inc. | High brightness electroluminescent device emitting in the green to ultraviolet spectrum and method of making the same |
EP0804054A1 (en) | 1996-04-16 | 1997-10-29 | Allen-Bradley Company, Inc. | Insulated surface mount circuit board construction |
JP3756575B2 (en) | 1996-06-04 | 2006-03-15 | 富士電機ホールディングス株式会社 | Group III nitride semiconductor device |
US5905275A (en) | 1996-06-17 | 1999-05-18 | Kabushiki Kaisha Toshiba | Gallium nitride compound semiconductor light-emitting device |
JPH1051065A (en) | 1996-08-02 | 1998-02-20 | Matsushita Electron Corp | Semiconductor laser device |
JP3179346B2 (en) | 1996-08-27 | 2001-06-25 | 松下電子工業株式会社 | Method for producing gallium nitride crystal |
JP3447527B2 (en) | 1996-09-09 | 2003-09-16 | 株式会社東芝 | Semiconductor light emitting device and method of manufacturing the same |
US5955772A (en) | 1996-12-17 | 1999-09-21 | The Regents Of The University Of California | Heterostructure thermionic coolers |
JP3325477B2 (en) | 1996-12-25 | 2002-09-17 | 京セラ株式会社 | Package for storing semiconductor elements |
US5741724A (en) | 1996-12-27 | 1998-04-21 | Motorola | Method of growing gallium nitride on a spinel substrate |
US6121634A (en) | 1997-02-21 | 2000-09-19 | Kabushiki Kaisha Toshiba | Nitride semiconductor light emitting device and its manufacturing method |
JPH10242584A (en) | 1997-02-28 | 1998-09-11 | Hitachi Ltd | Semiconductor light-emitting element |
EP0871228A3 (en) | 1997-04-09 | 2001-10-24 | Matsushita Electric Industrial Co., Ltd. | Semiconductor substrate, semiconductor device and method of manufacturing the same |
ATE550461T1 (en) | 1997-04-11 | 2012-04-15 | Nichia Corp | GROWTH METHOD FOR A NITRIDE SEMICONDUCTOR |
JP3882266B2 (en) | 1997-05-19 | 2007-02-14 | 日亜化学工業株式会社 | Semiconductor device |
US6239033B1 (en) | 1998-05-28 | 2001-05-29 | Sony Corporation | Manufacturing method of semiconductor device |
JPH10335637A (en) | 1997-05-30 | 1998-12-18 | Sony Corp | Hetero-junction field effect transistor |
FR2765398B1 (en) | 1997-06-25 | 1999-07-30 | Commissariat Energie Atomique | STRUCTURE WITH MICROELECTRONIC COMPONENT IN SEMICONDUCTOR MATERIAL DIFFICULT OF ENGRAVING AND WITH METAL HOLES |
JP4119501B2 (en) | 1997-07-10 | 2008-07-16 | ローム株式会社 | Semiconductor light emitting device |
JP3813740B2 (en) | 1997-07-11 | 2006-08-23 | Tdk株式会社 | Substrates for electronic devices |
US6201262B1 (en) | 1997-10-07 | 2001-03-13 | Cree, Inc. | Group III nitride photonic devices on silicon carbide substrates with conductive buffer interlay structure |
JP3036495B2 (en) | 1997-11-07 | 2000-04-24 | 豊田合成株式会社 | Method for manufacturing gallium nitride-based compound semiconductor |
JP3269475B2 (en) | 1998-02-16 | 2002-03-25 | 日本電気株式会社 | Semiconductor device |
US6051849A (en) | 1998-02-27 | 2000-04-18 | North Carolina State University | Gallium nitride semiconductor structures including a lateral gallium nitride layer that extends from an underlying gallium nitride layer |
US5982000A (en) | 1998-04-03 | 1999-11-09 | Ericsson Inc. | Resistive interconnect of transistor cells |
US6500257B1 (en) | 1998-04-17 | 2002-12-31 | Agilent Technologies, Inc. | Epitaxial material grown laterally within a trench and method for producing same |
US6265289B1 (en) | 1998-06-10 | 2001-07-24 | North Carolina State University | Methods of fabricating gallium nitride semiconductor layers by lateral growth from sidewalls into trenches, and gallium nitride semiconductor structures fabricated thereby |
US6316793B1 (en) | 1998-06-12 | 2001-11-13 | Cree, Inc. | Nitride based transistors on semi-insulating silicon carbide substrates |
JP3316562B2 (en) | 1998-07-21 | 2002-08-19 | 株式会社村田製作所 | Semiconductor light emitting device and method of forming ZnO film |
US6236116B1 (en) | 1998-09-03 | 2001-05-22 | Micron Technology, Inc. | Semiconductor device having a built-in heat sink and process of manufacturing same |
JP3164078B2 (en) | 1998-10-05 | 2001-05-08 | 日本電気株式会社 | Field effect transistor and method of manufacturing the same |
JP3505405B2 (en) | 1998-10-22 | 2004-03-08 | 三洋電機株式会社 | Semiconductor device and method of manufacturing the same |
US6177688B1 (en) | 1998-11-24 | 2001-01-23 | North Carolina State University | Pendeoepitaxial gallium nitride semiconductor layers on silcon carbide substrates |
US6255198B1 (en) | 1998-11-24 | 2001-07-03 | North Carolina State University | Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelectronic structures formed thereby |
US6426512B1 (en) | 1999-03-05 | 2002-07-30 | Toyoda Gosei Co., Ltd. | Group III nitride compound semiconductor device |
JP2000261035A (en) | 1999-03-12 | 2000-09-22 | Toyoda Gosei Co Ltd | GaN-BASED SEMICONDUCTOR DEVICE |
JP2000277441A (en) | 1999-03-26 | 2000-10-06 | Nagoya Kogyo Univ | Semiconductor structure, semiconductor element comprising the same and crystal growth method |
JP3591710B2 (en) | 1999-12-08 | 2004-11-24 | ソニー株式会社 | Method of growing nitride III-V compound layer and method of manufacturing substrate using the same |
US6812053B1 (en) | 1999-10-14 | 2004-11-02 | Cree, Inc. | Single step pendeo- and lateral epitaxial overgrowth of Group III-nitride epitaxial layers with Group III-nitride buffer layer and resulting structures |
US6441393B2 (en) | 1999-11-17 | 2002-08-27 | Lumileds Lighting U.S., Llc | Semiconductor devices with selectively doped III-V nitride layers |
US6521514B1 (en) | 1999-11-17 | 2003-02-18 | North Carolina State University | Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on sapphire substrates |
JP2001160627A (en) | 1999-11-30 | 2001-06-12 | Toyoda Gosei Co Ltd | Group iii nitride compound semiconductor light emitting element |
US20020069816A1 (en) | 1999-12-13 | 2002-06-13 | Thomas Gehrke | Methods of fabricating gallium nitride layers on textured silicon substrates, and gallium nitride semiconductor structures fabricated thereby |
US6380108B1 (en) | 1999-12-21 | 2002-04-30 | North Carolina State University | Pendeoepitaxial methods of fabricating gallium nitride semiconductor layers on weak posts, and gallium nitride semiconductor structures fabricated thereby |
US6355497B1 (en) | 2000-01-18 | 2002-03-12 | Xerox Corporation | Removable large area, low defect density films for led and laser diode growth |
US6586781B2 (en) | 2000-02-04 | 2003-07-01 | Cree Lighting Company | Group III nitride based FETs and HEMTs with reduced trapping and method for producing the same |
US6403451B1 (en) | 2000-02-09 | 2002-06-11 | Noerh Carolina State University | Methods of fabricating gallium nitride semiconductor layers on substrates including non-gallium nitride posts |
WO2001059819A1 (en) | 2000-02-09 | 2001-08-16 | North Carolina State University | Methods of fabricating gallium nitride semiconductor layers on substrates including non-gallium nitride posts, and gallium nitride semiconductor structures fabricated thereby |
US6261929B1 (en) | 2000-02-24 | 2001-07-17 | North Carolina State University | Methods of forming a plurality of semiconductor layers using spaced trench arrays |
JP3751791B2 (en) | 2000-03-28 | 2006-03-01 | 日本電気株式会社 | Heterojunction field effect transistor |
FR2809534B1 (en) | 2000-05-26 | 2005-01-14 | Commissariat Energie Atomique | SEMICONDUCTOR DEVICE WITH VERTICAL ELECTRONIC INJECTION AND MANUFACTURING METHOD THEREOF |
US6707074B2 (en) | 2000-07-04 | 2004-03-16 | Matsushita Electric Industrial Co., Ltd. | Semiconductor light-emitting device and apparatus for driving the same |
AU2001279163A1 (en) | 2000-08-04 | 2002-02-18 | The Regents Of The University Of California | Method of controlling stress in gallium nitride films deposited on substrates |
US6649287B2 (en) | 2000-12-14 | 2003-11-18 | Nitronex Corporation | Gallium nitride materials and methods |
US6611002B2 (en) | 2001-02-23 | 2003-08-26 | Nitronex Corporation | Gallium nitride material devices and methods including backside vias |
US6956250B2 (en) | 2001-02-23 | 2005-10-18 | Nitronex Corporation | Gallium nitride materials including thermally conductive regions |
US6489636B1 (en) | 2001-03-29 | 2002-12-03 | Lumileds Lighting U.S., Llc | Indium gallium nitride smoothing structures for III-nitride devices |
JP2004288948A (en) | 2003-03-24 | 2004-10-14 | Kyocera Corp | Semiconductor element-housing package and semiconductor device |
US7221042B2 (en) | 2004-11-24 | 2007-05-22 | Agere Systems Inc | Leadframe designs for integrated circuit plastic packages |
EP1739736A1 (en) | 2005-06-30 | 2007-01-03 | Interuniversitair Microelektronica Centrum ( Imec) | Method of manufacturing a semiconductor device |
US20080157222A1 (en) | 2006-12-27 | 2008-07-03 | Mediatek Inc. | Rf integrated circuit device |
KR101391924B1 (en) | 2007-01-05 | 2014-05-07 | 페어차일드코리아반도체 주식회사 | Semiconductor package |
JP2012084743A (en) | 2010-10-13 | 2012-04-26 | Fujitsu Semiconductor Ltd | Semiconductor device and power supply device |
JP6240898B2 (en) | 2012-09-12 | 2017-12-06 | パナソニックIpマネジメント株式会社 | Semiconductor device |
WO2014057906A1 (en) | 2012-10-11 | 2014-04-17 | ローム株式会社 | Nitride semiconductor device and fabrication method therefor |
JP6338832B2 (en) | 2013-07-31 | 2018-06-06 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
JP2015056637A (en) | 2013-09-13 | 2015-03-23 | 株式会社東芝 | Semiconductor device |
JP6584783B2 (en) | 2015-02-06 | 2019-10-02 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
US9960127B2 (en) | 2016-05-18 | 2018-05-01 | Macom Technology Solutions Holdings, Inc. | High-power amplifier package |
US10134658B2 (en) | 2016-08-10 | 2018-11-20 | Macom Technology Solutions Holdings, Inc. | High power transistors |
-
2016
- 2016-05-18 US US15/158,163 patent/US9960127B2/en active Active
- 2016-09-01 WO PCT/US2016/049813 patent/WO2017200561A1/en active Application Filing
-
2018
- 2018-03-26 US US15/935,996 patent/US10700023B2/en active Active
Patent Citations (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1599852A (en) | 1977-02-17 | 1981-10-07 | Varian Associates | Package for holding a composite semiconductor device |
EP0563873A2 (en) | 1992-04-03 | 1993-10-06 | Matsushita Electric Industrial Co., Ltd. | High frequency ceramic multi-layer substrate |
US5519252A (en) | 1992-07-24 | 1996-05-21 | Fuji Electric Co., Ltd. | Power semiconductor device employing pin block connection arrangement for facilitated and economized manufacture |
US5703399A (en) | 1995-11-15 | 1997-12-30 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor power module |
US5796165A (en) | 1996-03-19 | 1998-08-18 | Matsushita Electronics Corporation | High-frequency integrated circuit device having a multilayer structure |
JPH10242377A (en) | 1997-02-25 | 1998-09-11 | Hitachi Ltd | High-frequency power amplifier module |
JPH11150228A (en) | 1997-11-18 | 1999-06-02 | Oki Electric Ind Co Ltd | Ic bare-chip mounting structure |
US6291880B1 (en) | 1998-02-12 | 2001-09-18 | Hitachi, Ltd. | Semiconductor device including an integrally molded lead frame |
EP1085594A2 (en) | 1999-09-17 | 2001-03-21 | Kabushiki Kaisha Toshiba | High frequency circuit apparatus |
US7061080B2 (en) | 2001-06-11 | 2006-06-13 | Fairchild Korea Semiconductor Ltd. | Power module package having improved heat dissipating capability |
WO2003037048A1 (en) | 2001-10-22 | 2003-05-01 | Micro Mobio Corporation | Multilayer rf amplifier module |
US20030102494A1 (en) | 2001-11-30 | 2003-06-05 | Hitachi, Ltd. | Semiconductor device |
US20060138654A1 (en) | 2004-12-24 | 2006-06-29 | Kabushiki Kaisha Toshiba | Semiconductor device |
US9252067B1 (en) | 2006-01-25 | 2016-02-02 | Lockheed Martin Corporation | Hybrid microwave integrated circuit |
US20110100681A1 (en) | 2008-04-28 | 2011-05-05 | Peter Kimmich | Substrate-mounted circuit module having components in a plurality of contacting planes |
US20120032190A1 (en) * | 2010-08-06 | 2012-02-09 | Kabushiki Kaisha Toshiba | Package and fabrication method of the same |
US20130175628A1 (en) | 2012-01-05 | 2013-07-11 | Harris Corporation, Corporation Of The State Of Delaware | Electronic device including electrically conductive body for esd protection and related methods |
US20140191809A1 (en) | 2012-05-25 | 2014-07-10 | Panasonic Corporation | Radio frequency amplifier circuit |
US20160056150A1 (en) | 2013-03-27 | 2016-02-25 | Panasonic Intellectual Property Management Co., Ltd. | Power semiconductor element |
WO2015028839A1 (en) | 2013-08-29 | 2015-03-05 | Freescale Semiconductor, Inc. | Integrated solid state microwave power generation modules |
US20150311332A1 (en) | 2013-12-13 | 2015-10-29 | Dynax Semiconductor, Inc. | Semiconductor device and method of manufacturing the same |
CN204836090U (en) | 2015-06-29 | 2015-12-02 | 苏州英诺迅科技股份有限公司 | GaAs and LDMOSGaN mix integrated microwave power amplifier based on BT base plate |
Non-Patent Citations (1)
Title |
---|
International Search Report and Written Opinion for Application No. PCT/US2016/049813 dated Feb. 15, 2017. |
Cited By (4)
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US10134658B2 (en) | 2016-08-10 | 2018-11-20 | Macom Technology Solutions Holdings, Inc. | High power transistors |
US11367674B2 (en) | 2016-08-10 | 2022-06-21 | Macom Technology Solutions Holdings, Inc. | High power transistors |
US11862536B2 (en) | 2016-08-10 | 2024-01-02 | Macom Technology Solutions Holdings, Inc. | High power transistors |
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WO2017200561A1 (en) | 2017-11-23 |
US20170338194A1 (en) | 2017-11-23 |
US10700023B2 (en) | 2020-06-30 |
US20190006297A1 (en) | 2019-01-03 |
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