US9746606B2 - Waveguide structure, waveguide coupling structure, and production method - Google Patents

Waveguide structure, waveguide coupling structure, and production method Download PDF

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US9746606B2
US9746606B2 US15/152,831 US201615152831A US9746606B2 US 9746606 B2 US9746606 B2 US 9746606B2 US 201615152831 A US201615152831 A US 201615152831A US 9746606 B2 US9746606 B2 US 9746606B2
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layer
waveguide
silicon
silicon dioxide
waveguide layer
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US20160252678A1 (en
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Jing Hu
Xiaoping Zhou
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Huawei Technologies Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by the arrayed waveguides, e.g. comprising a filled groove in the array section
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12023—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the polarisation dependence, e.g. reduced birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12026—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the temperature dependence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1228—Tapered waveguides, e.g. integrated spot-size transformers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035—Materials
    • G02B2006/12038—Glass (SiO2 based materials)
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12035—Materials
    • G02B2006/12061—Silicon

Definitions

  • the present invention relates to the field of optical communication devices, and in particular, to a waveguide structure, a waveguide coupling structure, and a production method.
  • a process error of a silicon waveguide has a relatively high impact on a refractive index of the waveguide.
  • the impact causes random changes in refractive indexes of different parts of the silicon waveguide. Consequently, there is a relatively significant random change in an operating wavelength of a silicon-based photonic device, or performance of crosstalk between paths of the device deteriorates.
  • a relatively large refractive index difference further causes quite high polarization dependence of the silicon waveguide, which is unfavorable for implementing polarization-insensitive work.
  • the silicon waveguide is highly sensitive to temperature, and can work properly only within a proper temperature range.
  • a silicon-based arrayed waveguide grating is a quite important silicon-based photonic device. Because the silicon-based arrayed waveguide grating can implement wavelength splitting for a large quantity of wavelengths at the same time and control multiple wavelengths in a unified manner, and has a wide free spectral range and a compact device size, the silicon-based arrayed waveguide grating is considered as an important alternative to upgrading an optical splitter in network products.
  • the silicon-based arrayed waveguide grating is still restricted in terms of materials, and performance of an optical splitter to which the silicon-based arrayed waveguide grating is applied still cannot meet a requirement, which are mainly reflected as follows: Firstly, the silicon-based arrayed waveguide grating is highly sensitive to a process error, and has a crosstalk value of less than 15 dB, which cannot meet application requirements of some networks. For example, a crosstalk value of at least 25 dB is required in a passive optical network (Passive Optical Network, PON) for short, and a crosstalk value of at least 35 dB is required in a 40G-PON with two stages of optical splitters.
  • PON Passive Optical Network
  • the silicon-based arrayed waveguide grating is highly sensitive to temperature, and there is no mature a thermal solution; therefore, a semiconductor thermoelectric cooler (TEC for short) is required to perform temperature control, which also increases power consumption.
  • TEC semiconductor thermoelectric cooler
  • a refractive index difference of a silicon waveguide is large, polarization dependence is quite high. Because of the quite high polarization dependence, the silicon-based arrayed waveguide grating can hardly implement polarization-insensitive work required by optical splitting; instead, a polarization diversity manner needs to be used, that is, two devices are used to respectively process two beams of polarized light. However, in the polarization diversity manner, a device volume definitely increases, which is unfavorable for device miniaturization. In view of the foregoing undesirable factors, performance of the silicon-based arrayed waveguide grating urgently needs to be improved.
  • crosstalk of an arrayed waveguide grating is mainly subject to a random phase error of an arrayed waveguide that is caused by a process error.
  • causes for generation of this random phase error are mainly classified into two types: One type is non-uniformity of a material of an arrayed waveguide, and the other type is a random change in a refractive index of an arrayed waveguide.
  • a random change in a refractive index of an arrayed waveguide is a leading factor that causes a random phase error. Therefore, researchers mainly optimize crosstalk performance of an arrayed waveguide grating by changing a structure of an arrayed waveguide.
  • embodiments of the present invention provide a waveguide structure that has low polarization dependence and low temperature sensitivity, and in which a crosstalk value meets a requirement.
  • a waveguide structure is provided, where the waveguide structure is applied to a straight waveguide part of an arrayed waveguide in a silicon-on-insulator-based arrayed waveguide grating; the waveguide structure includes two axisymmetrically disposed first ends, and the first end is sequentially divided into a first region, a second region, and a third region in a direction toward an axis of symmetry; and the waveguide structure includes a first silicon substrate layer, a second silicon substrate layer, a first silicon dioxide layer, a second silicon dioxide layer, and a first silicon waveguide layer;
  • the first silicon substrate layer, the second silicon substrate layer, the first silicon dioxide layer, the second silicon dioxide layer, and the first silicon waveguide layer are sequentially disposed; a width of the first silicon waveguide layer is a constant value; and an optical signal is transmitted at the first silicon waveguide layer;
  • the second silicon substrate layer is etched as a first air layer; the first silicon substrate layer, the first air layer, the first silicon dioxide layer, the second silicon dioxide layer, and the first silicon waveguide layer are sequentially disposed; a width of the first silicon waveguide layer gradually decreases in the direction toward the axis of symmetry; and the optical signal is gradually transmitted from the first silicon waveguide layer to a first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer and the second silicon dioxide layer; and
  • the second silicon substrate layer is etched as the first air layer; the first silicon substrate layer, the first air layer, the first silicon dioxide layer, and the second silicon dioxide layer are sequentially disposed; a width of the first silicon waveguide layer is 0; and the optical signal is transmitted at the first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer and the second silicon dioxide layer.
  • the first silicon dioxide layer includes multiple parallel first silicon dioxide layer units that are arrayed at intervals, and a uniform first trench is disposed between the adjacent first silicon dioxide layer units;
  • the second silicon dioxide layer includes multiple second silicon dioxide layer units, the second silicon dioxide layer units correspondingly cover surfaces of the first silicon dioxide layer units, and the first silicon dioxide layer units and the second silicon dioxide layer units are included in the first ridge silicon dioxide waveguide layer;
  • the first silicon waveguide layer includes multiple first silicon waveguide layer units, and the first silicon waveguide layer units correspondingly cover surfaces of the second silicon dioxide layer units.
  • a production method for producing a waveguide structure including the following steps:
  • the first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer and the second silicon dioxide layer
  • a waveguide structure where the waveguide structure is applied to a straight waveguide part of an arrayed waveguide in a silicon-on-insulator-based arrayed waveguide grating, the waveguide structure includes two axisymmetrically disposed first ends, and the first end is divided into a first region, a second region, and a third region in a direction toward an axis of symmetry; the waveguide structure includes a third silicon substrate layer, a third silicon dioxide layer, a second silicon waveguide layer, a first waveguide layer, and a second waveguide layer that are sequentially disposed; and a coverage area of the second silicon waveguide layer is less than a coverage area of the third silicon dioxide layer, the second silicon waveguide layer is partially buried in the first waveguide layer, a coverage area of the first waveguide layer is greater than a coverage area of the second waveguide layer, and refractive indexes of the first waveguide layer and the second waveguide layer both lie between a refractive index of the second silicon waveguide
  • the third silicon substrate layer, the third silicon dioxide layer, and the second silicon waveguide layer are sequentially disposed; a width of the second silicon waveguide layer is constant; and the optical signal is transmitted at the second silicon waveguide layer;
  • the third silicon substrate layer, the third silicon dioxide layer, the second silicon waveguide layer, the first waveguide layer, and the second waveguide layer are sequentially disposed; a width of the second silicon waveguide layer gradually decreases in the direction toward the axis of symmetry; and the optical signal is gradually transmitted from the second silicon waveguide layer to a ridge waveguide layer that includes the first waveguide layer and the second waveguide layer;
  • the third silicon substrate layer, the third silicon dioxide layer, the first waveguide layer, and the second waveguide layer are sequentially disposed; a width of the second silicon waveguide layer is decreased to 0; and the optical signal is transmitted at the ridge waveguide layer that includes the first waveguide layer and the second waveguide layer.
  • the first waveguide layer includes multiple parallel first waveguide layer units that are arrayed at intervals
  • the second waveguide layer includes multiple second waveguide layer units, the second waveguide layer units correspondingly cover surfaces of the first waveguide layer units, and the first waveguide layer units and the second waveguide layer units are included in the ridge waveguide layer
  • the second silicon waveguide layer includes multiple second silicon waveguide layer units, and the second silicon waveguide layer units are correspondingly buried in the first waveguide layer units.
  • materials of the first waveguide layer and the second waveguide layer are the same, and are both silicon nitride or polymethyl methacrylate.
  • a production method for producing the waveguide structure includes the following steps:
  • a waveguide coupling structure is provided, where the waveguide coupling structure is used in a spot-size converter that couples a silicon waveguide to a laser source; the waveguide coupling structure is divided into a first region, a second region, and a third region in a direction toward the laser source; and the waveguide coupling structure includes a fourth silicon substrate layer, a fifth silicon substrate layer, a fourth silicon dioxide layer, a fifth silicon dioxide layer, and a third silicon waveguide layer;
  • the fourth silicon substrate layer, the fifth silicon substrate layer, the fourth silicon dioxide layer, the fifth silicon dioxide layer, and the third silicon waveguide layer are sequentially disposed; a width of the third silicon waveguide layer is constant; and the optical signal is transmitted at the third silicon waveguide layer;
  • the fifth silicon substrate layer is etched as a second air layer; the fourth silicon substrate layer, the second air layer, the fourth silicon dioxide layer, the fifth silicon dioxide layer, and the third silicon waveguide layer are sequentially disposed; a width of the third silicon waveguide layer gradually decreases in the direction toward the laser source; and the optical signal is gradually transmitted from the third silicon waveguide layer to a second ridge silicon dioxide waveguide layer that includes the fourth silicon dioxide layer and the fifth silicon dioxide layer;
  • the fourth silicon substrate layer, the second air layer, the fourth silicon dioxide layer, and the fifth silicon dioxide layer are sequentially disposed; a width of the third silicon waveguide layer is decreased to 0; and the optical signal is transmitted at the second ridge silicon dioxide waveguide layer that includes the fourth silicon dioxide layer and the fifth silicon dioxide layer;
  • the third region is used for coupling to the laser.
  • a production method for producing the waveguide coupling structure includes the following steps:
  • the second ridge silicon dioxide waveguide layer that includes the fourth silicon dioxide layer and the fifth silicon dioxide layer
  • a waveguide structure is provided, where the waveguide structure is applied to a straight waveguide part of an arrayed waveguide in a silicon-on-insulator-based arrayed waveguide grating; the waveguide structure includes two axisymmetrically disposed first ends, and the first end is sequentially divided into a first region, a second region, and a third region in a direction toward an axis of symmetry; and the waveguide structure includes a sixth silicon substrate layer, a seventh silicon substrate layer, a sixth silicon dioxide layer, a fourth silicon waveguide layer, a doped silicon dioxide layer, and a seventh silicon dioxide layer;
  • the sixth silicon substrate layer, the seventh silicon substrate layer, the sixth silicon dioxide layer, and the fourth silicon waveguide layer are sequentially disposed; a width of the fourth silicon waveguide layer is a constant value; the width of the fourth silicon waveguide layer is less than a width of the seventh silicon substrate layer; and an optical signal is transmitted at the fourth silicon waveguide layer;
  • the sixth silicon substrate layer, the seventh silicon substrate layer, the sixth silicon dioxide layer, and the fourth silicon waveguide layer are sequentially disposed; and a width of the fourth silicon waveguide layer gradually decreases in the direction toward the axis of symmetry;
  • the seventh silicon substrate layer and the sixth silicon dioxide layer are etched as a third air layer, and a width of the fourth silicon waveguide layer is 0;
  • the seventh silicon dioxide layer covers surfaces of the fourth silicon waveguide layer and the sixth silicon dioxide layer in the first region, covers surfaces of the fourth silicon waveguide layer and the sixth silicon dioxide layer in the second region, and is further padded into the third air layer in the third region, and a thickness of the seventh silicon dioxide layer is less than or equal to a thickness of the seventh silicon substrate layer in the third region;
  • the doped silicon dioxide layer covers a surface of the seventh silicon dioxide layer in the third region, a coverage area of the doped silicon dioxide layer is less than a coverage area of the seventh silicon dioxide layer, and the doped silicon dioxide layer is corresponding to the fourth silicon waveguide layer;
  • the optical signal in the second region, is gradually transmitted from the fourth silicon waveguide layer to a silicon dioxide waveguide layer that includes the sixth silicon dioxide layer and the seventh silicon dioxide layer; and in the third region, the optical signal is transmitted at the doped silicon dioxide layer.
  • the doped silicon dioxide layer includes multiple parallel doped silicon dioxide layer units that are arrayed at intervals, and a second trench is disposed between the adjacent doped silicon dioxide layer units.
  • the waveguide structure further includes an eighth silicon dioxide layer, the eighth silicon dioxide layer covers the seventh silicon dioxide layer in the first region and the second region, and the eighth silicon dioxide layer covers the second trench in the third region.
  • the method includes the following steps:
  • the method further includes a step of: etching on a surface of the silicon dioxide doped layer to shape the second trench.
  • the method further includes a step of: producing the eighth silicon dioxide layer.
  • the waveguide structure and the waveguide coupling structure that are provided in the present invention have advantages of a small size, low polarization dependence, and low temperature sensitivity, and a crosstalk value is greater than 25 dB, which meets a requirement of a passive optical network system, and provides feasibility for commercialization of an arrayed waveguide grating.
  • FIG. 1 is a schematic structural diagram of an arrayed waveguide grating according to the present invention
  • FIG. 2 is a partially enlarged schematic diagram of part II shown in FIG. 1 ;
  • FIG. 3 and FIG. 7 are schematic diagrams of a waveguide structure according to Embodiment 1 of the present invention.
  • FIG. 4 is a cross-section diagram of a first region shown in FIG. 3 ;
  • FIG. 5 is a cross-section diagram of a second region shown in FIG. 3 ;
  • FIG. 6 is a cross-section diagram of a third region shown in FIG. 3 ;
  • FIG. 8 and FIG. 12 are schematic diagrams of a waveguide structure according to Embodiment 2 of the present invention.
  • FIG. 9 is a cross-section diagram of a first region shown in FIG. 8 ;
  • FIG. 10 is a cross-section diagram of a second region shown in FIG. 8 ;
  • FIG. 11 is a cross-section diagram of a third region shown in FIG. 8 ;
  • FIG. 13 is a schematic diagram of a waveguide coupling structure according to Embodiment 3 of the present invention.
  • FIG. 14 is a partial cross-section diagram of a waveguide structure according to Embodiment 4 of the present invention.
  • FIG. 15 is a schematic structural diagram of a seventh silicon dioxide layer that covers a surface of the waveguide structure shown in FIG. 14 ;
  • FIG. 16 is a schematic structural diagram of an eighth silicon dioxide layer that covers a surface in FIG. 15 .
  • a structure of an arrayed waveguide grating provided in the present invention is roughly the same as that of a common arrayed waveguide grating, and the arrayed waveguide grating provided in the present invention includes an input waveguide IW, an input free propagation region (FPR 1 ), an arrayed waveguide AW, an output planar waveguide region FPR 2 , and an output waveguide OW.
  • a difference lies in the arrayed waveguide AW.
  • FIG. 2 is an enlarged schematic diagram of the arrayed waveguide AW.
  • silicon dioxide in a silicon-on-insulator (silicon on insulator, SOI for short) wafer is used as a straight waveguide part of the arrayed waveguide AW, and a phase difference generated from the straight waveguide part is a main factor that determines an operating wavelength of the arrayed waveguide grating.
  • SOI silicon on insulator
  • FIG. 3 is a schematic diagram of a waveguide structure 100 according to the present invention.
  • the waveguide structure is of a protruding type, and the waveguide structure is applied to a straight waveguide part of an arrayed waveguide AW in an SOI-based arrayed waveguide grating.
  • silicon dioxide in an SOI wafer is used as bottom cladding.
  • the waveguide structure 100 includes two axisymmetrically disposed first ends 100 a .
  • the first end 100 a is sequentially divided into a first region A, a second region B, and a third region C in a direction toward an axis of symmetry.
  • the waveguide structure 100 includes a first silicon substrate layer 10 , a second silicon substrate layer 20 , a first silicon dioxide layer 30 , a second silicon dioxide layer 40 , and a first silicon waveguide layer 50 .
  • the first silicon substrate layer 10 , the second silicon substrate layer 20 , the first silicon dioxide layer 30 , the second silicon dioxide layer 40 , and the first silicon waveguide layer 50 are sequentially disposed.
  • the first silicon waveguide layer 50 is exposed to air, a width of the first silicon waveguide layer 50 is a constant value, a refractive index of the first silicon waveguide layer 50 is greater than refractive indexes of the air and the second silicon dioxide layer 40 , and the refractive index of the first silicon waveguide layer 50 is relatively the largest; therefore, when an optical signal is input to the first silicon waveguide layer 50 in the first region A, the optical signal is transmitted only at the first silicon waveguide layer 50 .
  • the second silicon substrate layer 20 is etched as a first air layer 21 , and the first silicon substrate layer 10 , the first air layer 21 , the first silicon dioxide layer 30 , the second silicon dioxide layer 40 , and the first silicon waveguide layer 50 are sequentially disposed.
  • a width of the first silicon waveguide layer 50 gradually decreases in the direction toward the axis of symmetry, so that, gradually, the first silicon waveguide layer 50 no longer has a capability of limiting light beam transmission.
  • the optical signal when the optical signal is input to the first silicon waveguide layer 50 in the second region B, the optical signal is gradually transmitted from the first silicon waveguide layer 50 to a first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer 30 and the second silicon dioxide layer 40 .
  • the width of the first silicon waveguide layer 50 gradually decreases in the direction toward the axis of symmetry, which is favorable for implementing a slow change of the first silicon waveguide layer 50 from the first region A to the third region C via the second region B, so that a loss generated because of transformation of a propagation mode of the optical signal is reduced.
  • the second silicon substrate layer 20 is etched as the first air layer 21 , and the first silicon substrate layer 10 , the first air layer 21 , the first silicon dioxide layer 30 , and the second silicon dioxide layer 40 are sequentially disposed.
  • a width of the first silicon waveguide layer 50 is 0, and the optical signal is transmitted at the first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer 30 and the second silicon dioxide layer 40 .
  • the first air layer 21 is used as bottom cladding of the first ridge silicon dioxide waveguide layer, and no other material needs to be padded into the first air layer 21 , which simplifies a production process.
  • a structure of the first ridge silicon dioxide waveguide layer may reduce a limitation on a light field, so that a random phase error caused by a process error is reduced, and a crosstalk value of the device is increased.
  • the first ridge silicon dioxide waveguide layer has characteristics of a low temperature coefficient and low polarization dependence; therefore, the waveguide structure 100 also has the characteristics.
  • Optical transmission is reversible in the waveguide structure 100 . Therefore, optical transmission principles of the two first ends 100 a are also the same.
  • the optical signal when the optical signal is input from the first region A, the optical signal is transmitted at the first silicon waveguide layer 50 in the first region A.
  • the optical signal enters the second region B, the optical signal is gradually transmitted from the first silicon waveguide layer 50 to the first ridge silicon dioxide waveguide layer that includes the first silicon dioxide layer 30 and the second silicon dioxide layer 40 .
  • the optical signal enters the third region C, the optical signal is completely transmitted at the first ridge silicon dioxide waveguide layer, and is then transmitted to the other first end 100 a , thereby outputting the optical signal.
  • the used first silicon dioxide layer 30 includes multiple parallel first silicon dioxide layer units 30 a that are arrayed at intervals, and a first trench 31 is disposed between the adjacent first silicon dioxide layer units 30 a .
  • the second silicon dioxide layer 40 includes multiple second silicon dioxide layer units 40 a , the second silicon dioxide layer units 40 a correspondingly cover surfaces of the first silicon dioxide layer units 30 a , and the first silicon dioxide layer units 30 a and the second silicon dioxide layer units 40 a are included in the first ridge silicon dioxide waveguide layer.
  • the first silicon waveguide layer 50 includes multiple first silicon waveguide layer units 50 a , and the first silicon waveguide layer units 50 a correspondingly cover surfaces of the second silicon dioxide layer units 40 a.
  • the first silicon dioxide layer 30 may include only one first silicon dioxide layer unit 30 a .
  • the second silicon dioxide layer 40 includes only one second silicon dioxide layer unit 40 a
  • the first silicon waveguide layer 50 includes only one first silicon waveguide layer unit 50 a.
  • the present invention further provides a production method for producing the waveguide structure 100 .
  • the method includes the following steps:
  • the first silicon waveguide layer 50 on a surface of the first SOI wafer by means of dry etching.
  • the first silicon waveguide layer 50 may be produced by using another etching method, for example, wet etching.
  • dry etching may also be replaced with wet etching.
  • FIG. 8 is a schematic structural diagram of a waveguide structure 200 according to the present invention.
  • the waveguide structure 200 is of a buried type, and the waveguide structure 200 is applied to a straight waveguide part of an arrayed waveguide AW in an SOI-based arrayed waveguide grating.
  • the waveguide structure 200 uses a structure in which a waveguide layer with a low refractive index is added to a silicon optical surface.
  • the waveguide structure 200 includes two axisymmetrically disposed first ends 200 a .
  • the first end 200 a is divided into a first region D, a second region E, and a third region F in a direction toward an axis of symmetry.
  • the waveguide structure 200 includes a third silicon substrate layer 110 , a third silicon dioxide layer 120 , a second silicon waveguide layer 130 , a first waveguide layer 140 , and a second waveguide layer 150 that are sequentially disposed.
  • a coverage area of the second silicon waveguide layer 130 is less than a coverage area of the third silicon dioxide layer 120 , and the second silicon waveguide layer 130 is partially buried in the first waveguide layer 140 .
  • a coverage area of the first waveguide layer 140 is greater than a coverage area of the second waveguide layer 150 , and refractive indexes of the first waveguide layer 140 and the second waveguide layer 150 both lie between a refractive index of the second silicon waveguide layer 130 and a refractive index of the third silicon dioxide layer 120 .
  • the third silicon substrate layer 110 , the third silicon dioxide layer 120 , and the second silicon waveguide layer 130 are sequentially disposed.
  • the second silicon waveguide layer 130 is exposed to air, a width of the second silicon waveguide layer 130 is constant, and the refractive index of the second silicon waveguide layer 130 is relatively large; therefore, the optical signal is transmitted at the second silicon waveguide layer 130 .
  • the third silicon substrate layer 110 , the third silicon dioxide layer 120 , the second silicon waveguide layer 130 , the first waveguide layer 140 , and the second waveguide layer 150 are sequentially disposed.
  • a width of the second silicon waveguide layer 130 gradually decreases in the direction toward the axis of symmetry, so that, gradually, the second silicon waveguide layer 130 no longer has a capability of limiting light beam transmission. Therefore, the optical signal is gradually transmitted from the second silicon waveguide layer 130 to a ridge waveguide layer that includes the first waveguide layer 140 and the second waveguide layer 150 .
  • the width of the second silicon waveguide layer 130 gradually decreases in the direction toward the axis of symmetry, which is favorable for implementing a slow change of the second silicon waveguide layer 130 from the first region D to the third region F via the second region E, so that a loss generated because of transformation of a propagation mode of the optical signal is reduced.
  • the third silicon substrate layer 110 , the third silicon dioxide layer 120 , the first waveguide layer 140 , and the second waveguide layer 150 are sequentially disposed.
  • a width of the second silicon waveguide layer 130 is decreased to 0, and the optical signal is transmitted at the ridge waveguide layer that includes the first waveguide layer 140 and the second waveguide layer 150 .
  • Optical transmission is reversible in the waveguide structure 200 . Therefore, optical transmission principles of the two first ends 200 a are also the same.
  • An optical transmission principle of the waveguide structure 200 in Embodiment 2 of the present invention is roughly the same as an optical transmission principle of the waveguide structure 100 in Embodiment 1.
  • a structure of the ridge waveguide layer may reduce a limitation on a light field, so that a random phase change caused by a process error is reduced, and a crosstalk value of the device is increased.
  • the ridge waveguide layer has characteristics of a low temperature coefficient and low polarization dependence; therefore, the waveguide structure 200 also has the characteristics.
  • the first waveguide layer 140 includes multiple parallel first waveguide layer units 140 a that are arrayed at intervals
  • the second waveguide layer 150 includes multiple second waveguide layer units 150 a , the second waveguide layer units 150 a correspondingly cover surfaces of the first waveguide layer units 140 a , and the first waveguide layer units 140 a and the second waveguide layer units 150 a are included in the ridge waveguide layer.
  • the second silicon waveguide layer 130 includes multiple second silicon waveguide layer units 130 a , and the second silicon waveguide layer units 130 a are correspondingly buried in the first waveguide layer units 140 a.
  • the first waveguide layer 140 may include only one first waveguide layer unit 140 a .
  • the second waveguide layer 150 may also include only one second waveguide layer unit 150 a
  • the second silicon waveguide layer 130 may include only one second silicon waveguide layer unit 130 a.
  • Materials of the first waveguide layer 140 and the second waveguide layer 150 are of a same type, and the refractive indexes of the first waveguide layer 140 and the second waveguide layer 150 both lie between the refractive indexes of the second silicon waveguide layer 130 and the third silicon dioxide layer 120 , which is favorable for transmitting the optical signal at the second silicon waveguide layer 130 .
  • the materials of the first waveguide layer 140 and the second waveguide layer 150 are the same, and are both silicon nitride.
  • the materials of the first waveguide layer 140 and the second waveguide layer 150 may both be polymethyl methacrylate.
  • the present invention further provides a production method for producing the waveguide structure 200 .
  • the method includes the following steps:
  • the present invention further discloses a waveguide coupling structure 300 to which the waveguide structure 100 provided in Embodiment 1 is applied.
  • the waveguide coupling structure is used in a spot-size converter that couples a silicon waveguide to a laser source.
  • a structure of the waveguide coupling structure 300 in this embodiment is roughly the same as a structure of the waveguide structure 100 in Embodiment 1, and a difference between the two structures lies in that the waveguide coupling structure 300 is only a half structure of the waveguide structure 100 .
  • the third region I is coupled to the laser source.
  • the waveguide coupling structure 300 is divided into a first region G, a second region H, and the third region I in a direction toward the laser source.
  • the waveguide coupling structure 300 includes a fourth silicon substrate layer 310 , a fifth silicon substrate layer 320 , a fourth silicon dioxide layer 330 , a fifth silicon dioxide layer 340 , and a third silicon waveguide layer 350 .
  • the fourth silicon substrate layer 310 , the fifth silicon substrate layer 320 , the fourth silicon dioxide layer 330 , the fifth silicon dioxide layer 340 , and the third silicon waveguide layer 350 are sequentially disposed; a width of the third silicon waveguide layer 350 is constant; and the optical signal is transmitted at the third silicon waveguide layer 350 .
  • the fifth silicon substrate layer 320 is etched as a second air layer 321 ; the fourth silicon substrate layer 310 , the second air layer 321 , the fourth silicon dioxide layer 330 , the fifth silicon dioxide layer 340 , and the third silicon waveguide layer 350 are sequentially disposed; a width of the third silicon waveguide layer 350 gradually decreases in the direction toward the laser source; and the optical signal is gradually transmitted from the third silicon waveguide layer 350 to a second ridge silicon dioxide waveguide layer that includes the fourth silicon dioxide layer 330 and the fifth silicon dioxide layer 340 .
  • the fourth silicon substrate layer 310 , the second air layer 321 , the fourth silicon dioxide layer 330 , and the fifth silicon dioxide layer 340 are sequentially disposed; a width of the third silicon waveguide layer 350 is decreased to 0; and the optical signal is transmitted at the second ridge silicon dioxide waveguide layer that includes the fourth silicon dioxide layer 330 and the fifth silicon dioxide layer 340 .
  • the third region I is used for coupling to the laser.
  • the third region I is used for coupling to the laser source.
  • the present invention further provides a method for producing the waveguide coupling structure 300 .
  • the method includes the following steps:
  • An optical signal transmission principle of the waveguide coupling structure 300 provided in Embodiment 3 of the present invention is roughly the same as an optical signal transmission principle of the waveguide structure 100 in Embodiment 1.
  • a coupling loss may be controlled to be less than 0.5 dB, and the loss is relatively low, which lays the foundation for work without an optical amplifier.
  • FIG. 14 is a schematic structural diagram of a waveguide structure 400 according to the present invention.
  • the waveguide structure 400 is of a redeposited type, and the waveguide structure 400 is applied to a straight waveguide part of an arrayed waveguide AW in an SOI-based arrayed waveguide grating.
  • the waveguide structure 400 includes two axisymmetrically disposed first ends 400 a , where the first end 400 a is sequentially divided into a first region (not shown in the figure), a second region (not shown in the figure), and a third region (not shown in the figure) in a direction toward an axis of symmetry.
  • the waveguide structure 400 includes a sixth silicon substrate layer 410 , a seventh silicon substrate layer 420 , a sixth silicon dioxide layer 430 , a fourth silicon waveguide layer 440 , a doped silicon dioxide layer 450 , and a seventh silicon dioxide layer 460 .
  • the sixth silicon substrate layer 410 , the seventh silicon substrate layer 420 , the sixth silicon dioxide layer 430 , and the fourth silicon waveguide layer 440 are sequentially disposed; a width of the fourth silicon waveguide layer 440 is a constant value; the width of the fourth silicon waveguide layer 440 is less than a width of the seventh silicon substrate layer 420 ; and an optical signal is transmitted at the fourth silicon waveguide layer 440 .
  • the sixth silicon substrate layer 410 , the seventh silicon substrate layer 420 , the sixth silicon dioxide layer 430 , and the fourth silicon waveguide layer 440 are sequentially disposed; and a width of the fourth silicon waveguide layer 440 gradually decreases in the direction toward the axis of symmetry.
  • the width of the fourth silicon waveguide layer 440 gradually decreases in the direction toward the axis of symmetry, which is favorable for implementing a slow change of the fourth silicon waveguide layer 440 from the first region to the third region via the second region, so that a loss generated because of transformation of a propagation mode of the optical signal is reduced.
  • the seventh silicon substrate layer 420 and the sixth silicon dioxide layer 430 are etched as a third air layer, and a width of the fourth silicon waveguide layer 440 is 0.
  • the seventh silicon dioxide layer 460 covers surfaces of the fourth silicon waveguide layer 440 and the sixth silicon dioxide layer 430 in the first region, covers surfaces of the fourth silicon waveguide layer 440 and the sixth silicon dioxide layer 430 in the second region, and is further padded into the third air layer in the third region, and a thickness of the seventh silicon dioxide layer 460 is less than or equal to a thickness of the seventh silicon substrate layer 420 in the third region.
  • the seventh silicon dioxide layer 460 is mainly used for padding the third air layer.
  • the doped silicon dioxide layer 450 covers a surface of the seventh silicon dioxide layer 460 in the third region, and a coverage area of the doped silicon dioxide layer 450 is less than a coverage area of the seventh silicon dioxide layer 460 .
  • the doped silicon dioxide layer 450 is corresponding to the fourth silicon waveguide layer 440 , which is favorable for transmitting the optical signal between the doped silicon dioxide layer 450 and the fourth silicon waveguide layer 440 .
  • the optical signal is gradually transmitted from the fourth silicon waveguide layer 440 to a silicon dioxide waveguide layer that includes the sixth silicon dioxide layer 430 and the seventh silicon dioxide layer 460 ; and in the third region, the optical signal is transmitted at the doped silicon dioxide layer 450 .
  • the use of a structure of the doped silicon dioxide layer 450 in this embodiment reduces a limitation on a light field, reduces a random phase change caused by a process error, and increases a crosstalk value of the device.
  • the doped silicon dioxide layer 450 has characteristics of a low temperature coefficient and low polarization dependence; therefore, the waveguide structure 400 also has the characteristics.
  • the doped silicon dioxide layer 450 includes multiple parallel doped silicon dioxide layer units 450 a that are arrayed at intervals, and a second trench 451 is disposed between the adjacent doped silicon dioxide layer units 450 a .
  • the second trench 451 is used to shape a core layer structure of the doped silicon dioxide layer 450 .
  • the waveguide structure 400 further includes an eighth silicon dioxide layer 470 , the eighth silicon dioxide layer 470 covers the seventh silicon dioxide layer 460 in the first region and the second region, and the eighth silicon dioxide layer 470 covers the second trench in the third region.
  • the eighth silicon dioxide layer 470 is used to reduce a limitation of the doped silicon dioxide layer 450 on the light field.
  • the present invention further provides a production method for producing the waveguide structure 400 .
  • the method includes the following steps:
  • An optical signal transmission principle of the waveguide structure 400 provided in Embodiment 4 of the present invention is roughly the same as an optical signal transmission principle of the waveguide structure 100 in Embodiment 1, and details are not described herein again.
  • a waveguide that reduces a limitation on a light field is used to replace a silicon waveguide, and is used as a straight waveguide part of an arrayed waveguide AW, which reduces a change, in an equivalent refractive index of the waveguide, generated because of a waveguide size change caused by a process error, thereby reducing a random phase change experienced by the light field when an optical signal is being propagated in different arrayed waveguides AW.
  • the random phase change experienced by the light field when being propagated in the different arrayed waveguides AW is a primary factor why an actual device cannot achieve a theoretically designed crosstalk value. Therefore, a special structure design of the waveguide reduces this random phase change, and may theoretically increase a crosstalk value of a device.
  • ⁇ nc represents fluctuation of an average equivalent refractive index ⁇ nc of paths (path-averaged effective index), and L ctr represents an average value of lengths of arrayed waveguides AW.
  • Random changes of waveguide widths and waveguide thicknesses caused by process errors may cause changes in equivalent refractive indexes of waveguides.
  • a variance of the random changes in the waveguide widths is 1 nm
  • a corresponding change ⁇ nc is estimated by means of numerical simulation
  • a theoretical crosstalk value of an arrayed waveguide grating is calculated by using formula (1).
  • a theoretically calculated crosstalk value of the arrayed waveguide grating reaches 56 dB, which completely meets a requirement of a crosstalk counter of at least 25 dB, which provides a solution to implementing a higher crosstalk value.
  • the waveguide structure and the waveguide coupling structure that are provided in the present invention can have advantages of devices that are made from a silicon optical material, silicon dioxide, and a silicon nitride material, and have the following characteristics:
  • the waveguide structure is applied to a straight waveguide part of an arrayed waveguide AW in an arrayed waveguide grating, and a bent waveguide part of the arrayed waveguide AW is retained, where the bent waveguide part is favorable for reducing a device size.
  • Magnitude of the size of the arrayed waveguide grating in the present invention is mm 2 , and the arrayed waveguide grating inherits such advantages of a silicon optical material as a small size and being capable to be integrated with a modulator and a detector, which meets a requirement of device miniaturization.
  • a crosstalk value is greater than 25 dB, which meets a system requirement, and provides feasibility for commercialization of the arrayed waveguide grating.
  • the waveguide structure and the waveguide coupling structure may work in a transverse magnetic mode, and are suitable for a design requirement of an optical splitter.

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