US925988A - Process of hardening tantalum. - Google Patents

Process of hardening tantalum. Download PDF

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Publication number
US925988A
US925988A US42235408A US1908422354A US925988A US 925988 A US925988 A US 925988A US 42235408 A US42235408 A US 42235408A US 1908422354 A US1908422354 A US 1908422354A US 925988 A US925988 A US 925988A
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US
United States
Prior art keywords
hardening
tantalum
per cent
cent
silicium
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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US42235408A
Inventor
Werner Von Bolton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens AG
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Siemens AG
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Filing date
Publication date
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Priority to US42235408A priority Critical patent/US925988A/en
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Publication of US925988A publication Critical patent/US925988A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S76/00—Metal tools and implements, making
    • Y10S76/11—Tungsten and tungsten carbide

Definitions

  • the subject-matter of the present invention is a process for hardening tantalum.
  • silicium is employed" as hardening agent. It has been found that siliciuni has the best hardenlng action when it is employed in quantities between 1 per cent. and 10 er cent. of the ened, because'the hardening action of silici um increases considerably when'the addition is increased above 1 per cent,1without the'other good properties of the metal, par.- ticularly its ductility, being im aired to any extent, worth men'tloning.
  • the herein described process for hardening tantalum which consists in adding to tantalum less than 10 per cent. and more. than 1 per cent. of'silicium.

Description

UNITED STATES: PATENT OFFICE.
WERNER VON BOLTON, 0F cRARLoTq BuRc, GE MANY, ASSIGNOR T0 SIEMENS & HA'LSKE'A; G., OF BERLIN, GERMANY, A CORPORATION or GERMANY.
PROCESS OF HARDENING TANTALUH.
Specification of Letters Patent.
Patented June 22, 1909.
To all whom it may concern: Be it known that I, WERN R VON BOLTON, a subject of the Czar of Russia, and residing at Charlottenburg, near Berlin, Germany, have invented a certain new and useful Process for Hardening Tantalum, of which the following is a specification.
1 The subject-matter of the present invention is a process for hardening tantalum.
In accordance with the invention, silicium is employed" as hardening agent. It has been found that siliciuni has the best hardenlng action when it is employed in quantities between 1 per cent. and 10 er cent. of the ened, because'the hardening action of silici um increases considerably when'the addition is increased above 1 per cent,1without the'other good properties of the metal, par.- ticularly its ductility, being im aired to any extent, worth men'tloning.
is to be har- 1th additions of 2 per cent. to 3 'per cent. of silicium, for ex-; A
ample, a material having reat ductility and considerable hardness is o tained. As cow pared'with an addition of 3 lper cent. an addition of 5 er cent. only slig tly increases the hardness, ut the ductility is diminished.
WhatI claim as m invention and desire to secure by Letters atent is:-
1. The herein described process for hardening tantalum, which consists in adding to tantalum less than 10 per cent. and more. than 1 per cent. of'silicium.
2. The herein described process for hardening tantalum, which consists in adding to tantalum 3 per cent. of silicium.
In testimony whereof I have signed my name tothis specification in the'presence of two witnesses.
WERNER VON BOLTON.
Witnesses WOLDEMAR HAUPT, HENRY HABPER.
US42235408A 1908-03-20 1908-03-20 Process of hardening tantalum. Expired - Lifetime US925988A (en)

Priority Applications (1)

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US42235408A US925988A (en) 1908-03-20 1908-03-20 Process of hardening tantalum.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US42235408A US925988A (en) 1908-03-20 1908-03-20 Process of hardening tantalum.

Publications (1)

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US925988A true US925988A (en) 1909-06-22

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2438110A (en) * 1943-07-28 1948-03-23 Bell Telephone Labor Inc Electrical translating materials and devices and method of making them
US2438892A (en) * 1943-07-28 1948-04-06 Bell Telephone Labor Inc Electrical translating materials and devices and methods of making them
US2441603A (en) * 1943-07-28 1948-05-18 Bell Telephone Labor Inc Electrical translating materials and method of making them
US3790913A (en) * 1973-04-02 1974-02-05 F Peters Thin film resistor comprising sputtered alloy of silicon and tantalum

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2438110A (en) * 1943-07-28 1948-03-23 Bell Telephone Labor Inc Electrical translating materials and devices and method of making them
US2438892A (en) * 1943-07-28 1948-04-06 Bell Telephone Labor Inc Electrical translating materials and devices and methods of making them
US2441603A (en) * 1943-07-28 1948-05-18 Bell Telephone Labor Inc Electrical translating materials and method of making them
US3790913A (en) * 1973-04-02 1974-02-05 F Peters Thin film resistor comprising sputtered alloy of silicon and tantalum

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