US7907339B2 - Metallised security element - Google Patents

Metallised security element Download PDF

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Publication number
US7907339B2
US7907339B2 US11/661,487 US66148705A US7907339B2 US 7907339 B2 US7907339 B2 US 7907339B2 US 66148705 A US66148705 A US 66148705A US 7907339 B2 US7907339 B2 US 7907339B2
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Prior art keywords
region
security element
relief structure
metal layer
layer
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US11/661,487
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US20080094713A1 (en
Inventor
Wayne Robert Tompkin
Andreas Schilling
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OVD Kinegram AG
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OVD Kinegram AG
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
    • B42D25/373—Metallic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/40—Manufacture
    • B42D25/45—Associating two or more layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H1/0011—Adaptation of holography to specific applications for security or authentication
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • B42D2033/24—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
    • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
    • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
    • B42D25/30—Identification or security features, e.g. for preventing forgery
    • B42D25/324—Reliefs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
    • G03H1/182—Post-exposure processing, e.g. latensification
    • G03H2001/183—Erasing the holographic information
    • G03H2001/184—Partially erasing

Definitions

  • the invention relates to a security element in the form of a multi-layer film body which has a replication lacquer layer and a metal layer arranged thereon, and in which a relief structure is shaped in the replication lacquer layer.
  • the invention further relates to a security document with such a security element and a process for the production for such a security element.
  • optical security elements are frequently used to make it difficult to copy and misuse documents or products and if possible to prevent such copying and misuse.
  • optical security elements are frequently used for safeguarding documents, banknotes, credit cards, cash cards and the like.
  • security elements it is known to use optically variable elements which cannot be duplicated with conventional copying processes.
  • security elements it is also known for security elements to be provided with a structured metal layer which is in the form of a text, logo or other pattern.
  • a structured metal layer from a metal layer which is applied over a surface area for example by sputtering requires a large number of processes, in particular if fine structures are to be produced, which afford a high level of safeguard against forgery.
  • a metal layer which has been applied over the full surface area to be partially demetallised by positive/negative etching or by laser ablation, and thus structured.
  • metal layers it is possible for metal layers to be already applied in structured form to a carrier by means of the use of vapour deposition masks.
  • GB 2 136 352 A describes a production process for the production of a sealing film provided with a hologram as the security feature.
  • a plastic film is metallised over its full surface area after embossing of a diffractive relief structure therein and is then region-wise demetallised in accurate register relationship with the embossed diffractive relief structure.
  • the object of the invention is to improve the production of an optical security element which has a structured metallic surface layer and to provide an improved optical security element having such a metallic surface layer.
  • a security element in the form of a multi-layer film body which has a replication lacquer layer, wherein in a plane defined by co-ordinate axes x and y a first relief structure is shaped into the replication lacquer layer in a first region of the security element and a metal layer of constant surface density with respect to the plane defined by the co-ordinate axes x and y is applied to the replication lacquer layer in the first region of the security element and in an adjacent second region of the security element, wherein the first relief structure is a diffractive structure with a depth-to-width ratio of the individual structure elements of >0.5 and the metal layer is of a nominal layer thickness t o with which the transparency of the metal layer is increased by the first relief structure in the first region with respect to the transparency of the metal layer in the second region.
  • the invention is further attained by a process for the production of a security element in the form of a multi-layer film body, wherein a first relief structure is shaped into a replication lacquer layer of the multi-layer film body in a first region of the security element and a metal layer of constant surface density with respect to the plane defined by the replication lacquer layer is applied to the replication lacquer layer in the first region of the security element and in an adjacent second region of the security element, so that the first relief structure is shaped in the form of a diffractive structure with a depth-to-width ratio of the individual structure elements of >0.5 and the metal layer is applied with a surface density with respect to the plane defined by the replication lacquer layer and is produced in a nominal layer thickness t o in such a way that the transparency of the metal layer is increased by the first relief structure in the first region with respect to the transparency of the metal layer in the second region.
  • the transparency in the first region is enhanced visibly in particular for the human eye but there can also be an enhanced transparency which can be detected only by way of machine optical measurement systems.
  • the invention reduces the cost of the production of security elements in which the metal layer is to be provided not over the entire surface area but only in a pattern region. More specifically the invention provides for uniform deposition of metal over the full surface area involved to form the metal layer on the replication lacquer layer, wherein by virtue of the first relief structure in the first region the metal layer is so thin that it is transparent there or appears to be absent. Procedures which were necessary hitherto for structuring a metal layer applied to the relief structure are eliminated with the process according to the invention.
  • the invention provides that cost-intensive and environmentally damaging process steps, for example printing, etching and stripping processes, are saved in the production of such security elements, and the level of register accuracy is significantly enhanced.
  • Very high levels of resolution are possible by means of the process according to the invention.
  • the resolution which can be achieved is better by a factor of 1000 than resolutions which can be achieved by other processes.
  • the width of the structure elements of the first relief structure can be in the region of the wavelength of visible light but also below that, it is possible to produce metallised pattern regions having very fine contours. Accordingly major advantages over the processes used hitherto are also achieved in this respect and it is possible with the invention to produce security elements with a higher degree of safeguard against copying and forgery than hitherto.
  • the invention adopts a heuristic approach in markedly increasing the surface area of a structure by resolving it into very fine structure elements and in that region making a metal layer which is applied over the surface so thin that it appears transparent or more transparent.
  • the surface is formed by a large number of structure elements with a high depth-to-width ratio.
  • depth-to-width ratio in that respect is used to denote the ratio between a mean height h of two adjacent structure elements or a mean profile depth and a spacing d of two adjacent structure elements or a period spacing.
  • the metal layer is deposited perpendicularly onto the plane defined by the replication lacquer layer in a thickness t, wherein the more the effective thickness of the metal layer on the surface of the replication lacquer layer is reduced, the greater the effective surface area of the region, that is to say the greater the depth-to-width ratio of the relief structure of the region on which the metal is deposited.
  • a thin metal layer of that kind can appear transparent or semitransparent, in which respect that effect can be heuristically explained.
  • a cross grating with periods d x in the x-direction and d y in the y-direction, wherein x and y are orthogonal axes, and of a profile depth h, can be described for example by the following function:
  • f ⁇ ( x , y ) h ⁇ ⁇ sin 2 ⁇ ( ⁇ ⁇ ⁇ x d x ) ⁇ sin 2 ⁇ ( ⁇ ⁇ ⁇ y d y )
  • the thickness t of the metal layer is therefore only still 0.3 t 0 , that is to say in that region the metal layer is only one third as thick as in a flat region.
  • a line grating of a period d and of a profile depth h can be described by the following equation:
  • E ( ⁇ ) represents the entire elliptical second-order integral.
  • the relief structure is in the form of a cross grating or a linear grating, that is to say the relief structure involves a mathematical function with a period configuration, for example with a sine-quadratic configuration.
  • the relief structure is produced with a stochastic periodic configuration, wherein such a configuration can be produced in the x-direction or in the y-direction or in the x-direction and in the y-direction.
  • the metal layer may be achieved by means of relief structures which have a complex surface profile with raised portions or depressions of differing heights.
  • such surface profiles may also involve stochastic surface profiles.
  • transparency is generally achieved if the mean spacing of adjacent structure elements is less than the mean profile depth of the relief structure and adjacent structure elements are spaced less 200 ⁇ m from each other.
  • the mean spacing of adjacent raised portions is selected to be less than 30 ⁇ m so that the relief structure is a special diffractive relief structure.
  • the nominal thickness t 0 of the metal layer is such that on the one hand sufficient transparency of the metal layer is certain to occur in the regions with a high depth-to-width ratio and on the other hand the metal layer characterised by its nominal thickness t 0 appears opaque or predominantly opaque.
  • An observer typically already perceives a region as being opaque or as being fully reflecting if 85% of the incident light is reflected and an observer already perceives a region as being transparent if less than 20% of the incident light is reflected and more than 60% is transmitted.
  • Those values can vary in dependence on the substrate, the lighting and so forth. In that respect an important part is played by the absorption of the light in the metal layer. For example under certain circumstances chromium reflects much less.
  • the thickness t which is produced on a structure element is to be interpreted as a mean value for the thickness t is formed in dependence on the angle of inclination of the surface of the relief structure with respect to the horizontal. That angle of inclination can be mathematically described by the first derivative of the function of the relief structure.
  • the metal layer is deposited with the nominal thickness t 0 . If the magnitude of the local angle of inclination of the relief structure is greater than zero the metal layer is deposited with the thickness t which is less than the nominal thickness t 0 .
  • the metal layer is applied to the replication lacquer layer with such a surface density which corresponds to an application of the metal layer to a flat surface with a depth-to-width ratio equal to zero with a degree of reflection of the metal layer of 85% to 95% of the maximum attainable degree of reflection.
  • the maximum attainable degree of reflection is dependent on the nature of the metal. Metal layers of silver and gold have a very high maximum degree of reflection but copper is also highly suitable.
  • the degree of transparency of the metal layer, apart from the depth-to-width ratio of the relief structure, is dependent on the polarisation of the incident light. It can be provided that that effect is used for secondary security features.
  • the degree of transparency and/or the degree of reflection of the metal layer is wavelength-dependent.
  • colour effects can be observed upon irradiation with polychromatic light, for example with daylight. It can be provided that those colour effects are used as an additional second security feature.
  • a second diffractive relief structure is shaped into the second region of the replication lacquer layer, the second relief structure being formed with a depth-to-width ratio ⁇ 0.2 and in that way being substantially non-transparent.
  • the second relief structure has a depth-to-width ratio of ⁇ 1.
  • the first and second relief structures form an optically cohesive region in which a degree of transparency of between 0 and 100% can be produced.
  • Such a region can be provided for example in order to produce a so-called fading-in effect for structures arranged under that region.
  • a passport photograph of a security document can be produced with a contourless edge.
  • Such an effect can be an additional security feature.
  • the first region forms a transparent pattern region which in the form of a logo or a text and with a high depth-to-width ratio, in which a background region disposed under that region is visible.
  • the second region forms a pattern region which is in the form of a logo or a text, with a low depth-to-width ratio, so that the region is non-transparent or metallically shiny against the background region.
  • the second region can extend in the form of a fine line pattern, for example a guilloche pattern.
  • this fine line pattern can be particularly filigree and can be disposed in register relationship with all diffractive security features.
  • a relief structure with a high depth-to-width ratio is provided in the first region and a relief structure with a low depth-to-width ratio is provided in the second region, forming the filigree lines of the guilloche pattern.
  • the use of the invention makes it possible for the depth-to-width ratio of the first relief structure and/or the second relief structure to be discretely or continuously varied in the x-direction and/or in the y-direction.
  • raster elements involving differing transparency or differing opacity can be produced in that way. Any image representations can be produced by means of such raster elements, the dimensions of which are advantageously smaller than can be resolved by the human eye.
  • pixels are produced with raster elements, whose grey value is determined by the surface area ratio between transparent and opaque raster elements. Black-and-white images can be produced from the pixels in that way.
  • raster elements which are stepped in grey scales are produced, by the depth-to-width ratio of the relief structure determining the grey value of the raster element. In that way it is possible for example to produce monochrome computer grey scale images with 8-bit resolution.
  • the particular advantages of producing such images in accordance with the process of the invention are that it is possible to produce particularly fine rastering which satisfies high demands and that the image can be in register relationship with all diffractive security features.
  • the raster spacing can be below the level of resolution of the human eye.
  • the dimension of the individual raster regions is preferably less than 300 ⁇ m, preferably about 50 ⁇ m.
  • the first and/or the second relief structure is formed from a superpositioning of an envelope structure and a diffractive structure with a high depth-to-width ratio.
  • the envelope structure is a structure which has an optical-diffraction effect, in particular a relief structure generating a hologram.
  • the envelope structure is a macrostructure or a matte structure. A high level of register accuracy is achieved in that way without involving additional technological complication and expenditure for the regions covered by the first and/or second relief structures are formed by a resulting common relief structure. Procedures which were necessary hitherto for structuring a metal layer applied to the relief structure are eliminated with the process according to the invention.
  • the multi-layer film body of the security element according to the invention can be in the form of a transfer film, in particular a hot stamping film.
  • a security document in particular a banknote or a passport, can be provided with the security element according to the invention in known fashion, that is to say with the existing machines and apparatuses.
  • the metal layer is applied by sputtering to the replication lacquer layer of the security element according to the invention. In that way it is possible to use a tried-and-tested process for production of the metal layer. It is preferably provided that a metal for forming the metal layer is deposited on the plane defined by the replication lacquer layer in such a surface density which corresponds to an application of the metal layer on a flat surface arranged perpendicularly to the deposition direction, with a depth-to-width ratio equal to zero and with a degree of reflection of the metal layer of 85% to 95% of the maximum degree of reflection of an optically non-transparent metal layer of the metal. In that respect it can be provided that the metal layer is formed only from a single metal or however from a metal alloy.
  • the relief structures are formed in the replication lacquer layer by means of UV replication. Relief structures with a high depth-to-width ratio can be particularly easily and inexpensively produced in that fashion.
  • a security feature produced with the process according to the invention can be imitated only with very great difficulty with conventional processes, on a replication layer provided with a diffractive structure, as application of a metal layer in accurate register relationship or removal thereof makes very high technological demands.
  • FIG. 1 shows a diagrammatic view of a security element according to the invention
  • FIG. 2 shows a diagrammatic perspective view of a relief structure of a cross grating
  • FIG. 3 shows a diagrammatic perspective view of a relief structure of a linear grating
  • FIG. 4 shows a graph representation of the relationship between the depth-to-width ratio h/d and the thickness ratio ⁇ for the relief structure of FIG. 2 ,
  • FIG. 5 shows a graph representation of the relationship between the depth-to-width ratio h/d and the thickness ratio ⁇ for the relief structure of FIG. 3 ,
  • FIG. 6 shows a diagrammatic sectional view of a relief structure according to the invention
  • FIGS. 7 a and 7 b show a graph view of the relationship between the thickness t of a metal layer and the degree of reflection R for various metals
  • FIGS. 8 a to 8 d show diagrammatic sectional views of a relief structure according to the invention with differing depth-to-width ratio
  • FIG. 9 a shows a graph view of the relationship between the degree of transparency T or the degree of reflection R in dependence on depth h for a first metallised linear grating upon lighting with polarised light
  • FIG. 9 b shows a graph view of the relationship between the degree of transparency T in dependence on the depth h for the linear grating in FIG. 9 a upon lighting with non-polarised light
  • FIGS. 10 a to 10 c show a graph view of the relationship between the degree of transparency T or the degree of reflection R in dependence on the wavelength ⁇ for a third metallised linear grating upon lighting with different lighting angles,
  • FIG. 11 shows a diagrammatic view of the adjustment of differing transparency by surface rastering
  • FIG. 12 shows a graph view of the relationship between the degree of transparency T and the depth-to-width ratio of an embodiment of a metal layer
  • FIG. 13 shows a diagrammatic view of a security document with the security element according to the invention as shown in FIG. 1 ,
  • FIG. 14 shows a diagrammatic view of a second embodiment of a security element according to the invention.
  • FIG. 15 shows a diagrammatic view of a second embodiment of a security element according to the invention with the security element according to the invention as shown in FIG. 13 ,
  • FIG. 16 shows a figurative representation of a plan view onto a security document with a security element according to the invention
  • FIG. 17 shows a figurative representation of the guilloche pattern of the security element shown in FIG. 15 .
  • FIG. 1 shows a security element 11 in the form of a multi-layer film body which has a carrier film 10 , a release layer 20 , a protective lacquer layer 21 , a replication lacquer layer 22 with relief structures 25 and 26 , an outer metal layer 23 arranged on the relief structures 25 and 26 and an adhesive layer 24 .
  • the relief structure 26 is in the form of a planar relief structure.
  • the security element 11 is a stamping film, in particular a hot stamping film. It is however also possible for the security element 11 to be in the form of a laminating film or a sticker film.
  • the carrier layer 10 comprises for example a PET or POPP film of a layer thickness of 10 ⁇ m to 50 ⁇ m, preferably a thickness of 19 ⁇ m to 23 ⁇ m.
  • the release layer 20 and the protective lacquer layer 21 are then applied to the carrier film by means of an intaglio printing screen roller.
  • the release and protective lacquer layers 20 and 21 are preferably of a thickness of 0.2 to 1.2 ⁇ m. It would also be possible to dispense with those layers.
  • the replication lacquer layer 22 is then applied.
  • the replication lacquer layer 22 preferably comprises a radiation-crosslinkable replication lacquer.
  • a UV replication process is used for shaping the relief structures 25 and 26 in the replication lacquer layer 22 .
  • a UV-hardenable lacquer is used as the replication lacquer.
  • the relief structures 25 and 26 are produced in the UV crosslinkable replication lacquer layer for example by UV irradiation when shaping the relief structure into the lacquer layer while it is still soft or fluid or by partial irradiation and hardening of the UV crosslinkable lacquer layer.
  • a UV crosslinkable lacquer it is also possible to use another radiation crosslinkable lacquer.
  • the replication lacquer layer 22 may comprise a transparent, thermoplastic material.
  • a relief structure or a plurality of relief structures, for example the relief structures 25 and 26 is or are then embossed into the replication lacquer layer 22 by means of an embossing tool.
  • the thickness which is to be selected for the replication lacquer layer 22 is determined by the profile depth selected for the relief structures 25 and 26 . It is necessary to ensure that the replication lacquer layer 22 is of a sufficient thickness to permit shaping of the relief structures 25 and 26 . Preferably in that respect the replication lacquer layer 22 is of a thickness of 0.3 to 1.2 ⁇ m.
  • the replication lacquer layer 22 is applied to the protective lacquer layer 21 by means of a line raster intaglio printing roller over the full surface area involved with an application weight of 2.2 g/m 2 prior to drying.
  • a lacquer of the following composition is selected as the replication lacquer:
  • the replication lacquer layer 22 is then dried in a drying passage at a temperature of 100 to 120° C.
  • the relief structures 25 and 26 are then stamped into the replication lacquer layer 22 for example by means of a die comprising nickel, at about 130° C.
  • a die comprising nickel, at about 130° C.
  • the die is preferably electrically heated. Before the die is lifted off the replication lacquer layer 22 after the stamping operation the die can in that case be cooled down again.
  • the replication lacquer of the replication lacquer layer 22 hardens by crosslinking or in some other fashion.
  • relief structures 25 and 26 may be introduced into the replication lacquer layer 22 by an ablation process.
  • a laser removal process is suitable for that purpose.
  • HRI high reflection index
  • the relief structures 25 and 26 involve relief structures which are coated with the metal layer 23 in a common coating process, for example sputtering, so that the surface density of the metal layer 23 on the relief structures 25 and 26 is constant.
  • the metal layer 23 on the relief structure 26 which has a low depth-to-width ratio is opaque and the metal layer 23 on the relief structure 25 which has a high depth-to-width ratio is transparent.
  • the adhesive layer 24 is then applied to the metal layer 23 .
  • the adhesive layer 24 is preferably a layer comprising a thermally activatable adhesive. Depending on the respective use of the security element 11 however it is also possible to dispense with the adhesive layer 24 .
  • the relief structure 25 is a structure with a high depth-to-width ratio in respect of the structure elements of the relief structure and thus that relief structure has an effective surface area which is a multiple greater than conventional relief structures which are shaped in security elements for producing optical effects.
  • the depth is to be interpreted as the mean spacing between the peaks and troughs and the width is to be interpreted as the spacing of two adjacent structure elements of the relief structure.
  • the metal layer can be transparent in that way.
  • FIG. 2 now shows a diagrammatic view on an enlarged scale of an embodiment of the relief structure 25 shown in FIG. 1 , which is adapted to provide transparency in respect of the metal layer 23 disposed on the relief structure.
  • the relief structure 25 is a periodic function ⁇ (x, y), wherein the arrows 25 x and 25 y represent the identified co-ordinate axes x and y.
  • the function ⁇ (x, y) periodically varies the depth 25 z of the relief structure 25 , in the illustrated case in sine-quadratic form, both in the x- and also in the y-direction. That affords the relief profile shown in FIG.
  • the relief structure 25 shown in FIG. 2 thus involves for example period lengths 25 p and 25 q of 330 nm and a structure depth 25 t of more than 500 nm.
  • the period lengths 25 p and 25 q and the profile depth 25 t are different from the view shown in FIG. 2 . What is essential in that respect is that at least one of the period lengths 25 p and 25 q is less than or equal to the structure depth 25 t . Particularly good results are achieved if at least one of the period lengths 25 p and 25 q is less than the limit wavelength of visible light.
  • FIG. 3 shows a relief structure which has structure elements 25 e and 25 f only in one co-ordinate direction.
  • the other references are as selected in FIG. 2 so that reference will only be made to the differences in relation to the embodiment of FIG. 2 .
  • the structure elements 25 e and 25 f extend with a constant structure depth 25 t in the direction of the y-co-ordinate 25 y .
  • the relief structure diagrammatically shown in FIG. 3 also appears transparent.
  • the increase in the thickness ratio ⁇ is greater with the linear grating (see FIG. 3 ) than with the previously considered cross grating (see FIG. 2 ), with the same depth-to-width ratio.
  • FIG. 6 now shows in detail the thickness change effect in respect of the metal layer 23 , which is responsible for affording transparency.
  • FIG. 6 is a diagrammatic sectional view of a replication lacquer layer 622 with a relief structure 625 with a high depth-to-width ratio and with a relief structure 626 with a depth-to-width ratio equal to zero.
  • a metal layer 623 Arranged on the replication lacquer layer 622 is a metal layer 623 , applied for example by sputtering. Arrows 60 identify the direction of application of the metal layer 623 .
  • the metal layer 623 is of the nominal thickness t 0 in the region of the relief structure 626 and of the thickness t which is less than the nominal thickness t 0 in the region of the relief structure 625 .
  • thickness t is to be interpreted as a mean value for the thickness t is formed in dependence on the angle of inclination of the surface of the relief structure with respect to the horizontal. That angle of inclination can be described mathematically by the first derivative of the function of the relief structure.
  • the metal layer 623 is deposited with the nominal thickness t 0 , if the value of the angle of inclination is greater than zero the metal layer 623 is deposited with the thickness t, that is to say with a lesser thickness than the nominal thickness t 0 .
  • the transparency of the metal layer is achieved by relief structures which have a complex surface profile with raised portions and depressions of differing height.
  • surface profiles may also involve stochastic surface profiles.
  • transparency is generally achieved if the mean spacing of adjacent structure elements is less than the mean profile depth of the relief structure and adjacent structure elements are spaced from each other at less than 200 ⁇ m.
  • the mean spacing of adjacent raised portions is less than 30 ⁇ m so that the relief structure is a special diffractive relief structure.
  • silver and gold As will be seen, have a high maximum degree of reflection R max and require a relatively low depth-to-width ratio to afford transparency.
  • Aluminium (Al) admittedly also has a high maximum degree of reflection R max but requires a higher depth-to-width ratio. It can preferably therefore be provided that the metal layer is formed from silver or gold. It can however also be provided that the metal layer is formed from other metals or from metal alloys.
  • FIGS. 8 a to 8 d now show diagrammatic sectional view of an embodiment illustrating the configuration of relief structures 825 a , 825 b , 826 a and 826 b with differing degrees of transparency of the applied metal layer.
  • the metal layer 823 appears less transparent than in the embodiment of FIG. 8 a.
  • the degree of transparency of the metal layer 823 is now so slight that the metal layer 823 appears opaque, but nonetheless has a transparent component, in comparison with the embodiment shown in FIG. 8 d.
  • the metal layer 823 appears completely opaque, for example reflective.
  • Table 2 now shows the calculation results obtained from strict diffraction calculations for relief structures with differing depth-to-width ratios, which are in the form of linear, sinusoidal gratings with a grating spacing of 350 nm.
  • FIGS. 9 a to 9 e now show in graph views calculation results which demonstrate that effect.
  • the curves are identified by OR TM for the degree of reflection and OT TM for the degree of transparency of TM-polarised light and similarly with OR TE and OT TE for TE-polarised light.
  • the effect according to the invention is particularly highly pronounced for TE-polarised light.
  • FIG. 9 b now shows the degree of transparency T of the grating used in FIG. 9 a with non-polarised light, plotted against the grating depth h.
  • both the polarisation of the light and also the nature of polarisation have an influence on the degree of transparency T which at the same time is dependent on the wavelength of the light.
  • the curve identified by OT unpol for unpolarised light extends between the two curves OT TM and OT TE for TM-polarised and TE-polarised light respectively.
  • FIGS. 9 d and 9 e now show the influence of a decreasing depth-to-width ratio h/d on those curve configurations in respect of the degree of transparency T.
  • the degree of transparency T is now very slight so that the silver metal layer applied to the grating appears non-transparent at all wavelengths.
  • FIGS. 9 a to 9 e show relief structures according to the invention with a high depth-to-width ratio can produce colour effects which are to be observed upon irradiation with polychromatic light, for example with daylight. It can be provided that those colour effects are used as an additional secondary security feature.
  • the degree of transparency decreases if the angle of incidence of the light differs from the normal angle of incidence, that is to say the degree of transparency decreases if the light is not perpendicularly incident. That means that a region with a relief structure according to the invention can be transparent only in a limited cone of incidence of the light. It can therefore be provided that that effect is used as a further security feature. It can be provided that the metal layer is opaque, when viewed inclinedly.
  • FIG. 10 a is a graph showing the initial situation when the light is perpendicularly incident.
  • the curve configuration in respect of the degree of transparency T qualitatively corresponds to that shown in FIG. 9 c .
  • the degree of reflection R is less wavelength-dependent than the degree of transparency T. That applies in particular for illumination of the grating with unpolarised light.
  • the degree of transparency T and the degree of reflection R are now wavelength-dependent in a wide range in comparison with FIG. 10 a , in particular also upon illumination with unpolarised light.
  • the light is therefore now incident inclinedly in parallel relationship with the flanks of the grating lines.
  • the wavelength-dependent configurations are markedly qualitatively different in comparison with FIG. 10 b.
  • FIG. 11 now shows a diagrammatic view illustrating an embodiment for the production of regions with a differing degree of transparency T.
  • the regions 91 to 96 are of a rastered configuration with opaque raster elements 91 o to 95 o and transparent raster elements 92 t to 96 t .
  • the regions 91 to 96 can be in the form for example of pixels with a differing degree of transparency T.
  • the opaque raster elements 91 o to 95 o are marked in black in FIG. 11 and the transparent raster elements 92 t to 96 t are marked in white.
  • the degree of transparency T of each region 91 to 96 is described by the ratio of the surface area total of the opaque raster elements 91 o to 95 o to the surface area total of the transparent raster elements 92 t to 96 t .
  • the raster elements are produced in dimensions which can no longer be resolved by the human eye. Therefore, regions 91 to 96 which are rastered in that way preferably visually appear with equal distribution of the opaque and transparent raster elements as regions with a homogenous degree of transparency T.
  • the regions 92 to 95 are produced both with opaque raster elements 92 o to 95 o and also with transparent raster elements 92 t to 95 t and therefore have degrees of transparency of between 20% and 80%.
  • FIG. 12 illustrates by means of a graph with reference to an example how the degree of transparency T can be adjusted by the depth-to-width ratio h/d.
  • the degree of transparency T increases with an increasing depth-to-width ratio h/d.
  • h/d 2.2
  • T degree of transparency
  • a lower depth-to-width ratio can for example be technologically advantageous.
  • image representations are generated in that fashion which is described with reference to the FIGS. 11 and 12 .
  • images affording a high imaging quality can be produced in that way, for example in the form of logos or inscriptions.
  • line images or black-and-white raster images can be produced with the process of black-and-white rastering.
  • the degree of transparency of a pixel is determined by the ratio between opaque raster elements and transparent raster elements.
  • pixels are in the form of homogenous regions with a differing depth-to-width ratio (see FIG. 12 ).
  • FIGS. 11 and 12 can also be provided that the solutions characterised in FIGS. 11 and 12 are combined together and thus further effects can be achieved.
  • raster elements which are visible to the human eye are used as a configurational element, for example in the form of a journal raster.
  • FIG. 13 now shows a diagrammatic view of a security document 12 with a card body 28 and image elements 27 arranged on the card body 28 , and the security element 11 shown in FIG. 1 .
  • the same elements are denoted by the same references.
  • the security element 11 is pulled off the carrier film 10 and applied to the card body 28 .
  • the release layer 20 assists with release of the security element from the carrier film 10 .
  • the regions of the image elements 27 which are arranged under relief structures 25 are still visible by virtue of the application of the security element 11 .
  • the image elements 27 which are arranged under relief structures 26 are not visible for a person viewing the security document. Because of the metal 23 they appear as reflecting regions which, as can be particularly well seen from FIGS. 15 and 16 , can be in the form of a fine pattern in the form of a guilloche.
  • a pattern which is applied in accordance with the above-described process can be so fine that it cannot be imitated with another process, for example a colour copying process.
  • FIGS. 14 and 15 now show a second embodiment of a security element and a security document provided with that security element, wherein the same elements are denoted by the same references.
  • FIG. 14 shows a security element 111 in the form of a multi-layer film body which has the carrier film 10 , the release layer 20 , the protective lacquer layer 21 , the replication lacquer layer 22 , with the relief structures 25 , 26 and further relief structures 125 , 126 , the metal layer 23 and the adhesive layer 24 .
  • the relief structures 125 and 126 are in the form of superpositionings of a structure which in the illustrated diagrammatic example is of a sinusoidal configuration, with relief structures 25 and 26 respectively.
  • the superposed structure can involve for example a structure for generating a hologram which in that way appears visible in the regions of the relief structure 125 and invisible in the regions of the relief structure 126 .
  • the relief structures 26 and 126 can form a guilloche pattern which cannot be reproduced with conventional processes, that is to say it is in the form of a security feature.
  • FIG. 15 shows a diagrammatic view of a security document 112 to which a security element 111 as shown in FIG. 14 is applied.
  • FIGS. 16 and 17 now show an example of use of an identity document 110 .
  • That identity document 110 has a photograph 110 p of the identity document holder, an inscription 110 k , a personalised inscription 110 v and a guilloche pattern 110 g.
  • the photograph 110 p , the inscription 110 k and the personalised inscription 110 v are applied to the card body of the document 110 in accordance with the state of the art.
  • the guilloche pattern 110 g which is shown in detail in FIG. 17 for enhanced clarity of illustration is placed over the entire surface of the card.
  • the lines of the guilloche pattern 110 g are in the form of regions with a depth-to-width ratio ⁇ 0.2 and of a width of 50 ⁇ m, which directly adjoin transparent regions with a high depth-to-width ratio. That provides that the identity document is of a forgery-proof nature in a particularly simple fashion for the guilloche pattern 110 g cannot be applied with another process.
  • a security document which is like the embodiment illustrated in FIG. 16 combines the advantage of enhanced level of security against forgery with the advantage of simplified and more precise production. More specifically, because transparent and opaque regions can be produced in one process step, the positioning problems which occur in register printing in accurate register relationship no longer arise, that is to say, transparent regions, opaque regions and background regions no longer have to be positioned with a high level of accuracy relative to each other, as hitherto.
  • the process according to the invention provides that transparent and opaque regions are produced by surface structuring, more specifically precisely where they are intended. In that respect multi-layer thin-film systems, liquid crystal systems and so forth can be included.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Security & Cryptography (AREA)
  • Manufacturing & Machinery (AREA)
  • Holo Graphy (AREA)
  • Credit Cards Or The Like (AREA)
  • Laminated Bodies (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Materials For Medical Uses (AREA)
  • Burglar Alarm Systems (AREA)
  • Control Of Combustion (AREA)
US11/661,487 2004-08-30 2005-08-29 Metallised security element Expired - Fee Related US7907339B2 (en)

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DE102004042136A DE102004042136B4 (de) 2004-08-30 2004-08-30 Metallisiertes Sicherheitselement
DE102004042136.6 2004-08-30
PCT/EP2005/009287 WO2006024478A2 (de) 2004-08-30 2005-08-29 Metallisiertes sicherheitselement

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DE102004042136B4 (de) 2006-11-09
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US20080094713A1 (en) 2008-04-24
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PL1786632T5 (pl) 2021-02-08
EP1786632B1 (de) 2009-12-23
WO2006024478A2 (de) 2006-03-09

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