US7453228B2 - Method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device - Google Patents

Method for controlling a positioning device, positioning device, and lithographic apparatus provided with a positioning device Download PDF

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US7453228B2
US7453228B2 US11/399,589 US39958906A US7453228B2 US 7453228 B2 US7453228 B2 US 7453228B2 US 39958906 A US39958906 A US 39958906A US 7453228 B2 US7453228 B2 US 7453228B2
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error
signal
mover
controller
value
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US20070236163A1 (en
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Marcel François Heertjes
Yin Tim Tso
Ramidin Izair Kamidi
Dennis Andreas Petrus Hubertina Houben
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Koninklijke Philips NV
ASML Netherlands BV
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ASML Netherlands BV
Koninklijke Philips Electronics NV
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/19—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by positioning or contouring control systems, e.g. to control position from one programmed point to another or to control movement along a programmed continuous path
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/41—Servomotor, servo controller till figures
    • G05B2219/41029—Adjust gain as function of position error and position
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/42—Servomotor, servo controller kind till VSS
    • G05B2219/42249—Relative positioning
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers

Definitions

  • the present invention relates to a method for controlling a positioning device, a positioning device, and a lithographic apparatus provided with a positioning device.
  • a lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate.
  • a lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a patterning device which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC.
  • This pattern can be transferred onto a target portion (e.g. including part of, one, or several dies) on a substrate (e.g. a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate.
  • resist radiation-sensitive material
  • a single substrate will contain a network of adjacent target portions that are successively patterned.
  • Conventional lithographic apparatus include steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at once, and scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the “scanning” direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.
  • a lithographic apparatus includes various moving parts that are positioned using at least one positioning device such as a linear or rotating motor.
  • moving parts are a wafer stage, a reticle stage, a handler (robot arm), etc.
  • a wafer stage may include different positioning devices for moving a wafer support in multiple degrees of freedom to desired positions with a desired speed, acceleration, etc.
  • a reticle stage may include different positioning devices for moving a reticle support in multiple degrees of freedom to desired positions with a desired speed, acceleration, etc.
  • a positioning device includes a first part, called a stator, which is stationary relative to a predefined frame of reference, and further includes a second part, called a mover, which moves relative to the stator through the generation of electromagnetic forces between the stator and the mover. Positioning the mover relative to the stator is performed using a controller.
  • the controller may include a control characteristic being any combination of a proportional (P) control function, an integrating (I) control function, and a differentiating (D) control function.
  • the controller receives a position signal from a position sensor detecting the position of the mover relative to the stator.
  • the position signal is compared with a setpoint signal defining the desired position of the mover relative to the stator.
  • the difference between the position signal and the setpoint signal is obtained as one or more error signals, and on the basis of the one or more error signals, the controller generates positioning device control signals for controlling the position and movement of the positioning device such as to reduce or eliminate position errors.
  • This method of control is also referred to as feedback control, since the actual mover position is fed back to a controller input to generate the one or more error signals.
  • the feedback control forms a closed loop.
  • the controller shows a control characteristic, which is a feature of the controller.
  • the control characteristic is the way in which the controller operates in response to detecting position errors.
  • low-frequency disturbances limit the closed-loop performance.
  • additional low-frequency disturbance rejection can improve upon this performance, for example by increasing the integrator control function gain.
  • a problem, however, is that the settling behavior at the start of a constant velocity range is deteriorated by increasing the integrator control function gain.
  • a problem in adequately handling time-varying disturbances is that in a certain time period a controller with a specific control characteristic related to the disturbance spectrum in this time period is required, whereas in another time period this spectrum generally changes, and therefore a different control characteristic is required.
  • a method for controlling a positioning device including a stator and mover, the mover being movable relative to the stator; a position sensor configured to generate a position signal indicative of a position of the mover relative to the stator; a controller configured to receive the position signal, compare it to a setpoint signal to obtain an error signal, and generate a mover control signal on the basis of a signal component of the position signal, wherein the controller has a variable gain, and the positioning device, including the position sensor and the controller, defines a control loop, the method including, for error signals having a magnitude in a predefined range, selectively setting the gain to a value higher than a value for error signals having a magnitude outside the range.
  • the magnitude is defined as an absolute value of the error signal.
  • a positioning device including a stator and mover, the mover being movable relative to the stator; a position sensor configured to generate a position signal indicative of a position of the mover relative to the stator; a controller configured to receive the position signal, compare it to a setpoint signal to obtain an error signal, and generate a mover control signal on the basis of a signal component of the position signal, wherein the controller has a variable gain, the positioning device, including the position sensor and the controller, defines a control loop, the controller further being configured, for error signals having a magnitude in a predefined range, to selectively set the gain to a value higher than a value for error signals having a magnitude outside the range.
  • the positioning device is part of a lithographic apparatus.
  • FIG. 1 depicts a lithographic apparatus according to an embodiment of the invention
  • FIG. 2 depicts a block diagram of an embodiment of a controller according to the invention
  • FIG. 3 depicts a block diagram of an embodiment of a part of the controller of FIG. 2 ;
  • FIG. 4A depicts a variable gain curve in accordance with an embodiment of the invention
  • FIG. 4B depicts an input/output curve derived from FIG. 4A in accordance with an embodiment of the invention
  • FIG. 4C depicts a variable gain curve in accordance with an embodiment of the invention.
  • FIG. 5 depicts a block diagram of an embodiment of a part of the controller of FIG. 2 ;
  • FIG. 6 depicts a block diagram of an embodiment of a part of the controller of FIG. 2 .
  • FIG. 1 schematically depicts a lithographic apparatus according to one embodiment of the invention.
  • the apparatus includes an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation or any other suitable radiation), a mask support (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM including at least one stator and mover, configured to accurately position the patterning device in accordance with certain parameters.
  • the apparatus also includes a substrate table (e.g. a wafer table) WT or “substrate support” configured to hold a substrate (e.g.
  • the apparatus further includes a projection system (e.g. a refractive projection lens system) PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g. including one or more dies) of the substrate W.
  • a projection system e.g. a refractive projection lens system
  • PS configured to project a pattern imparted to the radiation beam B by patterning device MA onto a target portion C (e.g. including one or more dies) of the substrate W.
  • the illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, to direct, shape, and/or control radiation.
  • optical components such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of optical components, or any combination thereof, to direct, shape, and/or control radiation.
  • the mask support supports, e.g. bears the weight of, the patterning device. It holds the patterning device in a manner that depends on the orientation of the patterning device, the design of the lithographic apparatus, and other conditions, such as for example whether or not the patterning device is held in a vacuum environment.
  • the mask support can use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device.
  • the mask support may be a frame or a table, for example, which may be fixed or movable as required. The mask support may ensure that the patterning device is at a desired position, for example with respect to the projection system. Any use of the terms “reticle” or “mask” herein may be considered synonymous with the more general term “patterning device.”
  • patterning device used herein should be broadly interpreted as referring to any device that can be used to impart a radiation beam with a pattern in its cross-section so as to create a pattern in a target portion of the substrate. It should be noted that the pattern imparted to the radiation beam may not exactly correspond to the desired pattern in the target portion of the substrate, for example if the pattern includes phase-shifting features or so called assist features. Generally, the pattern imparted to the radiation beam will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit.
  • the patterning device may be transmissive or reflective.
  • Examples of patterning devices include masks, programmable mirror arrays, and programmable LCD panels.
  • Masks are well known in lithography, and include mask types such as binary, alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types.
  • An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which can be individually tilted so as to reflect an incoming radiation beam in different directions. The tilted mirrors impart a pattern in a radiation beam which is reflected by the mirror matrix.
  • projection system used herein should be broadly interpreted as encompassing any type of projection system, including refractive, reflective, catadioptric, magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, as appropriate for the exposure radiation being used, or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may be considered as synonymous with the more general term “projection system”.
  • the apparatus is of a transmissive type (e.g. employing a transmissive mask).
  • the apparatus may be of a reflective type (e.g. employing a programmable mirror array of a type as referred to above, or employing a reflective mask).
  • the lithographic apparatus may be of a type having two (dual stage) or more substrate tables or “substrate supports” (and/or two or more mask tables or “mask supports”).
  • substrate tables or “substrate supports” and/or two or more mask tables or “mask supports”.
  • additional tables or supports may be used in parallel, or preparatory steps may be carried out on one or more tables or supports while one or more other tables or supports are being used for exposure.
  • the lithographic apparatus may also be of a type wherein at least a portion of the substrate may be covered by a liquid having a relatively high refractive index, e.g. water, so as to fill a space between the projection system and the substrate.
  • a liquid having a relatively high refractive index e.g. water
  • An immersion liquid may also be applied to other spaces in the lithographic apparatus, for example, between the mask and the projection system. Immersion techniques can be used to increase the numerical aperture of projection systems.
  • immersion as used herein does not mean that a structure, such as a substrate, must be submerged in liquid, but rather only means that a liquid is located between the projection system and the substrate during exposure.
  • the illuminator IL receives radiation from a radiation source SO.
  • the source and the lithographic apparatus may be separate entities, for example when the source is an excimer laser. In such cases, the source is not considered to form part of the lithographic apparatus and the radiation is passed from the source SO to the illuminator IL with the aid of a beam delivery system BD including, for example, suitable directing mirrors and/or a beam expander. In other cases the source may be an integral part of the lithographic apparatus, for example when the source is a mercury lamp.
  • the source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
  • the illuminator IL may include an adjuster AD configured to adjust the angular intensity distribution of the radiation beam. Generally, at least the outer and/or inner radial extent (commonly referred to as ⁇ -outer and ⁇ -inner, respectively) of the intensity distribution in a pupil plane of the illuminator can be adjusted.
  • the illuminator IL may include various other components, such as an integrator IN and a condenser CO. The illuminator may be used to condition the radiation beam, to have a desired uniformity and intensity distribution in its cross-section.
  • the radiation beam B is incident on the patterning device (e.g., mask MA), which is held on the mask support (e.g., mask table MT), and is patterned by the patterning device. Having traversed the mask MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • a position sensor IF e.g. an interferometric device, linear encoder or capacitive sensor
  • the substrate table WT can be moved accurately, e.g. so as to position different target portions C in the path of the radiation beam B.
  • the first positioning device PM another position sensor (which is not explicitly depicted in FIG.
  • a second controller can be used to accurately position the mask MA with respect to the path of the radiation beam B, e.g. after mechanical retrieval from a mask library, or during a scan.
  • movement of the mask table MT may be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which form part of the first positioning device PM.
  • movement of the substrate table WT or “substrate support” may be realized using a long-stroke module and a short-stroke module, which form part of the second positioning device PW.
  • the mask table MT may be connected to a short-stroke actuator only, or may be fixed.
  • Mask MA and substrate W may be aligned using mask alignment marks M 1 , M 2 and substrate alignment marks P 1 , P 2 .
  • the substrate alignment marks as illustrated occupy dedicated target portions, they may be located in spaces between target portions (these are known as scribe-lane alignment marks).
  • the mask alignment marks may be located between the dies.
  • the depicted apparatus could be used in at least one of the following modes:
  • a controller for a positioning device such as the positioning device PM or PW, includes a variable gain where large error signals prior to the constant velocity operation of the positioning device induce a small additional gain, such that the controller has a similar settling behavior as in the conventional linear feedback control.
  • large setpoint accelerations induce large forces, and therefore challenge the linearity properties of the device components, such as amplifiers, motor, actuators, models, etc.
  • Sufficiently large stability margins are required, corresponding to small gains.
  • the stability margins may be chosen tighter. This is desirable when the controller is to control a mover which is to follow a specific setpoint profile.
  • a mover may be exemplified by a substrate stage mover for movements in the plane of the substrate (x and y direction).
  • a controller for a positioning device includes a variable gain where large error signals induce a larger additional gain than small error signals. This leads to an improved disturbance rejection, and is not aimed at a possibility to choose the stability margins tighter, as in the previous embodiment.
  • a controller according to the present embodiment may be exemplified by a substrate stage mover for movements at right angles to the plane of the substrate (z direction), where a setpoint profile plays a minor role.
  • FIG. 2 illustrates a block diagram of a controller according to the present invention in simplified form, only depicting those components necessary for an understanding of its operation.
  • a positioning device P (exemplified by the first positioning device PM and the second positioning device PW in FIG. 1 ) has a mover which is positioned at a position y.
  • a position sensor (exemplified by a laser interferometer in FIG. 1 ) feeds back the position y to a comparator for comparison with a setpoint position x.
  • the comparator outputs an error signal error which is input to a controller section C 1 .
  • a variable signal derived from the error signal is generated by controller section C 2 , and input to the controller section C 1 .
  • An output of the controller section C 1 is input to the positioning device P.
  • a signal f may be input to the positioning device P, e.g. representing disturbances which may act on the positioning device P, or feedforward contributions derived from a setpoint signal.
  • Other disturbances may also be input into the controller, such as output disturbances added to signal y, sensor noise added to signal y, etc.
  • FIG. 3 shows an embodiment of a part of the controller of FIG. 2 between terminals a and b.
  • the controller section C 2 includes a variable gain (non-linear) element VGE, as elucidated further with reference to FIGS. 4A and 4B .
  • FIG. 4A illustrates a variable gain ⁇ of the part of the controller between terminals a and b as a function of the error, in a brief notation ⁇ (error).
  • the variable gain ⁇ (error) varies between a first value ⁇ 1 , and a second value ⁇ 2 .
  • the relationship shown in FIG. 4A may be mathematically described according to equations [1]: if
  • ⁇ , then ⁇ (error) ⁇ 2 if
  • > ⁇ , then ⁇ (error) ⁇ 1 +( ⁇ 2 ⁇ 1 )* ⁇ /
  • the non-linear shape of the variable gain curve is not limited to the given example.
  • the variable gain ⁇ (error) is depicted as a constant value for errors in the range between ⁇ and + ⁇ , however, it may also vary as long as it remains higher than the variable gain ⁇ (error) outside the range.
  • the static input-output relation (gain multiplied by input, i.e. ⁇ (error)*error, as a function of error), as shown in FIG. 4B should be located in a sector delimited by sector boundaries, which are determined by ⁇ 1 and ⁇ 2 . Further the gain curve should be memoryless: any input should have only one output. Finally, no discontinuities should be present in the gain curve.
  • FIG. 4C illustrates another variable gain ⁇ (error) of the part of the controller between terminals a and b as a function of the error.
  • the variable gain ⁇ (error) varies between a first value ⁇ 3 and a second value ⁇ 4 .
  • the relationship shown in FIG. 4C may be mathematically described according to equations [2]: if
  • ⁇ , then ⁇ (error) ⁇ 3 if
  • > ⁇ , then ⁇ (error) ⁇ 4 ⁇ ( ⁇ 4 + ⁇ 3 )* ⁇ /
  • variable gain ⁇ (error) is large for large error levels, and small for small error levels. It is to be noted that the non-linear shape of the variable gain curve is not limited to the given example. In FIG. 4C , the variable gain ⁇ (error) is depicted as a constant value for errors in the range between ⁇ and + ⁇ , however, it may also vary as long as it remains lower than the variable gain ⁇ (error) outside the range.
  • the static input-output relation (gain multiplied by input, i.e. ⁇ (error)*error, as a function of error) should be located in a sector delimited by sector boundaries, which are determined by ⁇ 3 and ⁇ 4 . Further the gain curve should be memoryless, and no discontinuities should be present in the gain curve.
  • variable gain element VGE in the controller may vary.
  • FIG. 5 shows an embodiment of a part of the controller of FIG. 2 between terminals a and c including a nonlinear, variable gain element VG.
  • the controller part includes a PID control structure where an error signal is input to a proportional section P, an integrating section I, and a differentiating section D.
  • the proportional section P has a gain K 1
  • the integrating section I has a gain K 2 and a variable gain VG
  • the differentiating section has a gain K 3 .
  • the combined outputs of the proportional section P, the integrating section I and the differentiating section D are input to a low pass controller section LP.
  • the integrator gain is scaled non-linearly by a non-linear variable gain element VG using equations [1] above.
  • the location of the variable gain element is exemplary only, and not restricted to the integrating section I.
  • the variable gain element may also be implemented in the proportional section P and/or the differentiating section D, or upstream of the PID control structure.
  • variable gain control may provide an improved low-frequency disturbance rejection virtually without a deterioration of a settling behavior at a beginning of a constant velocity operation of a positioning device.
  • MA moving average
  • MSD moving standard deviation
  • FIG. 6 shows a further embodiment of a part of the controller of FIG. 2 between terminals a and b.
  • the controller section C 2 now includes a variable gain (non-linear) element VGE (cf. FIG. 3 ), supplemented with a dynamic filter C 3 .
  • VGE non-linear element
  • C 3 is chosen to represent a higher-order filter structure.
  • a filter structure may include a low-pass filter LP and at least one notch filter N (further notch filters may be added), for example having the transfer function:
  • variable gain element VGE and the dynamic filter C 3 , which combination may be considered to represent a variable integrator, provides much more low-frequency controller effort (hence much more low-frequency disturbance rejection) in comparison with the sole implementation of a variable gain as discussed above with reference to FIGS. 3-5 .
  • lithographic apparatus in the manufacture of ICs
  • the lithographic apparatus described herein may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays, liquid-crystal displays (LCDs), thin-film magnetic heads, etc.
  • any use of the terms “wafer” or “die” herein may be considered as synonymous with the more general terms “substrate” or “target portion”, respectively.
  • the substrate referred to herein may be processed, before or after exposure, in for example a track (a tool that typically applies a layer of resist to a substrate and develops the exposed resist), a metrology tool and/or an inspection tool. Where applicable, the disclosure herein may be applied to such and other substrate processing tools. Further, the substrate may be processed more than once, for example in order to create a multi-layer IC, so that the term substrate used herein may also refer to a substrate that already contains multiple processed layers.
  • imprint lithography a topography in a patterning device defines the pattern created on a substrate.
  • the topography of the patterning device may be pressed into a layer of resist supplied to the substrate whereupon the resist is cured by applying electromagnetic radiation, heat, pressure or a combination thereof.
  • the patterning device is moved out of the resist leaving a pattern in it after the resist is cured.
  • UV radiation e.g. having a wavelength of or about 365, 248, 193, 157 or 126 nm
  • EUV radiation e.g. having a wavelength in the range of 5-20 nm
  • particle beams such as ion beams or electron beams.
  • lens may refer to any one or combination of various types of optical components, including refractive, reflective, magnetic, electromagnetic and electrostatic optical components.
  • the present invention has been explained with reference to an embodiment of a lithographic apparatus. It should be appreciated that the invention can be applied to different kind of apparatus including motor devices for positioning an object. Examples of such different kind of apparatus are magnetic of optical storage devices, electron microscope imaging stages, and magnetic levitation stages for laser cutting.
  • the terms “a” or “an”, as used herein, are defined as one or more than one.
  • the term plurality, as used herein, is defined as two or more than two.
  • the term another, as used herein, is defined as at least a second or more.
  • the terms including and/or having, as used herein, are defined as including (i.e., open language).
  • the term coupled, as used herein, is defined as connected, although not necessarily directly, and not necessarily mechanically.
  • Software, a program, a computer program, or a software application may include a subroutine, a function, a procedure, an object method, an object implementation, an executable application, an applet, a servlet, a source code, an object code, a shared library/dynamic load library and/or other sequence of instructions designed for execution on a computer system.

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  • Automation & Control Theory (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
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