US7203010B2 - Catadioptric projection objective - Google Patents
Catadioptric projection objective Download PDFInfo
- Publication number
- US7203010B2 US7203010B2 US11/036,155 US3615505A US7203010B2 US 7203010 B2 US7203010 B2 US 7203010B2 US 3615505 A US3615505 A US 3615505A US 7203010 B2 US7203010 B2 US 7203010B2
- Authority
- US
- United States
- Prior art keywords
- diaphragm
- projection objective
- concave mirror
- objective
- catadioptric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related, expires
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/22—Telecentric objectives or lens systems
Definitions
- Such a system diaphragm also called aperture diaphragm or aperture stop, is fitted in the vicinity of a suitable diaphragm location of the optical axis.
- Suitable diaphragm locations lie at or in the vicinity of axial positions in which the principal ray of the optical imaging intercepts the optical axis.
- Imaging systems with an intermediate image have two such diaphragm locations, namely one between object plane and intermediate image and one between the intermediate image and the image plane.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Stereoscopic And Panoramic Photography (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/036,155 US7203010B2 (en) | 2002-07-18 | 2005-01-18 | Catadioptric projection objective |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39655202P | 2002-07-18 | 2002-07-18 | |
PCT/EP2003/007758 WO2004010164A2 (en) | 2002-07-18 | 2003-07-17 | Catadioptric projection objective |
US11/036,155 US7203010B2 (en) | 2002-07-18 | 2005-01-18 | Catadioptric projection objective |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/007758 Continuation WO2004010164A2 (en) | 2002-07-18 | 2003-07-17 | Catadioptric projection objective |
Publications (2)
Publication Number | Publication Date |
---|---|
US20050207029A1 US20050207029A1 (en) | 2005-09-22 |
US7203010B2 true US7203010B2 (en) | 2007-04-10 |
Family
ID=30770919
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/036,155 Expired - Fee Related US7203010B2 (en) | 2002-07-18 | 2005-01-18 | Catadioptric projection objective |
Country Status (5)
Country | Link |
---|---|
US (1) | US7203010B2 (ja) |
EP (1) | EP1523692A2 (ja) |
JP (1) | JP2005533285A (ja) |
AU (1) | AU2003258519A1 (ja) |
WO (1) | WO2004010164A2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070285767A1 (en) * | 2006-03-22 | 2007-12-13 | Carl Zeiss Smt Ag | Catadioptric imaging system with beam splitter |
US20080212170A1 (en) * | 2004-01-14 | 2008-09-04 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US20090190208A1 (en) * | 2004-01-14 | 2009-07-30 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10316428A1 (de) * | 2003-04-08 | 2004-10-21 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
DE602005008591D1 (de) | 2004-06-10 | 2008-09-11 | Zeiss Carl Smt Ag | Projektionsobjektiv für eine mikrolithographische projektionsbelichtungsvorrichtung |
US20090115986A1 (en) * | 2005-06-02 | 2009-05-07 | Carl Zeiss Smt Ag | Microlithography projection objective |
EP1746463A2 (de) | 2005-07-01 | 2007-01-24 | Carl Zeiss SMT AG | Verfahren zum Korrigieren eines lithographischen Projektionsobjektivs und derartiges Projektionsobjektiv |
US20080259308A1 (en) * | 2007-04-18 | 2008-10-23 | Carl Zeiss Smt Ag | Projection objective for microlithography |
DE102011003145A1 (de) | 2010-02-09 | 2011-08-11 | Carl Zeiss SMT GmbH, 73447 | Optisches System mit Blendeneinrichtung |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5052764A (en) | 1989-08-31 | 1991-10-01 | Hughes Aircraft Company | System and method for forming a holographic exposure with a simulated source |
US5742436A (en) | 1994-05-19 | 1998-04-21 | Carl-Zeiss-Stiftung | Maximum aperture catadioptric reduction objective for microlithography |
US5808805A (en) | 1994-04-28 | 1998-09-15 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
US5969882A (en) | 1997-04-01 | 1999-10-19 | Nikon Corporation | Catadioptric optical system |
US20020039175A1 (en) | 1999-12-29 | 2002-04-04 | Shafer David R. | Projection exposure lens with aspheric elements |
US6512641B2 (en) * | 1998-06-08 | 2003-01-28 | Nikon Corporation | Projection exposure apparatus and method |
US20030090786A1 (en) * | 1998-08-18 | 2003-05-15 | Nikon Corporation | Exposure apparatus and method |
US20030179356A1 (en) | 1999-12-29 | 2003-09-25 | Karl-Heinz Schuster | Projection objective having adjacently mounted aspheric lens surfaces |
US6707616B1 (en) | 1998-04-07 | 2004-03-16 | Nikon Corporation | Projection exposure apparatus, projection exposure method and catadioptric optical system |
US20060055907A1 (en) * | 2003-05-23 | 2006-03-16 | Takashi Kato | Projection optical system, exposure apparatus, and device manufacturing method |
-
2003
- 2003-07-17 WO PCT/EP2003/007758 patent/WO2004010164A2/en active Application Filing
- 2003-07-17 AU AU2003258519A patent/AU2003258519A1/en not_active Abandoned
- 2003-07-17 EP EP03765012A patent/EP1523692A2/en not_active Withdrawn
- 2003-07-17 JP JP2004522476A patent/JP2005533285A/ja active Pending
-
2005
- 2005-01-18 US US11/036,155 patent/US7203010B2/en not_active Expired - Fee Related
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5052764A (en) | 1989-08-31 | 1991-10-01 | Hughes Aircraft Company | System and method for forming a holographic exposure with a simulated source |
US5808805A (en) | 1994-04-28 | 1998-09-15 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
US5999333A (en) | 1994-04-28 | 1999-12-07 | Nikon Corporation | Exposure apparatus having catadioptric projection optical system |
US5742436A (en) | 1994-05-19 | 1998-04-21 | Carl-Zeiss-Stiftung | Maximum aperture catadioptric reduction objective for microlithography |
US5969882A (en) | 1997-04-01 | 1999-10-19 | Nikon Corporation | Catadioptric optical system |
US6707616B1 (en) | 1998-04-07 | 2004-03-16 | Nikon Corporation | Projection exposure apparatus, projection exposure method and catadioptric optical system |
US6512641B2 (en) * | 1998-06-08 | 2003-01-28 | Nikon Corporation | Projection exposure apparatus and method |
US20030090786A1 (en) * | 1998-08-18 | 2003-05-15 | Nikon Corporation | Exposure apparatus and method |
US20020039175A1 (en) | 1999-12-29 | 2002-04-04 | Shafer David R. | Projection exposure lens with aspheric elements |
US20030179356A1 (en) | 1999-12-29 | 2003-09-25 | Karl-Heinz Schuster | Projection objective having adjacently mounted aspheric lens surfaces |
US20060055907A1 (en) * | 2003-05-23 | 2006-03-16 | Takashi Kato | Projection optical system, exposure apparatus, and device manufacturing method |
Cited By (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8339701B2 (en) | 2004-01-14 | 2012-12-25 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US7869122B2 (en) | 2004-01-14 | 2011-01-11 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US9772478B2 (en) | 2004-01-14 | 2017-09-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with parallel, offset optical axes |
US8416490B2 (en) | 2004-01-14 | 2013-04-09 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8355201B2 (en) | 2004-01-14 | 2013-01-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20110235167A1 (en) * | 2004-01-14 | 2011-09-29 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8199400B2 (en) | 2004-01-14 | 2012-06-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8208199B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8289619B2 (en) | 2004-01-14 | 2012-10-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20090190208A1 (en) * | 2004-01-14 | 2009-07-30 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US20080212170A1 (en) * | 2004-01-14 | 2008-09-04 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US20100014153A1 (en) * | 2004-01-14 | 2010-01-21 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US8730572B2 (en) | 2004-01-14 | 2014-05-20 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US8804234B2 (en) | 2004-01-14 | 2014-08-12 | Carl Zeiss Smt Gmbh | Catadioptric projection objective including an aspherized plate |
US8908269B2 (en) | 2004-01-14 | 2014-12-09 | Carl Zeiss Smt Gmbh | Immersion catadioptric projection objective having two intermediate images |
US8913316B2 (en) | 2004-05-17 | 2014-12-16 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US9019596B2 (en) | 2004-05-17 | 2015-04-28 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US9134618B2 (en) | 2004-05-17 | 2015-09-15 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US9726979B2 (en) | 2004-05-17 | 2017-08-08 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
US20070285767A1 (en) * | 2006-03-22 | 2007-12-13 | Carl Zeiss Smt Ag | Catadioptric imaging system with beam splitter |
Also Published As
Publication number | Publication date |
---|---|
JP2005533285A (ja) | 2005-11-04 |
WO2004010164A2 (en) | 2004-01-29 |
AU2003258519A8 (en) | 2004-02-09 |
US20050207029A1 (en) | 2005-09-22 |
WO2004010164A3 (en) | 2004-06-03 |
AU2003258519A1 (en) | 2004-02-09 |
EP1523692A2 (en) | 2005-04-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7203010B2 (en) | Catadioptric projection objective | |
USRE39024E1 (en) | Exposure apparatus having catadioptric projection optical system | |
US5861997A (en) | Catadioptric reduction projection optical system and exposure apparatus having the same | |
US7236254B2 (en) | Exposure apparatus with interferometer | |
US7006304B2 (en) | Catadioptric reduction lens | |
EP1318425B1 (en) | Catadioptric optical system and exposure apparatus equipped with the same | |
USRE39296E1 (en) | Catadioptric projection systems | |
JP3826047B2 (ja) | 露光装置、露光方法、及びそれを用いたデバイス製造方法 | |
US7403262B2 (en) | Projection optical system and exposure apparatus having the same | |
US9459435B2 (en) | Catadioptric projection objective comprising deflection mirrors and projection exposure method | |
JP2001185480A (ja) | 投影光学系及び該光学系を備える投影露光装置 | |
US9046787B2 (en) | Microlithographic projection exposure apparatus | |
JPH04234722A (ja) | 補償型光学システム | |
USRE38438E1 (en) | Catadioptric reduction projection optical system and exposure apparatus having the same | |
KR101432822B1 (ko) | 결상 시스템, 특히 마이크로 리소그래픽 투영 조명 유닛에 사용될 수 있는 결상 시스템 | |
KR20010076350A (ko) | 마이크로리소그래피 투영장치 | |
US5594587A (en) | Illumination device with allowable error amount of telecentricity on the surface of the object to be illuminated and exposure apparatus using the same | |
US20040218164A1 (en) | Exposure apparatus | |
US7292316B2 (en) | Illumination optical system and exposure apparatus having the same | |
US7511890B2 (en) | Refractive optical imaging system, in particular projection objective for microlithography | |
JP2007287885A (ja) | 照明光学装置、露光装置、およびデバイス製造方法 | |
JP2008172272A (ja) | マイクロリソグラフィ投影露光装置 | |
JP4307039B2 (ja) | 照明装置、露光装置及びデバイス製造方法 | |
JP2001085315A (ja) | 照明光学装置および該照明光学装置を備えた露光装置 | |
JP2000021753A (ja) | 露光方法及び露光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: CARL ZEISS SMT AG, GERMANY Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:EPPLE, ALEXANDER;DODOC, AURELIAN;REEL/FRAME:016514/0578;SIGNING DATES FROM 20050415 TO 20050419 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20110410 |