US6641973B1 - Photographic day/night displays utilizing inorganic particles - Google Patents

Photographic day/night displays utilizing inorganic particles Download PDF

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Publication number
US6641973B1
US6641973B1 US10/265,552 US26555202A US6641973B1 US 6641973 B1 US6641973 B1 US 6641973B1 US 26555202 A US26555202 A US 26555202A US 6641973 B1 US6641973 B1 US 6641973B1
Authority
US
United States
Prior art keywords
layer
imaging member
imaging
image
inorganic particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US10/265,552
Other languages
English (en)
Inventor
Narasimharao Dontula
Robert P. Bourdelais
Debasis Majumdar
Cheryl J. Kaminsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Priority to US10/265,552 priority Critical patent/US6641973B1/en
Assigned to EASTMAN KODAK COMPANY reassignment EASTMAN KODAK COMPANY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: DONTULA, NARASIMHARAO, BOURDELAIS, ROBERT P., KAMINSKY, CHERYL J., MAJUMDAR, DEBASIS
Priority to EP03078029A priority patent/EP1408372A3/en
Priority to JP2003348470A priority patent/JP2004133462A/ja
Priority to CNA2003101006134A priority patent/CN1510510A/zh
Application granted granted Critical
Publication of US6641973B1 publication Critical patent/US6641973B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/95Photosensitive materials characterised by the base or auxiliary layers rendered opaque or writable, e.g. with inert particulate additives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/40Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
    • B41M5/41Base layers supports or substrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/502Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording characterised by structural details, e.g. multilayer materials
    • B41M5/508Supports
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/502Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording characterised by structural details, e.g. multilayer materials
    • B41M5/506Intermediate layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G03C1/7954Polyesters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/825Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
US10/265,552 2002-10-07 2002-10-07 Photographic day/night displays utilizing inorganic particles Expired - Fee Related US6641973B1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US10/265,552 US6641973B1 (en) 2002-10-07 2002-10-07 Photographic day/night displays utilizing inorganic particles
EP03078029A EP1408372A3 (en) 2002-10-07 2003-09-25 Photographic day/night displays utilizing inorganic particles
JP2003348470A JP2004133462A (ja) 2002-10-07 2003-10-07 画像形成要素
CNA2003101006134A CN1510510A (zh) 2002-10-07 2003-10-08 采用无机颗粒的摄影显示材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/265,552 US6641973B1 (en) 2002-10-07 2002-10-07 Photographic day/night displays utilizing inorganic particles

Publications (1)

Publication Number Publication Date
US6641973B1 true US6641973B1 (en) 2003-11-04

Family

ID=29270293

Family Applications (1)

Application Number Title Priority Date Filing Date
US10/265,552 Expired - Fee Related US6641973B1 (en) 2002-10-07 2002-10-07 Photographic day/night displays utilizing inorganic particles

Country Status (4)

Country Link
US (1) US6641973B1 (US06641973-20031104-C00027.png)
EP (1) EP1408372A3 (US06641973-20031104-C00027.png)
JP (1) JP2004133462A (US06641973-20031104-C00027.png)
CN (1) CN1510510A (US06641973-20031104-C00027.png)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6946240B2 (en) 2003-08-04 2005-09-20 Eastman Kodak Company Imaging material with improved scratch resistance
US20060241232A1 (en) * 2003-05-02 2006-10-26 Garces Juan M Coating and filler compositions comprising platy layered silicate pigments
US20060293430A1 (en) * 2005-06-20 2006-12-28 Eastman Kodak Company Exfoliated clay nanocomposites
GB2461276A (en) * 2008-06-25 2009-12-30 Royalking Ind Corp Accoutrement having thermal transfer printing
US20100003203A1 (en) * 2006-10-11 2010-01-07 Basf Se Method of producing surface-modified nanoparticulate metal oxides, metal hydroxides and/or metal oxyhydroxides
US20100261005A1 (en) * 2003-10-15 2010-10-14 Tolsa, S.A. Method of preparing metallic nanoparticles and materials thus obtained
US20130077169A1 (en) * 2011-09-23 2013-03-28 Ppg Industries Ohio, Inc. Hollow particle crystalline colloidal arrays
US9821588B2 (en) 2012-04-13 2017-11-21 Hewlett-Packard Development Company, L.P. Recording media
EP3265309A4 (en) * 2015-07-09 2018-03-21 Hewlett-Packard Development Company, L.P. Printable film
US10131173B2 (en) 2015-07-09 2018-11-20 Hewlett-Packard Development Company, L.P. Printable film

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7094525B2 (en) 2003-03-31 2006-08-22 Fuji Photo Film Co., Ltd. Silver halide photographic light-sensitive material

Citations (26)

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US4739007A (en) 1985-09-30 1988-04-19 Kabushiki Kaisha Toyota Chou Kenkyusho Composite material and process for manufacturing same
US4810734A (en) 1987-03-26 1989-03-07 Kabushiki Kaisha Toyota Chuo Kenkyusho Process for producing composite material
US4894411A (en) 1987-03-18 1990-01-16 Kabushiki Kaisha Toyota Chuo Kenkyusho Composite material and process for producing the same
JPH0362846A (ja) 1989-07-31 1991-03-18 Toyota Central Res & Dev Lab Inc ポリエステル複合材料及びその製造方法
US5102948A (en) 1989-05-19 1992-04-07 Ube Industries, Ltd. Polyamide composite material and method for preparing the same
US5164460A (en) 1990-05-30 1992-11-17 Kabushiki Kaisha Toyota Chuo Kenkyusho Polyimide composite material and process for producing the same
US5164440A (en) 1988-07-20 1992-11-17 Ube Industries, Ltd. High rigidity and impact resistance resin composition
WO1993004118A1 (en) 1991-08-12 1993-03-04 Allied-Signal Inc. Melt process formation of polymer nanocomposite of exfoliated layered material
US5248720A (en) 1988-09-06 1993-09-28 Ube Industries, Ltd. Process for preparing a polyamide composite material
WO1994004961A1 (en) 1992-08-11 1994-03-03 Agfa-Gevaert Naamloze Vennootschap Opaque polyester film support for photographic material
JPH07166036A (ja) 1993-09-30 1995-06-27 Co-Op Chem Co Ltd 芳香族ポリエステル組成物
JPH0873710A (ja) 1994-09-01 1996-03-19 Unitika Ltd 強化ポリエステル樹脂組成物およびその製造法
JPH08120071A (ja) 1994-10-24 1996-05-14 Unitika Ltd 強化ポリエステル樹脂組成物の製造法
US5552469A (en) 1995-06-07 1996-09-03 Amcol International Corporation Intercalates and exfoliates formed with oligomers and polymers and composite materials containing same
US5578672A (en) 1995-06-07 1996-11-26 Amcol International Corporation Intercalates; exfoliates; process for manufacturing intercalates and exfoliates and composite materials containing same
US5698624A (en) 1995-06-07 1997-12-16 Amcol International Corporation Exfoliated layered materials and nanocomposites comprising matrix polymers and said exfoliated layered materials formed with water-insoluble oligomers and polymers
US5721306A (en) 1995-06-07 1998-02-24 Amcol International Corporation Viscous carrier compositions, including gels, formed with an organic liquid carrier and a layered material:polymer complex
US5804613A (en) 1995-12-22 1998-09-08 Amcol International Corporation Intercalates and exfoliates formed with monomeric carbonyl-functional organic compounds, including carboxylic and polycarboxylic acids; aldehydes; and ketones; composite materials containing same and methods of modifying rheology therewith
US5830528A (en) 1996-05-29 1998-11-03 Amcol International Corporation Intercalates and exfoliates formed with hydroxyl-functional; polyhydroxyl-functional; and aromatic compounds; composites materials containing same and methods of modifying rheology therewith
US5854326A (en) 1995-08-29 1998-12-29 Sumitomo Chemical Company, Limited Gas barrier resin composition and process for producing the same
US6017685A (en) 1998-09-17 2000-01-25 Eastman Kodak Company Transmission duplitized display materials with biaxially oriented polyolefin sheets
US6030756A (en) 1998-09-17 2000-02-29 Eastman Kodak Company Day/night photographic display material with biaxially oriented polyolefin sheet
US6034163A (en) 1997-12-22 2000-03-07 Eastman Chemical Company Polyester nanocomposites for high barrier applications
US6352822B1 (en) * 2000-12-06 2002-03-05 Eastman Kodak Company Polyolefin base display material with tone enhancing layer
US6355404B1 (en) 2000-12-06 2002-03-12 Eastman Kodak Company Polyester base display material with tone enhancing layer
US20020123015A1 (en) * 2000-12-28 2002-09-05 Debasis Majumdar Imaging elements with nanocomposite containing supports

Patent Citations (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4739007A (en) 1985-09-30 1988-04-19 Kabushiki Kaisha Toyota Chou Kenkyusho Composite material and process for manufacturing same
US4894411A (en) 1987-03-18 1990-01-16 Kabushiki Kaisha Toyota Chuo Kenkyusho Composite material and process for producing the same
US4810734A (en) 1987-03-26 1989-03-07 Kabushiki Kaisha Toyota Chuo Kenkyusho Process for producing composite material
US5164440A (en) 1988-07-20 1992-11-17 Ube Industries, Ltd. High rigidity and impact resistance resin composition
US5248720A (en) 1988-09-06 1993-09-28 Ube Industries, Ltd. Process for preparing a polyamide composite material
US5102948A (en) 1989-05-19 1992-04-07 Ube Industries, Ltd. Polyamide composite material and method for preparing the same
JPH0362846A (ja) 1989-07-31 1991-03-18 Toyota Central Res & Dev Lab Inc ポリエステル複合材料及びその製造方法
US5164460A (en) 1990-05-30 1992-11-17 Kabushiki Kaisha Toyota Chuo Kenkyusho Polyimide composite material and process for producing the same
WO1993004118A1 (en) 1991-08-12 1993-03-04 Allied-Signal Inc. Melt process formation of polymer nanocomposite of exfoliated layered material
WO1994004961A1 (en) 1992-08-11 1994-03-03 Agfa-Gevaert Naamloze Vennootschap Opaque polyester film support for photographic material
JPH07166036A (ja) 1993-09-30 1995-06-27 Co-Op Chem Co Ltd 芳香族ポリエステル組成物
JPH0873710A (ja) 1994-09-01 1996-03-19 Unitika Ltd 強化ポリエステル樹脂組成物およびその製造法
JPH08120071A (ja) 1994-10-24 1996-05-14 Unitika Ltd 強化ポリエステル樹脂組成物の製造法
US5552469A (en) 1995-06-07 1996-09-03 Amcol International Corporation Intercalates and exfoliates formed with oligomers and polymers and composite materials containing same
US5578672A (en) 1995-06-07 1996-11-26 Amcol International Corporation Intercalates; exfoliates; process for manufacturing intercalates and exfoliates and composite materials containing same
US5698624A (en) 1995-06-07 1997-12-16 Amcol International Corporation Exfoliated layered materials and nanocomposites comprising matrix polymers and said exfoliated layered materials formed with water-insoluble oligomers and polymers
US5721306A (en) 1995-06-07 1998-02-24 Amcol International Corporation Viscous carrier compositions, including gels, formed with an organic liquid carrier and a layered material:polymer complex
US5854326A (en) 1995-08-29 1998-12-29 Sumitomo Chemical Company, Limited Gas barrier resin composition and process for producing the same
US5804613A (en) 1995-12-22 1998-09-08 Amcol International Corporation Intercalates and exfoliates formed with monomeric carbonyl-functional organic compounds, including carboxylic and polycarboxylic acids; aldehydes; and ketones; composite materials containing same and methods of modifying rheology therewith
US5830528A (en) 1996-05-29 1998-11-03 Amcol International Corporation Intercalates and exfoliates formed with hydroxyl-functional; polyhydroxyl-functional; and aromatic compounds; composites materials containing same and methods of modifying rheology therewith
US6034163A (en) 1997-12-22 2000-03-07 Eastman Chemical Company Polyester nanocomposites for high barrier applications
US6017685A (en) 1998-09-17 2000-01-25 Eastman Kodak Company Transmission duplitized display materials with biaxially oriented polyolefin sheets
US6030756A (en) 1998-09-17 2000-02-29 Eastman Kodak Company Day/night photographic display material with biaxially oriented polyolefin sheet
US6352822B1 (en) * 2000-12-06 2002-03-05 Eastman Kodak Company Polyolefin base display material with tone enhancing layer
US6355404B1 (en) 2000-12-06 2002-03-12 Eastman Kodak Company Polyester base display material with tone enhancing layer
US20020123015A1 (en) * 2000-12-28 2002-09-05 Debasis Majumdar Imaging elements with nanocomposite containing supports
US6475696B2 (en) * 2000-12-28 2002-11-05 Eastman Kodak Company Imaging elements with nanocomposite containing supports

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Pending U.S. Ser. No. 09/751,192, Majumdar et al., Imaging Elements with Nanocomposite Containing Supports, filed Dec. 28, 2000.
Pending U.S. Ser. No. 10/006,545, Nair et al., Polyester Nanocomposites, filed Nov. 13, 2001.
Pending U.S. Ser. No. 10/008/428, Dontula et al., Article Utilizing Block Copolymer Intercalated Clay, filed Nov. 13, 2001.
Pending U.S. Ser. No. 10/008/810, Majumdar et al., Smectite Clay Intercalated With Polyether Block Polyamide Copolymer, filed Nov. 13, 2001.
Pending U.S. Ser. No. 10/011/040, Dontula et al., Ethoxylated Alcohol Intercalated Smectite Materials And Method, filed Nov. 13, 2001.

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060241232A1 (en) * 2003-05-02 2006-10-26 Garces Juan M Coating and filler compositions comprising platy layered silicate pigments
US6946240B2 (en) 2003-08-04 2005-09-20 Eastman Kodak Company Imaging material with improved scratch resistance
US7910511B2 (en) * 2003-10-15 2011-03-22 Tolsa, S.A. Method of preparing metallic nanoparticles and materials thus obtained
US20100261005A1 (en) * 2003-10-15 2010-10-14 Tolsa, S.A. Method of preparing metallic nanoparticles and materials thus obtained
US20060293430A1 (en) * 2005-06-20 2006-12-28 Eastman Kodak Company Exfoliated clay nanocomposites
US20100003203A1 (en) * 2006-10-11 2010-01-07 Basf Se Method of producing surface-modified nanoparticulate metal oxides, metal hydroxides and/or metal oxyhydroxides
GB2461276A (en) * 2008-06-25 2009-12-30 Royalking Ind Corp Accoutrement having thermal transfer printing
US20130077169A1 (en) * 2011-09-23 2013-03-28 Ppg Industries Ohio, Inc. Hollow particle crystalline colloidal arrays
US11046856B2 (en) 2011-09-23 2021-06-29 Ppg Industries Ohio, Inc. Hollow particle crystalline colloidal arrays
US9821588B2 (en) 2012-04-13 2017-11-21 Hewlett-Packard Development Company, L.P. Recording media
EP3265309A4 (en) * 2015-07-09 2018-03-21 Hewlett-Packard Development Company, L.P. Printable film
US10040306B2 (en) 2015-07-09 2018-08-07 Hewlett-Packard Development Company, L.P. Printable film
US10131173B2 (en) 2015-07-09 2018-11-20 Hewlett-Packard Development Company, L.P. Printable film

Also Published As

Publication number Publication date
JP2004133462A (ja) 2004-04-30
EP1408372A2 (en) 2004-04-14
CN1510510A (zh) 2004-07-07
EP1408372A3 (en) 2004-08-18

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AS Assignment

Owner name: EASTMAN KODAK COMPANY, NEW YORK

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:DONTULA, NARASIMHARAO;BOURDELAIS, ROBERT P.;MAJUMDAR, DEBASIS;AND OTHERS;REEL/FRAME:013409/0611;SIGNING DATES FROM 20021004 TO 20021007

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

REMI Maintenance fee reminder mailed
LAPS Lapse for failure to pay maintenance fees
STCH Information on status: patent discontinuation

Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362

FP Lapsed due to failure to pay maintenance fee

Effective date: 20071104