US6362706B1 - Cavity resonator for reducing phase noise of voltage controlled oscillator - Google Patents

Cavity resonator for reducing phase noise of voltage controlled oscillator Download PDF

Info

Publication number
US6362706B1
US6362706B1 US09/542,056 US54205600A US6362706B1 US 6362706 B1 US6362706 B1 US 6362706B1 US 54205600 A US54205600 A US 54205600A US 6362706 B1 US6362706 B1 US 6362706B1
Authority
US
United States
Prior art keywords
cavity
microstrip line
metal film
cavity resonator
upper ground
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US09/542,056
Inventor
Cimoo Song
Chungwoo Kim
Insang Song
Yongwoo Kwon
Changyul Cheon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Assigned to SAMSUNG ELECTRONICS CO., LTD. reassignment SAMSUNG ELECTRONICS CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHEON, CHANGYUL, KIM, CHUNGWOO, Kwon, Yongwoo, SONG, CIMOO, SONG, INSANG
Application granted granted Critical
Publication of US6362706B1 publication Critical patent/US6362706B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P7/00Resonators of the waveguide type
    • H01P7/06Cavity resonators
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P7/00Resonators of the waveguide type
    • H01P7/06Cavity resonators
    • H01P7/065Cavity resonators integrated in a substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00Coupling devices of the waveguide type
    • H01P5/08Coupling devices of the waveguide type for linking dissimilar lines or devices
    • H01P5/10Coupling devices of the waveguide type for linking dissimilar lines or devices for coupling balanced lines or devices with unbalanced lines or devices
    • H01P5/107Hollow-waveguide/strip-line transitions

Definitions

  • the present invention relates to a cavity resonator for reducing the phase noise of electromagnetic waves output from a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) by utilizing a semiconductor (e.g., silicon, GaAs or InP) micro machining technique.
  • MMIC monolithic microwave integrated circuit
  • VCO voltage controlled oscillator
  • a microwave/millimeter wave MMIC VCO which does not use a cavity, outputs electromagnetic waves having large phase noise
  • the MMIC VCO is not appropriate for use in a radar system using a frequency modulating continuous wave (FMCW).
  • FMCW frequency modulating continuous wave
  • dielectric disks or transmission lines have been utilized as resonators to reduce phase noise.
  • dielectric resonators for millimeter waves are very expensive and are difficult to mass produce because the frequency at which resonance occurs depends on the location of the dielectric resonators and it is difficult to specify the location of the dielectric resonators in an MMIC substrate.
  • the Q-factor of transmission line resonators is too small to reduce phase noise.
  • FIGS. 1A and 1B are a plan view and a sectional view, respectively, of a conventional cavity resonator, and show a structure of an X-band micromachined resonator which is disclosed in IEEE Microwave and Guided Wave Letters, Vol. 7, pp. 168, 1997.
  • the conventional cavity resonator is structured such that two microstrip lines 30 are coupled to a cavity 20 through two slots 10 .
  • Such a structure implements a transmission type resonator having an input port and an output port. Since the transmission type resonator has a more complicated feed structure than a reflection type resonator, it is difficult to design the transmission type resonator having a larger Q-factor.
  • a cavity resonator for reducing the phase noise of electromagnetic waves output from a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) by coupling a silicon micromachined cavity, which has a large Q-factor, to a microstrip line such that the silicon micromachined cavity can be employed in a reflection type VCO.
  • MMIC monolithic microwave integrated circuit
  • VCO voltage controlled oscillator
  • the cavity resonator includes a cavity formed by a lower metal film and an upper ground plane metal film.
  • the lower metal film is formed by etching a semiconductor into a six-sided or rectangular parallelepiped structure and depositing a conductive film on the six-sided or rectangular parallelepiped structure.
  • the upper ground plane metal film is formed to cover the top of the rectangular parallelepiped structure of the lower metal film.
  • a microstrip line of predetermined width is formed to extend from one end of the cavity across to the other end of the cavity to serve as a waveguide.
  • the microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film of the cavity.
  • a slot is formed perpendicular to the microstrip line by removing a part, of predetermine dimension, of the upper ground plane metal film.
  • the lower metal film, the upper ground metal film and the microstrip line are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
  • Au gold
  • Ag silver
  • Cu copper
  • the predetermined distance between the microstrip line and the upper ground metal film is maintained by interposing a substrate formed of a semiconductor or an insulating material between them.
  • a cavity resonator for reducing the phase noise of a voltage controlled oscillator.
  • the cavity resonator includes a cavity formed by a lower metal film and an upper ground metal film.
  • the lower metal film is formed by etching a semiconductor into a rectangular parallelepiped structure and depositing a conductive film on the rectangular parallelepiped structure.
  • the upper ground plane metal film is formed to cover the top of the rectangular parallelepiped structure of the lower metal film.
  • a microstrip line of predetermined width is formed to expand across the cavity to serve as a waveguide.
  • the microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film.
  • Two slots are formed parallel to the microstrip line by removing a part, of predetermine dimension, of the upper ground plane metal film.
  • a matching resistor is inserted into the microstrip line at a predetermined location.
  • the resistor is inserted into the microstrip line by removing a part, of predetermined width, of the microstrip line, at a location corresponding to one end of the cavity.
  • the lower metal film, the upper ground metal film and the microstrip line are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
  • Au gold
  • Ag silver
  • Cu copper
  • the predetermined distance between the microstrip line and the upper ground metal film is maintained by interposing a substrate formed of a semiconductor or an insulating material between them.
  • FIGS. 1A and 1B are a plan view and a sectional view, respectively, of a conventional cavity resonator
  • FIG. 2A shows the shape of a cavity which is adopted in a cavity resonator according to the present invention
  • FIG. 2B shows a plan view of a 1-slot reflection type cavity resonator according to the present invention and a sectional view of the 1-slot reflection type cavity resonator taken along the line B—B′;
  • FIG. 2C is a sectional view of the 1-slot reflection type cavity resonator of FIG. 2B taken along the line A—A′;
  • FIG. 3 is a graph for showing the frequency characteristic in the 1-slot reflection type cavity resonator depicted in FIGS. 2B and 2C;
  • FIG. 4 is an S 11 parameter of electromagnetic waves output from the 1-slot reflection type cavity resonator depicted in FIGS. 2B and 2C;
  • FIGS. 5A and 5B are a plane view and a sectional view, respectively, of a 2-slot cavity resonator according to the present invention.
  • FIG. 6 shows an S 11 parameter of electromagnetic waves output from the 2-slot cavity resonator depicted in FIGS. 5 A and 5 B.
  • a cavity resonator for reducing the phase noise of a voltage controlled oscillator and a fabrication method therefor according to the present invention will now be described more fully with reference to the accompanying drawings, in which preferred embodiments of the invention are shown.
  • the phase noise of oscillators is one of the most important factors influencing the performance of transmitting and receiving systems.
  • the resonance frequency of a rectangular parallelepiped metal cavity is expressed as the following formula.
  • V ph is the phase velocity inside the cavity and l, m and n are integers indicating resonance modes.
  • Q factors used for measuring the performance of a cavity. The three Q factors are defined as follows:
  • f m,1,n is a resonance frequency
  • W is stored energy
  • P loss is lost energy.
  • the phase noise is inversely proportional to the square of the Q value of a resonator. Therefore, a resonator having a large Q value is required to reduce phase noise.
  • electromagnetic wave energy is coupled to the cavity of the resonator using a coaxial cable, a waveguide (i.e., a microstrip line), or through an aperture. As shown in FIGS.
  • a cavity resonator of the present invention has a reflection type structure in which a silicon micromachined cavity having a large Q-factor is coupled to a microstrip line so that the cavity resonator can be utilized in a reflection type voltage controlled oscillator.
  • a conventional transmission type cavity resonator has input and output ports
  • a cavity resonator of the present invention is a reflection type cavity resonator having a single port.
  • the reflection type cavity resonator has a simpler feed structure than the transmission type cavity resonator so that it is possible to fabricate a resonator having a larger Q-factor in the present invention.
  • the structure of such cavity resonator according to the present invention will now be described in detail.
  • FIGS. 2B and 2C are a plan view and a sectional view, respectively, for showing the schematic structure of a 1-slot reflection type cavity resonator.
  • the cavity resonator of the present invention basically has a structure in which, instead of a metal cavity, a cavity 500 , which is formed of a silicon or compound semiconductor substrate 1000 using a micro machining technology, is coupled to a micro strip line 400 .
  • the cavity 500 is formed by a lower cavity film 100 , which is a rectangular parallelepiped structure defined by a metal film such as a gold (Au) film and an upper ground plane film 200 , which covers the top of the lower cavity film 100 .
  • the microstrip line 400 is formed of a conductive film having an excellent conductivity such as a gold (Au) film, a silver (Ag) film or a copper (Cu) film.
  • the microstrip line which serves as a waveguide, is positioned at a predetermined distance from the upper ground plane film 200 of the cavity 500 .
  • a substrate 300 of Si, glass or a compound semiconductor is interposed between the microstrip line 400 and the upper ground plane film 200 of the cavity 500 to maintain the predetermined distance between the waveguide of the microstrip line 400 and the upper ground plane film 200 .
  • This predetermined distance is preferably 100 to 1000 micrometers because the width of the microstrip line 400 is dependent on the thickness and dielectric constant of substrate 300 .
  • Through holes 700 a are formed on the substrate 300 on both sides of the microstrip line 400 .
  • Grounding pads 700 are formed over the through holes 700 a and connected to the upper ground plane film 200 .
  • the microstrip line 400 stops near one end of the cavity 500 .
  • a single rectangular slot 210 perpendicular to the microstrip line 400 , is formed on the upper ground film 200 near the one end, thereby guiding electromagnetic waves, which have been guided along the waveguide including the upper ground plane film 200 and the microstrip line 400 , to the cavity 500 and thus generating resonance.
  • a 1-slot reflection type cavity resonator having such structure draws a signal output from a VCO to a microstrip line 400 and generates an electromagnetic wave mode in the cavity 500 using the electromagnetic wave coupling between the microstrip line 400 and the cavity 500 .
  • the electromagnetic wave coupling between the microstrip line 400 and the cavity 500 is established using the slot 210 which is appropriately formed.
  • the electromagnetic waves at a stable mode in the cavity 500 are transferred to the microstrip line 400 through the slot 210 and output to an antenna.
  • electromagnetic waves output from a VCO progress toward a slot along a microstrip line and are coupled to a cavity near the slot. Then, the electromagnetic waves excite a dominant cavity mode, TE 110 , in the cavity so that electromagnetic waves having stabilized resonance frequency are output through the microstrip line.
  • FIG. 3 shows a frequency characteristic curve illustrating a frequency characteristic in the 1-slot reflection type cavity resonator described above.
  • FIG. 4 shows an S 11 parameter of the output electromagnetic waves of the 1-slot reflection type cavity resonator.
  • MMIC monolithic microwave integrated circuit
  • VCO voltage controlled oscillator
  • FIG. 3 shows a frequency characteristic curve illustrating a frequency characteristic in the 1-slot reflection type cavity resonator described above.
  • FIG. 4 shows an S 11 parameter of the output electromagnetic waves of the 1-slot reflection type cavity resonator.
  • MMIC monolithic microwave integrated circuit
  • VCO voltage controlled oscillator
  • FIGS. 5A and 5B are a plan view and a sectional view, respectively, of a 2-slot cavity resonator.
  • the 2-slot cavity resonator is obtained by making the above embodiment of a 1-slot reflection type cavity resonator into a transmission type.
  • the operational principle of the 2-slot cavity resonator is the same as that of the embodiment shown in FIGS. 2B and 2C.
  • the 2-slot cavity resonator has a 50 ⁇ matching resistor 600 , in the microstrip located at a position corresponding to the one end of the cavity 500 .
  • the resistor attenuates electromagnetic waves having frequencies other than the resonance frequency.
  • the 2-slot cavity resonator also has two slots 220 in the upper ground plane film 200 , parallel to each other located on both sides of the microstrip line 400 .
  • Those members which are designated by the same reference numerals as those of FIGS. 2B and 2C are formed of the same materials as in the 1-slot reflection type cavity resonator in FIGS. 2B and 2C.
  • FIG. 6 shows an S 11 parameter characteristic of electromagnetic waves output from the 2-slot cavity resonator which is a second embodiment of the present invention. It can be seen from the result that the 2-slot cavity resonator is not as good as the 1-slot reflection type cavity resonator.
  • a cavity resonator for reducing the phase noise of a voltage controlled oscillator includes a cavity, obtained by micro machining silicon or a compound semiconductor instead of an existing metal cavity, which is coupled to a microstrip line to allow the cavity resonator to be adopted in a reflection type voltage controlled oscillator.
  • a coupling slot is formed by removing a predetermined size of the part of an upper ground plane film of a cavity facing to the microstrip line. Consequently, the cavity resonator of the present invention reduces the phase noise of microwaves or millimeter waves which are output from a voltage controlled oscillator.

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Inductance-Capacitance Distribution Constants And Capacitance-Resistance Oscillators (AREA)

Abstract

There is provided a cavity resonator for reducing the phase noise of electromagnetic waves output from a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) by utilizing a semiconductor (e.g., silicon, GaAs or InP) micro machining technique. In the cavity, instead of an existing metal cavity, a cavity, which is obtained by micro machining silicon or a compound semiconductor, is coupled to a microstrip line to allow the cavity resonator to be adopted in a reflection type voltage controlled oscillator. A coupling slot is formed by removing a predetermined size of the part of an upper ground plane film of a cavity facing to the microstrip line. Consequently, the cavity resonator reduces the phase noise of microwaves or millimeter waves which are output from a voltage controlled oscillator.

Description

Priority is claimed to Korean Application No. 99-11267 filed on Mar. 31, 1999, herein incorporated by reference.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention relates to a cavity resonator for reducing the phase noise of electromagnetic waves output from a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) by utilizing a semiconductor (e.g., silicon, GaAs or InP) micro machining technique.
2. Description of the Related Art
Since a microwave/millimeter wave MMIC VCO, which does not use a cavity, outputs electromagnetic waves having large phase noise, the MMIC VCO is not appropriate for use in a radar system using a frequency modulating continuous wave (FMCW). Recently, dielectric disks or transmission lines have been utilized as resonators to reduce phase noise. However, dielectric resonators for millimeter waves are very expensive and are difficult to mass produce because the frequency at which resonance occurs depends on the location of the dielectric resonators and it is difficult to specify the location of the dielectric resonators in an MMIC substrate. Moreover, the Q-factor of transmission line resonators is too small to reduce phase noise.
FIGS. 1A and 1B are a plan view and a sectional view, respectively, of a conventional cavity resonator, and show a structure of an X-band micromachined resonator which is disclosed in IEEE Microwave and Guided Wave Letters, Vol. 7, pp. 168, 1997. The conventional cavity resonator is structured such that two microstrip lines 30 are coupled to a cavity 20 through two slots 10. Such a structure implements a transmission type resonator having an input port and an output port. Since the transmission type resonator has a more complicated feed structure than a reflection type resonator, it is difficult to design the transmission type resonator having a larger Q-factor.
SUMMARY OF THE INVENTION
To solve the above problems, it is an objective of the present invention to provide a cavity resonator for reducing the phase noise of electromagnetic waves output from a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) by coupling a silicon micromachined cavity, which has a large Q-factor, to a microstrip line such that the silicon micromachined cavity can be employed in a reflection type VCO.
Accordingly, to achieve the above objective, there is provided a cavity resonator for reducing the phase noise of a voltage controlled oscillator. The cavity resonator includes a cavity formed by a lower metal film and an upper ground plane metal film. The lower metal film is formed by etching a semiconductor into a six-sided or rectangular parallelepiped structure and depositing a conductive film on the six-sided or rectangular parallelepiped structure. The upper ground plane metal film is formed to cover the top of the rectangular parallelepiped structure of the lower metal film. A microstrip line of predetermined width is formed to extend from one end of the cavity across to the other end of the cavity to serve as a waveguide. The microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film of the cavity. A slot is formed perpendicular to the microstrip line by removing a part, of predetermine dimension, of the upper ground plane metal film.
Preferably, the lower metal film, the upper ground metal film and the microstrip line are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu). The predetermined distance between the microstrip line and the upper ground metal film is maintained by interposing a substrate formed of a semiconductor or an insulating material between them.
In another aspect of the present invention, there is provided a cavity resonator for reducing the phase noise of a voltage controlled oscillator. The cavity resonator includes a cavity formed by a lower metal film and an upper ground metal film. The lower metal film is formed by etching a semiconductor into a rectangular parallelepiped structure and depositing a conductive film on the rectangular parallelepiped structure. The upper ground plane metal film is formed to cover the top of the rectangular parallelepiped structure of the lower metal film. A microstrip line of predetermined width is formed to expand across the cavity to serve as a waveguide. The microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film. Two slots are formed parallel to the microstrip line by removing a part, of predetermine dimension, of the upper ground plane metal film. A matching resistor is inserted into the microstrip line at a predetermined location. The resistor is inserted into the microstrip line by removing a part, of predetermined width, of the microstrip line, at a location corresponding to one end of the cavity.
Preferably, the lower metal film, the upper ground metal film and the microstrip line are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu). The predetermined distance between the microstrip line and the upper ground metal film is maintained by interposing a substrate formed of a semiconductor or an insulating material between them.
BRIEF DESCRIPTION OF THE DRAWINGS
The above objective and advantages of the present invention will become more apparent by describing in detail a preferred embodiment thereof with reference to the attached drawings in which:
FIGS. 1A and 1B are a plan view and a sectional view, respectively, of a conventional cavity resonator;
FIG. 2A shows the shape of a cavity which is adopted in a cavity resonator according to the present invention;
FIG. 2B shows a plan view of a 1-slot reflection type cavity resonator according to the present invention and a sectional view of the 1-slot reflection type cavity resonator taken along the line B—B′;
FIG. 2C is a sectional view of the 1-slot reflection type cavity resonator of FIG. 2B taken along the line A—A′; and
FIG. 3 is a graph for showing the frequency characteristic in the 1-slot reflection type cavity resonator depicted in FIGS. 2B and 2C;
FIG. 4 is an S11 parameter of electromagnetic waves output from the 1-slot reflection type cavity resonator depicted in FIGS. 2B and 2C;
FIGS. 5A and 5B are a plane view and a sectional view, respectively, of a 2-slot cavity resonator according to the present invention; and
FIG. 6 shows an S11 parameter of electromagnetic waves output from the 2-slot cavity resonator depicted in FIGS. 5A and 5B.
DETAILED DESCRIPTION OF THE INVENTION
A cavity resonator for reducing the phase noise of a voltage controlled oscillator and a fabrication method therefor according to the present invention, will now be described more fully with reference to the accompanying drawings, in which preferred embodiments of the invention are shown.
The phase noise of oscillators is one of the most important factors influencing the performance of transmitting and receiving systems. The resonance frequency of a rectangular parallelepiped metal cavity, as shown in FIG. 2A, is expressed as the following formula. Reference characters a, b and c indicate the width, depth and length, respectively, of the rectangular parallelepiped metal f m , l , n = v ph 2 ( l a ) 2 + ( m b ) 2 + ( n c ) 2
Figure US06362706-20020326-M00001
Here, Vph is the phase velocity inside the cavity and l, m and n are integers indicating resonance modes. There are three kinds of Q factors used for measuring the performance of a cavity. The three Q factors are defined as follows:
unloaded Q (QU): QU=f0/Δf=(2πf0)W/Ploss
loaded Q (QL): unloaded Q considering the input and output load
external Q (QE): 1/QE=1/QL−1/QU.
Here, fm,1,n is a resonance frequency, W is stored energy, and Ploss is lost energy. The phase noise is inversely proportional to the square of the Q value of a resonator. Therefore, a resonator having a large Q value is required to reduce phase noise. To excite the resonator, electromagnetic wave energy is coupled to the cavity of the resonator using a coaxial cable, a waveguide (i.e., a microstrip line), or through an aperture. As shown in FIGS. 2B and 2C, a cavity resonator of the present invention has a reflection type structure in which a silicon micromachined cavity having a large Q-factor is coupled to a microstrip line so that the cavity resonator can be utilized in a reflection type voltage controlled oscillator. While a conventional transmission type cavity resonator has input and output ports, a cavity resonator of the present invention is a reflection type cavity resonator having a single port. The reflection type cavity resonator has a simpler feed structure than the transmission type cavity resonator so that it is possible to fabricate a resonator having a larger Q-factor in the present invention. The structure of such cavity resonator according to the present invention, will now be described in detail.
FIGS. 2B and 2C are a plan view and a sectional view, respectively, for showing the schematic structure of a 1-slot reflection type cavity resonator. As shown in FIGS. 2B and 2C, the cavity resonator of the present invention basically has a structure in which, instead of a metal cavity, a cavity 500, which is formed of a silicon or compound semiconductor substrate 1000 using a micro machining technology, is coupled to a micro strip line 400. The cavity 500 is formed by a lower cavity film 100, which is a rectangular parallelepiped structure defined by a metal film such as a gold (Au) film and an upper ground plane film 200, which covers the top of the lower cavity film 100. The microstrip line 400 is formed of a conductive film having an excellent conductivity such as a gold (Au) film, a silver (Ag) film or a copper (Cu) film. The microstrip line, which serves as a waveguide, is positioned at a predetermined distance from the upper ground plane film 200 of the cavity 500. A substrate 300 of Si, glass or a compound semiconductor is interposed between the microstrip line 400 and the upper ground plane film 200 of the cavity 500 to maintain the predetermined distance between the waveguide of the microstrip line 400 and the upper ground plane film 200. This predetermined distance is preferably 100 to 1000 micrometers because the width of the microstrip line 400 is dependent on the thickness and dielectric constant of substrate 300. Through holes 700 a are formed on the substrate 300 on both sides of the microstrip line 400. Grounding pads 700 are formed over the through holes 700 a and connected to the upper ground plane film 200. The microstrip line 400 stops near one end of the cavity 500. A single rectangular slot 210, perpendicular to the microstrip line 400, is formed on the upper ground film 200 near the one end, thereby guiding electromagnetic waves, which have been guided along the waveguide including the upper ground plane film 200 and the microstrip line 400, to the cavity 500 and thus generating resonance.
A 1-slot reflection type cavity resonator having such structure draws a signal output from a VCO to a microstrip line 400 and generates an electromagnetic wave mode in the cavity 500 using the electromagnetic wave coupling between the microstrip line 400 and the cavity 500. The electromagnetic wave coupling between the microstrip line 400 and the cavity 500 is established using the slot 210 which is appropriately formed. The electromagnetic waves at a stable mode in the cavity 500 are transferred to the microstrip line 400 through the slot 210 and output to an antenna. In other words, in a 1-slot cavity resonator as shown in FIGS. 2B and 2C, electromagnetic waves output from a VCO progress toward a slot along a microstrip line and are coupled to a cavity near the slot. Then, the electromagnetic waves excite a dominant cavity mode, TE110, in the cavity so that electromagnetic waves having stabilized resonance frequency are output through the microstrip line.
FIG. 3 shows a frequency characteristic curve illustrating a frequency characteristic in the 1-slot reflection type cavity resonator described above. FIG. 4 shows an S11 parameter of the output electromagnetic waves of the 1-slot reflection type cavity resonator. Generally, a monolithic microwave integrated circuit (MMIC) voltage controlled oscillator (VCO) outputs electromagnetic waves having large phase noise so that the MMIC VCO is difficult to apply to a radar system using FMCW, but the 1-slot reflection type cavity resonator according to the present invention can greatly reduce the phase noise of the VCO.
FIGS. 5A and 5B are a plan view and a sectional view, respectively, of a 2-slot cavity resonator. The 2-slot cavity resonator is obtained by making the above embodiment of a 1-slot reflection type cavity resonator into a transmission type. The operational principle of the 2-slot cavity resonator is the same as that of the embodiment shown in FIGS. 2B and 2C. The 2-slot cavity resonator has a 50 Ω matching resistor 600, in the microstrip located at a position corresponding to the one end of the cavity 500. The resistor attenuates electromagnetic waves having frequencies other than the resonance frequency. The 2-slot cavity resonator also has two slots 220 in the upper ground plane film 200, parallel to each other located on both sides of the microstrip line 400. Those members which are designated by the same reference numerals as those of FIGS. 2B and 2C are formed of the same materials as in the 1-slot reflection type cavity resonator in FIGS. 2B and 2C. FIG. 6 shows an S11 parameter characteristic of electromagnetic waves output from the 2-slot cavity resonator which is a second embodiment of the present invention. It can be seen from the result that the 2-slot cavity resonator is not as good as the 1-slot reflection type cavity resonator.
As described above, in a cavity resonator for reducing the phase noise of a voltage controlled oscillator according to the present invention, includes a cavity, obtained by micro machining silicon or a compound semiconductor instead of an existing metal cavity, which is coupled to a microstrip line to allow the cavity resonator to be adopted in a reflection type voltage controlled oscillator. A coupling slot is formed by removing a predetermined size of the part of an upper ground plane film of a cavity facing to the microstrip line. Consequently, the cavity resonator of the present invention reduces the phase noise of microwaves or millimeter waves which are output from a voltage controlled oscillator.

Claims (14)

What is claimed is:
1. A cavity resonator comprising:
a semiconductor having a cavity which is defined by four sides, an upper surface and a lower surface;
a lower metal film located on said four sides and on said lower surface of said cavity in said semiconductor;
an upper ground plane metal film which covers said upper surface of said cavity in said semiconductor;
a microstrip line, of predetermined width, which extends from one end of the cavity across to the other end of the cavity to serve as a waveguide, wherein the microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film of the cavity opposite to said lower surface of said cavity; and
a slot in said upper ground plane metal film, wherein the slot is positioned perpendicular to the microstrip line.
2. The cavity resonator of claim 1, wherein the lower metal film and the upper ground metal film are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
3. The cavity resonator of claim 1, wherein the microstrip line consists of at least one a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
4. The cavity resonator of claim 1, further comprising a substrate of a semiconductor or insulating material interposed between said microstrip line and said upper ground metal film wherein the predetermined distance between the microstrip line and the upper ground metal film is maintained by said substrate.
5. The cavity resonator of claim 4, further comprising:
through holes which are formed in said substrate for maintaining the distance between the microstrip line and the upper ground metal film, wherein the through holes are positioned on both sides of the microstrip line; and
grounding metal pads which are formed to be connected to the upper ground plane metal film through the through holes.
6. The cavity resonator of claim 4, wherein the semiconductor is silicon (Si) or a compound semiconductor.
7. The cavity resonator of claim 4, wherein the insulating material is glass.
8. A cavity resonator comprising:
a semiconductor having a cavity which is defined by four sides, an upper surface and a lower surface;
a lower metal film located on said four sides and on said lower surface of said cavity in said semiconductor;
an upper ground plane metal film which covers said upper surface of said cavity in said semiconductor;
a microstrip line, of predetermined width, which extends from one end of the cavity across to the other end of the cavity to serve as a waveguide, wherein the microstrip line is disposed a uniform predetermined distance from the upper ground plane metal film of the cavity opposite to said lower surface of said cavity; and
two slots, of predetermined dimension, in said upper ground plane metal film, wherein the two slots are parallel to each other and positioned on each side of the microstrip line; and
a matching resistor which is positioned within a gap, of predetermined width, of the microstrip line, wherein the resistor is positioned at the location corresponding to one end of the cavity.
9. The cavity resonator of claim 8, wherein the lower metal film and the upper ground metal film are formed of a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
10. The cavity resonator of claim 8, wherein the microstrip line consists of at least one a conductor selected from the group consisting of gold (Au), silver (Ag) and copper (Cu).
11. The cavity resonator of claim 8, further comprising a substrate of a semiconductor or insulating material interposed between said microstrip line and said upper ground metal film wherein the predetermined distance between the microstrip line and the upper ground metal film is maintained by said substrate.
12. The cavity resonator of claim 11, further comprising:
through holes which are formed in said substrate for maintaining the distance between the microstrip line and the upper ground metal film, wherein the through holes are positioned on both sides of the microstrip line; and
grounding metal pads which are formed to be connected to the upper ground plane metal film through the through holes.
13. The cavity resonator of claim 11, wherein the semiconductor is silicon (Si) or a compound semiconductor.
14. The cavity resonator of claim 11, wherein the insulating material is glass.
US09/542,056 1999-03-31 2000-03-31 Cavity resonator for reducing phase noise of voltage controlled oscillator Expired - Lifetime US6362706B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019990011267A KR100552658B1 (en) 1999-03-31 1999-03-31 Cavity resonator for reducing a phase noise of a voltage controlled oscillator
KR99-11267 1999-03-31

Publications (1)

Publication Number Publication Date
US6362706B1 true US6362706B1 (en) 2002-03-26

Family

ID=19578398

Family Applications (1)

Application Number Title Priority Date Filing Date
US09/542,056 Expired - Lifetime US6362706B1 (en) 1999-03-31 2000-03-31 Cavity resonator for reducing phase noise of voltage controlled oscillator

Country Status (3)

Country Link
US (1) US6362706B1 (en)
EP (1) EP1041668A3 (en)
KR (1) KR100552658B1 (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050215020A1 (en) * 2001-12-28 2005-09-29 Leif Bergstedt Component for electromagnetic waves and a method for manufacturing the same
US20070069824A1 (en) * 2005-09-27 2007-03-29 Northrop Grumman Corporation 3D MMIC VCO and methods of making the same
US20070109078A1 (en) * 2005-11-14 2007-05-17 Northrop Grumman Corporation Tunable MMIC (monolithic microwave integrated circuit) waveguide resonators
US20090278631A1 (en) * 2004-06-03 2009-11-12 Huber & Suhner Ag Cavity resonator, use of a cavity resonator and oscillator circuit
US20100253450A1 (en) * 2006-11-17 2010-10-07 Electronics And Telecommunications Research Institute Apparatus for transitioning millimeter wave between dielectric waveguide and transmission line
US20100308925A1 (en) * 2009-06-09 2010-12-09 Seoul National University Industry Foundation Method of producing micromachined air-cavity resonator, micromachined air-cavity resonator, band-pass filter and oscillator using the method
CN102509721A (en) * 2011-11-23 2012-06-20 中国科学院微电子研究所 Method for manufacturing indium phosphide monolithic microwave integrated circuit
US8860532B2 (en) 2011-05-20 2014-10-14 University Of Central Florida Research Foundation, Inc. Integrated cavity filter/antenna system
US9000851B1 (en) 2011-07-14 2015-04-07 Hittite Microwave Corporation Cavity resonators integrated on MMIC and oscillators incorporating the same
CN104577316A (en) * 2014-12-30 2015-04-29 中国科学院上海微系统与信息技术研究所 Vertical coupled feeding structure applied to millimeter-wave microstrip antenna
US9123983B1 (en) 2012-07-20 2015-09-01 Hittite Microwave Corporation Tunable bandpass filter integrated circuit
US20160006100A1 (en) * 2011-10-05 2016-01-07 Harris Corporation Method for making electrical structure with air dielectric and related electrical structures
US9520356B1 (en) * 2015-09-09 2016-12-13 Analog Devices, Inc. Circuit with reduced noise and controlled frequency
US10131115B1 (en) 2017-09-07 2018-11-20 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell with dual wafer bonding
US20190058232A1 (en) * 2017-08-21 2019-02-21 Texas Instruments Incorporated Launch structures for a hermetically sealed cavity
US10424523B2 (en) 2017-09-07 2019-09-24 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell with buried ground plane
US10444102B2 (en) 2017-09-07 2019-10-15 Texas Instruments Incorporated Pressure measurement based on electromagnetic signal output of a cavity
US10544039B2 (en) 2017-09-08 2020-01-28 Texas Instruments Incorporated Methods for depositing a measured amount of a species in a sealed cavity
US10551265B2 (en) 2017-09-07 2020-02-04 Texas Instruments Incorporated Pressure sensing using quantum molecular rotational state transitions
US10549986B2 (en) 2017-09-07 2020-02-04 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell
US10589986B2 (en) 2017-09-06 2020-03-17 Texas Instruments Incorporated Packaging a sealed cavity in an electronic device
US10775422B2 (en) 2017-09-05 2020-09-15 Texas Instruments Incorporated Molecular spectroscopy cell with resonant cavity

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100379440B1 (en) * 2000-02-16 2003-04-10 엘지전자 주식회사 method for fabricating of microwave resonator
KR20010111806A (en) * 2000-06-13 2001-12-20 구자홍 Integrated Microwave Resonator and the Fabrication Method for the same
KR100348443B1 (en) * 2000-07-13 2002-08-10 엘지전자 주식회사 Resonator using cavity filled with high dielectric pastes and fabricating method thereof
KR100360889B1 (en) * 2000-08-17 2002-11-13 엘지전자 주식회사 Dielectric resonator and fabricating method thereof
WO2010139366A1 (en) * 2009-06-04 2010-12-09 Telefonaktiebolaget L M Ericsson (Publ) A package resonator cavity
CN105186091B (en) * 2015-08-04 2018-12-04 中国电子科技集团公司第四十一研究所 A kind of production method of the extra small metal waveguide of terahertz wave band

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423448A (en) * 1977-07-25 1979-02-22 Toshiba Corp Microwave filter
US4211987A (en) 1977-11-30 1980-07-08 Harris Corporation Cavity excitation utilizing microstrip, strip, or slot line
JPS6313401A (en) 1986-07-03 1988-01-20 Mitsubishi Electric Corp Connection circuit for high frequency transmission line
JPH0198311A (en) * 1987-10-09 1989-04-17 Murata Mfg Co Ltd Manufacture of integrated type resonator
JPH04292003A (en) * 1991-03-20 1992-10-16 Fujitsu Ltd Oscillation frequency adjusting system for strip line resonator
US5821836A (en) * 1997-05-23 1998-10-13 The Regents Of The University Of Michigan Miniaturized filter assembly
WO1998053518A1 (en) 1997-05-23 1998-11-26 Thomson-Csf Method and device for connecting two millimetric elements
US6130483A (en) * 1997-03-05 2000-10-10 Kabushiki Kaisha Toshiba MMIC module using flip-chip mounting
US6211754B1 (en) * 1997-06-04 2001-04-03 Sanyo Electric Co., Ltd, Integrated resonance circuit consisting of a parallel connection of a microstrip line and a capacitor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60117801A (en) * 1983-11-29 1985-06-25 Fujitsu Ltd Mic oscillator
JPH07336139A (en) * 1994-06-07 1995-12-22 Fujitsu Ltd Oscillator
JPH1093219A (en) * 1996-09-17 1998-04-10 Toshiba Corp High-frequency integrated circuit and its manufacture
JP3762095B2 (en) * 1998-03-31 2006-03-29 京セラ株式会社 Multilayer circuit board

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5423448A (en) * 1977-07-25 1979-02-22 Toshiba Corp Microwave filter
US4211987A (en) 1977-11-30 1980-07-08 Harris Corporation Cavity excitation utilizing microstrip, strip, or slot line
JPS6313401A (en) 1986-07-03 1988-01-20 Mitsubishi Electric Corp Connection circuit for high frequency transmission line
JPH0198311A (en) * 1987-10-09 1989-04-17 Murata Mfg Co Ltd Manufacture of integrated type resonator
US4890370A (en) * 1987-10-09 1990-01-02 Murata Manufacturing Co., Ltd. Manufacturing method for integrated resonator
JPH04292003A (en) * 1991-03-20 1992-10-16 Fujitsu Ltd Oscillation frequency adjusting system for strip line resonator
US6130483A (en) * 1997-03-05 2000-10-10 Kabushiki Kaisha Toshiba MMIC module using flip-chip mounting
US5821836A (en) * 1997-05-23 1998-10-13 The Regents Of The University Of Michigan Miniaturized filter assembly
WO1998053518A1 (en) 1997-05-23 1998-11-26 Thomson-Csf Method and device for connecting two millimetric elements
US6211754B1 (en) * 1997-06-04 2001-04-03 Sanyo Electric Co., Ltd, Integrated resonance circuit consisting of a parallel connection of a microstrip line and a capacitor

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J. Papapolymerou et al., "A Micromachined High-Q X-Band Resonator", IEEE MicrowaVe and Guided Wave Letters, US, IEEE Inc., New York, vol. 7, No. 6, Jun. 1, 1997, pp. 168-170, XP000690394, ISSN: 1051-8207.

Cited By (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7192882B2 (en) * 2001-12-28 2007-03-20 Telefonaktiebolaget Lm Ericsson (Publ) Component for electromagnetic waves and a method for manufacturing the same
US20050215020A1 (en) * 2001-12-28 2005-09-29 Leif Bergstedt Component for electromagnetic waves and a method for manufacturing the same
US20090278631A1 (en) * 2004-06-03 2009-11-12 Huber & Suhner Ag Cavity resonator, use of a cavity resonator and oscillator circuit
US8035465B2 (en) * 2004-06-03 2011-10-11 Huber & Suhner Ag Cavity resonator, use of a cavity resonator and oscillator circuit
US20070069824A1 (en) * 2005-09-27 2007-03-29 Northrop Grumman Corporation 3D MMIC VCO and methods of making the same
US7276981B2 (en) 2005-09-27 2007-10-02 Northrop Grumman Corporation 3D MMIC VCO and methods of making the same
US20070109078A1 (en) * 2005-11-14 2007-05-17 Northrop Grumman Corporation Tunable MMIC (monolithic microwave integrated circuit) waveguide resonators
US7570137B2 (en) * 2005-11-14 2009-08-04 Northrop Grumman Corporation Monolithic microwave integrated circuit (MMIC) waveguide resonators having a tunable ferroelectric layer
US20100253450A1 (en) * 2006-11-17 2010-10-07 Electronics And Telecommunications Research Institute Apparatus for transitioning millimeter wave between dielectric waveguide and transmission line
US7994879B2 (en) * 2006-11-17 2011-08-09 Electronics And Telecommunication Research Institute Apparatus for transitioning millimeter wave between dielectric waveguide and transmission line
US20100308925A1 (en) * 2009-06-09 2010-12-09 Seoul National University Industry Foundation Method of producing micromachined air-cavity resonator, micromachined air-cavity resonator, band-pass filter and oscillator using the method
US8860532B2 (en) 2011-05-20 2014-10-14 University Of Central Florida Research Foundation, Inc. Integrated cavity filter/antenna system
US9000851B1 (en) 2011-07-14 2015-04-07 Hittite Microwave Corporation Cavity resonators integrated on MMIC and oscillators incorporating the same
US20160006100A1 (en) * 2011-10-05 2016-01-07 Harris Corporation Method for making electrical structure with air dielectric and related electrical structures
US10056670B2 (en) * 2011-10-05 2018-08-21 Harris Corporation Method for making electrical structure with air dielectric and related electrical structures
CN102509721A (en) * 2011-11-23 2012-06-20 中国科学院微电子研究所 Method for manufacturing indium phosphide monolithic microwave integrated circuit
US9123983B1 (en) 2012-07-20 2015-09-01 Hittite Microwave Corporation Tunable bandpass filter integrated circuit
CN104577316A (en) * 2014-12-30 2015-04-29 中国科学院上海微系统与信息技术研究所 Vertical coupled feeding structure applied to millimeter-wave microstrip antenna
CN106531696B (en) * 2015-09-09 2019-11-01 美国亚德诺半导体公司 It reduces noise and controls the circuit of frequency
US9520356B1 (en) * 2015-09-09 2016-12-13 Analog Devices, Inc. Circuit with reduced noise and controlled frequency
CN106531696A (en) * 2015-09-09 2017-03-22 美国亚德诺半导体公司 Circuit with reduced noise and controlled frequency
US11258154B2 (en) 2017-08-21 2022-02-22 Texas Instruments Incorporated Launch structures for a hermetically sealed cavity
US20190058232A1 (en) * 2017-08-21 2019-02-21 Texas Instruments Incorporated Launch structures for a hermetically sealed cavity
US10498001B2 (en) * 2017-08-21 2019-12-03 Texas Instruments Incorporated Launch structures for a hermetically sealed cavity
US10775422B2 (en) 2017-09-05 2020-09-15 Texas Instruments Incorporated Molecular spectroscopy cell with resonant cavity
US10589986B2 (en) 2017-09-06 2020-03-17 Texas Instruments Incorporated Packaging a sealed cavity in an electronic device
US10913654B2 (en) 2017-09-06 2021-02-09 Texas Instruments Incorporated Packaging a sealed cavity in an electronic device
US10493722B2 (en) 2017-09-07 2019-12-03 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell with dual wafer bonding
US10551265B2 (en) 2017-09-07 2020-02-04 Texas Instruments Incorporated Pressure sensing using quantum molecular rotational state transitions
US10549986B2 (en) 2017-09-07 2020-02-04 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell
US10444102B2 (en) 2017-09-07 2019-10-15 Texas Instruments Incorporated Pressure measurement based on electromagnetic signal output of a cavity
US10424523B2 (en) 2017-09-07 2019-09-24 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell with buried ground plane
US10131115B1 (en) 2017-09-07 2018-11-20 Texas Instruments Incorporated Hermetically sealed molecular spectroscopy cell with dual wafer bonding
US10544039B2 (en) 2017-09-08 2020-01-28 Texas Instruments Incorporated Methods for depositing a measured amount of a species in a sealed cavity

Also Published As

Publication number Publication date
EP1041668A2 (en) 2000-10-04
KR20000061886A (en) 2000-10-25
KR100552658B1 (en) 2006-02-17
EP1041668A3 (en) 2001-08-16

Similar Documents

Publication Publication Date Title
US6362706B1 (en) Cavity resonator for reducing phase noise of voltage controlled oscillator
US5525945A (en) Dielectric resonator notch filter with a quadrature directional coupler
JP3045046B2 (en) Non-radiative dielectric line device
EP0871239A1 (en) Antenna device and radar module
US3986153A (en) Active millimeter-wave integrated circuit
EP0742639B1 (en) Microwave oscillator, an antenna therefor and methods of manufacture
EP1077502A2 (en) MMIC-to-waveguide RF transition and associated method
JPH10163711A (en) Millimeter wave guide
EP0296838B1 (en) Monolithic microwave transmitter/receiver
US5726664A (en) End launched microstrip or stripline to waveguide transition with cavity backed slot fed by T-shaped microstrip line or stripline usable in a missile
US6411182B1 (en) Cavity resonator for reducing phase noise of voltage controlled oscillator and method for fabricating the same
US4131858A (en) Beam lead dual parametric amplifier
US4568889A (en) Distributed diode VCO with stripline coupled output and distributed variable capacitor control
US6445255B1 (en) Planar dielectric integrated circuit
US4325035A (en) Oscillator using dielectric resonator
Tavernier et al. A reduced-size silicon micromachined high-Q resonator at 5.7 GHz
Rebeiz et al. Micromachined membrane filters for microwave and millimeter‐wave applications (invited article)
KR100964984B1 (en) Cavity resonator and filter
JP3678194B2 (en) Transmission line and transmission / reception device
US5512868A (en) Magnetostatic microwave device having large impedance change at resonance
EP0523564A1 (en) An oscillating circuit with a ring shaped resonator of superconducting material coupled thereto
JP3405229B2 (en) Dielectric line device and transmission device
US20220376375A1 (en) Waveguides
EP0143887A2 (en) Distributed impatt structure
JPS61183948A (en) Connection substrate of microwave ic enclosure

Legal Events

Date Code Title Description
AS Assignment

Owner name: SAMSUNG ELECTRONICS CO., LTD., KOREA, REPUBLIC OF

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:SONG, CIMOO;KIM, CHUNGWOO;SONG, INSANG;AND OTHERS;REEL/FRAME:010862/0125

Effective date: 20000331

STCF Information on status: patent grant

Free format text: PATENTED CASE

FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

FPAY Fee payment

Year of fee payment: 12