US5772728A - Method for upgrading of silicon-containing residues obtained after leaching of copper-containing residues from chlorosilane synthesis - Google Patents
Method for upgrading of silicon-containing residues obtained after leaching of copper-containing residues from chlorosilane synthesis Download PDFInfo
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- US5772728A US5772728A US08/859,819 US85981997A US5772728A US 5772728 A US5772728 A US 5772728A US 85981997 A US85981997 A US 85981997A US 5772728 A US5772728 A US 5772728A
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- residue
- slag
- silicon
- copper
- smelting furnace
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- 239000010949 copper Substances 0.000 title claims abstract description 33
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 30
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 239000010703 silicon Substances 0.000 title claims abstract description 25
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 23
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 11
- 238000003786 synthesis reaction Methods 0.000 title claims abstract description 11
- 238000002386 leaching Methods 0.000 title claims abstract description 7
- 239000005046 Chlorosilane Substances 0.000 title 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title 1
- 239000002893 slag Substances 0.000 claims abstract description 24
- 238000003723 Smelting Methods 0.000 claims abstract description 20
- 239000007787 solid Substances 0.000 claims abstract description 19
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 8
- 230000003647 oxidation Effects 0.000 claims abstract description 6
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 6
- 239000000378 calcium silicate Substances 0.000 claims abstract description 5
- 229910052918 calcium silicate Inorganic materials 0.000 claims abstract description 5
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000001367 organochlorosilanes Chemical class 0.000 claims abstract description 5
- 238000010079 rubber tapping Methods 0.000 claims abstract description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 239000007789 gas Substances 0.000 claims description 9
- 229910052681 coesite Inorganic materials 0.000 claims description 8
- 229910052906 cristobalite Inorganic materials 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 239000000377 silicon dioxide Substances 0.000 claims description 8
- 229910052682 stishovite Inorganic materials 0.000 claims description 8
- 229910052905 tridymite Inorganic materials 0.000 claims description 8
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 7
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical group [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 239000002699 waste material Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical group 0.000 claims description 3
- 239000007800 oxidant agent Substances 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 3
- 229910018404 Al2 O3 Inorganic materials 0.000 claims description 2
- 239000000155 melt Substances 0.000 claims 2
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910000640 Fe alloy Inorganic materials 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- XWHPIFXRKKHEKR-UHFFFAOYSA-N iron silicon Chemical compound [Si].[Fe] XWHPIFXRKKHEKR-UHFFFAOYSA-N 0.000 description 4
- 229940050176 methyl chloride Drugs 0.000 description 4
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 3
- 229910017344 Fe2 O3 Inorganic materials 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 3
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 3
- 229940045803 cuprous chloride Drugs 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001018 Cast iron Inorganic materials 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 description 2
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910001092 metal group alloy Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 239000011343 solid material Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- HGUFODBRKLSHSI-UHFFFAOYSA-N 2,3,7,8-tetrachloro-dibenzo-p-dioxin Chemical compound O1C2=CC(Cl)=C(Cl)C=C2OC2=C1C=C(Cl)C(Cl)=C2 HGUFODBRKLSHSI-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- JJLJMEJHUUYSSY-UHFFFAOYSA-L Copper hydroxide Chemical class [OH-].[OH-].[Cu+2] JJLJMEJHUUYSSY-UHFFFAOYSA-L 0.000 description 1
- 229910005331 FeSi2 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 150000001399 aluminium compounds Chemical class 0.000 description 1
- 229940077746 antacid containing aluminium compound Drugs 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- 235000011116 calcium hydroxide Nutrition 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910001956 copper hydroxide Inorganic materials 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003673 groundwater Substances 0.000 description 1
- DKAGJZJALZXOOV-UHFFFAOYSA-N hydrate;hydrochloride Chemical compound O.Cl DKAGJZJALZXOOV-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002506 iron compounds Chemical class 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000010310 metallurgical process Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910021487 silica fume Inorganic materials 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 150000003752 zinc compounds Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Definitions
- the present invention relates to a method for upgrading residues from methylchlorosilane synthesis, where silicon is reacted with methylchloride in the presence of a copper catalyst and residues from chlorosilanesynthesis, where silicon is reacted with hydrogenchloride.
- Methylchlorosilane synthesis is carried out in fluidized bed reactors.
- a part of fine particulate silicon and copper catalyst particles are together with metallic compounds, especially iron- and aluminium compounds, which are present in the silicon raw material, removed from the reactor together with the gaseous reaction products, a mixture of silanes, and unreacted methylchloride.
- the solid materials are separated from the mixture of silanes and unreacted methylchloride in separating devices such as for example cyclones.
- a residue will remain in the reactor, comprising silicon, copper and metal halides formed from compounds in the silicon raw materials and also comprising carbon deposits formed by decomposition of methylchloride. This residue is continuously or intermittently removed from the reactor.
- Elemental copper, copper oxides, copper formate, copper hydroxides and other copper salts like copper chloride are used as a copper catalyst.
- the copper catalyst may further contain metals or metal compounds as activators, such as zinc, and zinc compounds, or promotors such as antimony, cadmium, phosphorus, tin, arsenic etc. in order to improve the reactivity and the selectivity of the produced silanes.
- DE-A 4205980 it is proposed to treat residue from direct synthesis by diluted sulphuric acid at elevated temperatures in order to dissolve copper and where copper can be precipitated as for example cuprous chloride or as copper-II-oxalat or where copper can be recovered by electrolysis. It is further disclosed in DE-A 4205980 that it is obtained a solid silicon residue which can be used in metallurgical processes or which can be deposited. Chemical analysis of the obtained silicon residue is, however, not given.
- an inert slag it is understood a material which satisfies the requirements set to an inert material in Review of Regulatory Situation on Waste at EC and OECD levels, published February 1993.
- the present invention relates to a method for upgrading silicon-containing solid residues obtained after leaching of copper from copper-containing residues from direct synthesis of organochlorosilanes, said method being characterized in that the solid residue, optionally together with an oxidation agent, is supplied to a smelting furnace where the residues are melted and form a molten metallic phase substantially containing silicon and a calcium silicate slag and tapping of the molten metallic phase and an inert slag from the smelting furnace.
- the residues are dried and agglomerated before they are supplied to the smelting furnace.
- the agglomeration is carried out by conventional methods such as for example pelletizing using a suitable binder.
- the residues can be supplied to the smelting furnace in powder form by injection through a hollow electrode or by injection through a lance or through nozzles arranged in the furnace bottom or in the furnace body.
- the residues can either be in powder form or agglomerated form.
- CaO, SiO 2 or Al 2 O 3 are added as slag forming materials in order to produce a calcium silicate or a calcium aluminate silicate slag which is liquid at the temperature in the smelting furnace and is inert after solidification.
- the basicity of the slag defined for example as weight ratio CaO/SiO 2 is preferably adjusted within the range of 0.5 to 3.0.
- the smelting process may be carried out in plasma heated furnaces or in furnaces equipped with graphite- or carbon electrodes.
- the current supply can be direct current or alternate current. Both open, semi-closed or closed smelting furnaces can be used.
- the use of a closed smelting furnace gives, however, the best control of gas production. This may be an advantage as to the amount of gas and to avoid outlet of dioxine to the environment.
- oxidizing agent a metal oxide or an oxygen containing gas can be used.
- the purpose of the supply of an oxidation agent is to oxidize any elemental carbon present in the residue.
- an iron oxide source is added as oxidation agent to the smelting furnace in an amount sufficient to oxidize elemental carbon present in the residue.
- the molten metallic phase will, in addition to silicon and copper, contain iron which during the solidification of the metallic phase will form a FeSi 2 intermetallic phase.
- amorphous silica dust will be formed which will follow the off gas from the furnace.
- This silica dust can be recovered from the off gas in for example a bag house filter and can be used as a binder for producing agglomerates of the residue or it can be used as an additive in the production of concrete and mortar.
- the gas can be cleaned by wet cleaning, whereby the amorphous silica can be recovered in the form of a liquid slurry.
- silicon or a silicon-iron alloy is obtained which can be used as an additive in the production of steel or cast iron or as a reduction agent in silicothermic production of metals or metal alloys.
- the inert slag can be used as a filler material or it can be deposited.
- a solid residue obtained after leaching of copper from a copper-containing residue for organochlorosynthesis was agglomerated using a binder which, based on the weight of the agglomerates, consisted of 2% by weight of amorphous silica fume, 3% by weight of slaked lime, 2% by weight of an aqueous sugar solution and water in an amount of up to 17% by weight.
- Agglomerates having a composition as shown in Table 1 were melted in a smelting furnace equipped with a plasma burner.
- a start melt was established in the furnace comprising silicon and a slag consisting of about 55% by weight of CaO and about 45% by weight of SiO 2 .
- the solid residue was together with CaO and SiO 2 as slagforming material and Fe 2 O 3 as oxidation agent supplied to the slag bath.
- the purpose of the addition of Fe 2 O 3 was to consume free carbon in the solid residue by reduction of Fe 2 O 3 to Fe.
- the silicon-iron alloy can for example be used as an additive in steel and cast iron production or as a reduction agent in silicothermic production of metals and metal alloys.
- the off-gas from the smelting furnace was cleaned in a wet cleaning apparatus. From the wet cleaning apparatus a sludge consisting essentially of SiO 2 was recovered.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Abstract
The present invention relates to a method for upgrading silicon-containing solid residues obtained after leaching of copper from copper-containing residues from direct synthesis of organochlorosilanes. Solid residue, optionally together with an oxidation agent, is supplied to a smelting furnace where the residues are melted and form a molten metallic phase substantially containing silicon and a calcium silicate slag and tapping of the molten metallic phase and an inert slag from the smelting furnace.
Description
This application is a continuation of application Ser. No. 08/537,934 filed Oct. 26, 1995 now abandoned.
The present invention relates to a method for upgrading residues from methylchlorosilane synthesis, where silicon is reacted with methylchloride in the presence of a copper catalyst and residues from chlorosilanesynthesis, where silicon is reacted with hydrogenchloride.
Methylchlorosilane synthesis, also called direct synthesis, is carried out in fluidized bed reactors. During the process a part of fine particulate silicon and copper catalyst particles are together with metallic compounds, especially iron- and aluminium compounds, which are present in the silicon raw material, removed from the reactor together with the gaseous reaction products, a mixture of silanes, and unreacted methylchloride. The solid materials are separated from the mixture of silanes and unreacted methylchloride in separating devices such as for example cyclones. In addition a residue will remain in the reactor, comprising silicon, copper and metal halides formed from compounds in the silicon raw materials and also comprising carbon deposits formed by decomposition of methylchloride. This residue is continuously or intermittently removed from the reactor.
Elemental copper, copper oxides, copper formate, copper hydroxides and other copper salts like copper chloride are used as a copper catalyst. The copper catalyst may further contain metals or metal compounds as activators, such as zinc, and zinc compounds, or promotors such as antimony, cadmium, phosphorus, tin, arsenic etc. in order to improve the reactivity and the selectivity of the produced silanes.
These residues have up till now normally been deposited on waste disposal sites. However, as the residues normally contain 1-10% by weight of copper, mainly in elemental form, copper may be leached from the residue which represents a danger for pollution of ground water. It is therefore no longer acceptable to deposit this type of residue on disposal sites.
A number of methods for recovering copper from the above mentioned residues have been proposed. Thus from German patent No. 901889 it is known to treat residue from the reactor in water and diluted hydrochloric acid under addition of chlorine gas in order to leach copper as divalent copper chloride and remove the remaining solid residue from the solution whereafter divalent copper chloride in the leach solution is reduced to cuprous chloride which is crystallized and used as a copper catalyst in the direct synthesis. The remaining solid residue, which mainly contains silicon must, however, be deposited. In addition it is difficult to obtain a complete crystallization of cuprous chloride from the leach solution, making it necessary to subject the final solution to further treatment.
From DE-A1 3523541 it is known a method for treatment of a hydrolysis residue from organochlorosilane production, where the residue is oxidized by sodium hypochlorite in order to leach copper from the residue. After removal of the solids from the leach solution, an alkaline earth- or alkaline hydroxide or an alkaline carbonate are added in order to precipitate copper oxides, hydroxides or carbonates. Also in this process the undissolved solid material which mainly contains silicon, is deposited.
In U.S. Pat. No. 4,758,352 it is proposed to oxidize hydrolysis residue by using an oxygen containing gas. Also in this process only copper is recovered, while a silicon containing residue is deposited.
In DE-A 4205980 it is proposed to treat residue from direct synthesis by diluted sulphuric acid at elevated temperatures in order to dissolve copper and where copper can be precipitated as for example cuprous chloride or as copper-II-oxalat or where copper can be recovered by electrolysis. It is further disclosed in DE-A 4205980 that it is obtained a solid silicon residue which can be used in metallurgical processes or which can be deposited. Chemical analysis of the obtained silicon residue is, however, not given.
By all the above-mentioned processes the residues are subjected to a leaching process in order to dissolve and recover copper while the undissolved solid matter is normally deposited. This undissolved matter does, however, contain a substantial amount of silicon which is not recovered.
It is an object of the present invention to provide a method for upgrading silicon-containing solid residues obtained after leaching of copper from copper-containing residues from direct synthesis of organochlorosilanes, whereby a silicon-containing product can be recovered and whereby an inert slag can be produced and can be used as a filler material and can be deposited without restrictions. By an inert slag it is understood a material which satisfies the requirements set to an inert material in Review of Regulatory Situation on Waste at EC and OECD levels, published February 1993.
Accordingly, the present invention relates to a method for upgrading silicon-containing solid residues obtained after leaching of copper from copper-containing residues from direct synthesis of organochlorosilanes, said method being characterized in that the solid residue, optionally together with an oxidation agent, is supplied to a smelting furnace where the residues are melted and form a molten metallic phase substantially containing silicon and a calcium silicate slag and tapping of the molten metallic phase and an inert slag from the smelting furnace.
According to a preferred embodiment the residues are dried and agglomerated before they are supplied to the smelting furnace. The agglomeration is carried out by conventional methods such as for example pelletizing using a suitable binder. Alternatively the residues can be supplied to the smelting furnace in powder form by injection through a hollow electrode or by injection through a lance or through nozzles arranged in the furnace bottom or in the furnace body. When the residues are supplied through a hollow electrode or injected through lances or nozzles directly into the molten bath, the residues can either be in powder form or agglomerated form.
If necessary CaO, SiO2 or Al2 O3 are added as slag forming materials in order to produce a calcium silicate or a calcium aluminate silicate slag which is liquid at the temperature in the smelting furnace and is inert after solidification. The basicity of the slag defined for example as weight ratio CaO/SiO2 is preferably adjusted within the range of 0.5 to 3.0.
The smelting process may be carried out in plasma heated furnaces or in furnaces equipped with graphite- or carbon electrodes. The current supply can be direct current or alternate current. Both open, semi-closed or closed smelting furnaces can be used. The use of a closed smelting furnace gives, however, the best control of gas production. This may be an advantage as to the amount of gas and to avoid outlet of dioxine to the environment.
As the oxidizing agent a metal oxide or an oxygen containing gas can be used. The purpose of the supply of an oxidation agent is to oxidize any elemental carbon present in the residue.
According to a preferred embodiment, an iron oxide source is added as oxidation agent to the smelting furnace in an amount sufficient to oxidize elemental carbon present in the residue. In this case the molten metallic phase will, in addition to silicon and copper, contain iron which during the solidification of the metallic phase will form a FeSi2 intermetallic phase.
During the smelting of the residue some amorphous silica dust will be formed which will follow the off gas from the furnace. This silica dust can be recovered from the off gas in for example a bag house filter and can be used as a binder for producing agglomerates of the residue or it can be used as an additive in the production of concrete and mortar. Alternatively the gas can be cleaned by wet cleaning, whereby the amorphous silica can be recovered in the form of a liquid slurry.
By the method according to the present invention silicon or a silicon-iron alloy is obtained which can be used as an additive in the production of steel or cast iron or as a reduction agent in silicothermic production of metals or metal alloys. The inert slag can be used as a filler material or it can be deposited.
A solid residue obtained after leaching of copper from a copper-containing residue for organochlorosynthesis was agglomerated using a binder which, based on the weight of the agglomerates, consisted of 2% by weight of amorphous silica fume, 3% by weight of slaked lime, 2% by weight of an aqueous sugar solution and water in an amount of up to 17% by weight. Agglomerates having a composition as shown in Table 1 were melted in a smelting furnace equipped with a plasma burner.
TABLE 1 ______________________________________ Composition of agglomerated solid residue. Element Weight % ______________________________________ Fe 1.7 Zn 0.01 Cu 0.3 Mn 0.03 Cr 0.01 Ti 0.13 Ca 1.2 Al 0.33 Mg 0.02 C 4.8 Cl 1.13 Si 78.6 Remainder Oxygen ______________________________________
Before the solid residue was supplied to the smelting furnace, a start melt was established in the furnace comprising silicon and a slag consisting of about 55% by weight of CaO and about 45% by weight of SiO2.
The solid residue was together with CaO and SiO2 as slagforming material and Fe2 O3 as oxidation agent supplied to the slag bath. The purpose of the addition of Fe2 O3 was to consume free carbon in the solid residue by reduction of Fe2 O3 to Fe.
From the smelting furnace a silicon-iron alloy and a calcium silicate slag was tapped. The chemical analysis of the produced silicon-iron alloy is shown in Table 2. The silicon-iron alloy can for example be used as an additive in steel and cast iron production or as a reduction agent in silicothermic production of metals and metal alloys.
TABLE 2 ______________________________________ Composition of Si--Fe (Cu)-alloy. Element Weight % ______________________________________ Al 0.50 Ca 1.4 Ti 0.14 Fe 9.9 Cu 0.4 Si 86.0 O.sub.2 <1.0 ______________________________________
The off-gas from the smelting furnace was cleaned in a wet cleaning apparatus. From the wet cleaning apparatus a sludge consisting essentially of SiO2 was recovered.
The chemical analysis of the solidified calcium aluminate slag is shown in Table 3. This kind of slag fullfills the requirements set to an inert material stated in Review of Regulatory Situation on Waste at EC and OECD levels, published February 1993.
TABLE 3 ______________________________________ Composition of slag. Weight % ______________________________________ CaO 56.4 FeO 2.9 MgO <0.01 TiO.sub.2 0.04 MnO 0.03 ZnO 0.011 PbO <0.01 SiO.sub.2 39.5 Al.sub.2 O.sub.3 1.2 ______________________________________
Claims (8)
1. Method for upgrading a silicon and copper containing solid residue to obtain a silicon product comprising the steps of:
obtaining a solid residue from a direct synthesis of organochlorosilanes, said solid residue being a silicon and copper containing waste product from said synthesis;
leaching said residue to extract copper therefrom;
supplying the solid leached residue optionally together with an oxidation agent to a smelting furnace;
melting the residue and optional oxidizing agent to form a melt comprising a molten metallic phase substantially containing silicon and a slag phase comprising a calcium silicate slag; and
tapping the molten metallic phase and said slag phase from the smelting furnace, said slag phase being inert and said molten metallic phase being said silicon product.
2. Method according to claim 1 wherein the residue is dried and agglomerated before the residue is supplied to the furnace.
3. Method according to claim 1 wherein the residue is supplied to the smelting furnace in powder form by injection through a hollow electrode or by injection into the melt by means of a lance or through nozzles arranged in the smelting furnace.
4. Method according to claim 1 wherein at least one slag forming material selected from the group consisting of CaO, SiO2, and Al2 O3 is added to the furnace to produce a liquid slag.
5. Method according to claim 1 wherein said slag has a basicity defined as a weight ratio CaO/SiO2, and said basicity is adjusted within a range of 0.5 to 3.0.
6. Method according to claim 1 wherein said oxidizing agent is a metal oxide or an oxygen-containing gas.
7. Method according to claim 6 wherein said metal oxide is iron oxide.
8. Method according to claim 4 wherein the slag has a basicity defined as a weight ratio CaO/SiO2 and said basicity is adjusted within the range of 0.5 to 3.0.
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US08/859,819 US5772728A (en) | 1994-03-30 | 1997-05-19 | Method for upgrading of silicon-containing residues obtained after leaching of copper-containing residues from chlorosilane synthesis |
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NO941174A NO180189C (en) | 1994-03-30 | 1994-03-30 | Process for the preparation of silicon-rich, undissolved residues from leaching of copper-containing residues from organochlorosilane synthesis |
NO941174 | 1994-03-30 | ||
US53793495A | 1995-10-26 | 1995-10-26 | |
US08/859,819 US5772728A (en) | 1994-03-30 | 1997-05-19 | Method for upgrading of silicon-containing residues obtained after leaching of copper-containing residues from chlorosilane synthesis |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102008025263A1 (en) * | 2008-05-27 | 2009-12-03 | Rev Renewable Energy Ventures, Inc. | Purification of metallurgical silicon, comprises mixing halide containing the metallurgical silicon, melting the mixture, and sublimating the impurities and removing the impurities from the melt in the form of metal halides |
US9327987B2 (en) | 2008-08-01 | 2016-05-03 | Spawnt Private S.A.R.L. | Process for removing nonmetallic impurities from metallurgical silicon |
WO2022073579A1 (en) * | 2020-10-05 | 2022-04-14 | Wacker Chemie Ag | Process of producing technical silicon from silicon metal-containing material |
CN114892004A (en) * | 2022-04-19 | 2022-08-12 | 浙江特力再生资源股份有限公司 | Comprehensive recycling process of copper-containing silicon slag |
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