WO2022073579A1 - Process of producing technical silicon from silicon metal-containing material - Google Patents
Process of producing technical silicon from silicon metal-containing material Download PDFInfo
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- WO2022073579A1 WO2022073579A1 PCT/EP2020/077825 EP2020077825W WO2022073579A1 WO 2022073579 A1 WO2022073579 A1 WO 2022073579A1 EP 2020077825 W EP2020077825 W EP 2020077825W WO 2022073579 A1 WO2022073579 A1 WO 2022073579A1
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 102
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 82
- 239000010703 silicon Substances 0.000 title claims abstract description 81
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000000463 material Substances 0.000 title claims abstract description 32
- 239000002893 slag Substances 0.000 claims abstract description 48
- 239000008188 pellet Substances 0.000 claims abstract description 28
- 238000004519 manufacturing process Methods 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000007788 liquid Substances 0.000 claims abstract description 7
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims abstract description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 3
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 3
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 3
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 3
- 239000000843 powder Substances 0.000 claims description 13
- 239000002002 slurry Substances 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000003723 Smelting Methods 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 description 10
- 238000004064 recycling Methods 0.000 description 10
- 229910021422 solar-grade silicon Inorganic materials 0.000 description 7
- 239000002699 waste material Substances 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 238000005191 phase separation Methods 0.000 description 5
- 238000000926 separation method Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- 238000007711 solidification Methods 0.000 description 4
- 230000008023 solidification Effects 0.000 description 4
- 238000004876 x-ray fluorescence Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 238000013459 approach Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000005453 pelletization Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910018125 Al-Si Inorganic materials 0.000 description 2
- 229910018520 Al—Si Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 241000237074 Centris Species 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- 241000252095 Congridae Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910003930 SiCb Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001640 fractional crystallisation Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009689 gas atomisation Methods 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000007038 hydrochlorination reaction Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000009854 hydrometallurgy Methods 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000003913 materials processing Methods 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- -1 poly- Chemical compound 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
Definitions
- the present invention relates to a process of production of technical silicon from pellets of silicon metal-containing material and slag .
- Silicon of technical quality ( Si content ⁇ 99 . 9 wt-% , also known as technical silicon) is mainly used in silicon thermal processes , in metal extraction, as a deoxidi zer in steel production and serves as an alloying component in casting alloys of aluminium, copper, titanium and iron and as a starting material for chemical compounds .
- Kerf is the residual powder material obtained from the sawing slurry during the production of silicon wafers .
- it consists mostly of fine metallic silicon particles and a few impurities form the sawing process .
- a maj or portion of the silicon is wasted in the PV industry in the form of kerf slurry .
- kerf slurry Upon slicing the silicon wafers , a considerable portion of this highly valuable material is lost . Therefore , the recovery and recycling of high-purity silicon from kerf slurry waste will be of steadily increasing importance in the coming years .
- the kerf powder was successfully purified via directional solidification.
- the dissolved impurities are segregated from the solidifying melt via fractional crystallization. While this process is technically viable, it generates a low yield, as a significant section of the produced ingot will have a much higher concentration of impurities [Wang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW.
- impurities [Wang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW.
- thermal plasma process that has been developed by DeSousa et al. to recover silicon from the slurry waste. They suggested that the energetic characteristics of thermal plasma are unique for materials processing.
- plasma was generated with direct current arc-plasma torch by injecting argon and hydrogen mixture into an electrical arc. Slurry waste in form of powdered particles was injected into the plasma jet. The high temperature of the plasma jet then melts the input material, having the molten particles to settle in a graphite crucible. The end product upon cooling down is a solid silicon ingot [De Sousa M, Vardelle A, Mariaux G, Vardelle M, Michon U, Beudin V. Use of a thermal plasma process to recycle silicon kerf loss to solar-grade silicon feedstock.
- the slag treatment research found throughout literature were solely focused as a method to upgrade the metallurgical grade silicon (MG-Si) into solar grade silicon (SG-Si) , employing different slag compositions and process parameters.
- the main goal of such investigations was to remove phosphor and boron from the metallic silicon by oxidizing and entrap such elements in the slag phase [Meteleva-Fischer Y V., Yang Y, Boom R, Kraaijveld B, Kuntzel H. Slag Treatment Followed by Acid Leaching as a Route to Solar-Grade Silicon. JOM 2012;64:957-67. https : //doi .org/ 10.1007/sll 837-012-0383-4 ] .
- the present invention provides a process of production of technical silicon, wherein silicon metal-containing material comprising at least 50 wt-% of metallic silicon and slag comprising at least together 80 wt-% of AI2O3, CaO and SiO2 are mixed with water to give a mixture, the mixture is agglomerated into the form of wet pellets, the wet pellets are dried to give pellets, and the pellets are heated up to 1450 to 1800°C wherein the liquid technical silicon phase is separated from the slag phase . At the heating temperature, a phase separation occurs and the metallic silicon is separated from the slag phase. The result is the entrapment of all the non-metallic impurities in the slag phase, while the technical silicon phase remains cleaned and can be recovered.
- each pellet behaves like an individual reactor, providing an efficient and localized entrapment of the non-metallic impurities present in the silicon metal-containing material.
- the slag originated from the silicon production, particularly by reduction of silicon dioxide with carbon in a smelting reduction furnace.
- the use of slag as a purification media has been previously studied with the focus of upgrading the primary source of metallurgical grade silicon into solar grade silicon, as well as removing non-metallic impurities from silicon metal-containing material. In all these studies, an artificial slag was employed. No literature could be found on the use of the slag originated from the silicon production for the purpose of kerf recycling. This factor poses a great innovation from the environment and economic perspective, as it employs a wide-available and -recyclable source of slag.
- the ratio between slag and silicon metal-containing material is between 1:20 and 2:1, preferably between 1:10 and 1.5:1, in particular between 1:5 and 1.1:1 the pelleting of both materials also assures that the homogeneity of the mixture can be assured throughout the whole process .
- the silicon metal-containing material preferably comprises silicon residues which are preferably selected from byproducts or wastes of the silicon-producing or silicon-processing industries , examples being
- classi fying processes are , for example , sieving and/or si fting;
- the material in question here may be neutrali zed catalyst material from chlorosilane reactors before and/or after recovery of Cu; more particularly from the processes of Muller-Rochow direct synthesis , hydrochlorination or low-temperature conversion for the production of silanes .
- the silicon metal-containing material preferably comprises at least 80 wt-% , more preferably at least 90 wt-% , in particular at least 95 wt-% of metallic silicon .
- the silicon metalcontaining material is kerf as defined above, with a metallic silicon concentration of at least 95 wt.%, preferably 98 wt . % .
- the metallic silicon preferably has an Si content of at least 98% by mass, preferably at least 99% by mass, in particular at least 99.9% by mass.
- a XRF (X-Ray fluorescence) analysis shows that, preferably, the slag comprises at least together 90 wt-%, more preferably at least together 95 wt-%, in particular at least together 99 wt-% of A1 2 O 3 , CaO and SiC>2.
- the slag can comprise elements selected from Mg, Fe and Ba, each at least most 10 wt- % , preferably at most 5 wt-%, in particular at most 1 wt-%.
- the slag preferably comprises at most 1 wt-%, more preferably at most 0.1 wt-%, of halogen.
- the slag preferably comprises at most 0.05 wt-%, more preferably at most 0.01 wt-%, of F.
- the slag preferably is grinded before mixing with the silicon metal-containing material.
- the slag is grinded to a grain size of at most 0.5 mm, more preferably at most 0.3 mm, in particular at most 0.1 mm.
- the silicon metal-containing material is also grinded.
- the silicon metal-containing material is grinded to a grain size of at most 0.5 mm, more preferably at most 0.3 mm, in particular at most 0.1 mm.
- the silicon metal-containing material and slag preferably are mixed and afterwards the dry mixture is mixed with water.
- the ratio between dry mixture and water is between 15:1 and 2:1, preferably between 10:1 and 5:1.
- water is used as main binder medium.
- the resulting mixture is agglomerated to give wet pellets, preferably by using pelletizing plates or pressed into briquettes .
- surface activating substances such as Na2O/NaOH or K2O/KOH can be also employed to increase the mechanical resistance and formability of the agglomerates to give wet pellets. Later, the wet pellets are dried at air or at 100 to 300°C, preferably at 120 to 250°C.
- the average size of the pellets is 0.1 to 3 cm, more preferably 0.5 to 2 cm.
- the dried pellets are then preferably charged in a crucible and preferably heated in a furnace, in particular inductively heated, more preferably in a middle-frequency induction heating furnace.
- the crucible used can be made of graphite or any other material which withstands the high temperatures involved in the process, while having no significant reaction with the melt.
- the pellets are preferably heated to a temperature from 1600°C to 1780°C, more preferably 1700°C to 1760°C.
- the temperature can be measured near the crucible wall by a thermocouple type B (Platinum Rhodium - 30% / Platinum Rhodium - 6%) or any other thermocouple suitable for the temperature range employed.
- the heating preferably is conducted in a closed system with low amount of oxygen. This can be obtained by the pre-consumption of the available oxygen by the oxidation of the initially charged pellets, or by replacing the furnace atmosphere with inert gas, preferably Argon. Alternatively, the process can be run in an open atmosphere when a molten slag layer is present at the surface of the melt . This slag acts then as a protective medium against the oxidation of the silicon . For that , an amount of slag should be first pre-melted with the subsequent addition of the pellets .
- pellets Due to the heating the pellets are trans formed into a mixture of liquid technical silicon phase and slag phase .
- the molten mixture of silicon and slag is then preferably kept at the target process temperature for a period of at least 15 minutes , more preferably of at least 20 minutes , to ensure a proper phase separation between the slag and the liquid technical silicon phases .
- This separation can be improved by applying a forced convection in the melt .
- This convection can be a product of the inductively heating system, mechanical agitation, or gas formation and/or purging .
- the technical silicon phase can be removed from the melt by means of mechanically removal or by separately pouring the melted slag and silicon phase in di f ferent recipients .
- the mechanical removal preferably takes place in such a way that the Si is frozen on a cooling element or skimmed of f the liquid .
- the slag and technical silicon phase layers order can be influenced by changing the slag density . This can be controlled by adj usting the content of SiC>2 in the slag .
- SiC>2 When a higher amount of SiC>2 is present in the slag ( or arti ficially added) , its density is decreased and will tend to float over the silicon melt .
- This slag configuration will act as a protective layer and is suitable for the application in an open system .
- the preferably way of separating the both phases is by means of mechanical removal or by pouring the top silicon layer. Since this configuration exposes the molten technical silicon to the furnace atmosphere, it is recommended that there is a very low amount of oxygen available in the atmosphere to prevent the losses of silicon via oxidation.
- the produced technical silicon preferably has a Si content of at least 90 wt-%, more preferably at least 95 wt-%, in particular at least 98 wt-%.
- All steps of the process preferably are carried out at atmospheric pressure. If not otherwise described, all temperatures are 20°C.
- the mixture was pelletized using 39,8 wt . % of water as binder medium.
- the pelletizing took place in a pelletizing disc of 500 mm diameter rotating at 25RPM with a 50° inclination angle. The results were pellets with 1 cm in size.
- the pellets were then charged in a graphite crucible place in a closed middle frequency (8 KHz) induction furnace with an atmosphere consisting of 800 mbar Argon and no oxygen present. The charge was then heated up to 1750°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. Upon cooling, the crucible was sectioned and the phase separation was revealed. The silicon fraction was analyzed via XRF (X-ray fluorescence) and a purity of 98.3 wt-% was obtained.
- XRF X-ray fluorescence
- Example 2 Using the same slag powder from Example 1, a mixture with kerf powder using a proportion 1:1 was pelletized using 30,0 wt . % of water as binder, performed similarly as Example 1. The pellets were charged and heated in a middle frequency (8 KHz) induction furnace at 1650°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. The result was a phase separation, where the silicon fraction obtained had a purity of 98.9%.
- a middle frequency (8 KHz) induction furnace at 1650°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min.
- the result was a phase separation, where the silicon fraction obtained had a purity of 98.9%.
- Example 2 Using the same slag powder from Example 1, a mixture with kerf powder using a proportion 1:1 was pelletized using 30,0 wt . % of water as binder, performed similarly as Example 1. The pellets were charged and heated in a middle frequency (8 KHz) induction furnace at 1750°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. The result was a phase separation, where the silicon fraction obtained had a purity of 97.8%.
- a middle frequency (8 KHz) induction furnace at 1750°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min.
- the result was a phase separation, where the silicon fraction obtained had a purity of 97.8%.
Abstract
The present invention provides a process of production of technical silicon, wherein silicon metal-containing material comprising at least 50 wt-% of metallic silicon and slag comprising at least together 80 wt-% of Al2O3, CaO and SiO2 are mixed with water to give a mixture, the mixture is agglomerated into the form of wet pellets, the wet pellets are dried to give pellets, and the pellets are heated up from 1450 to 1800°C wherein the liquid technical silicon phase is separated from the slag phase.
Description
Process of producing technical silicon from silicon metalcontaining material
The present invention relates to a process of production of technical silicon from pellets of silicon metal-containing material and slag .
Silicon of technical quality ( Si content <99 . 9 wt-% , also known as technical silicon) is mainly used in silicon thermal processes , in metal extraction, as a deoxidi zer in steel production and serves as an alloying component in casting alloys of aluminium, copper, titanium and iron and as a starting material for chemical compounds .
Kerf is the residual powder material obtained from the sawing slurry during the production of silicon wafers . Preferably it consists mostly of fine metallic silicon particles and a few impurities form the sawing process . A maj or portion of the silicon is wasted in the PV industry in the form of kerf slurry . Upon slicing the silicon wafers , a considerable portion of this highly valuable material is lost . Therefore , the recovery and recycling of high-purity silicon from kerf slurry waste will be of steadily increasing importance in the coming years .
Several researches have been done about kerf recycling . Despite some of them being technically success ful , most of them lacks the economic feasibility needed the large-scale industrial process of such valuable residue .
The exact route to handle raw silicon kerf slurry varies a lot . Often it starts with removal of polyethylene glycol using acetone , removal of Fe particles via acid dissolution, physical removal of most non-metallic impurities i . e . SiC by density
separation using a heavy liquid with density value between Si and the non-metallic particle (e.g. sodium polytungstate in water) . Finally, the residual product is a powder (kerf) consisting mostly of Si and a few residual impurities. Throughout the literature, kerf recycling was investigated for the fields of directional solidification [Wang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW. A novel approach for recycling of kerf loss silicon from cutting slurry waste for solar cell applications. J Cryst Growth 2008;310:3403-6. https://doi.Org/10.1016/j .j crysgro .2008.04.031] , hydrometallurgy [Huang K, Deng H, Li J, Zhu H. Separation of Si/SiC Wiresaw Cutting Powder Through Sedimentation by Adjusting the Solution pHs . EPD Congr . 2012, Hoboken, NJ, USA: John Wiley & Sons, Inc.; 2012, p. 297-304. https://doi.org/10.1002/9781118359341.ch34] , high temperature plasma melting [Wang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW. A novel approach for recycling of kerf loss silicon from cutting slurry waste for solar cell applications. J Cryst Growth 2008;310:3403-6. https://doi.Org/10.1016/j .jcrysgro.2008.04.031] and [De Sousa M, Vardelle A, Mariaux G, Vardelle M, Michon U, Beudin V. Use of a thermal plasma process to recycle silicon kerf loss to solar-grade silicon feedstock. Sep Purif Technol 2016; 161 : 187- 92. https://doi.Org/10.1016/j . seppur .2016.02.005] , centrifugation separation [Li JW, Guo ZC, Tang HQ, Wang Z, Sun ST. Si purification by solidification of Al-Si melt with super gravity. Trans Nonferrous Met Soc China (English Ed
2012;22:958-63. https://doi.org/10.1016/S1003-6326 dl) 61270-3] , as well as slag treatment.
The kerf powder was successfully purified via directional solidification. In this process, the dissolved impurities are segregated from the solidifying melt via fractional crystallization. While this process is technically viable, it
generates a low yield, as a significant section of the produced ingot will have a much higher concentration of impurities [Wang TY, Lin YC, Tai CY, Sivakumar R, Rai DK, Lan CW. A novel approach for recycling of kerf loss silicon from cutting slurry waste for solar cell applications. J Cryst Growth 2008;310:3403-6. https://doi.Org/10.1016/j .j crysgro .2008.04.031] .
When recycling kerf slurry originated from the diamond sawing process, the most important metallic contaminants are the nickel and iron deriving from the abrasion with the outer layer of the diamond-embedded wire. After chemical treatment, usually with HNO3 and HC1, the total metal impurities are drastically reduced. Higher purity levels can be achieved by performing a deeper chemical etching which removes a thicker layer of silicon surface, thus directly impacting the silicon recycling yield [Lombardi I, Fragiacomo G, Zehetmeier C, Rohr C, Gaumann B, Ktinzli A. High yield recycling process of silicon kerf from diamond wire watering. 24th Eur Photovolt Sol Energy Conf Hamburg, Ger 2009:1256-8] .
A thermal plasma process that has been developed by DeSousa et al. to recover silicon from the slurry waste. They suggested that the energetic characteristics of thermal plasma are unique for materials processing. In their study, plasma was generated with direct current arc-plasma torch by injecting argon and hydrogen mixture into an electrical arc. Slurry waste in form of powdered particles was injected into the plasma jet. The high temperature of the plasma jet then melts the input material, having the molten particles to settle in a graphite crucible. The end product upon cooling down is a solid silicon ingot [De Sousa M, Vardelle A, Mariaux G, Vardelle M, Michon U, Beudin V. Use of a thermal plasma process to recycle silicon kerf loss to solar-grade silicon feedstock. Sep Purif Technol 2016;161:187-92. https://doi.Org/10.1016/j . seppur .2016.02.005 ] .
In the centrifugation separation method, the kerf is initially dissolved in aluminum, which acts as solvent trapping most of the metallic impurities. Upon reaching supersaturation, the formed primary Si crystals can be recovered by super gravity. The separated silicon obtained goes then to an acid leaching process for the removal of residual aluminum contamination [Li JW, Guo ZC, Tang HQ, Wang Z, Sun ST. Si purification by solidification of Al-Si melt with super gravity. Trans Nonferrous Met Soc China (English Ed 2012;22:958-63. https : //doi . org/ 10.1016/S1003- 6326 ( 11 ) 61270-3 ] . Similar process has been used in industrial scale for the upgrade of MG-Si into SoG-Si .
The slag treatment research found throughout literature were solely focused as a method to upgrade the metallurgical grade silicon (MG-Si) into solar grade silicon (SG-Si) , employing different slag compositions and process parameters. The main goal of such investigations was to remove phosphor and boron from the metallic silicon by oxidizing and entrap such elements in the slag phase [Meteleva-Fischer Y V., Yang Y, Boom R, Kraaijveld B, Kuntzel H. Slag Treatment Followed by Acid Leaching as a Route to Solar-Grade Silicon. JOM 2012;64:957-67. https : //doi .org/ 10.1007/sll 837-012-0383-4 ] .
The present invention provides a process of production of technical silicon, wherein silicon metal-containing material comprising at least 50 wt-% of metallic silicon and slag comprising at least together 80 wt-% of AI2O3, CaO and SiO2 are mixed with water to give a mixture, the mixture is agglomerated into the form of wet pellets, the wet pellets are dried to give pellets, and the pellets are heated up to 1450 to 1800°C wherein the liquid technical silicon phase is separated from the slag phase .
At the heating temperature, a phase separation occurs and the metallic silicon is separated from the slag phase. The result is the entrapment of all the non-metallic impurities in the slag phase, while the technical silicon phase remains cleaned and can be recovered.
Since both silicon metal-containing material and slag are pelletized together, the agglomeration of the powder materials decreases the losses due to their high surface area. It also improves the storage and transport of these materials in the plant. Moreover, during the melting phase, each pellet behaves like an individual reactor, providing an efficient and localized entrapment of the non-metallic impurities present in the silicon metal-containing material.
Preferably used is the slag originated from the silicon production, particularly by reduction of silicon dioxide with carbon in a smelting reduction furnace. The use of slag as a purification media has been previously studied with the focus of upgrading the primary source of metallurgical grade silicon into solar grade silicon, as well as removing non-metallic impurities from silicon metal-containing material. In all these studies, an artificial slag was employed. No literature could be found on the use of the slag originated from the silicon production for the purpose of kerf recycling. This factor poses a great innovation from the environment and economic perspective, as it employs a wide-available and -recyclable source of slag.
If the ratio between slag and silicon metal-containing material is between 1:20 and 2:1, preferably between 1:10 and 1.5:1, in particular between 1:5 and 1.1:1 the pelleting of both
materials also assures that the homogeneity of the mixture can be assured throughout the whole process .
The silicon metal-containing material preferably comprises silicon residues which are preferably selected from byproducts or wastes of the silicon-producing or silicon-processing industries , examples being
- those arising in the production or the mechanical processing of silicon, such as poly- , multi- or monocrystalline silicon;
- those arising in the production of granulated silicon metal in, for example , fluidi zed bed, centri fugal , gas atomi zation or water granulation processes ;
- those arising in the production of technical-grade silicon by means of carbothermic reduction of SiCb ;
- those arising in the course of mechanical processing and optionally of one or more classi fying processes of technical- grade silicon . The mechanical processing may more particularly be crushing and/or grinding . Typical classi fying processes are , for example , sieving and/or si fting;
- those arising in the production of silanes . For example , the material in question here may be neutrali zed catalyst material from chlorosilane reactors before and/or after recovery of Cu; more particularly from the processes of Muller-Rochow direct synthesis , hydrochlorination or low-temperature conversion for the production of silanes .
There is normally no need for these silicon residues to be puri fied before being used in the method of the invention; that is , the silicon-containing materials can be used without further puri fication steps .
The silicon metal-containing material preferably comprises at least 80 wt-% , more preferably at least 90 wt-% , in particular at least 95 wt-% of metallic silicon .
According to a preferred embodiment, the silicon metalcontaining material is kerf as defined above, with a metallic silicon concentration of at least 95 wt.%, preferably 98 wt . % .
The metallic silicon preferably has an Si content of at least 98% by mass, preferably at least 99% by mass, in particular at least 99.9% by mass.
A XRF (X-Ray fluorescence) analysis shows that, preferably, the slag comprises at least together 90 wt-%, more preferably at least together 95 wt-%, in particular at least together 99 wt-% of A12O3, CaO and SiC>2.
Besides the elements Ca, Si, Al and 0 the slag can comprise elements selected from Mg, Fe and Ba, each at least most 10 wt- % , preferably at most 5 wt-%, in particular at most 1 wt-%.
The slag preferably comprises at most 1 wt-%, more preferably at most 0.1 wt-%, of halogen.
The slag preferably comprises at most 0.05 wt-%, more preferably at most 0.01 wt-%, of F.
The slag preferably is grinded before mixing with the silicon metal-containing material. Preferably the slag is grinded to a grain size of at most 0.5 mm, more preferably at most 0.3 mm, in particular at most 0.1 mm.
If necessary, the silicon metal-containing material is also grinded. Preferably the silicon metal-containing material is grinded to a grain size of at most 0.5 mm, more preferably at most 0.3 mm, in particular at most 0.1 mm.
Kerf has not to be grinded.
The silicon metal-containing material and slag preferably are
mixed and afterwards the dry mixture is mixed with water. Preferably the ratio between dry mixture and water is between 15:1 and 2:1, preferably between 10:1 and 5:1.
At this stage, water is used as main binder medium. The resulting mixture is agglomerated to give wet pellets, preferably by using pelletizing plates or pressed into briquettes .
The usage of surface activating substances such as Na2O/NaOH or K2O/KOH can be also employed to increase the mechanical resistance and formability of the agglomerates to give wet pellets. Later, the wet pellets are dried at air or at 100 to 300°C, preferably at 120 to 250°C.
Preferably, the average size of the pellets is 0.1 to 3 cm, more preferably 0.5 to 2 cm.
The dried pellets are then preferably charged in a crucible and preferably heated in a furnace, in particular inductively heated, more preferably in a middle-frequency induction heating furnace. The crucible used can be made of graphite or any other material which withstands the high temperatures involved in the process, while having no significant reaction with the melt. The pellets are preferably heated to a temperature from 1600°C to 1780°C, more preferably 1700°C to 1760°C. The temperature can be measured near the crucible wall by a thermocouple type B (Platinum Rhodium - 30% / Platinum Rhodium - 6%) or any other thermocouple suitable for the temperature range employed.
The heating preferably is conducted in a closed system with low amount of oxygen. This can be obtained by the pre-consumption of the available oxygen by the oxidation of the initially charged pellets, or by replacing the furnace atmosphere with inert gas, preferably Argon. Alternatively, the process can be
run in an open atmosphere when a molten slag layer is present at the surface of the melt . This slag acts then as a protective medium against the oxidation of the silicon . For that , an amount of slag should be first pre-melted with the subsequent addition of the pellets .
Due to the heating the pellets are trans formed into a mixture of liquid technical silicon phase and slag phase .
The molten mixture of silicon and slag is then preferably kept at the target process temperature for a period of at least 15 minutes , more preferably of at least 20 minutes , to ensure a proper phase separation between the slag and the liquid technical silicon phases . This separation can be improved by applying a forced convection in the melt . This convection can be a product of the inductively heating system, mechanical agitation, or gas formation and/or purging .
The technical silicon phase can be removed from the melt by means of mechanically removal or by separately pouring the melted slag and silicon phase in di f ferent recipients . The mechanical removal preferably takes place in such a way that the Si is frozen on a cooling element or skimmed of f the liquid .
The slag and technical silicon phase layers order can be influenced by changing the slag density . This can be controlled by adj usting the content of SiC>2 in the slag . When a higher amount of SiC>2 is present in the slag ( or arti ficially added) , its density is decreased and will tend to float over the silicon melt . This slag configuration will act as a protective layer and is suitable for the application in an open system . In the case of the slag having higher density than the technical
silicon melt i.e. lower SiC>2 content, the preferably way of separating the both phases is by means of mechanical removal or by pouring the top silicon layer. Since this configuration exposes the molten technical silicon to the furnace atmosphere, it is recommended that there is a very low amount of oxygen available in the atmosphere to prevent the losses of silicon via oxidation.
The produced technical silicon preferably has a Si content of at least 90 wt-%, more preferably at least 95 wt-%, in particular at least 98 wt-%.
All steps of the process preferably are carried out at atmospheric pressure. If not otherwise described, all temperatures are 20°C.
Examples
Example 1
A slag originated from the primary silicon production by reduction of silicon dioxide with carbon in a smelting reduction furnace with the composition of 17 wt-% AI2O3, 55 wt-% SiC>2, and 28 wt-% CaO was grounded into powder using a vibrating-disc mill for ca. 60 seconds, obtaining at the end a powder with a maximum 0.3 mm, which is then mixed with Kerf powder having a silicon metal content of 95 wt-% at a weight ratio of 1:3 (25 wt-% of slag and 75 wt-% of kerf) . The mixture was pelletized using 39,8 wt . % of water as binder medium. The pelletizing took place in a pelletizing disc of 500 mm diameter rotating at 25RPM with a 50° inclination angle. The results were pellets with 1 cm in size.
The pellets were then charged in a graphite crucible place in a closed middle frequency (8 KHz) induction furnace with an
atmosphere consisting of 800 mbar Argon and no oxygen present. The charge was then heated up to 1750°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. Upon cooling, the crucible was sectioned and the phase separation was revealed. The silicon fraction was analyzed via XRF (X-ray fluorescence) and a purity of 98.3 wt-% was obtained.
Example 2
Using the same slag powder from Example 1, a mixture with kerf powder using a proportion 1:1 was pelletized using 30,0 wt . % of water as binder, performed similarly as Example 1. The pellets were charged and heated in a middle frequency (8 KHz) induction furnace at 1650°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. The result was a phase separation, where the silicon fraction obtained had a purity of 98.9%.
Example 3
Using the same slag powder from Example 1, a mixture with kerf powder using a proportion 1:1 was pelletized using 30,0 wt . % of water as binder, performed similarly as Example 1. The pellets were charged and heated in a middle frequency (8 KHz) induction furnace at 1750°C (measured at crucible wall with a Type B thermocouple) and kept for 30 min. The result was a phase separation, where the silicon fraction obtained had a purity of 97.8%.
Claims
1 . A process of production of technical silicon, wherein silicon metal-containing material comprising at least 50 wt-% of metallic silicon and slag comprising at least together 80 wt-% of AI2O3, CaO and SiO2 are mixed with water to give a mixture , the mixture is agglomerated into the form of wet pellets , the wet pellets are dried to give pellets , and the pellets are heated up from 1450 to 1800 ° C wherein the liquid technical silicon phase is separated from the slag phase .
2 . The process of production of technical silicon according to Claim 1 , wherein the slag is originated from the silicon production by reduction of silicon dioxide with carbon in a smelting reduction furnace .
3 . The process of production of technical silicon according to anyone of the preceding claims , wherein the ratio between slag and silicon metal-containing material is between 1 : 20 and 2 : 1 .
4 . The process of production of technical silicon according to anyone of the preceding claims , wherein the silicon metalcontaining material preferably comprises at least 80 wt-% of metallic silicon .
5 . The process of production of technical silicon according to anyone of the preceding claims , wherein the silicon metalcontaining material is kerf , which is the residual powder material obtained from the sawing slurry during the production of silicon wafers .
6. The process of production of technical silicon according to anyone of the preceding claims, wherein the slag is grinded to a grain size of at most 0.5 mm before it is mixed with silicon metal-containing material and water.
7. The process of production of technical silicon according to anyone of the preceding claims, wherein the average size of the pellets is 0.1 to 3 cm.
8. The process of production of technical silicon according to anyone of the preceding claims, wherein the heating is carried out under an inert gas atmosphere.
9. The process of production of technical silicon according to anyone of the preceding claims, wherein the molten mixture of silicon and slag is kept at the target process temperature for a period of at least 15 minutes.
10. The process of production of technical silicon according to anyone of the preceding claims, wherein the produced technical silicon has a Si content of at least 95 wt-%.
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