US5225681A - Gas-filled uv spectrometer - Google Patents

Gas-filled uv spectrometer Download PDF

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Publication number
US5225681A
US5225681A US07/863,561 US86356192A US5225681A US 5225681 A US5225681 A US 5225681A US 86356192 A US86356192 A US 86356192A US 5225681 A US5225681 A US 5225681A
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gas
vessel
spectrometer
pressure
spectrometer according
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US07/863,561
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Heinz Falk
Ludger Thissen
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Spectro Analytical Instruments GmbH and Co KG
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Spectro Analytical Instruments GmbH and Co KG
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Assigned to SPECTRO ANALYTICAL INSTRUMENTS GESELLSCHAFT FUR ANALYTISCHE MESSGERATE MBH reassignment SPECTRO ANALYTICAL INSTRUMENTS GESELLSCHAFT FUR ANALYTISCHE MESSGERATE MBH ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: THISSEN, LUDGER, FALK, HEINZ
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • G01J3/0286—Constructional arrangements for compensating for fluctuations caused by temperature, humidity or pressure, or using cooling or temperature stabilization of parts of the device; Controlling the atmosphere inside a spectrometer, e.g. vacuum
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
    • G01N2021/335—Vacuum UV
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path

Definitions

  • the invention relates to an UV spectrometer for the measurement of spectral intensities in the wavelength range below 190 nm.
  • the UV spectrometer of this invention is equipped with a gas flushing apparatus fitted with a system for minimizing gas consumption.
  • the apparatus is also constructed to prevent the formation of absorbing deposits on optical windows, more particularly on the radiation inlet side, and maintain the partial pressure of absorbing residual gas components at a negligible level. Furthermore, the apparatus according to the invention achieves stable measuring results over a long period of time.
  • spectrometers in vacuum vessels are operated with a residual gas pressure below 1 Pa mbar.
  • Devices for maintaining low pressure within conventional spectrometers are normally quite expensive.
  • UV-transparent flushing gases are used instead of evacuating the spectrometer to pressures in the range below 10 Pa.
  • the known systems of gas flushing are based on a relatively high gas flow in the range of 30-300 1/h (U.S. Pat. No. 4,322,165), the gas used requiring a very high degree of purity. Similar flow systems with a gas consumption of 5-10 1/h are known from the published literature. for instance, see T. Nakahara and T. Wasa, Applied Spectroscopy, Vol. 41, 1238, 1978; and T. Nakahara, Spectrochim. Acta, Vol. 40B, 293, 1985.
  • This problem is solved according to the invention through inclusion of a sorption means that can bind residual gases absorbing the measuring radiation in the spectrometer.
  • the spectrometer disposed in a gas-tight vessel, is operated at constant gas pressure, which is preferably around 1K Pa above the external pressure. Sorption substances are used to bind residual gases occurring which absorb the radiation to be measured.
  • the sorption substances can be introduced into the spectrometer vessel; alternatively, the filling gas can be circulated via a circulating pump and a flow-sorption cell incorporated in the pump circuit.
  • the sorption means used can be cells based on chemical sorption, adsorption or electrochemical reactions.
  • the flushing gas pressure can be kept constant in the spectrometer vessel within narrow limits by the use of a pressure regulating system comprising a pressure gauge, an electronic control system, an electrically operated valve and a storage vessel. This makes it impossible for the state of adjustment of the spectrometer to be affected by the external air pressure or by possible changes in pressure due to temperature fluctuations.
  • the pressure regulating system reduces the gas consumption of the instrument to very low values so that, for example, a quantity of gas less than 50 l per annum at STP is adequate for the operation of the spectrometer.
  • the apparatus can therefore be regarded as practically autonomous as regards replacement of the flushing gas.
  • FIGURE is a highly schematic representation of the spectrometer illustrating the various functional elements.
  • FIG. 1 shows an embodiment of the apparatus according to the invention, with gas pressure regulation and a gas refilling device, and a UV polychromator.
  • the optical system of the apparatus is disposed in a gas-tight vessel.
  • the system includes an inlet pipe (1), an imaging lens (2) acting as an entrance window, an entrance slit (3), a diffraction grating (4), an exit slit (5) and a radiation receiver (6).
  • Evacuation of gas from the system occurs via a gas pipe (8) by means of a membrane pump (9) with a flow valve (11a) opened.
  • a purification cell (12) is closed by the closure of flow valves (11b+11c).
  • a flow valve (13) is also closed.
  • the spectrometer vessel (7) When a sufficiently low residual gas pressure has been reached, with the pump switched off, the spectrometer vessel (7) is filled with gas from a supply tank (15) by the opening of the valve (13). The pumping-out and subsequent filling of the spectrometer vessel can be repeated, to obtain a low partial pressure of residual gas components.
  • filling is performed after venting of the spectrometer vessel (7) by repeated partial evacuation by means of the circulating pump (9) followed by filling with gas and the removal of the residual gas via the purification cell (12).
  • the valve (13) is opened and by means of a pressure gauge (20) via an electronic control device (19) the pressure is measured until the required pressure is reached.
  • the filling gas is circulated by means of the pump (9) and the flow position of a three-way valve (10) is oriented in the direction of the purification cell (12).
  • the pump (9) remains switched on, so that desorbed residual gas components are removed by means of the purification cell (12).
  • the purification cell (12) can contain, for example, copper oxide on a silica gel support and suitable molecular sieve absorbers as granulates.
  • Temperature changes in the spectrometer vessel lead to an increase in pressure in the system, possibly resulting in changes in the state of adjustment of the spectrometer.
  • the pressure in the spectrometer vessel is therefore maintained below a preselected limit by the three-way valve (10) being opened in the direction of a storage tank (17) when the pressure rises. This position of the three-way valve (10) is maintained until the resulting gas surplus has been pumped into the storage tank (17). Thereafter a changeover back to gas circulating operation is made by changing over the three-way valve (10).
  • a flow resistance (14) ensures against abrupt pressure changes.
  • the flushing gases used can be nitrogen, argon or helium, in dependence on the required spectral range.
  • FIG. 1 can be simplified when the properties of the spectrometer do not require pressure regulation. In that case use is made of merely a circulating pump and a purification device in the outer gas circuit.

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Optical Measuring Cells (AREA)
  • Spectrometry And Color Measurement (AREA)

Abstract

A UV spectrometer for measurement of spectral intensities over a wavelength range below 190 nm is provided and includes a gas-tight spectrometer vessel, an optical window within the vessel and a UV transparent filling gas inside the vessel. The spectrometer is fitted with a sorption mechanism for binding residual gases that absorbs measuring radiation thereby maintaining the UV transparency of the gas.

Description

BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to an UV spectrometer for the measurement of spectral intensities in the wavelength range below 190 nm.
2. The Related Art
The UV spectrometer of this invention is equipped with a gas flushing apparatus fitted with a system for minimizing gas consumption. The apparatus is also constructed to prevent the formation of absorbing deposits on optical windows, more particularly on the radiation inlet side, and maintain the partial pressure of absorbing residual gas components at a negligible level. Furthermore, the apparatus according to the invention achieves stable measuring results over a long period of time.
Due to the optical absorption of radiation in the wavelength range below 190 nm by components of the air, spectrometers in vacuum vessels are operated with a residual gas pressure below 1 Pa mbar. Devices for maintaining low pressure within conventional spectrometers are normally quite expensive.
For the spectral range of the so-called vacuum UV, of course, UV-transparent flushing gases are used instead of evacuating the spectrometer to pressures in the range below 10 Pa. The known systems of gas flushing are based on a relatively high gas flow in the range of 30-300 1/h (U.S. Pat. No. 4,322,165), the gas used requiring a very high degree of purity. Similar flow systems with a gas consumption of 5-10 1/h are known from the published literature. for instance, see T. Nakahara and T. Wasa, Applied Spectroscopy, Vol. 41, 1238, 1978; and T. Nakahara, Spectrochim. Acta, Vol. 40B, 293, 1985.
High gas flows are needed to keep residual gases, that arise from desorption and leakage, at a low enough partial pressure. Voluminous pressure gas flasks for flushing renders difficult the practical handling of the apparatuses and is very expensive.
In prior art vacuum spectrometers, dissociation of residual gases contained in the spectrometer vessel has led to formation of absorbing deposits on UV-radiated optical windows and other optical surfaces. As a result, the stability of spectrometric measurements is limited and very expensive maintenance is required. An additional disadvantage of those vacuum spectrometers is the cost of the relatively technologically sophisticated mechanisms required to be built into the instruments to obtain the necessary medium-high vacuum.
Known gas-flushed spectrometers have a relatively high gas consumption of 50-100N m3 per annum at STP and their state of adjustment depends on the external air pressure.
SUMMARY OF THE INVENTION
It is an object of the invention to provide an UV spectrometer in which a constant density of an UV-transparent gas is maintained with minimum gas consumption.
This problem is solved according to the invention through inclusion of a sorption means that can bind residual gases absorbing the measuring radiation in the spectrometer.
The spectrometer, disposed in a gas-tight vessel, is operated at constant gas pressure, which is preferably around 1K Pa above the external pressure. Sorption substances are used to bind residual gases occurring which absorb the radiation to be measured. The sorption substances can be introduced into the spectrometer vessel; alternatively, the filling gas can be circulated via a circulating pump and a flow-sorption cell incorporated in the pump circuit. The sorption means used can be cells based on chemical sorption, adsorption or electrochemical reactions. The flushing gas pressure can be kept constant in the spectrometer vessel within narrow limits by the use of a pressure regulating system comprising a pressure gauge, an electronic control system, an electrically operated valve and a storage vessel. This makes it impossible for the state of adjustment of the spectrometer to be affected by the external air pressure or by possible changes in pressure due to temperature fluctuations.
Since all the components of the spectrometer during operation are at atmospheric pressure, there is minimal degassing resulting in the dirtying of optical components. The excess pressure in the spectrometer vessel ensures that leakages cannot lead to the penetration into the system of optically absorbing components of the surrounding atmosphere. The pressure regulating system according to the invention reduces the gas consumption of the instrument to very low values so that, for example, a quantity of gas less than 50 l per annum at STP is adequate for the operation of the spectrometer. The apparatus can therefore be regarded as practically autonomous as regards replacement of the flushing gas.
Repeated passage of the flushing gas through the purification cell leads to a substantial degassing of the surface and incorporated parts inside the vacuum vessel. Maximum optical transmission can therefore be achieved even in the range below 180 nm.
BRIEF DESCRIPTION OF THE DRAWING
An embodiment of the invention will now be described in greater detail with reference to the drawing constituted of a sole FIGURE which is a highly schematic representation of the spectrometer illustrating the various functional elements.
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows an embodiment of the apparatus according to the invention, with gas pressure regulation and a gas refilling device, and a UV polychromator. The optical system of the apparatus is disposed in a gas-tight vessel. The system includes an inlet pipe (1), an imaging lens (2) acting as an entrance window, an entrance slit (3), a diffraction grating (4), an exit slit (5) and a radiation receiver (6). Evacuation of gas from the system occurs via a gas pipe (8) by means of a membrane pump (9) with a flow valve (11a) opened. A purification cell (12) is closed by the closure of flow valves (11b+11c). A flow valve (13) is also closed. When a sufficiently low residual gas pressure has been reached, with the pump switched off, the spectrometer vessel (7) is filled with gas from a supply tank (15) by the opening of the valve (13). The pumping-out and subsequent filling of the spectrometer vessel can be repeated, to obtain a low partial pressure of residual gas components. Advantageously, filling is performed after venting of the spectrometer vessel (7) by repeated partial evacuation by means of the circulating pump (9) followed by filling with gas and the removal of the residual gas via the purification cell (12).
To obtain a clearly-defined excess pressure of the UV-transparent flushing gas inside the spectrometer vessel (7), the valve (13) is opened and by means of a pressure gauge (20) via an electronic control device (19) the pressure is measured until the required pressure is reached. As it is being supplied, the filling gas is circulated by means of the pump (9) and the flow position of a three-way valve (10) is oriented in the direction of the purification cell (12). Even during the operation of the spectrometer, the pump (9) remains switched on, so that desorbed residual gas components are removed by means of the purification cell (12). The purification cell (12) can contain, for example, copper oxide on a silica gel support and suitable molecular sieve absorbers as granulates.
If gas losses take place due to the apparatus leaking, so that the pressure drops below a given required value, the gas is supplemented via the electronic control device (19) by the opening of the valve (13).
Temperature changes in the spectrometer vessel lead to an increase in pressure in the system, possibly resulting in changes in the state of adjustment of the spectrometer. The pressure in the spectrometer vessel is therefore maintained below a preselected limit by the three-way valve (10) being opened in the direction of a storage tank (17) when the pressure rises. This position of the three-way valve (10) is maintained until the resulting gas surplus has been pumped into the storage tank (17). Thereafter a changeover back to gas circulating operation is made by changing over the three-way valve (10). When the temperature drops, gas from the storage tank enters the installation, as already mentioned hereinbefore, via valve (13). A flow resistance (14) ensures against abrupt pressure changes. By a regulating valve (16) a minimal excess pressure is always maintained in the storage tank (17), so that gas losses due to leakage are compensated for in this manner. The flushing gases used can be nitrogen, argon or helium, in dependence on the required spectral range.
The arrangement illustrated in FIG. 1 can be simplified when the properties of the spectrometer do not require pressure regulation. In that case use is made of merely a circulating pump and a purification device in the outer gas circuit.

Claims (10)

We claim:
1. A UV spectrometer for measurement of spectral intensities over a wavelength range below 190 nm comprising:
a gas-tight spectrometer vessel;
at least one optical window within said vessel;
a UV transparent filling gas inside said vessel; and
sorption means for the purpose of binding residual gases that absorb measuring radiation in said spectrometer and said means arrangedly communicating with said spectrometer vessel to accomplish said purpose.
2. A UV spectrometer according to claim 1 further comprising a pressure regulating system for maintaining a constant pressure of said filling gas inside said vessel which is higher than external air pressure.
3. A UV spectrometer according to claim 2 further comprising a gas circuit external to said vessel, said sorption means including a sorption substance, said circuit containing therewithin said sorption substance and fitted with a circulating pump; said filling gas being continuously circulated by means of said pump through said vessel.
4. A UV spectrometer according to claim 3 wherein said gas circuit forms part of said pressure regulating system, said system further comprising a means for measuring gas pressure in said vessel and a means for adjusting pressure in said vessel in response to the measured pressure.
5. A UV spectrometer according to claim 4 wherein said means for adjusting pressure is a three-way valve which, positioned at an outlet of the circulating pump, can be switched to have said vessel communicate with a storage tank for supplying gas.
6. A UV spectrometer according to claim 4 wherein said means for adjusting pressure is a controllable valve which supplies a gas from a storage tank to said gas circuit.
7. A UV spectrometer according to claim 6 further comprising a gas supply tank communicating via a pressure regulating valve with said storage tank thereby functioning to compensate for any gas losses.
8. A UV spectrometer according to claim 1 wherein said sorption means for binding residual gases is placed directly into said vessel.
9. A UV spectrometer according to claim 1 wherein said sorption means comprises an electrochemical gas-consuming cell.
10. A UV spectrometer according to claim 3 wherein said circulating pump is a membrane pump.
US07/863,561 1991-05-02 1992-04-03 Gas-filled uv spectrometer Expired - Lifetime US5225681A (en)

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DE4114276A DE4114276C2 (en) 1991-05-02 1991-05-02 Gas filled UV spectrometer
DE4114276 1991-05-02

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Cited By (8)

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Publication number Priority date Publication date Assignee Title
US5506149A (en) * 1995-03-03 1996-04-09 Thermo Jarrell Ash Corporation Spectroanalytical system and method
WO2001086687A1 (en) * 2000-02-07 2001-11-15 Lg Electronics Inc. Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer
WO2003029789A2 (en) * 2001-09-25 2003-04-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for suppression of light absorption, light dispersion and contamination with wavelengths below 200nm
GB2405924A (en) * 2003-09-09 2005-03-16 Thermo Electron Corp Vacuum ultraviolet radiation detection including a supply of UV transparent gas
US20050077474A1 (en) * 2003-10-09 2005-04-14 Nova Measuring Instruments Ltd. Vacuum UV based optical measuring method and system
US20060262303A1 (en) * 2005-05-17 2006-11-23 Honeywell International Inc. An optical micro-spectrometer
WO2011147603A1 (en) * 2010-05-24 2011-12-01 Labio A.S. Device for uv-spectrometric analysis of gaseous compounds
WO2012033443A1 (en) * 2010-09-06 2012-03-15 Chromalytica Ab Combination of spectrograph barrier gas, carrier gas and cooling of ccd

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CA2179338C (en) * 1995-08-07 2000-04-25 Gordon Albert Thomas Apparatus and method for spectroscopic product recognition and identification
DE19651677A1 (en) * 1996-12-12 1998-06-18 Spectro Analytical Instr Optical emission spectrometer
DE10010514B4 (en) * 1999-03-08 2004-09-30 Steag Microparts Gmbh Optoelectronic microspectrometer
DE10138302A1 (en) * 2001-08-10 2003-02-27 Kendro Lab Prod Gmbh Measuring device for determining the concentration of gases by IR absorption
DE102017010766A1 (en) 2017-11-21 2019-06-13 OBLF Ges. für Elektronik u. Feinwerktechnik mbH Transparency control of optical emission spectrometers

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Cited By (26)

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Publication number Priority date Publication date Assignee Title
US5506149A (en) * 1995-03-03 1996-04-09 Thermo Jarrell Ash Corporation Spectroanalytical system and method
WO2001086687A1 (en) * 2000-02-07 2001-11-15 Lg Electronics Inc. Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer
US20030047137A1 (en) * 2000-02-07 2003-03-13 Kang Sung Hee Apparatus for evaluating plasma polymerized polymer layer using uv spectrometer
US6764550B2 (en) 2000-02-07 2004-07-20 Lg Electronics Inc. Apparatus for evaluating plasma polymerized polymer layer using UV spectrometer
WO2003029789A2 (en) * 2001-09-25 2003-04-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for suppression of light absorption, light dispersion and contamination with wavelengths below 200nm
WO2003029789A3 (en) * 2001-09-25 2003-12-11 Fraunhofer Ges Forschung Method and device for suppression of light absorption, light dispersion and contamination with wavelengths below 200nm
US7476866B2 (en) 2003-09-09 2009-01-13 Thermo Fisher Scientific Inc. Apparatus and method for detection of vacuum ultraviolet radiation
GB2405924A (en) * 2003-09-09 2005-03-16 Thermo Electron Corp Vacuum ultraviolet radiation detection including a supply of UV transparent gas
WO2005024361A1 (en) * 2003-09-09 2005-03-17 Thermo Electron Corporation Apparatus and method for detection of vacuum ultraviolet radiation
GB2405924B (en) * 2003-09-09 2006-07-26 Thermo Electron Corp Ultraviolet spectroscopy
CN1846122B (en) * 2003-09-09 2012-04-18 热电股份有限公司 Apparatus and method for detecting vacuum ultraviolet rays
US20060289778A1 (en) * 2003-09-09 2006-12-28 Francois Vincent Apparatus and method for detection of vacuum ultraviolet radiation
US8552394B2 (en) 2003-10-09 2013-10-08 Nova Measuring Instruments Ltd. Vacuum UV based optical measuring method and system
US7482596B2 (en) 2003-10-09 2009-01-27 Nova Measuring Instruments Ltd. Vacuum UV based optical measuring method and system
US20050077474A1 (en) * 2003-10-09 2005-04-14 Nova Measuring Instruments Ltd. Vacuum UV based optical measuring method and system
US20060262303A1 (en) * 2005-05-17 2006-11-23 Honeywell International Inc. An optical micro-spectrometer
US7502109B2 (en) * 2005-05-17 2009-03-10 Honeywell International Inc. Optical micro-spectrometer
WO2011147602A3 (en) * 2010-05-24 2015-07-23 Labio A.S. Device for uv-spectrometric analysis of gaseous compounds
CN102985805A (en) * 2010-05-24 2013-03-20 拉碧欧公司 Device for uv-spectrometric analysis of gaseous compounds
US8841626B2 (en) 2010-05-24 2014-09-23 Labio A.S. Device for UV-spectrometric analysis of gaseous compounds
US9018592B2 (en) 2010-05-24 2015-04-28 Labio A.S. Device for UV-spectrometric analysis of gaseous compounds
WO2011147603A1 (en) * 2010-05-24 2011-12-01 Labio A.S. Device for uv-spectrometric analysis of gaseous compounds
RU2558014C2 (en) * 2010-05-24 2015-07-27 Лабио А.С. Device for uv-spectrometric analysis of gaseous compounds
CN102985805B (en) * 2010-05-24 2016-01-20 拉碧欧公司 For the device of the ultraviolet spectral analysis of gaseous compound
CZ305797B6 (en) * 2010-05-24 2016-03-16 Labio A. S. Device to measure spectra of gaseous substances or vapors in UV region below 190 nm in through-flow arrangement
WO2012033443A1 (en) * 2010-09-06 2012-03-15 Chromalytica Ab Combination of spectrograph barrier gas, carrier gas and cooling of ccd

Also Published As

Publication number Publication date
EP0512204A3 (en) 1993-09-29
JPH05133806A (en) 1993-05-28
EP0512204A2 (en) 1992-11-11
DE4114276A1 (en) 1992-11-05
DE4114276C2 (en) 1996-09-19

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