US3864219A - Process and electrolyte for applying barrier layer anodic coatings - Google Patents
Process and electrolyte for applying barrier layer anodic coatings Download PDFInfo
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- US3864219A US3864219A US431818A US43181874A US3864219A US 3864219 A US3864219 A US 3864219A US 431818 A US431818 A US 431818A US 43181874 A US43181874 A US 43181874A US 3864219 A US3864219 A US 3864219A
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- metal
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- aluminum
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- 239000003792 electrolyte Substances 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims description 35
- 230000004888 barrier function Effects 0.000 title abstract description 28
- 238000000576 coating method Methods 0.000 title description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 40
- 239000002184 metal Substances 0.000 claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000002904 solvent Substances 0.000 claims abstract description 15
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims abstract description 13
- 150000002739 metals Chemical class 0.000 claims abstract description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 23
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 23
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 20
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 12
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- 229910052715 tantalum Inorganic materials 0.000 claims description 11
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 11
- 150000001875 compounds Chemical class 0.000 claims description 10
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 claims description 9
- 239000008367 deionised water Substances 0.000 claims description 9
- 229910021641 deionized water Inorganic materials 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 9
- 239000010955 niobium Substances 0.000 claims description 9
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 9
- 229910045601 alloy Inorganic materials 0.000 claims description 8
- 239000000956 alloy Substances 0.000 claims description 8
- 239000010936 titanium Substances 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 239000000908 ammonium hydroxide Substances 0.000 claims description 5
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052770 Uranium Inorganic materials 0.000 claims description 4
- 150000004703 alkoxides Chemical class 0.000 claims description 4
- 229910052790 beryllium Inorganic materials 0.000 claims description 4
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 claims description 4
- 238000005238 degreasing Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910017604 nitric acid Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000002791 soaking Methods 0.000 claims description 3
- 125000005210 alkyl ammonium group Chemical group 0.000 claims description 2
- 150000003868 ammonium compounds Chemical class 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 238000005530 etching Methods 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical class [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 238000007743 anodising Methods 0.000 abstract description 24
- 150000001450 anions Chemical class 0.000 abstract description 4
- 239000011368 organic material Substances 0.000 abstract description 3
- 235000019441 ethanol Nutrition 0.000 description 13
- 239000000243 solution Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 7
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001008 7075 aluminium alloy Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- UAAZWFFLVYTDKS-UHFFFAOYSA-N OB(O)O.OB(O)O.OB(O)O.OB(O)O.OB(O)O.N.N.N.N.N.N.N.N.N.N.N.N.N.N.N.O.O.O.O.O.O.O.O.O.O Chemical compound OB(O)O.OB(O)O.OB(O)O.OB(O)O.OB(O)O.N.N.N.N.N.N.N.N.N.N.N.N.N.N.N.O.O.O.O.O.O.O.O.O.O UAAZWFFLVYTDKS-UHFFFAOYSA-N 0.000 description 1
- 229910000711 U alloy Inorganic materials 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010908 decantation Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- -1 tartrate ions Chemical class 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
Definitions
- Barrier anodization generally refers to anodic coatings that are essentially pore free and are generally of the order of about 10' meters in thickness whereas conventional anodic coatings are about l meters in thickness. Barrier anodization using prior art processes and electrolytes has been successful in barrier anodizing high purity aluminum but has generally been unsuccessful in attempting to barrier anodize either aluminum alloys or large areas of pure aluminum with pore free anodized films.
- barrier anodizing electrolytes for aluminum such as (a) aqueous boric acid-borax solutions, (b) aqueous or semi-aqueous solutions containing citrate or tartrate ions, and (c) solutions of ammonium pentaborate decahydrate in ethylene glycol may be suitable for high-purity aluminum, but are generally unsuitable for barrier anodizing of aluminum alloys such as 7075 aluminum. Alluminum alloys referred to herein are designated by the four-digit designation system established by the Aluminum Association and generally known in the art.
- the invention comprises a novel anodizing, and especially barrier anodizing, electrolyte and the method for using this electrolyte, which electrolyte includes a quaternary ammonium compound having a compex metal anion dissolved in a solvent.
- electrolyte includes a quaternary ammonium compound having a compex metal anion dissolved in a solvent.
- metals which may be barrier anodized using this electrolyte include tantalum, tungsten, niobium, titanium beryllium, uranium, aluminum and alloys thereof.
- FIG. 1 represents a electrical schematic for anodizing.
- FIG. 2 illustrates current-voltage curves derived in barrier anodizing of pure aluminum.
- FIG. I representsan electrical schematic of an anod- 0 izing apparatus which may be used with this invention.
- the electrolyte 12 described hereinbelow is disposed within a container 14 and may be stirred or agitated using a magnetic or the like stirrer 15 together with stirring means such as a plastic coated magnet 16.
- the anode l8 and cathode may be electrically connected by means of electrical conductors 22, 24 to a power supply such as a variable voltage power supply 30.
- an ammeter 36 and a voltmeter 38 may be disposed in the circuit as shown in order to measure current flow through the circuit.
- R N represents an alkyl group generally containing from I to 4 carbon atoms, an aryl group, or a mixture ofthese to form the quaternary ammonium ion
- 0 oxygen
- H represents hydrogen
- M represents a metal such as niobium, tantalum, or titanium
- the complex ion contains two or more atoms of metal.
- Compounds having this formula such as tetramethylammonium niobate, tetramethylammonium titanate and tetramethylammonium tantalate, may be formed by reacting quaternary ammonium hydroxide with a metal alkoxide. It is believed that the following equation accurately represents the portion of a reaction that is pertinent to this invention, but the invention is not to be bound or restricted by this belief:
- R and R may be alkyl or other organic groups containing from 1 to about 4 carbon atoms
- n is the valence of the metal M
- M may be such as niobium, tantalum and titanium.
- the metal alkoxide is then mixed and thereby reacted with the quaternary ammonium hydroxide to form the desired quaternary ammonium compound having a complex metal anion.
- This compound may be separated from the reaction products by precipitation with a less polar solvent such as acetone and subsequently separating by suitable processes such as filtration or decantation. 1
- This compound is dissolved in a suitable solvent com prising water and a polar, water soluble organic liquid such as alcohol or ethylene glycol wherein the alcohol volume percent may be from about I to about 80 per cent andpreferably from about 20 to about 80, and
- Typical alcohols which may be used are such as ethanol, methanol, propanol, etc. and which have the general formula ROH where R may contain 1 to about 3 carbon atoms.
- ROH where R may contain 1 to about 3 carbon atoms.
- the amount of compound to be dissolved in the solvent is dependent upon many factors such as the extent of use to be made of the electrolyte, but may generally be from about 1 to about grams per about 1,000 milliliters of solvent. It may be generally desirable to dissolve the compound in water and thereafter add a sufficient amount of a polar, water soluble organic material to bring to the desired volume.
- the resultant solution confilms which were formed on 606] aluminum with the present invention.
- the electrolyte was prepared by dissolving 5 grams of tetramethylammonium niobate compound in about 500 milliliters of water and thereafter diluting to a volume of about 2,000 milliliters with ethyl alcohol.
- the samples to be anodized which were about 3 inch squares (about 18 square inches surface area) of about 90 mil thickness of 6,061 aluminum alloy, were cleaned by scrubbing the surface with an alkaline solution, immersing thereafter in an ultrasonic bath containing trichloroethylene, and thereafter rinsing with ethyl alcohol:
- taining the dissolved compound is used as the barrier anodizing electrolyte and may be at a temperature of from about 0 to about 60C, and preferably at from about to about C.
- the materials to be anodized may be suitably cleaned or given a cleaning pretreatment through various means.
- barrier anodic films can be formed on a 6,061 aluminum alloy after a cleaning pretreatment involving a detergent scrub and a vapor degreasing of the surface.
- Other cleaning procedures may involve cleaning the asreceived surface with a suitable alkaline material, thereafter immersing the sample in an ultrasonic bath containing a suitable solvent such as trichloroethylene, and finally rinsing the sample with a suitable alcohol such as ethyl alcohol.
- An alternative and preferred cleaning pretreatment sequence to be used for aluminum and aluminum alloys may involve degreasing the surface with a suitable solvent such as trichloroethylene, contacting the sample surface with an about 5 weight percent sodium hydroxide solution at a temperature of about 160F for about 5 minutes, rinsing the etched sample with deionized water, contacting the sample with a 50 volume percent nitric acid solution which may be at about 90F for about 5 minutes, thereafter rinsing again in deionized water, immersing the sample in a 20 volume percent sulfuric acid solution at about 80F until such time as gas bubbles form on the aluminum surface such as about 5 minutes, and then applying an anodizing electrical current for about 90 seconds at a current density of 5 milliamps per square centimeter using a platinum, stainless steel or tantalum cathode, thereafter soaking the sample in said sulfuric acid bath for about 5 to 10 minutes after bubbles form on the aluminum surface, and thereafter rinsing with deionized water followed by a suitable
- the following table illustrates various properties of The cleaned samples were then immersed in the electrolyte and appropriately connected to electrical anodic leads.
- the cathode may be any suitable material such as platinum, tantalum, and stainless steel.
- the samples were anodized at a constant current of 2 milliamps per square centimeter until the voltage increased to a preset value as shown in the table.
- the voltage used is a function of the thickness of the anodic coating desired as described below. 300 and 500 volts were used as a preset value for these samples. When the desired voltage was reached, the voltage was held constant and the current was allowed to decrease to approximately 10 percent of its initial value. Current and voltage curves have been plotted against time and the results are similar to the FIG.
- Curve A represents voltage increase as a function of time to a preset voltage.
- Curve B represent current change as a function of time while the voltage increases to a preset value and is maintained constant thereafter.
- the anodizing procedure employed maintained the current constant until a preset voltage was attained, it may be seen that the same coating may be achieved by retaining the voltage constant and varying the current, or combination of these where the current or the voltage may be retained constant in increments until the desired results are achieved.
- the voltage was held constant after the desired voltage was attained and the current was allowed to decrease to a percentage of the initial value, it may be desirable to remove the barrier anodized material immediately upon attaining the .preset voltage. This is to be done at the discretion of the operator.
- the thickness of the barrier anodic film has been shown to be proportional to voltage with film thickness in angstroms approximately equal to 12 times the final adodizing voltage.
- the 300 V anodizing voltage yielded a thickness of about 3,6OOA and the 500 V setting yielded a thickness of about 6,000A.
- Film thicknesses of 6,500 A have also been applied to pure aluminum and aluminum alloys such as 6,061 A] and 7075 Al.
- a gold counter electrode was deposited over a centimeter square area of the barrier anodic film obtained by the above process and tested.
- the above table illustrates the electrical properties deteremined on one set of samples.
- This invention demonstrates that the novel electrolyte of this invention can be used to form barrier anodic films on materials which are not commonly amenable to prior art electrolytes, and the method for using this electrolyte.
- other aluminum base metals which have been anodized include 5,457 Al, 7,075 Al, 4,043 Al and pure aluminum. Except for 4,043 A] which was not tested, these had leakage currents at 2 volts of about 4 X 10 amperes per square centimeter. Areas as large as 575 square inches of 6,061 Al have been barrier anodized at 500 V to a thickness of about 6,000A using this electrolyte and process.
- Voltages used in barrier anodizing other metals using the process and electrolyte of this invention include uranium alloys 400 volts, beryllium- 300 volts, tantalum 300 volts, tungsten 150 volts, niobium 200 volts and titanium 400 volts. These voltages are merely exemplary and could be larger or smaller depending upon film properties desired.
- said solvent comprises from about I to about volume percent water and from about 99 to about 20 volume percent alcohol.
- said quaterenary ammonium compound comprises from about 1 to about l0 grams of said compound per liter of solvent.
- said quaternary ammonium compound is a reaction product of a quaternary alkyl ammonium hydroxide and a metal alkoxide.
- said quaternary ammonium compound is selected from the group consisting of tetramethylammonium niobate, tetramethylammonium titanate, tetramethylammonium tantalate.
- said cleaning comprises degreasing the metal, etching the surface by contacting said surface in an alkaline bath, rinsing said etched surface with deionized water, contacting said surface with an about 50 volume percent nitric acid solution to desmut said surface, rinsing said surface with deionized water, immersing said surface in an about 20 volume percent sulfuric acid solution, attaching an electrical lead to said metal to make it an anode, applying current to said anode for about seconds, thereafter soaking said surface for from about 5 to about 10 minutes in said sulfuric acid bath, rinsing said surface with deionized water and rinsing said surface with an alcohol.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electrochemical Coating By Surface Reaction (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US431818A US3864219A (en) | 1974-01-08 | 1974-01-08 | Process and electrolyte for applying barrier layer anodic coatings |
| GB5154774A GB1449080A (en) | 1974-01-08 | 1974-11-28 | Electrolyte for applying barrier anodic coatings |
| CA214,971A CA1030096A (en) | 1974-01-08 | 1974-11-29 | Electrolyte for applying barrier anodic coatings |
| FR7500365A FR2256969B3 (enrdf_load_stackoverflow) | 1974-01-08 | 1975-01-07 | |
| DE19752500541 DE2500541A1 (de) | 1974-01-08 | 1975-01-08 | Elektrolyt zum aufbringen von anodischen sperrueberzuegen |
| JP50004528A JPS50100570A (enrdf_load_stackoverflow) | 1974-01-08 | 1975-01-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US431818A US3864219A (en) | 1974-01-08 | 1974-01-08 | Process and electrolyte for applying barrier layer anodic coatings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3864219A true US3864219A (en) | 1975-02-04 |
Family
ID=23713563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US431818A Expired - Lifetime US3864219A (en) | 1974-01-08 | 1974-01-08 | Process and electrolyte for applying barrier layer anodic coatings |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3864219A (enrdf_load_stackoverflow) |
| JP (1) | JPS50100570A (enrdf_load_stackoverflow) |
| CA (1) | CA1030096A (enrdf_load_stackoverflow) |
| DE (1) | DE2500541A1 (enrdf_load_stackoverflow) |
| FR (1) | FR2256969B3 (enrdf_load_stackoverflow) |
| GB (1) | GB1449080A (enrdf_load_stackoverflow) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4717455A (en) * | 1985-11-25 | 1988-01-05 | Swiss Aluminium Ltd. | Process for manufacturing a microfilter |
| US5716511A (en) * | 1996-08-07 | 1998-02-10 | Kemet Electronics Corporation | Anodizing electrolyte and its use |
| US5733420A (en) * | 1992-11-10 | 1998-03-31 | Casio Computer Co., Ltd. | Anodizing apparatus and an anodizing method |
| GB2343681A (en) * | 1998-11-16 | 2000-05-17 | Agfa Gevaert Nv | Lithographic printing plate support |
| US20060191796A1 (en) * | 2004-12-06 | 2006-08-31 | Greatbatch, Inc. | Anodizing Valve Metals By Controlled Power |
| WO2006050401A3 (en) * | 2004-10-29 | 2007-07-26 | Medtronic Inc | Processes and systems for formation of high voltage, anodic oxide on a valve metal anode |
| US20080169200A1 (en) * | 2007-01-17 | 2008-07-17 | Thomas David Burleigh | Method of Anodizing Steel |
| US20080250621A1 (en) * | 2005-03-30 | 2008-10-16 | Showa Denko K.K. | Solid Electrolytic Capacitor Element, Method for Manufacturing Same, and Solid Electrolytic Capacitor |
| US20090205970A1 (en) * | 2003-03-17 | 2009-08-20 | John Tony Kinard | Capacitor containing aluminum anode foil anodized in low water content glycerine-phosphate electrolyte without a pre-anodizing hydaration step |
| US20090286385A1 (en) * | 2008-05-19 | 2009-11-19 | Advanced Micro Devices, Inc. | Methods for removing a photoresist from a metal-comprising material |
| US20090315062A1 (en) * | 2008-06-24 | 2009-12-24 | Wen-Herng Su | Light Emitting Diode Submount With High Thermal Conductivity For High Power Operation |
| CN1908245B (zh) * | 2006-07-24 | 2010-08-11 | 北京航空航天大学 | 基于酒石酸铵体系的钛合金阳极氧化工艺 |
| US20110284390A1 (en) * | 2007-01-17 | 2011-11-24 | Thomas David Burleigh | Method of anodizing steel |
| US20120247961A1 (en) * | 2005-06-17 | 2012-10-04 | Mitsubishi Chemical Corporation | Metal oxide film, laminate, metal member and process for producing the same |
| US8696767B2 (en) | 2007-05-21 | 2014-04-15 | Showa Denko K.K. | Dipping method of forming cathode of solid electrolytic capacitor |
| US9478587B1 (en) | 2015-12-22 | 2016-10-25 | Dicon Fiberoptics Inc. | Multi-layer circuit board for mounting multi-color LED chips into a uniform light emitter |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5376848A (en) * | 1976-12-20 | 1978-07-07 | Toshiba Corp | Electrochromic display device |
| JPS6045008A (ja) * | 1983-08-22 | 1985-03-11 | 松下電器産業株式会社 | 薄膜コンデンサの製造方法 |
| RU2123546C1 (ru) * | 1997-06-17 | 1998-12-20 | Тюменский государственный нефтегазовый университет | Способ твердого оксидирования алюминия и его сплавов |
| RU2124588C1 (ru) * | 1997-12-30 | 1999-01-10 | Закрытое акционерное общество "Техно-ТМ" | Способ микроплазменного оксидирования вентильных металлов и их сплавов и устройство для его осуществления |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3524799A (en) * | 1969-06-13 | 1970-08-18 | Reynolds Metals Co | Anodizing aluminum |
| US3796644A (en) * | 1972-05-03 | 1974-03-12 | Sprague Electric Co | Electrolytic formation process for aluminum capacitor electrodes |
-
1974
- 1974-01-08 US US431818A patent/US3864219A/en not_active Expired - Lifetime
- 1974-11-28 GB GB5154774A patent/GB1449080A/en not_active Expired
- 1974-11-29 CA CA214,971A patent/CA1030096A/en not_active Expired
-
1975
- 1975-01-07 FR FR7500365A patent/FR2256969B3/fr not_active Expired
- 1975-01-08 DE DE19752500541 patent/DE2500541A1/de active Pending
- 1975-01-08 JP JP50004528A patent/JPS50100570A/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3524799A (en) * | 1969-06-13 | 1970-08-18 | Reynolds Metals Co | Anodizing aluminum |
| US3796644A (en) * | 1972-05-03 | 1974-03-12 | Sprague Electric Co | Electrolytic formation process for aluminum capacitor electrodes |
Cited By (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4717455A (en) * | 1985-11-25 | 1988-01-05 | Swiss Aluminium Ltd. | Process for manufacturing a microfilter |
| US5733420A (en) * | 1992-11-10 | 1998-03-31 | Casio Computer Co., Ltd. | Anodizing apparatus and an anodizing method |
| US5716511A (en) * | 1996-08-07 | 1998-02-10 | Kemet Electronics Corporation | Anodizing electrolyte and its use |
| GB2343681A (en) * | 1998-11-16 | 2000-05-17 | Agfa Gevaert Nv | Lithographic printing plate support |
| EP1002644A3 (en) * | 1998-11-16 | 2004-01-14 | Agfa-Gevaert | Production of support for lithographic printing plate. |
| US20090205970A1 (en) * | 2003-03-17 | 2009-08-20 | John Tony Kinard | Capacitor containing aluminum anode foil anodized in low water content glycerine-phosphate electrolyte without a pre-anodizing hydaration step |
| US7780835B2 (en) * | 2003-03-17 | 2010-08-24 | Kemet Electronics Corporation | Method of making a capacitor by anodizing aluminum foil in a glycerine-phosphate electrolyte without a pre-anodizing hydration step |
| WO2006050401A3 (en) * | 2004-10-29 | 2007-07-26 | Medtronic Inc | Processes and systems for formation of high voltage, anodic oxide on a valve metal anode |
| US20060191796A1 (en) * | 2004-12-06 | 2006-08-31 | Greatbatch, Inc. | Anodizing Valve Metals By Controlled Power |
| US20080250621A1 (en) * | 2005-03-30 | 2008-10-16 | Showa Denko K.K. | Solid Electrolytic Capacitor Element, Method for Manufacturing Same, and Solid Electrolytic Capacitor |
| US7811338B2 (en) | 2005-03-30 | 2010-10-12 | Murata Manufacturing Co., Ltd. | Solid electrolytic capacitor element, method for manufacturing same, and solid electrolytic capacitor |
| US20120247961A1 (en) * | 2005-06-17 | 2012-10-04 | Mitsubishi Chemical Corporation | Metal oxide film, laminate, metal member and process for producing the same |
| US9476137B2 (en) * | 2005-06-17 | 2016-10-25 | Tohoku University | Metal oxide film, laminate, metal member and process for producing the same |
| CN1908245B (zh) * | 2006-07-24 | 2010-08-11 | 北京航空航天大学 | 基于酒石酸铵体系的钛合金阳极氧化工艺 |
| US20080169200A1 (en) * | 2007-01-17 | 2008-07-17 | Thomas David Burleigh | Method of Anodizing Steel |
| US20110284390A1 (en) * | 2007-01-17 | 2011-11-24 | Thomas David Burleigh | Method of anodizing steel |
| US8696767B2 (en) | 2007-05-21 | 2014-04-15 | Showa Denko K.K. | Dipping method of forming cathode of solid electrolytic capacitor |
| US20090286385A1 (en) * | 2008-05-19 | 2009-11-19 | Advanced Micro Devices, Inc. | Methods for removing a photoresist from a metal-comprising material |
| US8044427B2 (en) * | 2008-06-24 | 2011-10-25 | Dicon Fiberoptics, Inc. | Light emitting diode submount with high thermal conductivity for high power operation |
| US20090315062A1 (en) * | 2008-06-24 | 2009-12-24 | Wen-Herng Su | Light Emitting Diode Submount With High Thermal Conductivity For High Power Operation |
| US9478587B1 (en) | 2015-12-22 | 2016-10-25 | Dicon Fiberoptics Inc. | Multi-layer circuit board for mounting multi-color LED chips into a uniform light emitter |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1449080A (en) | 1976-09-08 |
| FR2256969A1 (enrdf_load_stackoverflow) | 1975-08-01 |
| JPS50100570A (enrdf_load_stackoverflow) | 1975-08-09 |
| FR2256969B3 (enrdf_load_stackoverflow) | 1977-09-30 |
| DE2500541A1 (de) | 1975-07-17 |
| CA1030096A (en) | 1978-04-25 |
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