US3849656A - Plural sample ion source - Google Patents

Plural sample ion source Download PDF

Info

Publication number
US3849656A
US3849656A US00876078A US87607869A US3849656A US 3849656 A US3849656 A US 3849656A US 00876078 A US00876078 A US 00876078A US 87607869 A US87607869 A US 87607869A US 3849656 A US3849656 A US 3849656A
Authority
US
United States
Prior art keywords
ions
regions
samples
chamber
ionization chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US00876078A
Other languages
English (en)
Inventor
M Wallington
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Associated Electrical Industries Ltd
Original Assignee
Associated Electrical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Associated Electrical Industries Ltd filed Critical Associated Electrical Industries Ltd
Application granted granted Critical
Publication of US3849656A publication Critical patent/US3849656A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers

Definitions

  • ABSTRACT An ion source for separately ionizing a plurality of vaporized samples and focusing the ions produced by the ionization into an ion beam containing ions from each of the vaporized samples.
  • the ion source comprises an ionization chamber having an aperture through which ions are emitted, means for emitting an electron beam into the ionization chamber, at least one ion control electrode for establishing an ion control field, and partition means for dividing the ionization chamber into a first and second electron bombardment chamber.
  • the ion source also includes a first and second gas storage vessel for respectively introducing at least a first and second vaporized sample into the first and second electron bombardment chambers, respectively, so that the first and second vaporized samples are independently ionized.
  • Known ion sources have included an ionization chamber into which two different gas samples are introduced in order to ionize the samples by electron bombardment.
  • one of the gas samples is a reference sample of which the spectral peaks are of a known mass, and the other sample is an unknown sample in which the spectral peaks thereof are to be compared with those of the reference sample.
  • the molecules of the gas samples are ionized by an electron beam which passes through the chamber, and the ions produced by this ionization process are then focused and accelerated by a series of electrodes so that the ions are projected through an ion exit slit in the ion source.
  • the projected ions are directed into a magnetic analyzer of the spectrometer.
  • the number of ions of the unknown sample present in the ion beam decreases.
  • This decrease in the number of ions developed by the unknown sample whenever the reference sample is introduced into the ionization chamber results in a decrease in the intensity of the spectral peaks of the unknown sample, thereby resulting in measurement errors.
  • the present invention is directed toward an ion source in which a plurality of vaporized samples may be independently ionized, thereby overcoming the noted disadvantages, and others, of such previous ion sources.
  • the ion source for separately ionizing a plurality of gas samples comprises an ionization chamber having an aperture for the passage of ions, means for emitting an electron beam into the ionization chamber for developing ions by electron bombardment, at least one ion control electrode for establishing an ion control field, and partition means for dividing the ionization chamber into a first and second electron bombardment chamber, so that a first and second gas sample may be independently ionized.
  • a pair of gas storage vessels are respectively associated with the first and second electron bombardment chambers so that the first and second gas samples may be separately introduced into the electron bombardment chambers.
  • an ion source having an ionization chamber for separately .ionizing a plurality of vaporized samples.
  • the ionization chamber includes an evacuatable chamber having an aperture for the passage of ions, means for dividing the evacuatable chamber into at least a first and second electron bombardment chamber, means for emitting an electron beam into the ionization chamber for developing ions by electron bombardment, and means for establishing an ion transporting field for propelling the ions through the aperture so that the ions are directed into an ion beam.
  • a pair of passage means are provided for introducing a first and a second gas sample into the first and second electron bombardment chambers, respectively, so that the first and second gas samples are independently ionized.
  • the electron beam emitting means includes a pair of electron emitting elements for respectively emitting a first electron beam into the first electron bombardment chamber and a second electron beam into the second electron bombardment chamber so that the first and second vaporized samples are separately ionized by the pair of electron beams.
  • the ion source includes means for evacuating air from the first and second electron bombardment chamber.
  • a method of generating an ion beam containing ions from a plurality of vaporized samples includes, introducing a first and second vaporized sample into a first and second electron bombardment chamber, separately ionizing the first and second vaporized sample in the first and second electron bombardment chambers respectively to thereby generate ions from the vaporized samples, and, accelerating the ions produced from both of the vaporized samples through an aperture means to thereby form a single ion beam.
  • the primary object of the present invention is to provide an ion source having an ionization chamber for separately ionizing a plurality of vaporized samples.
  • Another object of the present invention is to provide an ion source wherein the ionization chamber includes partition means for dividing the ionization chamber into a plurality of separate electron bombardment chambers so that a plurality of gas samples may be independently ionized.
  • a further object of the present invention is to provide an ion source wherein at least two gas samples are separately ionized. and the ions developed upon ionization of the two gas samples are then focused into an ion beam.
  • a still further object of the present invention is to provide an ionization chamber wherein at least two vaporized samples may be ionized in a manner such that an increase in the partial pressure of one of the samples has substantially no effect on the number of ions developed by the other vaporized sample.
  • Another object of the present invention is to provide an ion source wherein at least two gas samples may be ionized in such a manner such that an increase in the partial pressure of one gas sample has substantially no effect on the ionization of the other sample.
  • FIG. 1 is a block diagram, sectional view of an ion source illustrating a preferred embodiment of the present invention.
  • FIG. 2 is a sectional view of the ion source illustrated in FIG. 1, taken along line 2--2.
  • FIG. 1 illustrates a mass spectrometer 10, which generally comprises an evacuatable chamber 14 which encloses an ionization chamber 12 and a collector assembly 13.
  • the ionization chamber 12 includes an aperture 16 for the passage of ions, and a partition wall 18 which divides the ionization chamber 12 into a pair of electron bombardment chambers 20, 22.
  • the aperture 16 is defined by a pair of chamber walls 23, 25, each of which has a leading edge 27, 29, which slopes away from the aperture 16.
  • the walls 23, 25 are electrically insulated from the remainder of electron bombardment chamber 20, 22, and each of the wall 23, 25 is electrically connected to voltage supply source 8-].
  • Ionization chamber 12 is electrically connected to a voltage sup ply S-l.
  • a generally arcuate shaped ion repeller electrode 24 Positioned within electron bombardment chamber 20 is a generally arcuate shaped ion repeller electrode 24, which is electrically connected to a voltage supply source S-l.
  • a generally arcuate shaped ion repeller electrode 26 Positioned within electron bombardment chamber 22 is a generally arcuate shaped ion repeller electrode 26 which is electrically connected to voltage supply source 8-1.
  • the electron bombardment chambers 20, 22 are respectively coupled to a pair of gas storage vessels 28, 30, electrically insulated from ionization chambers 20 and 22, so that a first and second gas sample may be introduced into the electron bombardment chambers 20, 22.
  • an electron beam 32 is emitted into electron bombardment chamber 20 by the flow of the electrons between a cathode 34 and an anode 36 through a pair of apertures 38, 40 in electron bombardment chamber 20.
  • the cathode 34 and anode 36 are connected to voltage supply source -1 in a known manner for providing the flow of an electron current between these elements.
  • an electron beam 42 is emitted into electron bombardment chamber 22 by another anode-cathode arrangement positioned across bombardment chamber 22.
  • Mass spectrometer also includes a vacuum pump 44 for maintaining a relatively high vacuum in evacuatable chamber 14.
  • the ions generated upon ionization of the two gas samples in electron bombardment chambers 20, 22 are respectively accelerated by repeller electrodes 24, 26, and are emitted through aperture 16 to form a single beam of ions containing ions from both samples.
  • This beam of ions is then focused by a pair of beam centering electrodes 48, 50 and a pair of ground electrodes 52, 54, so that the beam passes through a ground slit 56 and is projected to collector assembly 13.
  • the collector assembly 13 includes an outlet aperture 58 and a collector electrode 60, which are respectively connected to voltage supply source S-1 and a detector D1 of known design.
  • Each of the electrodes 48, 50, 52, 54, as well as evacuatable chamber 14, is electrically connected to voltage supply source S-] in a known manner.
  • the two gas samples present in bombardment chambers 20, 22 are ionized and accelerated by the arcuate repeller electrodes 24, 26 thereby propelling the ions through the funnel-shaped aperture 16 in ionization chamber 12. It has been found that by separately controlling the voltage signal applied to the chamber walls 23, 25, optimum performance of each bombardment chamber 20, 22 may be obtained even though there is a slight variation in the geometrical dimensions of the bombardment chamber 20, 22.
  • the ions from the gas samples are accelerated and focused into a single beam containing ions generated from both samples.
  • an increase in the partial pressure applied to the gas sample in electron bombardment chamber 20 has substantially no effect on the number of ions generated by the gas sample in electron bombardment chamber 22, and similarly, an increase in the partial pressure applied to the gas sample in bombardment chamber 22 has substantially no effect on the number of ions generated by the gas sample in chamber 20.
  • the energy level of electron beam 32 may be set equal to the energy level of the electron beam 42, or these energy levels may be set at different values, depending on the nature of the spectrometric analysis to be conducted.
  • An ion source for a mass spectrometer comprising:
  • inlet means for introducing a plurality of vaporized samples into separate regions of said chamber
  • common aperture means defining at least one opening in communication with said ionization chamber through which ions formed in each of said regions exit to form an ion beam;
  • electrode means for accelerating the ions through said common aperture means thereby producing an ion beam containing ions from each of the samples
  • said partition means extending to a position adjacent said common aperture means to define flow paths whereby ions from each of said regions may exit said ionization chamber through said opening without passing through any other regions.
  • said partition means divides said chamber into first and second electron bombardment chambers
  • said inlet means comprises first and second inlet passage means for respectively introducing first and second vaporized samples into said first and second electron bombardment chambers.
  • said aperture means comprises an ion exit slit, the edges of which are tapered to facilitate the flow of ions from said ionization chamber and the formation of a single ion beam.
  • said electrode means comprises a separate repeller plate disposed in each of said regions for accelerating the ions produced in that region into the ion beam.
  • An ion source for separately ionizing a plurality of gas samples comprising:
  • an ionization chamber having a single aperture through which ions are emitted
  • inlet means for introducing a plurality of gas samples into separate regions of said chamber
  • ion control electrode means in each of said regions for establishing an ion control field for propelling ions through said aperture to form a single ion beam including ions of each of the samples;
  • said partition means extending to a position adjacent said aperture to define flow paths whereby ions from each of said regions may exit said ionization chamber through said aperture without passing into any of the other regions.
  • a method of generating an ion beam as defined in claim 13 comprising the steps of:

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Sources, Ion Sources (AREA)
US00876078A 1968-12-17 1969-11-12 Plural sample ion source Expired - Lifetime US3849656A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB5994068 1968-12-17

Publications (1)

Publication Number Publication Date
US3849656A true US3849656A (en) 1974-11-19

Family

ID=10484703

Family Applications (1)

Application Number Title Priority Date Filing Date
US00876078A Expired - Lifetime US3849656A (en) 1968-12-17 1969-11-12 Plural sample ion source

Country Status (6)

Country Link
US (1) US3849656A (enrdf_load_stackoverflow)
DE (1) DE1962617A1 (enrdf_load_stackoverflow)
FR (1) FR2026374A1 (enrdf_load_stackoverflow)
GB (1) GB1252569A (enrdf_load_stackoverflow)
NL (1) NL6918712A (enrdf_load_stackoverflow)
SE (1) SE356396B (enrdf_load_stackoverflow)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924134A (en) * 1974-11-29 1975-12-02 Ibm Double chamber ion source
US4016421A (en) * 1975-02-13 1977-04-05 E. I. Du Pont De Nemours And Company Analytical apparatus with variable energy ion beam source
US4028617A (en) * 1975-01-16 1977-06-07 Hitachi, Ltd. Ionization detector utilizing electric discharge
US4066894A (en) * 1976-01-20 1978-01-03 University Of Virginia Positive and negative ion recording system for mass spectrometer
US4159423A (en) * 1976-10-01 1979-06-26 Hitachi, Ltd. Chemical ionization ion source
US4164654A (en) * 1978-02-14 1979-08-14 The South African Inventions Development Corporation Device for generating an atomic cloud
US4314180A (en) * 1979-10-16 1982-02-02 Occidental Research Corporation High density ion source
US4563610A (en) * 1982-12-20 1986-01-07 Nissin-High Voltage Co., Ltd. Device for generating negative-ion beams by alkaline metal ion sputtering
US5331158A (en) * 1992-12-07 1994-07-19 Hewlett-Packard Company Method and arrangement for time of flight spectrometry
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US6759807B2 (en) 2002-04-04 2004-07-06 Veeco Instruments, Inc. Multi-grid ion beam source for generating a highly collimated ion beam
US20070096023A1 (en) * 2005-10-28 2007-05-03 Freidhoff Carl B MEMS mass spectrometer
US20080067410A1 (en) * 2004-12-28 2008-03-20 Kyoto Institute Of Technology Charged Particle Generator and Accelerator
US20130234036A1 (en) * 2012-03-08 2013-09-12 Kabushiki Kaisha Toshiba Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method
US20140097338A1 (en) * 2012-10-10 2014-04-10 California Institute Of Technology Mass spectrometer, system comprising the same, and methods for determining isotopic anatomy of compounds
US9594879B2 (en) 2011-10-21 2017-03-14 California Instutute Of Technology System and method for determining the isotopic anatomy of organic and volatile molecules
US20190189417A1 (en) * 2017-09-29 2019-06-20 Perkinelmer Health Sciences Canada, Inc. Off-axis ionization devices and systems using them
US11328919B2 (en) * 2018-05-11 2022-05-10 Leco Corporation Two-stage ion source comprising closed and open ion volumes

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4855602A (en) * 1986-06-20 1989-08-08 Sharma Devendra N Beam deflector

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2772362A (en) * 1955-04-26 1956-11-27 Gen Electric Ion source for a mass spectrometer
US3355587A (en) * 1951-01-28 1967-11-28 Jenckel Ludolf Gas analysis apparatus comprising plural ionization chambers with different ionizing electron beam energy levels in the chambers
US3405263A (en) * 1966-01-14 1968-10-08 Exxon Research Engineering Co Dual mass spectrometer ion source comprising field ionization and electron bombardment sources and the method of use

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3355587A (en) * 1951-01-28 1967-11-28 Jenckel Ludolf Gas analysis apparatus comprising plural ionization chambers with different ionizing electron beam energy levels in the chambers
US2772362A (en) * 1955-04-26 1956-11-27 Gen Electric Ion source for a mass spectrometer
US3405263A (en) * 1966-01-14 1968-10-08 Exxon Research Engineering Co Dual mass spectrometer ion source comprising field ionization and electron bombardment sources and the method of use

Cited By (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924134A (en) * 1974-11-29 1975-12-02 Ibm Double chamber ion source
US4028617A (en) * 1975-01-16 1977-06-07 Hitachi, Ltd. Ionization detector utilizing electric discharge
US4016421A (en) * 1975-02-13 1977-04-05 E. I. Du Pont De Nemours And Company Analytical apparatus with variable energy ion beam source
US4066894A (en) * 1976-01-20 1978-01-03 University Of Virginia Positive and negative ion recording system for mass spectrometer
US4159423A (en) * 1976-10-01 1979-06-26 Hitachi, Ltd. Chemical ionization ion source
US4164654A (en) * 1978-02-14 1979-08-14 The South African Inventions Development Corporation Device for generating an atomic cloud
US4314180A (en) * 1979-10-16 1982-02-02 Occidental Research Corporation High density ion source
US4563610A (en) * 1982-12-20 1986-01-07 Nissin-High Voltage Co., Ltd. Device for generating negative-ion beams by alkaline metal ion sputtering
US5331158A (en) * 1992-12-07 1994-07-19 Hewlett-Packard Company Method and arrangement for time of flight spectrometry
US5808308A (en) * 1996-05-03 1998-09-15 Leybold Inficon Inc. Dual ion source
US6759807B2 (en) 2002-04-04 2004-07-06 Veeco Instruments, Inc. Multi-grid ion beam source for generating a highly collimated ion beam
US20050017645A1 (en) * 2002-04-04 2005-01-27 Wahlin Erik Karl Kristian Multi-grid ion beam source for generating a highly collimated ion beam
US7045793B2 (en) 2002-04-04 2006-05-16 Veeco Instruments, Inc. Multi-grid ion beam source for generating a highly collimated ion beam
US20080067410A1 (en) * 2004-12-28 2008-03-20 Kyoto Institute Of Technology Charged Particle Generator and Accelerator
US7550753B2 (en) * 2004-12-28 2009-06-23 Kyoto Institute Of Technology Charged particle generator and accelerator
US7402799B2 (en) * 2005-10-28 2008-07-22 Northrop Grumman Corporation MEMS mass spectrometer
US20070096023A1 (en) * 2005-10-28 2007-05-03 Freidhoff Carl B MEMS mass spectrometer
US9594879B2 (en) 2011-10-21 2017-03-14 California Instutute Of Technology System and method for determining the isotopic anatomy of organic and volatile molecules
US10665329B2 (en) 2011-10-21 2020-05-26 California Institute Of Technology High-resolution mass spectrometer and methods for determining the isotopic anatomy of organic and volatile molecules
US9697338B2 (en) 2011-10-21 2017-07-04 California Institute Of Technology High-resolution mass spectrometer and methods for determining the isotopic anatomy of organic and volatile molecules
CN103313502A (zh) * 2012-03-08 2013-09-18 株式会社东芝 离子源、重粒子线照射装置及方法、离子源的驱动方法
CN103313502B (zh) * 2012-03-08 2016-01-20 株式会社东芝 离子源、重粒子线照射装置及方法、离子源的驱动方法
US9087678B2 (en) * 2012-03-08 2015-07-21 Kabushiki Kaisha Toshiba Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method
US20130234036A1 (en) * 2012-03-08 2013-09-12 Kabushiki Kaisha Toshiba Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method
US20140097338A1 (en) * 2012-10-10 2014-04-10 California Institute Of Technology Mass spectrometer, system comprising the same, and methods for determining isotopic anatomy of compounds
US10186410B2 (en) * 2012-10-10 2019-01-22 California Institute Of Technology Mass spectrometer, system comprising the same, and methods for determining isotopic anatomy of compounds
US20190103262A1 (en) * 2012-10-10 2019-04-04 California Institute Of Technology Mass spectrometer, system comprising the same, and methods for determining isotopic anatomy of compounds
US10559457B2 (en) * 2012-10-10 2020-02-11 California Institute Of Technology Mass spectrometer, system comprising the same, and methods for determining isotopic anatomy of compounds
US20190189417A1 (en) * 2017-09-29 2019-06-20 Perkinelmer Health Sciences Canada, Inc. Off-axis ionization devices and systems using them
US10658167B2 (en) * 2017-09-29 2020-05-19 Perkinelmer Health Sciences Canada, Inc. Off-axis ionization devices and systems using them
US11328919B2 (en) * 2018-05-11 2022-05-10 Leco Corporation Two-stage ion source comprising closed and open ion volumes

Also Published As

Publication number Publication date
NL6918712A (enrdf_load_stackoverflow) 1970-06-19
GB1252569A (enrdf_load_stackoverflow) 1971-11-10
FR2026374A1 (enrdf_load_stackoverflow) 1970-09-18
SE356396B (enrdf_load_stackoverflow) 1973-05-21
DE1962617A1 (de) 1970-07-16

Similar Documents

Publication Publication Date Title
US3849656A (en) Plural sample ion source
US4894546A (en) Hollow cathode ion sources
US4793961A (en) Method and source for producing a high concentration of positively charged molecular hydrogen or deuterium ions
SE8700017L (sv) Jonplasmaelektrokanon
US3955091A (en) Method and apparatus for extracting well-formed, high current ion beams from a plasma source
US3999072A (en) Beam-plasma type ion source
US4159423A (en) Chemical ionization ion source
US3579270A (en) Energy selective ion beam intensity measuring apparatus and method utilizing a scintillator to detect electrons generated by the beam
US11495447B2 (en) Ionizer and mass spectrometer
RU2554104C2 (ru) Масс-спектрометрический анализатор газового течеискателя
US3731089A (en) Mass spectrometer ion source having means for rapidly expelling ions from the source and method of operation
US4891525A (en) SKM ion source
US3860848A (en) High pressure ion source for ion optical analytical equipment and for particle accelerators
US2770735A (en) Non-poisoning mass spectrometer
US2894136A (en) Ion source
US4447724A (en) Apparatus for the chemical analysis of samples
US3514666A (en) Charged particle generator yielding a mono-energetic ion beam
US3341727A (en) Ionization gauge having a photocurrent suppressor electrode
Wallington Plural sample ion source
US3761708A (en) Electron suppressor grid for a mass spectrometer
WO1996026530A1 (en) Generator of ribbon-shaped ion beam
US3157784A (en) Ion source for a mass spectrometer
US2716197A (en) Ion source
US3505518A (en) Ion sources for mass spectrometers
US3138736A (en) Electron beam generator system