US3787296A - Non-poisonous zinc plating baths - Google Patents
Non-poisonous zinc plating baths Download PDFInfo
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- US3787296A US3787296A US00132218A US3787296DA US3787296A US 3787296 A US3787296 A US 3787296A US 00132218 A US00132218 A US 00132218A US 3787296D A US3787296D A US 3787296DA US 3787296 A US3787296 A US 3787296A
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- zinc
- bath
- baths
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- 239000011701 zinc Substances 0.000 title claims abstract description 65
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 title claims abstract description 62
- 229910052725 zinc Inorganic materials 0.000 title claims abstract description 62
- 238000007747 plating Methods 0.000 title abstract description 74
- -1 sulfate compound Chemical class 0.000 claims abstract description 53
- 238000009713 electroplating Methods 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 abstract description 71
- 239000000203 mixture Substances 0.000 abstract description 32
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 abstract description 9
- 150000003863 ammonium salts Chemical class 0.000 abstract description 8
- 150000003751 zinc Chemical class 0.000 abstract description 8
- 231100000614 poison Toxicity 0.000 abstract description 5
- 230000007096 poisonous effect Effects 0.000 abstract description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 14
- 239000004721 Polyphenylene oxide Substances 0.000 description 14
- 229910052751 metal Chemical group 0.000 description 14
- 239000002184 metal Chemical group 0.000 description 14
- 229920000570 polyether Polymers 0.000 description 14
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 13
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 12
- 239000000654 additive Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 235000019270 ammonium chloride Nutrition 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 6
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 239000011592 zinc chloride Substances 0.000 description 6
- 235000005074 zinc chloride Nutrition 0.000 description 6
- 239000010953 base metal Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 239000002699 waste material Substances 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 125000000623 heterocyclic group Chemical group 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 3
- 229960001763 zinc sulfate Drugs 0.000 description 3
- 229910000368 zinc sulfate Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 2
- 239000005695 Ammonium acetate Substances 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 2
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- 229930195725 Mannitol Natural products 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 235000019257 ammonium acetate Nutrition 0.000 description 2
- 229940043376 ammonium acetate Drugs 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 210000001787 dendrite Anatomy 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000000594 mannitol Substances 0.000 description 2
- 235000010355 mannitol Nutrition 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005185 salting out Methods 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 1
- XSAYZAUNJMRRIR-UHFFFAOYSA-N 2-acetylnaphthalene Chemical compound C1=CC=CC2=CC(C(=O)C)=CC=C21 XSAYZAUNJMRRIR-UHFFFAOYSA-N 0.000 description 1
- WXYKQNAKEPRCGF-UHFFFAOYSA-N 2-methylquinoline-3-carboxylic acid Chemical compound C1=CC=C2C=C(C(O)=O)C(C)=NC2=C1 WXYKQNAKEPRCGF-UHFFFAOYSA-N 0.000 description 1
- NDKSDABMEKCABD-UHFFFAOYSA-N 7-aminoquinoline-3-carboxylic acid Chemical compound C1=C(C(O)=O)C=NC2=CC(N)=CC=C21 NDKSDABMEKCABD-UHFFFAOYSA-N 0.000 description 1
- JGRPKOGHYBAVMW-UHFFFAOYSA-N 8-hydroxy-5-quinolinecarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(O)C2=N1 JGRPKOGHYBAVMW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 101100496169 Arabidopsis thaliana CLH1 gene Proteins 0.000 description 1
- 101100264195 Caenorhabditis elegans app-1 gene Proteins 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- UEXCJVNBTNXOEH-UHFFFAOYSA-N Ethynylbenzene Chemical group C#CC1=CC=CC=C1 UEXCJVNBTNXOEH-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 101100044057 Mesocricetus auratus SYCP3 gene Proteins 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 101100080600 Schizosaccharomyces pombe (strain 972 / ATCC 24843) nse6 gene Proteins 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 101150111293 cor-1 gene Proteins 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- XAAKCCMYRKZRAK-UHFFFAOYSA-N isoquinoline-1-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=NC=CC2=C1 XAAKCCMYRKZRAK-UHFFFAOYSA-N 0.000 description 1
- MCVMLYSLPCECGO-UHFFFAOYSA-N isoquinoline-4-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CN=CC2=C1 MCVMLYSLPCECGO-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 101150085091 lat-2 gene Proteins 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical compound C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000000176 sodium gluconate Substances 0.000 description 1
- 235000012207 sodium gluconate Nutrition 0.000 description 1
- 229940005574 sodium gluconate Drugs 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/22—Electroplating: Baths therefor from solutions of zinc
Definitions
- ABSTRACT A non-poisonous zinc plating bath comprising a fundamental plating composition including zinc salt and ammonium salt with or without hydroxy carboxylic acid; a sulfate compound or compounds having the general formula A.B -4CH CH Oi- -.mSO M; an alkylnaphthylketon compound or compounds having the general formula R COR1;
- This invention relates to novel and improved nonpoisonous zinc plating baths which contain no cyanide therein and which can effectively eliminate occurrence of harmful environmental contamination even when the waste liquids from the baths are discarded out of the system.
- One typical prior art zinc plating bath for use in zincplating the surfaces of various base metals has the composition which principally comprises 80 g/l of sodium hydroxide, 35 g/l of Zn and lOO g/l of sodium cyanide and the waste liquid from the plating bath includes cyan-containing substances in a substantially high concentration. Therefore, when the waste liquid, is discarded out of the system into a river or sea, for example, the liquid will seriously contaminate the water in the river or sea.
- Another object of the present invention is to provide a non-poisonous zinc plating bath which has a wide range of brilliance-imparting current density available, can be effectively applicable to barrel plating, is excellent in performance and will not cause harmful environmental contamination.
- the non-poisonous zinc plating bath of the present invention generally comprises (a) a conventional zinc plating composition comprising zinc salts and ammonium salt with or without hydroxy carboxylic acid; (b) a sulfate compound or compounds of polyether having the below-mentioned general formula:
- A is hydrogen, CI'IHQ" l (n is an integral within the range of 4 20), alkylphenylene, residue after removal of the hydroxy group from molecules of sorbitol or mannitol or residue of alkylpolyamine
- B is a bridge selected from the group comprising -COO, -NH, S', O, (OCH CH CH2O)7 and CONH
- M is hydrogen, ammonium or a metal selected from the group'comprising, sodium
- R is a group selected from the group comprising hydrogen, halogen, alkyl, alkoxyl, aryl, amino, nitro, hydroxyl, carboxyl, sulfo,- sulfomoyl, substituted sulfomoyl, hydroxycarboxyalkyl, carboxy vinylene, carboxy phenylene, carboxyalkyi, phenylvinylene and mercapto.
- Zinc salts, ammonium salts and hydroxy carboxylic acids to be blended with the other components of the zinc plating baths of the invention may be those usually employed in the conventional zinc plating baths compositions and the zinc salts useful in the baths of the invention include zinc chloride, zinc sulfate and zinc sulfaminate. These zinc salts can be employed in amounts tag in .19, t 2QQs/Llh9a91m msa useful in the baths of the invention include ammonium chloride, ammonium sulfate and ammonium acetate and these ammonium salts can be employed in amounts ranging from 20 to 350 g/l with satisfactory results.
- hydroxy carboxylic acids useful in the baths of the invention include maleic acid, citric acid, gluconic acid, tartaic acid and lactic acid and these hydroxy carboxylic acids can be optionally employed in amounts ranging from 1 to 100 g/l.
- any one of the above-mentioned zinc salts and any one of the above-mentioned ammonium salts are blended together or alternatively, anyone of the abovementioned hydroxy carboxylic acids is further added to the blend. Thereafter, the resulting mixture is added thereto the compounds represented by the general formulas I (2) and (3), respectively, thereto to prepare non-poisonous zinc plating baths.
- the mixture of zinc and ammonium salts with or without hydroxy carboxylic acid will be referred to as the fundamental bath composition hereinafter.
- the nitrogen-containing heterocyclic ring compound or compounds substituted with carboxyl group having the general formula (3) have buffering action upon the pH of the plating bath thereby to facilitate the pH control of the plating bath.
- the nitrogen-containing heterocyclic ring carboxylic acid compound or compounds extend the current density range of the plating bath available to impart brilliance to the surfaces of a base metal to be plated and in other words, the compound or compounds serve to reduce the necessary brillianceimparting currency density from a higher value portion thereby to substantially improve the brilliance and covering power of deposit metal on the base metal even when the bath is employed for barrel plating which must be usually carried out at a relatively low current density.
- Such a zinc plating bath cannot be employed forrack and barrel platings which require the brillianceimparting current density range of 0.5- A/dm and 0.1-3 A/dm respectively.
- the above-mentioned control bath was added thereto 3 g/l of quinaldinic acid which is a typical nitrogencontaining heterocyclic ring compound substituted base metal, it was surprisingly found that the brillianceimparting current density range of the bath containing the carboxylic acid compound was extended to the range of 0.1 2O A/dm and could be suitably employed for plating articles having complicate contours and shapes with satisfactory results. It was also found that the bath with the addition of the carboxylic acid compound could be satisfactorily employed for barrel plating which would generally require a relatively low current density.
- the amount range of the additive carboxylic acid compound or compounds is preferably within the range of 0.1 15 g/l.
- the pH of the zinc plating bath of the invention is preferably maintained within the range of 3.0 10. The reason is that when the pH is below 3.0, the plated product will be readily subjected to corrosion and the additive carboxylic acid compound or compounds will salt out and on the other hand, when the pH is over 10, the ammonia contained in the bath is allowed to disperse by evaporation. Therefore, the pH of the bath is preferably maintained within the range of 3 10.
- the temperature of the plating bath is preferably maintained within the range of l0-50C.
- plating operations employing baths of the nonpoisonous zinc plating compositions of the invention can be performed while the baths being maintained static, better results will be obtained when the baths are air-agitated or by the adoption of the so-called cathode rocker system.
- Typical nitrogen-containing heterocyclic ring compounds substituted with carboxyl group which are suitably employed in the present invention will be given hereinbelow, and in connection with this it is to be understood that they can be employed either in their simple forms or in the forms of various mixtures thereof.
- the sulfate compound or compounds of polyether when employed in conjunction with the fundamental bath composition serve to suitably control the electrodeposition of zinc and this is considered due to the fact that a thin colloidal film is probably formed in the cathode because of the structure of +CH CH O #present in the molecules of the polyether compound or compounds.
- the sulfate compound or compounds of polyether may serve to control extra-ordinary deposition of zinc at high current densities thereby to prevent the formation of dendrite.
- the suitable amount of the sulfate compound or compounds of polyether to be added to the baths of the invention when the sulfate compound or compounds are employed in amounts less than 0.1 g/l, the abovementioned operative effects cannot befully realized and on the other hand, when the amount is over 30 g/l, the obtained deposit metal will be brittleand will be readily subjected to salting-out. Therefore, the sulfate compound or compounds of polyether are preferably employed in amounts from 0.1 to 30 g/l.
- Typical sulfate compounds of polyether to be employed in the baths of the present invention will be shown hereinbelow by their chemical formulas. These sulfate compounds may be employed either in their simple forms or in the forms of mixtures thereof with h P ti mpsr t an as. .4
- zinc plating baths were prepared by adding acetophenone in the amount range from 0.1 to 20 g/l to the fundamental composition including a sulfate compound or compounds of polyether in the abovementioned amount range and a heterocyclic ring compound or compounds substituted with carboxyl group in the above-mentioned amount range as taught in the above-mentioned French patent, but the brillianceimparting current density range of these baths was narrow such as being 0.5 2 A/dm whereas in the others of the experiments, plating baths were prepared by adding an alkylnaphthylketon compound or compounds in the above-mentioned amount range to the fundamental composition including the compound or compounds of the general formula (1) and the compound or compounds of the general formula (3) without the use of acetophenone and the brilliancem122tt ns q nt sistt it nsz .that?
- bathin 9 wider such as being 0.1 to 20 A/dm and bright plated products were obtained over.
- an alkylnaphthylketon compound or compounds to be added to the plating baths of the invention when the 8 l2.
- 1-hydroxy-4-chl6r6 2 a etonaphihbri 13.
- 1-carboxy-5-acetonaphthone 14.
- 5-chl0ro-2-acet0naphth0ne 20 respectively to prepare the zinc plating baths.
- Test 2 5-methyl-2-acet0naphth ne pieces were zinc-plated using the thus prepared baths 3. S-amino-l-acetonaphthone under the conditions such as the temperature of 30C, 4. 1,5-diacetonaphthone the current density of 3 A/dm and pH of 5.0 while agi- 5. acetonaphthone (l or 2) tating the baths with air.
- the zinc-plated test pieces 6. 2-phenylnaphthylketone were measured or observed in accordance with the 7.
- a zinc plating bath was prepared by adding 10 g/l of cgH g SO Na as a Sulfate Compound of polyether, 3 g/l of 2-methyl-3- carboxyquinoline as a carboxylic acid compound of nitrogen-containing heterocyclic ring and 0.6 g/l of 5-chloro-2-acetylnaphton as an alkylnaphthylketon compound to the fundamental composition comprising 120 g/l of zinc chloride and 190 g/l of ammonium chloride and a zinc plating operation was conducted using the bath under the conditions such as the temperature of 25C, the pH of 5.0 and the current density of 5 A/dm" for minutes. The obtained deposit metal had a high brilliance.
- a zinc plating bath was prepared by adding 8 g/l of EXAMPLE 3
- a zinc plating bath was prepared by adding 10 g/l of C,,H, +OCH CH CH O)-(CH CH OM SO Na, 3 g/l of nicotinic acid and 2.5 g/l of B-sulfo-Z-acetylnaphton to the fundamental plating composition comprising 200 g/l of zinc sulfate, 30 g/l of ammonium chloride and g/l of sodium salt of maleic acid and a zinc plating operation was conducted using the bath under the conditions such as the temperature of C, the pH of 1,5
- the obtained deposit metal had a high brilliance.
- a zinc plating bath was prepared by adding l5 g/l of carboxyisoquinoline and 0.9 g/l of S-methyl-B- acetonaphton to the fundamental composition comprising 40 g/l of zinc chloride and 230 g/l of ammonium chloride and a zinc plating operation was conducted using the bath under the conditions such as the temperature of 35C.
- the pH adjusted to 7.2 with ammonia water and the current density of 2 A/dm for l0 minutes.
- the obtained deposit metal had high brilliance and softness.
- a zinc plating bath was'prepared by adding 5 g/l of H O (CH CH SO Na, 3 g/l of HS (CH- C- H 055 SO Na and 3 g/l of 4-carboxyisoquinone and 0.3 g/l of 5chloro-B-acethyl-naphton to the fundamental composition comprising 30 g/l of zinc chloride and 250 g/l of ammonium chloride and a zinc plating operation was conducted using the bath under the conditions such as the temperature of about 30C, the pH of about 5.0 and the current density of 2 A/dm for 10 minutes. The obtained deposit metal had a high brilliance.
- An aqueous cyanide-free zinc electroplating bath containing (a) a water soluble zinc salt selected from the group consisting of zinc chloride, zinc sulfate and zinc sulfaminate, a water-soluble ammonium salt selected from the group consisting of ammonium chloride, ammonium sulfate and ammonium acetate, and optionally a hydroxycarboxylic acid; (b) from 0.1 to 30 gm/liter of at least one sulfate compound of the formula wherein A is selected from the group consisting of hydrogen, C,,H with n being an integer of 4 to 20, al-
- kylphenyl, sorbitol, mannitol, alkylpolyamine B is a member selected from the group consisting of H O) and CONH
- M is selected from the group consisting of hydrogen, ammonium, alkali metal, alkaline earth metal and zinc; (c) from 0.01 to 5.0 gm/liter of at least one alkylnaphthylketone of the formula ll R ⁇ N/ COOH wherein is a heterocyclic ring selected from the group consisting 14- of 5151151; in which s aid bath confiifi sTro mfi3 to 2f5 gm/liter of said alkylnaphthylketone.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Other In-Based Heterocyclic Compounds (AREA)
- Pyridine Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Quinoline Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP45034717A JPS4840543B1 (enrdf_load_stackoverflow) | 1970-04-24 | 1970-04-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3787296A true US3787296A (en) | 1974-01-22 |
Family
ID=12422071
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00132218A Expired - Lifetime US3787296A (en) | 1970-04-24 | 1971-04-07 | Non-poisonous zinc plating baths |
Country Status (4)
Country | Link |
---|---|
US (1) | US3787296A (enrdf_load_stackoverflow) |
JP (1) | JPS4840543B1 (enrdf_load_stackoverflow) |
FR (1) | FR2086320B1 (enrdf_load_stackoverflow) |
GB (1) | GB1327291A (enrdf_load_stackoverflow) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3909374A (en) * | 1974-09-27 | 1975-09-30 | Kewanee Oil Co | Zinc electroplating baths and process |
FR2445397A1 (fr) * | 1978-12-26 | 1980-07-25 | Rohco Inc | Bains acides de zingage et procedes pour l'electrodeposition de depots brillants de zinc |
US4229268A (en) * | 1979-07-09 | 1980-10-21 | Rohco, Inc. | Acid zinc plating baths and methods for electrodepositing bright zinc deposits |
US4270989A (en) * | 1979-12-21 | 1981-06-02 | Rohco, Inc. | Cadmium plating baths and methods for electrodepositing bright cadmium deposits |
US4496439A (en) * | 1982-12-29 | 1985-01-29 | Basf Aktiengesellschaft | Acidic zinc-plating bath |
US4592809A (en) * | 1985-08-06 | 1986-06-03 | Macdermid, Incorporated | Electroplating composition and process and surfactant compound for use therein |
CN103397316A (zh) * | 2013-07-18 | 2013-11-20 | 胜宏科技(惠州)股份有限公司 | 一种酸性化学镀铜复合添加剂及其制备方法和使用方法 |
CN103556139A (zh) * | 2013-07-18 | 2014-02-05 | 胜宏科技(惠州)股份有限公司 | 一种碱性化学镀铜复合添加剂及其制备方法和使用方法 |
CN105483762A (zh) * | 2015-11-30 | 2016-04-13 | 武汉奥克特种化学有限公司 | 一种用嵌段聚醚制备氯化钾镀锌载体光亮剂的方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2064585B (en) * | 1979-11-19 | 1983-11-09 | Enthone | Acid zinc electro plating solutions and methods utilizing ethoxylated/propoxylated polyhydric alcohols |
US4541906A (en) * | 1984-05-21 | 1985-09-17 | Omi International Corporation | Zinc electroplating and baths therefore containing carrier brighteners |
RU2400570C1 (ru) * | 2009-10-02 | 2010-09-27 | Сергей Юрьевич Киреев | Способ нанесения гальванических покрытий цинком |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2389181A (en) * | 1941-05-15 | 1945-11-20 | Udylite Corp | Electrodeposition of metals |
US2389179A (en) * | 1941-02-21 | 1945-11-20 | Udylite Corp | Electrodeposition of metals |
US2813065A (en) * | 1955-11-07 | 1957-11-12 | Harshaw Chem Corp | Heterocyclic nitrogen compound containing antimony plating solutions and process |
US3296105A (en) * | 1964-04-03 | 1967-01-03 | Du Pont | Zinc cyanide electroplating bath and process |
US3296104A (en) * | 1963-10-29 | 1967-01-03 | Hanson Van Winkle Munning Co | Electrodeposition of zinc from pyrophosphate solutions |
US3594291A (en) * | 1968-08-10 | 1971-07-20 | Schering Ag | Bright zinc plating from an acid electrolyte |
US3655534A (en) * | 1970-02-24 | 1972-04-11 | Enthone | Alkaline bright zinc electroplating |
-
1970
- 1970-04-24 JP JP45034717A patent/JPS4840543B1/ja active Pending
-
1971
- 1971-04-07 US US00132218A patent/US3787296A/en not_active Expired - Lifetime
- 1971-04-23 FR FR7114516A patent/FR2086320B1/fr not_active Expired
- 1971-12-21 GB GB1053871*[A patent/GB1327291A/en not_active Expired
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2389179A (en) * | 1941-02-21 | 1945-11-20 | Udylite Corp | Electrodeposition of metals |
US2389181A (en) * | 1941-05-15 | 1945-11-20 | Udylite Corp | Electrodeposition of metals |
US2813065A (en) * | 1955-11-07 | 1957-11-12 | Harshaw Chem Corp | Heterocyclic nitrogen compound containing antimony plating solutions and process |
US3296104A (en) * | 1963-10-29 | 1967-01-03 | Hanson Van Winkle Munning Co | Electrodeposition of zinc from pyrophosphate solutions |
US3296105A (en) * | 1964-04-03 | 1967-01-03 | Du Pont | Zinc cyanide electroplating bath and process |
US3594291A (en) * | 1968-08-10 | 1971-07-20 | Schering Ag | Bright zinc plating from an acid electrolyte |
US3655534A (en) * | 1970-02-24 | 1972-04-11 | Enthone | Alkaline bright zinc electroplating |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3909374A (en) * | 1974-09-27 | 1975-09-30 | Kewanee Oil Co | Zinc electroplating baths and process |
FR2445397A1 (fr) * | 1978-12-26 | 1980-07-25 | Rohco Inc | Bains acides de zingage et procedes pour l'electrodeposition de depots brillants de zinc |
US4229268A (en) * | 1979-07-09 | 1980-10-21 | Rohco, Inc. | Acid zinc plating baths and methods for electrodepositing bright zinc deposits |
US4270989A (en) * | 1979-12-21 | 1981-06-02 | Rohco, Inc. | Cadmium plating baths and methods for electrodepositing bright cadmium deposits |
US4496439A (en) * | 1982-12-29 | 1985-01-29 | Basf Aktiengesellschaft | Acidic zinc-plating bath |
US4592809A (en) * | 1985-08-06 | 1986-06-03 | Macdermid, Incorporated | Electroplating composition and process and surfactant compound for use therein |
CN103397316A (zh) * | 2013-07-18 | 2013-11-20 | 胜宏科技(惠州)股份有限公司 | 一种酸性化学镀铜复合添加剂及其制备方法和使用方法 |
CN103556139A (zh) * | 2013-07-18 | 2014-02-05 | 胜宏科技(惠州)股份有限公司 | 一种碱性化学镀铜复合添加剂及其制备方法和使用方法 |
CN103556139B (zh) * | 2013-07-18 | 2015-10-28 | 胜宏科技(惠州)股份有限公司 | 一种碱性化学镀铜复合添加剂及其制备方法和使用方法 |
CN105483762A (zh) * | 2015-11-30 | 2016-04-13 | 武汉奥克特种化学有限公司 | 一种用嵌段聚醚制备氯化钾镀锌载体光亮剂的方法 |
CN105483762B (zh) * | 2015-11-30 | 2018-10-26 | 武汉奥克特种化学有限公司 | 一种用嵌段聚醚制备氯化钾镀锌载体光亮剂的方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS4840543B1 (enrdf_load_stackoverflow) | 1973-12-01 |
FR2086320A1 (enrdf_load_stackoverflow) | 1971-12-31 |
GB1327291A (en) | 1973-08-22 |
FR2086320B1 (enrdf_load_stackoverflow) | 1974-04-05 |
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