US3761313A - Stripping of coated titanium electrodes - Google Patents
Stripping of coated titanium electrodes Download PDFInfo
- Publication number
- US3761313A US3761313A US00147608A US14760871A US3761313A US 3761313 A US3761313 A US 3761313A US 00147608 A US00147608 A US 00147608A US 14760871 A US14760871 A US 14760871A US 3761313 A US3761313 A US 3761313A
- Authority
- US
- United States
- Prior art keywords
- coating
- titanium
- stripping
- acid
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title abstract description 34
- 239000010936 titanium Substances 0.000 title abstract description 34
- 229910052719 titanium Inorganic materials 0.000 title abstract description 34
- 238000000576 coating method Methods 0.000 abstract description 39
- 239000011248 coating agent Substances 0.000 abstract description 32
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 21
- 238000000034 method Methods 0.000 abstract description 13
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract description 12
- 239000000203 mixture Substances 0.000 abstract description 9
- 229910044991 metal oxide Inorganic materials 0.000 abstract description 8
- 239000002253 acid Substances 0.000 abstract description 5
- 150000001875 compounds Chemical class 0.000 abstract description 5
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract description 5
- 239000011707 mineral Substances 0.000 abstract description 5
- 239000002243 precursor Substances 0.000 abstract description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract description 2
- 229910017604 nitric acid Inorganic materials 0.000 abstract description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 14
- 239000002184 metal Substances 0.000 description 14
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000001117 sulphuric acid Substances 0.000 description 8
- 235000011149 sulphuric acid Nutrition 0.000 description 8
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- -1 platinum group metals Chemical class 0.000 description 6
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 6
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 5
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- 235000010755 mineral Nutrition 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910001514 alkali metal chloride Inorganic materials 0.000 description 2
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 229940119177 germanium dioxide Drugs 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000004408 titanium dioxide Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002222 fluorine compounds Chemical group 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Inorganic materials [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/10—Other heavy metals
- C23G1/106—Other heavy metals refractory metals
Definitions
- the present invention relates to stripping of coated titanium electrodes for .re-coat-ing. More particularly it relates to a method for the removal'of a coating compris- "ing one or more platinum metal oxides from a titanium support which carries the coating, in'a manner which renders the titanium surface suitable for re-coating and without excessive loss oftitanium fromthe support.
- Electrodes particularly as anodes in cells electrolysing aqueous solutions of alkali metal chloride, a combination of a filmforming metal support and a .coating thereon comprising oxides of one or more of the platinum group metals in admixture with an oxide of a film-forming metal.
- a film-forming metal support and a .coating thereon comprising oxides of one or more of the platinum group metals in admixture with an oxide of a film-forming metal.
- the film-forming metal of both the support and the oxide coating mixture is most suitably titanium.
- Electrodes of the aforesaid type have advantages over prior art electrodes when empolyed as anodes in the electrolysis of alkali metal chloride solution in that they have both low chlorine overpotential characteristics and high resistance to electrochemical attack in use.
- the electrodes have avery low wear rate in the cell, their useful lives are not infinite and in time they must be replaced or re-coated in order to maintain optimum performance. When the electrodes are taken out of service they still retain an appreciable amount of the original coating and this must be removed if the titanium support is to be used as a support for a new coating. This presents the problem of removing the old coating cheaply and easily without at the same time removing an unacceptable amount of titanium metal from the support. Also, the method used for removing the old coating should desirably leave the surface of the titanium support in a suitable condition for re-coating without (further treatments, such as the conventional etching treatments, which necessarily remove further amounts of titanium metal.
- the present invention provides a solution to these problems of stripping oxide-coated titanium electrodes of the aforesaid type.
- a method for stripping the coating from an electrode comprising a titanium support and a coating comprising a platinum metal oxide thereon which comprises immersing the electrode in an aqueous mixture comprising at least one strong 3,761,313 Patented Sept. 25, 1973 mineral acid, other than nitric acid, with hydrofluoric acid and/or a precursor compound that will react with the mineral acid to give hydrofluoric acid, at a temperature and for a time sufiicient for the coating to become detached from the titanium support.
- the preferred mineral acid is hydrochloric acid or sulphuric acid.
- hydrochloric acid When hydrochloric acid is used it is preferably such that it comprises 20% to 40% hydrogen chloride by weight of the total of hydrogen chloride and water.
- sulphuric acid When sulphuric acid is used it is preferably 25%. to 100% by weight of the total of sulphuric acid and Water.
- the hydrofluoric acid is preferably present in a concentration of 0.01% to 8% hydrogen fluoride by weight of the mixture, particularly 0.02% to 4%. If a compound is used instead to react with the hydrochloric or sulphuric acid to give the hydrofluoric acid its concentration should be such that it will give the desired hydrofluoric acid concentration.
- the precursor is a fluoride which is preferably soluble in hydrochloric or sulphuric acid. Examples of such compounds include ammonium fluoride which is particularly preferred and alkali metal fluorides, e.g. sodium or potassium fluoride.
- the temperature of the mixture in which the stripping is carried out may be for example from 25 C. to 100 C., preferably 60 C. to 100 C.
- the time of immersion is not critical but generally the immersion need be no longer than one hour.
- the electrodes to be treated in accordance with the invention may have coatings in which the whole of the platinum metal content is in the form of platinum metal oxides.
- the method of the invention is, however, also applicable to coatings wherein a minor amount of the platinum metal content is in the form of free platinum metals, the remainder and major amount being in the form of oxides.
- the platinum metal content thus defined may consist of any one or more of the metals platinum, iridium, rhodium, osmium, ruthenium and palladium.
- the invention is applicable to electrodes in which the coating consists entirely of platinum group metals, mainly in the oxidised state, and also to electrodes in which the coating consists of platinum group metals, mainly in the oxidised state, in association with oxides of other metals, e.g. oxides of the film-forming metals and in particular titanium as well as other film-forming metals including zirconium, niobium, tantalum and tungsten.
- oxides with which the platinum group metal oxides may be associated include tin dioxide, germanium dioxide and oxides of antimony.
- Specific examples of these types of coatings are coatings of ruthenium dioxide in association with titanium dioxide and coatings of ruthenium dioxide in association with mixtures of tin dioxide and oxides of antimony.
- the invention is further illustrated by the following examples on the stripping of coatings consisting substantially of ruthenium oxide in admixture with titanium dioxide on titanium support.
- the weight of the coatings was in the range 15-20 g./m. of the titanium surface. All percentages are by weight.
- EXAMPLE 1 A section from a coated titanium electrode blade having the coating on both faces of the blade was immersed in a solution consisting of 80 ml. of 35% hydrochloric acid; 20 ml. of water and 0.08% ammonium fluoride (which results in an approximate HF concentration of 0.04%) at a temperature of C. After 45 minutes the coating had fallen away from the titanium support leaving a titanium surface suitable for re-coating. The loss of titanium was 9.4%.
- EXAMPLE 2 Another section from the coated titanium electrode blade as in Example 1 was immersed in a solution consisting of 100 vols. of 35 hydrochloric acid and 0.4% ammonium fluoride (which results in an approximate HF concentration of 0.2%) at a temperature of 85 C.
- EXAMPLE 3 EXAMPLE 4
- another section of the coated titanium electrode blade as in Example 1 was immersed in 80 vols. of 35% hydrochloric acid and 20 vols. of water but containing no fluoride. After 13 hours the coating had only been partly removed and the surface was unsuitable for re-coating.
- EXAMPLE 5 Another section of a coated titanium electrode blade was immersed in a solution consisting of 30 ml. of concentrated (98%) sulphuric acid, 70 ml. of water and 0.2% ammonium fluoride (which results in an approximate HF concentration of 0.1%) at a temperature of 80 C. After 53 minutes the coating had fallen away from the titanium support leaving a titanium surface suitable for re-coating. The loss of titanium was 8.1%.
- a method for stripping the coating from an electrode comprising a titanium support and a coating comprising a platinum metal oxide thereon which comprises immersing the electrode in an aqueous mixture comprising (1) hydrochloric acid in a range of 20%40%. hydrogen chloride by weight of the total of hydrogen chloride and water or (2) sulphuric acid in a range of 25 %100% by weight of the total of sulphuric acid and water mixed with (3) hydrofluoric acid in a concentration of 0.01% to 8% hydrogen fluoride by weight of the mixture, said immersing being carried out at a temperature and for a time suflicient for the coating to become detached from the titanium support.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2706770 | 1970-06-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3761313A true US3761313A (en) | 1973-09-25 |
Family
ID=10253625
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US00147608A Expired - Lifetime US3761313A (en) | 1970-06-04 | 1971-05-27 | Stripping of coated titanium electrodes |
Country Status (9)
Country | Link |
---|---|
US (1) | US3761313A (enrdf_load_stackoverflow) |
AU (1) | AU2965471A (enrdf_load_stackoverflow) |
BE (1) | BE767908A (enrdf_load_stackoverflow) |
CA (1) | CA919561A (enrdf_load_stackoverflow) |
FR (1) | FR2094044B1 (enrdf_load_stackoverflow) |
GB (1) | GB1290752A (enrdf_load_stackoverflow) |
IL (1) | IL36914A0 (enrdf_load_stackoverflow) |
SU (1) | SU426351A3 (enrdf_load_stackoverflow) |
ZA (1) | ZA713542B (enrdf_load_stackoverflow) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4017368A (en) * | 1974-11-11 | 1977-04-12 | General Electric Company | Process for electroplating zirconium alloys |
US4052253A (en) * | 1976-09-27 | 1977-10-04 | Motorola, Inc. | Semiconductor-oxide etchant |
US4132569A (en) * | 1977-10-25 | 1979-01-02 | Diamond Shamrock Corporation | Ruthenium recovery process |
US4322264A (en) * | 1975-12-09 | 1982-03-30 | U.S. Philips Corporation | Method for selective etching of titaniumdioxide relative to aluminum |
US4889589A (en) * | 1986-06-26 | 1989-12-26 | United Technologies Corporation | Gaseous removal of ceramic coatings |
US5141563A (en) * | 1989-12-19 | 1992-08-25 | Eltech Systems Corporation | Molten salt stripping of electrode coatings |
US6444010B1 (en) * | 1999-11-11 | 2002-09-03 | Nec Corporation | Platinum group impurity recovery liquid and method for recovering platinum group impurity |
US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
CN102560514A (zh) * | 2012-01-16 | 2012-07-11 | 南昌航空大学 | 一种用于退除钛及钛合金阳极氧化膜的弱酸性悬浮液 |
DE102007037246B4 (de) | 2006-08-10 | 2018-05-17 | GM Global Technology Operations LLC (n. d. Ges. d. Staates Delaware) | Verfahren zum recyceln einer beschichteten bipolaren platte aus rostfreiem stahl |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4874434A (en) * | 1988-05-16 | 1989-10-17 | Kerr-Mcgee Chemical Corporation | Method of treating a titanium structure |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3562013A (en) * | 1967-10-23 | 1971-02-09 | Diversey Corp | Process of deoxidizing titanium and its alloys |
-
1970
- 1970-06-04 GB GB2706770A patent/GB1290752A/en not_active Expired
-
1971
- 1971-05-21 CA CA113687A patent/CA919561A/en not_active Expired
- 1971-05-25 IL IL36914A patent/IL36914A0/xx unknown
- 1971-05-27 US US00147608A patent/US3761313A/en not_active Expired - Lifetime
- 1971-06-01 ZA ZA713542A patent/ZA713542B/xx unknown
- 1971-06-01 BE BE767908A patent/BE767908A/xx unknown
- 1971-06-03 AU AU29654/71A patent/AU2965471A/en not_active Expired
- 1971-06-03 FR FR7120118A patent/FR2094044B1/fr not_active Expired
- 1971-06-04 SU SU1665738A patent/SU426351A3/ru active
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4017368A (en) * | 1974-11-11 | 1977-04-12 | General Electric Company | Process for electroplating zirconium alloys |
US4322264A (en) * | 1975-12-09 | 1982-03-30 | U.S. Philips Corporation | Method for selective etching of titaniumdioxide relative to aluminum |
US4052253A (en) * | 1976-09-27 | 1977-10-04 | Motorola, Inc. | Semiconductor-oxide etchant |
US4132569A (en) * | 1977-10-25 | 1979-01-02 | Diamond Shamrock Corporation | Ruthenium recovery process |
US4889589A (en) * | 1986-06-26 | 1989-12-26 | United Technologies Corporation | Gaseous removal of ceramic coatings |
US5141563A (en) * | 1989-12-19 | 1992-08-25 | Eltech Systems Corporation | Molten salt stripping of electrode coatings |
US6444010B1 (en) * | 1999-11-11 | 2002-09-03 | Nec Corporation | Platinum group impurity recovery liquid and method for recovering platinum group impurity |
DE102007037246B4 (de) | 2006-08-10 | 2018-05-17 | GM Global Technology Operations LLC (n. d. Ges. d. Staates Delaware) | Verfahren zum recyceln einer beschichteten bipolaren platte aus rostfreiem stahl |
US20110017608A1 (en) * | 2009-07-27 | 2011-01-27 | Faraday Technology, Inc. | Electrochemical etching and polishing of conductive substrates |
CN102560514A (zh) * | 2012-01-16 | 2012-07-11 | 南昌航空大学 | 一种用于退除钛及钛合金阳极氧化膜的弱酸性悬浮液 |
Also Published As
Publication number | Publication date |
---|---|
BE767908A (fr) | 1971-12-01 |
ZA713542B (en) | 1973-01-31 |
AU2965471A (en) | 1972-12-07 |
FR2094044A1 (enrdf_load_stackoverflow) | 1972-02-04 |
GB1290752A (enrdf_load_stackoverflow) | 1972-09-27 |
FR2094044B1 (enrdf_load_stackoverflow) | 1975-07-04 |
SU426351A3 (enrdf_load_stackoverflow) | 1974-04-30 |
CA919561A (en) | 1973-01-23 |
IL36914A0 (en) | 1971-07-28 |
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