US3753872A - Method of and bath for producing microcrack chromium coatings - Google Patents
Method of and bath for producing microcrack chromium coatings Download PDFInfo
- Publication number
- US3753872A US3753872A US00216724A US3753872DA US3753872A US 3753872 A US3753872 A US 3753872A US 00216724 A US00216724 A US 00216724A US 3753872D A US3753872D A US 3753872DA US 3753872 A US3753872 A US 3753872A
- Authority
- US
- United States
- Prior art keywords
- nickel
- acid
- chromium
- bath
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000576 coating method Methods 0.000 title abstract description 29
- 229910052804 chromium Inorganic materials 0.000 title abstract description 23
- 239000011651 chromium Substances 0.000 title abstract description 23
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract description 22
- 238000000034 method Methods 0.000 title description 9
- 239000011248 coating agent Substances 0.000 abstract description 21
- 238000009713 electroplating Methods 0.000 abstract description 15
- 239000000758 substrate Substances 0.000 abstract description 14
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 abstract description 13
- 150000003839 salts Chemical class 0.000 abstract description 6
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 4
- 239000005711 Benzoic acid Substances 0.000 abstract description 3
- 235000010233 benzoic acid Nutrition 0.000 abstract description 3
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 abstract description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 53
- 229910052759 nickel Inorganic materials 0.000 description 26
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- 238000007747 plating Methods 0.000 description 14
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 12
- 229910052742 iron Inorganic materials 0.000 description 11
- 229910017052 cobalt Inorganic materials 0.000 description 10
- 239000010941 cobalt Substances 0.000 description 10
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- -1 iron and steel Chemical class 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229910001429 cobalt ion Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ZOMNIUBKTOKEHS-UHFFFAOYSA-L dimercury dichloride Chemical class Cl[Hg][Hg]Cl ZOMNIUBKTOKEHS-UHFFFAOYSA-L 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229960003424 phenylacetic acid Drugs 0.000 description 2
- 239000003279 phenylacetic acid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- QVYYOKWPCQYKEY-UHFFFAOYSA-N [Fe].[Co] Chemical compound [Fe].[Co] QVYYOKWPCQYKEY-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- XRBURMNBUVEAKD-UHFFFAOYSA-N chromium copper nickel Chemical compound [Cr].[Ni].[Cu] XRBURMNBUVEAKD-UHFFFAOYSA-N 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000003003 spiro group Chemical group 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
Definitions
- a microcrack chromium coating is applied by electroplating it upon a coating of nickel, cobalt, nickel-cobalt, nickel-iron or iron-cobalt previously electrodeposited upon a substrate, e.g. of steel, from an electroplating bath containing 5 g./liter to the limit of solubility of at least one aromatic mono-, dior polycarboxylic acid anhydride or salt.
- the aromatic carboxylic acid is benzoic acid, phthalic acid or phenylacetic acid and is present in an amount of 5 g./liter to 70 g./liter or the limit of solubility whichever is less, the electroplatinng is carried out at a temperature of 35 to 70 C. and the current density of 3 to a./dm.
- microcrack chromium coating has the advantage of excellent corrosion-protection characteristics and these characteristics are enhanced when it is formed as the final layer in a corrosion-resistant system consisting of copper-nickel-chromium or nickel-chromium upon steel or iron bodies and upon pressure-cast zinc.
- the copper and nickel coatings may be deposited from a combined electrolyte or from individual electrolytic baths.
- the chromium layer is applied to a bright-nickel electrodeposited coating and is found to have relatively high internal stress and relatively low elongation-to-break valves.
- An electrolyte must be used which provides high dispersion if the optimal plating-thickness distribution is to be reached.
- the chromium coating is then electroplated with a final chromium coating from a second chromium-plating bath.
- the quality of such electrodeposited layers often leaves much to be desired and they have low bonding-strength tolerance to mechanical distortion.
- Similar chromium coatings which are rendered microporous by incorporating nonconductive particles in the underlying nickel coating, have similar disadvantages.
- the nickel coating is not a high-internal-stress layer (a stress of the order of 980 N/mm. being common) while the elongation-to-break or failure load is about 0.5 and, therefore, relatively high.
- the anticorrosion character of such nickel coatings tested in accordance with German Industrial Standards DIN 50,958 without kaolin or in accordance with ASTM standard B380, against a saturated calomel electrode in a Corrodkote solvents, revealed a potential of the layer of 300 to 500 mv. which is unsatisfactory.
- a further disadvantage of this latter system is that high current densities during electrodeposition result in clouding of the deposit, especially when the substrate is exposed to the plating conditions for a long period.
- the principal object of the present invention is to provide an improved electroplating bath for the electrodeposition of an intermediate nickel layer upon a substrate such that the subsequent chromium deposit Will have a high and uniform microcrack character.
- Yet another object of the invention is to provide an improved method of applying corrosion-resistant coatings to metallic substrates.
- the invention resides in the provision of an electrolyte or electroplating bath for the formation of the intermediate layer, which contains nickel, cobalt, nickel-and-cobalt, nickel-and-iron or iron-and-cobalt ions, the usual ammonium and chloride ions common in nickel and cobalt-plating baths and the customary additives thereto together with at least one aromatic mono-, dior polycarboxylic acid or a salt thereof (or the anhydride thereof which is converted to salt or free acid upon addition).
- the intervening coating is a nickel layer deposited from a nickel electroplating bath of conventional composition except for inclusion of at least 5 grams per liter (g./l.) of the aromatic carboxylic acid which can be present in amounts up to the limit of solubility thereof in the aqueous electroplating bath.
- the aromatic carboxylic acid is benzoic acid, phthalic acid or phenylacetic acid and in the case of phthalic acid may be of the auto-, meta-, or paraform.
- the aromatic carboxylic acid is present in an amount between 5 to 70 g./l. or the limit of solubility whichever is less. More preferably, the aromatic carboxylic acid is present in an amount between 20 to 60 g./l.
- the nickel-plating bath (or the cobalt-containing plating bath as the case may be) will contain the ususal substances employed in the deposition of the respective coatings. Reference is made in this respect to the Encyclopedia of Electrochemistry, Reinhard Publishing Corporation, New York, 1964.
- the metal ions are present in an amount ranging from 30 to 100 g./l. and will be nickel and cobalt and combinations thereof with one another or with iron, the metal ions being introduced into an aqueous bath in the form of the sulfate, sulfamate, chloride, fluorborate, fluoride and/or acetate.
- the bath further should contain 10 to 150 g./l.
- chloride introduced in the form of nickel, cobalt, iron, ammonium, magnesium or alkali-metal (lithium, sodium, potassium) chloride. 10 to 100 g. of ammonium ion may also be present and, if desired, boric acid in conventional quantities.
- the chromium coating is applied in accordance with the conventional technique described above. It is found that the system of the invention can operate at high current densities without significant clouding of the intermediate layer, that in all cases Within the temperature range of the present invention there is a volatilization of liquid from the bath so that replenishing chemicals can be added without increasing the volume, that the intermediate coating has an internal stress above 1960 N/mm. and an elongation to break of less than 0.1%.
- the potential of the intervening layer measured against a saturated calomel electrode in accordance with DIN 5 0,95 8 and ASTM B380 as described above is between -100 and l50 mv., and thus is not disadvantageous from the point of view of corrosion protection.
- Electrodeposition was carried out for a period of three minutes at a pH of 3.0 to 3.9, a temperature of 40 to 50 C. and a current density of 5 to 10 a../drn. against the nickel electrode.
- the unclouded nickel layer was washed and coated with chromium in an aqueous bath containing 300 g./liter chromic acid, 2.5 g./1iter sulfuric acid and 1-3 g./liter aluminum silicofluoride.
- the chromium plating was carried out at a temperature of 30 C. and a current density of 6 a. ldm.
- the nickel coating was found to have an internal stress value of 1960 N/mm? and a potential of -100 mv. measured as described above.
- the elongation at break was about 0.09% and the chromium coating had a crack count of 300-850 cracks per cm. uniformly distributed over the electroplated region.
- the chromium-plating step is carried out using a bright-chromium plating bath under cold conditions as described in the aforementioned publications at a temperature of 25 to 35 C. and a current density of 3 to 12 a./dm.
- a method of coating a metal substrate to restrict corrosion thereof comprising applying a first metallic layer to said substrate by electroplating nickel, cobalt or a combination thereof, or a combination of either with iron onto said substrate from a aqueous acidic electroplating bath containing the respective metal ions, ammonium ion and chloride ion together with 20 to 60 g./l. of phthalic acid and thereafter electrodepositing a chromium layer upon said first layer to produce a microcrack coating.
- An aqueous acidic electroplating bath containing essentially 30 to g./l. of nickel or cobalt ion individually or in combination, or in combination either with iron ion, 10 to g./1. chloride ion, 1 to 100 g./liter ammonium ion and 20 g./1. to 60 g./l. of phthalic acid.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2100971A DE2100971B2 (de) | 1971-01-11 | 1971-01-11 | Verfahren und Bad zur Erzeugung mikrorissiger Chromschichten über Zwischenschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3753872A true US3753872A (en) | 1973-08-21 |
Family
ID=5795549
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US00216724A Expired - Lifetime US3753872A (en) | 1971-01-11 | 1972-01-10 | Method of and bath for producing microcrack chromium coatings |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3753872A (enExample) |
| DE (1) | DE2100971B2 (enExample) |
| FR (1) | FR2123246B1 (enExample) |
| GB (1) | GB1371172A (enExample) |
| IT (1) | IT946426B (enExample) |
| SE (1) | SE401209B (enExample) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3901773A (en) * | 1972-08-01 | 1975-08-26 | Langbein Pfanhauser Werke Ag | Method of making microcrack chromium coatings |
| US5871641A (en) * | 1996-05-30 | 1999-02-16 | H-Tech, Inc. | Fluid filter with pleated septum |
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| US20120157297A1 (en) * | 2010-12-16 | 2012-06-21 | Nguyen Thien Duyen Thi | Catalysts and methods of preparation of catalyst |
| US9315736B2 (en) | 2010-12-16 | 2016-04-19 | Energia Technologies, Inc. | Methods of fuel production |
| US11377748B2 (en) * | 2017-11-20 | 2022-07-05 | Basf Se | Composition for cobalt electroplating comprising leveling agent |
| US12098473B2 (en) * | 2018-12-21 | 2024-09-24 | Basf Se | Composition for cobalt plating comprising additive for void-free submicron feature filling |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3471271A (en) * | 1965-08-16 | 1969-10-07 | Udylite Corp | Electrodeposition of a micro-cracked corrosion resistant nickel-chromium plate |
-
1971
- 1971-01-11 DE DE2100971A patent/DE2100971B2/de active Pending
- 1971-08-03 FR FR717128455A patent/FR2123246B1/fr not_active Expired
-
1972
- 1972-01-05 SE SE7200113A patent/SE401209B/xx unknown
- 1972-01-07 GB GB83772A patent/GB1371172A/en not_active Expired
- 1972-01-10 IT IT19189/72A patent/IT946426B/it active
- 1972-01-10 US US00216724A patent/US3753872A/en not_active Expired - Lifetime
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3901773A (en) * | 1972-08-01 | 1975-08-26 | Langbein Pfanhauser Werke Ag | Method of making microcrack chromium coatings |
| US5871641A (en) * | 1996-05-30 | 1999-02-16 | H-Tech, Inc. | Fluid filter with pleated septum |
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| WO2006052310A3 (en) * | 2004-11-10 | 2006-12-21 | Macdermid Inc | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| US20120157297A1 (en) * | 2010-12-16 | 2012-06-21 | Nguyen Thien Duyen Thi | Catalysts and methods of preparation of catalyst |
| US20120157299A1 (en) * | 2010-12-16 | 2012-06-21 | Nguyen Thien Duyen Thi | Method of making a catalyst |
| US8507400B2 (en) * | 2010-12-16 | 2013-08-13 | Energia Technologies, Inc. | Method of making a catalyst |
| US8524629B2 (en) * | 2010-12-16 | 2013-09-03 | Energia Technologies, Inc. | Catalysts |
| US8597599B2 (en) | 2010-12-16 | 2013-12-03 | Energia Technologies, Inc. | Systems for fuel production |
| US9315736B2 (en) | 2010-12-16 | 2016-04-19 | Energia Technologies, Inc. | Methods of fuel production |
| US11377748B2 (en) * | 2017-11-20 | 2022-07-05 | Basf Se | Composition for cobalt electroplating comprising leveling agent |
| US20220298664A1 (en) * | 2017-11-20 | 2022-09-22 | Basf Se | Composition for Cobalt Electroplating Comprising Leveling Agent |
| US12098473B2 (en) * | 2018-12-21 | 2024-09-24 | Basf Se | Composition for cobalt plating comprising additive for void-free submicron feature filling |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1371172A (en) | 1974-10-23 |
| SE401209B (sv) | 1978-04-24 |
| IT946426B (it) | 1973-05-21 |
| FR2123246B1 (enExample) | 1974-06-21 |
| DE2100971A1 (de) | 1972-07-13 |
| FR2123246A1 (enExample) | 1972-09-08 |
| DE2100971B2 (de) | 1975-04-17 |
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