US3634684A - Electron beam scanning apparatus - Google Patents

Electron beam scanning apparatus Download PDF

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Publication number
US3634684A
US3634684A US20199A US3634684DA US3634684A US 3634684 A US3634684 A US 3634684A US 20199 A US20199 A US 20199A US 3634684D A US3634684D A US 3634684DA US 3634684 A US3634684 A US 3634684A
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United States
Prior art keywords
electron beam
scanning apparatus
shield
beam scanning
path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US20199A
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English (en)
Inventor
Masayuki Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
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Publication of US3634684A publication Critical patent/US3634684A/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Definitions

  • An electron beam scanning apparatus comprising a chamber defined, for example, by a cylindrical glass structure spaced about a mean electron beam path. Deflection coils are positioned outside the chamber. An electroconductive coating, for example, a layer of gold vapor deposited on the inside surface of the structure is grounded. The electron beam is deflected by magnetic fluxes at right angles to the path produced by deflection coils. Stray electrons are collected by the electroconductive coating.
  • This invention relates to an electron beam scanning apparatus. More particularly, it relates to an electron beam scanning apparatus with little or no high-frequency loss.
  • a shield is positioned between the coil and the electron beam path to prevent the coil from being impinged by stray electrons.
  • shields have been made from an insulating or conducting material. If an insulating material is employed, the impingement of stray electrons on the shield caused it to become electrically charged. This condition resulted in the beam being undesirably deflected.
  • an electron beam scanning apparatus is provided with a shield between the deflection coil or coils and the beam path comprising an insulating (nonconducting) material upon which grounded electroconducting coating is applied facing the beam path.
  • FIG. 1 is a sectional view of a portion of an apparatus according to this invention.
  • FIG. 2 shows a sectional view of another embodiment of the present invention.
  • external deflection coils 1 and 2 are arranged to produce magnetic fluxes at right angles to the mean electron beam path A-A.
  • a cylindrical shield 4 is positioned between the coils and the electron beam path 3 to prevent the coils from being impinged by stray electrons.
  • the shield 4 is made from an insulating material. Suitable insulating materials comprise ceramics including porcelain-type materials; glass, for example, quartz glass and semidevitrified materials and the like. Further suitable insulating materials comprise plastics or rubber materials which are any of a group of synthetic or natural materials that may be shaped or hardened including resins, resinoids, polymers, cellulose derivatives, casein material, proteins and the like.
  • An electroconductive coating or membrane 5 on the inner surface of the shield is connected electrically with electroconductive end plates 6 and 7 fitted to the upper and lower ends of the cylindrical member 4 respectively. The plate 7 is grounded.
  • Suitable electroconductive coatings comprise, for example, vapor-deposited metals, very thin metal foils, and metal, carbon or other conductor carrying paints or the like.
  • the thickness of the coating is preferably less than about 1,000 Angstroms.
  • the electron beam created by well-known means, enters the cylindrical shield 4 by an opening 6a in the end plate 6' and exits by an opening 70 in the end plate 7.
  • the beam is deflected by the magnetic fluxes produced by the deflection coils 1 and 2.
  • the respective currents applied to the said coils are synchronized and the electron beam is deflected by the first and second deflection coils respectively.
  • Electron beam scanning is carried out by applying varying currents to the said coils.
  • the charge attributable to the stray electrons impinging on the membrane or coatings is discharged through the said membrane or coating and the plate 7.
  • a high-frequency current is applied to the said coils, no eddy currents appear in the shield and little or no eddy currents appear in the electroconductive membrane 5. As a result, high-frequency loss is virtually eliminated.
  • the upper and lower inner surfaces of the coil supporter 12, the lowerouter surface of the cylindrical member 15 and the upper outer surface of the cylindrical member 16 are threaded so that by screwing the cylindrical members 15 and 16 to the coil supporter 12, the shield 13 is secured tightly. Moreover, this arrangement makes assembly and disassembly of the apparatus very easy.
  • the electron beam enters the protectingmember 13 by opening 18a in the plate 18 and exists by opening 19a and in the plate 19.
  • the electron beam traverses the magnetic fluxes produced by the deflection coils 10 and 11 and, as a result, is caused to scan in proportion to the intensity of the currents applied to the said coils.
  • Stray electronsimpinging on the gold layer 14 are discharged through the cylindrical members 16 and the plate 19, thereby preventing any buildup of charges on the coil supporter 12 and protecting member 13.
  • the shield may take numerous forms so long as it separates the coils from the stray electrons. There is no need that it be cylindrical or any other particular shape.
  • an electron beam scanning apparatus of a scanning electron microscope in which an electron beam is deflected about a mean path, at least one deflection coil is provided, to which a high-frequency current is applied, for producing a magnetic field at right angles to the mean path, the improvement comprising an electrical insulating shield positioned between said coil and said mean path having a grounded electroconductive coating facing said beam path, the coating being so thin that little or no eddy currents appear in said coatmg.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Details Of Television Scanning (AREA)
US20199A 1969-03-17 1970-03-17 Electron beam scanning apparatus Expired - Lifetime US3634684A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2019369 1969-03-17

Publications (1)

Publication Number Publication Date
US3634684A true US3634684A (en) 1972-01-11

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ID=12020326

Family Applications (1)

Application Number Title Priority Date Filing Date
US20199A Expired - Lifetime US3634684A (en) 1969-03-17 1970-03-17 Electron beam scanning apparatus

Country Status (4)

Country Link
US (1) US3634684A (enrdf_load_stackoverflow)
DE (1) DE2012431B2 (enrdf_load_stackoverflow)
FR (1) FR2034981A1 (enrdf_load_stackoverflow)
GB (1) GB1308971A (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3787696A (en) * 1972-03-15 1974-01-22 Etec Corp Scanning electron microscope electron-optical column construction
FR2520553A1 (fr) * 1982-01-22 1983-07-29 Cameca Appareil d'optique electronique comportant des elements en graphite pyrolytique
US4798953A (en) * 1986-04-15 1989-01-17 Thomson-Csf Electronic beam device for projecting an image of an object on a sample
US6452173B1 (en) * 1998-05-21 2002-09-17 Seiko Instruments Inc. Charged particle apparatus
US20080218054A1 (en) * 2007-03-08 2008-09-11 International Business Machines Corporation Carbon tube for electron beam application
EP3333877A1 (en) * 2016-12-07 2018-06-13 JEOL Ltd. Liner tube and electron microscope
EP3591685A1 (en) * 2018-07-06 2020-01-08 FEI Company Electron microscope with improved imaging resolution
US11565127B2 (en) * 2016-12-21 2023-01-31 Raysearch Laboratories Ab System and method for determining a treatment plan for active ion beam treatment
KR102856649B1 (ko) * 2018-07-06 2025-09-05 에프이아이 컴파니 향상된 이미징 해상도를 가진 전자 현미경

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2213176A (en) * 1939-06-06 1940-08-27 Rca Corp Television transmitting tube
US2237065A (en) * 1938-06-02 1941-04-01 Vacuum Science Products Ltd Cathode ray tube
US2959705A (en) * 1952-09-18 1960-11-08 American Optical Corp Shielded tube and method of making the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2237065A (en) * 1938-06-02 1941-04-01 Vacuum Science Products Ltd Cathode ray tube
US2213176A (en) * 1939-06-06 1940-08-27 Rca Corp Television transmitting tube
US2959705A (en) * 1952-09-18 1960-11-08 American Optical Corp Shielded tube and method of making the same

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3787696A (en) * 1972-03-15 1974-01-22 Etec Corp Scanning electron microscope electron-optical column construction
FR2520553A1 (fr) * 1982-01-22 1983-07-29 Cameca Appareil d'optique electronique comportant des elements en graphite pyrolytique
EP0086120A1 (fr) * 1982-01-22 1983-08-17 Cameca Appareil d'optique électronique comportant des éléments en graphite pyrolytique
US4508967A (en) * 1982-01-22 1985-04-02 Cameca Electronic optical apparatus comprising pyrolytic graphite elements
US4798953A (en) * 1986-04-15 1989-01-17 Thomson-Csf Electronic beam device for projecting an image of an object on a sample
US6452173B1 (en) * 1998-05-21 2002-09-17 Seiko Instruments Inc. Charged particle apparatus
US20080218054A1 (en) * 2007-03-08 2008-09-11 International Business Machines Corporation Carbon tube for electron beam application
US7863563B2 (en) * 2007-03-08 2011-01-04 International Business Machines Corporation Carbon tube for electron beam application
EP3333877A1 (en) * 2016-12-07 2018-06-13 JEOL Ltd. Liner tube and electron microscope
US11565127B2 (en) * 2016-12-21 2023-01-31 Raysearch Laboratories Ab System and method for determining a treatment plan for active ion beam treatment
EP3591685A1 (en) * 2018-07-06 2020-01-08 FEI Company Electron microscope with improved imaging resolution
US20200013580A1 (en) * 2018-07-06 2020-01-09 Fei Company Electron microscope with improved imaging resolution
CN110690093A (zh) * 2018-07-06 2020-01-14 Fei 公司 具有改进的成像分辨率的电子显微镜
EP3594987A2 (en) 2018-07-06 2020-01-15 FEI Company Electron microscope with improved imaging resolution
JP2020009765A (ja) * 2018-07-06 2020-01-16 エフ イー アイ カンパニＦｅｉ Ｃｏｍｐａｎｙ 撮像分解能を向上させた電子顕微鏡
EP3594987A3 (en) * 2018-07-06 2020-12-23 FEI Company Electron microscope with improved imaging resolution
KR102856649B1 (ko) * 2018-07-06 2025-09-05 에프이아이 컴파니 향상된 이미징 해상도를 가진 전자 현미경

Also Published As

Publication number Publication date
GB1308971A (en) 1973-03-07
FR2034981A1 (enrdf_load_stackoverflow) 1970-12-18
DE2012431A1 (de) 1970-09-24
DE2012431B2 (de) 1974-02-21

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