US3594885A - Method for fabricating a dimpled concave dispenser cathode incorporating a grid - Google Patents

Method for fabricating a dimpled concave dispenser cathode incorporating a grid Download PDF

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Publication number
US3594885A
US3594885A US833458A US3594885DA US3594885A US 3594885 A US3594885 A US 3594885A US 833458 A US833458 A US 833458A US 3594885D A US3594885D A US 3594885DA US 3594885 A US3594885 A US 3594885A
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Prior art keywords
groove pattern
pattern
concave face
cathode
grid
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Expired - Lifetime
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US833458A
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English (en)
Inventor
George V Miram
Gerhard B Kuehne
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Varian Medical Systems Inc
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Varian Associates Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H01J9/042—Manufacture, activation of the emissive part
    • H01J9/047—Cathodes having impregnated bodies

Definitions

  • An array of concave dimples are formed in the cellular regions of the concave emitter face bounded by the cells of the groove pattern.
  • a multicell grid structure is incorporated into the groove pattern.
  • the groove pattern is formable by photoetching, electrical discharge machining or by milling.
  • the grid structure may be brazed into the grooves or merely supported therein in noncontacting relation therewith.
  • FIG. 8 AFFIX APPLY REMOVE MACHINE A fi wg MASKING MASKING Q QYE YQ A.
  • FIG 9 MACHINE TooL GEORGE v. NLRAN GERHARD-BKUEHNE Qeu BY cATHooE BLANK ATToR EY I METHOD FOR FABRICATING A DIMPLED CONCAVE DISPENSER CATI IODE INCORPORATING A GRID DESCRIPTION OF THE PRIOR ART
  • Such a cathode is disclosed and claimed in copending U.S. Pat. application Ser. No. 650,893 filed July 3, 1967 and assigned to the same assignee as the present invention.
  • Such cathodes are especially useful in electron guns of high-convergence high-power linear beam tubes since control grid current interception is greatly reduced. This follows since the grid structure in or on the cathode helps to focus the electron beamlets through the aligned apertures of the control grid. Moreover, the focusing grid structure helps to inhibit electron emission from the regions of the cathode in registration with the webs of the control grid.
  • practical production methods for fabricating dispenser cathodes incorporating such focusing grid structures have not been known.
  • the principal object of the present invention is the provision of an improved method for fabricating a concave dimpled dispenser cathode having a grid structure incorporated therein.
  • One feature of the present invention are the steps of forming a multicell groove pattern in the concave face of a dispenser cathode blank to accommodate a multiapertured grid structure and forming an array of dimpled facets in the concave face of the cathode blank, such facets each being bounded by individual cells of the multicell groove pattern.
  • step of forming the groove pattern comprises the step of milling the grooves in the concave face of the cathode blank.
  • Another feature of the present invention is the same as the first feature wherein the step of forming the groove pattern comprises chemically etching the groove pattern in the concave face of the cathode blank.
  • Another feature of the present invention is the same as the first feature wherein the step of electrically discharge machining the groove pattern with a discharge defining electrode having a pattern conforming to at least a portion of the groove pattern to be formed.
  • FIG. 1 is fragmentary longitudinal sectional view of an electron gun fabricated by methods incorporating features of the present invention
  • FIGS. 2 and 4 are enlarged detail views of alternative embodiments to that portion of the structure of FIG. 1 delineated by lines 22 and 4-4,
  • FIGS. 3 and are enlarged detail views of portions of FIGS. 2 and 4 delineated by lines 3-3 and 5-5, respectively,
  • FIG. 6 is a perspective flow diagram depicting a method of the present invention for fabricating dispenser cathodes.
  • FIG. 7 is a flow diagram in block diagram form depicting a cathode-fabricating method of the present invention.
  • FIG. 8 is flow diagram in block diagram form depicting certain steps in a method of the present invention.
  • FIG. 9 is a sectional view of a tool of an electrical discharge machine depicting how it is employed in a method of the 3 present invention.
  • FIG. 1 there is shown an electron gun I employing a concave dispenser cathode emitter 2.
  • the emitter is of the type disclosed in the aforecited U.S. Pat. application Ser. No. 650,893 and briefly is a spherical section of bariumimpregnated porous tungsten having a multitude of closely packed dimpled facets 3 in the concave face 4 of the emitter 2.
  • a centrally apertured anode electrode 5 faces the concave face 4 of the emitter 2.
  • a multiaperturcd control grid 6 is disposed closely overlying and conforming to the shape of the concave surface 4.
  • the apertures 7 of the control grid 6 are preferably hexagonal and disposed in registration with the dimpled facets 3, Le, center of grid openings 7 falls on an electron trajectory leaving the center of facet 3.
  • the facets 3 may be of circular or hexagonal boundary configuration with spherically concave surfaces of substantially lesser radius of curvature than the radius of curvature for the composite concave face 4.
  • the focus grid 8 is positioned within a grid shaped groove pattern 9 in the concave surface 4 of the emitter.
  • the grid 8 may be supported in noncontacting relation with respect to the grooves or it may be affixed, as by brazing, to the grooves. These two alternatives are depicted in greater detail in FIGS. 2-5 below.
  • the focus grid serves to focus the individual electron beamlets through the corresponding aperture 7 in control grid 6 in a substantially nonintercepting manner.
  • the focus grid 8 as of molybdenum, is coated with an electron-emission-inhibiting material, such as, carbon, titanium, zirconium, iridium, etc., to prevent current interception on the control grid 6 because the coating inhibits emission from those portions of the cathode surface 4 which would have electron trajectories to intercept the web members of grid'6.
  • an electron-emission-inhibiting material such as, carbon, titanium, zirconium, iridium, etc.
  • the gun 1 produces a beam of 1 amp at 10 kv. with a microperveance of 1.0 and cathode loading current density of L2 amps/cm. 2. Grid interception was 0.8 percent of the beam current.
  • focus grid structure 8 is supported at its periphery from a relatively heavy tubular thermally conductive support 11 for heat sinking and cooling the grid 8.
  • the grid 8 is supported in noncontacting relation within the groove pattern 9 to inhibit thermal conduction from the cathode 2, which normally operates within the range of 900 to l,l00 C, to the grid 8.
  • the noncontacting relation also serves to inhibit migration of barium impregnant from the cathode 2 to the grid 8.
  • the grooves 9 have a width of 0.01 6 inch and a depth of 0.005 inch and the grid 8 has a web width of 0.010 inch and a depth in the direction of the beam of 0.009 inch and is separated from the bottom of the groove 9 by 0.001 inch.
  • FIGS. 4 and 5 there is shown a second embodiment of the dispenser cathode 2 wherein the grid 8 is supported from the cathode body via brazed joints 12 between the bottom of the grooves 9 and the abutting surface of the grid 8.
  • Suitable braze materials include molybdenum-nickel or molybdenum-ruthenium mixes.
  • a spherically concave dispenser cathode blank 2 such as porous tungsten impregnated with a malleable material such as copper or plastic has its concave surface 4 grooved, in step (a), with a multicell hexagonal pattern of grooves 9 such groove pattern conforming to the grid pattern of the control grid 6 and to the pattern of the focus grid 8 to be located in the grooves 9.
  • the grooves 9 may be formed as by chemical etching, milling, or by electrical discharge machining in the manner more fully described below with regard to FIGS. 79.
  • the dimpled facets 3 are formed, in step (b), in each of the cells of the groove pattern 9.
  • the dimples 3 are formed either by machining or by electrical discharge machining.
  • step (c) the focus grid structure 8 is incorporated into the groove pattern 9 either in noncontacting relation, as described above with regard to FIGS. 2 and 3, or in contacting relation as described with regard to FIGS. 4 and 5.
  • FIG. 7 the general method of FIG. 6 is described in greater detail as employing chemical etching to form the grid-shaped pattern of grooves 9 in the cathode blank 2.
  • a masking grid structure substantially identical to grid 8, in fact it can be grid 8 is affixed to the concave surface 4 of the cathode blank 2, as by an adhesive or by clamping.
  • an acid resistant emulsive coating such as A-Z l l 1 photo resist coating manufactured by Shipley Company, is applied to the concave surface 4 of the cathode blank 2 through the openings in the masking grid.
  • the masking grid is removed leaving the exposed grid pattern in the cathode blank surface 4.
  • step (d) the surface 4 is treated with a chemical acid etch such as potassium ferrocyanide and caustic for etching the groove pattern 9 into the concave surface 4.
  • step (c) the surface 4 is dimpled as above described.
  • step (b) the malleable impregnant of the porous tungsten body is removed, as by chemical etching or heating to boil out the impregnant.
  • step (g) the porous tungsten body is impregnated with electron emissive material, such as barium, ferrocyanidc conventional manner.
  • step (h) the grid structure 8 with its electron-emissioninhibiting coating is incorporated in the grid pattern of grooves 9 either in the noncontacting manner, as described above with regard to FIGS. 2 and 3, or in contacting relation, as described above with regard to FIGS. 4 and 5.
  • the dimpling step (e) can be performed either before or after incorporation of the grid 8. If it is performed after incorporation of the grid 8, the dimpling tool is merely inserted through the respective aperture in grid 8.
  • steps (ad) replace steps (a-d) in the process of FIG. 7.
  • step (a) a masking grid is affixed to the cathode blank 2, as in step (a) of the method of FIG. 7.
  • step (b) a marking dye or paint is applied through the holes in the masking grid to indicate the desired grid pattern for the grooves 9 by the unpainted web pattern in the painted surface.
  • step (c) the masking grid is removed to expose the desired grid pattern markings.
  • the concave surface 4 is milled by a milling machine along the unpainted lines of the desired grid pattern. The remainder of the process of manufacture remains the same as described with regard to FIG. 7.
  • steps (a--d) of the method of FIG. 7 are replaced by the step of electrically discharge machining the pattern of grooves 9 in the concave surface 4 of the cathode blank 2.
  • the electrical discharge defining elec trode tool 15 has a spherically curved surface I6 conforming to the surface 4 of the cathode blank 2.
  • Formed on the surface 16 of the tool 15 is a raised grid pattern 17 conforming to the grid pattern of the grooves 9 to be formed in the cathode blank 2.
  • the electrical discharge machining tool I is then moved into the surface 4 of the cathode blank 2 to machine the grid pattern of grooves 9 therein.
  • the remainder of this method is the same as that previously described above with retion and many ap arently widely different embodiments of this lnvention coud be made without departing from the scope thereof, it is intended that all matter contained in the above description or shown in the accompanying drawings shall be interpreted as illustrative and not in a limiting sense.
  • a method for fabricating a dimpled dispenser cathode for a convergent stream electron gun the steps of, forming a multicell groove pattern in the concave face of a dispenser cathode blank, such multicell groove pattern conforming generally to the web pattern of a multiapertured control grid to be employed over the concave emissive surface of the dispenser cathode, forming an array of concave dimpled emissive facets in the concave face of the cathode blank, each of the individual facets being located such as to be bounded by an individual cell of the multicell groove pattern, and incorporating a multiapertured grid structure in the groove pattern, such grid structure having a web pattern conforming generally to the groove pattern and to the web pattern of the control grid.
  • step of forming the multicelled groove pattern in the concave face of the dispenser cathode blank comprises the step of marking the concave face to be grooved to indicate the'pattern of the desired grooves, and milling the grooves in the concave face according to the marked pattern.
  • step of forming the multicelled groove pattern in the concave face of the dispenser cathode blank comprises the step of electrically discharge machining the concave face with a tool having a discharge defining electrode pattern conforming to at least a portion of the desired groove pattern to be formed in the concave face of the dispenser cathode blank.
  • step of forming the, multicelled groove pattern in the concave face of the dispenser cathode blank comprises the step of, chemically etching the groove pattern in the concave face of the dispenser cathode blank.
  • the cathode blank into which the groove pattern is to be formed comprises a porous tungsten body with the pores infiltrated with a malleable material, and including the steps of removing the malleable material from the grooved cathode blank to leave a porous metal blank, and infiltrating the pores of the metal blank with electron emissive material to form a dispenser cathode body.
  • step of incorporating the grid structure into the groove pattern includes the steps of, locating the web of the grid structure in the groove pattern, and brazing the grid structure to the grooved cathode body.
  • the method of claim 5 including the step of, coating the grid structure to be incorporated in the groove pattern of the dispenser cathode blank with an electron-emission-inhibiting coating.
  • step of chemically etching the groove pattern includes the steps of, positioning a masking grid structure, having the desired grid pattern to be formed in the cathode, adjacent the concave face of the cathode blank, coating the grid structure and exposed positions of the masked concave face of the cathode blank with an acid-resistant emulsion, removing the masking grid structure to expose the surface of the cathode blank masked by the masking grid structure, and chemically etching the exposed surfaces in the concave face of the cathode blank to form the desired groove pattern.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Solid Thermionic Cathode (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Microwave Tubes (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
US833458A 1969-06-16 1969-06-16 Method for fabricating a dimpled concave dispenser cathode incorporating a grid Expired - Lifetime US3594885A (en)

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JP (1) JPS5220817B1 (enrdf_load_stackoverflow)
CA (1) CA922878A (enrdf_load_stackoverflow)
DE (1) DE2029675A1 (enrdf_load_stackoverflow)
FR (1) FR2052633A5 (enrdf_load_stackoverflow)
GB (1) GB1264765A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3843902A (en) * 1972-08-24 1974-10-22 Varian Associates Gridded convergent flow electron gun
US4734073A (en) * 1986-10-10 1988-03-29 The United States Of America As Represented By The Secretary Of The Army Method of making a thermionic field emitter cathode
US5844173A (en) * 1994-08-04 1998-12-01 Valeo Electronique Collector terminal for contact with a battery supplying an electronic circuit, and an electronic circuit and a radio remote control emitter incorporating such a terminal
US20080032427A1 (en) * 2006-08-04 2008-02-07 Samsung Electronics Co., Ltd. Ion analysis system based on analyzer of ion energy distribution using retarded electric field
US20090001281A1 (en) * 2007-06-26 2009-01-01 Bassom Neil J Cathode having electron production and focusing grooves, ion source and related method
US20090146052A1 (en) * 2007-12-10 2009-06-11 Schlumberger Technology Corporation Low Power Neutron Generators
NL2014030A (en) * 2013-12-30 2015-07-01 Mapper Lithography Ip Bv Cathode arrangement, electron gun, and lithograpy system comprising such electron gun.

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3967150A (en) * 1975-01-31 1976-06-29 Varian Associates Grid controlled electron source and method of making same
DE2535467C2 (de) * 1975-08-08 1985-06-05 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer Kathode einer gittergesteuerten Leistungsröhre
US4583021A (en) * 1983-04-18 1986-04-15 Litton Systems, Inc. Electron gun with improved cathode and shadow grid configuration
JPS6273362U (enrdf_load_stackoverflow) * 1985-10-24 1987-05-11

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2864028A (en) * 1955-08-15 1958-12-09 Philips Corp Thermionic dispenser cathode
US2977496A (en) * 1958-12-04 1961-03-28 Machlett Lab Inc Electrode structure for electron tubes
US3067486A (en) * 1957-06-20 1962-12-11 Itt Target electrode for barrier grid storage tube and method of making same
US3139552A (en) * 1960-03-07 1964-06-30 Hughes Aircraft Co Charged particle gun with nonspherical emissive surface
US3293487A (en) * 1961-10-04 1966-12-20 English Electric Valve Co Ltd Anode for a magnetron having deverse size cavity resonators

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2864028A (en) * 1955-08-15 1958-12-09 Philips Corp Thermionic dispenser cathode
US3067486A (en) * 1957-06-20 1962-12-11 Itt Target electrode for barrier grid storage tube and method of making same
US2977496A (en) * 1958-12-04 1961-03-28 Machlett Lab Inc Electrode structure for electron tubes
US3139552A (en) * 1960-03-07 1964-06-30 Hughes Aircraft Co Charged particle gun with nonspherical emissive surface
US3293487A (en) * 1961-10-04 1966-12-20 English Electric Valve Co Ltd Anode for a magnetron having deverse size cavity resonators

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3843902A (en) * 1972-08-24 1974-10-22 Varian Associates Gridded convergent flow electron gun
US4734073A (en) * 1986-10-10 1988-03-29 The United States Of America As Represented By The Secretary Of The Army Method of making a thermionic field emitter cathode
US5844173A (en) * 1994-08-04 1998-12-01 Valeo Electronique Collector terminal for contact with a battery supplying an electronic circuit, and an electronic circuit and a radio remote control emitter incorporating such a terminal
US20080032427A1 (en) * 2006-08-04 2008-02-07 Samsung Electronics Co., Ltd. Ion analysis system based on analyzer of ion energy distribution using retarded electric field
US20090001281A1 (en) * 2007-06-26 2009-01-01 Bassom Neil J Cathode having electron production and focusing grooves, ion source and related method
US7723699B2 (en) * 2007-06-26 2010-05-25 Varian Semiconductor Equipment Associates, Inc. Cathode having electron production and focusing grooves, ion source and related method
US20090146052A1 (en) * 2007-12-10 2009-06-11 Schlumberger Technology Corporation Low Power Neutron Generators
US7978804B2 (en) * 2007-12-10 2011-07-12 Schlumberger Technology Corporation Low power neutron generators
NL2014030A (en) * 2013-12-30 2015-07-01 Mapper Lithography Ip Bv Cathode arrangement, electron gun, and lithograpy system comprising such electron gun.
US20150187541A1 (en) * 2013-12-30 2015-07-02 Mapper Lithography Ip B.V Cathode arrangement, electron gun, and lithography system comprising such electron gun
WO2015101538A1 (en) * 2013-12-30 2015-07-09 Mapper Lithography Ip B.V. Cathode arrangement, electron gun, and lithography system comprising such electron gun
US9455112B2 (en) * 2013-12-30 2016-09-27 Mapper Lithography Ip B.V. Cathode arrangement, electron gun, and lithography system comprising such electron gun
US9466453B2 (en) 2013-12-30 2016-10-11 Mapper Lithography Ip B.V. Cathode arrangement, electron gun, and lithography system comprising such electron gun
US20160314935A1 (en) * 2013-12-30 2016-10-27 Mapper Lithography Ip B.V. Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun
EP3090438B1 (en) * 2013-12-30 2020-03-25 ASML Netherlands B.V. Cathode arrangement, electron gun, and lithography system comprising such electron gun
US10622188B2 (en) * 2013-12-30 2020-04-14 Asml Netherlands B.V. Focusing electrode for cathode arrangement, electron gun, and lithography system comprising such electron gun

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GB1264765A (enrdf_load_stackoverflow) 1972-02-23
CA922878A (en) 1973-03-20
DE2029675A1 (de) 1971-01-21
JPS5220817B1 (enrdf_load_stackoverflow) 1977-06-06
FR2052633A5 (enrdf_load_stackoverflow) 1971-04-09

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