US3581766A - Supplying liquid to a vacuum chamber - Google Patents

Supplying liquid to a vacuum chamber Download PDF

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Publication number
US3581766A
US3581766A US749741A US3581766DA US3581766A US 3581766 A US3581766 A US 3581766A US 749741 A US749741 A US 749741A US 3581766D A US3581766D A US 3581766DA US 3581766 A US3581766 A US 3581766A
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United States
Prior art keywords
liquid
feed chamber
reservoir
chamber
feed
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Expired - Lifetime
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US749741A
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English (en)
Inventor
Joseph Paul Gimigliano
John Francis Butler
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Jones and Laughlin Steel Corp
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Jones and Laughlin Steel Corp
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/85954—Closed circulating system
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/86236—Tank with movable or adjustable outlet or overflow pipe

Definitions

  • Assignee Jones 8 Laughlin Steel Corporation Pittsburgh, Pa.
  • FIG. I is a vertical schematic section of a first preferred embodiment of our invention.
  • FIG. 2 is a vertical schematic section of a second preferred embodiment.
  • FIG. 3 is a vertical schematic section, in somewhat more detail than FIGS. 1 and 2, of a third preferred embodiment.
  • FIG. 4 is a vertical schematic section of a portion of a fourth preferred embodiment.
  • Our apparatus causes the liquid to flow into the evaporation receptacle in the evacuated chamber by means of the pressure of the atmosphere over the liquid in a liquid feed chamber.
  • This chamber is interconnected with a liquid reservoir so that the level of the liquid in the feed chamber is maintained constant.
  • our apparatus hereinafter as it is adapted to supply molten metal.
  • the evacuated chamber 1 which is indicated only in part because it is conventional, is provided with an evaporation receptacle 2, which is also conventional. Evaporation receptacle 2 is heated by heating means, not shown.
  • a pipe 3 Leading from the evaporation receptacle 2 is a pipe 3 which passes through the wall of vacuum chamber I through a vacuum seal 4. Pipe 3 is inclined slightly downwardly so that it serves to drain evaporation receptacle 2.
  • the end of pipe 3 outside vacuum chamber 1 connects with a vertical leg I5 which extends downwardly into a liquid feed chamber 5, the top of which is open to the atmosphere. Feed chamber 5 is contained within a larger liquid reservoir 6.
  • a liquid pump 8 is positioned with its intake 9 within reservoir 6 at a location below the normal level of liquid in reservoir 6. Pump 8 is provided with a motor 10 which is connected to a source of power, not shown. Pump 8 is provided with a discharge pipe 11 which extends upwardly and over the edge of feed chamber 5 in an inverted U.” The outside leg 12 of discharge pipe 11 extends into feed chamber S'to a position below the normal level of the liquid in feed chamber 5. Reservoir 6 is provided with a drain I3 which is nonnally closed. Reservoir 6 is surrounded by a furnace 14.
  • liquid level sensing device 16 Within feed chamber 5 is positioned a liquid level sensing device 16.
  • This device 16 which is conventional, is connected to the pump motor I0 through wires 17 and conventional proportioning means, not shown. These means increase or decrease the speed of pump motor 10 in response to the signal from the level sensing device 16.
  • the distance between the normal surface of liquid in evaporation receptacle 2 and a chosen level of the liquid in feed chamber 5 is determined by the difference between the atmospheric pressure over the liquid in feed chamber 5 and the pressure over the liquid within vacuum chamber I. This distance is equal to the height of the column of the liquid which is supported by that pressure. If the level of the liquid in feed chamber 5 is maintained constant at its predetermined position, the level of the liquid in evaporation receptacle 2 will likewise remain constant because the atmospheric pressure will cause liquid to flow up pipe 15 and over through pipe 3 into evaporation receptacle 2 whenever the level of the liquid in receptacle 2 falls.
  • the level of the liquid in reservoir 6 is normally below that of the liquid in feed chamber 5, and the function of pump 8 is to keep the level of the liquid in feed chamber 5 constant. This is effected by level-sensing device 16 which has been described.
  • the liquid-sensing device 16 causes pump 8 to increase its pumping speed and draw more liquid from reservoir 6 through the pump intake 9 and discharge it through pump discharge II into feed chamber 5.
  • the liquid in feed chamber 5 is constantly draining through orifice 7 back into reservoir 6 so that the liquid circulates between reservoir 6 and feed chamber 5. From time to time the liquid in reservoir 6 is replenished.
  • the liquid to be evaporated is a liquid metal, it must, of course, be kept above its melting point, and this heating is accomplished by furnace 14 which surrounds reservoir 6 and feed chamber 5. i
  • FIG. 2 the reservoir 20 is provided with a feed chamber 2
  • An orifice 22 is provided in wall 23 which partitions feed chamber 21 from reservoir 20 so that liquid constantly drains from reservoir 20 into feed chamber 21.
  • Pump 8 is located with its intake 9 in feed chamber 21 and its discharge pipe 12 in reservoir'20.
  • the difference between the apparatus of the two figures is, of course, that the level of the liquid in the reservoir 20 of FIG. 2 is higher than the normal level of the liquid in the feed chamber 21 whereas in FIG. 2 the normal level of the liquid in reservoir 6 is below that of the liquid in feed chamber 5.
  • the liquid flows by gravity from reservoir 20 into feed chamber 21 through orifice 22 and is pumped out of feed chamber 21 back into reservoir 20 by pump 8. Otherwise, the apparatus of our FIG. 2 operates the same way as that of our FIG. I.
  • feed chamber 24 is elevated above reservoir 6 and is adapted to be located at a distance therefrom, as will be hereinafter described.
  • Feed chamber 24 is constructed of, or is lined with, heat insulating material.
  • a drain tube 29 which is provided with a heat insulating outer lining 31.
  • the lower end of tube 29 is connected to an extension 30 which is constructed of or is lined with heat insulating material. The lower end of extension 30 projects into reservoir 6.
  • a movable sleeve 32 is adjustably positioned in drain tube 29 and extends above its upper end so that the upper end of sleeve 32 can be adjusted to a desired height.
  • This sleeve forms an overflow drain through which the liquid flows out of feed chamber 24.
  • the level of the liquid in feed chamber 24 cannot rise above the level of the upper end of adjustable sleeve 32.
  • Pump 8 which is otherwise positioned as is shown in FIG. 1, is provided with a discharge tube 26 having a heat-insulating lining 28.
  • the upper end of discharge tube 26 is bent over into a downwardly extending discharge end 34 which projects into feed chamber 24 well below the upper end of sleeve 32.
  • Crucible 2 within vacuum chamber 1 is provided as before with a drain tube 3 which is connected to a downwardly extending section 15 having an insulated covering 27. If necessary, conventional heating means are interposed between tube 15 and insulating covering 27.
  • the lower end of tube 15 is bent to a vertical downwardly projecting element 25 which extends into feed chamber 24 well below the level of the top of sleeve 32.
  • Pump 8 runs constantly and pumps liquid from reservoir 6 through pump discharge tubes 26 and 34 into feed chamber 24. This liquid fills the feed chamber to the level of the upper end of sleeve 32 and overflows through that sleeve and its extensions 31 and 30 back into reservoir 6.
  • the level of the liquid in feed chamber 24 is predetermined by the spacing of the upper end of sleeve 32 from the bottom of feed chamber 24. Liquid from chamber 24 is forced upwardly through tubes 25, 27 and 3 into crucible 2 in vacuum chamber 1 by the difference in pressure between that on the surface of the liquid in chamber 24 and the reduced pressure in vacuum chamber 1.
  • FIG. 3 illustrates only one feed chamber 24, but the apparatus as there shown is suitable for use with several feed chambers 24, all of which are supplied with liquid metal by the same pump 8 from the same reservoir 6 and each of which supplies liquid to its crucible through its own barometric leg feed tube arrangement.
  • Feed chamber 24 is not connected to crucible 2, to reservoir 6, or to pump 8 and its associated pipes, except as pipes 25 and 34 dip into the coating material held in feed chamber 24, and drain 30 therefrom dips into coating material held in reservoir 6.
  • Lowering feed chamber 24 therefore causes coating material to flow from crucible 2 through pipes 3, l and 25 into feed chamber 24. Raising feed chamber 24 causes coating material to flow from it through pipes 25, I5 and 3 into crucible 2.
  • the feed chamber is open to the atmosphere. This construction requires that the feed chamber be positioned below the crucible the full length of the barometric leg for the liquid supply. Under some circumstances this arrangement may not be convenient. If it is desired to bring the feed chamber closer to the crucible, for example, in the embodiment shown in FIG. 3, the feed chamber is enclosed and maintained at a pressure intermediate the pressure in the evacuated chamber and atmospheric pressure. The difference in pressure between feed chamber and reservoir will then have to be taken into account in positioning the reservoir below the feed chamber.
  • FIG. 4 The essential elements of this fourth embodiment of our invention are illustrated in FIG. 4. Those elements in FIG. 4 which are also found in FIG. 3 are identified by the same reference characters.
  • the feed chamber 24 which is otherwise identical to feed chamber 24 of FIG. 3 is provided with a cover 33 through which pipes 25 and 34 are lead in. Cover 34 is also provided with an exhaust pipe 35 which is connected to pumping means, not shown, to reduce the pressure within chamber 24 to a desired value above that in vacuum chamber 1.
  • molten coating material from reservoir 6 is supplied to feed chamber 24 through pipe 34. Molten metal from feed chamber 24 is caused to flow from it upwardly through pipe 25 into crucible 2 because the pressure maintained in feed chamber 24 is greater than that in vacuum chamber 1.
  • this heavier phase drains through feed pipes 3 and 15 back into feed chamber 5 and eventually through aperture 7 from that feed chamber into reservoir 6. From reservoir 6 it is removed from time to time through drain I3.
  • This draining out from evaporation receptacle 2 is continuous and goes on simultaneously with the continuous supplying of fresh molten metal through feed pipes 3 and 15.
  • Apparatus for supplying a liquid to an evaporation receptacle enclosed in a vacuum chamber comprising a liquid reservoir open to the circumambient atmosphere positioned outside the vacuum chamber, a feed chamber positioned outside the vacuum chamber, filling means including a pump interconnecting the liquid reservoir and the feed chamber and draining means interconnecting the liquid reservoir and the feed chamber, the filling means and the draining means being adapted and adjusted to maintain a circulating flow of liquid between liquid reservoir and feed chamber, a feedpipe having its lower end positioned in the feed chamber rising therefrom and extending through a wall of the vacuum chamber into the evaporation receptacle and control means positioned in the feed chamber adapted to maintain a constant level of liquid therein, the feed chamber being positioned below the evaporation receptacle a distance such that the levels of the liquid in them differ by the height of the column of the liquid supported by the pressure of the atmosphere in the feed chamber less the pressure of the atmosphere in the vacuum chamber.
  • Apparatus of claim 1 in which the reservoir is positioned at a higher level than the feed chamber and the draining means comprise an orifice in the bottom of the reservoir through which the liquid drains therefrom into the feed chamber, and the liquid pump is positioned with its intake in the feed chamber and discharge in the reservoir so as to pump liquid from the feed chamber into the reservoir.
  • control means comprise liquid level sensing means, and including means actuated by the liquid level sensing means adapted to control the operation of the pump.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
US749741A 1968-08-02 1968-08-02 Supplying liquid to a vacuum chamber Expired - Lifetime US3581766A (en)

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US74974168A 1968-08-02 1968-08-02

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US (1) US3581766A (enrdf_load_stackoverflow)
JP (1) JPS4841416B1 (enrdf_load_stackoverflow)
DE (1) DE1938992A1 (enrdf_load_stackoverflow)
GB (1) GB1240773A (enrdf_load_stackoverflow)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3901182A (en) * 1972-05-18 1975-08-26 Harris Corp Silicon source feed process
JPS5385738A (en) * 1977-01-07 1978-07-28 Nippon Steel Corp Device of feeding molten metal to vacuum chamber
WO2008040329A1 (de) * 2006-09-29 2008-04-10 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
RU2348738C2 (ru) * 2007-04-04 2009-03-10 Государственное образовательное учреждение высшего профессионального образования Самарский государственный аэрокосмический университет им. академика С.П. Королева Испаритель многокомпонентных растворов
WO2017191082A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Apparatus for feeding a liquid material to an evaporator device
WO2017191083A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
US20210381097A1 (en) * 2020-06-04 2021-12-09 Applied Materials, Inc. Vapor deposition apparatus and method for coating a substrate in a vacuum chamber
US20210388486A1 (en) * 2018-11-20 2021-12-16 Bobst Manchester Limited Evaporator boat control system, pvd machine and method of operating the pvd machine
US20220074042A1 (en) * 2018-12-19 2022-03-10 Posco Apparatus and method for controlling coating layer in pvd plating process

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4931517U (enrdf_load_stackoverflow) * 1972-06-16 1974-03-19
JPH0444306U (enrdf_load_stackoverflow) * 1990-08-10 1992-04-15
LV13383B (en) * 2004-05-27 2006-02-20 Sidrabe As Method and device for vacuum vaporization metals or alloys

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2548696A (en) * 1947-10-20 1951-04-10 Dow Chemical Co Spark-gap liquid level indicator
US2690764A (en) * 1951-01-26 1954-10-05 Separator Ab Apparatus of the overflow type for regulating the continuous flow of liquids throughcontainers
US3050798A (en) * 1960-06-13 1962-08-28 Strategic Materials Corp Process for continuous casting and vacuum degasification
US3059612A (en) * 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3408224A (en) * 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3447951A (en) * 1965-10-20 1969-06-03 Pennsalt Chemicals Corp Cyclone separation of particles in vapor coating

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2548696A (en) * 1947-10-20 1951-04-10 Dow Chemical Co Spark-gap liquid level indicator
US2690764A (en) * 1951-01-26 1954-10-05 Separator Ab Apparatus of the overflow type for regulating the continuous flow of liquids throughcontainers
US3059612A (en) * 1959-10-19 1962-10-23 Wean Engineering Co Inc Vacuum coating apparatus
US3050798A (en) * 1960-06-13 1962-08-28 Strategic Materials Corp Process for continuous casting and vacuum degasification
US3408224A (en) * 1964-06-25 1968-10-29 Pennsalt Chemicals Corp Vapor coating employing degassing of coating metal
US3447951A (en) * 1965-10-20 1969-06-03 Pennsalt Chemicals Corp Cyclone separation of particles in vapor coating

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3901182A (en) * 1972-05-18 1975-08-26 Harris Corp Silicon source feed process
JPS5385738A (en) * 1977-01-07 1978-07-28 Nippon Steel Corp Device of feeding molten metal to vacuum chamber
WO2008040329A1 (de) * 2006-09-29 2008-04-10 Von Ardenne Anlagentechnik Gmbh Vakuumbeschichtungsverfahren und anordnung zur durchführung des verfahrens
RU2348738C2 (ru) * 2007-04-04 2009-03-10 Государственное образовательное учреждение высшего профессионального образования Самарский государственный аэрокосмический университет им. академика С.П. Королева Испаритель многокомпонентных растворов
WO2017191081A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
WO2017191083A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
WO2017191082A1 (en) 2016-05-03 2017-11-09 Tata Steel Nederland Technology B.V. Apparatus for feeding a liquid material to an evaporator device
US11220739B2 (en) 2016-05-03 2022-01-11 Tata Steel Nederland Technology B.V. Apparatus for feeding a liquid material to an evaporator device
US11261860B2 (en) 2016-05-03 2022-03-01 Tata Steel Nederland Technology B.V. Method to control the temperature of an electromagnetic pump
US11414744B2 (en) 2016-05-03 2022-08-16 Tata Steel Nederland Technology B.V. Method to operate an apparatus for feeding liquid metal to an evaporator device
US20210388486A1 (en) * 2018-11-20 2021-12-16 Bobst Manchester Limited Evaporator boat control system, pvd machine and method of operating the pvd machine
US20220074042A1 (en) * 2018-12-19 2022-03-10 Posco Apparatus and method for controlling coating layer in pvd plating process
US20210381097A1 (en) * 2020-06-04 2021-12-09 Applied Materials, Inc. Vapor deposition apparatus and method for coating a substrate in a vacuum chamber

Also Published As

Publication number Publication date
DE1938992A1 (de) 1970-02-05
JPS4841416B1 (enrdf_load_stackoverflow) 1973-12-06
GB1240773A (en) 1971-07-28

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