US3574625A - Photographic systems with polyvalent metal ions contiguous to the silver halide grains - Google Patents
Photographic systems with polyvalent metal ions contiguous to the silver halide grains Download PDFInfo
- Publication number
- US3574625A US3574625A US629091A US3574625DA US3574625A US 3574625 A US3574625 A US 3574625A US 629091 A US629091 A US 629091A US 3574625D A US3574625D A US 3574625DA US 3574625 A US3574625 A US 3574625A
- Authority
- US
- United States
- Prior art keywords
- silver halide
- halide grains
- contiguous
- silver
- trivalent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052709 silver Inorganic materials 0.000 title abstract description 96
- 239000004332 silver Substances 0.000 title abstract description 96
- -1 silver halide Chemical class 0.000 title abstract description 95
- 229910021645 metal ion Inorganic materials 0.000 title abstract description 38
- 239000000839 emulsion Substances 0.000 abstract description 38
- 229910052736 halogen Inorganic materials 0.000 abstract description 33
- 150000002367 halogens Chemical class 0.000 abstract description 30
- 150000003839 salts Chemical class 0.000 abstract description 21
- 150000002500 ions Chemical class 0.000 abstract description 12
- 230000002378 acidificating effect Effects 0.000 abstract description 8
- 239000000126 substance Substances 0.000 abstract description 4
- 239000000370 acceptor Substances 0.000 description 31
- 230000005855 radiation Effects 0.000 description 18
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 13
- 229910052741 iridium Inorganic materials 0.000 description 10
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 108010010803 Gelatin Proteins 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 229920000159 gelatin Polymers 0.000 description 7
- 239000008273 gelatin Substances 0.000 description 7
- 235000019322 gelatine Nutrition 0.000 description 7
- 235000011852 gelatine desserts Nutrition 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910052762 osmium Inorganic materials 0.000 description 7
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 7
- 229910052697 platinum Inorganic materials 0.000 description 7
- 229910052787 antimony Inorganic materials 0.000 description 6
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 6
- 229910052785 arsenic Inorganic materials 0.000 description 6
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 229910052797 bismuth Inorganic materials 0.000 description 6
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 6
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052703 rhodium Inorganic materials 0.000 description 6
- 239000010948 rhodium Substances 0.000 description 6
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- 229910001508 alkali metal halide Inorganic materials 0.000 description 4
- 150000008045 alkali metal halides Chemical class 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- 150000002429 hydrazines Chemical class 0.000 description 4
- 150000003283 rhodium Chemical class 0.000 description 4
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 3
- 238000012822 chemical development Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 3
- 229910001961 silver nitrate Inorganic materials 0.000 description 3
- WXTMDXOMEHJXQO-UHFFFAOYSA-N 2,5-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC(O)=CC=C1O WXTMDXOMEHJXQO-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 2
- 150000002503 iridium Chemical class 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Inorganic materials [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 150000003585 thioureas Chemical class 0.000 description 2
- UDATXMIGEVPXTR-UHFFFAOYSA-N 1,2,4-triazolidine-3,5-dione Chemical compound O=C1NNC(=O)N1 UDATXMIGEVPXTR-UHFFFAOYSA-N 0.000 description 1
- 150000005206 1,2-dihydroxybenzenes Chemical class 0.000 description 1
- ZWLWGULMKSZGRW-UHFFFAOYSA-N 1,4-dibutyl-1,2,4-triazolidine-3,5-dione Chemical compound C(CCC)N1NC(=O)N(C1=O)CCCC ZWLWGULMKSZGRW-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- JIGUICYYOYEXFS-UHFFFAOYSA-N 3-tert-butylbenzene-1,2-diol Chemical compound CC(C)(C)C1=CC=CC(O)=C1O JIGUICYYOYEXFS-UHFFFAOYSA-N 0.000 description 1
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 1
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical class NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 1
- FTLPCUOUNXWZMN-UHFFFAOYSA-N 4-ethyl-1,2,4-triazolidine-3,5-dione Chemical compound CCN1C(=O)NNC1=O FTLPCUOUNXWZMN-UHFFFAOYSA-N 0.000 description 1
- ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 4-methyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)CN1C1=CC=CC=C1 ZZEYCGJAYIHIAZ-UHFFFAOYSA-N 0.000 description 1
- ZVNPWFOVUDMGRP-UHFFFAOYSA-N 4-methylaminophenol sulfate Chemical compound OS(O)(=O)=O.CNC1=CC=C(O)C=C1.CNC1=CC=C(O)C=C1 ZVNPWFOVUDMGRP-UHFFFAOYSA-N 0.000 description 1
- ZPDYXWCBXQWHAI-UHFFFAOYSA-N 5-sulfanylidene-1,2,4-triazolidin-3-one Chemical compound O=C1NNC(=S)N1 ZPDYXWCBXQWHAI-UHFFFAOYSA-N 0.000 description 1
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- MNOILHPDHOHILI-UHFFFAOYSA-N Tetramethylthiourea Chemical compound CN(C)C(=S)N(C)C MNOILHPDHOHILI-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 235000015241 bacon Nutrition 0.000 description 1
- FBXVOTBTGXARNA-UHFFFAOYSA-N bismuth;trinitrate;pentahydrate Chemical compound O.O.O.O.O.[Bi+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FBXVOTBTGXARNA-UHFFFAOYSA-N 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 229960005219 gentisic acid Drugs 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- AZQWDUWTKFPMJL-UHFFFAOYSA-N hydrazine;1,2,4-triazolidine-3,5-dithione Chemical compound NN.S=C1NNC(=S)N1 AZQWDUWTKFPMJL-UHFFFAOYSA-N 0.000 description 1
- BRWIZMBXBAOCCF-UHFFFAOYSA-N hydrazinecarbothioamide Chemical compound NNC(N)=S BRWIZMBXBAOCCF-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- JGJLWPGRMCADHB-UHFFFAOYSA-N hypobromite Inorganic materials Br[O-] JGJLWPGRMCADHB-UHFFFAOYSA-N 0.000 description 1
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 1
- 235000015250 liver sausages Nutrition 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- PMRYVIKBURPHAH-UHFFFAOYSA-N methimazole Chemical compound CN1C=CNC1=S PMRYVIKBURPHAH-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- YCIMNLLNPGFGHC-UHFFFAOYSA-N o-dihydroxy-benzene Natural products OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000004986 phenylenediamines Chemical class 0.000 description 1
- 150000003057 platinum Chemical class 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 239000012260 resinous material Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/49—Print-out and photodevelopable emulsions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/485—Direct positive emulsions
- G03C1/48538—Direct positive emulsions non-prefogged, i.e. fogged after imagewise exposure
Definitions
- This invention relates to radiation-sensitive silver halide materials.
- this invention relates to a silver halide emulsion containing silver halide grains with occluded polyvalent ions therein and having a halogen acceptor and a metal salt contiguous to said silver halide grains.
- this invention relates to an improved photographic emulsion which has increased maximum density and increased contrast upon chemical development.
- this invention relates to an emulsion having good print-out characteristics which can also be chemically developed to an image record with high D and good contrast.
- Emulsions which have good print-out characteristics and which can be chemically developed to provide a permanent record are known in the art. These emulsions generally contain silver halide grains which have been precipitated in the presence or trivalent or tetravalent metal ions. French patent 1,456,581 made available October 28, 1966, discloses several emulsions of this type. However, it is desirable to further improve the chemical developing-out characteristics of good print-out emulsions.
- the polyvalent metal ions are used in the precipitation or formation of the silver halide.
- Silver halide crystals are formed with polyvalent ions or atoms occluded therein.
- suitable polyvalent metal ions include the trivalent metal ions such as those of antimony, bismuth, arsenic, gold, iridium, rho- "ice dium and the like, and tetravalent metal ions such as those of platinum, osmium, iridium and the like.
- the polyvalent metal ions or mixtures thereof can be suitably added with the water-soluble salt (e.g. silver nitrate) or the water-soluble halide (e.g.
- polyvalent ions can also be introduced into the silver halide precipitation vessel with a hydrophilic colloid such as gelatin.
- the polyvalent metal ions can be added to the system as watersoluble inorganic salts, as organo-metallic materials, as
- the amount of polyvalent metal utilized can be widely varied, though at least 1 10- and more generally about 1X10 to about 2 mole percent based on the silver halide is used.
- the presence of the polyvalent metal ions in the silver halide grain can be observed analytically by successively washing the precipitated silver halide grains with a silver halide solvent such as an organic thioether or an alkali metal thiocyanate. If the polyvalent metal ions are only contiguous to the surface, substantially all of the ions will be observed in the analysis of the first washings while substantial amounts of polyvalent ions will be found in washings just prior to complete dissolution of the silver halide when the ions are occluded therein.
- the emulsion containing the silver halide grains containing the polyvalent 'ions occluded therein is washed and the following addenda are added in accordance with the invention.
- a halogen acceptor and a trivalent or tetravalent metal ion salt are added to the emulsion.
- the trivalent or tetravalent metal ion salts, thus added, are contiguous to the silver halide grains and can be readily distinguished from the polyvalent ions occluded within the crystalline grain; for identification the trivalent or tetravalent metal ion salts can be removed by washing in an aqueous solutionfollowed by washing quickly with a silver halide solvent to remove the respective metal salts contiguous to the silver halide grains.
- Typical trivalent metal ion salts which can be added to the emulsion contiguous to the silver halide grains are those of antimony, bismuth, arsenic, gold, iridium, rhodium and the like.
- Typical tetravalent metal ion salts which can be added to the emulsion contiguous to the silver halide grains are those of platinum, osmium, iridium and the like.
- metal salts of rhodium, iridium and platinum are placed contiguous to the silver halide grains to achieve very high D and maximum contrast.
- the concentration of the trivalent or tetravalent metal ion salts utilized contiguous to the silver halide grains of this invention can be widely varied. Generally about 10 to about 500 mg./mole of silver and preferably about to 250 rug/mole of silver in the emulsion is utilized in the emulsion.
- the water-soluble silver salt and the water-soluble halide are reacted to precipitate the silver halide preferably under acidic conditions.
- the pH of the silver halide precipitation is typically less than 6 and preferably less than 5.
- Such acids as phosphoric, trifluoracetic, hydrobromic, hydrochloric, sulfuric and nitric are typically utilized in the silver halide precipitating media to maintain acidic conditions.
- the silver halide grains useful in the invention generally have an average grain size of about .01 to 10 microns, and more generally about .05 to 2 microns, in diameter.
- Suitable silver halides include silver chloride, silver bromide, silver bromoiodide, silver chloroiodide, and silver chlorobromoiodide.
- the silver halide preferably is unfogged and contains at least 50% bromide, less than 10% iodide and less than 50% chloride on a molar basis.
- Both silver halide that forms latent image predominantly on the surface of the silver halide crystal or those that form latent images predominantly inside the silver halide crystal, such as those described in Davey and Knott, US. Pat. 2,592,250 issued Apr. 8, 1952, can be used in the materials of the present invention.
- halogen acceptors can be used in the emulsion.
- nitrogen containing halogen acceptors are particularly useful in the invention.
- Typical nitrogencontaining halogen acceptors include the thioureas, hydrazines, urazoles, thiourazoles, and the like. Halogen acceptors of this type are disclosed in McBride, US. Pat. 3,287,137 issued Nov. 22, 1966.
- the preferred halogen accceptors are those such as Z-imidazolidinethione, 1- phenyl-S-mercaptotetrazole, thiosemicarbazide, tetramethylthiourea, 2-thiouracil, hydrazine, l-phenyl-2-imidazolidinethione, 1-methyl-2-mercaptoimidazole, thiourea, urazole, 3-thiourazole, 3,5-dithiourazole hydrazine salt, urazole sodium salt, 4-ethylurazole, 1,4-dibutylurazole and 3-thio-5-iminourazole.
- Such ureas which include thioureas, urazoles, etc., as well as cyclic forms thereof, are merely illustrative halogen acceptors.
- halogen acceptors that can be used in the invention include aromatic mercaptans such as thiosalicylic acid; hydroquinones such as hydroquinone, chlorohydroquinone, gentisic acid and t-butylhydroquinone; catechols such as phenyl catechol and t-butylcatechol; p-aminophenols such as N-methyl-p-aminophenol sulfate; 3-pyrazolidones such as 1-phenyl-3-pyrazolidone, 4-methyl-1- phenyl-3-pyrazolidone and 1phenyl-4,4-dimethyl-3-pyrazolidone; phenylenediamines; nitriles; phenols; glycine; sodium sulfite; alkaline materials such as borax, alkali metal hydroxide, etc.; and the like halogen acceptors well known to those skilled in the art.
- aromatic mercaptans such as thiosalicylic acid
- concentration of halogen acceptor utilized in the emulsions of the invention can be widely varied in accordance with usual practice. Usually, about .01 to 100 mole percent, and more generally about .1 to 25 mole percent, based on the silver halide in the emulsion is utilized.
- halogen acceptors are utilized contiguous to the silver halide in the present photographic system.
- Such halogen acceptors can be incorporated in the same photographic layer as the silver halide such as in the same emulsion layer, or in a layer adjacent to the silver halide.
- the photographic silver halide system of the invention can comprise layers coated on a wide variety of supports in accordance with usual practice.
- suitable supports include paper, polyethylene-coated paper, polypropylene-coated paper, cellulose acetate film, polyvinyl acetal film, polystyrene film, polyester films such as polyethylene terephthalate film, polycarbonate films, polyimide films and related films of resinous materials, as well as glass, metals and others.
- any method of imagewise halogen acceptor formation in the element followed by over-all light exposure also gives a stable record if the silver halide emulsion layer was coated without a halogen acceptor. In either case, image fading does not occur with continued exposure.
- a radiation-sensitive gelatino silver chlorobromide (5 mole percent chloride and mole percent bromide) photographic emulsion is prepared by slowly adding simultaneously an aqueous silver nitrate solution and an aqueous alkali metal halide solution to an agitated aqueous gelatin solution at 50 C. at a pH of about 1.8 adjusted with nitric acid.
- the gelatin solution and the alkali metal halide solution also contain 7.5 mg. of (NH RhCl per mole of silver.
- the emulsion is washed in the usual manner. Five mole percent of the halogen acceptor, dithiourazole hydrazine salt, is added to the emulsion.
- the emulsion is divided into three portions; one portion is coated on a polyester (polyethylene terephthalate) film support with no further addenda; to the other portions is added respectively and mg. of rhodium trichloride per mole of silver before coating on a similar support.
- the coatings are exposed through a step wedge with light from a high pressure mercury arc lamp through a Wratten 2C Filter, and developed for 4 minutes in Kodak 13-85 Developer, fixed, washed and dried.
- the following comparative results show the improvement in the emulsions of this invention.
- Rhodium trichloride as a coating addendum Contrast Dmnx N one 1. 66 2. 12 100 mg./mole Ag 4. 6O 3. 24 150 mgJmole Ag 4. 60 3. 26
- Example 2 Two emulsions of the type described in Example 1 are prepared containing 5 and 15 mg. of (NH RhCl per mole of silver in the gelatin solution and the alkali metal halide solution respectively. Five mole percent of the halogen acceptor, dithiourazole hydrazine salt, is added to each emulsion which is then respectively split again into two portions. One portion of each emulsion is coated on a photographic paper support with no further addenda; to the remaining portion is added 100 mg. of rhodium trichloride per mole of silver before coating on a similar support. Processing and exposure are carried out by the procedure of Example 1 except that the development is for 7 minutes in Kodak D-85 Developer. The following results show that increasing the amount of rhodium salt in the precipitation with or without additional rhodium salt as coating addendum does not give the improvements in developability.
- a radiation-sensitive gelatino silver chlorobromide (5 mole percent chloride and 95 mole percent bromide) photographic emulsion is prepared by slowly adding simultaneously an aqueous solution of silver nitrate and an aqueous solution of alkali metal halides to an agitated aqueous gelatin solution containing 1.5 g. bismuth trinitrate pentahydrate per mole of silver at 30 C. at a pH of about 1.8 adjusted with nitric acid.
- 0.7 mole percent of the halogen acceptor, dithiourazole hydrazine salt is added to the emulsion, which is then split into portions; one portion is coated on a polyester, polyethyleneterephthalate film support with no further addenda; to the other portions were added the coating addenda as listed in the table before coating on a similar support.
- the coatings were exposed through a stepwedge with light from a high pressure mercury arc lamp through a Wratten Filter, and developed for 2 /2 minutes in Kodak D85 developer, tfixed, washed and dried.
- the following results show the improvement in the emulsions of my invention.
- An improved radiation-sensitive, photographic silver halide system containing silver halide grains having polyvalent metal ions occluded therein, the improvement comprising the combination of at least .01 mole percent, based on silver, of a halogen acceptor other than gelatin contiguous to said grains and at least 75 mg. per mole, based on silver, of a trivalent or tetravalent metal ion salt contiguous to said silver halide grains.
- a radiation-sensitive system according to claim 1 wherein said silver halide grains have trivalent or tetravalent metal ions occluded therein.
- a radiation-sensitive system wherein said silver halide grains have osmium, platinum, iridium, antimony, arsenic, bismuth, gold or rhodium ions or mixtures thereof occluded therein.
- a radiation-sensitive system according to claim 1 wherein said halogen acceptor is a nitrogen-containing halogen acceptor.
- a radiation-sensitive system wherein said metal ions contiguous to said grains are antimony, bismuth, arsenic, gold, iridium, rhodium, osmium or platinum ions or mixtures thereof.
- a radiation-sensitive system wherein said trivalent or tetravalent metal ions are water-soluble rhodium, iridium or platinum salts or mixtures thereof which have been added to the system after the formation of the silver halide grains.
- halogen acceptor is a direct-print halogen acceptor.
- a radiation-sensitive system according to claim 1 wherein the halide of said silver halide grains is predominantly bromide.
- a radiation-sensitive photographic system comprising silver halide grains formed in an acidic medium in the presence of water-soluble osmium, platinum, iridium, antimony, arsenic, bismuth, gold or rhodium salts or mixtures thereof and wherein at least about .01 mole percent, based on silver, of a direct-print halogen acceptor and at least about mg. per mole of silver of a water-soluble trivalent or tetravalent metal ion salt have been added to the system after the formation of said silver halide grains.
- a radiation-sensitive system wherein said water-soluble trivalent or tetravalent metal ion salts are osmium, platinum or iridium salts or mixtures thereof.
- a radiation-sensitive system wherein said trivalent or tetravalent metal ions are antimony, arsenic, bismuth, gold, iridium or rhodium salts or mixtures thereof.
- a radiation-sensitive system comprising silver halide grains having trivalent or tetravalent metal ions occluded therein, at least 75 mg. per mole of silver of a water-soluble trivalent or tetravalent metal ion salt contiguous to said silver halide grains, gelatin and at least .01 mole percent, based on silver, of one other compound which is a halogen acceptor.
- a photographic element comprising the radiationsensitive system of claim 1.'
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US62909167A | 1967-04-07 | 1967-04-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3574625A true US3574625A (en) | 1971-04-13 |
Family
ID=24521544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US629091A Expired - Lifetime US3574625A (en) | 1967-04-07 | 1967-04-07 | Photographic systems with polyvalent metal ions contiguous to the silver halide grains |
Country Status (4)
Country | Link |
---|---|
US (1) | US3574625A (enrdf_load_stackoverflow) |
BE (1) | BE713272A (enrdf_load_stackoverflow) |
FR (1) | FR1558883A (enrdf_load_stackoverflow) |
GB (1) | GB1225526A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050037297A1 (en) * | 2003-08-12 | 2005-02-17 | Eastman Kodak Company | Photothermographic materials containing doped high iodide emulsions |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3761266A (en) * | 1971-03-10 | 1973-09-25 | Eastman Kodak Co | Silver halide emulsions predominantly chloride containing silver halide grains with surfaces chemically sensitized and interiors free fromchemical sensitization and the use thereof in reversal processes |
US3761276A (en) * | 1971-03-10 | 1973-09-25 | Eastman Kodak Co | Photographic element containing monodispersed unfogged silver halide grains chemically sensitized internally and externally |
US3761267A (en) * | 1971-03-10 | 1973-09-25 | Eastman Kodak Co | Photographic element containing monodispersed unfogged dye sensitizedsilver halide grains metal ions sensitized internally and the use theeof in reversal process |
DE3507830A1 (de) * | 1985-03-06 | 1986-09-11 | Agfa-Gevaert Ag, 5090 Leverkusen | Farbfotografisches aufzeichnungsmaterial mit einer silberhalogenidemulsion und verfahren zu deren herstellung |
-
1967
- 1967-04-07 US US629091A patent/US3574625A/en not_active Expired - Lifetime
-
1968
- 1968-04-04 BE BE713272D patent/BE713272A/xx unknown
- 1968-04-05 GB GB1225526D patent/GB1225526A/en not_active Expired
- 1968-04-05 FR FR1558883D patent/FR1558883A/fr not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050037297A1 (en) * | 2003-08-12 | 2005-02-17 | Eastman Kodak Company | Photothermographic materials containing doped high iodide emulsions |
US6942960B2 (en) | 2003-08-12 | 2005-09-13 | Eastman Kodak Company | Photothermographic materials containing doped high iodide emulsions |
Also Published As
Publication number | Publication date |
---|---|
DE1622931B2 (de) | 1975-07-17 |
FR1558883A (enrdf_load_stackoverflow) | 1969-02-28 |
BE713272A (enrdf_load_stackoverflow) | 1968-08-16 |
DE1622931A1 (de) | 1972-02-24 |
GB1225526A (enrdf_load_stackoverflow) | 1971-03-17 |
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