US3545973A - Photosensitive polyvinylbutyral lacquer - Google Patents

Photosensitive polyvinylbutyral lacquer Download PDF

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Publication number
US3545973A
US3545973A US631578A US3545973DA US3545973A US 3545973 A US3545973 A US 3545973A US 631578 A US631578 A US 631578A US 3545973D A US3545973D A US 3545973DA US 3545973 A US3545973 A US 3545973A
Authority
US
United States
Prior art keywords
lacquer
polyvinylbutyral
photosensitive
bichromate
bichromates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US631578A
Other languages
English (en)
Inventor
Theo Tjalke Boersma
Hendrikes Johannes Veenendaal
Hendrikus Cornelis Nico Sanden
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
US Philips Corp
Original Assignee
US Philips Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by US Philips Corp filed Critical US Philips Corp
Application granted granted Critical
Publication of US3545973A publication Critical patent/US3545973A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/04Chromates
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D129/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
    • C09D129/14Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative

Definitions

  • Photosensitive materials comprising a polyvinylbutyral lacquer and an aliphatic alkaryl, dimethyl ammonium bichromate.
  • An example is dimethyllaurylbenzyl ammonium bichromate.
  • the invention relates to the preparation of a photosensitive polyvinylbutyral lacquer which contains a waterinsoluble polyvinylbutyral resin and a bichromate. Such lacquers are used in photomechanical processes.
  • photosensitive lacquer of this type may particularly advantageously be prepared by using a water-insoluble or substantially water insoluble organic bichromate which, however, is readily soluble in solvents in which the polyvinylbutyral resin is soluble.
  • R may be an aliphatic saturated or unsaturated hydrocarbon chain having 6 to 18 carbon atoms or an alicyclic ring. If n is smaller than 3, the various hydrocarbon radicals R may be ditferent or the same.
  • Examples of such compounds are dimethyldilauryl ammonium bichromate and trimethyllauryl ammonium bichromate.
  • R is an aliphatic hydrocarbon moiety of 6-18 carbon atoms inclusive and R is alkaryl of 7 to 12 carbon atoms inclusive.
  • R may be for example, octyl, decyl, dodecyl (lauryl), tetradecyl (myristyl) hexadecyl (cetyl), octadecyl (stearyl).
  • polyvinylbutyral vinyl alcohol content approximately 20% by weight, viscosity of a standard solution of 10% by weight of polyvinylbutyral in methanol: cm. at 25 in a mixture of 75 mls. of dimethylformamide and mls. of butanone.
  • This layer was exposed to light through a template for 1 minute by means of four 125 watt high pressure mercury discharge lamps placed in the corners of a square having sides of 15 cms. at a distance of 50 cms. from the object. The unexposed parts of the lacquers were then washed away in methanol. The remaining lacquer pattern may be used as a screening layer for various etching or electro-deposition processes.
  • R is an aliphatic hydrocarbon chain of 6 to 18 carbon atoms and R is aralkyl of 7 to 12 carbon atoms.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
US631578A 1966-04-20 1967-04-18 Photosensitive polyvinylbutyral lacquer Expired - Lifetime US3545973A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6605244A NL6605244A (de) 1966-04-20 1966-04-20

Publications (1)

Publication Number Publication Date
US3545973A true US3545973A (en) 1970-12-08

Family

ID=19796338

Family Applications (1)

Application Number Title Priority Date Filing Date
US631578A Expired - Lifetime US3545973A (en) 1966-04-20 1967-04-18 Photosensitive polyvinylbutyral lacquer

Country Status (9)

Country Link
US (1) US3545973A (de)
AT (1) AT278997B (de)
BE (1) BE697257A (de)
CH (1) CH483657A (de)
DE (1) DE1669238B2 (de)
ES (1) ES339435A1 (de)
GB (1) GB1123642A (de)
NL (1) NL6605244A (de)
SE (1) SE330828B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4262080A (en) * 1978-10-31 1981-04-14 Nasa Method for applying photographic resist to otherwise incompatible substrates

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL6605244A (de) * 1966-04-20 1967-10-23

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1123642A (en) * 1966-04-20 1968-08-14 Philips Electronic Associated Improvements relating to photosensitive lacquers
US3471294A (en) * 1964-10-20 1969-10-07 Philips Corp Photosensitive polyvinyl butyral lacquer containing water-insoluble chromates or bichromates

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3471294A (en) * 1964-10-20 1969-10-07 Philips Corp Photosensitive polyvinyl butyral lacquer containing water-insoluble chromates or bichromates
GB1123642A (en) * 1966-04-20 1968-08-14 Philips Electronic Associated Improvements relating to photosensitive lacquers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4262080A (en) * 1978-10-31 1981-04-14 Nasa Method for applying photographic resist to otherwise incompatible substrates

Also Published As

Publication number Publication date
BE697257A (de) 1967-10-19
AT278997B (de) 1970-02-25
NL6605244A (de) 1967-10-23
DE1669238A1 (de) 1971-06-09
CH483657A (de) 1969-12-31
GB1123642A (en) 1968-08-14
SE330828B (de) 1970-11-30
DE1669238B2 (de) 1976-06-16
ES339435A1 (es) 1968-10-01

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