US3545973A - Photosensitive polyvinylbutyral lacquer - Google Patents
Photosensitive polyvinylbutyral lacquer Download PDFInfo
- Publication number
- US3545973A US3545973A US631578A US3545973DA US3545973A US 3545973 A US3545973 A US 3545973A US 631578 A US631578 A US 631578A US 3545973D A US3545973D A US 3545973DA US 3545973 A US3545973 A US 3545973A
- Authority
- US
- United States
- Prior art keywords
- lacquer
- polyvinylbutyral
- photosensitive
- bichromate
- bichromates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
- C09D129/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
Definitions
- Photosensitive materials comprising a polyvinylbutyral lacquer and an aliphatic alkaryl, dimethyl ammonium bichromate.
- An example is dimethyllaurylbenzyl ammonium bichromate.
- the invention relates to the preparation of a photosensitive polyvinylbutyral lacquer which contains a waterinsoluble polyvinylbutyral resin and a bichromate. Such lacquers are used in photomechanical processes.
- photosensitive lacquer of this type may particularly advantageously be prepared by using a water-insoluble or substantially water insoluble organic bichromate which, however, is readily soluble in solvents in which the polyvinylbutyral resin is soluble.
- R may be an aliphatic saturated or unsaturated hydrocarbon chain having 6 to 18 carbon atoms or an alicyclic ring. If n is smaller than 3, the various hydrocarbon radicals R may be ditferent or the same.
- Examples of such compounds are dimethyldilauryl ammonium bichromate and trimethyllauryl ammonium bichromate.
- R is an aliphatic hydrocarbon moiety of 6-18 carbon atoms inclusive and R is alkaryl of 7 to 12 carbon atoms inclusive.
- R may be for example, octyl, decyl, dodecyl (lauryl), tetradecyl (myristyl) hexadecyl (cetyl), octadecyl (stearyl).
- polyvinylbutyral vinyl alcohol content approximately 20% by weight, viscosity of a standard solution of 10% by weight of polyvinylbutyral in methanol: cm. at 25 in a mixture of 75 mls. of dimethylformamide and mls. of butanone.
- This layer was exposed to light through a template for 1 minute by means of four 125 watt high pressure mercury discharge lamps placed in the corners of a square having sides of 15 cms. at a distance of 50 cms. from the object. The unexposed parts of the lacquers were then washed away in methanol. The remaining lacquer pattern may be used as a screening layer for various etching or electro-deposition processes.
- R is an aliphatic hydrocarbon chain of 6 to 18 carbon atoms and R is aralkyl of 7 to 12 carbon atoms.
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Paints Or Removers (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL6605244A NL6605244A (de) | 1966-04-20 | 1966-04-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3545973A true US3545973A (en) | 1970-12-08 |
Family
ID=19796338
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US631578A Expired - Lifetime US3545973A (en) | 1966-04-20 | 1967-04-18 | Photosensitive polyvinylbutyral lacquer |
Country Status (9)
Country | Link |
---|---|
US (1) | US3545973A (de) |
AT (1) | AT278997B (de) |
BE (1) | BE697257A (de) |
CH (1) | CH483657A (de) |
DE (1) | DE1669238B2 (de) |
ES (1) | ES339435A1 (de) |
GB (1) | GB1123642A (de) |
NL (1) | NL6605244A (de) |
SE (1) | SE330828B (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4262080A (en) * | 1978-10-31 | 1981-04-14 | Nasa | Method for applying photographic resist to otherwise incompatible substrates |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6605244A (de) * | 1966-04-20 | 1967-10-23 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1123642A (en) * | 1966-04-20 | 1968-08-14 | Philips Electronic Associated | Improvements relating to photosensitive lacquers |
US3471294A (en) * | 1964-10-20 | 1969-10-07 | Philips Corp | Photosensitive polyvinyl butyral lacquer containing water-insoluble chromates or bichromates |
-
1966
- 1966-04-20 NL NL6605244A patent/NL6605244A/xx unknown
-
1967
- 1967-04-17 GB GB17433/67A patent/GB1123642A/en not_active Expired
- 1967-04-17 AT AT358967A patent/AT278997B/de not_active IP Right Cessation
- 1967-04-17 DE DE1967N0030363 patent/DE1669238B2/de active Granted
- 1967-04-17 SE SE05332/67A patent/SE330828B/xx unknown
- 1967-04-17 CH CH538267A patent/CH483657A/de not_active IP Right Cessation
- 1967-04-18 US US631578A patent/US3545973A/en not_active Expired - Lifetime
- 1967-04-18 ES ES339435A patent/ES339435A1/es not_active Expired
- 1967-04-19 BE BE697257D patent/BE697257A/xx unknown
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3471294A (en) * | 1964-10-20 | 1969-10-07 | Philips Corp | Photosensitive polyvinyl butyral lacquer containing water-insoluble chromates or bichromates |
GB1123642A (en) * | 1966-04-20 | 1968-08-14 | Philips Electronic Associated | Improvements relating to photosensitive lacquers |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4262080A (en) * | 1978-10-31 | 1981-04-14 | Nasa | Method for applying photographic resist to otherwise incompatible substrates |
Also Published As
Publication number | Publication date |
---|---|
BE697257A (de) | 1967-10-19 |
AT278997B (de) | 1970-02-25 |
NL6605244A (de) | 1967-10-23 |
DE1669238A1 (de) | 1971-06-09 |
CH483657A (de) | 1969-12-31 |
GB1123642A (en) | 1968-08-14 |
SE330828B (de) | 1970-11-30 |
DE1669238B2 (de) | 1976-06-16 |
ES339435A1 (es) | 1968-10-01 |
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