US3515652A - Bright nickel plating - Google Patents
Bright nickel plating Download PDFInfo
- Publication number
- US3515652A US3515652A US596750A US3515652DA US3515652A US 3515652 A US3515652 A US 3515652A US 596750 A US596750 A US 596750A US 3515652D A US3515652D A US 3515652DA US 3515652 A US3515652 A US 3515652A
- Authority
- US
- United States
- Prior art keywords
- nickel
- acid
- sodium
- butyne
- diol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title description 68
- 229910052759 nickel Inorganic materials 0.000 title description 32
- 238000007747 plating Methods 0.000 title description 5
- -1 acetylene alcohol Chemical compound 0.000 description 29
- 239000002253 acid Substances 0.000 description 25
- 150000002815 nickel Chemical class 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 229960001922 sodium perborate Drugs 0.000 description 16
- YKLJGMBLPUQQOI-UHFFFAOYSA-M sodium;oxidooxy(oxo)borane Chemical compound [Na+].[O-]OB=O YKLJGMBLPUQQOI-UHFFFAOYSA-M 0.000 description 16
- 150000007513 acids Chemical class 0.000 description 13
- 239000007795 chemical reaction product Substances 0.000 description 13
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 9
- 229910052783 alkali metal Inorganic materials 0.000 description 9
- 150000001340 alkali metals Chemical class 0.000 description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 8
- 229910052749 magnesium Inorganic materials 0.000 description 8
- 239000011777 magnesium Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000003929 acidic solution Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 6
- 239000004327 boric acid Substances 0.000 description 6
- NIAGBSSWEZDNMT-UHFFFAOYSA-N hydroxidotrioxidosulfur(.) Chemical class [O]S(O)(=O)=O NIAGBSSWEZDNMT-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 150000003949 imides Chemical class 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 4
- 239000011780 sodium chloride Substances 0.000 description 4
- JLEPZAUPTZFVIM-RHIZIOMBSA-N (3s,5s,9r,10s,13r,17r)-3-hydroxy-10,13-dimethyl-17-[(2r)-6-methylheptan-2-yl]-1,2,3,4,5,6,9,11,12,15,16,17-dodecahydrocyclopenta[a]phenanthrene-14-carbaldehyde Chemical compound C1[C@@H](O)CC[C@]2(C)[C@@H](CC[C@@]3([C@@H]([C@H](C)CCCC(C)C)CCC33C=O)C)C3=CC[C@H]21 JLEPZAUPTZFVIM-RHIZIOMBSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 150000001642 boronic acid derivatives Chemical class 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 3
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical compound OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 3
- 239000012047 saturated solution Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- XNMQEEKYCVKGBD-UHFFFAOYSA-N 2-butyne Chemical compound CC#CC XNMQEEKYCVKGBD-UHFFFAOYSA-N 0.000 description 2
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 241000080590 Niso Species 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 125000006264 diethylaminomethyl group Chemical group [H]C([H])([H])C([H])([H])N(C([H])([H])*)C([H])([H])C([H])([H])[H] 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- 239000003792 electrolyte Substances 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- WCYWZMWISLQXQU-UHFFFAOYSA-N methyl Chemical compound [CH3] WCYWZMWISLQXQU-UHFFFAOYSA-N 0.000 description 2
- 125000001064 morpholinomethyl group Chemical group [H]C([H])(*)N1C([H])([H])C([H])([H])OC([H])([H])C1([H])[H] 0.000 description 2
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 2
- HZPNKQREYVVATQ-UHFFFAOYSA-L nickel(2+);diformate Chemical compound [Ni+2].[O-]C=O.[O-]C=O HZPNKQREYVVATQ-UHFFFAOYSA-L 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- MZSDGDXXBZSFTG-UHFFFAOYSA-M sodium;benzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC=C1 MZSDGDXXBZSFTG-UHFFFAOYSA-M 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RHZZVWTVJHZKAH-UHFFFAOYSA-K trisodium;naphthalene-1,2,3-trisulfonate Chemical compound [Na+].[Na+].[Na+].C1=CC=C2C(S([O-])(=O)=O)=C(S([O-])(=O)=O)C(S(=O)(=O)[O-])=CC2=C1 RHZZVWTVJHZKAH-UHFFFAOYSA-K 0.000 description 2
- ZGZXYZZHXXTTJN-UHFFFAOYSA-N 2,3-dichlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(Cl)=C1Cl ZGZXYZZHXXTTJN-UHFFFAOYSA-N 0.000 description 1
- TXCLTIFWSNGTIK-UHFFFAOYSA-N 3-ethylhept-1-yn-3-ol Chemical compound CCCCC(O)(CC)C#C TXCLTIFWSNGTIK-UHFFFAOYSA-N 0.000 description 1
- ACGZBRWTWOZSFU-UHFFFAOYSA-N 4-(diethylamino)but-2-yn-1-ol Chemical compound CCN(CC)CC#CCO ACGZBRWTWOZSFU-UHFFFAOYSA-N 0.000 description 1
- WBPDYMXNWYFHGZ-UHFFFAOYSA-N 4-bromobenzenesulfonic acid;sodium Chemical compound [Na].OS(=O)(=O)C1=CC=C(Br)C=C1 WBPDYMXNWYFHGZ-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 101100273866 Aedes albopictus CECC1 gene Proteins 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical compound [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910018597 Ni(BF4)2 Inorganic materials 0.000 description 1
- 229910006069 SO3H Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
- IBVWKDVFDAWRFU-UHFFFAOYSA-L benzenesulfonate;nickel(2+) Chemical compound [Ni+2].[O-]S(=O)(=O)C1=CC=CC=C1.[O-]S(=O)(=O)C1=CC=CC=C1 IBVWKDVFDAWRFU-UHFFFAOYSA-L 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- OTJZCIYGRUNXTP-UHFFFAOYSA-N but-3-yn-1-ol Chemical compound OCCC#C OTJZCIYGRUNXTP-UHFFFAOYSA-N 0.000 description 1
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940044170 formate Drugs 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- PCPDOIKJFCRPEA-UHFFFAOYSA-L naphthalene-1,2-disulfonate nickel(2+) Chemical compound C=1(C(=CC=C2C=CC=CC12)S(=O)(=O)[O-])S(=O)(=O)[O-].[Ni+2] PCPDOIKJFCRPEA-UHFFFAOYSA-L 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- YGMADCGBQRYLND-UHFFFAOYSA-N oct-4-yne-3,6-diol Chemical compound CCC(O)C#CC(O)CC YGMADCGBQRYLND-UHFFFAOYSA-N 0.000 description 1
- LBSKEFWQPNVWTP-UHFFFAOYSA-N pent-1-yn-3-ol Chemical compound CCC(O)C#C LBSKEFWQPNVWTP-UHFFFAOYSA-N 0.000 description 1
- IDYNOORNKYEHHO-UHFFFAOYSA-N pent-3-yn-1-ol Chemical compound CC#CCCO IDYNOORNKYEHHO-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- ABOYDMHGKWRPFD-UHFFFAOYSA-N phenylmethanesulfonamide Chemical compound NS(=O)(=O)CC1=CC=CC=C1 ABOYDMHGKWRPFD-UHFFFAOYSA-N 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 1
- QXCFFLGAAJDPTG-UHFFFAOYSA-M sodium;2,3-dichlorobenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC=CC(Cl)=C1Cl QXCFFLGAAJDPTG-UHFFFAOYSA-M 0.000 description 1
- VQIDGTFLGAAJGI-UHFFFAOYSA-M sodium;prop-1-ene-1-sulfonate Chemical compound [Na+].CC=CS([O-])(=O)=O VQIDGTFLGAAJGI-UHFFFAOYSA-M 0.000 description 1
- 239000010902 straw Substances 0.000 description 1
- HGKLFYLYWZXWPO-UHFFFAOYSA-N sulfo benzoate Chemical compound OS(=O)(=O)OC(=O)C1=CC=CC=C1 HGKLFYLYWZXWPO-UHFFFAOYSA-N 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 description 1
- BSXLLFUSNQCWJP-UHFFFAOYSA-N thiophene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=CS1 BSXLLFUSNQCWJP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/16—Acetylenic compounds
Definitions
- This invention relates to bright nickel plating.
- the invention is based on the discovery that on reacting in water acetylene alcohols with sodium perborate or any other alkali metal perborate capable of forming a borate derivative and incorporating this material in a nickel plating bath in combination with sulpho-oxygen compounds of the sulphonic acid type, it is found to be very effective for promoting the formation of bright ductile nickel electro-deposits.
- a process for producing bright nickel deposits which comprises, electro-depositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from 0.01 to 1.5 g./l. of a preformed borate compound consisting of the reaction product of an acetylene alcohol and an alkali metal perborate together with a watersoluble sulpho-oxygen compound at a concentration of from 0.5 to 90 g./l.
- the acetylenic alcohol may have the general formula where M is a hydroxyl, hydroxmethyl or hydroxyethyl radical, M is a hydrogen or methyl radical and M is a methyl, hydroxymethyl, hydroxmethyl, methoxymethyl, diethylaminomethyl, morpholinomethyl or hydroxypropyne radical.
- This alcohol may also be reacted with the perborate under reflux.
- Equal molecular quantities of acetylenic alcohol and sodium perborate are taken.
- the acetylenic alcohol is made into a 50% solution form in water, placed in a reaction flask and heated to 85-95 C. under a reflux condenser.
- the sodium perborate is added gradually until addition of total quantity of perborate has been made, reaction is then continued until gassing ceases and reaction product then gradually changes from a pale straw colour to a deep intense brown colour.
- any of this particular group of chemicals is particularly effected when reacted with sodium perborate, especially 2-butyne-1z4-diol at a concentration of 0.010.5 gm.
- Additions of the brighteners according to this invention have been used in the normal standard Watts type nickel electroplating bath. However, it was also found that they are equally effective in all other acid nickel electroplating baths and, therefore, the invention is applicable to any nickel electro-deposition operation that takes place from an aqueous acidic solution of one or more nickel salts.
- reaction product can also be used for the production of a semi-bright nickel deposit from a Watts-type nickel solution in conjunction with an acetate.
- the compounds listed in Table II are examples of the sulpho-oxygen compounds which are used in conjunction with the reacted product of the acetylenic alcohols.
- Binuclear aromatic sulphonic acids and alkali Brilliant nickel deposits may be obtained in accordmetal, ammonium, magnesium and nickel salts thereof. ance with this invention, using electrolytes listed in Z-naphthalene monosulphonic acid C H SO H Table III.
- C H (SO H) An example of the type of nickel solution that has been 1:5 or 2:7 naphthalene disulphonic acid nickel salt used with particular success in accordance with this in- C H (SO Ni vention is one containing: Naphthalene trisulphonic acid C H (SO H) Naphthalene trisulphonic acid trisodi-um salt NI JH O g./l 280 C10H5(SO3 Na)3 --g-/1 Diphenyl pp-disulphonic acid.HSO C H C H SO H 40 3 0 g./l 4O Z-naphthol 3:6 disulphonic acid.
- the solution comprises at least one nickel salt, in which is dissolved from 0.00156 to 0.3 g./l. of a reaction product of Z-butyne-l: 4-diol and sodium perborate and 0.1 to 1.0 g./l. 2-propene-l-sulphonic acid in the presence of between 50 g./l. and a saturated solution of boric acid and 0.5 to 80 g./l.
- a water soluble sulphooxygen compound selected from the group consisting of mononuclear and binuclear aromatic sulphonic acids, alkali metal, ammonium, magnesium and nickel salts of said acids and mononoclear aromatic sulphonamides and sulphonimides or salts of such amides and imides.
- Examples of the type of nickel solutions that were used with particular success in accordance with this invention are those containing:
- a process for producing bright nickel deposits which comprises electro-depositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved from 0.00156 to 1.0 g./l. of a preformed borate compound consisting of the reaction product of the reaction of equal molar amounts of an acetylene alcohol and an alkali metal perborate at a temperature of 85-' 95 C.; together with a water-soluble sulpho-oxygen compound at a concentration of from 0.5 to 90 g./l.
- the sulphooxygen compound is selected from a group consisting of mononuclear and binuclear sulphonic acids, heterocyclic sulphonic acids, mononuclear aromatic sulphonic acids, alkali metal, ammonium, magnesium and nickel salts of said acids, and mononuclear aromatic sulphonamides and sulphonimides.
- a process of producing bright nickel deposits which comprises electrodepositing nickel from an aqueous acidic solution of at least one nickel salt in which there is incorporated from 0.00156 to 0.3 g./l. of the borate reaction product of the reaction of equal molar amounts of an acetylenic alcohol and with sodium perborate at a temperature of 85-95 C., the said acetylenic alcohol having the general formula where M, is a hydroxyl, hydroxymethyl or hydroxyethyl radical, M is ahydrogen or methyl radical and M is a methyl, hydroxymethyl, hydroxyethyl, methoxymethyl, diethylaminomethyl, morpholinomethyl or hydroxypropyne radical and 0.5 to 90 g./l. of a water soluble sulphooxygen compound.
- a process for producing bright nickel deposits which comprises, electro-depositing nickel from an aqueous acidic solution of at leastone nickel salt, in which is dissolved from 0.00156 to 0.3 g./l. of a borate reaction product of the reaction of equal molar amounts of 2-butyne-l :4 diol and sodium perborate at a temperature of 85-95 C. and 0.1 to 1.0 g./l. 2-propene-l-sulphonic acid in the presence of between 50 g./l. and a saturated solution of boric acid and 0.5 to g./l.
- a water soluble sulpho-oxygen compound selected from the group consisting of mononuclear and binuclear aromatic sulphonic acids, alkali metals, ammonium, magnesium and nickel salts of said acids and mononuclear aromatic sulphonamides and imides or salts of such amides and imides.
- a process for producing bright nickel deposits which comprises, electro-depositing nickel from an aqueous acidic nickel solution of at least one nickel salt in which there is dissolved from 0.00156 to 0.3 g./l. of the borate reaction product of the reaction of equal molar amounts of 2-butyne-lz4-diol and sodium perborate at a temperature of -95 C., 0.1 to 1.5 g./l. Z-propene-lsulphonic acid, 50 g./l. to a saturated solution of boric acid and 0.5 to 80 g./l. of naphthalene trisulphonic acidsodium salt.
- a process for producing bright nickel deposits which comprises, electro-depositing nickel from an aqueous acidic solution of at least one nickel salt in which there is dissolved at least 0.3 g./l. of the borate reaction product of the reaction of equal molar amounts of 2-butyne-lz4-diol and sodium perborate at a temperature of 85-95 C., 0.1 to 1.0 g./l. 2-propene-l-sulphonic acid, at least 50 g./l. boric acid and l to 10 g./I. of orthosulphobenzoic acid imide sodium salt.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US59675066A | 1966-11-25 | 1966-11-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US3515652A true US3515652A (en) | 1970-06-02 |
Family
ID=24388544
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US596750A Expired - Lifetime US3515652A (en) | 1966-11-25 | 1966-11-25 | Bright nickel plating |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3515652A (enrdf_load_html_response) |
| GB (2) | GB1059915A (enrdf_load_html_response) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4416741A (en) * | 1981-03-06 | 1983-11-22 | Langbein-Pfanhauser Werke Ag | Method and bath for the electrodeposition of palladium/nickel alloys |
| US4421611A (en) * | 1982-09-30 | 1983-12-20 | Mcgean-Rohco, Inc. | Acetylenic compositions and nickel plating baths containing same |
| WO2008154722A1 (en) * | 2007-06-18 | 2008-12-24 | Vale Inco Limited | Method for improving nickel cathode morphology |
| CN103173800A (zh) * | 2013-03-27 | 2013-06-26 | 江苏增钬云表面处理有限公司 | 镀镍光亮剂及其配制使用方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR16632E (fr) * | 1969-05-07 | 1913-03-18 | Pestourie & Quentin Soc | Soupape d'échappement libre |
| GB2175922B (en) * | 1985-07-03 | 1989-07-05 | Inst Phisikochimia | Nickel sulphamate aqueous electrolyte composition |
| GB2246144B (en) * | 1990-07-18 | 1994-08-03 | Nippon Piston Ring Co Ltd | Composite plating bath |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3245887A (en) * | 1963-01-31 | 1966-04-12 | M & T Chemicals Inc | Electrodeposition of nickel |
-
0
- GB GB1052028D patent/GB1052028A/en active Active
-
1963
- 1963-09-12 GB GB36051/63A patent/GB1059915A/en not_active Expired
-
1966
- 1966-11-25 US US596750A patent/US3515652A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3245887A (en) * | 1963-01-31 | 1966-04-12 | M & T Chemicals Inc | Electrodeposition of nickel |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4416741A (en) * | 1981-03-06 | 1983-11-22 | Langbein-Pfanhauser Werke Ag | Method and bath for the electrodeposition of palladium/nickel alloys |
| US4421611A (en) * | 1982-09-30 | 1983-12-20 | Mcgean-Rohco, Inc. | Acetylenic compositions and nickel plating baths containing same |
| WO2008154722A1 (en) * | 2007-06-18 | 2008-12-24 | Vale Inco Limited | Method for improving nickel cathode morphology |
| CN103173800A (zh) * | 2013-03-27 | 2013-06-26 | 江苏增钬云表面处理有限公司 | 镀镍光亮剂及其配制使用方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1052028A (enrdf_load_html_response) | |
| GB1059915A (en) | 1967-02-22 |
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