US3507646A - Electrophotographic process using a single phase photoconductive glass imaging layer - Google Patents
Electrophotographic process using a single phase photoconductive glass imaging layer Download PDFInfo
- Publication number
- US3507646A US3507646A US516726A US3507646DA US3507646A US 3507646 A US3507646 A US 3507646A US 516726 A US516726 A US 516726A US 3507646D A US3507646D A US 3507646DA US 3507646 A US3507646 A US 3507646A
- Authority
- US
- United States
- Prior art keywords
- plate
- photoconductive
- glass
- electrophotographic
- single phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011521 glass Substances 0.000 title description 46
- 238000000034 method Methods 0.000 title description 20
- 230000008569 process Effects 0.000 title description 14
- 238000003384 imaging method Methods 0.000 title description 8
- 239000000463 material Substances 0.000 description 24
- 239000000203 mixture Substances 0.000 description 16
- 229910044991 metal oxide Inorganic materials 0.000 description 15
- 150000004706 metal oxides Chemical class 0.000 description 15
- 239000000758 substrate Substances 0.000 description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 239000011669 selenium Substances 0.000 description 10
- 229910052711 selenium Inorganic materials 0.000 description 10
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 9
- 239000002245 particle Substances 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 239000011810 insulating material Substances 0.000 description 5
- 239000000155 melt Substances 0.000 description 5
- 229910052697 platinum Inorganic materials 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- 229910000464 lead oxide Inorganic materials 0.000 description 4
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 description 4
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- -1 AS203 Chemical compound 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 238000010587 phase diagram Methods 0.000 description 1
- 229920002382 photo conductive polymer Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/085—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and being incorporated in an inorganic bonding material, e.g. glass-like layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/087—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and being incorporated in an organic bonding material
Definitions
- An electrophotographic plate comprising a single phase glassy layer having at least one photoconductive metal oxide and at least one glass former, with said metal oxide comprising at least 50 mole percent of said layer.
- This invention relates in general to electrophotographic imaging systems and, more specifically, to electrophotographic plates having a photoconductive insulating layer comprising a single phase homogeneous glass containing a major proportion of the oxides and of polarizable cations.
- images may be formed and developed on the surface of certain photoconductive insulating materials by electrostatic means.
- the basic electrophotographic process as taught by Carlson in U.S. Patent 2,297,691, involves uniformly charging a photoconductive insulating layer and then exposing the layer to light-and-shadow image which dissipates the charge on the portions of the layer which are exposed to light.
- the electrostatic latent image formed on the layer corresponds to the configuration of the light and shadow image.
- a latent electrostatic image may be formed on the layer by charging said layer in image configuration. This image is rendered visible by depositing on the imaged layer a finely divided electroscopic developing material.
- the powder developing material will normally be attracted to those portions of the layer which retain a charge, thereby forming a powder imagecorre'spon'ding to the latent electrostatic image.
- the powder image may be fixed directly to the plate, as by heat ornsolvent. fusing.
- the powder image may be transferred to a sheet of receiving material such as paper and fixed thereon.
- the photoconductive insulating layer to be useful in electrophotography must be capable of holding an electrostatic charge in the dark and dissipating the charge to a conductive substrate when exposedto light. That various photoconductive insulating materials may be used in making electrophotographic plates is known. Suitable photoconductive insulating materials such as anthracene, sulfur, selenium or mixtures thereof have been disclosed by Carlson in U.S. Patent 2,297,691. These materials generally have sensitivity limited to the blue or near ultraviolet range, and all but selenium have a further limitation of being only slightly light sensitive. For this reason, selenium has been the most commercially acceptable material for use in electrophotographic plates.
- Vitreous selenium while desirable in most aspects, suffers from serious limitations in that its spectral response is somewhat limited to the ultraviolet, blue and green regions of the spectrum and the preparation of vitreous selenium plates requires costly and complex procedures such as vacuum evaporation. Also, vitreous selenium layers are.
- selenium plates require the use of a separate conductive substrate layer, preferably with an additional barrier layer deposited thereon before deposition of the selenium photoconductive layer. Because of these economic and commercial considerations, there have been many recent efforts towards developing photoconductive insulating materials other than selenium for use in electrophotographic plates.
- inorganic pigment-binder type plates can be charged only by negative and not by positive corona discharge. This property makes them commercially undesirable since negative corona discharge generates much more ozone and is generally more difiicult to control.
- organic photoconductive dyes in a wide variety of polycyclic compounds may be used together with suitable resin materials to form photoconductive insulating layers useful in bindertype plates.
- These plates generally lack sensitivity levels necessary for use in conventional electrophotographic copying devices.
- these plates lack abrasion resistance and stability of operation, particularly at elevated temperatures.
- inherently photoconductive polymers are used, frequently in combination with sensitizing dyes or Lewis acids, to form photoconductive insulating layers.
- These polymeric organic photoconductive plates generally have the inherent disadvantages of high cost of manufacture, brittleness, poor adhesion to supporting substrates.
- a number of these photoconductive insulating layers have thermal distortion properties which make them undesirable in an automatic electrophotographic apparatus which often include the powerful lamps and thermal fusing devices which tend to heat the electrophotographic plate.
- Another object of this invention is to provide an electrophotographic plate having improved homogeneity and uniformity of physical and electrical characteristics.
- Another object of this invention is to provide an electrophotographic plate having a smooth, tough, abrasionresistant surface.
- Still another object of this invention is to provide an electrophotographic plate having a wide range of useful physical properties.
- Yet another object of this invention is to provide elec trophotographic plates suitable for use in both single use and reusable systems.
- Still another object of this invention is to provide an electrophotographic imaging process utilizing an electrophotographic plate having high sensitivity and a tough, smooth, abrasion-resistant surface.
- an electrophotographic plate comprising a single phase vitreous glass layer, the major component of which is a photoconductive oxide, and a method of electrophotographic imaging using said plate.
- the plate is homogeneous and non-crystalline and has a smooth, tough surface.
- lead oxide has been found to give especially good results. Plates including lead oxide are especially highly photosensitive and are especially durable. While these plates are sensitive to visible light and are useful in conventional electrophotography, they are also sensitive to X-rays and are especially useful in electroradiography. Systems of electroradiography for which the plates of this invention are suitable include that described by Schaffert in US. Patent 2,666,144, for example. Therefore, lead oxide is the preferred major component for use in single phase glassy plates.
- the electrophotographic plate of this invention is distinguished from the inorganic pigment-glass binder plates of the prior art in providing a single phase system which is inherently capable of including a high proportion of photoconductive material without producing a rough surface.
- the major component of the photoconductive insulating layer consists of the photoconductive metal oxide and the remainder of the layer comprises any glass forming materials which form a homogeneous single phase layer with the metal oxide. It is preferred that the photoconductive insulating layer comprise at least about 50 mole percent photoconductive metal oxide(s) for the optimum combination of desirable physical properties and highest photosensitivity. In general, the higher the proportion of photoconductive metal oxide in the glass, the higher the photosensitivity of the plate. However, if the proportion of somemetal oxide is too high, it may not be possible to prevent the metal oxide from crystallizing. Generally, up to about 85 mole percent metal oxide may be included before undesired crystallization occurs.
- photoconductive metal oxide may be used in the electrophotographic plates of this invention.
- Lead oxide has especially desirable electrical and other physical properties and is, therefore, the preferred photoconductive metal oxide.
- Typical photoconductive oxides include 4 PhD, ZnO, BaO, TiO CdO, Bi O Ga O In O SnO, SnO Sb O TeO Cu O, As O HgO and mixtures thereof.
- silicon dioxide has been found to produce excellent single phase glasses with high proportions of the photoconductive metal oxide. Any other suitable glass former may be used where desired.
- Typical glass forming materials include As O B P 0 Sb O GeO V 0 TeO and mixtures thereof.
- the single phase glassy layer may include any other v suitable material, where desired.
- various physical property modifying materials may be included.
- Typical materials which may be included to modify the electrical or other physical properties of the plate include A1 0 MgO, Li O, Na O, K 0, CaO, SrO, andmixtures thereof.
- the single phase glass photoconductive insulating layer may be deposited on any suitable supporting substrate, or may be cast as a self-supporting sheet. The plate may be over-coated with any suitable material, if desired.
- the single phase photoconductive insulating layer may be used in the formation of multilayer sandwich configurations adjacent a dielectric layer, similar to those shown by Golovin et al., in the publication entitled A New Elec trophotographic Process, Effected by Means of Combined Electret Layers, Doklady Akad. Nauk SSSR, vol. 129, No.
- the single phase glass photoconductive insulating layer is coated on a substrate
- a wide variety of materials may be used, for example, metal surfaces such as aluminum, brass, stainless steel, copper, nickel, zinc, etc.; conductively coated glass such as tin or indium coated glass, aluminum coated glass, etc.; under certain conditions, such as at higher temperatures common plate glass has a sufiiciently lower resistivity to act as a ground plane.
- a backing material may have a. surprisingly high resistivity, such as 10 -10 ohm/cm. The material must, however, be capable of withstanding the temperatures required for fusing the single phase glass photoconductive insulating layer.
- EXAMPLE I About 25 mole percent powdered SiO is mixed under acetone with about 70 mole percent powdered PhD and 5 .mole percent A1 0 The mixture is placed in a platinum crucible, and melted at a temperature of about 900 C. A clear, single phase glass is formed in the crucible. The melt is poured onto a stainless steel plate, preheated to about 200 C. The glass is then annealed from about 400 C. to room temperature in about 3 hours. The glass layer produced is then examined with a polarizing microscope and by X-ray diffraction, both of which establish the absence of crystalline phases. The resulting glass has a tough, abrasion-resistant surface and a pale yellow color.
- EXAMPLE 11 About 23 mole percent powdered SiO about 60 mole percent powdered PhD and about 17 mole percent Bi O are mixed under acetone. The mixture is placed in a platinum crucible and heated to about 900 C. As the powders melt, a clear single phase glass is formed. The melt is poured onto a stainless steel plate preheated to about 200 C. The glass is then annealed from about 400 C. to room temperature in about 3 hours. A tough abrasion resistant glass results with a pale yellow color.
- EXAMPLE III About 20 mole percent powdered B is mixed under acetone with about 70 mole percent powdered CdO and about 10 mole percent powdered A1 0 The mixture is placed in a platinum crucible and melted at a temperature of about 1300 C. The melt is poured onto a stainless steel plate preheated to about 200 C. The glass is then annealed from about 500 C. to room temperature, in about 4 hours. Examination with a polarizing microscope and X-ray diffraction establish the absence of crystalline phases. A smooth, hard surface glass results having a dark color.
- EXAMPLE V About 10 mole percent powdered SiO is mixed with about 12 mole percent powdered B 0 about 0 mole percent powdered PbO and about 28 mole percent ZnO under acetone. The mixture is placed in a platinum cruicible and melted at a temperature of about 950 C. The melt is poured onto a stainless steel plate preheated to about 200 C. The 'glass is annealed from about 450 C. to room temperature in about 3 hours. Examination confirms the presence of a single phase glassy layer. This plate has a pale yellow color.
- EXAMPLE VI The following ingredients are mixed in powdered form under acetone: about mole percent CdO, about 5 mole percent ZnO, about 35 mole percent PbO, about 5 mole percent A1 0 about 5 mole percent Bi O about 5 mole percent B 0 about 25 mole percent Si0 and about 10 mole percent GeO
- the mixture is placed in a platinum crucible and melted at a temperature of about 950 C.
- the melt is poured onto a stainless steel plate preheated to about 300 C.
- the glass is annealed from about 45 0 C. to room temperature in about 3 hours. A single phase glassy layer results.
- the single phase glalss photobonduc'tive insulalting layers prepared as in the above examples are useful in electrophotographic plates in electrophotographic imaging processes. These materials are also especially useful in electroradiographic imaging processes.
- EXAMPLE VII A sheet of glass prepared as in Example I having a thickness of about 330 microns is bonded to an aluminum substrate with Silverprint, a mixture of silver powder in an adhesive carrier, available from General Cement Electronics Co.
- the plate is charged to a potential of about 2,000 volts in the dark by corona discharge means such as is described in U.S. Patent 2,777,957.
- a conventional black and white transparency is placed about 1 millimeter from the plate surface.
- This composite is illuminated with a 100 watt Burton lamp available from the Burton Manufacturing Company. The lamp is held at a distance of about 1 inch from the plate.
- the plate is exposed to the image for about 30 seconds.
- the image is developed by cascading an electroscopic marking material over its surface by the method described by Walkup in U.S.
- Patent 2,618,551 An image is formed on the plate surface conforming to the transparency image.
- the powdered image is transferred to a sheet of ordinary bond paper by the electrostatic transfer method described by Schatfert in US.. Patent 2,576,047.
- the paper sheet is then heated to the melting point of the electroscopic marking particles and cooled; forming a permanent image of good quality conforming to the original.
- the plate may then be reimaged by the above process.
- EXAMPLE VIII A 700 micron sheet of glass prepared as in Example II above is bonded to an aluminum substrate with Silverprint. The plate is then charged to a potential of about 2,500 volts by corona discharge means. The charged plate is exposed to an image through a conventional black and white transparency. The illumination is provided by a Watt Burton lamp held about 1 inch from the plate for about 60 seconds. The latent electrostatic image thus formed on the plate surface is cascade developed. The powder image formed on the plate surface is transferred to a paper sheet and fixed thereon. A good image conforming to the original results. The plate may then be reused, as by the above process.
- EXAMPLE IX A 1,100 micron glass sheet prepared as in Example III above is bonded to an aluminum substrate with Silverprint. The plate is charged to a potential of about 2,500 volts by corona discharge. The charged plate is exposed to a light image through a conventional black and White transparency. The plate is illuminated by a 100 watt Burton lamp held about 1 inch from the plate surface for about 60 seconds. The latent electrostatic image on the plate is then cascade developed. The powder image is. then fixed directly to the plate by heating the plate above the fusing temperautre of the electroscopic marking particles. An excellent image corresponding to the original is produced.
- EXAMPLE X A 900 micron glass sheet prepared as in Example 1V above is bonded to an aluminum substrate with Silverprint. The plate is charged to a potential of about 2,500 volts by corona discharge. The charged plate is exposed to a light image through a conventional black-and-white transparency. The plate is illuminated by a 100 watt Burton lamp held about 1 inch from the plate surface for about 60 seconds. The latent electrostatic image on the plate is developed by cascade. The powder image is fixed directly to the plate by heating the plate above the fusing temperature of the electroscopic marking particles. An image of good resolution and density corresponding to the original results.
- EXAMPLE XI A 700 micron glass sheet prepared as in Example V above is bonded to an aluminum substrate with Silverprint. The plate is charged to a negative potential of about 2,500 volts by corona discharge. The charged plate is exposed and developed as in Example VII above. An image of good quality corresponding to the original results.
- EXAM-PIE XII A 700 micron glass sheet prepared as in Example VI above is bonded to an aluminum substrate with Silverprint. The plate is charged to a negative potential of about 2,000 volts by corona discharge. The charged plate is exposed and developed as in Example IX above. An image of excellent quality corresponding to the original results.
- Suitable materials as listed above, may be used with similar results.
- other materials may be added to the glass compositions to synergize, enhance, or otherwise modify their properties.
- spectral sensitizing agents may be added to the glass compositions to modify the spectral response of the plates.
- an electrophotographic plate comprising a layer consisting essentially of a single phase photoconductive glass comprising at least one photoconductive metal oxide selected from the group consisting of PbO, AS203, ZnO, BaO, TiO CdO, Bi O 63203, 111203, SnO, SHO'g, Sb203, T302, C1120, and HgO, and mixtures thereof in an amount from about 50 to about 85 mole percent; and at least one glass former selected from the group consisting of SiO G60 B203, V205, P205, T60 AS203, Sb O and mixtures thereof;
- An electrophotographic process comprising:
- an electrophotographic plate comprising a layer consisting essentially of a single phase photoconducti-ve glass comprising at least one photoconductive metal oxide selected from the group consisting of PbO, AS203, ZnO, BaO, TiO' CdO, Bigog,
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51672665A | 1965-12-27 | 1965-12-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
US3507646A true US3507646A (en) | 1970-04-21 |
Family
ID=24056842
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US516726A Expired - Lifetime US3507646A (en) | 1965-12-27 | 1965-12-27 | Electrophotographic process using a single phase photoconductive glass imaging layer |
Country Status (9)
Country | Link |
---|---|
US (1) | US3507646A (enrdf_load_stackoverflow) |
BE (1) | BE691757A (enrdf_load_stackoverflow) |
CH (1) | CH472707A (enrdf_load_stackoverflow) |
DE (1) | DE1522713C3 (enrdf_load_stackoverflow) |
ES (1) | ES334896A1 (enrdf_load_stackoverflow) |
FR (1) | FR1511172A (enrdf_load_stackoverflow) |
GB (1) | GB1167520A (enrdf_load_stackoverflow) |
NL (1) | NL6618219A (enrdf_load_stackoverflow) |
SE (1) | SE331793B (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655376A (en) * | 1966-03-31 | 1972-04-11 | Xerox Corp | Electrophotographic denitrified glass binder plate |
US3837906A (en) * | 1967-04-03 | 1974-09-24 | Xerox Corp | Method of making a xerographic binder layer, and layer so prepared |
US3921191A (en) * | 1971-03-09 | 1975-11-18 | Innotech Corp | Photoresponsive junction device having an active layer of altered conductivity glass |
US3958262A (en) * | 1971-03-09 | 1976-05-18 | Innotech Corporation | Electrostatic image reproducing element employing an insulating ion impermeable glass |
US4053863A (en) * | 1971-06-03 | 1977-10-11 | Varian Associates, Inc. | Electrophotographic photoconductive plate and the method of making same |
DE2728005A1 (de) * | 1977-06-22 | 1979-01-04 | Danfoss As | Hydraulische steuervorrichtung fuer einen servomotor, insbesondere fuer fahrzeuglenkungen |
US4254200A (en) * | 1976-09-30 | 1981-03-03 | Siemens Aktiengesellschaft | Electrophotographic element with bismuth oxide compound |
US4483931A (en) * | 1983-03-21 | 1984-11-20 | Corning Glass Works | Lead gallate glasses |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2210489A (en) * | 1938-06-27 | 1940-08-06 | Gen Electric | Electrical device |
US2220765A (en) * | 1937-02-06 | 1940-11-05 | Gen Electric | Vitreous material |
US2297453A (en) * | 1939-12-11 | 1942-09-29 | Berger Edwin | Optical glass |
US2435995A (en) * | 1945-09-04 | 1948-02-17 | Corning Glass Works | Optical glass |
US2461878A (en) * | 1944-11-01 | 1949-02-15 | Bell Telephone Labor Inc | Metallizing composition |
US2490331A (en) * | 1945-11-09 | 1949-12-06 | Corning Glass Works | Optical glass |
US2937100A (en) * | 1953-03-17 | 1960-05-17 | Gen Electric Co Ltd | Glass compositions and glass-to-metal seals |
US3149984A (en) * | 1960-12-17 | 1964-09-22 | Jenaer Glaswerk Schott & Gen | Lead glass for optical use |
US3151982A (en) * | 1962-04-02 | 1964-10-06 | Xerox Corp | Xerographic plate |
US3294561A (en) * | 1965-03-05 | 1966-12-27 | Pittsburgh Plate Glass Co | Bronze-smoke segment glass |
-
1965
- 1965-12-27 US US516726A patent/US3507646A/en not_active Expired - Lifetime
-
1966
- 1966-12-19 GB GB56666/66A patent/GB1167520A/en not_active Expired
- 1966-12-22 SE SE17653/66A patent/SE331793B/xx unknown
- 1966-12-22 FR FR88488A patent/FR1511172A/fr not_active Expired
- 1966-12-22 CH CH1834766A patent/CH472707A/fr not_active IP Right Cessation
- 1966-12-23 ES ES334896A patent/ES334896A1/es not_active Expired
- 1966-12-23 DE DE1522713A patent/DE1522713C3/de not_active Expired
- 1966-12-23 BE BE691757D patent/BE691757A/xx unknown
- 1966-12-27 NL NL6618219A patent/NL6618219A/xx unknown
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2220765A (en) * | 1937-02-06 | 1940-11-05 | Gen Electric | Vitreous material |
US2210489A (en) * | 1938-06-27 | 1940-08-06 | Gen Electric | Electrical device |
US2297453A (en) * | 1939-12-11 | 1942-09-29 | Berger Edwin | Optical glass |
US2461878A (en) * | 1944-11-01 | 1949-02-15 | Bell Telephone Labor Inc | Metallizing composition |
US2435995A (en) * | 1945-09-04 | 1948-02-17 | Corning Glass Works | Optical glass |
US2490331A (en) * | 1945-11-09 | 1949-12-06 | Corning Glass Works | Optical glass |
US2937100A (en) * | 1953-03-17 | 1960-05-17 | Gen Electric Co Ltd | Glass compositions and glass-to-metal seals |
US3149984A (en) * | 1960-12-17 | 1964-09-22 | Jenaer Glaswerk Schott & Gen | Lead glass for optical use |
US3151982A (en) * | 1962-04-02 | 1964-10-06 | Xerox Corp | Xerographic plate |
US3294561A (en) * | 1965-03-05 | 1966-12-27 | Pittsburgh Plate Glass Co | Bronze-smoke segment glass |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3655376A (en) * | 1966-03-31 | 1972-04-11 | Xerox Corp | Electrophotographic denitrified glass binder plate |
US3837906A (en) * | 1967-04-03 | 1974-09-24 | Xerox Corp | Method of making a xerographic binder layer, and layer so prepared |
US3921191A (en) * | 1971-03-09 | 1975-11-18 | Innotech Corp | Photoresponsive junction device having an active layer of altered conductivity glass |
US3958262A (en) * | 1971-03-09 | 1976-05-18 | Innotech Corporation | Electrostatic image reproducing element employing an insulating ion impermeable glass |
US4053863A (en) * | 1971-06-03 | 1977-10-11 | Varian Associates, Inc. | Electrophotographic photoconductive plate and the method of making same |
US4254200A (en) * | 1976-09-30 | 1981-03-03 | Siemens Aktiengesellschaft | Electrophotographic element with bismuth oxide compound |
DE2728005A1 (de) * | 1977-06-22 | 1979-01-04 | Danfoss As | Hydraulische steuervorrichtung fuer einen servomotor, insbesondere fuer fahrzeuglenkungen |
US4483931A (en) * | 1983-03-21 | 1984-11-20 | Corning Glass Works | Lead gallate glasses |
Also Published As
Publication number | Publication date |
---|---|
BE691757A (enrdf_load_stackoverflow) | 1967-05-29 |
ES334896A1 (es) | 1968-06-01 |
SE331793B (enrdf_load_stackoverflow) | 1971-01-11 |
DE1522713B2 (de) | 1975-03-13 |
CH472707A (fr) | 1969-05-15 |
DE1522713C3 (de) | 1975-12-04 |
FR1511172A (fr) | 1968-01-26 |
GB1167520A (en) | 1969-10-15 |
NL6618219A (enrdf_load_stackoverflow) | 1967-06-28 |
DE1522713A1 (de) | 1969-10-16 |
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