US3418520A - Intensity control system for a particle beam device - Google Patents

Intensity control system for a particle beam device Download PDF

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Publication number
US3418520A
US3418520A US603556A US60355666A US3418520A US 3418520 A US3418520 A US 3418520A US 603556 A US603556 A US 603556A US 60355666 A US60355666 A US 60355666A US 3418520 A US3418520 A US 3418520A
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United States
Prior art keywords
intensity
lens
current
signal
target
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Expired - Lifetime
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US603556A
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English (en)
Inventor
Barber Robert Russell
Loeffler Karl Heinz
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International Business Machines Corp
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International Business Machines Corp
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Priority to US603556A priority Critical patent/US3418520A/en
Priority to NL6711696A priority patent/NL6711696A/xx
Priority to FR06008596D priority patent/FR93242E/fr
Priority to BE706124D priority patent/BE706124A/fr
Priority to GB53759/67A priority patent/GB1201176A/en
Priority to DE19671589982 priority patent/DE1589982A1/de
Priority to SE16810/67A priority patent/SE336409B/xx
Priority to CH1802167A priority patent/CH485316A/de
Application granted granted Critical
Publication of US3418520A publication Critical patent/US3418520A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/08—Disposition or mounting of heads or light sources relatively to record carriers
    • G11B7/09—Disposition or mounting of heads or light sources relatively to record carriers with provision for moving the light beam or focus plane for the purpose of maintaining alignment of the light beam relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
    • G11B7/0908—Disposition or mounting of heads or light sources relatively to record carriers with provision for moving the light beam or focus plane for the purpose of maintaining alignment of the light beam relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following for focusing only
    • G11B7/0917—Focus-error methods other than those covered by G11B7/0909 - G11B7/0916
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/04—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam
    • G11C13/048—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using optical elements ; using other beam accessed elements, e.g. electron or ion beam using other optical storage elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/52—Arrangements for controlling intensity of ray or beam, e.g. for modulation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/82—Mounting, supporting, spacing, or insulating electron-optical or ion-optical arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

Definitions

  • ABSTRACT 0F THE DISCLOSURE A control system for regulating the intensity of a beam spot of a particle beam device such as an electron beam column wherein the magnication of a variable magnication lens is adjusted responsive to the measured beam current to regulate the beam spot size at an aperture plate thereby to regulate the current density of the beam and thereby the beam current passing through the aperture.
  • This invention relates to a control system for regulating the intensity of the beam spot of a particle ybeam device such as an electron beam column for use in data recording systems, wherein the magnification of a variable magnication lens is adjusted responsive to the beam intensity at a target to control the beam spot size at a downward positioned aperture plate thereby to regulate the particle density of the beam passing through the aperture.
  • a particle beam is scanned across a memory element or target to record a pattern or image for future reference.
  • the beam may comprise such particles as electrons, ions, or photons which are accelerated and focused to a spot size having a small cross-sectional diameter for use in writing on the target.
  • electron beams now are being used to inscribe on silver halide film certain patterns indicative of data in digital form for use in data handling systems.
  • the beam either is ymodulated in a pre-determined manner or is deflected to inscribe patterns representing the data onto the memory element. Since the beam intensity frequently is modulated in response to the data being recorded, it is important that the intensity of the beam prior to such modulation be controlled closely so that the only change in the beam is one actually responsive to the data being recorded.
  • This side deflection prevents the cutol'rr portion of the beam from striking the target, thereby lowering the overall intensity of the beam at the target,
  • This method resuits in generating a beam of irregular cross-section which frequently is unsuitable for recording data onto memory elements. Additionally, when the beam is shifted off axis in this manner to reduce the beam intensity, it becomes more difficult to control the alignment of the scan pattern of the beam with the memory storage lplane.
  • the current intensity of a particle beam spot is regulated by sensing the beam intensity at the target and by adjusting the focal power of a variable magnification lens, positioned between the beam source and an opaque aperture-forming Patented D'ec. 24, 1968 member, in a manner responsive to the difference between the measured intensity of the beam spot and the desired intensity of the beam spot.
  • the cross sectional current density of the beam is varied by changing the beam spot size or diameter at the aperture-forming member such that more or less of the outer fringes of the beam are intercepted thereby regulating the intensity of the beam passing through the aperture and adjusting the overall intensity of the beam reaching the target.
  • a further embodiment of the invention combines the before-mentioned intensity control with a second lens in the particle beam device having a magnification which is varied responsive to the focal power adjustment of the lens for maintaining the overall magnification of both lens, and therefore of the column, constant.
  • One object of this invention is to provide an improved control for regulating the intensity of the beam spot of a particle beam device.
  • Another object of this invention is to regulate the spot current of a particle beam device quickly, accurately and with little effect on the overall functioning of the beam.
  • a more detailed object of this invention is to regulate closely and continuously the spot current of a particle beam device, in a manner to minimize any adverse effects on the operation of the beam device as the beam current is regulated.
  • FIGURE l is a perspective view of an electron beam column of a type in which the subject invention can be employed;
  • FIGURE 2 is a ⁇ side cross-sectional view of an aperture assembly used in the electron beam column shown in FIGURE 1;
  • FIGURE 3 illustrates the column of FIGURE 1 in diagrammatic form with a schematic drawing of one embodiment of the beam intensity control system
  • FIGURE 4 illustrates graphically the manner in which the beam target current varies as the first lens current is adjusted in accordance with the invention.
  • FIGURES l and 3 are shown an electron beam column S representing one type of particle beam generating device in which the subject invention can be employed.
  • the column is adapted for use in data recording wherein the beam is directed onto a target or memory element 9 for recording an image.
  • this target is removable from the column.
  • the column comprises an elongated tubular housing 1t) with a cathode 11 supported adjacent an anode 12 in one end of the column serving as an electron source for emitting a beam of electrons of a preselected magnitude of intensity for passage along the column axis 13.
  • the electron beam is focused to a small spot size by being passed through the magnetic fields of axially spaced electromagnetic lenses 14, 15 and 16 positioned in spaced relationship along the axis 13 within the housing 10.
  • Each of these lenses includes a pair of polepieces 17 and 18 which transmit the magnetic flux generated in the respective electric coils 14a, 15a and 16a to a point closely adjacent to the beam axis 13.
  • a non-magnetic spacer 19in each lens maintains the ends of the polepieces adjacent the axis in axially-spaced relationship.
  • the lenses 14 and 1S also include polepiece extensions 2t) and 21 separated by a non-magnetic member 22 and held in a non-magnetic cylinder 23, which extensions receive the magnetic flux of the respective lens and cooperate to form the lens magnetic gap at a position closely adjacent to the beam axis 13.
  • each aperture assembly includes a housing 2S held within the non-magnetic cylinder 23. Within the housing is positioned a support 26 for mounting a beam-opaque aperture plate 27a, 27b and 27C in which is formed a small aperture 28a, 28h and 2SC, respectively, at a position coinciding with the beam axis.
  • the beam By first passing the bear through the magnetic field of each lens and subsequently through the cooperating aperture assembly, the beam is formed to a very small cross-sectional diameter or spot size suitable for writing data onto the target 9 at a very high density.
  • the beam is focused in the plane of the target 9 by energizing a focusing coil 30 positioned adjacent the lens 16.
  • a focusing coil 30 By properly adjusting the magnitude of electric current supplied to this focusing coil (in a manner not specifically shown herein, but which is well known in the art), the focal power of lens 30 is varied for adjusting the image size at the plane of the target.
  • an annular-shaped deliection coil 31 is provided which, when energized, serves to deect and scan the beam across the memory element for recording the data thereon.
  • a pair of electrostatic deliecting plates 32 and 34 are positioned respectively to each side of the axis 13. By energizing these plates, the beam is deflected suiciently to become misaligned -with the aperture 28 of the downstream positioned aperture assembly 24C thereby effectively shutting off the beam.
  • One method of recording data onto the target 9 is by superimposing a sine-wave signal onto the normal signal supplied to the deflecting coil 31 such that the beam is deflected back and forth rapidly at a direction perependicular to the scan direction as the beam is scanned in a manner to paint an exposed area onto the target.
  • a one commonly used in digital data recording can be represented by an exposed or painted area followed by an unexposed area, while a zero can be represented by an unexposed area followed by an exposed area. Thereafter, the reader can detect the ones and zeros by detecting the exposed and unexposed areas and their sequence of occurrence.
  • the intensity of the beam spot must vbe controlled closely. Otherwise, with the variance of the beam intensity, a painted area might remain unexposed if the beam spot intensity was lessened substantially. Conversely, if the spot intensity was increased sufficiently, the size of the exposed area might be enlarged sufficiently to expose an adjacent area which is desired to be unexposed thereby rendering the recording method invalid.
  • Various external factors can cause the spot intensity to change such as changes in the filament current, a reduction in filament size during the life of the filament, etc.
  • the overall purpose of this invention is to control closely the spot intensity of a particle beam column such as the one heretofore described so that the recording function is unaffected by undesired fluctuations in the intensity of the beam.
  • the intensity of the beam is controlled by generating a first signal responsive to the measured spot intensity at the target and, by comparing the measured beam intensity signal Iwith a second signal indicative of the beam intensity desired, a differential signal is generated which is used for adjusting the magnification of one of the electro magnetic lenses thereby to vary the beam diameter at the cooperating sperture assembly to control the density of the electrons of that portionof the beam passing through the aperture for regulating the overall intensity of the beam striking the target.
  • FIGURE 3 A preferred embodiment of the invention is shown in FIGURE 3 wherein the intensity of the beam is detected by a detector 37 positioned adjacent the target 9, with fa signal responsive to this measured intensity being fed to a level detector 38.
  • the signal from the level detector is fed to a differential amplifier 39 along with a reference signal for generating a differential signal indicative of the difference between the measured beam intensity and the desired beam intensity.
  • the differential signal is fed to a lens current control 40 for varying the magnification of the lens 14 thereby to vary the beam image size at the adjacent aperture plate 27 of the aperture assembly 24a. In this manner, the current density of that portion of the beam passing through the aperture 28a is varied to change the overall intensity of the beam passing through the aperture and thereafter striking the target 9.
  • FIGURE 3 the control is illustrated in diagrammatic form in which an alternating current signal is generated responsive to the measured intensity of the spot.
  • a target 9 is used having a series of adjacent and alternately positioned opaque ⁇ and transparent portions such as is formed by the series of opaque lines 41 extending in a direction perpendicular to the scanning direction of the beam. As the beam is scanned across these lines, it alternately strikes and is prevented from striking the detector 37.
  • This detector is one of many types for generating a signal responsive to the beam current striking it.
  • One example of such a detector is a P/N junction of standard design having an electrical impedance proportional to the strength of the beam striking it.
  • an alternating current signal is imposed on a constant magnitude current being passed through the detector as the beam intermittently strikes the detector which signal has a peak value responsive to the measured intensity of the beam.
  • the AC signal is fed through a conductor 42 to a level detector 38.
  • the level detector includes an AC amplifier 44 of standard design which amplifies the measured-intensity signal and feeds it to a peak voltage detector 45.
  • the peak voltage detector is one of several types commercially available for generating a direct current signal responsive to the peak magnitudes of the measured intensity signal received from the amplifier 44. While a DC signal could be generated responsive to the beam intensity sensed by the detector 37, by excluding the special target 9 having the opaque lines 41, the overall drift of this control is minimized by utilizing an AC signal which is amplified in the AC amplifier 44.
  • the amplified direct current measured-intensity signal is fed to the differential amplifier 39 along with a reference signal fed through the conductor 46.
  • This reference signal is a direct current signal indicative of the intensity desired ⁇ at the detector 37 and can be generated in any of many well known ways for achieving a direct current signal having a level which preferably can be adjusted to set the level of intensity desired.
  • the differential amplitier compares the peak voltage DC signal and the reference signal to generate a differential signal which then is amplified and transmitted to a lens control 40.
  • the lens current control 40 adjusts the focal power of the electromagnetic lens 14 to change the image size of the beam at the aperture plate 27a of the aperture assembly immediately downstream of the lens. By varying the image size of the aperture plate, more or less of the beam is allowed to pass through the aperture 28a thereby varying the overall beam current.
  • the lens control 40 comprises an analog storage device 48 which receives the differential signal and stores it until another signal is received from the differential amplifier.
  • the storage device can be any of many well known types such as a field effect transistor (not shown) having the bias voltage supplied by a large value capacitor which receives and is charged by the differential signal.
  • the differential signal is fed 4to a first lens driver 49 which comprises a current source for supplying an electric current through the conductors 53 and 56 to the coil 14a of the lens 14 at a magnitude responsive to the signal received from the analog storage device.
  • conductors 53 and 56 also connect With the coil 15a. The purpose of including the coil in the circuit will be explained later.
  • This measured-intensity signal is peak detected and compared with a reference signal for generating a differential signal which then is supplied to the first lens driver to adjust the magnitude of the current supplied to the lens 14a for varying the focal power of that lens.
  • the target current signal is adjusted since the image size at the aperture plate 27a is changed as the magnification of the lens 14 changes. Assume, for instance, that it is desired that the magnitude of the target current signal be at a level corresponding to point 50 on the curve. However, the control just described senses a target current signal having a level corresponding to point 51 on the curve. With the first lens current being that indicated by the point 51, the outline of the beam is represented by the solid line 52 in FIGURE 3. It is necessary, therefore, to reduce the target current or beam intensity from the value indicated by point 51 to that indicated by point 50. For a smaller beam current, the magnification of the lens 14 is reduced to enlarge the beam diameter at the aperture 28a. Thus, the current density of the lbeam at the aperture is reduced, and as a consequence a fewer number of electrons are permitted to pass through the aperture 28a.
  • the lens control 40 receives a signal indicating that the first lens current should correspond to the magnitude indicated by point 50 on the curve, which indicates that the first lens current should be increased.
  • the beam shape is changed from that indicated by the solid line 52 to a shape corresponding to the dotted line 54 (FIGURE 3) thereby increasing the diameter of the beam at the aperture plate 27a.
  • the current density at the aperture plate 27a is decreased since the current level of the beam remains substantially constant for periods of time substantially longer than it takes for this control to react. Therefore, the total number of electrons passing through the aperture 28a is decreased and the target current assumes the value corresponding to point 50 on the curve.
  • the control may go through several cycles of readjusting the first lens current to obtain the proper target current. However, after a very few cycles, the first lens current will be readjusted to a value corresponding to that of point 50 on the curve. Fortunately, the normal changes in beam intensity which this control is meant to correct are relatively slow in acting thereby allowing the control continually to maintain the beam current at the desired value.
  • the reference signal is changed in magnitude indicating a different desired target current
  • the point 50 Will assume a different value on the curve with the control system thereafter readjusting the first lens current to correspond to that desired target current signal.
  • the outline of the beam is shown as a finite line, it is assumed that this is an outline representing the area of the beam having an electron density above a given value.
  • the magnification of the adjacent downward lens is adjusted as the magnification of the first lens is adjusted for changing the beam intensity, thereby limiting any overall effects on the functioning of the beam as the intensity is changed by the heretofore described control.
  • FIGURE 3 when the magnification of the lens 14 is changed to alter the shape of the lens from that indicated by the solid line 52 to that indicated by the dotted line 54, ordinarily the downstream image size at the aperture plate 27b also is changed from that indicated by the solid line 57 to that indicated by the dotted line 58.
  • This alternative embodiment of this invention involves feeding the first lens driver signal through the conductors 53 and .56 to the lens to change directly the magnification of the lens 15 as the magnification of the lens 14 is changed.
  • the electrons are passed through the aperture 28a at a greater angle thereby altering the angle at which they approach the downstream aperture plate 27b.
  • the change in magnification of lens 15 is made proportional to the magnification change in lens 14- and is effected by reducing the magnitude of the flux generated by the electric current supplied to lens 15 by an amount proportional to the increase of lens 14 current or vice versa depending on the direction of change of the magnification of the lens 14.
  • One method of changing the flux level of coil 15a is by supplying the same current to that coil as is supplied through the conductors 53 and 56 to the coil 14a for transmission through an oppositely wound section of the coil 15a to counteract the normal fiux generated in lens 15.
  • a beam intensity control system comprising:
  • variable magnification lens includes a magnetic fiux generating coil and said means for adjusting the lens magnification includes an electric current source for supplying electric current flow to said coil. at a magnitude responsive to said first signal.
  • a beam intensity control as defined in claim 2 wherein said means for generating a first signal includes a beam detector for generating a second signal responsive to the intensity of said beam;
  • a beam intensity control as defined in claim 1 including means for maintaining the beam focusing downward of said aperture forming plate assembly substantially constant as the magnification of said first lens is adjusted thereby to prevent the Operation of the beam from being adversely affected as the beam intensity at the target is changed.
  • a beam intensity control as defined in claim 4 wherein said means for maintaining said beam focusing constant comprises a second variable magnification lens with means for changing the magnification thereof in response to the changing of the magnification of said first lens.
  • An electron beam column comprising:
  • a beam-opaque aperture plate held between said source and target along the axis forming an aperture through which the beam must pass to reach the target;
  • variable magnification lens positioned to vary the image size of said beam at said aperture plate thereby to regulate the density of the electrons of that portion of the beam passing through said aperture;
  • said lens includes a variable magnitude electric current source and an electric coil connected to receive current from said source for establishing a magnetic fiux field intercepting said beam for focusing said beam at focal points positioned in the proximity of said aperture plate, with the precise focal point position of the beam being determined by a first signal in the form of an electric current being passed through said coil and the magnitude of said current being controlled in response to the measured beam intensity.
  • An electron beam column as defined in claim 8 wherein said means for measuring the beam intensity is actuated intermittently Yand includes Yan analog storage Y' References Cited UNITED STATES PATENTS 6/1951 Szegho et al 315-21 X 2/1953 Ellis 315-31 RODNEY D. BENNETT, Primary Examiner.

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
US603556A 1966-08-29 1966-12-21 Intensity control system for a particle beam device Expired - Lifetime US3418520A (en)

Priority Applications (8)

Application Number Priority Date Filing Date Title
US603556A US3418520A (en) 1966-12-21 1966-12-21 Intensity control system for a particle beam device
NL6711696A NL6711696A (de) 1966-08-29 1967-08-25
FR06008596D FR93242E (fr) 1966-08-29 1967-10-30 Colonne de faisceau électronique.
BE706124D BE706124A (de) 1966-08-29 1967-11-06
GB53759/67A GB1201176A (en) 1966-12-21 1967-11-27 Beam intensity control system
DE19671589982 DE1589982A1 (de) 1966-12-21 1967-12-01 Einrichtung zur Intensitaetssteuerung bei Strahlerzeugungssystemen
SE16810/67A SE336409B (de) 1966-12-21 1967-12-07
CH1802167A CH485316A (de) 1966-12-21 1967-12-20 Einrichtung zur Intensitätssteuerung eines Strahlerzeugungssystems

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Application Number Priority Date Filing Date Title
US603556A US3418520A (en) 1966-12-21 1966-12-21 Intensity control system for a particle beam device

Publications (1)

Publication Number Publication Date
US3418520A true US3418520A (en) 1968-12-24

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US603556A Expired - Lifetime US3418520A (en) 1966-08-29 1966-12-21 Intensity control system for a particle beam device

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US (1) US3418520A (de)
CH (1) CH485316A (de)
DE (1) DE1589982A1 (de)
GB (1) GB1201176A (de)
SE (1) SE336409B (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3483427A (en) * 1967-11-03 1969-12-09 Minnesota Mining & Mfg Lens for electron beam recorder
US3497762A (en) * 1965-11-03 1970-02-24 Minnesota Mining & Mfg Electron beam recording system and apparatus
US3786305A (en) * 1972-05-15 1974-01-15 Hitachi Ltd Field emission electron gun
US3854071A (en) * 1972-12-14 1974-12-10 Ibm Exposure regulated scanning illumination means for electron projection systems
US20060227589A1 (en) * 2005-04-06 2006-10-12 Alexander Govyadinov System and method for writing data using an electron beam
CN110858529A (zh) * 2018-08-23 2020-03-03 卡尔蔡司显微镜有限责任公司 用于加工物体的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2556455A (en) * 1948-03-02 1951-06-12 Rauland Corp Cathode-ray tube focusing system
US2627589A (en) * 1950-10-30 1953-02-03 Rca Corp Focusing of electron optical apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2556455A (en) * 1948-03-02 1951-06-12 Rauland Corp Cathode-ray tube focusing system
US2627589A (en) * 1950-10-30 1953-02-03 Rca Corp Focusing of electron optical apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3497762A (en) * 1965-11-03 1970-02-24 Minnesota Mining & Mfg Electron beam recording system and apparatus
US3483427A (en) * 1967-11-03 1969-12-09 Minnesota Mining & Mfg Lens for electron beam recorder
US3786305A (en) * 1972-05-15 1974-01-15 Hitachi Ltd Field emission electron gun
US3854071A (en) * 1972-12-14 1974-12-10 Ibm Exposure regulated scanning illumination means for electron projection systems
US20060227589A1 (en) * 2005-04-06 2006-10-12 Alexander Govyadinov System and method for writing data using an electron beam
US7342817B2 (en) * 2005-04-06 2008-03-11 Hewlett-Packard Development Company, L.P. System and method for writing data using an electron beam
CN110858529A (zh) * 2018-08-23 2020-03-03 卡尔蔡司显微镜有限责任公司 用于加工物体的方法

Also Published As

Publication number Publication date
GB1201176A (en) 1970-08-05
DE1589982A1 (de) 1970-04-09
CH485316A (de) 1970-01-31
SE336409B (de) 1971-07-05

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