US3274417A - Electronic evaporator - Google Patents

Electronic evaporator Download PDF

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Publication number
US3274417A
US3274417A US284198A US28419863A US3274417A US 3274417 A US3274417 A US 3274417A US 284198 A US284198 A US 284198A US 28419863 A US28419863 A US 28419863A US 3274417 A US3274417 A US 3274417A
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US
United States
Prior art keywords
cathode
anode
substance
evaporator
evaporated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US284198A
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English (en)
Inventor
Haefer Rene
Zollinger Erich
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Individual
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Individual
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13—Supported filter elements
    • B01D29/23—Supported filter elements arranged for outward flow filtration
    • B01D29/25—Supported filter elements arranged for outward flow filtration open-ended the arrival of the mixture to be filtered and the discharge of the concentrated mixture are situated on both opposite sides of the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/64—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element
    • B01D29/6469—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers
    • B01D29/6476—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers with a rotary movement with respect to the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/88—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices
    • B01D29/90—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding
    • B01D29/902—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding containing fixed liquid displacement elements or cores
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Definitions

  • the invention relates to an electronic evaporator for vacuum coating technology.
  • the substance to be evaporated is surrounded by a spiral-shaped glow cathode and without using .a crucible is exposed to the impinging electrons.
  • Such applications have the advantage of clean evaporation without crucible reactions, but the disadvantage that the substance must be in rod shape and electrically conductive if it is to serve as anode in this arrangement.
  • an electronic evaporator In another design of an electronic evaporator the liquid or powdered substance is placed in a graphite crucible or in a crucible made of metal which is surrounded by an incandescent cathode. Heating and evaporating is accomplished here indirectly in that the outer wall of the crucible is heated by electronic bombardment. This process carries with it the risks of undesirable Chemical reactions between substance and crucible wall because the crucible, heated through the outer wall, assumes a temperature higher than that of the evaporation substance.
  • Another known method is to bombard the substance in the crucible with electrons from electron guns arranged directly above the crucible whereby only a small part of the .surface of the substance has to be melted and evaporated.
  • the crucible wall heats up relatively little from the heat conducted from the heating zone, and it has been suggested to melt with an electron gun in several crucibles placed side by side in the evaporator, by the use of a deflection device which directs the electron "beam in quick succession from evaporator crucible to evaporator crucible letting the beam remain shortly on the evaporant in each crucible.
  • the electronic evaporator for evaporation of substances in a high vacuurn has a carrier which is located coaxially with an electron-emitting ring cathode which is different from the prior practices in that the ring cathode is surrounded by a negative auxiliary electrode for the production of an electron ring beam which is directed onto the substance to be evaporated, and also that between the ring cathode and the substance to be evaporated a 'positive accelerator electrode which surrounds the substance to be evaporated is arranged in such a way, that the cathode with respect to the vapor stream emitted from the evaporating substance lies in the shadow of the accelerator electrode.
  • FIGURE 1 shows a coater with the electronic evaporator of the invention
  • FIGURE 2 shows an enlarged schematic view of the evaporator shown in FIGURE 1.
  • number 1 is the shell or bell jar of a coater in which the objects to be coated are fastened to a work holding fiXture 2.
  • Number 3 designates the evacuation port', 4 the electronic evaporator in its entirety.
  • the electronic evaporator consists of the carrier 5 which has a trough shaped depression 6 into which the substance to be evaporated, 7, is placed.
  • Carrier 5 is surrounded by the ring shaped cathode 8 (FIGURE 2) which may be brought in a conventional way to the emission temperature.
  • the current lead-ins are vacuum tight and insulated and are lead through the base plate 12 of the coater.
  • the cathode 8 is connected with a voltage source via the voltage lead-in 13 so as to be highly negative with respect to the shell or bell jar of the coater and the carrier 5.
  • a negative auxiliary electrode which serves to deflect the electrons and to focus them on the substance to be evaporated.
  • This auxiliary electrode in the case of this embodiment consists of several parts.
  • Number 15 is a metallic cylinder which has a circular groove 16.
  • the crcular groove 16 and the groove 17 of the upper end of the cylinder 15 are covered by a ring shaped part 18 and the parts 15 and 18 together form a ring shaped hollow electrode which surrounds the ring cathode with an annular cavity 19 directed toward the center.
  • This electrode assumes the same negative potential as the cathode.
  • the cathode emits electrons which are directed to the crucible aXis 20 by a positive accelerator electrode.
  • the cathode 8 is located underneath the upper rim of the wall 9 of the positive accelerat-or electrode which holds the substance to be evaporated.
  • the electrons rise at a slant through cavity 19 and must be deflected or more from their initial direction to hit the substance to be evaporated.
  • An arrangement with a deflection of more than 90 is particularly desirable when the vapor of the evaporating substance is readily ionized and susceptible to electrical discharges.
  • means for generating electrical and/or magnetic defiector fields for the adjustment of sharpness and location of the focal point of the electron ring beam may still be used in the generally known manner.
  • two coils 10 and 11 generate a magnetic deflector field which may be regulated by regulating the current flow in the coils.
  • the drawings also show provisions for the cooling of the electronic evaporator while in operation.
  • cooling water is admitted into the hollow space of carrier 5 through the partly visible pipeline 21 and is removed through pipeline 22.
  • cooling ring 23 with lead-in 24 (and a discharge pipe located behind it and not visible) serve this purpose. All cooling pipes pass through a vacuurn tight connection 25 in the base plate 12.
  • the insulated current and v-oltage lines f-or the cathode and the negative auxiliary electrode are suitably arranged within the cooling pipes and are, therefore, also cooled at the same time. In this case oi l can be recommended as a coolant, in other cases water is commonly used.
  • EIGURE 1 portrays schematically the required pump system for -the evacuation of the coater. It usually consists of a multi-stage diflusion pump 26, a mechanical fore pump 26', and lines 27 and 28 with valves 29, 30, 31 and 32 to allow first pre-evacu ation in the known manner by *by-passing the diffusion pump and subsequently to permit Creation of high vacuum by the diffusion pump. Number 33 is an ordinary oil bale.
  • the shell or bell jar of the coater has an observation window at 35.
  • An example of present application is the production of "cold li gh mirrors. These are in-terference mirrors with approximately 25 alternating highand low-refracting absorpti-on-free layers. "Cold light mirrors are useful by way of example in movie project-ors to obtain maximum picture brightness by reflecting visible light through the film and to eliminate or reduce heating of the film by -transmitting .the infrared light away from the film. It is an important economic .advantage of this invention, that the h ighand low-refracting oxides required for this application and many other similar interference layer applications, may be deposited directly without reduction of the oxides and without additional steps in the process.
  • the electronic evaporator of the invention is a compact unit which can be put int-o any existing coater quickly and without special structural changes, whereas known electron guns for the same purpose require a special installation which often produces conflict with other parts of the existing coater.
  • a cathode formed in -a substantially regular closed shape to produce an electron beam having a substant-ially closed periphery coaxial with said anode and disposed radially outwardly of said anode and axially inwardly from the outer end of said anode,
  • an auxiliary electrode surrounding said cathode and formed to limit the initi al direction of electrons emitted from sa-id cathode to angles less than degrees with respect to the axis of said anode
  • an anode formed with an outer surface adapted to carry the substance to be evaporated
  • a ring cathode coaxial with said anode and disposed radially outwardly of said anode and axially inwardly from said surface of said anode
  • an auxiliary electrode surrounding said cathode and formed to limit the initial direction of electrons emitted from said cathode to angles less than 90 degrees with respect to the axisof said anode
  • means for establishing an electric potential difference between said cathode and said anode t-o deflect said electrons from their inital directions to angles of at least 90 degrees toward said surface of said anode.
  • auxiliary electrode is formed with ta radially inwardly extendin g portion to shield said cathode from direct line exposure to vapor flow in the evaporator.
  • auxiliary electrode member has a generally cy lindrieal form with a circular groove ⁇ formed therein substantially enclosing said cathode member.
  • the electronic evaporator of claim 4 having' means for producing a magnetic field tor controlling the area and position of the focal point of the electron beam emitted by said cathode.
  • said auxiliary electrode member upper surface forms a cup-shaped contour radially outwardly of and axially ⁇ above said cathode member;
  • an upper ring member is fixedly connected to said auxiliary electrode member t-o form therewith a ringshaped hollow electrode substantially enclosing the cathode.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
US284198A 1962-05-30 1963-05-29 Electronic evaporator Expired - Lifetime US3274417A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Publications (1)

Publication Number Publication Date
US3274417A true US3274417A (en) 1966-09-20

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US284198A Expired - Lifetime US3274417A (en) 1962-05-30 1963-05-29 Electronic evaporator

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US (1) US3274417A (enrdf_load_html_response)
CH (1) CH399122A (enrdf_load_html_response)
DE (1) DE1255440B (enrdf_load_html_response)
GB (1) GB995180A (enrdf_load_html_response)
NL (1) NL293315A (enrdf_load_html_response)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
US20120048199A1 (en) * 2010-08-24 2012-03-01 Hon Hai Precision Industry Co., Ltd. Crucible and evaporation deposition device having same
CN102373420A (zh) * 2010-08-24 2012-03-14 鸿富锦精密工业（深圳）有限公司 坩埚及具有该坩埚的蒸镀设备

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3276333D1 (en) * 1982-10-28 1987-06-19 Ibm Method and apparatus for vacuum evaporation coating using an electron gun

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
US3132198A (en) * 1962-01-15 1964-05-05 Stauffer Chemical Co Electron beam furnace
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
US3132198A (en) * 1962-01-15 1964-05-05 Stauffer Chemical Co Electron beam furnace
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
US20120048199A1 (en) * 2010-08-24 2012-03-01 Hon Hai Precision Industry Co., Ltd. Crucible and evaporation deposition device having same
CN102373420A (zh) * 2010-08-24 2012-03-14 鸿富锦精密工业（深圳）有限公司 坩埚及具有该坩埚的蒸镀设备

Also Published As

Publication number Publication date
CH399122A (de) 1966-03-31
NL293315A (enrdf_load_html_response)
DE1255440B (de) 1967-11-30
GB995180A (en) 1965-06-16

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