NL293315A - - Google Patents

Info

Publication number
NL293315A
NL293315A NL293315DA NL293315A NL 293315 A NL293315 A NL 293315A NL 293315D A NL293315D A NL 293315DA NL 293315 A NL293315 A NL 293315A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL293315A publication Critical patent/NL293315A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D29/00Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13Supported filter elements
    • B01D29/23Supported filter elements arranged for outward flow filtration
    • B01D29/25Supported filter elements arranged for outward flow filtration open-ended the arrival of the mixture to be filtered and the discharge of the concentrated mixture are situated on both opposite sides of the filtering element
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D29/00Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62Regenerating the filter material in the filter
    • B01D29/64Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element
    • B01D29/6469Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers
    • B01D29/6476Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers with a rotary movement with respect to the filtering element
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D29/00Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/88Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices
    • B01D29/90Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding
    • B01D29/902Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding containing fixed liquid displacement elements or cores
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • C23C14/30Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL293315D 1962-05-30 NL293315A (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Publications (1)

Publication Number Publication Date
NL293315A true NL293315A (enrdf_load_html_response)

Family

ID=4311700

Family Applications (1)

Application Number Title Priority Date Filing Date
NL293315D NL293315A (enrdf_load_html_response) 1962-05-30

Country Status (5)

Country Link
US (1) US3274417A (enrdf_load_html_response)
CH (1) CH399122A (enrdf_load_html_response)
DE (1) DE1255440B (enrdf_load_html_response)
GB (1) GB995180A (enrdf_load_html_response)
NL (1) NL293315A (enrdf_load_html_response)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
EP0111611B1 (fr) * 1982-10-28 1987-05-13 International Business Machines Corporation Perfectionnements aux procédés et équipements de dépôt par évaporation sous vide mettant en oeuvre un canon à électrons
CN102373420A (zh) * 2010-08-24 2012-03-14 鸿富锦精密工业(深圳)有限公司 坩埚及具有该坩埚的蒸镀设备
TWI477623B (zh) * 2010-08-24 2015-03-21 Hon Hai Prec Ind Co Ltd 坩堝及具有該坩堝的蒸鍍設備

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
NL287742A (enrdf_load_html_response) * 1962-01-15
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Also Published As

Publication number Publication date
GB995180A (en) 1965-06-16
DE1255440B (de) 1967-11-30
US3274417A (en) 1966-09-20
CH399122A (de) 1966-03-31

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