CH399122A - Einrichtung für die Verdampfung von Substanzen im Hochvakuum - Google Patents

Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Info

Publication number
CH399122A
CH399122A CH657262A CH657262A CH399122A CH 399122 A CH399122 A CH 399122A CH 657262 A CH657262 A CH 657262A CH 657262 A CH657262 A CH 657262A CH 399122 A CH399122 A CH 399122A
Authority
CH
Switzerland
Prior art keywords
evaporation
substances
high vacuum
vacuum
Prior art date
Application number
CH657262A
Other languages
English (en)
Inventor
Rene Dr Haefer
Zollinger Erich
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to NL293315D priority Critical patent/NL293315A/xx
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH657262A priority patent/CH399122A/de
Priority to DEB71977A priority patent/DE1255440B/de
Priority to US284198A priority patent/US3274417A/en
Priority to GB21701/63A priority patent/GB995180A/en
Publication of CH399122A publication Critical patent/CH399122A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/11—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor with bag, cage, hose, tube, sleeve or like filtering elements
    • B01D29/13—Supported filter elements
    • B01D29/23—Supported filter elements arranged for outward flow filtration
    • B01D29/25—Supported filter elements arranged for outward flow filtration open-ended the arrival of the mixture to be filtered and the discharge of the concentrated mixture are situated on both opposite sides of the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/62—Regenerating the filter material in the filter
    • B01D29/64—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element
    • B01D29/6469—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers
    • B01D29/6476—Regenerating the filter material in the filter by scrapers, brushes, nozzles, or the like, acting on the cake side of the filtering element scrapers with a rotary movement with respect to the filtering element
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D29/00—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor
    • B01D29/88—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices
    • B01D29/90—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding
    • B01D29/902—Filters with filtering elements stationary during filtration, e.g. pressure or suction filters, not covered by groups B01D24/00 - B01D27/00; Filtering elements therefor having feed or discharge devices for feeding containing fixed liquid displacement elements or cores
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Toxicology (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physical Vapour Deposition (AREA)
CH657262A 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum CH399122A (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL293315D NL293315A (de) 1962-05-30
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum
DEB71977A DE1255440B (de) 1962-05-30 1963-05-18 Einrichtung zur Herstellung von UEberzuegen auf Unterlagen durch Aufdampfen von Substanzen im Hochvakuum mittels Elektronenstrahlen
US284198A US3274417A (en) 1962-05-30 1963-05-29 Electronic evaporator
GB21701/63A GB995180A (en) 1962-05-30 1963-05-30 Improvements in and relating to the evaporation of material for the coating of surfaces by electronic bombardment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Publications (1)

Publication Number Publication Date
CH399122A true CH399122A (de) 1966-03-31

Family

ID=4311700

Family Applications (1)

Application Number Title Priority Date Filing Date
CH657262A CH399122A (de) 1962-05-30 1962-05-30 Einrichtung für die Verdampfung von Substanzen im Hochvakuum

Country Status (5)

Country Link
US (1) US3274417A (de)
CH (1) CH399122A (de)
DE (1) DE1255440B (de)
GB (1) GB995180A (de)
NL (1) NL293315A (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3730962A (en) * 1971-08-24 1973-05-01 Airco Inc Electron beam furance with material-evaporant equilibrium control
DE3276333D1 (en) * 1982-10-28 1987-06-19 Ibm Method and apparatus for vacuum evaporation coating using an electron gun
CN102373420A (zh) * 2010-08-24 2012-03-14 鸿富锦精密工业（深圳）有限公司 坩埚及具有该坩埚的蒸镀设备
TWI477623B (zh) * 2010-08-24 2015-03-21 Hon Hai Prec Ind Co Ltd 坩堝及具有該坩堝的蒸鍍設備

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3040112A (en) * 1960-06-03 1962-06-19 Stauffer Chemical Co Electron-beam furnace with beam emission suppressors
NL287742A (de) * 1962-01-15
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source

Also Published As

Publication number Publication date
GB995180A (en) 1965-06-16
DE1255440B (de) 1967-11-30
US3274417A (en) 1966-09-20
NL293315A (de)

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