US2950185A - Production of tantalum powder - Google Patents
Production of tantalum powder Download PDFInfo
- Publication number
- US2950185A US2950185A US741865A US74186558A US2950185A US 2950185 A US2950185 A US 2950185A US 741865 A US741865 A US 741865A US 74186558 A US74186558 A US 74186558A US 2950185 A US2950185 A US 2950185A
- Authority
- US
- United States
- Prior art keywords
- bath
- sodium
- potassium
- reactor
- fluotantalate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title description 11
- 239000011734 sodium Substances 0.000 claims description 35
- 229910052708 sodium Inorganic materials 0.000 claims description 35
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 34
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 28
- 229910052700 potassium Inorganic materials 0.000 claims description 28
- 239000011591 potassium Substances 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 10
- 239000006227 byproduct Substances 0.000 claims description 6
- 238000013517 stratification Methods 0.000 claims description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 36
- 235000013024 sodium fluoride Nutrition 0.000 description 18
- 239000011775 sodium fluoride Substances 0.000 description 18
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 12
- 239000011698 potassium fluoride Substances 0.000 description 7
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 235000003270 potassium fluoride Nutrition 0.000 description 6
- 238000010992 reflux Methods 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000009835 boiling Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000013019 agitation Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000011067 equilibration Methods 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 210000004907 gland Anatomy 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 150000003385 sodium Chemical class 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/16—Making metallic powder or suspensions thereof using chemical processes
- B22F9/18—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds
- B22F9/24—Making metallic powder or suspensions thereof using chemical processes with reduction of metal compounds starting from liquid metal compounds, e.g. solutions
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
Definitions
- This invention relates to the production of tantalum metal in pure powder form.
- the principal object of the present invention is to provide an improved process for producing tantalum metal which can be converted into usefully ductile material without the necessity of high vacuum sintering operations to remove oxygen.
- Another object of the invention is to provide an improved method for producing tantalum powder at high production rates :withexcellent control of the reaction to produce uniform, small particles.
- Still another object of the invention is to provide a process which can be readily controlled to give high production rates in a relatively short time cycle.
- the invention accordingly comprises the process involving the several steps and the relation and the order of one or more of such steps with respect to each of the others and the products possessing the features, properties and the relation of components which are exemplified in the following detailed disclosure, and the scope of the application 'of which will be indicated in the claims.
- Fig. 1 is a schematic, diagrammatic illustration of one embodiment of the invention.
- Fig. 2 is a sectional view of a portion of Fig. 1 taken along the line 2- 2 of Fig. l. i
- tantalum powder is produced by reducing potassium fluotantalate with sodium.
- Potassium fluotantalate K TaF has a melting point of about 765 C.
- a molten bath of the fluotantalate is preferably confined in a reactor maintained at a temperature above the melting point of potassium fluotantalate and liquid sodium is fed to the fused bath of potassium fluotantalate to reduce'the potassium fluotantalate to tantalum powder with the pro-' duction of the byproducts sodium fluoride and potassium fluoride.
- the byproduct may not uniformly have the ratio of 2 moles of potassium fluoride to 5 moles of sodium fluoride since sodium will reduce potassium fluoride to potassium with the formation of sodium fluoride. Accordingly, the surface of the bath where the sodium is fed may consist largely of sodium fluoride, free sodium and NaK. The NaK thus liberated can reduce the potassium fluotantalate to tantalum metal.
- Sodium fluoride has a high melting point on the order of 990 C., while potassium fluoride has a relatively lower melting point of about 840 C.
- a mixture of 5 moles of sodium fluoride and 2 moles of potassium fluoride has a melting point of approximately 875 to 880 :ited States Patented Aug. 23, 1960 C., which is about the boiling point of sodium and con siderably above the boiling point of potassium. It is also'above the boiling point (about 830 C. to 850 C.) of the alloy NaK which can be formed in fairly copious quantities by reaction between sodium and KF.
- sodium fluoride formed at the surface of the bath by reaction with potassium fluotantalate can remain at the surface and form a concentration in excess of the equilibrium solubility in the available potassium fluotantalate. Accordingly, if the surface is below 990 C., the sodium fluoride can freeze and float as a crust on top of the molten bath of potassium fluotantalate. 'Since sodium is continuously fed to this crust surface, and since this surface is above the boiling point of sodium or the boiling point (about 830 C.-850 C.) of NaK, the sodium and NaK, whichever is present, will continuously remove heat from the frozen surface by vaporizing from this surface.
- any sodium fluoride formed at the surface which starts to freeze is immediately pulled down into the bath where '(a) it is no longer subjected to the cooling effect of vaporizing sodium and (b) is in the presence of a large excess of potassium fluotantalate for permitting equilibration of the system.
- Figs. 1 and 2 there is illustrated a very diagrammatic form of one preferred embodiment of the invention.
- the reactor is indicated at 10 as comprising a cylindrical vessel such as an lnconel pot.
- the charge of KzTaFq, illustrated at 12 is placed in the pot and the pot is then sealed by an insulated cover 14.
- the pot is supported in a furnace generally indicated at 16 having a plurality of electrical heating elements 18 therein.
- Liquid sodium is fed from a sodium supply 20 through pipe 22 onto the surface of the charge 12 of K TaF Individual drops of sodium are illustrated at 24.
- a reflux condenser 30 is provided in a vent line 28 for refluxing sodium vapors tending to escape through the vent line 28.
- a vacuum pump 32 is also connected to the vent line to permit evacuation of the interior of the reaction vessel 10.
- a source of inert gas 34 is also connected to the vent line to permit the introduction of a slight superatmospheric pressure of inert gas into the interior of the reaction vessel.
- a propeller 40 carried by a propeller shaft 42.
- This propeller shaft extends through a suitable vacuum-tight gland 44 to a motor schematically indicated at 46.
- Three baffles 48 are positioned around the interior of the reaction vessel 10. These bafiles serve to discourage circumferential flow of KgTaFq and encourage vertical flow.
- the combination of the baflles and propellers thus illustrated gives high upward flow of the fused bath at the center of the bath and rapid downward flow at the periphery of the bath. This violent agitation of the bath thus keeps the composition of the bath substantially completely uniform throughout its depth.
- the propeller will give an upward velocity to the bath of 10 to 20 feet per minute. It will also provide substantially complete recirculation of the bath in 10 or 15 seconds.
- Example I One hundred pounds of KzTaFq is placed in an Inconel reactor 12 inches in diameter and 12 inches high.
- the inside of the reactor is provided with 3 baffles having radial dimensions of about 1 inch as illustrated in Fig. 1 and is provided with a propeller of inches in diameter with a pitch of 35 During the reduction stage of the operation the propeller is run at 175 r.p.m.
- the reactor is sealed, and repeatedly evacuated and back filled with argon to provide a slight positive pressure of a few rni'llimeters above atmosphere. During this repeated evacuation and back filling with argon, the reactor is heated to 200 to 400 C. to assure removal of all water vapor and other gases or vapors. The reactor is then heated to 925 C.
- the product consisted of tantalum powder having the following particle size distribution after being run through a Wiley mill:
- the improvement whidh comprises confining a bath of molten potassium fluotantalate in a reactor at a temperature above 900 C., feeding molten sodium to the surface of the bath at a rate in excess of one pound per square foot per hour of bath surface, refluxing to said surface sodium and NaK evaporating from said surface, and agitating said bath with a mechanical agitator at a suificiently high rate and with substantially lineal upward and downward flow to draw into the bath any sodium fluoride crystals floating on the surface of the bath.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL252366D NL252366A (fr) | 1958-06-13 | ||
US741865A US2950185A (en) | 1958-06-13 | 1958-06-13 | Production of tantalum powder |
DEN16680A DE1141794B (de) | 1958-06-13 | 1959-05-06 | Verfahren zur Herstellung von Tantalpulver |
FR824092A FR1284531A (fr) | 1958-06-13 | 1960-04-11 | Procédé de fabrication de tantale métallique |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US741865A US2950185A (en) | 1958-06-13 | 1958-06-13 | Production of tantalum powder |
FR824092A FR1284531A (fr) | 1958-06-13 | 1960-04-11 | Procédé de fabrication de tantale métallique |
Publications (1)
Publication Number | Publication Date |
---|---|
US2950185A true US2950185A (en) | 1960-08-23 |
Family
ID=37891422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US741865A Expired - Lifetime US2950185A (en) | 1958-06-13 | 1958-06-13 | Production of tantalum powder |
Country Status (4)
Country | Link |
---|---|
US (1) | US2950185A (fr) |
DE (1) | DE1141794B (fr) |
FR (1) | FR1284531A (fr) |
NL (1) | NL252366A (fr) |
Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3295951A (en) * | 1965-02-02 | 1967-01-03 | Nat Res Corp | Production of metals |
US3992192A (en) * | 1974-07-01 | 1976-11-16 | Haig Vartanian | Metal powder production |
US4141720A (en) * | 1978-05-16 | 1979-02-27 | Nrc, Inc. | Tantalum powder reclaiming |
US4149876A (en) * | 1978-06-06 | 1979-04-17 | Fansteel Inc. | Process for producing tantalum and columbium powder |
US4445931A (en) * | 1980-10-24 | 1984-05-01 | The United States Of America As Represented By The Secretary Of The Interior | Production of metal powder |
US5442978A (en) * | 1994-05-19 | 1995-08-22 | H. C. Starck, Inc. | Tantalum production via a reduction of K2TAF7, with diluent salt, with reducing agent provided in a fast series of slug additions |
US5524836A (en) * | 1993-02-12 | 1996-06-11 | Board Of Control Of Michigan Technological University | Method for producing powder from polycrystalline inorganic material |
WO2000031310A1 (fr) | 1998-11-25 | 2000-06-02 | Cabot Corporation | Tantale de grande purete et produits le contenant, tels que les cibles pulverisees |
US20030082864A1 (en) * | 1998-05-27 | 2003-05-01 | Harry Rosenberg | Tantalum sputtering target and method of manufacture |
US20040008472A1 (en) * | 1999-02-08 | 2004-01-15 | Tripp Terrance B. | Capacitor substrates made of refractory metal nitrides |
US20040163491A1 (en) * | 2000-10-10 | 2004-08-26 | Shekhter Leonid N. | Metalothermic reduction of refractory metal oxides |
US6863750B2 (en) | 2000-05-22 | 2005-03-08 | Cabot Corporation | High purity niobium and products containing the same, and methods of making the same |
US20050279187A1 (en) * | 2004-06-21 | 2005-12-22 | Shekhter Leonid N | Metalothermic reduction of refractory metal oxides |
US20060065073A1 (en) * | 2004-09-29 | 2006-03-30 | Shekhter Leonid N | Magnesium removal from magnesium reduced metal powders |
US20060213327A1 (en) * | 2005-03-22 | 2006-09-28 | Shekhter Leonid N | Method of preparing primary refractory metal |
US20060230877A1 (en) * | 2000-02-08 | 2006-10-19 | Yukio Oda | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder |
US20080011124A1 (en) * | 2004-09-08 | 2008-01-17 | H.C. Starck Gmbh & Co. Kg | Deoxidation of Valve Metal Powders |
US20080105082A1 (en) * | 2004-09-29 | 2008-05-08 | Shekhter Leonid N | Magnesium Removal From Magnesium Reduced Metal Powders |
US7485198B2 (en) | 2001-01-11 | 2009-02-03 | Cabot Corporation | Tantalum and niobium billets and methods of producing the same |
EP2055412A2 (fr) | 1998-05-06 | 2009-05-06 | H.C. Starck GmbH | Poudres de métal produites par la réduction des oxydes avec un magnésium gazeux |
CN101879605A (zh) * | 2010-06-18 | 2010-11-10 | 江门富祥电子材料有限公司 | 搅拌钠还原氟钽酸钾制取钽粉的方法及装置 |
CN101879603A (zh) * | 2010-06-18 | 2010-11-10 | 江门富祥电子材料有限公司 | 钽粉的生产方法和装置 |
CN104801725A (zh) * | 2015-05-18 | 2015-07-29 | 江门富祥电子材料有限公司 | 一种钠还原氟钽酸钾的反应装置及用其制造钽粉的方法 |
WO2019173087A1 (fr) | 2018-03-05 | 2019-09-12 | Global Advanced Metals Usa, Inc. | Anodes contenant une poudre sphérique et des condensateurs |
WO2020027874A2 (fr) | 2018-03-05 | 2020-02-06 | Global Advanced Metals Usa, Inc. | Poudre de tantale sphérique, produits la contenant, et ses procédés de production |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4684399A (en) * | 1986-03-04 | 1987-08-04 | Cabot Corporation | Tantalum powder process |
DE3712281A1 (de) * | 1987-04-10 | 1988-10-27 | Heraeus Gmbh W C | Verfahren zur herstellung von hochduktilem tantal-halbzeug |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2069705A (en) * | 1934-04-30 | 1937-02-02 | Alais & Froges & Camarque Cie | Process of manufacture of metallic glucinum and its alloys |
US2193364A (en) * | 1936-06-06 | 1940-03-12 | Perosa Corp | Process for obtaining beryllium and beryllium alloys |
CA541517A (fr) * | 1957-05-28 | Fansteel Metallurgical Corporation | Recuperation de tantale et columbium | |
US2823991A (en) * | 1954-06-23 | 1958-02-18 | Nat Distillers Chem Corp | Process for the manufacture of titanium metal |
GB791121A (en) * | 1954-11-18 | 1958-02-26 | Atomic Energy Authority Uk | Improvements in or relating to the production of niobium |
US2837426A (en) * | 1955-01-31 | 1958-06-03 | Nat Distillers Chem Corp | Cyclic process for the manufacture of titanium-aluminum alloys and regeneration of intermediates thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE815107C (de) * | 1950-01-17 | 1951-09-27 | Hermann C Starck A G | Verfahren zur Herstellung von Tantal-Metall |
-
0
- NL NL252366D patent/NL252366A/xx unknown
-
1958
- 1958-06-13 US US741865A patent/US2950185A/en not_active Expired - Lifetime
-
1959
- 1959-05-06 DE DEN16680A patent/DE1141794B/de active Granted
-
1960
- 1960-04-11 FR FR824092A patent/FR1284531A/fr not_active Expired
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA541517A (fr) * | 1957-05-28 | Fansteel Metallurgical Corporation | Recuperation de tantale et columbium | |
US2069705A (en) * | 1934-04-30 | 1937-02-02 | Alais & Froges & Camarque Cie | Process of manufacture of metallic glucinum and its alloys |
US2193364A (en) * | 1936-06-06 | 1940-03-12 | Perosa Corp | Process for obtaining beryllium and beryllium alloys |
US2823991A (en) * | 1954-06-23 | 1958-02-18 | Nat Distillers Chem Corp | Process for the manufacture of titanium metal |
GB791121A (en) * | 1954-11-18 | 1958-02-26 | Atomic Energy Authority Uk | Improvements in or relating to the production of niobium |
US2837426A (en) * | 1955-01-31 | 1958-06-03 | Nat Distillers Chem Corp | Cyclic process for the manufacture of titanium-aluminum alloys and regeneration of intermediates thereof |
Cited By (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3295951A (en) * | 1965-02-02 | 1967-01-03 | Nat Res Corp | Production of metals |
US3992192A (en) * | 1974-07-01 | 1976-11-16 | Haig Vartanian | Metal powder production |
US4141720A (en) * | 1978-05-16 | 1979-02-27 | Nrc, Inc. | Tantalum powder reclaiming |
US4149876A (en) * | 1978-06-06 | 1979-04-17 | Fansteel Inc. | Process for producing tantalum and columbium powder |
US4445931A (en) * | 1980-10-24 | 1984-05-01 | The United States Of America As Represented By The Secretary Of The Interior | Production of metal powder |
US5524836A (en) * | 1993-02-12 | 1996-06-11 | Board Of Control Of Michigan Technological University | Method for producing powder from polycrystalline inorganic material |
WO1995032313A1 (fr) * | 1994-05-19 | 1995-11-30 | H.C. Starck, Inc. | Production de tantale et tantale ainsi produit |
US5442978A (en) * | 1994-05-19 | 1995-08-22 | H. C. Starck, Inc. | Tantalum production via a reduction of K2TAF7, with diluent salt, with reducing agent provided in a fast series of slug additions |
EP2055412A2 (fr) | 1998-05-06 | 2009-05-06 | H.C. Starck GmbH | Poudres de métal produites par la réduction des oxydes avec un magnésium gazeux |
US6958257B2 (en) | 1998-05-27 | 2005-10-25 | Honeywell International Inc. | Tantalum sputtering target and method of manufacture |
US20050284546A1 (en) * | 1998-05-27 | 2005-12-29 | Harry Rosenberg | Tantalum sputtering target and method of manufacture |
US20030082864A1 (en) * | 1998-05-27 | 2003-05-01 | Harry Rosenberg | Tantalum sputtering target and method of manufacture |
WO2000031310A1 (fr) | 1998-11-25 | 2000-06-02 | Cabot Corporation | Tantale de grande purete et produits le contenant, tels que les cibles pulverisees |
US7585380B2 (en) | 1998-11-25 | 2009-09-08 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US20030168131A1 (en) * | 1998-11-25 | 2003-09-11 | Michaluk Christopher A. | High purity tantalum, products containing the same, and methods of making the same |
US7431782B2 (en) | 1998-11-25 | 2008-10-07 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US6893513B2 (en) | 1998-11-25 | 2005-05-17 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US6348113B1 (en) | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US20040008472A1 (en) * | 1999-02-08 | 2004-01-15 | Tripp Terrance B. | Capacitor substrates made of refractory metal nitrides |
US6927967B2 (en) | 1999-02-08 | 2005-08-09 | H. C. Starck Inc. | Capacitor substrates made of refractory metal nitrides |
US20060230877A1 (en) * | 2000-02-08 | 2006-10-19 | Yukio Oda | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder |
US7473294B2 (en) | 2000-02-08 | 2009-01-06 | Cabot Supermetals K.K. | Nitrogen-containing metal powder, production process thereof, and porous sintered body and solid electrolytic capacitor using the metal powder |
US6863750B2 (en) | 2000-05-22 | 2005-03-08 | Cabot Corporation | High purity niobium and products containing the same, and methods of making the same |
US20050263217A1 (en) * | 2000-05-22 | 2005-12-01 | Cabot Corporation | High purity niobium and products containing the same, and methods of making the same |
US20070107549A1 (en) * | 2000-10-10 | 2007-05-17 | Shekhter Leonid N | Metalothermic reduction of refractory metal oxides |
US7678175B2 (en) | 2000-10-10 | 2010-03-16 | H.C. Starck Inc. | Metalothermic reduction of refractory metal oxides |
US20040163491A1 (en) * | 2000-10-10 | 2004-08-26 | Shekhter Leonid N. | Metalothermic reduction of refractory metal oxides |
US7150776B2 (en) | 2000-10-10 | 2006-12-19 | H.C. Starck Inc. | Metalothermic reduction of refractory metal oxides |
US6849104B2 (en) | 2000-10-10 | 2005-02-01 | H. C. Starck Inc. | Metalothermic reduction of refractory metal oxides |
US20090068434A1 (en) * | 2001-01-11 | 2009-03-12 | Cabot Corporation | Tantalum and Niobium Billets and Methods of Producing the Same |
US8231744B2 (en) | 2001-01-11 | 2012-07-31 | Global Advanced Metals, Usa, Inc. | Tantalum and niobium billets and methods of producing the same |
US7485198B2 (en) | 2001-01-11 | 2009-02-03 | Cabot Corporation | Tantalum and niobium billets and methods of producing the same |
US7354472B2 (en) | 2004-06-21 | 2008-04-08 | H.C. Starck Inc. | Metalothermic reduction of refractory metal oxides |
US20050279187A1 (en) * | 2004-06-21 | 2005-12-22 | Shekhter Leonid N | Metalothermic reduction of refractory metal oxides |
US20080011124A1 (en) * | 2004-09-08 | 2008-01-17 | H.C. Starck Gmbh & Co. Kg | Deoxidation of Valve Metal Powders |
US7431751B2 (en) | 2004-09-29 | 2008-10-07 | H.C. Starck Inc. | Magnesium removal from magnesium reduced metal powders |
US20080105082A1 (en) * | 2004-09-29 | 2008-05-08 | Shekhter Leonid N | Magnesium Removal From Magnesium Reduced Metal Powders |
US20060065073A1 (en) * | 2004-09-29 | 2006-03-30 | Shekhter Leonid N | Magnesium removal from magnesium reduced metal powders |
US20060213327A1 (en) * | 2005-03-22 | 2006-09-28 | Shekhter Leonid N | Method of preparing primary refractory metal |
US7399335B2 (en) | 2005-03-22 | 2008-07-15 | H.C. Starck Inc. | Method of preparing primary refractory metal |
CN101879605A (zh) * | 2010-06-18 | 2010-11-10 | 江门富祥电子材料有限公司 | 搅拌钠还原氟钽酸钾制取钽粉的方法及装置 |
CN101879603B (zh) * | 2010-06-18 | 2012-05-30 | 江门富祥电子材料有限公司 | 钽粉的生产方法和装置 |
CN101879603A (zh) * | 2010-06-18 | 2010-11-10 | 江门富祥电子材料有限公司 | 钽粉的生产方法和装置 |
CN104801725A (zh) * | 2015-05-18 | 2015-07-29 | 江门富祥电子材料有限公司 | 一种钠还原氟钽酸钾的反应装置及用其制造钽粉的方法 |
CN104801725B (zh) * | 2015-05-18 | 2018-01-23 | 江门富祥电子材料有限公司 | 一种钠还原氟钽酸钾的反应装置及用其制造钽粉的方法 |
WO2019173087A1 (fr) | 2018-03-05 | 2019-09-12 | Global Advanced Metals Usa, Inc. | Anodes contenant une poudre sphérique et des condensateurs |
WO2020027874A2 (fr) | 2018-03-05 | 2020-02-06 | Global Advanced Metals Usa, Inc. | Poudre de tantale sphérique, produits la contenant, et ses procédés de production |
US10943744B2 (en) | 2018-03-05 | 2021-03-09 | Global Advanced Metals Usa, Inc. | Anodes containing spherical powder and capacitors |
US11508529B2 (en) | 2018-03-05 | 2022-11-22 | Global Advanced Metals Usa, Inc. | Anodes containing spherical powder and capacitors |
US11691197B2 (en) | 2018-03-05 | 2023-07-04 | Global Advanced Metals Usa, Inc. | Spherical tantalum powder, products containing the same, and methods of making the same |
Also Published As
Publication number | Publication date |
---|---|
DE1141794B (de) | 1962-12-27 |
DE1141794C2 (fr) | 1963-06-27 |
FR1284531A (fr) | 1962-02-16 |
NL252366A (fr) |
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