US2899556A - Apparatus for the treatment of substances - Google Patents

Apparatus for the treatment of substances Download PDF

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US2899556A
US2899556A US2899556DA US2899556A US 2899556 A US2899556 A US 2899556A US 2899556D A US2899556D A US 2899556DA US 2899556 A US2899556 A US 2899556A
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pressure
vacuum
nozzle
chamber
stage
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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/081—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21H—OBTAINING ENERGY FROM RADIOACTIVE SOURCES; APPLICATIONS OF RADIATION FROM RADIOACTIVE SOURCES, NOT OTHERWISE PROVIDED FOR; UTILISING COSMIC RADIATION
    • G21H5/00—Applications of radiation from radioactive sources or arrangements therefor, not otherwise provided for 
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/04—Irradiation devices with beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/20—Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/15—External mechanical adjustment of electron or ion optical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00—Metal founding
    • Y10S164/04—Dental

Definitions

  • thin foils consisting preferably 'ofalu'minium which are placed in a vacuum-tight'manner upon a through aperture in the wall of the beam gen- "erating chamber, and through which the corpuscular beam must then be conducted, which involves considerable consists of a series of chambers with increasing air pressures, which are arranged in series in the direction of the beam and possesses fine aligned apertures in the partition walls so that only a fraction of the total -.'p'ressure dilferenc'e will be effective to cause entry of air through each aperture, while the'corpuscular beam can be conducted through the apertures and thus, stage- -by'-sta'ge, from the vacuum chamber into chambers of progressively higher gas pressure and finally into the "working space, which may be the free atmosphere or a chamber with essentially atmospheric pressure. Electron microscopy is, however, concerned only with very small concentrations of energy.
  • the presentinvention relates to an apparatus for the treatment of substances adapted to be controlled without inertia 'and'localised within narrowly confined spatial limits with the particularly characteristic feature that an electric corpuscular beam produced and concentrated in a vacuum by well known means is conducted outof the vacuum through the medium of a :dynamic pressurestage stretch without the employment of material windows, into a space containing gas at a pressure comparable to atmospheric pressure and is caused to impinge 'upon'the sharply confined part of space in which the'treatment is desired to take place.
  • the appara'tus of the invention is of great importance for obtaining a treatment requiring high energy transforma- "tiofis'controllable in an inertialess manner, 'confinedwithin narrow spatial limits by the use of a corpuscular beam co ducted out of the generating chamber through a dynamic pressure-stage stretch.
  • Theinvention mak'es'it possible to'generate locally confined and controllable without inertia, 'very high temperatures and 'thiseffect can be utilised for cutting by burning substances moved perpendicularly to the cor- 'puscular beam or for the thermic blasting of holes in *imetallic 'or non-metallic stationary objects.
  • 'Even finespatial shapes may be burned out under suitable movement of thebeam apparatus or of the object, by the gradual removal of surface portions.
  • the invention permits very fine, smooth bores with walls of high quality to be obtained.
  • the invention also makes it possible for confined volume portions of gases to be heated very rapidly to very 'high temperatures which, for example, may be utilised for the generationofthermic pressure pulses and, with a suitable beam frequency, for the generation of intensive .sound oscillations in gases.
  • the volume heating may also be utilised for the separation of gaseous mixtures by thermic diffusion; for example'an isotope separation may be effected-in thismanner.
  • the invention also allows living tissue to be irradiated for the production of biological or therapeutic eifects.
  • the invention makes it possible with the help of a corpuscular beam apparatus equipped with a pressure-stage stretch, to excite any suitable substances, including even substances which become unstable ina vacuum, for the emission of X-ray radiation with great intensity in anormal atmosphere.
  • the, invention makes it possible for the first time to carryout the X-ray spectrographic analysis of solutions and of liquid substances.
  • the invention has been found useful and may serve for temperature and density measurement in hot flames, e.g. in the propulsion jet of a rocket or for the supervision of chemical reactions.
  • one may, for example, measure the partial pressures of individual'reaction components by drawing conclusions from thedispersion 'ofa corpuscular beam, particularly a beam (10 Hg), "aiworking chamber containing the material tofbe treated, the gas pressure in this working chamber being more than 1 Torr, and at least one pressure-stage chamber interposed between the generating chamber and the -'i'yorking chamber, in which the gas pressure has a-value-between the pressures in said two chambers, the partition walls between the individual chambers being provided, at the passage points of the beam, with fine orifices making possible the unimpeded passage of the corpuscular beam with such a distance, within the order of magnitude of the orifice diameters, that the formation of density maxima anddensity minima in the inflowing jet of gas is utilized and the orifice nearest the direction of the
  • Fig. 1 is a somewhat diagrammatic sectional elevation showing a beam generating apparatus comprising a twostage pressure-stage stretch incorporated in the path of the. corpuscular beam and an object arranged in front of it, which object, for example, is intended to be pierced.
  • Fig. 2 is a fragmentary representation, to a larger scale, of the front part of the pressure-stage stretch shown in Fig. l, which shows the relation between the dimensions of the orifice, which is an aperture at the end of a nozzle in the illustrated instance, and its distance from the exit orifice, on the one hand, and the shape of the jet of gas entering from the working chamber, on the other hand.
  • Fig. 3 similarly illustrates a well tried form of a fourstage pressure-stage stretch.
  • 1 indicates the preferably cylindrical vacuum chamber with a vacuum tight metal wall 2, into which chamber there projects from one of the end faces with vacuum tight seal a corpuscular ray generating source 4, which may be of any conventional design and which includes the mounting 3.
  • a corpuscular ray generating source 4 which may be of any conventional design and which includes the mounting 3.
  • a concentrated powerful cathode-ray beam may be generated with a conventional telefocus cathode 4 with a Wehnelt cylinder, as described in Optik, vol. 5 (1949), page 469.
  • This is an electron-optical device for focusing the electron beam emitted from a conventional tungsten wire cathode.
  • cold cathodes, channel-ray or ion sources and other particle generators and accelerators with the required concentrating (focussing) means may be provided.
  • the wall 2 of the vacuum chamber forms, in the illustrated embodiment, the anode and is grounded.
  • the end wall, situated in the direction of the beam, of the cylindrical vacuum chamber 1, preferably has the shape of an outwardly directed cone shell and is provided at its apex 5 with a nose-like perforated projection adapted to accommodate a nozzle pin 6 provided with a capillary 17 for the passage of the corpuscular beam.
  • the intermediate pressure-stage chamber 7 is preferably of cylindrical shape, and its wall 8 may be moulded or cast from a single block of metal simultaneously with the wall 2 of the vacuum chamber. It is closed against the external air or the working chamber 31 by a perforated nozzle plate 9.
  • the distance between the point of the nozzle pin 6 from the nozzle plate 9 is so selected that the point of the capillary 17 does not fall into a gas-density node 11 of the infiowing gas jet 12 but, as shown in Fig. 2, into the density minimum 10, a relatively short nozzle distance is obtained.
  • the nozzle apertures or capillaries 17 to 20 are blanked out of separate diaphragms 13 to 16 which are constructed as funnels or as cone shells of a cone shape progressively slimmer, i.e. having progressively smaller cone angles, from the outside toward the inside of the vacuum chamber according to their sequence in the pressure-stage, and nested in each other with their points extending in the direction of the corpuscular beam, and inserted into the partition walls 21 to 24 between the pressure-stage cham- 4 bers 28 to 30. It is of advantage for the nozzle diaphragms to be exchangeable individually or in sets. schematically indicated in Fig.
  • the pump sets 25 to 27 which serve for the generation and maintenance of the required pressure conditions.
  • Means are preferably provided for cooling the partition walls between the pressure stage chambers, more particularly the. innermost partition wall 21, and/or the nozzle members, as indicated schematically at 13 in Fig. 3.
  • the cone shape of the nozzle diaphragms is very favourable inasmuch as they may be arranged closely behind each other in the apparatus so that on the one hand the points of the nozzles may line in the periodical pressure or density minima, respectively, and the total path of the corpuscular beam through the pressure-stage up to the atmospheric pressure remains small, while on the other hand the stage chambers determined by two diaphragms each and arranged behind one another are enlarged outwardly in a radial direction and thus favourable conditions exist for the connection of the pumps and for the withdrawal of the infiowing gas.
  • an object 33 (Fig. 1) to be pierced is mounted in the working chamber 31 on a support 35 so as to lie in front of the corpuscular beam 32 emerging from the nozzle diaphragm 9 in order that the irradiated portions 34 of the object may be evaporated and the desired bore produced.
  • the vacuum chamber 1 and the pressure-stage chamber 7 are connected by means of the stubs 36 and 37 to the schematically represented vacuum-pump sets 38 and 39 which have a suction power determined according to the desired pressure differences. It may be advantageous in this case for the pump 38 which is connected to the chamber of lower pressure to be arranged to operate against the pressure of pump 39 which is connected to the chamber 7 and which in this case acts as a pre-vacuum pump.
  • Constructive arrangements may be made which make possible both an adjustment of the desired distance between the two nozzle diaphragms 6 and 9 and the fine alignment of the latter so that the capillary 17 in the nozzle pin 6 points accurately to the aperture of the nozzle diaphragm 9.
  • a further adjustment device is intended to make possible that the beam generated by any suitable source of radiation 4, for example by a known telefocus cathode or by a cold cathode, shall strike accurately the aperture of the capillary at the vacuum side and is given the direction thereof.
  • any suitable source of radiation for example by a known telefocus cathode or by a cold cathode
  • One construction has been found satisfactory according to which both for the housing of the beam apparatus and for the housing of the pressure-stage stretch two spherically ground bearings 40 and 41 are provided which, however, have different radii of curvature and different centres of curvatures, the operation being etfected with the help of the spindles 42 and 43. When the centres of curvature are disposed in opposite directions, the radii of curvature of the two ground bearings may be equal if desired.
  • the holders 3 for the source of radiation 4 and the housing 2 of the vacuum chamber and of the pressurestage stretch are connected to each other at the flange 44.
  • the pressure-stage stretch need not be altered, and more particularly no other high vacuum pumps are required.
  • the spherically ground bearing it is advisable in the spherically ground bearing for the sphericalsurface to be formed with astep at the smaller diameter or to arrange for them'to tcarry there a screen ring of a width such that nolsuppontingrporticns of the surfaces project freely into the high vacuum and that any gas discharge accidentally there "produced ,can- -not leave any burning traces of theground surfaces; If the spherically groundbearing ;is.ilubricated with :a thin high-vacuum grease layer, metal Smay:slide.on metal, and the ground connection is then high-vacuum tight without the use of flexible bellows. Apart-from the simplicity and reliability of adjustment hy means of the two spherical ground seatings, this also involves the appreciable advantage that the constructional height of the apparatus may be kept relatively-small. V y
  • the gasflfiow in the nozzle diaphragms adjoiningthe 'vacuum is reduced to a very small fraction-of the flow of .gas entering the vacuum when only .a..single..nozzle:iis..used, without .any important stray (diffusion). .loss .being produced.
  • the pressure-stage arrangement according to the invention has the advantage that, because of the funnel or cone shaped construction of the nozzle diaphragms and the resultant enlargement of the pressure-stage chamber in a radial direction outwardly, flow conditions in the nozzles and in the individual spaces between the nozzle diaphragms are much more favourable than in the case of fiat pressure chambers between plane nozzle diaphragms.
  • the individual diaphragms act, due to their conical shape, as gas traps, since the nozzle apertures at the apex of each diaphragm amount to only a small portion of the cross-section which is available for the expansion of the flow of gas entering through the pressure nozzle aperture.
  • the total path from the vacuum to the high pressure is very short and as a result losses by diffusion of the corpuscular beam are small. Since furthermore the wall areas of the individual pressure chambers are very large due to the funnel shape or conical construction of the nozzle diaphragms, very effective removal of heat is obtained and adequate room is available for the attachment of pumping stubs of as great a width as possible.
  • the nozzle diaphragm in contact with the high pressure may consist of a thin plate without appreciably more gas penetrating through the fine aperture than would enter through a longer nozzle passage
  • the nozzle in the inner diaphragm is preferably constructed as a long passage or as a capillary so that on the relatively long part within the capillary already a great pressure drop may develop and the pressure in the first stage chamber adjoining the high vacuum may already be fairly high. Contrary to the situation in the preceding high pressure range, the flow of gas in the low pressure range is strongly reduced by a longitudinal extension of the nozzle.
  • the corpuscular beam is not materially affected since the productzpressure times path length which determines the diffusion of a corpuscular beam, remains small owing to the small pressure.
  • a considerable advantage as regards the manipulation and manifold application of the device for leading out a corpuscular beam into the atmosphere is obtained by the proposed exchangeability of individual nozzles or of a set of nozzles.
  • nozzle diaphragms which have become damaged in the course of time to be replaced by new ones in a simpler manner but also diaphragms of difierent nozzle apertures or shapes to be applied for difierent uses.
  • suitable diaphragms and corresponding nozzle diameters are required, independently of how otherwise the diaphragms may be shaped.
  • the nozzle diaphragms may also be adjustable relative to each other individually or in sets. For instance,
  • electrostatic or magnetic lenses for concentrating (focussing) :the corpuscular beam thus supplementing any-additional electron-optical focussing elements which may be provided.
  • a magnetic lens 45 may be .arranged in the vacuum chamber, as has been shown in Fig. 1.
  • the :long capillary 17 maybe further increased in lengthand/or be widenedat the entrance and the nozzle pin 6 charged negatively so that an electrostatic lens effectwis produced and the current density of the corpuscular beam is isubstantially increased at ith narrowest point of the pressure stretch.
  • the nozzle apertures may also form the ⁇ p.ole pieces of magnetic lenses.
  • the ,pumps for the individual pressure-stages are-chosen suitably amongst the pumps available; but for certain intermediate stages no particularly suitable pumps are readily commercially available at the present time.
  • An adaptation may be obtained for example, by filling a rotary pump with oil of very low viscosity without regard to the vapour pressure thereof and operating it at a rate of revolution greater than the normal one.
  • One may also, when employing multi-stage pumps, provide each stage with a suction stub and connect it with the appropriate pressure stage or cause the pump of each pressure stage to work against the next higher pressure stage. It is also within the scope of the invention when the pressure-stage stretch or the whole corpuscular beam apparatus is combined with the pumps to form a construction unit so that no pipe conduits throttling the suction output are required at all.
  • Apparatus for producing chemical reactions comprising a source for a beam of electrically charged corpuscular rays having an energy not substantially exceeding 200 kv., said source being positioned in a vacuum chamber, means for maintaining in said chamber a gas pressure of less than 10- Torr, a pressure stage stretch including at least one intermediate chamber, means for maintaining in each intermediate chamber a gas pressure less than atmospheric, a partition wall between adjacent ones of said intermediate chambers, said partition walls having small apertures, the partition walls being so spaced that succeeding apertures are positioned in the minimum density region of the gas stream flowing into said intermediate chambers from'the atmosphere, means for concentrating the corpuscular rays and the apertures being so aligned that the concentrated rays pass unimpeded therethrough from the vacuum chamber to the atmosphere to cause there said chemical reactions.
  • Apparatus for the treatment of substances with corpuscular rays comprising a source of said rays, an accelerating tube under a vacuum of no more than 10- mm. Hg for the acceleration of the ray corpuscules to an energy not substantially exceeding 200 kv., a working chamber under at least atmopheric pressure, and a pressure stage stretch between the vacuum and the working chamber, said stretch including at least two pressure stage chambers and a separating wall with a relatively large aperture between adjacent ones of said chambers, the separating wall apertures being aligned to transmit said rays from the accelerating tube to the working chamber and the pressure stage stretch forming a very short transit region of intermediate gas pressure with minimum energy losses of the ray corpuscules in said stretch, the working chamber being in communication with the last one of said pressure stage chambers and the substance to be treated being placed into said working chamber in the path of the rays.
  • Apparatusfor the treatment of substances with core puscular rays comprising a. source :of said rays, an accelerating: tube yunder a vacuum of no more than 10* mm.I-Ig:for the acceleration ofthe ray corpusculesto an energy not substantially exceeding 200 kvz, a working chamber under at least atmospheric pressure, and a.
  • partition walls having-acentral cone pointing toward the first partition wall with the. holes at'the apex of the cones, means mediate chambersthroughpreceding, holes, all hole dis-. tancesbeing inthe 'samelorderofmagnitude as the hole diameters and the substance to be treated being placed into said working chamber in the path of the rays.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Biomedical Technology (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
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  • Life Sciences & Earth Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Public Health (AREA)
  • Animal Behavior & Ethology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pathology (AREA)
  • Veterinary Medicine (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Particle Accelerators (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Beam Exposure (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
US2899556D 1952-10-17 Apparatus for the treatment of substances Expired - Lifetime US2899556A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE332987X 1952-10-17
DESCH10753A DE971610C (de) 1952-10-17 1952-10-17 Dynamische Druckstufenstrecke zur UEberfuehrung eines Korpuskular-strahlbuendels aus Raeumen niederen Gasdruckes in Raeume hoeheren Gasdruckes

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US (1) US2899556A (ja)
CH (1) CH332987A (ja)
DE (1) DE971610C (ja)
FR (1) FR1090183A (ja)
GB (3) GB777428A (ja)
NL (1) NL109549C (ja)

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US3082316A (en) * 1960-04-12 1963-03-19 Air Reduction Electron beam welding
US3134013A (en) * 1960-12-06 1964-05-19 United Aircraft Corp Method of producing a weld zone of desired cross-sectional shape in charge-carrier-beam welding
US3156811A (en) * 1962-11-05 1964-11-10 United Aircraft Corp Gaseous sealing means in an apparatus for working materials by a beam of charged particles
US3162749A (en) * 1962-12-31 1964-12-22 United Aircraft Corp Jet valve pressure staging device
US3174026A (en) * 1962-06-20 1965-03-16 Budd Co Method and means of circumventing cathode maintenance in electron beam devices
US3206598A (en) * 1961-03-20 1965-09-14 Trub Tauber & Co A G Evacuated and cooled diffraction chamber for electron diffraction apparatus
US3218431A (en) * 1962-12-27 1965-11-16 Gen Electric Self-focusing electron beam apparatus
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US3294954A (en) * 1963-10-15 1966-12-27 Harnischfeger Corp Welding method and apparatus
US3315732A (en) * 1965-03-29 1967-04-25 Edward L Garwin High energy particle beam dump and heat sink
US3322930A (en) * 1961-05-12 1967-05-30 Welding Research Inc Protective shield for electron gun
US3322577A (en) * 1963-05-03 1967-05-30 Temescal Metallurgical Corp Method and apparatus for the continuous production of oxide coatings
US3343828A (en) * 1962-03-30 1967-09-26 Air Reduction High vacuum furnace
US3346736A (en) * 1964-09-22 1967-10-10 Applied Res Lab Inc Electron probe apparatus having an objective lens with an aperture for restricting fluid flow
DE1253841B (de) * 1962-07-11 1967-11-09 United Aircraft Corp Vorrichtung zur Materialbearbeitung mittels eines Ladungstraegerstrahles
US3393289A (en) * 1964-11-12 1968-07-16 United Aircraft Corp Self-cleaning electron beam exit orifice
US3412196A (en) * 1966-07-13 1968-11-19 Sanders Associates Inc Electron beam vacuum melting furnace
US3426173A (en) * 1964-08-08 1969-02-04 Karl Heinz Steigerwald Machining device using a corpuscular beam
US3444350A (en) * 1965-10-23 1969-05-13 United Aircraft Corp Jet diffuser plate for electron beam device
US3469066A (en) * 1966-09-30 1969-09-23 Nasa Method and device for preventing high voltage arcing in electron beam welding
US3474220A (en) * 1967-05-17 1969-10-21 Webb James E Device for preventing high voltage arcing in electron beam welding
US3581086A (en) * 1967-03-21 1971-05-25 Onera (Off Nat Aerospatiale) Device for the supervision of a treatment in an enclosure at very low pressure
US3585349A (en) * 1963-04-15 1971-06-15 Rohr Corp Nonvacuum environmentally controlled electron beam
US3725633A (en) * 1971-01-08 1973-04-03 Westinghouse Electric Corp Corpuscular beam in the atmosphere
US3770934A (en) * 1971-10-29 1973-11-06 Machlett Lab Inc Electron beam heating apparatus
US3800152A (en) * 1970-12-11 1974-03-26 Onera (Off Nat Aerospatiale) Electron analysis apparatus with heat-protective shield means spacedly overlying a sample supporting surface
WO1983003674A1 (en) * 1982-04-14 1983-10-27 Battelle Development Corp Providing x-rays
US4484339A (en) * 1981-02-09 1984-11-20 Battelle Development Corporation Providing X-rays
US4524261A (en) * 1983-09-19 1985-06-18 Varian Associates, Inc. Localized vacuum processing apparatus
US5324950A (en) * 1991-07-18 1994-06-28 Hitachi, Ltd. Charged particle beam apparatus
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
WO1997007525A1 (en) * 1995-08-11 1997-02-27 Philips Electronics North America Corporation Field emission environmental scanning electron microscope
EP1126503A1 (de) * 2000-02-19 2001-08-22 Leica Microsystems Wetzlar GmbH Mikroskop mit einem Elektronenstrahl zur Beleuchtung
US6448554B1 (en) * 1998-06-01 2002-09-10 The Institute Of Physical And Chemical Research (Riken) Ion scattering spectrometer
EP1722394A2 (en) * 2005-05-09 2006-11-15 Lee, Bing-Huan Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation
US20090205947A1 (en) * 2005-02-10 2009-08-20 John Barkanic Method for the reduction of malodorous compounds
ITMI20100120A1 (it) * 2010-01-28 2011-07-29 Armani Nicola Metodo e apparecchiatura per il trasporto di fasci di elettroni
CN109074888A (zh) * 2016-04-18 2018-12-21 日立造船株式会社 喷嘴式电子射线照射装置和电子射线杀菌设备
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US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
US5103102A (en) * 1989-02-24 1992-04-07 Micrion Corporation Localized vacuum apparatus and method

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US3725633A (en) * 1971-01-08 1973-04-03 Westinghouse Electric Corp Corpuscular beam in the atmosphere
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US6448554B1 (en) * 1998-06-01 2002-09-10 The Institute Of Physical And Chemical Research (Riken) Ion scattering spectrometer
EP1126503A1 (de) * 2000-02-19 2001-08-22 Leica Microsystems Wetzlar GmbH Mikroskop mit einem Elektronenstrahl zur Beleuchtung
US20090205947A1 (en) * 2005-02-10 2009-08-20 John Barkanic Method for the reduction of malodorous compounds
EP1722394A2 (en) * 2005-05-09 2006-11-15 Lee, Bing-Huan Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation
EP1722394A3 (en) * 2005-05-09 2008-02-13 Contrel Technology Co., Ltd. Method of operating liquid in the vacuum or low-pressure environment and observing the operation and device for the operation and observation
ITMI20100120A1 (it) * 2010-01-28 2011-07-29 Armani Nicola Metodo e apparecchiatura per il trasporto di fasci di elettroni
CN109074888A (zh) * 2016-04-18 2018-12-21 日立造船株式会社 喷嘴式电子射线照射装置和电子射线杀菌设备
EP3447772A4 (en) * 2016-04-18 2019-11-20 Hitachi Zosen Corporation NOZZLE-TYPE ELECTRON BEAM IRRADIATION DEVICE, AND EQUIPMENT EQUIPPED WITH ELECTRON BEAM STERILIZATION EQUIPMENT
US10568980B2 (en) 2016-04-18 2020-02-25 Hitachi Zosen Corporation Nozzle-type electron beam irradiation device, and electron beam sterilization equipment equipped with same
CN109074888B (zh) * 2016-04-18 2022-05-10 日立造船株式会社 喷嘴式电子射线照射装置和电子射线杀菌设备
WO2022175000A1 (en) * 2021-02-17 2022-08-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus
US11469072B2 (en) 2021-02-17 2022-10-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus
CN116897408A (zh) * 2021-02-17 2023-10-17 Ict半导体集成电路测试有限公司 带电粒子束设备、扫描电子显微镜和操作带电粒子束设备的方法

Also Published As

Publication number Publication date
NL109549C (ja)
GB777426A (en) 1957-06-19
CH332987A (de) 1958-09-30
FR1090183A (fr) 1955-03-28
GB777427A (en) 1957-06-19
DE971610C (de) 1959-02-26
GB777428A (en) 1957-06-19

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