US2800441A - Electrodeposition of nickel - Google Patents

Electrodeposition of nickel Download PDF

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Publication number
US2800441A
US2800441A US538528A US53852855A US2800441A US 2800441 A US2800441 A US 2800441A US 538528 A US538528 A US 538528A US 53852855 A US53852855 A US 53852855A US 2800441 A US2800441 A US 2800441A
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United States
Prior art keywords
nickel
acid
liter
bath
group
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Expired - Lifetime
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US538528A
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English (en)
Inventor
Brown Henry
Richard J Clauss
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Udylite Research Corp
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Udylite Research Corp
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Priority to US538528A priority Critical patent/US2800441A/en
Priority to DEU4037A priority patent/DE1042337B/de
Priority to FR1171291D priority patent/FR1171291A/fr
Application granted granted Critical
Publication of US2800441A publication Critical patent/US2800441A/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16Acetylenic compounds

Definitions

  • This invention relates to the electrodeposition of ductile, fine-grained, bright nickel from aqueous acidic nickel baths.
  • This object can be accomplished by the use in Watts type nickel baths or modifications thereof, of certain soluble unsaturated organic compounds exemplified in Table I, together with one or more of the organic sulfonompounds exemplified in Table II.
  • the unsaturated compounds of Table I consist of alkynoxy alkane carboxylic acids especially alkynoxy acetic, propionic, succinic, and propane tricarboxylic acids containing a total of from five to fifteen carbon atoms.
  • the unsaturation of these compounds is due to the triple bonded carbon to carbon linkage (CEC), and the unsaturated linkage is separated from the carboxyl group by two to four inclusive carbon atoms and one intervening or intermediate oxygen atom linkage.
  • CEC triple bonded carbon to carbon linkage
  • the compounds of Table I can be characterized by the following grouping (A):
  • R H, CH3, COOH, or CI-IzCOOH
  • the carboxylic group is in alpha position to the triple bond, that is, directly connected to the triple bonded carbon to carbon linkage, as in propiolic acid HCEC--CO0H or in acetylene dicarboxylic acid HOOCEC-CCOOH brightening only over a narrow current density range is obtained, and the low current density plate is dull and dark, and of poor ductility, when used in conjunction with the organic sulfon-compounds of Table II. This is where similar to a certain extent to the results with acrylic acid,
  • the compound N o( CHlC 0 on is an excellent brightener
  • the compound OOOH is a poor brightener, when used in conjunction with the organic sulfon-compounds of Table II.
  • the unsaturated compounds of Table I carrying the CEC bond with a carboxyl group separated from the triple bond by two to four carbon atoms and an in termediate or intervening oxygen atom when used in conjunction with the compounds of Table II, not only make possible very bright ductile plate over a very wide current density range, but also are not very critical to causing misplating or dark plate in the low current density areas (recesses of articles).
  • the preferred alkane carboxylic acid groupings in the alkynoxy alkane carboxylic compounds of this invention are those with CH2 or -CH3 radical per carboxylic group such as in acetic acid (-CHzCOOH), succinic acid and propane tricarboxylic From the standpoint of low price and efiicacy in the baths the preferred compounds are the alkynoxy acetic acids such as Z-butynoxy-l, 4-diacetic acid, and 2-propynoxy-l-acetic acid.
  • Alkynoxy alkane carboxylic acids in which the alkane group is greater than propane, as for example in butyric, valeric, and caprylic, etc. acids, are of limited solubility in the baths and also are of an oily or fatty nature and are not as desirable to use.
  • the unsaturated compounds of Table I give especially high brilliance and ductility when used in conjunction with about 0.1 to 1 gram per liter of allyl sulfonic acid, and a second organic sulfon-compound selected from benzene sulfonic acids, benzene sulfonamides and benzene sulfonimides or mixtures, the latter organic sulfoncompounds in a concentration of about 0.1 to 6 grams per liter.
  • the compounds of Table I can be used as the free acids gas pitting of the cathode without the use of surface active agents, and besides it greatly improves the brilliance of the plate, with and without air agitation.
  • the faster the agitation of the solution or of the cathode the less the concentration of the compounds of Table I that need to be employed to obtain high brilliance, also the brighter the plate at a given ductility.
  • the concentration of the compounds of Table I that need to be used to obtain bright plate at rapid rates of solution agitation may be used in various combinations in baths of the general type illustrated below by employing the concentrations indicated in Tables I and II.
  • the cathode current densities to be used in the following examples average from about 10 to 200 amps./ sq. ft. depending mainly on the temperature, degree of solution agitation, and the composition of the bath. Higher temperatures and higher degrees of agitation permit higher current densities to be employed satisfactorily.
  • ButynoXy-1,4-diacetic acid HOOC-CH2OCH2-CEC-CH2OCH2COOH
  • Butyne-1,4-disulfonic acid HO3SCH2CEC-CH2-SO3H
  • o-Benzoyl sulfimide at 0.1 to 2 g./l.
  • Example 6 g./l. NiSO4.6H2O 25-300 NiCl2.6H2O 225-30 HsBOs 30-45 Propynoxy acetic acid (HCECCH20CH2COOH) at 0.005 to 0.12 g./l.
  • o-Sulfobenzaldehyde forrnyl benzene sulfonic acid
  • nickel baths made up predominantly of nickel sulfate and nickel chloride, or mixtures of these salts
  • nickel fluoborate and nickel sulfamate may be used in whole or in part.
  • boric acid other butters such as nickel formate, succinate, citrate, etc., may be used, though in general boric acid is the preferred bufier as it allows the best leveling action.
  • the best pH values for the baths are about 2.5 to 5.0, though pH'values from 2 to 6 at least, may be used.
  • the bath temperatures may be from room to boiling, though in general the most convenient temperatures of operation are from about F. to F. Ammonium ions make the plate less ductile, but sodium, lithium, potassium or magnesium ions are not nearly as critical.
  • the bromide ion may be present in high concentrations, but not the iodide ion as the latter in excessive concentration may cause a loss of cathode efficiency (from the free iodine formed by anodic oxidation of the iodide ion).
  • Ferrous salts or cobalt salts or mixtures up to at least a concentration of forty grams per liter as sulphates, chlorides of fiuoborates may be present in the nickel bath, and yield nickel alloy plates containing as low as about sixty percent nickel and still the plate obtained is bright and ductile.
  • a bath for electrodepositing bright nickel comprising an aqueous acidic solution of at least one nickel salt selected from the group consisting of nickel sulfate, nickel chloride, nickel fiuoborate and nickel sulfamate, said bath also containing dissolved therein about 0.005 to about 2 grams/liter of at least one alkynoxy alkane carboxylic acid having a total of 5 to 15 carbon atoms in which the unsaturated triple bonded carbon to carbon linkage is separated from the carboxyl group by 2 to 4 inclusive in which R is selected from the group consisting of hydrogen, methyl, carboxyl and carboxymethyl radicals, R is selected from the group consisting of hydrogen and methyl radicals,Rz'is selected from the group consisting of hydrogen, methyl and ethyl radicals, and n is not greater than 1 and in conjunction therewith about 0.1 gram/ liter to saturation of at least one brightener selected from the group consisting of benzene, diphenyl and naphthalene sulfonic
  • a bath for electrodepositing bright nickel comprising an aqueous acidic solution of at least one nickel salt selected from the group consisting of nickel sulfate, nickel chloride, nickel fluoborate and nickel sulfamate, said bath also containing dissolved therein 2-butynoxy-1,- 4-diacetic acid (HOOC-CH2OCH2 -CEC-CHz- O-CH2COOH) in a concentration of 0.01 to 0.6 grams/liter, and inconjunction therewith about 0.1 gram/ liter to saturation of at least one brightener selected from the group consisting of benzene, diphenyl and naphthalene sulfonic acids, benzene sulfonamides and sulfonimides and di-benzene sulfonamides and sulfonimides and the halogenic, methyl, aldehydo (formyl) derivatives of said sulfonic acids, sulfonamides and sulf
  • a bath for electrodepositing bright nickel comprising an aqueous acidic solution of at least one nickel salt selected from the group consisting of nickel sulfate, nickel chloride, nickel fluoborate and nickel sulfamate, said bath also containing dissolved therein 2-propynoxyl-acetic acid (HCECCH2OCH2COOH) in a concentration of 0.005 to 0.15 grams/liter, and in conjunction therewith about 0.1 gram/liter to saturation of at least one brightener selected from the group consisting of benzene, diphenyl and naphthalene sulfonic acids, benzene sulfonamides and sulfonimides and dibenzene sulfonamides and sulfonimides and the halogenic, methyl, aldehydo (formyl) derivatives of said sulfonic acids, sulfonamides and sulfonimides, and beta unsaturated alkene sulfonic acids having 4
  • a method for electrodepositing bright nickel which comprises the steps of electrolyzing an aqueous acidic solution of at least one nickel salt selected from the group consisting of nickel sulfate, nickel chloride, nickel fluoborate and nickel sulfamate, said bath also containing dissolved therein about 0.005 to about 2 grams/liter of at least one alkynoxy alkane carboxylic acid having a total of 5 to 15 carbon atoms in which the unsaturated triple bonded carbon to carbon linkage is separated from the carboxyl group by 2 to 4 inclusive carbon atoms and 1 intermediate oxygen atom, and containing the grouping,
  • R is selected from the group consisting of-hydrogen, methyl, carboxyl and carboxymethyl radicals
  • R1 is selected.,fro'm' the group consisting of hydrogen and methyl radicals
  • R2 is selected from the group consisting of hydrogen, methyl and ethyl radicals
  • n is not greater than 1 and in conjunction therewith about 0.1 gram/liter to.
  • a method in accordance with claim 4 wherein said carboxylic acid is 2-butynoxy-l,4-diacetic acid (HOOC. CH2OCH2CECCH2OCH2COOH) and is present in a concentration of 0.04-l.5 gram/liter.
  • HOOC. CH2OCH2CECCH2OCH2COOH 2-butynoxy-l,4-diacetic acid
  • carboxylic acid is 2-propynoxy-1-acetic acid (HCEC CHzOCHzCOOH) and is present in a concentration of 0.005 to 0.15 gram/liter.
  • carboxylic acid is propynoxy propionic acid (HCEC- CH2OCzI-I4COOH) and is present in a concentration of 000540.15, gram/liter.
  • carboxylic acid is 1,l-dimethyl-2-propynoxy-l-acetic acid (HCEC'C(CH3)2OCH2COOH) and is present in a concentration of 0.01 to 0.2 gram/liter.
  • HECC(CH3)2 OCHZCOOH 1,1-dimethyl-Z-propynoxy-l-acetic acid
  • 2-butynoxy-1,4-diacetic acid HOOC-CH2OCH2C:: CCH2OCH2COOH

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
US538528A 1955-10-04 1955-10-04 Electrodeposition of nickel Expired - Lifetime US2800441A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US538528A US2800441A (en) 1955-10-04 1955-10-04 Electrodeposition of nickel
DEU4037A DE1042337B (de) 1955-10-04 1956-07-27 Bad und Verfahren zur galvanischen Abscheidung hochglaenzender Nickelueberzuege
FR1171291D FR1171291A (fr) 1955-10-04 1956-09-26 Procédé perfectionné de dépôt électrolytique du nickel

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3206383A (en) * 1964-03-26 1965-09-14 Kappel Mario Electrolyte for use in the galvanic deposition of bright leveling nickel coatings
US3502550A (en) * 1965-11-01 1970-03-24 M & T Chemicals Inc Nickel electroplating electrolyte
FR2070793A1 (fr) * 1969-12-10 1971-09-17 M & T Chemicals Inc
WO2015147321A1 (fr) * 2014-03-28 2015-10-01 宇部興産株式会社 Électrolyte pour dispositif électrochimique, solution électrolytique et dispositif électrochimique

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL271581A (fr) * 1960-11-22
DE1221873B (de) * 1961-07-08 1966-07-28 Dehydag Gmbh Galvanische Nickelbaeder

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2712522A (en) * 1953-03-24 1955-07-05 Hanson Van Winkle Munning Co Bright nickel plating

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE505242A (fr) * 1950-08-16
IT498690A (fr) * 1950-09-27
DE925560C (de) * 1952-12-12 1955-03-24 W Kampschulte & Cie Dr Verfahren zur elektrolytischen Abscheidung glaenzender Metallniederschlaege
DE934320C (de) * 1953-03-29 1955-10-20 W Kampschulte & Cie Dr Verfahren zur elektrolytischen Herstellung hochglaenzender Nickelueberzuege

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2712522A (en) * 1953-03-24 1955-07-05 Hanson Van Winkle Munning Co Bright nickel plating

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3206383A (en) * 1964-03-26 1965-09-14 Kappel Mario Electrolyte for use in the galvanic deposition of bright leveling nickel coatings
US3502550A (en) * 1965-11-01 1970-03-24 M & T Chemicals Inc Nickel electroplating electrolyte
FR2070793A1 (fr) * 1969-12-10 1971-09-17 M & T Chemicals Inc
WO2015147321A1 (fr) * 2014-03-28 2015-10-01 宇部興産株式会社 Électrolyte pour dispositif électrochimique, solution électrolytique et dispositif électrochimique
JPWO2015147321A1 (ja) * 2014-03-28 2017-04-13 宇部興産株式会社 電気化学デバイス用電解質、電解液および電気化学デバイス

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Publication number Publication date
DE1042337B (de) 1958-10-30
FR1171291A (fr) 1959-01-23

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