US2782152A - Electrodeposition of nickel - Google Patents
Electrodeposition of nickel Download PDFInfo
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- US2782152A US2782152A US410712A US41071254A US2782152A US 2782152 A US2782152 A US 2782152A US 410712 A US410712 A US 410712A US 41071254 A US41071254 A US 41071254A US 2782152 A US2782152 A US 2782152A
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- nickel
- per liter
- coumarin
- concentration
- electrodeposition
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical group [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 19
- 238000004070 electrodeposition Methods 0.000 title claims description 6
- 229910052759 nickel Inorganic materials 0.000 title description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 8
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 5
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 5
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 5
- 229910001453 nickel ion Inorganic materials 0.000 claims description 4
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 4
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 3
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 19
- 239000000243 solution Substances 0.000 description 13
- 229960000956 coumarin Drugs 0.000 description 11
- -1 Pentamethyl triamino triphenyl methane acetate Chemical compound 0.000 description 10
- 235000001671 coumarin Nutrition 0.000 description 10
- 238000009499 grossing Methods 0.000 description 6
- 229940124530 sulfonamide Drugs 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 150000004775 coumarins Chemical class 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical class C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 3
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 3
- OGKAGKFVPCOHQW-UHFFFAOYSA-L nickel sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O OGKAGKFVPCOHQW-UHFFFAOYSA-L 0.000 description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 235000019204 saccharin Nutrition 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 2
- AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002659 electrodeposit Substances 0.000 description 2
- 150000003456 sulfonamides Chemical class 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 description 1
- ZUAURMBNZUCEAF-UHFFFAOYSA-N 2-(2-phenoxyethoxy)ethanol Chemical compound OCCOCCOC1=CC=CC=C1 ZUAURMBNZUCEAF-UHFFFAOYSA-N 0.000 description 1
- XGBDLEXVEKHYBY-UHFFFAOYSA-N 4-benzhydrylbenzene-1,2,3-triamine Chemical class NC1=C(C(=C(C=C1)C(C1=CC=CC=C1)C1=CC=CC=C1)N)N XGBDLEXVEKHYBY-UHFFFAOYSA-N 0.000 description 1
- USQCUKQZXOWUDF-YWZLYKJASA-N 6-chloro-n-[(3s)-1-[(2s)-1-(4-methyl-5-oxo-1,4-diazepan-1-yl)-1-oxopropan-2-yl]-2-oxopyrrolidin-3-yl]naphthalene-2-sulfonamide Chemical compound O=C([C@@H](N1C([C@@H](NS(=O)(=O)C=2C=C3C=CC(Cl)=CC3=CC=2)CC1)=O)C)N1CCN(C)C(=O)CC1 USQCUKQZXOWUDF-YWZLYKJASA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- DGUVYSKQPBATBX-UHFFFAOYSA-N benzylbenzene;hydrochloride Chemical compound Cl.C=1C=CC=CC=1CC1=CC=CC=C1 DGUVYSKQPBATBX-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- CZZYITDELCSZES-UHFFFAOYSA-N diphenylmethane Chemical compound C=1C=CC=CC=1CC1=CC=CC=C1 CZZYITDELCSZES-UHFFFAOYSA-N 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical class C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- JFTBTTPUYRGXDG-UHFFFAOYSA-N methyl violet Chemical compound Cl.C1=CC(=NC)C=CC1=C(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 JFTBTTPUYRGXDG-UHFFFAOYSA-N 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000000979 retarding effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- This invention relates to electrodeposition of nickel and more specifically to a process for producing electrodeposits of greatly lncreased brightness and smoothness, as taken from the plating solution, without bufling or polishingof United States Patent 2,782,152 Patented Feb. 19, 1957 amide, but also one or more of'certain organic, leveling addition agents of the following class:
- the central carbon- may carry one OH group increase their brightness by the use of addition agents of the type of saccharin or naphthalene sulfonic acids result in improved brightness with loss of smoothness when the surface being coated is quite smooth, and can result in decrease in both smoothness and brightness when the surface to be coated is quite rough.
- the preferred acid nickel solution in connection with which the invention may be realized is an aqueous solution containing nickel sulfate equivalent to from to 400 grams per liter of nickel sulfate heptahydrate, nickel chloride equivalent to from 10 to 75 grams per liter of nickel chloride hexahydrate, and from 10 to 50 grams per liter, preferably 15 to 40 grams per liter, of boric acid or other buffer such as formic acidforcitric acid.
- one or more aromatic sulfonamides to a concentration from /2 gram per liter to saturation, one or more coumarin compounds to a concentration, from.,0.01 to0.5 gram per liter, and one or more leveling agents of the above indicated class in concentrations less than half a gram per liter, for example, from'0.0005 to 0.3 gram per liter.
- concentrations .of these. compounds required for best results will be with-. in the ranges indicatedv in the respective tablesv opposite each of said compounds, and very desirably will be'approximately the specific concentration set forth opposite each compound in the tables.
- the compounds listed in Table I are examples of sulfur compounds which when used in connection with coumarin and certain coumarin derivativesproduce an increase in brightness with some loss in smoothness. Numerous other similar compounds produce the same effect in varying degree. They are aromatic sulfonamides and sulfimides.
- the compounds of Table II are examples of coumarin compounds which can be used. -Alkyl and acyl derivatives of-coumarin having 1 to 4 carbon atoms, and the chlorine and carboxy derivatives thereof are suitable. The comchloride pounds effective to increase smoothing power (and bright- 'ness) of coumarin type smoothing agents lost by the addition of sulfur compounds of the type of those listed in Table I. .Coumarin sulfonic acids are not equivalent to the above indicated coumarin compounds.
- the solutions are operated in pH range from 2.5 to 4.5, the temperature is maintained within the range from F. to F., and the cathode current density is maintained within the range from 5 to 100 a. s. f.
- Formaldehyde may be used in the above described solutions at a concentration of from 0.05 to 0.5 gram per liter for the purpose of retarding or minimizing the effect of breakdown products of coumarin or derivative such as listed in Table II.
- nickel ions for electrodeposition may be employed.
- the nickel ion concentration should in any case be within the range which would result from the presence of from 100 to 400 grams per liter of NiSO4.7H2O.
- a solution for electrodeposition of nickel in the form of bright and smooth deposits said solution containing a nickel ion yielding compound of the class consisting of nickel sulfate, nickel chloride, nickel sulfamate and nickel fluoborate together with cooperating addition agents, one of said addition agents being an organic sulfur compound containing the group one thereof being selected from the class consisting of conmarin and its alkyl, aeyl, chlorine and carboxy derivatives and a third thereof being an aminopolyaryl methane compound having six nuclear carbon atoms in each aryl group said first mentioned addition agent being present in concentration from one-half gram per liter to saturation, said second mentioned addition agent being present in concentration from 0.01 to 0.5 gram per liter and said third mentioned addition agent being present in concentration from 0.0005 to 0.3 gram per liter.
- a process for producing bright, smooth electrodeposits of nickel comprising electrolyzing between an anode and a cathode a solution containing nickel sulfate equivalent to from 100 to 400 grams per liter of nickel sulfate heptahydrate, nickel chloride equivalent to from 10 to 75 grams per liter of nickel chloride hexahydrate and a group of three cooperating addition agents, one of said addition agents being an organic sulfur compound containing the group one thereof being selected from the class consisting of coumarin and its alkyl, acyl, chlorine and carboxy derivatives and a third thereof being an aminopolyaryl methane compound having six nuclear carbon atoms in each aryl group said first mentioned addition agent being present in concentration from one-half gram per liter to saturation, said second mentioned addition agent being present in concentration from 0.01 to 0.5 gram per liter and said third mentioned addition agent being present in concentration from 0.0005 to 0.3 gram per liter.
- aminopolyaryl methane compound is a triaminotolyl diphenyl methane.
- aminopolyaryl methane compound is a tniamino tolyl diphenyl methane and said aromatic sulfur compound is bidibenzene sulfonamide.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
I 2,782,152 ELECTRODEPOSITION F NICKEL Arthur H. Du Rose, Euclid, and John D. Little, Bay Village, Ohio, assignors to The Harshaw Chemical Company, Cleveland, Ohio, a corporation of Ohio No Drawing. Application February 16, 1954, Serial No. 410,712
7 Claims. (Cl. 204-49) This invention relates to electrodeposition of nickel and more specifically to a process for producing electrodeposits of greatly lncreased brightness and smoothness, as taken from the plating solution, without bufling or polishingof United States Patent 2,782,152 Patented Feb. 19, 1957 amide, but also one or more of'certain organic, leveling addition agents of the following class:
- carbon. The central carbon-may carry one OH group increase their brightness by the use of addition agents of the type of saccharin or naphthalene sulfonic acids result in improved brightness with loss of smoothness when the surface being coated is quite smooth, and can result in decrease in both smoothness and brightness when the surface to be coated is quite rough. 'It was found, for example, that when an aqueous, acid solution containing 240 grams per liter of nickel sulfate heptahydrate, 40 grams per liter of nickel chloride hexahydrate and 40 grams per liter of boric acid was utilized and coumarin was used in concentration of 0.25 gram per liter as the sole crease in smoothness is remarkable, and thispr'operty of coumarin has formed the basis of a commercial semibright solution now being widely used. When the attempt was made to increase the brightness by the addition of agents such as saccharin or naphthalene sulfonicacids, 1
it was found that increased brightness was secured, but at thecost of a part of the smoothing action of the coumarin. For example, it was found that when the above described solution was varied by adding 3.5 grams per liter of naphthalene disulfonic acid an increase in brightness was secured, but the gain in smoothness over the base metal was only 2.2 microinches, the same type of base metal being used. If, instead of using naphthalene sulfonic acids, saccharin was used to improve the brightness, improved brightness was obtained and the gain in a smoothness was about the same. Many other sulfonic acidsand-sulfonamides show similar results. Whenthe surface to be coated is not so smooth, e. g. 20't'o-29 R. M. S. as shown by the Brush surface analyzer, the loss of the smoothing action may be so great as to overshadow the tendency toward increased brightness and actually appear to decrease the luster of the deposit.
In accordance with the present invention it has now been discovered that a large portion of the lost smoothing action just described can be restored if there is added, in addition to the coumarin, not only an aromatic sulfonand may be connected by a double bond to one of the rings as in'the dyes.
' As examples may be mentioned,
(a) Triamino triphenyl methanes, (H2NCsH4)aCH (b) Diaminodiphenyl methanes, (HzNCsH4)2CH2 (c) Triaminotolyl phenyl carbitol hydrochloride (d) Triaminotolyl diphenyl methane hydrochloride (reduction product of Fuchsin) (e) Pentamethyl triamino triphenyl methane acetate (reduction product of methyl violet) (f) Hexamethyl -p.p'-diaminofuchsonimonium (Crystal Violet).
While these leveling agents do not completely restore the full smoothing action of coumarin, they .do, in some instances, approach that result, and in other instances restore a large portion of it. p
The preferred acid nickel solution in connection with which the invention may be realized is an aqueous solution containing nickel sulfate equivalent to from to 400 grams per liter of nickel sulfate heptahydrate, nickel chloride equivalent to from 10 to 75 grams per liter of nickel chloride hexahydrate, and from 10 to 50 grams per liter, preferably 15 to 40 grams per liter, of boric acid or other buffer such as formic acidforcitric acid. To this fundamental solution there may be added in accordance with the present invention one or more aromatic sulfonamides to a concentration from /2 gram per liter to saturation, one or more coumarin compounds to a concentration, from.,0.01 to0.5 gram per liter, and one or more leveling agents of the above indicated class in concentrations less than half a gram per liter, for example, from'0.0005 to 0.3 gram per liter. The concentrations .of these. compounds required for best results will be with-. in the ranges indicatedv in the respective tablesv opposite each of said compounds, and very desirably will be'approximately the specific concentration set forth opposite each compound in the tables. H
The compounds listed in Table I are examples of sulfur compounds which when used in connection with coumarin and certain coumarin derivativesproduce an increase in brightness with some loss in smoothness. Numerous other similar compounds produce the same effect in varying degree. They are aromatic sulfonamides and sulfimides. The compounds of Table II are examples of coumarin compounds which can be used. -Alkyl and acyl derivatives of-coumarin having 1 to 4 carbon atoms, and the chlorine and carboxy derivatives thereof are suitable. The comchloride pounds effective to increase smoothing power (and bright- 'ness) of coumarin type smoothing agents lost by the addition of sulfur compounds of the type of those listed in Table I. .Coumarin sulfonic acids are not equivalent to the above indicated coumarin compounds.
Preferably, the solutions are operated in pH range from 2.5 to 4.5, the temperature is maintained within the range from F. to F., and the cathode current density is maintained within the range from 5 to 100 a. s. f.
Formaldehyde may be used in the above described solutions at a concentration of from 0.05 to 0.5 gram per liter for the purpose of retarding or minimizing the effect of breakdown products of coumarin or derivative such as listed in Table II.
Specific examples which have yielded excellent results are indicated in Table IV.
Other basic solutions capable of yielding nickel ions for electrodeposition may be employed. Preferably there should be present in the solution at least one nickel salt of the class consisting of nickel sulfate, nickel chloride, nickel fluoborate and nickel sulfamate. The nickel ion concentration should in any case be within the range which would result from the presence of from 100 to 400 grams per liter of NiSO4.7H2O.
Table I Optimum Preferred Range, Concentra g./l. tion, g./l.
(1) Benzene sullonamide (PhSOQNHE) 0.5 to 3.0 1. (2) p-Toluenesulfonamide (OHgCrHiSOgNHz). 0.5 to 3.0 l. 0 (3) Sacchnrin (o-benzosulfimid) 0.5 to 3.0 1. 0 (4) Dibenzene snlt'onamide (PhSO NHSOrPh) and its 1110110- and di-chioro derivatives 0.5 to 5.0 1.0 (5) p-Benzene-bis (N-sulphonylbenzenesnlfonamide (PhS()zNHSOaCeIEIrSOzNHSOzPll). v 0.5 to 6.0 1. 0 (6) N-ethene sulfonyl benzene sulfonamide.. 0.5 to 5.0 l. 0 E7) Monoand di-chlorobenzene syllonamides. 0.5 to 5.0 1. 0
8) Monoand di-chloro derivatives of (2) and (5) above 0.5 to 5.0 1. 0 (9) Bi-dibenzenesulionamide (PllSOzNHSQz- 0.5 to 5.0 1.0 CQH4C5H4SOZNHSO2PII 0.5 1.0 5.0 l. 0 (10) Monoand di-chloro derivatives of (9) above 0.5 to 5.0 1.0 (11) Dibenzcne snlfonamide ether (Phi-102- NHSO CALOOglEIrSOnNHSOzPh) 0.5 to 5.0 1. 0
Table II Preferred Range, g./l. Concentration, -I
0. 05 to 0.25 0. l. 0. 05 to 0.25 0. 1 0.05 to 0.25 0. 1 0.05 to 0.25 0.1 (i-earboxy coumarin 0.05 to 0.25 0.1
Table III Preferred Range, g./l. Concentration, g./l.
(HQNCQHQQCOH 002 to 01 005 (3) Fuchsin dye (HzNC Hi)zC-=C6H NHg .002 to .01 .005 (4) Trlamino tolyl phenyl Cnrbltol hydrochloride .002 to .01 .005 (5) 'lrinmino tolyl diphcnyhuethane hydrochloride .002 to .01 .005 (0) Pentamethyl triamino trlphenyl methnne acetate .002 to .01 .005 (7) Hexamethyl-p.p'-dlamino iuohsonimonium chloride .002 to .01 .005
Table IV Grams per Liter 300 300 300 300 45 45 45 45 40 40 40 40 0.2 0.06 1n 0. l 0. 1 0. 1 0. 1 Toluene sulionamide 1.0 Bl-dibenzeue sultonnmlde 1. 0 1. 0 Trlamino-triphenyl methane 0.005 0.0075 0.005 0.0075
Having thus described the invention, what is claimed is:
l. A solution for electrodeposition of nickel in the form of bright and smooth deposits, said solution containing a nickel ion yielding compound of the class consisting of nickel sulfate, nickel chloride, nickel sulfamate and nickel fluoborate together with cooperating addition agents, one of said addition agents being an organic sulfur compound containing the group one thereof being selected from the class consisting of conmarin and its alkyl, aeyl, chlorine and carboxy derivatives and a third thereof being an aminopolyaryl methane compound having six nuclear carbon atoms in each aryl group said first mentioned addition agent being present in concentration from one-half gram per liter to saturation, said second mentioned addition agent being present in concentration from 0.01 to 0.5 gram per liter and said third mentioned addition agent being present in concentration from 0.0005 to 0.3 gram per liter.
2. A process for producing bright, smooth electrodeposits of nickel comprising electrolyzing between an anode and a cathode a solution containing nickel sulfate equivalent to from 100 to 400 grams per liter of nickel sulfate heptahydrate, nickel chloride equivalent to from 10 to 75 grams per liter of nickel chloride hexahydrate and a group of three cooperating addition agents, one of said addition agents being an organic sulfur compound containing the group one thereof being selected from the class consisting of coumarin and its alkyl, acyl, chlorine and carboxy derivatives and a third thereof being an aminopolyaryl methane compound having six nuclear carbon atoms in each aryl group said first mentioned addition agent being present in concentration from one-half gram per liter to saturation, said second mentioned addition agent being present in concentration from 0.01 to 0.5 gram per liter and said third mentioned addition agent being present in concentration from 0.0005 to 0.3 gram per liter.
3. A process according to claim 2 wherein said solution contains from 10 to 50 grams per liter of boric acid.
4. The invention a defined in claim 2 wherein said aminopolyaryl methane compound is a triaminotolyl diphenyl methane.
5. The invention defined in claim 2 wherein said organic sulfur compound is bidibenzene sulfonamide,
6. The invention as definedin claim 2 wherein said aminopolyaryl methane compound is a tniamino tolyl diphenyl methane and said aromatic sulfur compound is bidibenzene sulfonamide.
7. The invention as defined in claim 2 wherein said third mentioned addition agent is present in concentration from 0.002 to 0.01 gram per liter.
References Cited in the file of this patent UNITED STATES PATENTS 2,198,267 Lind et a1 Apr. 23, 1940 2,635.076 Du Rose Apr. 14, 1953
Claims (1)
1. A SOLUTION FOR ELECTRODEPOSITION OF NICKEL IN THE FORM OF BRIGHT AND SMOOTH DEPOSITS, SAID SOLUTION CONTAINING A NICKEL ION YIELDING COMPOUND OF THE CLASS CONSISTING OF NICKEL SULFATE, NICKEL CHLORIDE, NICKEL SULFAMATE AND NICKEL FLUOBORATE TOGETHER WITH COOPERATING ADDITION AGENTS, ONE OF SAID ADDITION AGENTS BEING AN ORGANIC SULFUR COMPOUND CONTAINING THE GROUP
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US410712A US2782152A (en) | 1954-02-16 | 1954-02-16 | Electrodeposition of nickel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US410712A US2782152A (en) | 1954-02-16 | 1954-02-16 | Electrodeposition of nickel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US2782152A true US2782152A (en) | 1957-02-19 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US410712A Expired - Lifetime US2782152A (en) | 1954-02-16 | 1954-02-16 | Electrodeposition of nickel |
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| Country | Link |
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| US (1) | US2782152A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2986501A (en) * | 1959-07-27 | 1961-05-30 | Mcgean Chem Co Inc | Electrodeposition of nickel |
| US3041254A (en) * | 1959-01-30 | 1962-06-26 | Nat Alloys Ltd | Nickel plating |
| US3488264A (en) * | 1965-03-26 | 1970-01-06 | Kewanee Oil Co | High speed electrodeposition of nickel |
| US4159926A (en) * | 1976-12-03 | 1979-07-03 | Bnf Metals Technology Centre | Nickel plating |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2198267A (en) * | 1939-12-14 | 1940-04-23 | Harshaw Chem Corp | Electrodeposition of metals |
| US2635076A (en) * | 1947-01-29 | 1953-04-14 | Harshaw Chem Corp | Bright nickel plating |
-
1954
- 1954-02-16 US US410712A patent/US2782152A/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2198267A (en) * | 1939-12-14 | 1940-04-23 | Harshaw Chem Corp | Electrodeposition of metals |
| US2635076A (en) * | 1947-01-29 | 1953-04-14 | Harshaw Chem Corp | Bright nickel plating |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3041254A (en) * | 1959-01-30 | 1962-06-26 | Nat Alloys Ltd | Nickel plating |
| US2986501A (en) * | 1959-07-27 | 1961-05-30 | Mcgean Chem Co Inc | Electrodeposition of nickel |
| US3488264A (en) * | 1965-03-26 | 1970-01-06 | Kewanee Oil Co | High speed electrodeposition of nickel |
| US4159926A (en) * | 1976-12-03 | 1979-07-03 | Bnf Metals Technology Centre | Nickel plating |
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