US2695380A - Electric current rectifier - Google Patents
Electric current rectifier Download PDFInfo
- Publication number
- US2695380A US2695380A US180100A US18010050A US2695380A US 2695380 A US2695380 A US 2695380A US 180100 A US180100 A US 180100A US 18010050 A US18010050 A US 18010050A US 2695380 A US2695380 A US 2695380A
- Authority
- US
- United States
- Prior art keywords
- layer
- electric current
- titanium dioxide
- rectifier
- semi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 36
- 239000010410 layer Substances 0.000 claims description 23
- 239000004408 titanium dioxide Substances 0.000 claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 6
- 230000004888 barrier function Effects 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- 239000002344 surface layer Substances 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 229910044991 metal oxide Inorganic materials 0.000 description 6
- 150000004706 metal oxides Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
- 230000007306 turnover Effects 0.000 description 2
- 239000001828 Gelatine Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000001117 sulphuric acid Substances 0.000 description 1
- LPHBARMWKLYWRA-UHFFFAOYSA-N thallium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Tl+3].[Tl+3] LPHBARMWKLYWRA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- -1 titanium dioxide Chemical class 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/46—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/428
- H01L21/479—Application of electric currents or fields, e.g. for electroforming
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/24—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only semiconductor materials not provided for in groups H01L29/16, H01L29/18, H01L29/20, H01L29/22
Definitions
- This invention relates to electric current rectifiers, and more particularly to such rectifiers utillsing the semiconducting properties of a metal oxide and allied materials containing appreciable quantities of a metal oxide.
- the materials to be used in rectifiers according to the present invention owe their semi-conducting properties to a deficiency of oxygen from the stoichiometric proportions, usually too minute to be detected by chemical analysis.
- an electric current rectifier comprises a semi-conductor layer and a counterelectrode and a barrier layer therebetween in which the semi-conductor layer and the barrier layer comprise a metal oxide and in which the semi-conductor layer is deficient in oxygen in comparison with the barrier layer.
- Another feature of the invention comprises the method of manufacture of an electric current rectifier which comprises reducing the oxygen content of a layer of metal oxide, restoring oxygen to a thin surface layer thereof and applying a counter-electrode to said thin surface layer.
- a further feature of the invention comprises the method of manufacture of an electric current rectifier which comprises reducing the oxygen content of a layer of titanium dioxide and depositing thereon titanium dioxide by the decomposition of a compound containing titanium and oxygen and applying a counter-electrode to the deposited layer.
- a semi-conductor layer 1 comprising metal oxide such as titanium dioxide, rendered deficient in oxygen in a manner to be later explained, has on one of its surfaces a relatively thin layer 2, comprising metal oxide such as titanium dioxide to which oxygen has been added to overcome any deficiency which might have existed therein.
- the surface of the layer 2 remote from the layer 1 has thereon a counterelectrode layer 3 which may conveniently comprise a silver paste.
- a pressed and sintered body of titanium dioxide is formed in the shape of a disc, by making up titanium dioxide in powder form into a paste with water to which has been added some gelatine or glue. The paste is then pressed into the disc form to a density of about 3.5. The disc is then dried, prefired in air to about 1050 C. for about 1 /2 hours. A final firing at about 1300" C. is given in hydrogen for 2,695,380 Patented Nov. 23, 1954 "ice about 1 hour. The disc is then allowed to cool in the furnace in a hydrogen atmosphere.
- a base electrode is applied to one face of the disc e. g. by firing a silver paste.
- the other face of the disc is then polished by known. methods and treated by means of an oxy-gas flame so that the surface attains a temperature of about 500 C.
- a counterelectrode is then applied to the treated surface.
- This counterelectrode may be pressed on lead foil, or a silver paste prepared according to specification No. 569.388 so that it can be fired at a lower temperature than 500 C., e. g. 300 C. is applied.
- Better results than either of these have, however been obtained by the use of a connterelectrode of tellurium.
- counterelectrode a typical rectifier of 0.5 cm. give the following characteristics Forward resistance 77 ohms Reverse resistance 90,000 ohms Turnover voltage 20 volts.
- the eifective area of the rectifier was of the order of l cm. and a rectifier of this character is eminently suitable for power work.
- the surface treatment of the semi-conductor can be given either before or after the application of the base electrode.
- the surface treatment may, however, be produced by other means.
- the surface may be treated by application of a chemical oxidising agent, or may be oxidised electrolytically e. g. ,by anodic treatment in sulphuric or oxalic acid.
- an electrolytic treatment it is clearly an advantage that this should be carried out after application of the base electrode.
- the surface treatment may also consist in the deposition upon the surface of a thin socalled barrier layer of another material of the same type as that of the disc but which contains a higher proportion of oxygen than the body of the disc.
- a thin socalled barrier layer of another material of the same type as that of the disc but which contains a higher proportion of oxygen than the body of the disc For example titanium dioxide de posited from titanium tetrachloride or butyl titanate may be used with a semi-conducting titanium dioxide disc.
- An electriccurrent rectifier comprising a layer of titanium dioxide in conducting condition and having a thinsurface layer-'of'titanium dioxide in non-conducting condition, a counte'relectrode on said thin surface layer and a base electrode :of silver paste on the semi-conductor layer on the surface remote fromithe barrier layer.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Thermistors And Varistors (AREA)
- Laminated Bodies (AREA)
- Insulating Bodies (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB22203/49A GB672732A (en) | 1949-08-26 | 1949-08-26 | Improvements in or relating to electric current rectifiers |
Publications (1)
Publication Number | Publication Date |
---|---|
US2695380A true US2695380A (en) | 1954-11-23 |
Family
ID=10175594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US180100A Expired - Lifetime US2695380A (en) | 1949-08-26 | 1950-08-17 | Electric current rectifier |
Country Status (6)
Country | Link |
---|---|
US (1) | US2695380A (ja) |
BE (1) | BE497748A (ja) |
CH (1) | CH311957A (ja) |
DE (1) | DE976691C (ja) |
FR (1) | FR1023735A (ja) |
GB (1) | GB672732A (ja) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2721966A (en) * | 1950-06-22 | 1955-10-25 | Westinghouse Brake & Signal | Manufacture of dry surface contact rectifiers |
US2766508A (en) * | 1952-05-22 | 1956-10-16 | Gen Electric | Blocking layer for titanium oxide rectifier |
US2820184A (en) * | 1953-03-11 | 1958-01-14 | Sylvania Electric Prod | Titanate rectifiers |
US2821490A (en) * | 1953-03-11 | 1958-01-28 | Sylvania Electric Prod | Titanate rectifiers |
US2851405A (en) * | 1953-07-03 | 1958-09-09 | Sylvania Electric Prod | Titanate rectifiers |
DE1042133B (de) * | 1955-10-09 | 1958-10-30 | Koji Yoshida | Verfahren zur Herstellung von Titanoxyd-Gleichrichtern |
US2883305A (en) * | 1950-09-27 | 1959-04-21 | Auwarter Max | Photoelectric semiconductors and method of producing same |
US2922730A (en) * | 1956-06-07 | 1960-01-26 | Feldman Charles | Method of forming thin films of barium titanate |
US2967282A (en) * | 1957-09-30 | 1961-01-03 | Gen Electric | High temperature resistor |
US2972570A (en) * | 1955-04-07 | 1961-02-21 | Eastman Kodak Co | Thin film ceramic capacitor and method of making |
US3223601A (en) * | 1959-06-26 | 1965-12-14 | Quartz & Silice S A | Process of forming dielectric materials for condensers |
US3262867A (en) * | 1962-11-28 | 1966-07-26 | Lockheed Aircraft Corp | Method for making film capacitors |
US3351500A (en) * | 1963-03-13 | 1967-11-07 | Globe Union Inc | Method of forming a transistor and varistor by reduction and diffusion |
US3365378A (en) * | 1963-12-31 | 1968-01-23 | Ibm | Method of fabricating film-forming metal capacitors |
US3507759A (en) * | 1966-09-15 | 1970-04-21 | American Cyanamid Co | Removal of conductive metal oxide from a metal oxide coated insulating substrate |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2826725A (en) * | 1953-11-10 | 1958-03-11 | Sarkes Tarzian | P-n junction rectifier |
US2796564A (en) * | 1953-12-21 | 1957-06-18 | Sylvania Electric Prod | Electric circuit element |
US3121830A (en) * | 1960-10-04 | 1964-02-18 | Lockheed Aircraft Corp | Single-crystal rutile capacitor and method of fabrication |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US879062A (en) * | 1907-04-05 | 1908-02-11 | Massachusetts Wireless Equipment Company | Rectifier and detector. |
US929582A (en) * | 1908-09-10 | 1909-07-27 | William P Mashinter | Electric-current rectifier. |
GB483088A (en) * | 1936-10-13 | 1938-04-12 | Franz Rother | Improvements in and relating to barrier plane rectifying cells and photo-electric cells |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE667780C (de) * | 1937-09-28 | 1938-11-19 | John James Kirwan | Verfahren zum Herstellen von Mundstueckbelag |
NL65452C (ja) * | 1938-10-11 | |||
GB565323A (en) * | 1943-11-22 | 1944-11-06 | Otto Kurt Kolb | Improvements relating to alternating electric current rectifiers of the selenium type |
DE946075C (de) * | 1945-03-29 | 1956-07-26 | Siemens Ag | Sperrschicht-Trockengleichrichter |
FR1271560A (ja) * | 1959-08-01 | 1962-01-19 |
-
0
- BE BE497748D patent/BE497748A/xx unknown
-
1949
- 1949-08-26 GB GB22203/49A patent/GB672732A/en not_active Expired
-
1950
- 1950-08-17 US US180100A patent/US2695380A/en not_active Expired - Lifetime
- 1950-08-24 FR FR1023735D patent/FR1023735A/fr not_active Expired
- 1950-08-25 CH CH311957D patent/CH311957A/fr unknown
-
1951
- 1951-04-01 DE DEJ3988A patent/DE976691C/de not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US879062A (en) * | 1907-04-05 | 1908-02-11 | Massachusetts Wireless Equipment Company | Rectifier and detector. |
US929582A (en) * | 1908-09-10 | 1909-07-27 | William P Mashinter | Electric-current rectifier. |
GB483088A (en) * | 1936-10-13 | 1938-04-12 | Franz Rother | Improvements in and relating to barrier plane rectifying cells and photo-electric cells |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2721966A (en) * | 1950-06-22 | 1955-10-25 | Westinghouse Brake & Signal | Manufacture of dry surface contact rectifiers |
US2883305A (en) * | 1950-09-27 | 1959-04-21 | Auwarter Max | Photoelectric semiconductors and method of producing same |
US2766508A (en) * | 1952-05-22 | 1956-10-16 | Gen Electric | Blocking layer for titanium oxide rectifier |
US2821490A (en) * | 1953-03-11 | 1958-01-28 | Sylvania Electric Prod | Titanate rectifiers |
US2820184A (en) * | 1953-03-11 | 1958-01-14 | Sylvania Electric Prod | Titanate rectifiers |
US2851405A (en) * | 1953-07-03 | 1958-09-09 | Sylvania Electric Prod | Titanate rectifiers |
US2972570A (en) * | 1955-04-07 | 1961-02-21 | Eastman Kodak Co | Thin film ceramic capacitor and method of making |
DE1042133B (de) * | 1955-10-09 | 1958-10-30 | Koji Yoshida | Verfahren zur Herstellung von Titanoxyd-Gleichrichtern |
US2922730A (en) * | 1956-06-07 | 1960-01-26 | Feldman Charles | Method of forming thin films of barium titanate |
US2967282A (en) * | 1957-09-30 | 1961-01-03 | Gen Electric | High temperature resistor |
US3223601A (en) * | 1959-06-26 | 1965-12-14 | Quartz & Silice S A | Process of forming dielectric materials for condensers |
US3262867A (en) * | 1962-11-28 | 1966-07-26 | Lockheed Aircraft Corp | Method for making film capacitors |
US3351500A (en) * | 1963-03-13 | 1967-11-07 | Globe Union Inc | Method of forming a transistor and varistor by reduction and diffusion |
US3365378A (en) * | 1963-12-31 | 1968-01-23 | Ibm | Method of fabricating film-forming metal capacitors |
US3507759A (en) * | 1966-09-15 | 1970-04-21 | American Cyanamid Co | Removal of conductive metal oxide from a metal oxide coated insulating substrate |
Also Published As
Publication number | Publication date |
---|---|
BE497748A (ja) | |
GB672732A (en) | 1952-05-28 |
CH311957A (fr) | 1955-12-15 |
DE976691C (de) | 1964-02-27 |
FR1023735A (fr) | 1953-03-23 |
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