US2436690A - Acid chloride-fluoride bath for nickel plating - Google Patents

Acid chloride-fluoride bath for nickel plating Download PDF

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Publication number
US2436690A
US2436690A US582423A US58242345A US2436690A US 2436690 A US2436690 A US 2436690A US 582423 A US582423 A US 582423A US 58242345 A US58242345 A US 58242345A US 2436690 A US2436690 A US 2436690A
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chloride
nickel
nickel plating
acid chloride
bath
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Expired - Lifetime
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US582423A
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Rose Arthur H Du
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Harshaw Chemical Co
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Harshaw Chemical Co
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

Definitions

  • This invention relates toeleotrodeposition of nickel from high chloride solutions, and more particularly a chloride-fluoride bath omittin boric acid.
  • high chloride solutions I mean those in which at least 33 of the nickel is from chloride, the remainder from sulfate.
  • Fluorides suitable for my purpose are HF, NaF, KHFz, NHiHFz, NiFz, and NiHF. These are used in quantity between 15 and 30 grams per liter in the case of NHiHFz and in the other cases the equivalent in fluorine content of 15 to 30 grams per liter of NH4IIF2.
  • Suitable bath compositions are as follows:
  • a nickel plating solution essentially consisting of water from 200 to 400 grams per liter of a source of nickel of the class consisting of (l) nickel chloride and (2) nickel chloride plus nickel sulfate, in proportion such that at least 33 of the nickel is from the chloride, HCl suiflcient to produce a pH of from 2.5 to 5, and a source of fluorine of the class consisting of NH4HF2, HF, NaF, KHFz, NiF'z, NiHE and mixtures of a plurality thereof, the total fluorine content of said source of fluorine being equivalent to from 15 to 30 grams per liter of NH4HF2.
  • a nickel plating solution essentially consisting of water, nickel chloride, HCl suflicient to produce a pH of from 2.5 to 5, and from 15 to 30 3 grams per liter of a substance of the class consisting of NH4HF2, HF, NaF, KHFz, NiFz, NiHF and mixtures of a plurality thereof.
  • a nickel plating solution essentially consisting of water, from 200 to 400 grams per liter of 5 a source of nickel of the class consisting of (1) nickel chloride and (2) nickel chloride plus nickel sulfate in proportion that at least 50% of the nickel is from the chloride, HCl in quantity sulficient to produce a pH of 2.5 to 5, and a source of fluorine of the class consisting of; NHiHFz, HF, NaF, KHFz; NiF2,.NiHF. and mixtures of a plurality thereof, the total fluorine content of said source of fluorine being equivalent to from 15 to 30 grams per liter of NH4HF2.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Description

Patented Feb. 24, 1948 ACID CHLORIDE-FLUORIDE BATH FOR NICKEL PLATING Arthur H. Du Rose, Euclid, Ohio, assignor to The Harshaw Chemical Company, Elyria, Ohio, a r
, corporation of Ohio No Drawing. Application MarchlZ, 1945,
Serial No. 582,423
3 Claims. (Cl. 204-49,)
This invention relates toeleotrodeposition of nickel from high chloride solutions, and more particularly a chloride-fluoride bath omittin boric acid.
I have now discovered that the use of certain fluorides in nickel plating solutions of the high chloride type instead of the usual boric acid buifer is advantageous in respect to ductility of the resulting deposit, throwing power and freedom from pitting. The solution also remains clear at pH values above 5.0 whereas the usual bath buffered with boric acid becomes turbid. There is also a slight increase in brightness in the all chloride solution and solutions in which the nickel in solution is more than half derived from chloride.
By high chloride solutions I mean those in which at least 33 of the nickel is from chloride, the remainder from sulfate.
As is well known, all-chloride nickel plating solutions normally yield more highly stressed deposits than do solutions high in sulfate, With the advent of equipment suitable for containing the all-chloride solution there has been substantial tendency in the last few years for Workers in the art of nickel plating to experiment with solutions of the all-chloride or high-chloride type in an attempt to produce deposits no more highly stressed than those taken from the usual highsulfate solutions. Surprisingly, the use of fluorides as described below results in marked reduction in stress in the deposit. For example, a half chloride bath using fluorides gives a, deposit which is no more highly stressed than those derived from the normal high-sulfate bath. This comparison is between solutions buffered with fluoride on the one hand and with boric acid on the other, 15 to 30 grams per liter of NH4HF2 or equivalent fluorine content of other fluorides as described below compared with 37.5 grams per liter of boric acid in standard Watts bath, these being optimum concentrations in both cases. Still more surprisingly, the use of fluorides as described below gives improved results in respect to throwing power, pitting, brightness and bufiering action.
Fluorides suitable for my purpose are HF, NaF, KHFz, NHiHFz, NiFz, and NiHF. These are used in quantity between 15 and 30 grams per liter in the case of NHiHFz and in the other cases the equivalent in fluorine content of 15 to 30 grams per liter of NH4IIF2.
Suitable bath compositions are as follows:
Nickel chloride hexahydrate 33%? to 1007 .grems per liter.. 200 to Nickel sulfate hexahydrate ee%%m 0%.? v410...} 40o A substance of the class consisting of NHiHFQ, HF, NaF,
KHFi, NiFi, and NiHF and mixtures of a plurality thereof, the total fluorine content thereof being equivalent to iHFi grams per Men. 15 to 30 Water Remainder pH (may be adjusted with H01) 2.5 to 5.5
Specific examples of preferred bath proportions according to the invention are as follows:
Having thus described my invention, what I' claim is:
1. A nickel plating solution essentially consisting of water from 200 to 400 grams per liter of a source of nickel of the class consisting of (l) nickel chloride and (2) nickel chloride plus nickel sulfate, in proportion such that at least 33 of the nickel is from the chloride, HCl suiflcient to produce a pH of from 2.5 to 5, and a source of fluorine of the class consisting of NH4HF2, HF, NaF, KHFz, NiF'z, NiHE and mixtures of a plurality thereof, the total fluorine content of said source of fluorine being equivalent to from 15 to 30 grams per liter of NH4HF2.
2. A nickel plating solution essentially consist ing of water, nickel chloride, HCl suflicient to produce a pH of from 2.5 to 5, and from 15 to 30 3 grams per liter of a substance of the class consisting of NH4HF2, HF, NaF, KHFz, NiFz, NiHF and mixtures of a plurality thereof.
3. A nickel plating solution essentially consisting of water, from 200 to 400 grams per liter of 5 a source of nickel of the class consisting of (1) nickel chloride and (2) nickel chloride plus nickel sulfate in proportion that at least 50% of the nickel is from the chloride, HCl in quantity sulficient to produce a pH of 2.5 to 5, and a source of fluorine of the class consisting of; NHiHFz, HF, NaF, KHFz; NiF2,.NiHF. and mixtures of a plurality thereof, the total fluorine content of said source of fluorine being equivalent to from 15 to 30 grams per liter of NH4HF2.
ARTHUR H, DU ROSE;
REFERENCES CITED The following references-are of record in th file of this patent:
UNITED STATES PATENTS Number Name Date Loose Mar. 16; 1943 FOREIGN PA'IEN'IS Number Country Date 513,963 Great Britain Oct. 26, 1939 OTHER REFERENCES Transactions of the Electrochemical Society, vol. '75 (1939) pages 209-211, by W. A. Wesley et al 20 Standards. Nol10l1(1924),page 50.
US582423A 1945-03-12 1945-03-12 Acid chloride-fluoride bath for nickel plating Expired - Lifetime US2436690A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2728720A (en) * 1953-03-09 1955-12-27 Dow Chemical Co Method of producing an electroplate of nickel on magnesium and the magnesium-base alloys
US3167491A (en) * 1960-07-29 1965-01-26 Plasitron Corp Polyfluorinated ethylene polymermetal article and method
US3274079A (en) * 1962-07-19 1966-09-20 M & T Chemicals Inc Bath and process for the electrodeposition of nickel and nickel-cobalt alloys
FR2685353A1 (en) * 1991-12-23 1993-06-25 Commissariat Energie Atomique Process for depositing an adherent nickel, copper or cobalt coating on a component made of oxidisable or passive metal, especially tantalum
WO1996041040A1 (en) * 1995-06-07 1996-12-19 Atotech Usa Inc. Etchant for aluminium alloys

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB513963A (en) * 1938-04-23 1939-10-26 Eaton Mfg Co Improvements in or relating to the electrodeposition of nickel
US2313756A (en) * 1939-03-01 1943-03-16 Dow Chemical Co Method of electroplating magnesium

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB513963A (en) * 1938-04-23 1939-10-26 Eaton Mfg Co Improvements in or relating to the electrodeposition of nickel
US2313756A (en) * 1939-03-01 1943-03-16 Dow Chemical Co Method of electroplating magnesium

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2728720A (en) * 1953-03-09 1955-12-27 Dow Chemical Co Method of producing an electroplate of nickel on magnesium and the magnesium-base alloys
US3167491A (en) * 1960-07-29 1965-01-26 Plasitron Corp Polyfluorinated ethylene polymermetal article and method
US3274079A (en) * 1962-07-19 1966-09-20 M & T Chemicals Inc Bath and process for the electrodeposition of nickel and nickel-cobalt alloys
FR2685353A1 (en) * 1991-12-23 1993-06-25 Commissariat Energie Atomique Process for depositing an adherent nickel, copper or cobalt coating on a component made of oxidisable or passive metal, especially tantalum
WO1996041040A1 (en) * 1995-06-07 1996-12-19 Atotech Usa Inc. Etchant for aluminium alloys
US5601695A (en) * 1995-06-07 1997-02-11 Atotech U.S.A., Inc. Etchant for aluminum alloys

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