US20220181529A1 - Light emitting diode structure, method of forming the same, and backlight module - Google Patents
Light emitting diode structure, method of forming the same, and backlight module Download PDFInfo
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- US20220181529A1 US20220181529A1 US17/469,933 US202117469933A US2022181529A1 US 20220181529 A1 US20220181529 A1 US 20220181529A1 US 202117469933 A US202117469933 A US 202117469933A US 2022181529 A1 US2022181529 A1 US 2022181529A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/58—Optical field-shaping elements
- H01L33/60—Reflective elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133611—Direct backlight including means for improving the brightness uniformity
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/50—Wavelength conversion elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133603—Direct backlight with LEDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0041—Processes relating to semiconductor body packages relating to wavelength conversion elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0058—Processes relating to semiconductor body packages relating to optical field-shaping elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
- H01L2933/0066—Processes relating to semiconductor body packages relating to arrangements for conducting electric current to or from the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Definitions
- the present disclosure relates to the backlight module. More particularly, the present disclosure relates to the light emitting diode structure of the backlight module and the method of forming the same.
- the liquid crystal display includes the liquid crystal module and the backlight module (or referred as the backlight unit) for providing the light source.
- the backlight module may be classified as the direct type backlight module and the edge type backlight module.
- the direct type backlight module may provide the local dimming function so it is broadly used in the liquid crystal display. Therefore, reducing the optical distance of the direct type backlight module to decrease the thickness of the display is critical to the development of the backlight module.
- a light emitting diode structure includes a substrate, a chip disposed on the substrate, transparent cup walls disposed on the substrate and surrounding the chip, a wavelength conversion layer covering the chip between the transparent cup walls, and a reflective layer disposed on the wavelength conversion layer, in which the reflective layer includes a curved bottom surface protruding toward chip.
- a transmittance of the transparent cup walls is in a range of 20% to 100%.
- an angle between an inner wall of the transparent cup walls and the substrate is in a range of 90° to 170°.
- an outer wall of the transparent cup walls is substantially vertical to the substrate.
- a thickness from the curved bottom surface of the reflective layer to a top surface of the reflective layer is in a range of 30 ⁇ m to 100 ⁇ m.
- an edge thickness of the reflective layer approaches zero.
- the reflective layer contacts the transparent cup walls, and the wavelength conversion layer is free from being exposed to environment.
- a reflectance of the reflective layer is in a range of 90% to 100%.
- the reflective layer includes a substantially flat top surface.
- a beam angle of the light emitting diode structure is in a range of 95° to 175°.
- a backlight module includes a light emitting diode structure and an optical film disposed over the light emitting diode structure.
- the light emitting diode structure includes a substrate, a chip disposed on the substrate, transparent cup walls disposed on the substrate and surrounding the chip, a wavelength conversion layer covering the chip between the transparent cup walls, and a reflective layer disposed on the wavelength conversion layer, in which the reflective layer includes a curved bottom surface protruding toward the chip.
- the backlight module further includes a wire connecting the chip and the substrate.
- an angle between an inner wall of the transparent cup walls and the substrate is in a range of 90° to 170°.
- the wavelength conversion layer includes a fluorescent material to emit a second light different from a first light emitted by the chip.
- a central thickness from the curved bottom surface of the reflective layer to a top surface of the reflective layer is in a range of 30 ⁇ m to 100 ⁇ m.
- a beam angle of the light emitting diode structure is in a range of 95° to 175°.
- a method of forming a light emitting diode structure includes forming transparent cup walls on a substrate, disposing a chip on the substrate, in which the transparent cup walls surround the chip.
- the method includes connecting a wire to the chip, forming a wavelength conversion layer with a central-recessed top surface between the transparent cup walls, in which the wavelength conversion layer covers the chip.
- the method includes forming a reflective layer on the wavelength conversion layer and performing a baking process.
- a difference between a central thickness of the wavelength conversion layer and an edge thickness of the wavelength conversion layer is larger than 30 ⁇ m.
- forming the wavelength conversion layer includes dispensing a material of the wavelength conversion layer between the transparent cup walls.
- the baking process includes a plurality of heating stages with gradient temperatures.
- FIG. 1A illustrates a schematic diagram of a light emitting diode according to some embodiments of the present disclosure.
- FIG. 1B illustrates a cross-sectional view along the line A-A′ of the light emitting diode in FIG. 1A .
- FIGS. 1C-1D illustrate cross-sectional views of light emitting diodes according to some other embodiments of the present disclosure.
- FIGS. 2A-2B illustrate schematic diagrams of the light emitting diode according to some other embodiments of the present disclosure.
- FIG. 3 illustrates an exploded view of a backlight module according to some other embodiments of the present disclosure.
- FIGS. 4-8 illustrate cross-sectional views of each intermediate stage of the manufacturing process of the light emitting diode according to some embodiments of the present disclosure.
- first and second features are formed in direct contact
- additional features may be formed between the first and second features, such that the first and second features may not be in direct contact
- first and second features may not be in direct contact
- connection may be referred as physically and/or electrically connection.
- electrically connected or “coupled” of two elements may include another element between the two elements.
- spatially relative terms such as “below,” “bottom,” “above,” “top” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures.
- the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figure is flipped, the element at the lower side of the other(s) may be defined as those at the upper side of the other(s). Therefore, the spatially relative term “below” may include the orientation of “below” and “above.”
- terms, such as “about,” “close to,” “substantially” and the like, used herein may include the given value and the average of the acceptable deviation of the given value for those skilled in the art.
- the term “about” may indicate the values in one or more deviation or in ⁇ 30%, ⁇ 20%, ⁇ 10%, or ⁇ 5% of the given value.
- the present disclosure provides a light emitting diode structure including transparent cup walls and a reflective layer with a curved bottom surface.
- the transparent cup walls surrounding a chip are disposed on a substrate, and the reflective layer is disposed on a wavelength conversion layer covering the chip.
- the reflective layer changes the light path emitted by the chip so that the light leaves the light emitting diode from the transparent cup walls on the sides of the light emitting diode. As a result, the luminous intensity above the light emitting diode is decreased and the beam angle range of the light emitting diode is increased.
- FIG. 1A illustrates a schematic diagram of a light emitting diode 100
- FIG. 1B illustrates a cross-sectional view along a line A-A′ of the light emitting diode 100 in FIG. 1A
- the light emitting diode 100 includes a substrate 110 , a chip 120 , wires 130 , transparent cup walls 140 , a wavelength conversion layer 150 , and a reflective layer 160 .
- the light emitting diode 100 may include other layers, materials, or elements, for example, the wavelength conversion layer 150 may specifically be a wavelength conversion layer with double layers.
- the substrate 110 acts as the carrier of the light emitting diode 100 .
- the substrate 110 may include the insulation material and the wire bracket to provide the current to the light emitting diode 100 .
- the substrate 110 may be a printed circuit board.
- the chip 120 is disposed on the substrate 110 as the light source of the light emitting diode 100 .
- the wires 130 connect the chip 120 and the circuit (such as the substrate 110 ) to provide the current to the chip 120 for light emitting.
- the number of the wires 130 may differ because of the type of the chip 120 . For example, as shown in FIG. 1B , two wires 130 are connected to the lateral (face-up) chip 120 . In contrast, FIGS.
- FIG. 1C-1D illustrate the cross-sectional views of the light emitting diodes 100 according to some other embodiments.
- the chip 120 in the light emitting diodes 100 may be a vertical chip 120 with one wire 130 as shown in FIG. 10 or a flip chip 120 without wire 130 as shown in FIG. 1D .
- the wavelength conversion layer 150 is positioned above the chip 120 and covers the chip 120 .
- the wavelength conversion layer 150 may include the material converting the wavelength of the light from the chip 120 . More specifically, after the first light is emitted by the chip 120 , the wavelength conversion layer 150 may absorb portions of the first light and emit the second light different from the first light. As a result, the light emitting diode 100 emits a mixed light of the first light and the second light. In other words, the wavelength of the light emitted from the light emitting diode 100 is different from the wavelength of the first light emitted by the chip 120 .
- the wavelength conversion layer 150 may include the fluorescent material so that the wavelength conversion layer 150 may emit the second light with the emission wavelength after absorbing the first light with the excitation wavelength.
- the first light and the second light will be presented as the light 170 to simplify the description.
- the reflective layer 160 is disposed on the wavelength conversion layer 150 and above the chip 120 , and the reflective layer 160 may reflect the light 170 emitted upward by the chip 120 . Since the reflective layer 160 is above the chip 120 , the reflective layer 160 reduces the luminous intensity above the light emitting diode 100 .
- the reflective layer 160 includes a curved bottom surface 160 b protruding toward the chip 120 , as shown in FIG. 1B .
- the curved bottom surface 160 b may increase the angle range of the light 170 reflected by the reflective layer 160 and leaving the light emitting diode 100 . Therefore, the curved bottom surface 160 b increases the luminous intensity on the sides of the light emitting diode 100 .
- the central thickness of the reflective layer 160 may be larger than the edge thickness along the direction vertical to the flat top surface 160 t of the reflective layer 160 , which forms the curved bottom surface 160 b .
- the thickness from the central of the bottom surface 160 b of the reflective layer 160 to the top surface 160 t of the reflective layer 160 may be thickness H 1 , and the edge thickness of the reflective layer 160 approaches zero.
- the thickness H 1 may larger than about 30 ⁇ m.
- the thickness H 1 may be in a range of about 30 ⁇ m to about 100 ⁇ m. However, it should be understood that the thickness H 1 may be other values according to the size or the material of the light emitting diode 100 .
- the reflective layer 160 may be positioned on the wavelength conversion layer 150 , and the edge of the reflective layer 160 may contact the transparent cup walls 140 on the sides of the light emitting diode 100 .
- the substrate 110 , the reflective layer 160 , and the transparent cup walls 140 may surround the wavelength conversion layer 150 so that the wavelength conversion layer 150 is free from being exposed to the environment.
- the wavelength conversion layer 150 not being exposed may be avoided from the defects caused by the environment (such as the particles, the moisture, or the gas in air). This improves the efficiency and the stability of the light emitting diode 100 .
- the wavelength conversion layer 150 in the package of the reflective layer 160 and the transparent cup wall 140 may be free from being sulfur-corroded which affects the efficiency of the light emitting diode 100 .
- the reflectance of the reflective layer 160 may be in a range of about 90% to about 100%. Since the reflective layer 160 has the reflectance to light 170 , the light 170 emitted by the chip 120 may be reflected by the reflective layer 160 . This decreases the luminous intensity above the light emitting diode 100 . Therefore, the reflective layer 160 may include suitable materials with the above mentioned reflectance. In some embodiments, the reflective layer 160 may include silicone.
- the transparent cup walls 140 disposed on the substrate 110 and surrounding the chip 120 form the sidewalls of the light emitting diode 100 .
- the light 170 reflected by the reflective layer 160 may leave the light emitting diode 100 through the transparent cup walls 140 .
- the transparent cup walls 140 is positioned around the chip 120 so that the transparent cup walls 140 may increase the luminous intensity on the sides of the light emitting diode 100 .
- the transparent cup walls 140 include the inner wall 140 a and the outer wall 140 b .
- the outer wall 140 b of the transparent cup walls 140 may be substantially vertical to the substrate 110 , which leads to the column structure of the light emitting diode 100 .
- the angle between the inner wall 140 a of the transparent cup walls 140 and the substrate 110 may be angle 81 .
- the angle 81 corresponds to the application of the light emitting diode 100 with different functions, such as the window size of the light emitting diode 100 , the position of the light emitting diode 100 and the optical film (not shown) above the light emitting diode 100 , the light type of the light emitting diode 100 , or the like.
- the angle 81 between the inner wall 140 a of the transparent cup walls 140 and the substrate 110 may be in a range of about 90° to about 170°.
- the light emitting diode 100 may have a rectangular structure, which the angle 81 between the longer inner wall 140 a and the substrate 110 is in a range of about 110° to about 170°, and the angle 81 between the shorter inner wall 140 a and the substrate 110 is in a range of about 90° to about 150°.
- the angle 81 of other values may be included according to the size or the material of the light emitting diode 100 .
- the transmittance of the transparent cup walls 140 may be in a range of about 20% to about 100%. Since the transparent cup walls 140 has the transmittance to light 170 , the light 170 emitted by the chip 120 may leave the light emitting diode 100 through the transparent cup walls 140 after being reflected by the reflective layer 160 .
- the transparent cup walls 140 may have different transmittances for the light 170 with different wavelengths. For example, the transmittance of the transparent cup walls 140 to the light 170 with wavelength between 400 nm and 550 nm may be in a range of about 20% to about 50%, while the transmittance of the transparent cup walls 140 to the light 170 with wavelength between 550 nm and 750 nm may be in a range of about 50% to about 70%.
- the transparent cup walls 140 may include the materials with the above mentioned transmittance.
- the transparent cup walls 140 may include polyamide, poly(p-phenylene hexamethylenediamine) (PA6T), polyamide 9T (PA9T), polycyclohexane-dimethyl terephthalate (PCT), semi-aromatic polyamide, liquid crystal polymer (LOP), thermosetting epoxy resin, thermosetting silicone, or the like.
- the reflective layer 160 reflects the light 170 emitting upward from the chip 120 , which decreases the luminous intensity above the light emitting diode 100 . Additionally, the light 170 penetrating through the transparent cup walls 140 of the sides of the light emitting diode 100 increases the luminous intensity of the sides of the light emitting diode 100 . As a result, the beam angle range of the light emitting diode 100 is increased by the reflective layer 160 and the transparent cup walls 140 . In some embodiments, the beam angle of the light emitting diode 100 may be in a range of about 95° to about 175°.
- the light emitting diode 100 may have any suitable shape or size to be applied in the design or the process of the light emitting device. According to some other embodiments of the present disclosure, FIG. 2A to FIG. 2B illustrate schematic diagrams of the light emitting diode 102 and the light emitting diode 104 , in which the structures of the light emitting diode 102 and the light emitting diode 104 are similar to that of the light emitting diode 100 . Referring to FIG. 1A , FIG. 2A , and FIG. 2B , the light emitting diode 100 is rectangular with a square top surface 160 t , in which the side length of the top surface 160 t may be in a range of about 0.1 mm to about 6.5 mm.
- the light emitting diode 102 is rectangular with a rectangle top surface 162 t , in which the side length of the top surface 162 t may be in a range of about 0.1 mm to about 7 mm, and the difference of the two side lengths of top surface 162 t may be in a range of about 1 mm to about 5 mm.
- the light emitting diode 104 is cylinder with a round top surface 164 t to provide uniformed light.
- FIG. 3 illustrates an exploded view of the backlight module 300 .
- the backlight module 300 includes a carrier 302 , a light emitting diode 100 , an optical film 304 , and a liquid crystal display 306 .
- the light emitting diode 100 is disposed on the carrier 302 to act as the light source of the backlight module 300 .
- the optical film 304 is disposed above the light emitting diode 100 to further uniform the light from the light emitting diode 100 .
- the liquid crystal display 306 is disposed above the optical film 304 to receive the light uniformed by the optical film 304 .
- the backlight module 300 as an example is not intended to limit the present disclosure, and the backlight module 300 including other components is in the scope of the present disclosure.
- the light emitting diode 100 including the reflective layer 160 and the transparent cup walls 140 may be applied in the backlight module 300 . Since the reflective layer 160 and the transparent cup walls 140 of the light emitting diode 100 increases the beam angle range of the light emitting diode 100 , the optical distance between the light emitting diode 100 and the optical film 304 is decreased, thereby decreasing the thickness of the backlight module 300 . In addition, the light emitting diode 100 with the increased beam angle range increases the light source area of each light emitting diode 100 . Therefore, the number of the light emitting diode 100 in the backlight module 300 may be reduced to lower the process cost of the backlight module 300 .
- FIG. 4 to FIG. 8 illustrate the cross-sectional views of each intermediate stage of the manufacturing process of the light emitting diode 100 , in which the cross-sectional is similar to that of FIG. 1B .
- FIG. 4 to FIG. 8 are merely examples and are not intended to limit the present disclosure. Additional steps may be provided before, during, or after the process of FIG. 4 to FIG. 8 .
- FIG. 4 illustrates the cross-sectional view of an intermediate stage of the process forming the light emitting diode 100 .
- the transparent cup walls 140 are formed on the substrate 110 .
- Forming the transparent cup walls 140 on the substrate 110 may include forming the outer wall 140 b substantially vertical to the substrate 110 and the inner wall 140 a with the angle 81 between the inner wall 140 a and the substrate 110 .
- the transparent cup walls 140 and the substrate 110 form a cup-shaped structure, so that other elements may be disposed in the cup-shaped structure in the following process.
- the transparent cup walls 140 may include thermoplastic or thermosetting material, which corresponds to the different processes, such as injection molding or compression molding, forming the transparent cup walls 140 .
- FIG. 5 illustrates the cross-sectional view of an intermediate stage of the process forming the light emitting diode 100 .
- the chip 120 is disposed on the substrate 110 and between the transparent cup walls 140 .
- the chip 120 is disposed on the substrate 110 and connected to the outer source to provide the light source of the light emitting diode 100 .
- the chip 120 is fixed on the substrate 110 by an adhesion layer.
- FIG. 6 illustrates the cross-sectional view of an intermediate stage of the process forming the light emitting diode 100 .
- the wires 130 are connected to the chip 120 , or the operation may be called “bonding.”
- the wires 130 are connected to the chip 120 and the circuit of the wire bracket on the substrate 110 .
- the transparent cup walls 140 surround the chip 120 .
- the chip 120 is disposed in the cup-shaped structure formed by the transparent cup walls 140 and the substrate 110 .
- FIG. 7 illustrates the cross-sectional view of an intermediate stage of the process forming the light emitting diode 100 .
- the wavelength conversion layer 150 is formed between the transparent cup walls 140 .
- the wavelength conversion layer 150 is not only formed between the transparent cup walls 140 but also formed above the chip 120 to cover the chip 120 . Since the wavelength conversion layer 150 is formed between the transparent cup walls 140 and the wavelength conversion layer 150 covers the chip 120 , the wires 130 , and the substrate 110 , the chip 120 may be avoided from the corrosion caused by the environment. This increases the stability and efficiency of the light emitting diode 100 .
- the wavelength conversion layer 150 may include the colloid with cohesion. Therefore, the wavelength conversion layer 150 forming between the transparent cup walls 140 has a top surface 150 t recessing toward the chip 120 .
- the thickness from the central of the top surface 150 t of the wavelength conversion layer 150 to the substrate 110 along the direction vertical to the substrate 110 is thickness H 2 .
- the thickness from the edge of the top surface 150 t to the substrate 110 is thickness H 3 , and the thickness H 3 is larger than the thickness H 2 .
- the difference between the thickness H 2 and the thickness H 3 may be larger than about 30 ⁇ m.
- the difference between the thickness H 2 and the thickness H 3 may be in a range of about 30 ⁇ m to about 100 ⁇ m. However, it should be understood that the thickness H 2 and the thickness H 3 of other values may be included according to the size or the material of the light emitting diode 100 .
- forming the wavelength conversion layer 150 may include performing the dispensing process.
- the material of the wavelength conversion layer 150 is dispensed in the cup-shaped structure formed by the transparent cup walls 140 and the substrate 110 .
- the transparent cup walls 140 and the substrate 110 define the side boundary and the bottom boundary of the wavelength conversion layer 150 so that the wavelength conversion layer 150 may be avoided from being processed by other cutting process or etching process (such as dry etch or wet etch). Since cutting process or etching process is not performed in the forming process of the wavelength conversion layer 150 , the wavelength conversion layer 150 may not be affected by those processes (such as flash and crack caused by cutting process or graphitization and corrosion caused by etching process) which decreases the light emitting efficiency of the wavelength conversion layer 150 .
- FIG. 8 illustrates the cross-sectional view of an intermediate stage of the process forming the light emitting diode 100 .
- the reflective layer 160 is formed on the wavelength conversion layer 150 , and the baking process is performed.
- the reflective layer 160 includes a bottom surface 160 b attached to the top surface 150 t of the wavelength conversion layer 150 , leading to the curved bottom surface 160 b protruding toward the chip 120 .
- the reflective layer 160 may include the substantially flat top surface 160 t so that other elements may be easily formed on the light emitting diode 100 .
- forming the reflective layer 160 may include performing the dispensing process, which the material of the reflective layer 160 is dispensed on the wavelength conversion layer 150 . As shown in FIG. 8 , the reflective layer 160 , the transparent cup walls 140 and the substrate 110 may pack the wavelength conversion layer 150 into the cup-shaped structure of the light emitting diode 100 . This avoid the exposure of the wavelength conversion layer 150 to moisture, corrosion, or other environment factors and increases the stability of the light emitting diode 100 .
- the light emitting diode 100 is baked to cure the light emitting diode 100 .
- the baking process may include a plurality of heating stages to increase the adhesion between the reflective layer 160 and the wavelength conversion layer 150 . This decrease the possibility of the penetration of moisture and air into the light emitting diode 100 .
- the baking process may include three heating stages with gradient temperatures (such as about 80° C. for the first stage, about 100° C. for the second stage, and about 150° C. for the third stage). The first stage with a relative low temperature may reduce the viscosity of the wavelength conversion layer 150 so that the wavelength conversion layer 150 may be dispensed into the gaps in the light emitting diode 100 with less ripple.
- the second stage with a temperature between that of the first stage and that of the third stage may decrease the stress caused by the rapid heating up to avoid the deformation of the light emitting diode 100 .
- the third stage with a relative high temperature may sufficiently cure the light emitting diode 100 and increases the chemical adhesion between the reflective layer 160 and the wavelength conversion layer 150 .
- the present disclosure provides the light emitting diode structure including the reflective layer with the curved bottom surface above the light emitting chip to decrease the luminous intensity above the light emitting diode.
- the light emitting diode structure also includes the transparent cup walls disposed on the sides of the light emitting chip to increase the luminous intensity of the sides of the light emitting diode.
- the reflective layer and the transparent cup walls increase the beam angle range of the light emitting diode so that the requirement for the optical distance and the number of the light emitting diode may be reduced. This reduces the thickness of the backlight module using the light emitting diode of the present disclosure and increases the application possibility of the light emitting diode.
- forming the cup-shaped structure with the transparent cup walls and the substrate and forming the wavelength conversion layer in the cup-shaped structure may avoid performing cutting process or etching process to the wavelength conversion layer.
- This process design is free from the defects caused by cutting and etching process and thereby improving the yield of the light emitting diode and decreasing the process cost.
Abstract
Description
- This application claims priority to Taiwan Application Serial Number 109143106, filed on Dec. 7, 2020, which is herein incorporated by reference in its entirety.
- The present disclosure relates to the backlight module. More particularly, the present disclosure relates to the light emitting diode structure of the backlight module and the method of forming the same.
- The liquid crystal display includes the liquid crystal module and the backlight module (or referred as the backlight unit) for providing the light source. According to the positon of the light emitting element in the backlight module corresponds to that of the light emitting surface, the backlight module may be classified as the direct type backlight module and the edge type backlight module. The direct type backlight module may provide the local dimming function so it is broadly used in the liquid crystal display. Therefore, reducing the optical distance of the direct type backlight module to decrease the thickness of the display is critical to the development of the backlight module.
- According to the embodiments of the present disclosure, a light emitting diode structure includes a substrate, a chip disposed on the substrate, transparent cup walls disposed on the substrate and surrounding the chip, a wavelength conversion layer covering the chip between the transparent cup walls, and a reflective layer disposed on the wavelength conversion layer, in which the reflective layer includes a curved bottom surface protruding toward chip.
- In some embodiments, a transmittance of the transparent cup walls is in a range of 20% to 100%.
- In some embodiments, an angle between an inner wall of the transparent cup walls and the substrate is in a range of 90° to 170°.
- In some embodiments, an outer wall of the transparent cup walls is substantially vertical to the substrate.
- In some embodiments, a thickness from the curved bottom surface of the reflective layer to a top surface of the reflective layer is in a range of 30 μm to 100 μm.
- In some embodiments, an edge thickness of the reflective layer approaches zero.
- In some embodiments, the reflective layer contacts the transparent cup walls, and the wavelength conversion layer is free from being exposed to environment.
- In some embodiments, a reflectance of the reflective layer is in a range of 90% to 100%.
- In some embodiments, the reflective layer includes a substantially flat top surface.
- In some embodiments, a beam angle of the light emitting diode structure is in a range of 95° to 175°.
- According to the embodiments of the present disclosure, a backlight module includes a light emitting diode structure and an optical film disposed over the light emitting diode structure. The light emitting diode structure includes a substrate, a chip disposed on the substrate, transparent cup walls disposed on the substrate and surrounding the chip, a wavelength conversion layer covering the chip between the transparent cup walls, and a reflective layer disposed on the wavelength conversion layer, in which the reflective layer includes a curved bottom surface protruding toward the chip.
- In some embodiments, the backlight module further includes a wire connecting the chip and the substrate.
- In some embodiments, an angle between an inner wall of the transparent cup walls and the substrate is in a range of 90° to 170°.
- In some embodiments, the wavelength conversion layer includes a fluorescent material to emit a second light different from a first light emitted by the chip.
- In some embodiments, a central thickness from the curved bottom surface of the reflective layer to a top surface of the reflective layer is in a range of 30 μm to 100 μm.
- In some embodiments, a beam angle of the light emitting diode structure is in a range of 95° to 175°.
- According to the embodiments of the present disclosure, a method of forming a light emitting diode structure includes forming transparent cup walls on a substrate, disposing a chip on the substrate, in which the transparent cup walls surround the chip. The method includes connecting a wire to the chip, forming a wavelength conversion layer with a central-recessed top surface between the transparent cup walls, in which the wavelength conversion layer covers the chip. The method includes forming a reflective layer on the wavelength conversion layer and performing a baking process.
- In some embodiments, a difference between a central thickness of the wavelength conversion layer and an edge thickness of the wavelength conversion layer is larger than 30 μm.
- In some embodiments, forming the wavelength conversion layer includes dispensing a material of the wavelength conversion layer between the transparent cup walls.
- In some embodiments, the baking process includes a plurality of heating stages with gradient temperatures.
- It is to be understood that both the foregoing general description and the following detailed description are by examples, and are intended to provide further explanation of the disclosure as claimed.
- The disclosure can be more fully understood by reading the following detailed description of the embodiment, with reference made to the accompanying drawings as follows. Aspects of the present disclosure are best understood from the following detailed description when read with the accompanying figures. It is noted that, in accordance with the standard practice in the industry, various features are not drawn to scale.
-
FIG. 1A illustrates a schematic diagram of a light emitting diode according to some embodiments of the present disclosure. -
FIG. 1B illustrates a cross-sectional view along the line A-A′ of the light emitting diode inFIG. 1A . -
FIGS. 1C-1D illustrate cross-sectional views of light emitting diodes according to some other embodiments of the present disclosure. -
FIGS. 2A-2B illustrate schematic diagrams of the light emitting diode according to some other embodiments of the present disclosure. -
FIG. 3 illustrates an exploded view of a backlight module according to some other embodiments of the present disclosure. -
FIGS. 4-8 illustrate cross-sectional views of each intermediate stage of the manufacturing process of the light emitting diode according to some embodiments of the present disclosure. - In the figures, the thickness of the layer, the film, the display, or the region is magnified to specifically describe the present disclosure. Through the specification, the same reference numbers are used in the drawings and the description to refer to the same or like parts. The formation of a first feature on or connected to a second feature in the description that follows may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which additional features may be formed between the first and second features, such that the first and second features may not be in direct contact. In the contrary, the formation of a first feature directly on or directly connected to a second feature includes embodiments in which the first and second features are formed without another feature between the two features. As used herein, “connection” may be referred as physically and/or electrically connection. In addition, “electrically connected” or “coupled” of two elements may include another element between the two elements.
- Further, spatially relative terms, such as “below,” “bottom,” “above,” “top” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. The spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figure is flipped, the element at the lower side of the other(s) may be defined as those at the upper side of the other(s). Therefore, the spatially relative term “below” may include the orientation of “below” and “above.”
- Additionally, terms, such as “about,” “close to,” “substantially” and the like, used herein may include the given value and the average of the acceptable deviation of the given value for those skilled in the art. For example, the term “about” may indicate the values in one or more deviation or in ±30%, ±20%, ±10%, or ±5% of the given value.
- The present disclosure provides a light emitting diode structure including transparent cup walls and a reflective layer with a curved bottom surface. The transparent cup walls surrounding a chip are disposed on a substrate, and the reflective layer is disposed on a wavelength conversion layer covering the chip. The reflective layer changes the light path emitted by the chip so that the light leaves the light emitting diode from the transparent cup walls on the sides of the light emitting diode. As a result, the luminous intensity above the light emitting diode is decreased and the beam angle range of the light emitting diode is increased.
- According to some embodiments of the present disclosure,
FIG. 1A illustrates a schematic diagram of alight emitting diode 100, andFIG. 1B illustrates a cross-sectional view along a line A-A′ of thelight emitting diode 100 inFIG. 1A . As shown inFIG. 1B , thelight emitting diode 100 includes asubstrate 110, achip 120,wires 130,transparent cup walls 140, awavelength conversion layer 150, and areflective layer 160. According to some other embodiments of the present disclosure, thelight emitting diode 100 may include other layers, materials, or elements, for example, thewavelength conversion layer 150 may specifically be a wavelength conversion layer with double layers. - The
substrate 110 acts as the carrier of thelight emitting diode 100. Thesubstrate 110 may include the insulation material and the wire bracket to provide the current to thelight emitting diode 100. In some embodiments, thesubstrate 110 may be a printed circuit board. Thechip 120 is disposed on thesubstrate 110 as the light source of thelight emitting diode 100. Thewires 130 connect thechip 120 and the circuit (such as the substrate 110) to provide the current to thechip 120 for light emitting. In some embodiments, the number of thewires 130 may differ because of the type of thechip 120. For example, as shown inFIG. 1B , twowires 130 are connected to the lateral (face-up)chip 120. In contrast,FIGS. 1C-1D illustrate the cross-sectional views of thelight emitting diodes 100 according to some other embodiments. Thechip 120 in thelight emitting diodes 100 may be avertical chip 120 with onewire 130 as shown inFIG. 10 or aflip chip 120 withoutwire 130 as shown inFIG. 1D . - The
wavelength conversion layer 150 is positioned above thechip 120 and covers thechip 120. Thewavelength conversion layer 150 may include the material converting the wavelength of the light from thechip 120. More specifically, after the first light is emitted by thechip 120, thewavelength conversion layer 150 may absorb portions of the first light and emit the second light different from the first light. As a result, thelight emitting diode 100 emits a mixed light of the first light and the second light. In other words, the wavelength of the light emitted from thelight emitting diode 100 is different from the wavelength of the first light emitted by thechip 120. For example, thewavelength conversion layer 150 may include the fluorescent material so that thewavelength conversion layer 150 may emit the second light with the emission wavelength after absorbing the first light with the excitation wavelength. In the following description, the first light and the second light will be presented as the light 170 to simplify the description. - The
reflective layer 160 is disposed on thewavelength conversion layer 150 and above thechip 120, and thereflective layer 160 may reflect the light 170 emitted upward by thechip 120. Since thereflective layer 160 is above thechip 120, thereflective layer 160 reduces the luminous intensity above thelight emitting diode 100. In addition, thereflective layer 160 includes acurved bottom surface 160 b protruding toward thechip 120, as shown inFIG. 1B . Thecurved bottom surface 160 b may increase the angle range of the light 170 reflected by thereflective layer 160 and leaving thelight emitting diode 100. Therefore, thecurved bottom surface 160 b increases the luminous intensity on the sides of thelight emitting diode 100. - In some embodiments, the central thickness of the
reflective layer 160 may be larger than the edge thickness along the direction vertical to the flattop surface 160 t of thereflective layer 160, which forms thecurved bottom surface 160 b. For example, as shown inFIG. 1B , the thickness from the central of thebottom surface 160 b of thereflective layer 160 to thetop surface 160 t of thereflective layer 160 may be thickness H1, and the edge thickness of thereflective layer 160 approaches zero. In some embodiments, the thickness H1 may larger than about 30 μm. In some embodiments, the thickness H1 may be in a range of about 30 μm to about 100 μm. However, it should be understood that the thickness H1 may be other values according to the size or the material of thelight emitting diode 100. - In some embodiments, the
reflective layer 160 may be positioned on thewavelength conversion layer 150, and the edge of thereflective layer 160 may contact thetransparent cup walls 140 on the sides of thelight emitting diode 100. In other words, thesubstrate 110, thereflective layer 160, and thetransparent cup walls 140 may surround thewavelength conversion layer 150 so that thewavelength conversion layer 150 is free from being exposed to the environment. In such embodiments, thewavelength conversion layer 150 not being exposed may be avoided from the defects caused by the environment (such as the particles, the moisture, or the gas in air). This improves the efficiency and the stability of thelight emitting diode 100. For example, thewavelength conversion layer 150 in the package of thereflective layer 160 and thetransparent cup wall 140 may be free from being sulfur-corroded which affects the efficiency of thelight emitting diode 100. - In some embodiments, the reflectance of the
reflective layer 160 may be in a range of about 90% to about 100%. Since thereflective layer 160 has the reflectance to light 170, the light 170 emitted by thechip 120 may be reflected by thereflective layer 160. This decreases the luminous intensity above thelight emitting diode 100. Therefore, thereflective layer 160 may include suitable materials with the above mentioned reflectance. In some embodiments, thereflective layer 160 may include silicone. - The
transparent cup walls 140 disposed on thesubstrate 110 and surrounding thechip 120 form the sidewalls of thelight emitting diode 100. The light 170 reflected by thereflective layer 160 may leave thelight emitting diode 100 through thetransparent cup walls 140. Thetransparent cup walls 140 is positioned around thechip 120 so that thetransparent cup walls 140 may increase the luminous intensity on the sides of thelight emitting diode 100. - In
FIG. 1B , thetransparent cup walls 140 include theinner wall 140 a and theouter wall 140 b. Theouter wall 140 b of thetransparent cup walls 140 may be substantially vertical to thesubstrate 110, which leads to the column structure of thelight emitting diode 100. The angle between theinner wall 140 a of thetransparent cup walls 140 and thesubstrate 110 may be angle 81. The angle 81 corresponds to the application of thelight emitting diode 100 with different functions, such as the window size of thelight emitting diode 100, the position of thelight emitting diode 100 and the optical film (not shown) above thelight emitting diode 100, the light type of thelight emitting diode 100, or the like. - In some embodiments, the angle 81 between the
inner wall 140 a of thetransparent cup walls 140 and thesubstrate 110 may be in a range of about 90° to about 170°. For example, thelight emitting diode 100 may have a rectangular structure, which the angle 81 between the longerinner wall 140 a and thesubstrate 110 is in a range of about 110° to about 170°, and the angle 81 between the shorterinner wall 140 a and thesubstrate 110 is in a range of about 90° to about 150°. However, it should be and erstood that the angle 81 of other values may be included according to the size or the material of thelight emitting diode 100. - In some embodiments, the transmittance of the
transparent cup walls 140 may be in a range of about 20% to about 100%. Since thetransparent cup walls 140 has the transmittance to light 170, the light 170 emitted by thechip 120 may leave thelight emitting diode 100 through thetransparent cup walls 140 after being reflected by thereflective layer 160. Thetransparent cup walls 140 may have different transmittances for the light 170 with different wavelengths. For example, the transmittance of thetransparent cup walls 140 to the light 170 with wavelength between 400 nm and 550 nm may be in a range of about 20% to about 50%, while the transmittance of thetransparent cup walls 140 to the light 170 with wavelength between 550 nm and 750 nm may be in a range of about 50% to about 70%. - The
transparent cup walls 140 may include the materials with the above mentioned transmittance. In some embodiments, thetransparent cup walls 140 may include polyamide, poly(p-phenylene hexamethylenediamine) (PA6T), polyamide 9T (PA9T), polycyclohexane-dimethyl terephthalate (PCT), semi-aromatic polyamide, liquid crystal polymer (LOP), thermosetting epoxy resin, thermosetting silicone, or the like. - The
reflective layer 160 reflects the light 170 emitting upward from thechip 120, which decreases the luminous intensity above thelight emitting diode 100. Additionally, the light 170 penetrating through thetransparent cup walls 140 of the sides of thelight emitting diode 100 increases the luminous intensity of the sides of thelight emitting diode 100. As a result, the beam angle range of thelight emitting diode 100 is increased by thereflective layer 160 and thetransparent cup walls 140. In some embodiments, the beam angle of thelight emitting diode 100 may be in a range of about 95° to about 175°. - The
light emitting diode 100 may have any suitable shape or size to be applied in the design or the process of the light emitting device. According to some other embodiments of the present disclosure,FIG. 2A toFIG. 2B illustrate schematic diagrams of thelight emitting diode 102 and thelight emitting diode 104, in which the structures of thelight emitting diode 102 and thelight emitting diode 104 are similar to that of thelight emitting diode 100. Referring toFIG. 1A ,FIG. 2A , andFIG. 2B , thelight emitting diode 100 is rectangular with a squaretop surface 160 t, in which the side length of thetop surface 160 t may be in a range of about 0.1 mm to about 6.5 mm. Thelight emitting diode 102 is rectangular with a rectangletop surface 162 t, in which the side length of thetop surface 162 t may be in a range of about 0.1 mm to about 7 mm, and the difference of the two side lengths oftop surface 162 t may be in a range of about 1 mm to about 5 mm. Thelight emitting diode 104 is cylinder with a roundtop surface 164 t to provide uniformed light. - According to some other embodiments of the present disclosure,
FIG. 3 illustrates an exploded view of thebacklight module 300. Thebacklight module 300 includes acarrier 302, alight emitting diode 100, anoptical film 304, and aliquid crystal display 306. Thelight emitting diode 100 is disposed on thecarrier 302 to act as the light source of thebacklight module 300. Theoptical film 304 is disposed above thelight emitting diode 100 to further uniform the light from thelight emitting diode 100. Theliquid crystal display 306 is disposed above theoptical film 304 to receive the light uniformed by theoptical film 304. It should be understood that thebacklight module 300 as an example is not intended to limit the present disclosure, and thebacklight module 300 including other components is in the scope of the present disclosure. - As shown in
FIG. 3 , thelight emitting diode 100 including thereflective layer 160 and the transparent cup walls 140 (such as thelight emitting diode 100 inFIG. 1B ) may be applied in thebacklight module 300. Since thereflective layer 160 and thetransparent cup walls 140 of thelight emitting diode 100 increases the beam angle range of thelight emitting diode 100, the optical distance between thelight emitting diode 100 and theoptical film 304 is decreased, thereby decreasing the thickness of thebacklight module 300. In addition, thelight emitting diode 100 with the increased beam angle range increases the light source area of eachlight emitting diode 100. Therefore, the number of thelight emitting diode 100 in thebacklight module 300 may be reduced to lower the process cost of thebacklight module 300. - According to some embodiments of the present disclosure,
FIG. 4 toFIG. 8 illustrate the cross-sectional views of each intermediate stage of the manufacturing process of thelight emitting diode 100, in which the cross-sectional is similar to that ofFIG. 1B . However, it should be noted thatFIG. 4 toFIG. 8 are merely examples and are not intended to limit the present disclosure. Additional steps may be provided before, during, or after the process ofFIG. 4 toFIG. 8 . -
FIG. 4 illustrates the cross-sectional view of an intermediate stage of the process forming thelight emitting diode 100. Thetransparent cup walls 140 are formed on thesubstrate 110. Forming thetransparent cup walls 140 on thesubstrate 110 may include forming theouter wall 140 b substantially vertical to thesubstrate 110 and theinner wall 140 a with the angle 81 between theinner wall 140 a and thesubstrate 110. As shown inFIG. 4 , thetransparent cup walls 140 and thesubstrate 110 form a cup-shaped structure, so that other elements may be disposed in the cup-shaped structure in the following process. In some embodiments, thetransparent cup walls 140 may include thermoplastic or thermosetting material, which corresponds to the different processes, such as injection molding or compression molding, forming thetransparent cup walls 140. -
FIG. 5 illustrates the cross-sectional view of an intermediate stage of the process forming thelight emitting diode 100. Thechip 120 is disposed on thesubstrate 110 and between thetransparent cup walls 140. Thechip 120 is disposed on thesubstrate 110 and connected to the outer source to provide the light source of thelight emitting diode 100. In some embodiments, thechip 120 is fixed on thesubstrate 110 by an adhesion layer. -
FIG. 6 illustrates the cross-sectional view of an intermediate stage of the process forming thelight emitting diode 100. Thewires 130 are connected to thechip 120, or the operation may be called “bonding.” Thewires 130 are connected to thechip 120 and the circuit of the wire bracket on thesubstrate 110. After thechip 120 and thewires 130 being disposed, thetransparent cup walls 140 surround thechip 120. In other words, thechip 120 is disposed in the cup-shaped structure formed by thetransparent cup walls 140 and thesubstrate 110. -
FIG. 7 illustrates the cross-sectional view of an intermediate stage of the process forming thelight emitting diode 100. Thewavelength conversion layer 150 is formed between thetransparent cup walls 140. Thewavelength conversion layer 150 is not only formed between thetransparent cup walls 140 but also formed above thechip 120 to cover thechip 120. Since thewavelength conversion layer 150 is formed between thetransparent cup walls 140 and thewavelength conversion layer 150 covers thechip 120, thewires 130, and thesubstrate 110, thechip 120 may be avoided from the corrosion caused by the environment. This increases the stability and efficiency of thelight emitting diode 100. - In some embodiments, the
wavelength conversion layer 150 may include the colloid with cohesion. Therefore, thewavelength conversion layer 150 forming between thetransparent cup walls 140 has atop surface 150 t recessing toward thechip 120. For example, as shown inFIG. 7 , the thickness from the central of thetop surface 150 t of thewavelength conversion layer 150 to thesubstrate 110 along the direction vertical to thesubstrate 110 is thickness H2. The thickness from the edge of thetop surface 150 t to thesubstrate 110 is thickness H3, and the thickness H3 is larger than the thickness H2. In some embodiments, the difference between the thickness H2 and the thickness H3 may be larger than about 30 μm. In some embodiments, the difference between the thickness H2 and the thickness H3 may be in a range of about 30 μm to about 100 μm. However, it should be understood that the thickness H2 and the thickness H3 of other values may be included according to the size or the material of thelight emitting diode 100. - In some embodiments, forming the
wavelength conversion layer 150 may include performing the dispensing process. The material of thewavelength conversion layer 150 is dispensed in the cup-shaped structure formed by thetransparent cup walls 140 and thesubstrate 110. In other words, thetransparent cup walls 140 and thesubstrate 110 define the side boundary and the bottom boundary of thewavelength conversion layer 150 so that thewavelength conversion layer 150 may be avoided from being processed by other cutting process or etching process (such as dry etch or wet etch). Since cutting process or etching process is not performed in the forming process of thewavelength conversion layer 150, thewavelength conversion layer 150 may not be affected by those processes (such as flash and crack caused by cutting process or graphitization and corrosion caused by etching process) which decreases the light emitting efficiency of thewavelength conversion layer 150. -
FIG. 8 illustrates the cross-sectional view of an intermediate stage of the process forming thelight emitting diode 100. Thereflective layer 160 is formed on thewavelength conversion layer 150, and the baking process is performed. Thereflective layer 160 includes abottom surface 160 b attached to thetop surface 150 t of thewavelength conversion layer 150, leading to thecurved bottom surface 160 b protruding toward thechip 120. In some embodiments, thereflective layer 160 may include the substantially flattop surface 160 t so that other elements may be easily formed on thelight emitting diode 100. - In some embodiments, forming the
reflective layer 160 may include performing the dispensing process, which the material of thereflective layer 160 is dispensed on thewavelength conversion layer 150. As shown inFIG. 8 , thereflective layer 160, thetransparent cup walls 140 and thesubstrate 110 may pack thewavelength conversion layer 150 into the cup-shaped structure of thelight emitting diode 100. This avoid the exposure of thewavelength conversion layer 150 to moisture, corrosion, or other environment factors and increases the stability of thelight emitting diode 100. - After forming the
reflective layer 160, thelight emitting diode 100 is baked to cure thelight emitting diode 100. In some embodiments, the baking process may include a plurality of heating stages to increase the adhesion between thereflective layer 160 and thewavelength conversion layer 150. This decrease the possibility of the penetration of moisture and air into thelight emitting diode 100. For example, the baking process may include three heating stages with gradient temperatures (such as about 80° C. for the first stage, about 100° C. for the second stage, and about 150° C. for the third stage). The first stage with a relative low temperature may reduce the viscosity of thewavelength conversion layer 150 so that thewavelength conversion layer 150 may be dispensed into the gaps in thelight emitting diode 100 with less ripple. The second stage with a temperature between that of the first stage and that of the third stage may decrease the stress caused by the rapid heating up to avoid the deformation of thelight emitting diode 100. The third stage with a relative high temperature may sufficiently cure thelight emitting diode 100 and increases the chemical adhesion between thereflective layer 160 and thewavelength conversion layer 150. - The present disclosure provides the light emitting diode structure including the reflective layer with the curved bottom surface above the light emitting chip to decrease the luminous intensity above the light emitting diode. The light emitting diode structure also includes the transparent cup walls disposed on the sides of the light emitting chip to increase the luminous intensity of the sides of the light emitting diode. The reflective layer and the transparent cup walls increase the beam angle range of the light emitting diode so that the requirement for the optical distance and the number of the light emitting diode may be reduced. This reduces the thickness of the backlight module using the light emitting diode of the present disclosure and increases the application possibility of the light emitting diode.
- In the light emitting diode structure forming process provided by the present disclosure, forming the cup-shaped structure with the transparent cup walls and the substrate and forming the wavelength conversion layer in the cup-shaped structure may avoid performing cutting process or etching process to the wavelength conversion layer. This process design is free from the defects caused by cutting and etching process and thereby improving the yield of the light emitting diode and decreasing the process cost.
- Although the present disclosure has been described in considerable detail with reference to certain embodiments thereof, other embodiments are possible. Therefore, the spirit and scope of the appended claims should not be limited to the description of the embodiments contained herein. It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the present disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the present disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims.
Claims (20)
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US18/328,112 US20230307596A1 (en) | 2020-12-07 | 2023-06-02 | Light emitting diode structure and backlight module |
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TW109143106A TWI762071B (en) | 2020-12-07 | 2020-12-07 | Light emitting diode structure, method of forming the same, and backlight module |
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US18/328,112 Pending US20230307596A1 (en) | 2020-12-07 | 2023-06-02 | Light emitting diode structure and backlight module |
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US20070086211A1 (en) * | 2005-10-18 | 2007-04-19 | Goldeneye, Inc. | Side emitting illumination systems incorporating light emitting diodes |
US20080310158A1 (en) * | 2007-06-18 | 2008-12-18 | Xicato, Inc. | Solid State Illumination Device |
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US8272758B2 (en) * | 2005-06-07 | 2012-09-25 | Oree, Inc. | Illumination apparatus and methods of forming the same |
KR20110115506A (en) * | 2010-04-15 | 2011-10-21 | 삼성엘이디 주식회사 | Light emitting diode package, lighting apparatus having the same and method of manufacturing a light emitting diode package |
TW201238085A (en) * | 2011-03-15 | 2012-09-16 | Lextar Electronics Corp | Light emitting diode package structure |
TWI523282B (en) * | 2013-03-08 | 2016-02-21 | 群創光電股份有限公司 | Led device and display device and electronic apparatus |
KR101575655B1 (en) * | 2014-10-10 | 2015-12-08 | 주식회사 루멘스 | Light emitting device package and backlight unit |
CN106784250A (en) * | 2017-01-05 | 2017-05-31 | 芜湖聚飞光电科技有限公司 | A kind of controllable chip-scale LED packagings of lighting angle and packaging technology |
US9799810B1 (en) * | 2017-03-30 | 2017-10-24 | Harvatek Corporation | Light emitting device |
CN109390456A (en) * | 2017-08-04 | 2019-02-26 | 亿光电子工业股份有限公司 | A kind of LED encapsulation structure and its manufacturing method |
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- 2020-12-07 TW TW109143106A patent/TWI762071B/en active
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2021
- 2021-06-09 CN CN202110641114.4A patent/CN113394324A/en active Pending
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US20070086211A1 (en) * | 2005-10-18 | 2007-04-19 | Goldeneye, Inc. | Side emitting illumination systems incorporating light emitting diodes |
US20080310158A1 (en) * | 2007-06-18 | 2008-12-18 | Xicato, Inc. | Solid State Illumination Device |
US20120250350A1 (en) * | 2011-03-30 | 2012-10-04 | Mangeun Kim | Display apparatus |
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US20230307596A1 (en) | 2023-09-28 |
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