US20200284953A1 - Gap fill of imprinted structure with spin coated high refractive index material for optical components - Google Patents
Gap fill of imprinted structure with spin coated high refractive index material for optical components Download PDFInfo
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- US20200284953A1 US20200284953A1 US16/884,117 US202016884117A US2020284953A1 US 20200284953 A1 US20200284953 A1 US 20200284953A1 US 202016884117 A US202016884117 A US 202016884117A US 2020284953 A1 US2020284953 A1 US 2020284953A1
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- 230000003287 optical effect Effects 0.000 title abstract description 36
- 239000000463 material Substances 0.000 title description 8
- 238000000034 method Methods 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 238000004528 spin coating Methods 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 235000012239 silicon dioxide Nutrition 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 5
- 229910000484 niobium oxide Inorganic materials 0.000 claims description 5
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 5
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 5
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 4
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims description 4
- 229910021426 porous silicon Inorganic materials 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 238000001723 curing Methods 0.000 claims 5
- 238000003848 UV Light-Curing Methods 0.000 claims 2
- 238000001029 thermal curing Methods 0.000 claims 2
- 230000003190 augmentative effect Effects 0.000 abstract description 16
- 239000002105 nanoparticle Substances 0.000 abstract description 13
- 239000011521 glass Substances 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
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- 239000012686 silicon precursor Substances 0.000 description 2
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- 239000005062 Polybutadiene Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- -1 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
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- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4272—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having plural diffractive elements positioned sequentially along the optical path
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0073—Optical laminates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00769—Producing diffraction gratings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
- B29D11/00875—Applying coatings; tinting; colouring on light guides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
- B29D11/00884—Spin coating
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
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- G—PHYSICS
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G02B5/1847—Manufacturing methods
- G02B5/1852—Manufacturing methods using mechanical means, e.g. ruling with diamond tool, moulding
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/0074—Production of other optical elements not provided for in B29D11/00009- B29D11/0073
- B29D11/00759—Branching elements for light guides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
- G02B2027/0174—Head mounted characterised by optical features holographic
Definitions
- Embodiments of the present disclosure generally relate to display devices for augmented, virtual, and mixed reality. More specifically, embodiments described herein provide a method for forming an optical component for a display device.
- Virtual reality is generally considered to be a computer generated simulated environment in which a user has an apparent physical presence.
- a virtual reality experience can be generated in 3D and viewed with a head-mounted display (HMD), such as glasses or other wearable display devices that have near-eye display panels as lenses to display a virtual reality environment that replaces an actual environment.
- HMD head-mounted display
- Augmented reality enables an experience in which a user can still see through the display lenses of the glasses or other HMD device to view the surrounding environment, yet also see images of virtual objects that are generated for display and appear as part of the environment.
- Augmented reality can include any type of input, such as audio and haptic inputs, as well as virtual images, graphics, and video that enhances or augments the environment that the user experiences.
- Both virtual reality and augmented reality display devices utilize optical components, such as waveguides or flat lens/meta surfaces, including a patterned layer having high refractive index (RI), such as 1.7 or higher.
- the refractive index is a ratio of the speed of light in a vacuum to the speed of light in the medium.
- Conventional method for forming the patterned high RI layer includes pressing a stamp having the pattern onto a layer of nanoparticles of the high RI material to transfer the pattern to the layer of nanoparticles.
- the resulting patterned high RI layer has either non-uniform dispersion of the nanoparticles in the patterned high RI layer or brittle structure due to weak bonding between nanoparticles.
- Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device.
- a method includes forming a first layer having a first refractive index on a substrate, pressing a stamp having a pattern onto the first layer, transferring the pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index greater than the first refractive index on the patterned first layer by spin coating.
- a method in another embodiment, includes forming a first layer having a first refractive index ranging from about 1.1 to about 1.5, pressing a stamp having a pattern onto the first layer, transferring the pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating.
- a method in another embodiment, includes forming a first layer having a first refractive index on a first surface of a substrate, pressing a first stamp having a first pattern onto the first layer, transferring the first pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating.
- the second layer includes a metal oxide.
- FIG. 1 is a flow diagram of a method for forming an optical component according to one embodiment described herein.
- FIGS. 2A-2D illustrate schematic cross-sectional views of the optical component during different stages of the method of FIG. 1 according to one embodiment described herein.
- FIGS. 3A-3D illustrate schematic cross-sectional views of an optical component during different stages according to one embodiment described herein.
- FIGS. 4A-4D illustrate schematic cross-sectional views of an optical component according to embodiments described herein.
- Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device.
- the method includes forming a first layer on a substrate, and the first layer has a first refractive index.
- the method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer.
- the method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index.
- the second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.
- FIG. 1 is a flow diagram of a method 100 for forming an optical component 200 according to one embodiment described herein.
- FIGS. 2A-2D illustrate schematic cross-sectional views of the optical component 200 during different stages of the method 100 of FIG. 1 according to one embodiment described herein.
- the method 100 starts at block 102 by forming a first layer 204 having a first RI on a substrate 202 , as shown in FIG. 2A .
- the substrate 202 is fabricated from a visually transparent material, such as glass.
- the substrate 202 has a RI ranging from about 1.4 to about 2.0.
- the first layer 204 is fabricated from a transparent material, and the first RI ranges from about 1.1 to about 1.5.
- the RI of the substrate 202 is the same as the first RI of the first layer 204 . In another embodiment, the RI of the substrate 202 is different from the first RI of the first layer 204 .
- the first layer 204 is fabricated from porous silicon dioxide, quartz, or any suitable material.
- the first layer 204 is formed on the substrate 202 by spin coating. For example, a solution including a silicon precursor is spin-coated onto the substrate 202 and then heated in oxygen environment to form the first layer 204 . In some embodiments, there are no nanoparticles dispersed in the solution. The silicon precursor is dissolved in the solution.
- a stamp 206 having a pattern 208 is pressed onto the first layer 204 , as shown in FIG. 2B .
- the stamp 206 is fabricated from any suitable material, such as silicon, quartz, glass, or a polymer.
- the polymer may be polyurethane, polybutadiene, polyisoprene, or poly(dimethylsiloxane) (PDMS).
- the pattern 208 formed on the stamp 206 may include a plurality of protrusions 210 and a plurality of gaps 212 . Adjacent protrusions 210 are separated by a gap 212 .
- the protrusions 210 may have any suitable shape.
- a curing process may be performed to cure the first layer 204 .
- the curing process may utilize UV light or thermal energy to cure the first layer 204 .
- the stamp 206 is removed from the cured first layer 204 , and the pattern 208 of the stamp 206 is transferred to the cured first layer 204 to form a patterned first layer 214 , as shown at block 106 in FIG. 1 and in FIG. 2C .
- the pattern 208 of the patterned first layer 214 includes a plurality of protrusions 216 and a plurality of gaps 218 . Adjacent protrusions 216 are separated by a gap 218 . As shown in FIG. 2C , the protrusion 216 has a rectangular shape. The protrusion 216 may have any other suitable shape. Examples of the protrusion 216 having different shapes are shown in FIGS. 4A-4D .
- the protrusions 216 are gratings.
- Gratings are a plurality of parallel elongated structures that splits and diffracts light into several beams traveling in different directions. Gratings may have different shapes, such as sine, square, triangle, or sawtooth gratings. Because the first layer 204 , or the patterned first layer 214 , does not contain any nanoparticles, there are no non-uniformity issues. Furthermore, the removal of the stamp 206 from the patterned first layer 214 does not damage the patterned first layer 214 , because the patterned first layer 214 is not formed by packing nanoparticles.
- a second layer 220 having a refractive index greater than that of the first layer 204 is formed on the patterned first layer 214 by spin coating, as shown in FIG. 2D .
- the second layer 220 includes metal oxides, such as titanium oxide (TiO x ), tantalum oxide (TaO x ), zirconium oxide (ZrO x ), hafnium oxide (HfO x ), or niobium oxide (NbO x ).
- the second layer 220 has a RI ranging from about 1.7 to about 2.4.
- the second layer 220 includes nanoparticles of the metal oxides dispersed in a polymer matrix or a carrier liquid, and the nanoparticles are uniformly distributed throughout the second layer 220 due to the spin coating method. Furthermore, because the patterned first layer 214 has the pattern 208 formed thereon, the second layer 220 is also patterned as the second layer 220 is spin coated on the patterned first layer 214 . As shown in FIG. 2D , the second layer 220 includes a plurality of protrusions 222 , and each protrusion 222 is formed in a corresponding gap 218 (as shown in FIG. 2C ) of the patterned first layer 214 .
- the protrusions 216 of the patterned first layer 214 and the protrusions 222 of the second layer 220 are alternately positioned. Because the pattern of the second layer 220 , i.e., the protrusions 222 , are formed without using a stamp to press thereonto, the pattern of the second layer 220 is not damaged and the nanoparticles of the metal oxide material are uniformly distributed in the second layer 220 .
- the optical component 200 including layers having different RIs may be used in any suitable display devices.
- the optical component 200 is used as a waveguide or waveguide combiner in augmented reality display devices.
- Waveguides are structures that guide optical waves.
- Waveguide combiners are used in augmented reality display devices that combine real world images with virtual images.
- the optical component 200 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR.
- FIGS. 2A-2D illustrate the method 100 for forming the optical component 200 including layers having different RIs on one side of the substrate 202 .
- both sides of the substrate 202 can be utilized to form layers having different RIs thereon.
- FIGS. 3A-3D illustrate schematic cross-sectional views of an optical component 300 during different stages according to one embodiment described herein.
- the substrate 202 includes a first surface 302 and a second surface 304 opposite the first surface 302 .
- the patterned first layer 214 and the second layer 220 are formed on the first surface 302 of the substrate 202 , as described in FIGS. 2A-2D .
- a third layer 306 is formed on the second surface 304 of the substrate 202 , and the third layer 306 is patterned by the stamp 206 , as shown in FIG. 3B .
- the third layer 306 may be fabricated from the same materials as the first layer 204 (as shown in FIG. 2A ).
- the third layer 306 may be formed by the same process as the first layer 204 .
- the stamp 206 includes the pattern 208 .
- the pattern 208 of the stamp 206 is transferred to the third layer 306 to form a patterned third layer 308 , and the stamp 206 is removed from the patterned third layer 308 .
- the patterned third layer 308 is cured by a curing process similar to the curing process performed on the patterned first layer 214 prior to removal of the stamp 206 .
- the patterned third layer 308 includes a plurality of protrusions 310 and a plurality of gaps 312 . Adjacent protrusions 310 are separated by a gap 312 .
- the patterned third layer 308 may be fabricated from the same material as the patterned first layer 214 and may have the same pattern as the patterned first layer 214 .
- the patterned third layer 308 may be identical to the patterned first layer 214 . In some embodiments, the patterned third layer 308 has a different pattern than the patterned first layer 214 .
- a fourth layer 316 is formed on the patterned third layer 308 by spin coating.
- the fourth layer 316 may be identical to the second layer 220 and may be fabricated by the same method as the second layer 220 .
- the fourth layer 316 includes a pattern, such as the plurality of protrusions 318 .
- the protrusions 310 of the patterned third layer 308 and the protrusions 318 of the fourth layer 316 are alternately positioned.
- the optical component 300 includes layers having different RIs formed on two surfaces of the substrate 202 .
- the optical component 300 may be used in any suitable display devices.
- the optical component 300 is used as a waveguide or waveguide combiner in augmented reality display devices.
- the optical component 300 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR.
- FIGS. 4A-4D illustrate schematic cross-sectional views of an optical component 400 according to embodiments described herein.
- the optical component 400 includes the substrate 202 , the patterned first layer 214 disposed on the substrate 202 , and the second layer 220 disposed on the patterned first layer 214 .
- the patterned first layer 214 includes a plurality of protrusions 402
- the second layer 220 includes a plurality of protrusions 403 .
- Each of the protrusions 402 , 403 has a parallelogramical cross-sectional area, as shown in FIG. 4A .
- the protrusions 402 , 403 may be gratings.
- the optical component 400 includes the substrate 202 , the patterned first layer 214 disposed on the substrate 202 , and the second layer 220 disposed on the patterned first layer 214 .
- the patterned first layer 214 includes a plurality of protrusions 404
- the second layer 220 includes a plurality of protrusions 405 .
- Each of the protrusions 404 , 405 has a triangular cross-sectional area, as shown in FIG. 4B .
- the protrusions 404 , 405 may be gratings.
- the optical component 400 includes the substrate 202 , the patterned first layer 214 disposed on the first surface 302 of the substrate 202 , and the second layer 220 disposed on the patterned first layer 214 .
- the patterned first layer 214 includes the plurality of protrusions 402
- the second layer 220 includes the plurality of protrusions 403 .
- the optical component 400 further includes the patterned third layer 308 disposed on the second surface 304 of the substrate 202 and the fourth layer 316 disposed on the patterned third layer 308 .
- the patterned third layer 308 includes a plurality of protrusions 406
- the fourth layer 316 includes a plurality of protrusions 407 .
- the protrusions 406 , 407 may be substantially the same as the protrusions 402 , 403 , respectively.
- the protrusions 402 , 403 , 406 , 407 may be gratings.
- the optical component 400 includes the substrate 202 , the patterned first layer 214 disposed on the first surface 302 of the substrate 202 , and the second layer 220 disposed on the patterned first layer 214 .
- the patterned first layer 214 includes the plurality of protrusions 404
- the second layer 220 includes the plurality of protrusions 405 .
- the optical component 400 further includes the patterned third layer 308 disposed on the second surface 304 of the substrate 202 and the fourth layer 316 disposed on the patterned third layer 308 .
- the patterned third layer 308 includes a plurality of protrusions 408
- the fourth layer 316 includes a plurality of protrusions 409 .
- the protrusions 408 , 409 may be substantially the same as the protrusions 404 , 405 , respectively.
- the protrusions 404 , 405 , 408 , 409 may be gratings.
- the optical component 400 may be used in any suitable display devices.
- the optical component 400 is used as a waveguide or waveguide combiner in augmented reality display devices.
- the optical component 400 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR.
- a method for forming an optical component including layers having different RIs is disclosed.
- a pattern is formed in the layer having a lower RI, and the layer having a higher RI is spin coated on the patterned layer with the lower RI.
- the spin coated layer having the higher RI has improved uniformity of nanoparticles of the high RI material.
- the layer having the higher RI is not damaged because imprinting of the layer having the higher RI using a stamp is avoided.
- the application of the optical component is not limited to augmented and virtual reality display devices and 3D sensing devices. The optical component can be used in any suitable applications.
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Abstract
Description
- This application claims priority to U.S. patent application Ser. No. 16/120,733, filed Sep. 4, 2018, which claims benefit of U.S. Provisional Patent Application Ser. No. 62/692,247, filed on Jun. 29, 2018, which herein is incorporated by reference.
- Embodiments of the present disclosure generally relate to display devices for augmented, virtual, and mixed reality. More specifically, embodiments described herein provide a method for forming an optical component for a display device.
- Virtual reality is generally considered to be a computer generated simulated environment in which a user has an apparent physical presence. A virtual reality experience can be generated in 3D and viewed with a head-mounted display (HMD), such as glasses or other wearable display devices that have near-eye display panels as lenses to display a virtual reality environment that replaces an actual environment.
- Augmented reality enables an experience in which a user can still see through the display lenses of the glasses or other HMD device to view the surrounding environment, yet also see images of virtual objects that are generated for display and appear as part of the environment. Augmented reality can include any type of input, such as audio and haptic inputs, as well as virtual images, graphics, and video that enhances or augments the environment that the user experiences.
- Both virtual reality and augmented reality display devices utilize optical components, such as waveguides or flat lens/meta surfaces, including a patterned layer having high refractive index (RI), such as 1.7 or higher. The refractive index is a ratio of the speed of light in a vacuum to the speed of light in the medium. Conventional method for forming the patterned high RI layer includes pressing a stamp having the pattern onto a layer of nanoparticles of the high RI material to transfer the pattern to the layer of nanoparticles. The resulting patterned high RI layer has either non-uniform dispersion of the nanoparticles in the patterned high RI layer or brittle structure due to weak bonding between nanoparticles.
- Accordingly, an improved method for forming optical components for virtual reality or augmented reality display devices is needed.
- Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, a method includes forming a first layer having a first refractive index on a substrate, pressing a stamp having a pattern onto the first layer, transferring the pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index greater than the first refractive index on the patterned first layer by spin coating.
- In another embodiment, a method includes forming a first layer having a first refractive index ranging from about 1.1 to about 1.5, pressing a stamp having a pattern onto the first layer, transferring the pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating.
- In another embodiment, a method includes forming a first layer having a first refractive index on a first surface of a substrate, pressing a first stamp having a first pattern onto the first layer, transferring the first pattern to the first layer to form a patterned first layer, and forming a second layer having a second refractive index ranging from about 1.7 to about 2.4 on the patterned first layer by spin coating. The second layer includes a metal oxide.
- So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only exemplary embodiments and are therefore not to be considered limiting of its scope, and may admit to other equally effective embodiments.
-
FIG. 1 is a flow diagram of a method for forming an optical component according to one embodiment described herein. -
FIGS. 2A-2D illustrate schematic cross-sectional views of the optical component during different stages of the method ofFIG. 1 according to one embodiment described herein. -
FIGS. 3A-3D illustrate schematic cross-sectional views of an optical component during different stages according to one embodiment described herein. -
FIGS. 4A-4D illustrate schematic cross-sectional views of an optical component according to embodiments described herein. - To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. It is contemplated that elements and features of one embodiment may be beneficially incorporated in other embodiments without further recitation.
- Embodiments of the present disclosure generally relate to a method for forming an optical component, for example, for a virtual reality or augmented reality display device. In one embodiment, the method includes forming a first layer on a substrate, and the first layer has a first refractive index. The method further includes pressing a stamp having a pattern onto the first layer, and the pattern of the stamp is transferred to the first layer to form a patterned first layer. The method further includes forming a second layer on the patterned first layer by spin coating, and the second layer has a second refractive index greater than the first refractive index. The second layer having the high refractive index is formed by spin coating, leading to improved nanoparticle uniformity in the second layer.
-
FIG. 1 is a flow diagram of amethod 100 for forming anoptical component 200 according to one embodiment described herein.FIGS. 2A-2D illustrate schematic cross-sectional views of theoptical component 200 during different stages of themethod 100 ofFIG. 1 according to one embodiment described herein. Themethod 100 starts atblock 102 by forming afirst layer 204 having a first RI on asubstrate 202, as shown inFIG. 2A . In one embodiment, thesubstrate 202 is fabricated from a visually transparent material, such as glass. Thesubstrate 202 has a RI ranging from about 1.4 to about 2.0. Thefirst layer 204 is fabricated from a transparent material, and the first RI ranges from about 1.1 to about 1.5. In one embodiment, the RI of thesubstrate 202 is the same as the first RI of thefirst layer 204. In another embodiment, the RI of thesubstrate 202 is different from the first RI of thefirst layer 204. Thefirst layer 204 is fabricated from porous silicon dioxide, quartz, or any suitable material. In one embodiment, thefirst layer 204 is formed on thesubstrate 202 by spin coating. For example, a solution including a silicon precursor is spin-coated onto thesubstrate 202 and then heated in oxygen environment to form thefirst layer 204. In some embodiments, there are no nanoparticles dispersed in the solution. The silicon precursor is dissolved in the solution. - Next, at
block 104, astamp 206 having apattern 208 is pressed onto thefirst layer 204, as shown inFIG. 2B . Thestamp 206 is fabricated from any suitable material, such as silicon, quartz, glass, or a polymer. The polymer may be polyurethane, polybutadiene, polyisoprene, or poly(dimethylsiloxane) (PDMS). Thepattern 208 formed on thestamp 206 may include a plurality ofprotrusions 210 and a plurality ofgaps 212.Adjacent protrusions 210 are separated by agap 212. Theprotrusions 210 may have any suitable shape. After thestamp 206 is pressed onto thefirst layer 204, a curing process may be performed to cure thefirst layer 204. The curing process may utilize UV light or thermal energy to cure thefirst layer 204. - After the
first layer 204 is cured, thestamp 206 is removed from the curedfirst layer 204, and thepattern 208 of thestamp 206 is transferred to the curedfirst layer 204 to form a patternedfirst layer 214, as shown atblock 106 inFIG. 1 and inFIG. 2C . Thepattern 208 of the patternedfirst layer 214 includes a plurality ofprotrusions 216 and a plurality ofgaps 218.Adjacent protrusions 216 are separated by agap 218. As shown inFIG. 2C , theprotrusion 216 has a rectangular shape. Theprotrusion 216 may have any other suitable shape. Examples of theprotrusion 216 having different shapes are shown inFIGS. 4A-4D . In one embodiment, theprotrusions 216 are gratings. Gratings are a plurality of parallel elongated structures that splits and diffracts light into several beams traveling in different directions. Gratings may have different shapes, such as sine, square, triangle, or sawtooth gratings. Because thefirst layer 204, or the patternedfirst layer 214, does not contain any nanoparticles, there are no non-uniformity issues. Furthermore, the removal of thestamp 206 from the patternedfirst layer 214 does not damage the patternedfirst layer 214, because the patternedfirst layer 214 is not formed by packing nanoparticles. - Next, at
block 108, asecond layer 220 having a refractive index greater than that of thefirst layer 204 is formed on the patternedfirst layer 214 by spin coating, as shown inFIG. 2D . Thesecond layer 220 includes metal oxides, such as titanium oxide (TiOx), tantalum oxide (TaOx), zirconium oxide (ZrOx), hafnium oxide (HfOx), or niobium oxide (NbOx). In one embodiment, thesecond layer 220 has a RI ranging from about 1.7 to about 2.4. In one embodiment, thesecond layer 220 includes nanoparticles of the metal oxides dispersed in a polymer matrix or a carrier liquid, and the nanoparticles are uniformly distributed throughout thesecond layer 220 due to the spin coating method. Furthermore, because the patternedfirst layer 214 has thepattern 208 formed thereon, thesecond layer 220 is also patterned as thesecond layer 220 is spin coated on the patternedfirst layer 214. As shown inFIG. 2D , thesecond layer 220 includes a plurality ofprotrusions 222, and eachprotrusion 222 is formed in a corresponding gap 218 (as shown inFIG. 2C ) of the patternedfirst layer 214. Theprotrusions 216 of the patternedfirst layer 214 and theprotrusions 222 of thesecond layer 220 are alternately positioned. Because the pattern of thesecond layer 220, i.e., theprotrusions 222, are formed without using a stamp to press thereonto, the pattern of thesecond layer 220 is not damaged and the nanoparticles of the metal oxide material are uniformly distributed in thesecond layer 220. - After the spin coating of the
second layer 220, a curing process may be performed to cure thesecond layer 220. The curing process of thesecond layer 220 may be the same as the curing process of the patternedfirst layer 214. Theoptical component 200 including layers having different RIs may be used in any suitable display devices. For example, in one embodiment, theoptical component 200 is used as a waveguide or waveguide combiner in augmented reality display devices. Waveguides are structures that guide optical waves. Waveguide combiners are used in augmented reality display devices that combine real world images with virtual images. In another embodiment, theoptical component 200 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR. -
FIGS. 2A-2D illustrate themethod 100 for forming theoptical component 200 including layers having different RIs on one side of thesubstrate 202. In some embodiments, both sides of thesubstrate 202 can be utilized to form layers having different RIs thereon.FIGS. 3A-3D illustrate schematic cross-sectional views of anoptical component 300 during different stages according to one embodiment described herein. As shown inFIG. 3A , thesubstrate 202 includes afirst surface 302 and asecond surface 304 opposite thefirst surface 302. The patternedfirst layer 214 and thesecond layer 220 are formed on thefirst surface 302 of thesubstrate 202, as described inFIGS. 2A-2D . Next, athird layer 306 is formed on thesecond surface 304 of thesubstrate 202, and thethird layer 306 is patterned by thestamp 206, as shown inFIG. 3B . Thethird layer 306 may be fabricated from the same materials as the first layer 204 (as shown inFIG. 2A ). Thethird layer 306 may be formed by the same process as thefirst layer 204. Thestamp 206 includes thepattern 208. - Next, as shown in
FIG. 3C , thepattern 208 of thestamp 206 is transferred to thethird layer 306 to form a patternedthird layer 308, and thestamp 206 is removed from the patternedthird layer 308. The patternedthird layer 308 is cured by a curing process similar to the curing process performed on the patternedfirst layer 214 prior to removal of thestamp 206. The patternedthird layer 308 includes a plurality ofprotrusions 310 and a plurality ofgaps 312.Adjacent protrusions 310 are separated by agap 312. The patternedthird layer 308 may be fabricated from the same material as the patternedfirst layer 214 and may have the same pattern as the patternedfirst layer 214. In other words, the patternedthird layer 308 may be identical to the patternedfirst layer 214. In some embodiments, the patternedthird layer 308 has a different pattern than the patternedfirst layer 214. Next, as shown inFIG. 3D , afourth layer 316 is formed on the patternedthird layer 308 by spin coating. Thefourth layer 316 may be identical to thesecond layer 220 and may be fabricated by the same method as thesecond layer 220. Thefourth layer 316 includes a pattern, such as the plurality ofprotrusions 318. Theprotrusions 310 of the patternedthird layer 308 and theprotrusions 318 of thefourth layer 316 are alternately positioned. Theoptical component 300 includes layers having different RIs formed on two surfaces of thesubstrate 202. Theoptical component 300 may be used in any suitable display devices. For example, in one embodiment, theoptical component 300 is used as a waveguide or waveguide combiner in augmented reality display devices. In another embodiment, theoptical component 300 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR. -
FIGS. 4A-4D illustrate schematic cross-sectional views of anoptical component 400 according to embodiments described herein. As shown inFIG. 4A , theoptical component 400 includes thesubstrate 202, the patternedfirst layer 214 disposed on thesubstrate 202, and thesecond layer 220 disposed on the patternedfirst layer 214. The patternedfirst layer 214 includes a plurality ofprotrusions 402, and thesecond layer 220 includes a plurality ofprotrusions 403. Each of theprotrusions FIG. 4A . Theprotrusions - As shown in
FIG. 4B , theoptical component 400 includes thesubstrate 202, the patternedfirst layer 214 disposed on thesubstrate 202, and thesecond layer 220 disposed on the patternedfirst layer 214. The patternedfirst layer 214 includes a plurality ofprotrusions 404, and thesecond layer 220 includes a plurality ofprotrusions 405. Each of theprotrusions FIG. 4B . Theprotrusions - As shown in
FIG. 4C , theoptical component 400 includes thesubstrate 202, the patternedfirst layer 214 disposed on thefirst surface 302 of thesubstrate 202, and thesecond layer 220 disposed on the patternedfirst layer 214. The patternedfirst layer 214 includes the plurality ofprotrusions 402, and thesecond layer 220 includes the plurality ofprotrusions 403. Theoptical component 400 further includes the patternedthird layer 308 disposed on thesecond surface 304 of thesubstrate 202 and thefourth layer 316 disposed on the patternedthird layer 308. The patternedthird layer 308 includes a plurality ofprotrusions 406, and thefourth layer 316 includes a plurality ofprotrusions 407. Theprotrusions protrusions protrusions - As shown in
FIG. 4D , theoptical component 400 includes thesubstrate 202, the patternedfirst layer 214 disposed on thefirst surface 302 of thesubstrate 202, and thesecond layer 220 disposed on the patternedfirst layer 214. The patternedfirst layer 214 includes the plurality ofprotrusions 404, and thesecond layer 220 includes the plurality ofprotrusions 405. Theoptical component 400 further includes the patternedthird layer 308 disposed on thesecond surface 304 of thesubstrate 202 and thefourth layer 316 disposed on the patternedthird layer 308. The patternedthird layer 308 includes a plurality ofprotrusions 408, and thefourth layer 316 includes a plurality ofprotrusions 409. Theprotrusions protrusions protrusions optical component 400 may be used in any suitable display devices. For example, in one embodiment, theoptical component 400 is used as a waveguide or waveguide combiner in augmented reality display devices. In another embodiment, theoptical component 400 is used as a flat lens/meta surfaces in augmented and virtual reality display devices and 3D sensing devices, such as face ID and LIDAR. - A method for forming an optical component including layers having different RIs is disclosed. A pattern is formed in the layer having a lower RI, and the layer having a higher RI is spin coated on the patterned layer with the lower RI. The spin coated layer having the higher RI has improved uniformity of nanoparticles of the high RI material. Furthermore, the layer having the higher RI is not damaged because imprinting of the layer having the higher RI using a stamp is avoided. The application of the optical component is not limited to augmented and virtual reality display devices and 3D sensing devices. The optical component can be used in any suitable applications.
- While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.
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