KR101769749B1 - Manufacturing method of double-sided pattern with horizontally controlled-refractive index and double-sided pattern thereby - Google Patents
Manufacturing method of double-sided pattern with horizontally controlled-refractive index and double-sided pattern thereby Download PDFInfo
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- KR101769749B1 KR101769749B1 KR1020150185329A KR20150185329A KR101769749B1 KR 101769749 B1 KR101769749 B1 KR 101769749B1 KR 1020150185329 A KR1020150185329 A KR 1020150185329A KR 20150185329 A KR20150185329 A KR 20150185329A KR 101769749 B1 KR101769749 B1 KR 101769749B1
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- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2201/00—Polymeric substrate or laminate
- B05D2201/02—Polymeric substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2502/00—Acrylic polymers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2503/00—Polyurethanes
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Abstract
BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a method of manufacturing a double-sided pattern having a controlled refractive index in a horizontal direction and a double-sided pattern produced by the method, and a first stamp on which a microstructure pattern and an align key are formed, A first step of engraving the polymer substrate with a first pattern which is opposite in phase to the microstructure pattern of the first stamp and displaying an alignment mark; and a step of separating the first stamp from the polymer substrate imprinted with the first pattern A second step of forming a first pattern on the polymer substrate, a second step of applying a fluid material on the polymer substrate on which the first pattern is formed, and forming a lower pattern opposite to the first pattern on the lower side of the fluid material And a second stamp on which a microstructure pattern and an align key are formed, is placed on the applied fluid material, and a pressing process is performed A second step of separating the second stamp from the fluid material imprinted with the upper pattern to form a flowable material on the polymer substrate, And a second step of aligning the alignment mark of the second stamp with the alignment mark displayed on the polymer substrate, and then aligning the alignment mark of the second stamp on the flexible material, And controlling the pressing force of the second stamp applied in the horizontal direction of the fluid material so as to control the refractive index of the second stamp in the horizontal direction and controlling the refractive index in the horizontal direction, Let the pattern be its technical point. Thus, the present invention can simultaneously form a double-sided pattern by a simple process, and in particular, by using an alignment mark in a hot forming and an imprint process, it is possible to provide a double-sided pattern in which the refractive index in the horizontal direction is controlled, It can be easily transferred to a substrate or a thin film and can be utilized in various fields.
Description
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a double-sided pattern and a double-sided pattern produced thereby, and a double-sided pattern having a controlled refractive index in a horizontal direction can be simultaneously formed by a simple process. A double-sided pattern having a refractive index controlled in a horizontal direction which can be applied to various fields, and a double-sided pattern produced thereby.
2. Description of the Related Art In recent years, studies have been actively made on a fabrication method for forming various types of patterns in accordance with the trend of high integration and miniaturization of electronic devices, and these patterns are formed in the form of fine (nano or micro) .
In particular, the microstructures can be formed of various materials such as metals, non-metals, dielectrics, semiconductors, magnetic materials, and the like, and they are used variously in optical, electrical, and magnetic devices by controlling their sizes and shapes.
Generally, the formation of such a microstructure pattern has been performed by a thin film deposition, patterning and etching process on a substrate. However, it is difficult to obtain uniform and aligned microstructures due to adhesion or deformation between microstructure patterns, There were complications.
Accordingly, Applicant has made various attempts to obtain a microstructure. Korean Patent Application No. 10-2008-0098598 (Method for forming metal nanostructure and metal nanostructure formed by the method), Application No. 10-2011- 0073391 (Aligned nanostructures with three-dimensional structure using imprint lithography and lift-off process and method for manufacturing the same), Application No. 10-2011-0117471 (Production of refractive index-controlled multilayer nanostructure using imprint lithography and lift- No. 10-2011-0135977 (a method for manufacturing a three-dimensional nanostructure using imprint lithography, and a three-dimensional nanostructure produced thereby), and the like have been filed.
However, such microstructures generally exhibit a cross-sectional pattern pattern in which a pattern is formed on a substrate. Therefore, studies on double-side patterns related to the present invention are rare.
In general, an injection molding process is in progress to form a double-sided microstructure. A mold for such an injection molding process is formed between an upper core and a lower core, and an upper core and a lower core, and is composed of a cavity into which molten microstructure material is injected.
When the molten microstructure material is injected into the cavity and molding, curing and cooling are completed, the upper and lower cores are separated and the formed microstructure is ejected.
However, this method has a problem in that the shape and dimension of the actual pattern are likely to be deformed by the variables such as temperature and pressure during the microstructure forming process, and breakage of the microstructure occurs during the separation of the core and the ejection process .
This problem becomes more prominent particularly when a nano-scale microstructure is manufactured, and also it is very difficult to manufacture a metal mold having a nano-scale microstructure.
In addition, a method of fabricating a pattern in which the refractive index in the vertical direction is controlled by adjusting the composition of the material is known in the manufacture of such a microstructure, but it is difficult to control the refractive index of the microstructure in the horizontal direction.
SUMMARY OF THE INVENTION The present invention is directed to a method for manufacturing a double-sided pattern having a refractive index controlled in a horizontal direction capable of simultaneously forming a double-sided pattern whose refractive index is controlled in a horizontal direction by a simple process such as hot forming and imprinting, The present invention has been made to solve the above problems.
According to an aspect of the present invention, there is provided a method of manufacturing a microstructure, comprising: positioning a first stamp having a microstructure pattern and an align key on a polymer substrate and hot forming the microstructure pattern; A first step of stamping the first pattern and displaying an alignment mark; a second step of separating the first stamp from the polymer substrate imprinted with the first pattern to form a first pattern on the polymer substrate; A third step of applying a fluid material on the polymer substrate on which the first pattern is formed and forming a lower pattern opposite to the first pattern on the lower surface of the fluid material; And a second stamp on which an align key is formed are placed and pressed, and a curing process is performed to form an image on the upper surface of the fluid material in a phase opposite to the microstructure pattern of the second stamp And a fifth step of separating the second stamp from the fluid material imprinted with the upper pattern to form a double-sided pattern made of a fluid material on the polymer substrate, The fourth step includes aligning the alignment mark on the polymer substrate and the alignment mark of the second stamp, and positioning the second stamp on the flexible material to align the alignment mark of the second stamp applied in the horizontal direction of the flexible material Wherein the refractive index is controlled in a horizontal direction and the refractive index is controlled in a horizontal direction, and the pressing force is controlled. The present invention also provides a two-sided pattern manufactured by the method.
It is preferable that the first stamp is made of any one of silicon (Si), silicon oxide (SiO 2 ), quartz, nickel (Ni), copper (Cu) , An anti-stiction surface treatment process is preferably performed.
The polymer substrate of the first step may be a polymer substrate such as a polycarbonate (PC), a polyethylene naphthalate (PEN), a polynorbornene (PN), a polyacrylate, a polyvinyl alcohol alcohol, PVA), polyimide (PI), polyethylene terephthalate (PET), polyethersulfone (PES), polystyrene (PS), polypropylene (PP) (PE), polyvinylchloride (PVC), polyamide (PA), polybutyleneterephthalate (PBT), polymethyl methacrylate (PMMA) and polydimethylsiloxane PDMS).
The hot forming in the first step may be performed at a temperature higher than the glass transition temperature of the polymer substrate, and the pressure applied is preferably 1.5 to 50 bar.
It is preferable that the fluid material in the third step is any one of a photocurable resin composition, a thermosetting resin composition, a natural curing resin composition, a transparent resin composition, a conductive paste and a photosensitive metal-organic precursor, The application of the fluid material is preferably implemented by any one of dropping, spray coating, spin coating and printing.
It is preferable that the second stamp is made of any one of silicon (Si), silicon oxide (SiO 2 ), quartz, nickel (Ni), copper (Cu), glass and a polymer, , PDMS (Polydimethylsiloxane), PUA (Polyurethane acrylate), ETFE (Ethylene tetrafluoroethylene), PFA (Perfluoroalkyl acrylate), PFPE (Perfluoropolyether) and PTFE (Polytetrafluoroethylene).
In addition, it is preferable that an anti-stiction surface treatment process is performed on the second stamp in the fourth step.
The curing step of the fourth step may be implemented by a photocuring method of irradiating the fluid material with ultraviolet rays for 5 seconds to 1 hour while pressing the second stamp or irradiating the microwave for 5 seconds to 1 hour, And the heat is applied to the fluid material while pressurizing the second stamp at a temperature in the range of 50 DEG C to 200 DEG C for 15 seconds to 1 hour.
In addition, after the fifth step, it is preferable that the photomask having the alignment mark is aligned on the polymer substrate having the double-sided pattern formed thereon, and ultraviolet rays or heat are irradiated to a part of the area on the double-
Preferably, the method further comprises the step of transferring the polymer substrate having the double-sided pattern formed of the fluid material to the different substrate or thin film using the transfer tape after the fifth step, (Polycarbonate) (PC), or any one of inorganic substrates such as silicon (Si), gallium arsenide (GaAs), gallium phosphorus (GaP), gallium arsenide (GaAsP), SiC, GaN, ZnO, MgO, sapphire, quartz, , Polyethylene naphthalate (PEN), polynorbornene (PN), polyacrylate, polyvinyl alcohol (PVA), polyimide (PI), polyethylene terephthalate terephthalate (PET), polyethersulfone (PES), polystyrene (PS), polypropylene (PP), polyethylene (PE), polyvinylchloride It is preferably a polymer substrate of any one of polyamide (PA), polybutylene tererephthalate (PBT), polymethyl methacrylate (PMMA), and polydimethylsiloxane (PDMS).
The transferring step may be performed by providing the transfer tape in the form of a roll to transfer the two-sided pattern of the transfer tape to the different substrate or thin film, bringing the transfer tape into contact with the dissimilar substrate or thin film, It is preferable that the double-side pattern of the transfer tape is transferred to the different substrate or the thin film.
It is also preferable to transfer the double-side pattern onto the different substrate or thin film, and then transfer the double-side pattern to another different substrate or thin film.
Here, it is preferable that an adhesion promoter surface treatment process is performed on the dissimilar substrate or the thin film upper portion before the transfer step after the fifth step.
In addition, it is preferable that the application of the fluid material in the third step adjusts the thickness of the interlayer between the lower pattern and the upper pattern according to the thickness adjustment for applying the fluid material, and the upper pattern and the lower pattern The thickness of the interlayer film is preferably 10 nm to 100 mu m.
Meanwhile, it is preferable that the double-sided pattern is formed of any one of a composite structure in which a nanostructure, a microstructure, a nano-structure, and a microstructure are complexly formed.
The upper and lower patterns of the double-sided pattern may be formed in any one of a horn shape, a columnar shape, a spherical shape, and a semi-spherical shape, and these shapes are preferably formed in a convex or concave shape.
The present invention can simultaneously form a double-sided pattern by a simple process and can provide a double-sided pattern in which the refractive index in the horizontal direction is controlled by using an alignment key in a hot forming and an imprint process, It can be easily transferred to a thin film, so that it can be utilized in various fields.
In addition, a double-sided pattern in which the refractive index is controlled in the horizontal direction by the difference in pressure applied to the double-sided pattern by the second stamp can be formed, and ultraviolet rays or heat can be locally applied to a part of the double- It is possible to additionally control the refractive index in the horizontal direction.
In addition, it is easy to mold the microstructure as well as the nanostructure or composite structure by using the hot stamping process using the first stamp and the polymer substrate, the application of the fluid material, and the imprint process using the second stamp, A high-quality pattern can be realized when a microstructure is formed.
Also, there is an effect of solving the shape and size deformation of the actual pattern, breakage of the micro-nano structure, and difficulty of manufacturing the nano-structured metal mold, which are the problems of the injection molding used in the past.
Figs. 1 and 2 are schematic views of a method of manufacturing a double-sided pattern according to the present invention. Fig.
FIG. 3 and FIG. 4 are photographs of a pattern according to an embodiment of the present invention. FIG.
5 is a graph showing a refractive index change of a Zr-organic precursor thin film according to an ultraviolet time (irradiation amount) according to an embodiment of the present invention.
6 is a graph showing a change in refractive index of a Ti-organic precursor thin film according to ultraviolet time (irradiation dose) according to an embodiment of the present invention.
The present invention can simultaneously form a double-sided pattern by a simple process, and can provide a double-sided pattern in which the refractive index in the horizontal direction is controlled by using an alignment key in a hot forming and an imprint process, Sided pattern capable of being easily transferred to a thin film.
In the present invention, the lower pattern is formed by hot embossing lithography using a polymer substrate, and the upper pattern is formed by ultraviolet (UV), microwave, or thermal imprint lithography Thus, a double-sided pattern can be formed at the same time by a simple process, and then transferred to a substrate or a thin film of a different kind, so that it can be utilized in various fields.
In addition, it is also possible to transfer the double-side pattern onto the different substrate or thin film, and then transfer the double-side pattern to another different substrate or thin film, thereby changing the upper and lower sides of the microstructure pattern of the double- It can be used variously according to the purpose of the double-sided pattern.
Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. FIGS. 1 and 2 are schematic views of a method for manufacturing a double-sided pattern according to the present invention. FIGS. 3 and 4 are photographs of a pattern according to an embodiment of the present invention. FIG. 6 is a graph showing changes in refractive index of a Ti-organic precursor thin film according to ultraviolet time (irradiation amount) according to an embodiment of the present invention. FIG. 6 is a graph showing a change in refractive index of a Zr- Fig.
FIG. 1 (a) is a schematic view for producing a lower pattern of a double-sided pattern according to the present invention, FIG. 1 (b) is a schematic view for producing an upper pattern, 1 is a schematic view showing a process of transferring a double-side pattern onto a substrate or a thin film of a different type using a polymer substrate having a double-sided pattern formed of a material as a transfer tape. 2 (b) is a schematic view showing a process of forming a lower pattern and an upper pattern, and FIG. 2 (b) To improve the refractive index change ratio.
1, a method for manufacturing a double-sided pattern according to the present invention includes a
First, in the first step, a
An
That is, the
The microstructure of the present invention may be formed of a nano-structure of nanosize, a micro-structure of micro-size, or a complex structure in which patterns of nano-size or micro-size are repeatedly or irregularly arranged, The
In addition, the microstructure may be formed in a variety of shapes such as a circular shape or a polygonal shape, or may be formed in a variety of shapes, such as a horn shape, a column shape, a spherical shape, and a semi-spherical shape. This is accomplished by properly processing the shape of the stamp to imprint the pattern.
Meanwhile, it is preferable that the pressure is in the range of 1.5 bar to 50 bar when heated at a temperature higher than the glass transition temperature of the
That is, after the
Accordingly, the
When the
In a specific embodiment, the
On the other hand, an anti-stiction surface treatment process is preferably performed on the
This is accomplished by performing a surface treatment process to prevent adhesion on the upper surface of the
Here, the anti-stick surface treatment step may be performed by coating the upper surface of the
Examples of the anti-adhesion material include octadecyltrichlorosilane (OTS), 1H, 1H, 2H, 2H-perfluorodecyltrichlorosilane (FDTS), tridecafluoro-1,1,2,2-tetra-hydroctyltrichlorosilane (FOTS), dichlorodimethylsilane carbon (DLC) may be used.
The hydrophobic treatment on the upper surface of the
The
In the second step according to the present invention, the
That is, after the
The reversed phase of the
A third step according to the present invention is a method of manufacturing a semiconductor device including a step of applying a
The
Here, the application of the
Such a
The photosensitive metal-organic precursor layer may include at least one selected from the group consisting of lithium, beryllium, boron, sodium, magnesium, aluminum, silicon, indium, S, K, Ca, Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Rb, Sr, Y, (Zr), niobium (Nb), molybdenum (Mo), ruthenium (Ru), rhodium (Rh), indium (In), tin (Sn), tellurium (Te), antimony (Sb) (Ir), lanthanum (La), cerium (Ce), praseodymium (Pr), neodymium (Nd), promethium (Pm), gadolinium (Gd), hafnium (Hf), tantalum , Lead (Pb), bismuth (Bi), polonium (Po), or uranium (U).
Also, the photosensitive metal-organic precursor layer may be formed of a material selected from the group consisting of Ethylhexanoate, Acetylacetonate, Dialkyldithiocarbamates, Carboxylic acids, Carboxylates, Pyridine, Diamines, Arsines, Diarsines, Phosphines, Diphosphines, Butoxide, Isopropoxide, Ethoxine, It is also possible to use a combination of two or more of the following: Ethoxide, Chloride, Acetate, Carbonyl, Carbonate, Hydroxide, Arenas, Beta-Diketonate ), 2-Nitrobenzaldehyde, or Acetate Dihydrate. The organic ligand may be at least one of the following:
Also, the photosensitive metal-organic precursor layer may be formed of at least one selected from the group consisting of hexane, 4-methyl-2-pentanone, ketone, methyl isobutyl ketone, methyl ethyl ketone, water, methanol, ethanol, (Such as dimethyl sulfoxide (DMSO), dimethylformamide (DMF), N-methylpyrrolidone, acetone, acetonitrile, tetrahydrofuran (THF), isopropanol, And may be produced using at least one solvent selected from the group consisting of n-butanol, n-butanol, 2-methoxyethanol, n-butanol,
The application of the
That is, the
In the fourth step according to the present invention, the
The
Specifically, a
Here, the pressing force of the
In other words, when the center point of the
Therefore, the double-
On the other hand, in the fourth step, the
That is, when the
Here, the polymer may be formed by using any one of PDMS (Polydimethylsiloxane), PUA (Polyurethane acrylate), ETFE (Ethylene tetrafluoroethylene), PFA (Perfluoroalkyl acrylate), PFPE (Perfluoropolyether) and PTFE (Polytetrafluoroethylene) ) Can be produced.
Also, it is preferable that an anti-stiction surface treatment process is performed on the upper portion of the
This is because the
Here, the anti-stick surface treatment process is the same as that in the
On the other hand, the curing step may be performed by irradiating the
In the fifth step according to the present invention, the
That is, when the
In other words, the
2 (b), the
That is, the
Here, the
That is, in the fourth step, the double-
During the curing process by the
That is, in order to prevent complete curing in the curing process by the
As described above, the present invention can realize a double-sided pattern in which the refractive index is controlled in the horizontal direction due to the pressure difference of the second stamp applied to the fluid material in accordance with the double-sided pattern shape, The mask is placed on the polymer substrate on which the double-sided pattern is formed of the fluid material so that the refractive index of the region on the double-sided pattern irradiated with ultraviolet rays or heat is further increased and the rate of change of the refractive index in the horizontal direction is further improved.
In addition, a double-sided pattern made of a fluid material and having a controlled refractive index in a horizontal direction can be formed on such a polymer substrate to be used for various optical, electrical, and magnetic devices using a flexible polymer substrate.
On the other hand, the
In other words, the double-
Here, the different types of substrates may be any one of silicon (Si), gallium arsenide (GaAs), gallium arsenide (GaP), gallium arsenide (GaAsP), SiC, GaN, ZnO, MgO, sapphire, quartz, Or an inorganic substrate or a polycarbonate (PC), a polyethylene naphthalate (PEN), a polynorbornene (PN), a polyacrylate, a polyvinyl alcohol (PVA) Polyimide (PI), Polyethylene terephthalate (PET), Polyethersulfone (PES), Polystyrene (PS), Polypropylene (PP), Polyethylene (PDMS), such as polyvinyl chloride (PVC), polyamide (PA), polybutyleneterephthalate (PBT), polymethyl methacrylate (PMMA) and polydimethylsiloxane pole A reamer substrate or the like can be used.
In the transferring step, the
Meanwhile, it is preferable that an adhesion promoter surface treatment process is performed on the dissimilar substrate or the
As the promoter resin, hexamethyldisilzane (HMDS), acryloxypropyl methyl dichlorosilane (APMDS), 3-glycidoxypropyltrimethoxysilane (GPTS), aminopropyltriethoxysilane (APTS), aminoalkyltrimethoxysilane (ATS), 3-aminopropyltriethoxysilane APTES), and Oxygen plasma treatment.
As described above, when the two-sided patterned fluid material on the polymer substrate according to the present invention is transferred to the dissimilar substrate, the lower pattern of the two-sided patterns is formed on the upper pattern of the two-sided patterns on the different substrate, And is formed in the lower pattern of the patterns.
In addition, it is also possible to transfer the double-side pattern onto the different substrate or thin film, and then transfer the double-side pattern to another different substrate or thin film, thereby changing the upper and lower sides of the microstructure pattern of the double- It can be used variously according to the use of double-sided pattern.
Hereinafter, embodiments of the present invention will be described. FIGS. 3 and 4 are schematic views of an embodiment of the present invention and photographs of patterns according to each embodiment.
3 is a view illustrating a
First, a Si stamp (first stamp 20) having a line width of 7 mu m, a pitch of 80 mu m, a line width of 7 mu m and a pitch of 250 mu m and an
Thereafter, the Si stamp and the PC sheet were demolded. The micro pattern on which the 7 탆 line depressed, which is a reverse phase of the microstructure pattern (microsize pattern) 41 on the Si stamp, was stamped on the PC sheet as shown in FIG. 4,
As shown in FIG. 4, after the UV (curable) resin composition was dropped on the top of the PC sheet on which the 7 탆 line of FIG. 3 was stamped, the same microstructure pattern was formed, but the negative / (Second stamp 40) having the
That is, it can be confirmed that a high-refractive index region is formed in a portion intensively pressed by both patterns, and a relatively low-refractive index region is formed in other regions, thereby realizing a double-sided pattern in which the refractive index is controlled in the horizontal direction.
5 and 6 are views for observing changes in refractive index when ultraviolet light is irradiated when a photosensitive metal-organic precursor is used as a flowable material. FIG. 5 is a graph showing changes in ultraviolet time (irradiation amount) according to an embodiment of the present invention FIG. 6 shows a refractive index change of a Ti-organic precursor thin film according to an ultraviolet time (irradiation amount) according to an embodiment of the present invention.
FIG. 5 is a schematic view showing a method of synthesizing a photosensitive Zr-organic precursor resin using zirconium (VI) 2-ethylhexanoate [Zr (VI) 2-ethylhexanoate, Strem Co., USA) and hexane (Hexanes, Aldrich Co., The prepared photosensitive Zr-organic precursor resin was spin-coated on the Si substrate at 3000 rpm for 60 seconds and irradiated with ultraviolet rays at 0, 10, 30, and 50 minutes, respectively. , And the refractive index change with respect to the wavelength for various ultraviolet irradiation times is shown in Fig.
As shown in FIG. 5, when the wavelength of 365 nm was used as a reference, it was found that the refractive index was increased by about 0.05 (1.55 1.60) when the ultraviolet was irradiated for 50 minutes, compared with the film not irradiated with ultraviolet rays.
FIG. 6 is a cross-sectional view illustrating a method of synthesizing a photosensitive Ti-organic precursor resin using titanium (VI) (n-butoxide) 2 (2-ethylhexanoate) 2 [Ti (VI) (normal-butoxide) 2 (2-ethylhexanoate) 2 [(2-ethylhexanoate)] was synthesized by mixing a certain amount of titanium Ti (VI) (n-butoxide) 4, Aldrich Co., USA], 2 (2-ethylhexanoate) (2-ethylhexanoic acid, Aldrich Co., USA) and hexane were placed in a round-bottomed flask and evaporated and condensed for 72 hours using a rotary evaporator to obtain titanium (VI) The resultant photosensitive Ti-organic precursor resin was spin-coated on a Si substrate at 3000 rpm for 60 seconds, and irradiated with ultraviolet rays at 0, 10, 30, and 30 minutes, respectively. 50 It was investigated, showing a variation in refractive index to the wavelength for different ultraviolet irradiation times in FIG.
As shown in FIG. 6, when the wavelength of 365 nm was used as a reference, the refractive index was increased by about 0.15 (1.63 1.78) in comparison with the film not irradiated with ultraviolet rays when irradiated with ultraviolet rays for 50 minutes.
5 and 6, it is confirmed that the refractive index of the fluid material can be controlled by adjusting the ultraviolet time (irradiation amount).
As described above, according to the present invention, a double-sided pattern can be simultaneously formed by a simple process. In particular, a double-sided pattern in which the refractive index in the horizontal direction is controlled can be provided by using an alignment key in a hot forming and an imprint process, So that it can be easily transferred to the substrate or the thin film.
In addition, it is possible not only to realize a double-sided pattern in which the refractive index is controlled in the horizontal direction due to the pressure difference of the second stamp applied to the fluid material according to the shape of the double-sided pattern, but also to use a photomask The refractive index of the region on the double-sided pattern irradiated with ultraviolet rays or heat can be further increased, and the rate of change of the refractive index in the horizontal direction can be further improved.
The lower pattern is formed by hot embossing lithography using a polymer substrate and the upper pattern is formed by ultraviolet (UV), microwave, or thermal imprint lithography Thus, a double-sided pattern can be formed at the same time by a simple process, and then transferred to a substrate or a thin film of a different kind, so that it can be used in various fields.
In addition, it is also possible to transfer the double-side pattern onto the different substrate or thin film, and then transfer the double-side pattern to another different substrate or thin film, thereby changing the upper and lower sides of the microstructure pattern of the double- And can be utilized variously according to the use of the double-sided pattern.
10: Polymer substrate 11: First pattern
20: First stamp 21: Microstructure pattern
22: Alliance 30: Fluid material
31: double-
31b:
40: second stamp 41: microstructure pattern
42: Alliqua 50: heterogeneous substrate or thin film
60: Transfer tape 70: Photomask
71: Allainki
Claims (24)
A second step of separating the first stamp from the polymer substrate on which the first pattern is stamped and forming a first pattern on the polymer substrate;
A third step of applying a fluid material on the polymer substrate on which the first pattern is formed and forming a lower pattern opposite to the first pattern on the lower side of the fluid material;
A second stamp on which a microstructure pattern and an align key are formed is placed on the applied fluid material and a pressing process is performed to perform a hardening process so that a reversed phase of the microstructure pattern of the second stamp A fourth step of imprinting the upper pattern; And
And a fifth step of separating the second stamp from the fluid material imprinted with the upper pattern to form a double-sided pattern made of a fluid material on the polymer substrate,
In the fourth step,
Aligning the alignment mark displayed on the polymer substrate and the alignment mark of the second stamp, and then placing the second stamp on the fluid material to control the pressing force of the second stamp applied in the horizontal direction of the fluid material Wherein the refractive index is controlled in a horizontal direction.
Wherein the refractive index is controlled by any one of silicon (Si), silicon oxide (SiO 2 ), quartz, nickel (Ni), copper (Cu) and glass.
Characterized in that an anti-stiction surface treatment process is performed.
Polycarbonate (PC), polyethylene naphthalate (PEN), polynorbornene (PN), polyacrylate, polyvinyl alcohol (PVA), polyimide ), Polyethylene terephthalate (PET), polyethersulfone (PES), polystyrene (PS), polypropylene (PP), polyethylene (PE), polyvinylchloride Characterized in that it is any one of polyvinyl chloride (PVC), polyamide (PA), polybutyleneterephthalate (PBT), polymethyl methacrylate (PMMA) and polydimethylsiloxane Wherein the refractive index is controlled in a direction perpendicular to the first direction.
Wherein the polymer substrate is heated at a temperature higher than the glass transition temperature of the polymer substrate and the pressure applied is 1.5 to 50 bar.
A method for producing a double-sided pattern having a controlled refractive index in a horizontal direction, characterized by being any one of a photocurable resin composition, a thermosetting resin composition, a natural curing resin composition, a transparent resin composition, a conductive paste and a photosensitive metal-organic precursor.
Wherein the method is implemented by any one of dropping, spray coating, spin coating, and printing.
A method for manufacturing a double-sided pattern having a controlled refractive index in the horizontal direction, which is fabricated from any one of silicon (Si), silicon oxide (SiO 2 ), quartz, nickel (Ni), copper Way.
A pattern of a double-sided pattern having a refractive index controlled in the horizontal direction, which is one of PDMS (Polydimethylsiloxane), PUA (Polyurethane acrylate), ETFE (Ethylene Tetrafluoroethylene), PFA (Perfluoroalkyl acrylate), PFPE (Perfluoropolyether) and PTFE Gt;
Characterized in that an anti-stiction surface treatment process is performed.
Wherein the first stamp is irradiated with ultraviolet rays for 5 seconds to 1 hour while the second stamp is pressed while the microwave is irradiated for 5 seconds to 1 hour. A method for manufacturing a double-sided pattern.
And the heat is applied to the fluid material while pressing the second stamp at a temperature ranging from 50 ° C to 200 ° C for 15 seconds to 1 hour. A method for manufacturing a double-sided pattern.
Wherein the photomask having the alignment mark is aligned on the polymer substrate on which the double-sided pattern is formed, and ultraviolet rays or heat are irradiated to a part of the area on the double-sided pattern.
Further comprising the step of transferring the double-sided pattern onto a different substrate or thin film using the polymer substrate having the double-sided pattern formed thereon as a transfer tape.
Wherein the inorganic substrate is at least one of silicon (Si), gallium arsenide (GaAs), gallium phosphide (GaP), gallium arsenide (GaAsP), SiC, GaN, ZnO, MgO, sapphire, quartz,
Or polycarbonate (PC), polyethylene naphthalate (PEN), polynorbornene (PN), polyacrylate, polyvinyl alcohol (PVA), polyimide (PI), polyethylene terephthalate (PET), polyethersulfone (PES), polystyrene (PS), polypropylene (PP), polyethylene (PE) a polymer substrate of any one of polyvinylchloride (PVC), polyamide (PA), polybutylene tererephthalate (PBT), polymethyl methacrylate (PMMA), and polydimethylsiloxane Wherein the refractive index is controlled in a horizontal direction.
Wherein the transfer tape is provided in the form of a roll to transfer the double-sided pattern of the transfer tape to the different substrate or the thin film, wherein the refractive index is controlled in the horizontal direction.
Wherein the double-sided pattern of the transfer tape is transferred onto the dissimilar substrate or the thin film while pressing the transfer tape and the dissimilar substrate or the thin film by using a roller.
Wherein a surface treatment process of an adhesion promoter is performed on the different substrate or thin film.
Wherein the thickness of the interlayer between the lower pattern and the upper pattern is adjusted according to the thickness adjustment for applying the fluid material.
Wherein the thickness of the interlayer between the upper and lower patterns of the double-sided patterns is 10 nm to 100 탆.
Nanostructures, microstructures,
Wherein the refractive index control layer is formed of any one of a composite structure in which a nano structure and a micro structure are complexly formed.
Wherein each of the convex portions is formed in one of a horn shape, a columnar shape, a spherical shape, and a semi-spherical shape, and these shapes are formed in a convex or concave shape.
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