US20190378748A1 - Method and apparatus for multiple direct transfers of semiconductor devices - Google Patents
Method and apparatus for multiple direct transfers of semiconductor devices Download PDFInfo
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- US20190378748A1 US20190378748A1 US16/551,131 US201916551131A US2019378748A1 US 20190378748 A1 US20190378748 A1 US 20190378748A1 US 201916551131 A US201916551131 A US 201916551131A US 2019378748 A1 US2019378748 A1 US 2019378748A1
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- transfer
- die
- wafer tape
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Definitions
- Semiconductor devices are electrical components that utilize semiconductor material, such as silicon, germanium, gallium arsenide, and the like. Semiconductor devices are typically manufactured as single discrete devices or as integrated circuits (ICs). Examples of single discrete devices include electrically-actuatable elements such as light-emitting diodes (LEDs), diodes, transistors, resistors, capacitors, fuses, and the like.
- LEDs light-emitting diodes
- the conventional fabrication process for semiconductor devices starts with handling a semiconductor wafer.
- the wafer is diced into a multitude of “unpackaged” semiconductor devices.
- the “unpackaged” modifier refers to an unenclosed semiconductor device without protective features.
- unpackaged semiconductor devices may be called semiconductor device die, or just “die” for simplicity.
- a single semiconductor wafer may be diced to create die of various sizes, so as to form upwards of more than 100,000 or even 1,000,000 die from the semiconductor wafer (depending on the starting size of the semiconductor), and each die has a certain quality.
- the unpackaged die are then “packaged” via a conventional fabrication process discussed briefly below.
- the actions between the wafer handling and the packaging may be referred to as “die preparation.”
- the die preparation may include sorting the die via a “pick and place process,” whereby diced die are picked up individually and sorted into bins.
- the sorting may be based on the forward voltage capacity of the die, the average power of the die, and/or the wavelength of the die.
- the packaging involves mounting a die into a plastic or ceramic package (e.g., mold or enclosure).
- the packaging also includes connecting the die contacts to pins/wires for interfacing/interconnecting with ultimate circuitry.
- the packaging of the semiconductor device is typically completed by sealing the die to protect it from the environment (e.g., dust).
- a product manufacturer then places packaged semiconductor devices in product circuitry. Due to the packaging, the devices are ready to be “plugged in” to the circuit assembly of the product being manufactured. Additionally, while the packaging of the devices protects them from elements that might degrade or destroy the devices, the packaged devices are inherently larger (e.g., in some cases, around 10 times the thickness and 10 times the area, resulting in 100 times the volume) than the die found inside the package. Thus, the resulting circuit assembly cannot be any thinner than the packaging of the semiconductor devices.
- FIG. 2A represents a schematic view of an embodiment of a transfer apparatus in a pre-transfer position.
- FIG. 2B represents a schematic view of an embodiment of a transfer apparatus in a transfer position.
- FIG. 3 illustrates an embodiment of a shape profile of the end of a needle of a transfer mechanism.
- FIG. 4 illustrates an embodiment of a needle actuation stroke profile.
- FIG. 5 illustrates a plan view of an embodiment of a product substrate having a circuit trace thereon.
- FIG. 6 illustrates a schematic view of an embodiment of elements of a die transfer system.
- FIG. 7 illustrates a schematic view of an embodiment of a circuitry path between machine hardware and controllers of a die transfer system.
- FIG. 8 illustrates a method of a die transfer process according to an embodiment of this application.
- FIG. 9 illustrates a method of a die transfer operation according to an embodiment of this application.
- FIG. 10 illustrates an embodiment of a direct transfer apparatus and process implementing a conveyor system.
- FIG. 11A illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position.
- FIG. 12 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position.
- FIG. 13 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position.
- FIG. 14 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position.
- needle when used, (or variations of needle as used herein), it is contemplated that a plurality of needles may be considered in place of a single needle, unless the context of the usage of “needle” implies otherwise.
- the machine may secure a product substrate for receiving “unpackaged” die, such as LEDs, transferred from the wafer tape, for example.
- die are very small and thin, for example, a die thickness may range from about 12.5-200 microns thick. Due to the relatively small size of the die, the machine includes components that function to precisely align both the wafer tape carrying the die and the product substrate to ensure accurate placement and/or avoid product material waste.
- the components that align the product substrate and the die on the wafer tape may include a set of frames in which the wafer tape and the product substrate are secured respectively and conveyed individually to a position of alignment such that a specific die on the wafer tape is transferred to a specific spot on the product substrate.
- the machine may further include a transfer mechanism for transferring the die directly from the wafer tape to the product substrate without “packaging” the die.
- the transfer mechanism may be disposed vertically above the wafer tape so as to press down on the die via the wafer tape toward the product substrate. This process of pressing down on the die may cause the die to peel off of the wafer tape, starting at the sides of the die until the die separate from the wafer tape to be attached to the product substrate. That is, by reducing the adhesion force between the die and the wafer tape, and increasing the adhesion force between the die and the product substrate, the die may be transferred.
- the portion of the wafer tape that does not receive pressure from the needle may begin to flex away from the surface of the die. This partial separation may thus cause the die to lose sufficient contact with the wafer tape, so as to be released from the wafer tape.
- the deflection of the wafer tape may be so minimal, as to maintain an entirety of the surface area of the die in contact with the wafer tape, while still causing the opposing surface of the die to extend beyond a plane of extension of the corresponding surface of the adjacent die to avoid unintentional transfer of the adjacent die.
- FIG. 1 illustrates an embodiment of an apparatus 100 that may be used to directly transfer unpackaged semiconductor components (or “die”) from a wafer tape to a product substrate.
- the wafer tape may also be referred to herein as the semiconductor device die substrate, or simply a die substrate.
- the apparatus 100 may include a product substrate conveyance mechanism 102 and a wafer tape conveyance mechanism 104 .
- Each of the product substrate conveyance mechanism 102 and the wafer tape conveyance mechanism 104 may include a frame system or other means to secure the respective substrates to be conveyed to desired alignment positions with respect to each other.
- the apparatus 100 may further include a transfer mechanism 106 , which, as shown, may be disposed vertically above the wafer tape conveyance mechanism 104 .
- the transfer mechanism 106 may be located so as to nearly contact the wafer substrate.
- the apparatus 100 may include a fixing mechanism 108 .
- the fixing mechanism 108 may be disposed vertically beneath the product substrate conveyance mechanism 102 in alignment with the transfer mechanism 106 at a transfer position, where a die, or multiple die, may be placed on the product substrate.
- FIGS. 2A and 2B illustrate example details of the apparatus 100 .
- FIGS. 2A and 2B depict different stages of the transfer operation, while referring to the same elements and features of apparatus 200 , the following discussion of specific features may refer interchangeably to either or both of FIGS. 2A and 2B , except where explicitly indicated.
- FIGS. 2A and 2B illustrate an embodiment of an apparatus 200 , including a product substrate conveyance mechanism 202 , a wafer tape conveyance mechanism 204 , a transfer mechanism 206 , and a fixing mechanism 208 .
- the product substrate conveyance mechanism 202 may be disposed adjacent to the wafer tape conveyance mechanism 204 .
- the conveyance mechanisms 202 , 204 may be positioned such that a space between a surface of a product substrate carried by the product substrate conveyance mechanism 202 and a surface of a wafer tape carried by the wafer tape conveyance mechanism 204 may be more or less than 1 mm, depending on various other aspects of the apparatus 200 , including the amount of deflection that occurs by components during the transfer operation, as described herein below.
- the respective opposing surfaces of the wafer tape and the product substrate may be the most prominent structures in comparison to the supporting structures of the conveyance mechanisms 202 , 204 .
- a distance between the respective surfaces of the wafer tape and product substrate may be less than a distance between either of the surfaces and any other opposing structural component.
- the transfer mechanism 206 may be disposed vertically above the wafer tape conveyance mechanism 204 , and the fixing mechanism 208 may be disposed vertically beneath the product substrate conveyance mechanism 202 . It is contemplated that in some embodiments, one or both of the transfer mechanism 206 and the fixing mechanism 208 may be oriented in different positions than the positions illustrated in FIGS. 2A and 2B .
- the transfer mechanism 206 may be disposed so as to extend at an acute angle with respect to a horizontal plane.
- the fixing mechanism 208 may be oriented to emit energy during the transfer process from the same direction of actuation as the transfer mechanism 206 , or alternatively, from any orientation and position from which the fixing mechanism 208 is able to participate in the transfer process.
- the product substrate conveyance mechanism 202 may be used to secure a product substrate 210 .
- the term “product substrate” may include, but is not limited to: a wafer tape (for example, to presort the die and create sorted die sheets for future use); a paper or polymer substrate formed as a sheet or other non-planar shape, where the polymer—translucent or otherwise—may be selected from any suitable polymers, including, but not limited to, a silicone, an acrylic, a polyester, a polycarbonate, etc.; a circuit board (such as a printed circuit board (PCB)); a string or thread circuit, which may include a pair of conductive wires or “threads” extending in parallel; and a cloth material of cotton, nylon, rayon, leather, etc.
- a wafer tape for example, to presort the die and create sorted die sheets for future use
- a paper or polymer substrate formed as a sheet or other non-planar shape, where the polymer—translucent or otherwise—may be selected from any suitable
- the material of the circuit trace 212 may include, but is not limited to, silver, copper, gold, carbon, conductive polymers, etc. In some instances, the circuit trace 212 may include a silver-coated copper particle.
- a thickness of the circuit trace 212 may vary depending on the type of material used, the intended function and appropriate strength or flexibility to achieve that function, the energy capacity, the size of the LED, etc. For example, a thickness of the circuit trace may range from about 5 microns to 20 microns, from about 7 microns to 15 microns, or from about 10 microns to 12 microns.
- the product substrate 210 may be a flexible, translucent polyester sheet having a desired circuit pattern screen printed thereon using a silver-based conductive ink material to form the circuit trace 212 .
- the product substrate conveyance mechanism 202 may include a product substrate conveyor frame 214 for securing a product substrate holder frame 216 .
- the structure of the product substrate holder frame 216 may vary significantly depending on the type and properties (e.g., shape, size, elasticity, etc.) of the product substrate being used.
- product substrate 210 may be a flexible material
- product substrate 210 may be held under tension in the product substrate holder frame 216 , so as to create a more rigid surface upon which a transfer operation, discussed herein below, is performed.
- the rigidity created by the tension in the product substrate 210 may increase the placement accuracy when transferring components.
- a durable or more rigid material for the product substrate 210 naturally provides a firm surface for component placement accuracy.
- wrinkles and/or other discontinuities may form in the product substrate 210 and interfere with the pre-set pattern of the circuit trace 212 , to the extent that the transfer operation may be unsuccessful.
- FIG. 2A illustrates an embodiment of a product substrate holder frame 216 including a first portion 216 a having a concave shape and a second portion 216 b having a convex counter shape that corresponds in shape to the concave shape.
- tension is created for the product substrate 210 by inserting an outer perimeter of the product substrate 210 between the first portion 216 a and the second portion 216 b to thereby clamp the product substrate 210 tightly.
- the product substrate conveyor frame 214 may be conveyed in at least three directions—two directions in the horizontal plane and vertically as well. The conveyance may be accomplished via a system of motors, rails, and gears (none of which are shown). As such, the product substrate tensioner frame 216 may be conveyed to and held in a specific position as directed and/or programmed and controlled by a user of the apparatus 200 .
- the wafer tape conveyance mechanism 204 may be implemented to secure a wafer tape 218 having die 220 (i.e., semiconductor device die) thereon.
- the wafer tape 218 may be conveyed in multiple directions to the specific transfer positions for the transfer operation via a wafer tape conveyor frame 222 .
- the wafer tape conveyor frame 222 may include a system of motors, rails, and gears (none of which are shown).
- the unpackaged semiconductor die 220 for transfer may be extremely small. Indeed, the height of the die 220 may range from 12.5 to 200 microns, or from 25 to 100 microns, or from 50 to 80 microns.
- a gap spacing between the wafer tape 218 and the product substrate 210 may range from about 0.25 mm to 1.50 mm, or about 0.50 mm to 1.25 mm, or about 0.75 mm to 1.00 mm, for example.
- a minimum gap spacing may depend on factors including: a thickness of the die being transferred, a stiffness of the wafer tape involved, an amount of deflection of the wafer tape needed to provide adequate capture and release of the die, a proximity of the adjacent die, etc.
- a speed of the transfer operation may also decrease due to the reduced cycle time (discussed further herein) of the transfer operation.
- Such a decrease in the duration of a transfer operation may therefore increase a rate of die transfers.
- the die transfer rate may range from about 6-500 die placed per second, or 20-400 per second, or 50-250 per second, or 80-150 per second.
- the die transfer rate may be even greater than 500 per second depending on the number of needles in use and the speed of the conveying mechanisms.
- the die 220 on the wafer tape 218 may include die that were individually cut from a solid semiconductor wafer and then placed onto the wafer tape 218 to secure the die.
- the die may have been pre-sorted and explicitly organized on the wafer tape 218 , in order, for example, to assist in the transfer operation.
- the die 220 may be arranged sequentially as to the expected order of transfer to the product substrate 210 .
- Such pre-arrangement of the die 220 on the wafer tape 218 may reduce the amount of travel that would otherwise occur between the product substrate conveyance mechanism 202 and the wafer tape conveyance mechanism 204 .
- the die on the wafer tape 218 may have been pre-sorted to include only die having substantially equivalent performance properties. In this case, efficiency of the supply chain may be increased and thus, travel time of the wafer tape conveyance mechanism 204 may be reduced to a minimum.
- materials used for the die may include, but is not limited to, silicon carbide, gallium nitride, a coated silicon oxide, etc.
- sapphire or silicon may be used as a die as well.
- a “die” may be representative herein of an electrically actuatable element generally.
- the wafer tape 218 may include die that are not pre-sorted, but rather are formed by simply cutting a semiconductor directly on wafer tape, and then leaving the die on the wafer tape without “picking and placing” to sort the die depending on the respective performance quality of the die.
- the die on the wafer tape may be mapped to describe the exact relative locations of the different quality die. Therefore, in some instances, it may be unnecessary to use wafer tape having pre-sorted die. In such a case, the amount of time and travel for the wafer tape conveyance mechanism 204 to move between particular die for each sequential transfer operation may increase.
- the wafer tape conveyance mechanism 204 may move the wafer tape 218 further to align an appropriate die of a specific quality for transfer than would be necessary for a wafer tape 218 containing die of substantially equivalent quality.
- the needle 226 may include a material that is sufficiently durable to withstand repetitive, rapid, minor impacts while minimizing potential harm to the die 220 upon impact.
- the needle 226 may include a metal, a ceramic, a plastic, etc.
- a tip of the needle 226 may have a particular shape profile, which may affect the ability of the needle to function repetitively without frequently breaking either the tip or damaging the wafer tape 218 or the die 220 . The profile shape of the tip of the needle is discussed in greater detail below with respect to FIG. 3 .
- the needle 226 may be aligned with a die 220 , as depicted in FIG. 2A , and the needle actuator may move the needle 226 to push against an adjacent side of the wafer tape 218 at a position in which the die 220 is aligned on the opposing side of the wafer tape 218 , as depicted in FIG. 2B .
- the pressure from the needle 226 may cause the wafer tape 218 to deflect so as to extend the die 220 to a position closer to the product substrate 226 than adjacent die 220 , which are not being transferred.
- the amount of deflection may vary depending several factors, such as the thickness of the die and circuit trace.
- an amount of deflection of the wafer tape 218 may be about 75 microns.
- the die 220 may be pressed via the needle 226 toward the product substrate 210 to the extent that the electrical contact terminals (not shown) of the die are able to bond with the circuit trace 212 , at which point, the transfer operation proceeds to completion and the die 220 is released from the wafer tape 218 .
- the transfer process may include a rapidly repeated set of steps including a cyclical actuation of the needle 226 pressing upon a die 220 , a method of the process is described in detail herein below with respect to FIG. 8 . Further, the stroke profile of the actuation of the needle 226 (within the context of the transfer process) is discussed in more detail hereafter with respect to FIG. 4 .
- the transfer mechanism 206 may further include a needle retraction support 230 , (also known as a pepper pot).
- the support 230 may include a structure having a hollowed space wherein the needle 226 may be accommodated by passing into the space via an opening 232 in a first end of the support 230 .
- the support 230 may further include at least one opening 234 on a second opposing end of the support 230 .
- the support may include multiple perforations near opening 234 .
- the at least one opening 234 may be sized with respect to a diameter of the needle 226 to accommodate passage of the needle 226 therethrough so as to press on the wafer tape 218 during the transfer process.
- the support 230 may be disposed adjacent to the upper surface of the wafer tape 218 .
- a base surface of the support 230 (having the at least one opening 234 therein) may come into contact with the upper surface of the wafer tape 218 , thereby preventing upward deflection of the wafer tape 218 .
- This upward deflection may be caused in the event where the needle 226 pierces at least partially into the wafer tape 218 , and while retracting, the wafer tape is stuck to the tip of the needle 226 .
- the support 230 may reduce the time it takes to move to the next die 220 .
- a wall perimeter shape of the support 230 may be cylindrical or any other shape that may be accommodated in the apparatus 200 . Accordingly, the support 230 may be disposed between the needle 226 and an upper surface of the wafer tape 218 .
- a temperature of support 230 may be adjusted so as to regulate the temperature of the needle 226 and the wafer tape 218 , at least near the point of the transfer operation. Accordingly, the temperature of the support 230 may be heated or cooled, and a material of the support 230 may be selected to maximize thermal conductivity.
- the support 230 may be formed of aluminum, or another relatively high thermal conductivity metal or comparable material, whereby the temperature may be regulated to maintain consistent results of the transfer operations.
- air may be circulated within the support 230 to assist in regulating the temperature of a local portion of the wafer tape 218 .
- a fiber optic cable 230 a may be inserted into the needle retraction support 230 , and may further be against the needle 226 to assist in temperature regulation of the wafer tape 218 and/or the needle 226 .
- a laser may be implemented as the energy-emitting device 236 .
- laser 236 may be activated to emit a specific wavelength and intensity of light energy directed at the die 220 being transferred.
- the wavelength of the light of the laser 236 may be selected specifically based on the absorption of that wavelength of light with respect to the material of the circuit trace 212 without significantly affecting the material of the product substrate 210 .
- a laser having an operational wavelength of 808 nm, and operating at 5 W may be readily absorbed by silver, but not by polyester. As such, the laser beam may pass through the substrate of polyester and affect the silver of a circuit trace.
- the wavelength of laser may match the absorption of the circuit trace and the material of the substrate.
- the focus area of the laser 236 (indicated by the dashed lines emanating vertically from the laser 236 in FIG. 2B toward the product substrate 210 ) may be sized according to the size of the LED, such as for example, a 300 micron wide area.
- the circuit trace 212 may begin to cure (and/or melt or soften) to an extent that a fusing bond may form between the material of the circuit trace 212 and the electrical contact terminals (not shown) on the die 220 .
- This bond further assists in separating the unpackaged die 220 from the wafer tape 218 , as well as simultaneously affixing the die 220 to the product substrate 210 .
- the laser 236 may cause some heat transfer on the wafer tape 218 , thereby reducing adhesion of the die 220 to the wafer tape 218 and thus assisting in the transfer operation.
- die may be released and fixed to the product substrates in many ways, including using a laser having a predetermined wavelength or a focused light (e.g., IR, UV, broadband/multi spectral) for heating/activating circuit traces to thereby cure an epoxy or phase change bond materials, or for deactivating/releasing a die from wafer tape, or for initiating some combination of reactions.
- a specific wavelength laser or light may be used to pass through one layer of the system and interact with another layer.
- a vacuum may be implemented to pull a die from the wafer tape, and air pressure may be implemented to push the die onto a product substrate, potentially including a rotary head between the die wafer substrate and the product substrate.
- ultrasonic vibration may be combined with pressure to cause the die to bond to the circuit traces.
- the fixing mechanism may also include a product substrate support 238 , which may be disposed between the laser 236 and the bottom surface of the product substrate 210 .
- the support 238 may include an opening 240 at a base end thereof and an opening 242 at an upper end thereof.
- the support 238 may be formed as a ring or hollow cylinder.
- the support may further include structure to secure a lens (not shown) to assist in directing the laser.
- the laser 236 emits the light through the openings 240 , 242 to reach the product substrate 210 .
- the upper end of the sidewalls of the support 238 may be disposed in direct contact with or closely adjacent to the bottom surface of the product substrate 210 .
- the support 238 may help to prevent damage from occurring to the product substrate 210 during the stroke of the needle 226 at the time of a transfer operation.
- the portion of the bottom surface of the product substrate 210 that is aligned with the support 238 may contact the support 238 , which thereby provides resistance against the incoming motion of the die 220 being pressed by the needle 226 .
- the support 238 may be movable in a direction of the vertical axis to be able to adjust a height thereof so as to raise and lower support 238 as necessary, including to a height of the product substrate 210 .
- apparatus 200 may further include a first sensor 244 , from which apparatus 200 receives information regarding the die 220 on the wafer tape 218 .
- the wafer tape 218 may have a bar code (not shown) or other identifier, which is read or otherwise detected.
- the identifier may provide die map data to the apparatus 200 via the first sensor 244 .
- the first sensor 244 may be positioned near the transfer mechanism 206 (or the needle 226 specifically), spaced apart from the transfer mechanism 206 by a distance d, which may range from about 1-5 inches, so as to enhance the accuracy of location detection.
- first sensor 244 may be disposed adjacent the tip of the needle 226 in order to sense the exact position of the die 220 in real time.
- the wafer tape 218 may be punctured and or further stretched over time, which may alter the previously mapped, and thus expected, locations of the die 220 on the wafer tape 218 . As such, small changes in the stretching of the wafer tape 218 could add up to significant errors in alignment of the die 220 being transferred. Thus, real time sensing may be implemented to assist in accurate die location.
- the first sensor 244 may be able to identify the precise location and type of die 220 that is being sensed. This information may be used to provide instructions to the wafer tape conveyor frame 222 indicating the exact location to which the wafer tape 218 should be conveyed in order to perform the transfer operation.
- Sensor 244 may be one of many types of sensors, or a combination of sensor types to better perform multiple functions.
- Sensor 244 may include, but is not limited to: a laser range finder, or an optical sensor, such as a non-limiting example of a high-definition optical camera having micro photography capabilities.
- a second sensor 246 may also be included in apparatus 200 .
- the second sensor 246 may be disposed with respect to the product substrate 210 so as to detect the precise position of the circuit trace 212 on the product substrate 210 . This information may then be used to determine any positional adjustment needed to align the product substrate 210 between the transfer mechanism 206 and the fixing mechanism 208 so that the next transfer operation occurs in the correct location on the circuit trace 212 . This information may further be relayed to the apparatus 200 to coordinate conveying the product substrate 210 to a correct position, while simultaneously conveying instructions to the wafer tape conveyor frame 222 .
- a variety of sensors are also contemplated for sensor 246 including optical sensors, such as one non-limiting example of a high-definition optical camera having micro photography capabilities.
- FIGS. 2A and 2B further illustrate that the first sensor 244 , the second sensor 246 , and the laser 236 may be grounded.
- the first sensor 244 , the second sensor 246 , and the laser 236 may all be grounded to the same ground (G), or alternatively, to a different ground (G).
- the first or second sensors may further be able to test the functionality of transferred die.
- an additional tester sensor (not shown) may be incorporated into the structure of apparatus 200 to test individual die before removing the product substrate 210 from the apparatus 200 .
- multiple independently-actuatable needles and/or lasers may be implemented in a machine in order to transfer and fix multiple die at a given time.
- the multiple needles and/or lasers may be independently movable within a three-dimensional space. Multiple die transfers may be done synchronously (multiple needles going down at the same time), or sequentially (e.g., one needle going down while the other is going up, which arrangement may balance better the components and minimize vibration). Control of the multiple needles and/or lasers may be coordinated to avoid collisions between the plurality of components.
- the multiple needles and/or lasers may be arranged in fixed positions relative to each other.
- the tip 300 of a needle is discussed with respect to FIG. 3 , which shows a schematic example profile shape of the tip 300 .
- the tip 300 may be defined as the end of the needle, including sidewalls 302 adjoining tapered portion 304 , corner 306 , and base end 308 , which may extend transversely to the opposing side of the needle.
- the specific size and shape of the tip 300 may vary according to factors of the transfer process such as, for example, the size of the die 220 being transferred and the speed and the impact force, of a transfer operation. For example, the angle ⁇ seen in FIG.
- the tapered portion 304 as measured between a longitudinal direction of the central axis of the needle and the tapered portion 304 may range from about 10 to 15°; the radius r of the corner 306 may range from about 15 to 50+ microns; the width w of the base end 308 may range from about 0 to 100+ microns ( ⁇ m), where w may be less than or equal to the width of the die 220 being transferred; the height h of the tapered portion 304 may range from about 1 to 2 mm, where h may be greater than a distance traveled by needle during a stroke of a transfer operation; and the diameter d of the needle 226 may be approximately 1 mm.
- the needle tip 300 may be more blunt to mirror the width of the die or more pointed so as to press in a smaller area of the wafer tape.
- the transfer mechanism 206 may include one or more needles with the same or different needle profiles.
- FIG. 4 Illustrated in FIG. 4 is an embodiment of a needle actuation performance profile. That is, FIG. 4 depicts an example of the stroke pattern performed during a transfer operation by displaying the height of the needle tip with respect to the plane of the wafer tape 218 as it varies with time. As such, the “0” position in FIG. 4 may be the upper surface of the wafer tape 218 . Further, inasmuch as the idle time of the needle and the ready time of the needle may vary depending on the programmed process or the varying duration of time between transferring a first die and the time it takes to reach a second die for transfer, the dashed lines shown at the idle and ready phases of the stroke pattern indicate that the time is approximate, but may be longer or shorter in duration.
- the solid lines shown for use of the laser are example times for an embodiment illustrated herewith, however, the actual duration of laser on and off time may vary depending on the materials used in forming the circuit (such as the material choice of the circuit trace), the type of product substrate, the desired effect (pre-melting circuit trace, partial bond, complete bond, etc.), the distance of the laser from the bond point (i.e., the upper surface of the product substrate), the size of the die being transferred, and the power/intensity/wavelength of the laser, etc. Accordingly, the following description of the profile shown in FIG. 4 may be an example embodiment of a needle profile.
- a fully retracted needle tip may be idle at approximately 2000 ⁇ m above the surface of the wafer tape. After a varying amount of time, the needle tip may descend rapidly to rest in the ready state at approximately 750 ⁇ m above the surface of the wafer tape. After another undetermined amount of time at the ready state, the needle tip may descend again to contact the die and press the wafer tape with the die down to a height of approximately ⁇ 1000 ⁇ m, where at the die may be transferred to the product substrate.
- the dotted vertical line at the start of the laser on section indicates that the laser may come on at some point between the beginning of the descent from the ready phase and the bottom of the stroke of the needle tip.
- the laser may turn on at approximately 50% of the way through the descent.
- the circuit trace may begin to soften prior to contact with the die so as to form a stronger bond, or additionally, the die wafer may be affected or prepared during this time.
- the phase in which the laser turns on may last approximately 20 ms (“milliseconds”). At the bottom of the stroke, where the laser is on, that phase may be a bonding phase between the die and the product substrate. This bonding phase may allow the circuit trace to attach to the die contacts, which stiffens quickly after the laser is turned off. As such, the die may be bonded to the product substrate.
- the bonding phase may last approximately 30 ms.
- the laser may be turned off and the needle may ascend to the ready phase rapidly.
- the laser may be turned off before the needle begins to ascend, or at some point during the ascent of the needle tip back to the ready phase, the laser may be turned off
- the height of the needle tip may overshoot and bounce back under the height of the ready phase somewhat buoyantly. While some of the buoyancy may be attributed to the speed at which the needle tip ascends to the ready phase, the speed and the buoyancy may be intentional in order to assist in retracting a tip of the needle from a surface of the wafer tape in the case where the needle has pierced the wafer tape and may be stuck therein.
- the timing in which the laser is turned off may be longer than the timing in which the laser is turned on, where a slower speed of the descent may assist in preventing damage to the die, and as mentioned above, the rapid rate of ascent may assist in extracting the needle tip from the wafer tape more effectively.
- the timing shown on FIG. 4 is approximate, particularly with respect to the idle and ready periods. Therefore, the numerical values assigned along the bottom edge of the FIG. 4 are for reference and should not be taken literally, except when otherwise stated.
- the product substrate 502 may have a bar code (not shown) or other identifier, which is read or otherwise detected.
- the identifier may provide circuit trace data to the apparatus.
- the product substrate 502 may further include datum points 506 .
- Datum points 506 may be visual indicators for sensing by the product substrate sensor (for example, second sensor 246 in FIG. 2 ) to locate the first and second portions of the circuit trace 504 A, 504 B. Once the datum points 506 are sensed, a shape and relative position of the first and second portions of the circuit trace 504 A, 504 B with respect to the datum points 506 may be determined based on preprogrammed information. Using the sensed information in connection with the preprogrammed information, the product substrate conveyance mechanism may convey the product substrate 502 to the proper alignment position for the transfer operation.
- die 508 are depicted in FIG. 5 as straddling between the first and second portions of the circuit trace 504 A, 504 B.
- the electrical contact terminals (not shown) of the die 508 may be bonded to the product substrate 502 during a transfer operation.
- power may be applied to run between the first and second portions of the circuit trace 504 A, 504 B, and thereby powering die 508 .
- the die may be unpackaged LEDs that were directly transferred from a wafer tape to the circuit trace on the product substrate 502 . Thereafter, the product substrate 502 may be processed for completion of the product substrate 502 and used in a circuit or other final product. Further, other components of a circuit may be added by the same or other means of transfer to create a complete circuit, and may include control logic to control LEDs as one or more groups in some static or programmable or adaptable fashion.
- the transfer system 600 may include a personal computer (PC) 602 (or server, data input device, user interface, etc.), a data store 604 , a wafer tape mechanism 606 , a product substrate mechanism 608 , a transfer mechanism 610 , and a fixing mechanism 612 .
- PC personal computer
- a wafer tape mechanism 606 a wafer tape mechanism 606
- a product substrate mechanism 608 a product substrate mechanism 608
- a transfer mechanism 610 a transfer mechanism 612
- specific details about these mechanisms is not repeated here.
- a brief description of how the wafer tape mechanism 606 , the product substrate mechanism 608 , the transfer mechanism 610 , and the fixing mechanism 612 relate to interactions between the PC 602 and the data store 604 is described hereafter.
- the PC 602 communicates with data store 604 to receive information and data useful in the transfer process of directly transferring die from a wafer tape in wafer tape mechanism 606 using the transfer mechanism 610 on to a product substrate in the product substrate mechanism 608 whereat the die may be fixed upon the product substrate via actuation of a laser or other energy-emitting device located in the fixing mechanism 612 .
- PC 602 may also serve as a receiver, compiler, organizer, and controller of data being relayed to and from each of the wafer tape mechanism 606 , the product substrate mechanism 608 , the transfer mechanism 610 , and the fixing mechanism 612 .
- PC 602 may further receive directed information from a user of the transfer system 600 .
- a schematic of the communication pathways between the respective elements of a transfer system 700 may be described as follows.
- the direct transfer system may include a personal computer (PC) 702 (or server, data input device, user interface, etc.), which may receive communication from, and provide communication to a data store 704 .
- the PC 702 may further communicate with a first cell manager 706 (illustrated as “Cell Manager 1 ”) and a second cell manager 708 (illustrated as “Cell Manager 2 ”). Therefore, the PC 702 may control and synchronize the instructions between the first cell manager 706 and the second cell manager 708 .
- PC personal computer
- Project manager 710 may receive input from the first and second cell managers 706 , 708 and data store 704 to organize the direct transfer process and maintain smooth functioning with respect to orientation and alignment of the product substrate with respect to the wafer tape and the die thereon.
- Needle profile definer 712 may contain data regarding the needle stroke performance profile, which may be used to instruct the transfer mechanism regarding the desired needle stroke performance according to the specific die on the loaded wafer tape and the pattern of the circuit trace on the product substrate. Additional details of the needle profile definer 712 are discussed further herein below.
- Project manager 710 may receive the die map 714 and circuit CAD files 716 from the data store 704 , and may relay the respective information to the first and second cell managers 706 , 708 , respectively.
- the first cell manager 706 may use the die map 714 from data store 704 via a die manager 718 . More specifically, die manager 718 may compare die map 714 with the information received by a sensor manager 720 , and based thereon, may provide instructions to a motion manager 722 regarding the location of a particular die. Sensor manager 720 may receive data regarding the actual location of die on the wafer tape from a die detector 724 . Sensor manager 720 may also instruct the die detector 724 to look for a particular die in a particular location according to die map 714 .
- the die detector 724 may include a sensor such as the second sensor 244 in FIGS. 2A and 2B .
- the first cell manager 706 may pass through a plurality of states including: determining where to tell the first robot 726 to go; telling the first robot 726 to go to the determined location; turning on the needle; activating the fixing device; and resetting.
- the project manager 710 may relay the data of the circuit CAD files 716 to the second cell manager 708 .
- the second cell manager 708 may include a sensor manager 734 and a motion manager 736 .
- the sensor manager 734 may instruct the substrate alignment sensor 738 to find the datum points on the product substrate and thereby detect and orient the product substrate according to the location of the circuit trace thereon.
- the sensor manager 734 may receive confirmation or updated location information of the circuit trace pattern on the product substrate.
- the sensor manager 734 may coordinate with the motion manager 736 to provide instructions to a second robot 740 (illustrated as “Robot 2 ”) to convey the product substrate to an alignment position (i.e., a transfer fixing position) for execution of the transfer operation.
- a second robot 740 illustrated as “Robot 2 ”
- the circuit CAD files 716 may assist the project manager 710 in aligning the product substrate with respect to the wafer tape such that the die may be accurately transferred to the circuit trace thereon.
- the second cell manager 708 may pass through a plurality of states including: determining where to tell the second robot 740 to go; telling the second robot 740 to go to the determined location; and resetting.
- the steps of the method 800 described herein may not be in any particular order and as such may be executed in any satisfactory order to achieve a desired product state.
- the method 800 may include a step of loading transfer process data into a PC and/or a data store 802 .
- the transfer process data may include data such as die map data, circuit CAD files data, and needle profile data.
- a step of loading a wafer tape into a wafer tape conveyor mechanism 804 may also be included in method 800 .
- Loading the wafer tape into the wafer tape conveyor mechanism may include controlling the wafer tape conveyor mechanism to move to a load position, which is also known as an extract position.
- the wafer tape may be secured in the wafer tape conveyor mechanism in the load position.
- the wafer tape may be loaded so that the die of the semiconductor are facing downward toward the product substrate conveyor mechanism.
- the method 800 may further include a step of preparing the product substrate to load into the product substrate conveyor mechanism 806 .
- Preparing the product substrate may include a step of screen printing a circuit trace on the product substrate according to the pattern of the CAD files being loaded into the PC or data store. Additionally, datum points may be printed onto the circuit substrate in order to assist in the transfer process.
- the product substrate conveyor mechanism may be controlled to move to a load position, which is also known as an extraction position, whereat the product substrate may be loaded into the product substrate conveyor mechanism.
- the product substrate may be loaded so that the circuit trace faces toward the die on the wafer.
- the product substrate may be delivered and placed in the load position by a conveyor (not shown) or other automated mechanism, such as in the style of an assembly line.
- the product substrate may be manually loaded by an operator.
- a program to control the direct transfer of the die from the wafer tape to the circuit trace of the product substrate may be executed via the PC to commence the direct transfer operation 808 .
- the details of the direct transfer operation are described below.
- a method 900 of the direct transfer operation of causing die to be transferred directly from the wafer tape (or other substrate holding die, also called a “die substrate” for simplified description of FIG. 9 ) to the product substrate is illustrated in FIG. 9 .
- the steps of the method 900 described herein may not be in any particular order and as such may be executed in any satisfactory order to achieve a desired product state.
- the PC may receive input regarding the identification of the product substrate and the identification of the die substrate containing the die to be transferred 902 .
- This input may be entered manually by a user, or the PC may send a request to the cell managers in control, respectively, of the product substrate alignment sensor and the die detector.
- the request may instruct the sensor to scan the loaded substrate for an identification marker, such as a barcode or QR code; and/or the request may instruct the detector to scan the loaded die substrate for an identification marker, such as a barcode or QR code.
- the PC may query the data store or other memory to match the respective identification markers of the product substrate and the die substrate and retrieve the associated data files 904 .
- the PC may retrieve a circuit CAD file associated with the product substrate that describes the pattern of the circuit trace on the product substrate.
- the circuit CAD file may further contain data such as the number of, relative positions of, and respective quality requirement of, the die to be transferred to the circuit trace.
- the PC may retrieve a die map data file associated with the die substrate that provides a map of the relative locations of the specific die on the die substrate.
- the PC may determine the initial orientation of the product substrate and the die substrate relative to the transfer mechanism and the fixing mechanism 906 .
- the PC may instruct the substrate alignment sensor to locate datum points on the product substrate.
- the datum points may be used as reference markers for determining the relative location and orientation of the circuit trace on the product substrate.
- the PC may instruct the die detector to locate one or more reference points on the die substrate to determine the outlay of the die.
- the PC may instruct the respective product substrate and die substrate conveyance mechanisms to orient the product substrate and die substrate, respectively, into a position of alignment with the transfer mechanism and the fixing mechanism 908 .
- the alignment step 908 may include determining the location of the portion of the circuit trace to which a die is to be transferred 910 , and where the portion is located relative to the transfer fixing position 912 .
- the transfer fixing position may be considered to be the point of alignment between the transfer mechanism and the fixing mechanism.
- the PC may instruct the product substrate conveyance mechanism to convey the product substrate so as to align the portion of the circuit trace to which a die is to be transferred with the transfer fixing position 914 .
- the alignment step 908 may further include determining which die on the die substrate will be transferred 916 , and where the die is located relative to the transfer fixing position 918 . Based on the data determined in steps 916 and 918 , the PC may instruct the wafer tape conveyance mechanism to convey the die substrate so as to align the die to be transferred with the transfer fixing position 920 .
- the needle, and/or needles, and the fixing device may be actuated 922 to effectuate the transfer of the die from the die substrate to the product substrate.
- the PC may determine whether additional die are to be transferred 924 . In the case where another die is to be transferred, the PC may revert to step 908 and realign the product and die substrates accordingly for a subsequent transfer operation. In the case where there will not be another die transferred, the transfer process is ended 926 .
- FIG. 10 illustrates several of the components of the direct transfer apparatus described above in a conveyor/assembly line system 1000 (hereinafter “conveyor system”).
- FIGS. 2A and 2B depict the product substrate 210 being held by the product substrate conveyor frame 214 and tensioned by the product substrate tensioner frame 216 .
- FIG. 10 illustrates the product substrate conveyor frame 214 being conveyed through the conveyor system 1000 in which the product substrate goes through an assembly line style process.
- the conveyor system 1000 may include a series of tracks, rollers, and belts 1002 and/or other handling devices to sequentially convey a plurality of product substrate conveyor frames 214 , each holding a product substrate.
- operation stations of the conveyor system 1000 may include one or more printing stations 1004 .
- a circuit trace may be printed thereon.
- the multiple printing stations 1004 may be arranged serially, and may be configured to perform one or more printing operations each so as to form a complete circuit trace.
- the product substrate conveyor frame 214 may be conveyed to one or more die transfer stations 1006 .
- the multiple die transfer stations 1006 may be arranged serially, and may be configured to perform one or more die transfers each.
- the product substrates may have one or more die transferred and affixed thereto via a transfer operation using one or more of the direct transfer apparatus embodiments described herein.
- each transfer station 1006 may include a wafer tape conveyance mechanism, a transfer mechanism, and a fixing mechanism.
- a circuit trace may have been previously prepared on the product substrate, and as such, the product substrate may be conveyed directly to the one or more transfer stations 1006 .
- the wafer tape conveyance mechanism, the transfer mechanism, and the fixing mechanism may be aligned with respect to the conveyed product substrate conveyor frame 214 upon entering the station.
- the transfer station 1006 components may repeatedly perform the same transfer operation in the same relative position on each product substrate as the plurality of product substrates are conveyed through the conveyor system 1000 .
- the conveyor system 1000 may further include one or more finishing stations 1008 to which the product substrate may be conveyed to have final processing performed.
- the type, amount, and duration of the final processing may depend on the features of the product and the properties of the materials used to make the product.
- the product substrate may receive additional curing time, a protective coating, additional components, etc., at the finishing station(s) 1008 .
- a “light string” may be formed. While many of the features of apparatus 1100 may remain substantially similar to those of apparatus 200 of FIGS. 2A and 2B , product substrate conveyance mechanism 1102 , as depicted in FIGS. 11A and 11B , may be configured to convey a product substrate 1104 that is different than the product substrate 212 . Specifically, in FIGS. 2A and 2B , the product substrate conveyance mechanism 202 includes the conveyor frame 214 and the tensioner frame 216 , which secure the sheet-like product substrate 212 under tension. In the embodiment of FIGS. 11A and 11B , however, the product substrate conveyance mechanism 1102 may include a product substrate reel system.
- the product substrate reel system may include one or two circuit trace reels 1106 that are wound with a “string circuit,” which may include a pair of adjacently wound conductive strings or wires as the product substrate 1104 .
- the reel 1106 may be located on a first side of the transfer position, and the pair of conductive strings ( 1104 ) may be wound around the single reel 1106 .
- the die transfer process of forming the string circuit may be substantially similar in each case.
- the conductive strings of the product substrate 1104 may be threaded from the reel(s) 1106 across the transfer position and may be fed into a finishing device 1108 .
- the finishing device 1108 may be: a coating device to receive a protective coating, for example, of a translucent or transparent plastic; or a curing apparatus, which may finish curing the string circuit as a part of final processing of the product.
- the circuit string may be fed onto another reel, which may wind up the string circuit thereon before final processing of the string circuit.
- the transfer mechanism 206 may be actuated to perform a needle stroke (as described above) to transfer die 220 to the conductive strings of the product substrate 1104 so that electrical contact terminals of the die 220 are placed, respectively, on the adjacent strings, and the fixing mechanism 208 may be actuated to affix the die 220 in position.
- apparatus 1100 may include tensioning rollers 1110 on which the conductive strings of the product substrate 1104 may be supported and further tensioned against.
- the tensioning rollers 1110 may assist in maintaining tension in the formed string circuit so as to enhance the die transfer accuracy.
- die 220 are depicted as having been transferred to the conductive strings of the product substrate 1104 , thereby uniting (to some extent) the conductive strings of the product substrate 1104 and forming a string circuit.
- apparatus 1200 may include a wafer tape conveyance mechanism 1202 .
- the wafer tape conveyance mechanism 1202 may include a system of one or more reels 1204 to convey die 220 through the transfer position of the apparatus 1200 to transfer die to a single substrate.
- each reel 1204 may include a substrate 1206 formed as a narrow, continuous, elongated strip having die 220 attached consecutively along the length of the strip.
- a transfer operation may include conveying the product substrate 210 via the product substrate conveyance mechanism 202 substantially as described above, using motors, tracks, and gears.
- the wafer tape conveyance mechanism 1202 may include a substantially static mechanism, in that, while the die 220 may be fed continuously through the transfer position by unrolling the substrate 1206 from reel 1204 , the reel 1204 itself main remain in a fixed position.
- the tension of the substrate 1206 may be maintained for stability purposes by tensioning rollers 1208 , and/or a tensioning reel 1210 , which may be disposed on a side of the apparatus 1200 opposite the reel 1204 .
- the tensioning reel 1210 may roll up the substrate 1206 after the die have been transferred.
- the tension may be maintained by any other suitable means to secure the substrate 1206 so as to assist in pulling it through the transfer position after each transfer operation to cycle through the die 220 .
- each reel 1204 may be disposed laterally adjacent to other reels 1204 .
- Each reel 1204 may be paired with a specific transfer mechanism 206 and a specific fixing mechanism 208 .
- each respective set of transfer mechanisms and fixing mechanisms may be arranged with respect to the product substrate 210 such that multiple die may be placed in multiple locations on the same product substrate 210 simultaneously.
- the respective transfer positions i.e., the alignment between a transfer mechanism and a corresponding fixing mechanism
- the die transfer operation may be relatively similar to the transfer operation as described above with respect to the first example embodiment of the direct transfer apparatus 200 .
- the product substrate 210 may be conveyed to a transfer position (die fixing position) in the same manner as described above via the product substrate conveyance mechanism 202 , the transfer mechanism(s) 206 may perform a needle stroke to transfer the die 220 from the die substrate 1206 to the product substrate 210 , and the fixing mechanism 208 may be actuated to assist in affixing the die 220 to the product substrate 210 .
- a circuit trace pattern may be such that not every transfer mechanism may need to be actuated simultaneously. Accordingly, multiple transfer mechanisms may be actuated intermittently as the product substrate is conveyed to various positions for transfer.
- FIG. 13 depicts an embodiment of a direct transfer apparatus 1300 .
- the product substrate conveyance mechanism 202 may be disposed adjacent to the wafer tape conveyance mechanism 204 .
- a transfer mechanism 1302 may be disposed to effectuate the transfer of the die 220 from the wafer tape 218 to the product substrate 210 .
- the transfer mechanism 1302 may include a collet 1304 that picks the die 220 , one or more at a time, from the wafer tape 218 and rotates about an axis A that extends through arm 1306 .
- FIG. 13 depicts the wafer tape 218 facing the product substrate 210 such that the collet 1304 may pivot 180 degrees about pivot point 1308 (see directional pivot arrows) between the die-carrying surface of the wafer tape 218 and the transfer surface of the product substrate 210 . That is, the direction of extension of the collet 1304 pivots in a plane that is orthogonal to the surface or plane of transfer of both the wafer tape 218 and the product substrate 210 .
- the arm structure of the collet may be arranged to pivot between two parallel surfaces, and the arm of the collet may pivot along parallel plane.
- the collet 1304 may pick the die 220 and then immediately pivot to the surface of the product substrate 210 to be in line with the fixing mechanism 208 .
- the collet 1304 then releases the die 220 so as to transfer the die 220 to be affixed to the circuit trace 212 on the product substrate 210 .
- the transfer mechanism 1302 may include two or more collets (not shown) extending from the arm in different directions.
- the collets may be indexed rotatingly 360 degrees through the collet stop locations and picking and transferring a die every time a collet passes the wafer tape 218 .
- the one or more collets 1304 may pick and release the die 220 from the wafer tape using positive and negative vacuum pressure through the collet 1304 .
- a plurality of needles may be used. While many of the features of apparatus 1400 may remain substantially similar to those of apparatus 200 in FIGS. 2A and 2B , multiple needles 226 may be implemented in a machine in order to transfer multiple die 220 simultaneously or substantially simultaneously (e.g., within microseconds or milliseconds of each other. Though depicting a set of three needles 226 in FIG. 14 , a machine implementing multiple needles technology may include two or more. For example, multiple needles 226 may include needles in quantities of 2, 3, 9, 24, etc., and anywhere in between or greater than the example quantities.
- the individual needles of multiple needles 226 may be independently-actuatable, enabling individual needles of the multiple needles 226 to be actuated solitarily and/or sequentially, as well as in one or more groups.
- the multiple needles 226 may be independently movable within a three-dimensional space, allowing the multiple needles 226 to articulate independently from one another.
- the implementation of a head or a cluster of multiple needles 226 allows the machine to transfer die in a manner that may be more efficient than a machine implementing a single needle 226 .
- a machine implementing multiple needles 226 may be able to transfer more than one die 220 at a time. Transferring multiple die 220 via a head containing multiple needles 226 or a cluster of multiple needles 226 may significantly reduce total transfer time, as well as the circuit substrate formation time, as it would reduce the travel distance that the transfer mechanism 206 would otherwise need to move.
- the multiple needles 226 may actuate synchronously or sequentially. However, in other embodiments, one or more than one, but fewer than all, of the multiple needles 226 may be actuated at a same time or substantially the same time, as mentioned above.
- control of the multiple needles 226 may be coordinated to avoid collisions between the plurality of components of the apparatus 1400 .
- the multiple needles 226 may actuate via a needle actuator 228 .
- the needle actuator 228 may include a motor connected to the multiple needles 226 to drive the multiple needles 226 towards the wafer tape 218 at predetermined/preprogrammed times.
- the needle actuator 228 may include an electromechanical actuator.
- the needle actuator 228 may include one or more return springs (not shown) in order to assist the multiple needles 226 to return to a neutral position, as shown in FIG. 14 .
- the multiple needles 226 may be arranged in fixed positions relative to each other.
- the multiple needles 226 may be clustered in a predefined pattern.
- Each needle of the multiple needles 226 may be formed of a same material and/or have a same shape.
- each needle 226 of the multiple needles 226 may be of a size and shape similar to the needle described with respect to FIG. 3 above.
- the multiple needles 226 may comprise a uniform plurality of needles 226 , meaning that all needles selected for use may be substantially identical in material and size.
- one or more of the multiple needles 226 may be formed of dissimilar materials, and have dissimilar sizes and/or shapes than one or more other needles within the same plurality of needles to be implemented.
- the transfer mechanism 206 may have a plurality of types of needles 226 for different applications without having to change the needles 226 (or head/cluster of needles) in the transfer mechanism 206 .
- the transfer mechanism 206 may include a configuration similar to the needle/head configuration used in a dot-matrix printer device, such that the transfer mechanism 206 may include a plurality of needles converging to predetermined positions in a given matrix, carried by a single head unit.
- the transfer mechanism 206 may include two or more needles 226 positioned in a pattern, which pattern may be circular, rectangular, linear, etc.
- Frame 1402 also referred to as a needle guide or a needle guide with housing
- a transfer mechanism may include seven needles 226 that converge in a 7 ⁇ 1 matrix, wherein the matrix includes 7 rows of needles and 1 column.
- any variation of matrix may be used in a transfer mechanism 206 , (i.e., the transfer mechanism 206 may comprise any number of columns and rows comprising any number of needles 226 ; the multiple needles 226 may be offset and/or staggered with respect to each other so as to not be in rows and columns).
- the frame 1402 may guide each respective needle of the multiple needles 226 to a respective opening 1404 in the frame 1402 .
- the transfer mechanism 206 may not include a frame 1402 .
- the multiple needles 226 may actuate in a straight up and down direction, rather than being driven from a cluster and guided to a specific alignment out of the cluster formation with respective openings 1404 as shown in FIG. 14 .
- the transfer mechanism 206 may exhibit a scanning behavior as it transfers die 220 .
- the transfer mechanism 206 may move continuously relative to the product substrate 210 to predetermined places and positions to transfer corresponding die 220 .
- the product substrate 210 may remain stationary while the transfer mechanism 206 is free to move.
- the product substrate 210 may move relative to the transfer mechanism 206 , while the transfer mechanism 206 remains stationary.
- both the transfer mechanism 206 and the product substrate 210 may be configured to move relative to each other.
- the transfer mechanism 206 may be able to move in any direction relative to any one of the substrates.
- the transfer mechanism 206 may be able to move in X, Y, and Z directions, and/or in more than one direction simultaneously.
- the transfer mechanism 206 may employ one or more of the multiple needles 226 to ensure that the product substrate 210 remains stationary or the semiconductor die 220 remains in the correct orientation while multiple die 220 are transferred. For example, two non-adjacent needles 226 may be actuated (i.e., lowered from a neutral or terminal state) to hold the product substrate 210 in place while one or more other needles 226 are used to transfer one or more die 220 either simultaneously or synchronously. Furthermore, the transfer mechanism 206 may implement specific needles 226 to hold the product substrate 210 each time. Additionally, and/or alternatively, the transfer mechanism 206 may be configured and/or programmed to designate different needles 226 to hold the product substrate each time a die 220 is transferred. In such an embodiment, the needles 226 used may be chosen based on the location and/or configuration of the die 220 to be transferred.
Abstract
Description
- This application is a divisional of and claims priority to U.S. patent application Ser. No. 15/978,094, filed on May 12, 2018 which is incorporated in its entirety by reference. This application further incorporates: U.S. patent application Ser. No. 14/939,896, filed on Nov. 12, 2014, entitled “Apparatus for Transfer of Semiconductor Devices,” now patented as U.S. Pat. No. 9,633,883; U.S. patent application Ser. No. 15/343,055, filed on Nov. 3, 2016, entitled “Compliant Needle for Direct Transfer of Semiconductor Devices;” U.S. patent application Ser. No. 15/360,471, Filed on Nov. 23, 2016, entitled “Top-Side Laser for Direct Transfer of Semiconductor Devices;” U.S. patent application Ser. No. 15/360,645, filed on Nov. 23, 2016, entitled “Pattern Array Direct Transfer Apparatus and Method Therefor;” and U.S. patent application Ser. No. 15/409,409, filed on Jan. 18, 2017, entitled “Flexible Support Substrate for Transfer of Semiconductor Devices;” in their entireties by reference.
- Semiconductor devices are electrical components that utilize semiconductor material, such as silicon, germanium, gallium arsenide, and the like. Semiconductor devices are typically manufactured as single discrete devices or as integrated circuits (ICs). Examples of single discrete devices include electrically-actuatable elements such as light-emitting diodes (LEDs), diodes, transistors, resistors, capacitors, fuses, and the like.
- The fabrication of semiconductor devices typically involves an intricate manufacturing process with a myriad of steps. The end-product of the fabrication is a “packaged” semiconductor device. The “packaged” modifier refers to the enclosure and protective features built into the final product as well as the interface that enables the device in the package to be incorporated into an ultimate circuit.
- The conventional fabrication process for semiconductor devices starts with handling a semiconductor wafer. The wafer is diced into a multitude of “unpackaged” semiconductor devices. The “unpackaged” modifier refers to an unenclosed semiconductor device without protective features. Herein, unpackaged semiconductor devices may be called semiconductor device die, or just “die” for simplicity. A single semiconductor wafer may be diced to create die of various sizes, so as to form upwards of more than 100,000 or even 1,000,000 die from the semiconductor wafer (depending on the starting size of the semiconductor), and each die has a certain quality. The unpackaged die are then “packaged” via a conventional fabrication process discussed briefly below. The actions between the wafer handling and the packaging may be referred to as “die preparation.”
- In some instances, the die preparation may include sorting the die via a “pick and place process,” whereby diced die are picked up individually and sorted into bins. The sorting may be based on the forward voltage capacity of the die, the average power of the die, and/or the wavelength of the die.
- Typically, the packaging involves mounting a die into a plastic or ceramic package (e.g., mold or enclosure). The packaging also includes connecting the die contacts to pins/wires for interfacing/interconnecting with ultimate circuitry. The packaging of the semiconductor device is typically completed by sealing the die to protect it from the environment (e.g., dust).
- A product manufacturer then places packaged semiconductor devices in product circuitry. Due to the packaging, the devices are ready to be “plugged in” to the circuit assembly of the product being manufactured. Additionally, while the packaging of the devices protects them from elements that might degrade or destroy the devices, the packaged devices are inherently larger (e.g., in some cases, around 10 times the thickness and 10 times the area, resulting in 100 times the volume) than the die found inside the package. Thus, the resulting circuit assembly cannot be any thinner than the packaging of the semiconductor devices.
- As mentioned previously, conventional devices typically pick and place die individually from sorted bins. This process introduces a plurality of inefficiencies in the system. Furthermore, a pick and place technique makes a process of placing multiple die simultaneously cumbersome and inefficient. Conventional devices do not have the capacity or efficiency to fabricate multiple semiconductor die simultaneously.
- The Detailed Description is set forth with reference to the accompanying figures. In the figures, the left-most digit(s) of a reference number identifies the figure in which the reference number first appears. The use of the same reference numbers in different figures indicates similar or identical items. Furthermore, the drawings may be considered as providing an approximate depiction of the relative sizes of the individual components within individual figures. However, the drawings are not to scale, and the relative sizes of the individual components, both within individual figures and between the different figures, may vary from what is depicted. In particular, some of the figures may depict components as a certain size or shape, while other figures may depict the same components on a larger scale or differently shaped for the sake of clarity.
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FIG. 1 illustrates an isometric view of an embodiment of a transfer apparatus. -
FIG. 2A represents a schematic view of an embodiment of a transfer apparatus in a pre-transfer position. -
FIG. 2B represents a schematic view of an embodiment of a transfer apparatus in a transfer position. -
FIG. 3 illustrates an embodiment of a shape profile of the end of a needle of a transfer mechanism. -
FIG. 4 illustrates an embodiment of a needle actuation stroke profile. -
FIG. 5 illustrates a plan view of an embodiment of a product substrate having a circuit trace thereon. -
FIG. 6 illustrates a schematic view of an embodiment of elements of a die transfer system. -
FIG. 7 illustrates a schematic view of an embodiment of a circuitry path between machine hardware and controllers of a die transfer system. -
FIG. 8 illustrates a method of a die transfer process according to an embodiment of this application. -
FIG. 9 illustrates a method of a die transfer operation according to an embodiment of this application. -
FIG. 10 illustrates an embodiment of a direct transfer apparatus and process implementing a conveyor system. -
FIG. 11A illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position. -
FIG. 11B illustrates a schematic top view of the product substrate conveyance mechanism post-transfer operation of the embodiment inFIG. 11A . -
FIG. 12 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position. -
FIG. 13 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position. -
FIG. 14 illustrates a schematic view of another embodiment of a transfer apparatus in a pre-transfer position. - This disclosure is directed to a machine that directly transfers and affixes semiconductor device die to a circuit and to the process for achieving the same, as well as to the circuit having die affixed thereto (as the output product). In some instances, the machine functions to transfer unpackaged die directly from a substrate such as a “wafer tape” to a product substrate, such as a circuit substrate. The direct transfer of unpackaged die may significantly reduce the thickness of an end product compared to a similar product produced by conventional means, as well as the amount of time and/or cost to manufacture the product substrate. In some instances, the machine may function to transfer multiple semiconductor device die to a circuit simultaneously or sequentially. Moreover, as used in the specification herein, when the term “needle” is used, (or variations of needle as used herein), it is contemplated that a plurality of needles may be considered in place of a single needle, unless the context of the usage of “needle” implies otherwise.
- For the purpose of this description, the term “substrate” refers to any substance on which, or to which, a process or action occurs. Further, the term “product” refers to the desired output from a process or action, regardless of the state of completion. Thus, a product substrate refers to any substance on which, or to which, a process or action is caused to occur for a desired output.
- In an embodiment, the machine may secure a product substrate for receiving “unpackaged” die, such as LEDs, transferred from the wafer tape, for example. In an effort to reduce the dimensions of the products using the die, the die are very small and thin, for example, a die thickness may range from about 12.5-200 microns thick. Due to the relatively small size of the die, the machine includes components that function to precisely align both the wafer tape carrying the die and the product substrate to ensure accurate placement and/or avoid product material waste. In some instances, the components that align the product substrate and the die on the wafer tape may include a set of frames in which the wafer tape and the product substrate are secured respectively and conveyed individually to a position of alignment such that a specific die on the wafer tape is transferred to a specific spot on the product substrate.
- The frame that conveys the product substrate may travel in various directions, including horizontal directions and/or vertical directions, or even directions that would permit transfer to a curved surface. The frame that conveys the wafer tape may travel in various directions also. A system of gears, tracks, motors, and/or other elements may be used to secure and convey the frames carrying the product substrate and the wafer tape respectively to align the product substrate with the wafer tape in order to place a die on the correct position of the product substrate. Each frame system may also be moved to an extraction position in order to facilitate extraction of the wafer tape and the product substrate upon completion of the transfer process.
- In some instances, the machine may further include a transfer mechanism for transferring the die directly from the wafer tape to the product substrate without “packaging” the die. The transfer mechanism may be disposed vertically above the wafer tape so as to press down on the die via the wafer tape toward the product substrate. This process of pressing down on the die may cause the die to peel off of the wafer tape, starting at the sides of the die until the die separate from the wafer tape to be attached to the product substrate. That is, by reducing the adhesion force between the die and the wafer tape, and increasing the adhesion force between the die and the product substrate, the die may be transferred.
- In some embodiments, the transfer mechanism may include an elongated rod, such as a pin or needle that may be cyclically actuated against the wafer tape to push the wafer tape from a top side. Additionally, and/or alternatively, the transfer mechanism may include a plurality needles that may be simultaneously and/or individually actuated against the wafer tape. The needle, or needles, may be sized so as to be no wider than a width of the die being transferred. Although in other instances, the width of the needle(s) may wider, or any other dimension. When the end of the needle contacts the wafer tape, the wafer tape may experience a local deflection at the area between the die and the wafer tape. Inasmuch as the deflection is highly localized and rapidly performed, the portion of the wafer tape that does not receive pressure from the needle may begin to flex away from the surface of the die. This partial separation may thus cause the die to lose sufficient contact with the wafer tape, so as to be released from the wafer tape. Moreover, in some instances, the deflection of the wafer tape may be so minimal, as to maintain an entirety of the surface area of the die in contact with the wafer tape, while still causing the opposing surface of the die to extend beyond a plane of extension of the corresponding surface of the adjacent die to avoid unintentional transfer of the adjacent die.
- Alternatively, or additionally, the machine may further include a fixing mechanism for affixing the separated, “unpackaged” die to the product substrate. In some instances, the product substrate may have thereon a circuit trace to which the die are transferred and affixed. The fixing mechanism may include a device that emits energy, such as a laser, to melt/soften the material of the circuit trace on the product substrate. Moreover, in some instances, the laser may be used to activate/harden the material of the circuit trace. Thus, the fixing mechanism may be actuated before, and/or after the die is in contact with the material of the circuit trace. Accordingly, upon actuation of the transfer mechanism to release a die onto the product substrate, the energy emitting device may also be activated so as to prepare the trace material to receive the die. The activation of the energy emitting device may further enhance the release and capture of the die from the wafer tape so as to begin formation of a semiconductor product on the product substrate.
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FIG. 1 illustrates an embodiment of anapparatus 100 that may be used to directly transfer unpackaged semiconductor components (or “die”) from a wafer tape to a product substrate. The wafer tape may also be referred to herein as the semiconductor device die substrate, or simply a die substrate. Theapparatus 100 may include a productsubstrate conveyance mechanism 102 and a wafertape conveyance mechanism 104. Each of the productsubstrate conveyance mechanism 102 and the wafertape conveyance mechanism 104 may include a frame system or other means to secure the respective substrates to be conveyed to desired alignment positions with respect to each other. Theapparatus 100 may further include atransfer mechanism 106, which, as shown, may be disposed vertically above the wafertape conveyance mechanism 104. In some instances, thetransfer mechanism 106 may be located so as to nearly contact the wafer substrate. Additionally, theapparatus 100 may include afixing mechanism 108. Thefixing mechanism 108 may be disposed vertically beneath the productsubstrate conveyance mechanism 102 in alignment with thetransfer mechanism 106 at a transfer position, where a die, or multiple die, may be placed on the product substrate. As discussed below,FIGS. 2A and 2B illustrate example details of theapparatus 100. - Inasmuch as
FIGS. 2A and 2B depict different stages of the transfer operation, while referring to the same elements and features ofapparatus 200, the following discussion of specific features may refer interchangeably to either or both ofFIGS. 2A and 2B , except where explicitly indicated. In particular,FIGS. 2A and 2B illustrate an embodiment of anapparatus 200, including a productsubstrate conveyance mechanism 202, a wafertape conveyance mechanism 204, atransfer mechanism 206, and afixing mechanism 208. The productsubstrate conveyance mechanism 202 may be disposed adjacent to the wafertape conveyance mechanism 204. For example, as illustrated, the productsubstrate conveyance mechanism 202 may extend in a substantially horizontal direction and may be disposed vertically beneath the wafertape conveyance mechanism 204 so as to take advantage of any effect that gravity may have in the transfer process. Alternatively, the productsubstrate conveyance mechanism 202 may be oriented so as to extend transversely to a horizontal plane. - During a transfer operation, the
conveyance mechanisms substrate conveyance mechanism 202 and a surface of a wafer tape carried by the wafertape conveyance mechanism 204 may be more or less than 1 mm, depending on various other aspects of theapparatus 200, including the amount of deflection that occurs by components during the transfer operation, as described herein below. In some instances, the respective opposing surfaces of the wafer tape and the product substrate may be the most prominent structures in comparison to the supporting structures of theconveyance mechanisms conveyance mechanisms 202, 204), a distance between the respective surfaces of the wafer tape and product substrate may be less than a distance between either of the surfaces and any other opposing structural component. - As depicted, and in some instances, the
transfer mechanism 206 may be disposed vertically above the wafertape conveyance mechanism 204, and thefixing mechanism 208 may be disposed vertically beneath the productsubstrate conveyance mechanism 202. It is contemplated that in some embodiments, one or both of thetransfer mechanism 206 and thefixing mechanism 208 may be oriented in different positions than the positions illustrated inFIGS. 2A and 2B . For example, thetransfer mechanism 206 may be disposed so as to extend at an acute angle with respect to a horizontal plane. In another embodiment, thefixing mechanism 208 may be oriented to emit energy during the transfer process from the same direction of actuation as thetransfer mechanism 206, or alternatively, from any orientation and position from which thefixing mechanism 208 is able to participate in the transfer process. - The product
substrate conveyance mechanism 202 may be used to secure aproduct substrate 210. Herein, the term “product substrate” may include, but is not limited to: a wafer tape (for example, to presort the die and create sorted die sheets for future use); a paper or polymer substrate formed as a sheet or other non-planar shape, where the polymer—translucent or otherwise—may be selected from any suitable polymers, including, but not limited to, a silicone, an acrylic, a polyester, a polycarbonate, etc.; a circuit board (such as a printed circuit board (PCB)); a string or thread circuit, which may include a pair of conductive wires or “threads” extending in parallel; and a cloth material of cotton, nylon, rayon, leather, etc. The choice of material of the product substrate may include durable materials, flexible materials, rigid materials, and other materials with which the transfer process is successful and which maintain suitability for the end use of the product substrate. Theproduct substrate 210 may be formed solely or at least partially of conductive material such that theproduct substrate 210 acts as a conductive circuit for forming a product. The potential types of product substrate may further include items, such as glass bottles, vehicle windows, or sheets of glass. - In an embodiment as depicted in
FIGS. 2A and 2B , theproduct substrate 210 may include acircuit trace 212 disposed thereon. Thecircuit trace 212, as depicted, may include a pair of adjacent trace lines spaced apart by a trace spacing, or gap so as to accommodate a distance between electrical contact terminals (not shown) on the die being transferred. Thus, the trace spacing, or gap between the adjacent trace lines of thecircuit trace 212 may be sized according to the size of the die being transferred to ensure proper connectivity and subsequent activation of the die. For example, thecircuit trace 212 may have a trace spacing, or gap ranging from about 75 to 200 microns, about 100 to 175 microns, or about 125 to 150 microns. - The
circuit trace 212 may be formed from a conductive ink disposed via screen printing, inkjet printing, laser printing, manual printing, or other printing means. Further, thecircuit trace 212 may be pre-cured and semi-dry or dry to provide additional stability, while still being activatable for die conductivity purposes. A wet conductive ink may also be used to form thecircuit trace 212, or a combination of wet and dry ink may be used for thecircuit trace 212. Alternatively, or additionally, thecircuit trace 212 may be pre-formed as a wire trace, or photo-etched, or from molten material formed into a circuit pattern and subsequently adhered, embedded, or otherwise secured to theproduct substrate 210. - The material of the
circuit trace 212 may include, but is not limited to, silver, copper, gold, carbon, conductive polymers, etc. In some instances, thecircuit trace 212 may include a silver-coated copper particle. A thickness of thecircuit trace 212 may vary depending on the type of material used, the intended function and appropriate strength or flexibility to achieve that function, the energy capacity, the size of the LED, etc. For example, a thickness of the circuit trace may range from about 5 microns to 20 microns, from about 7 microns to 15 microns, or from about 10 microns to 12 microns. - Accordingly, in one non-limiting example, the
product substrate 210 may be a flexible, translucent polyester sheet having a desired circuit pattern screen printed thereon using a silver-based conductive ink material to form thecircuit trace 212. - The product
substrate conveyance mechanism 202 may include a productsubstrate conveyor frame 214 for securing a productsubstrate holder frame 216. The structure of the productsubstrate holder frame 216 may vary significantly depending on the type and properties (e.g., shape, size, elasticity, etc.) of the product substrate being used. Inasmuch as theproduct substrate 210 may be a flexible material,product substrate 210 may be held under tension in the productsubstrate holder frame 216, so as to create a more rigid surface upon which a transfer operation, discussed herein below, is performed. In the above example, the rigidity created by the tension in theproduct substrate 210 may increase the placement accuracy when transferring components. - In some instances, using a durable or more rigid material for the
product substrate 210, naturally provides a firm surface for component placement accuracy. In contrast, when theproduct substrate 210 is allowed to sag, wrinkles and/or other discontinuities may form in theproduct substrate 210 and interfere with the pre-set pattern of thecircuit trace 212, to the extent that the transfer operation may be unsuccessful. - While the means of holding the
product substrate 210 may vary greatly,FIG. 2A illustrates an embodiment of a productsubstrate holder frame 216 including afirst portion 216 a having a concave shape and asecond portion 216 b having a convex counter shape that corresponds in shape to the concave shape. In the depicted example, tension is created for theproduct substrate 210 by inserting an outer perimeter of theproduct substrate 210 between thefirst portion 216 a and thesecond portion 216 b to thereby clamp theproduct substrate 210 tightly. - The product
substrate conveyor frame 214 may be conveyed in at least three directions—two directions in the horizontal plane and vertically as well. The conveyance may be accomplished via a system of motors, rails, and gears (none of which are shown). As such, the productsubstrate tensioner frame 216 may be conveyed to and held in a specific position as directed and/or programmed and controlled by a user of theapparatus 200. - The wafer
tape conveyance mechanism 204 may be implemented to secure awafer tape 218 having die 220 (i.e., semiconductor device die) thereon. Thewafer tape 218 may be conveyed in multiple directions to the specific transfer positions for the transfer operation via a wafertape conveyor frame 222. Similar to the productsubstrate conveyor frame 214, the wafertape conveyor frame 222 may include a system of motors, rails, and gears (none of which are shown). - The unpackaged semiconductor die 220 for transfer may be extremely small. Indeed, the height of the
die 220 may range from 12.5 to 200 microns, or from 25 to 100 microns, or from 50 to 80 microns. - Due to the micro size of the die, when the
wafer tape 218 has been conveyed to the appropriate transfer position, a gap spacing between thewafer tape 218 and theproduct substrate 210 may range from about 0.25 mm to 1.50 mm, or about 0.50 mm to 1.25 mm, or about 0.75 mm to 1.00 mm, for example. A minimum gap spacing may depend on factors including: a thickness of the die being transferred, a stiffness of the wafer tape involved, an amount of deflection of the wafer tape needed to provide adequate capture and release of the die, a proximity of the adjacent die, etc. As the distance between thewafer tape 218 and theproduct substrate 210 decreases, a speed of the transfer operation may also decrease due to the reduced cycle time (discussed further herein) of the transfer operation. Such a decrease in the duration of a transfer operation may therefore increase a rate of die transfers. For example, the die transfer rate may range from about 6-500 die placed per second, or 20-400 per second, or 50-250 per second, or 80-150 per second. Moreover, the die transfer rate may be even greater than 500 per second depending on the number of needles in use and the speed of the conveying mechanisms. - Furthermore, the wafer
tape conveyor frame 222 may secure a wafertape holder frame 224, which may stretch and hold thewafer tape 218 under tension. As illustrated inFIG. 2A , thewafer tape 218 may be secured in the wafertape holder frame 224 via clamping a perimeter of thewafer tape 218 between adjacent components of thewafer holder frame 224. Such clamping assists in maintaining the tension and stretched characteristic of thewafer tape 218, thereby increasing the success rate of the transfer operation. In view of the varying properties of different types/brands/qualities of wafer tapes available, a particular wafer tape may be selected for use based on an ability to consistently remain at a desired tension during a transfer process. In some instances, the needle actuation performance profile (discussed further herein below) may change depending on the tension of thewafer tape 218. - The material used for the
wafer tape 218 may include a material having elastic properties, such as a rubber or silicone, for example. Furthermore, inasmuch as temperature of the environment and thewafer tape 218 itself may contribute to potential damage to thewafer tape 218 during the transfer process, a material having properties that are resistant to temperature fluctuation may be advantageous. Additionally, in some instances, thewafer tape 218 may be stretched slightly so as to create a separation or gap betweenindividual die 220 to assist in the transfer operation. A surface of thewafer tape 218 may include a sticky substance via which thedie 220 may be removably adhered to thewafer tape 218. - The die 220 on the
wafer tape 218 may include die that were individually cut from a solid semiconductor wafer and then placed onto thewafer tape 218 to secure the die. In such a situation, the die may have been pre-sorted and explicitly organized on thewafer tape 218, in order, for example, to assist in the transfer operation. In particular, thedie 220 may be arranged sequentially as to the expected order of transfer to theproduct substrate 210. Such pre-arrangement of thedie 220 on thewafer tape 218 may reduce the amount of travel that would otherwise occur between the productsubstrate conveyance mechanism 202 and the wafertape conveyance mechanism 204. Additionally, or alternatively, the die on thewafer tape 218 may have been pre-sorted to include only die having substantially equivalent performance properties. In this case, efficiency of the supply chain may be increased and thus, travel time of the wafertape conveyance mechanism 204 may be reduced to a minimum. - In some instances, materials used for the die may include, but is not limited to, silicon carbide, gallium nitride, a coated silicon oxide, etc. Furthermore, sapphire or silicon may be used as a die as well. Additionally, as indicated above, a “die” may be representative herein of an electrically actuatable element generally.
- In some embodiments, the
wafer tape 218 may include die that are not pre-sorted, but rather are formed by simply cutting a semiconductor directly on wafer tape, and then leaving the die on the wafer tape without “picking and placing” to sort the die depending on the respective performance quality of the die. In such a situation, the die on the wafer tape may be mapped to describe the exact relative locations of the different quality die. Therefore, in some instances, it may be unnecessary to use wafer tape having pre-sorted die. In such a case, the amount of time and travel for the wafertape conveyance mechanism 204 to move between particular die for each sequential transfer operation may increase. This may be caused in part by the varying quality of the die dispersed within the area of the semiconductor, which means that a die of a specific quality for the next transfer operation may not be immediately adjacent to the previously transferred die. Thus, the wafertape conveyance mechanism 204 may move thewafer tape 218 further to align an appropriate die of a specific quality for transfer than would be necessary for awafer tape 218 containing die of substantially equivalent quality. - In further regard to the die 220 on the
wafer tape 218, in some instances, a data map of thedie 220 may be provided with thewafer tape 218. The data map may include a digital file providing information that describes the specific quality and location of each die on thewafer tape 218. The data map file may be input into a processing system in communication with theapparatus 200, whereby theapparatus 200 may be controlled/programmed to seek thecorrect die 220 on thewafer tape 218 for transfer to theproduct substrate 210. - A transfer operation is performed, in part, via the
transfer mechanism 206, which is a die separation device for assisting in separation of die from thewafer tape 218. The actuation of thetransfer mechanism 206 may cause one or more die 220 to be released from thewafer tape 218 and to be captured by theproduct substrate 210. In some instances, thetransfer mechanism 206 may operate by pressing at least one elongated rod, such as a pin or aneedle 226 into a top surface of thewafer tape 218 against adie 220. Theneedle 226 may be connected to aneedle actuator 228. Theneedle actuator 228 may include a motor connected to theneedle 226 to drive theneedle 226 toward thewafer tape 218 at predetermined/programmed times. In some embodiments, thetransfer mechanism 206 may include a plurality ofneedles 226 connected to theneedle actuator 228. - In view of the function of the
needle 226, theneedle 226 may include a material that is sufficiently durable to withstand repetitive, rapid, minor impacts while minimizing potential harm to the die 220 upon impact. For example, theneedle 226 may include a metal, a ceramic, a plastic, etc. Additionally, a tip of theneedle 226 may have a particular shape profile, which may affect the ability of the needle to function repetitively without frequently breaking either the tip or damaging thewafer tape 218 or thedie 220. The profile shape of the tip of the needle is discussed in greater detail below with respect toFIG. 3 . - In a transfer operation, the
needle 226 may be aligned with adie 220, as depicted inFIG. 2A , and the needle actuator may move theneedle 226 to push against an adjacent side of thewafer tape 218 at a position in which thedie 220 is aligned on the opposing side of thewafer tape 218, as depicted inFIG. 2B . The pressure from theneedle 226 may cause thewafer tape 218 to deflect so as to extend thedie 220 to a position closer to theproduct substrate 226 thanadjacent die 220, which are not being transferred. As indicated above, the amount of deflection may vary depending several factors, such as the thickness of the die and circuit trace. For example, where adie 220 is about 50 microns thick andcircuit trace 212 is about 10 microns thick, an amount of deflection of thewafer tape 218 may be about 75 microns. Thus, thedie 220 may be pressed via theneedle 226 toward theproduct substrate 210 to the extent that the electrical contact terminals (not shown) of the die are able to bond with thecircuit trace 212, at which point, the transfer operation proceeds to completion and thedie 220 is released from thewafer tape 218. - To the extent that the transfer process may include a rapidly repeated set of steps including a cyclical actuation of the
needle 226 pressing upon adie 220, a method of the process is described in detail herein below with respect toFIG. 8 . Further, the stroke profile of the actuation of the needle 226 (within the context of the transfer process) is discussed in more detail hereafter with respect toFIG. 4 . - Turning back to
FIGS. 2A and 2B , in some instances, thetransfer mechanism 206 may further include aneedle retraction support 230, (also known as a pepper pot). In an embodiment, thesupport 230 may include a structure having a hollowed space wherein theneedle 226 may be accommodated by passing into the space via anopening 232 in a first end of thesupport 230. Thesupport 230 may further include at least oneopening 234 on a second opposing end of thesupport 230. Moreover, the support may include multiple perforations nearopening 234. The at least oneopening 234 may be sized with respect to a diameter of theneedle 226 to accommodate passage of theneedle 226 therethrough so as to press on thewafer tape 218 during the transfer process. - Additionally, in some instances, the
support 230 may be disposed adjacent to the upper surface of thewafer tape 218. As such, when theneedle 226 is retracted from pressing on thewafer tape 218 during a transfer operation, a base surface of the support 230 (having the at least oneopening 234 therein) may come into contact with the upper surface of thewafer tape 218, thereby preventing upward deflection of thewafer tape 218. This upward deflection may be caused in the event where theneedle 226 pierces at least partially into thewafer tape 218, and while retracting, the wafer tape is stuck to the tip of theneedle 226. Thus, thesupport 230 may reduce the time it takes to move to thenext die 220. A wall perimeter shape of thesupport 230 may be cylindrical or any other shape that may be accommodated in theapparatus 200. Accordingly, thesupport 230 may be disposed between theneedle 226 and an upper surface of thewafer tape 218. - With respect to the effect of temperature on the integrity of the
wafer tape 218, it is contemplated that a temperature ofsupport 230 may be adjusted so as to regulate the temperature of theneedle 226 and thewafer tape 218, at least near the point of the transfer operation. Accordingly, the temperature of thesupport 230 may be heated or cooled, and a material of thesupport 230 may be selected to maximize thermal conductivity. For example, thesupport 230 may be formed of aluminum, or another relatively high thermal conductivity metal or comparable material, whereby the temperature may be regulated to maintain consistent results of the transfer operations. In some instances, air may be circulated within thesupport 230 to assist in regulating the temperature of a local portion of thewafer tape 218. Additionally, or alternatively, afiber optic cable 230 a may be inserted into theneedle retraction support 230, and may further be against theneedle 226 to assist in temperature regulation of thewafer tape 218 and/or theneedle 226. - As indicated above, fixing
mechanism 208 may assist in affixing thedie 220 to thecircuit trace 212 on a surface of theproduct substrate 210.FIG. 2B illustrates theapparatus 200 in a transfer stage, where thedie 220 is pushed against thecircuit trace 212. In an embodiment, fixingmechanism 208 may include an energy-emittingdevice 236 including, but not limited to: a laser, electromagnetic radiation, pressure vibration, ultrasonic welding, etc. In some instances, the use of pressure vibration for the energy-emittingdevice 236 may function by emitting a vibratory energy force so as to cause disruption of the molecules within the circuit trace against those of the electrical contact terminals so as to form a bond via the vibratory pressure. Furthermore, in an embodiment, thefixing mechanism 208 may be omitted entirely, and a transfer of one or more die to a circuit substrate may occur via other means, including adhesive strength or bonding potential. - In a non-limiting example, as depicted in
FIG. 2B , a laser may be implemented as the energy-emittingdevice 236. During a transfer operation,laser 236 may be activated to emit a specific wavelength and intensity of light energy directed at thedie 220 being transferred. The wavelength of the light of thelaser 236 may be selected specifically based on the absorption of that wavelength of light with respect to the material of thecircuit trace 212 without significantly affecting the material of theproduct substrate 210. For example, a laser having an operational wavelength of 808 nm, and operating at 5 W may be readily absorbed by silver, but not by polyester. As such, the laser beam may pass through the substrate of polyester and affect the silver of a circuit trace. Alternatively, the wavelength of laser may match the absorption of the circuit trace and the material of the substrate. The focus area of the laser 236 (indicated by the dashed lines emanating vertically from thelaser 236 inFIG. 2B toward the product substrate 210) may be sized according to the size of the LED, such as for example, a 300 micron wide area. - Upon actuation of a predetermined controlled pulse duration of the
laser 236, thecircuit trace 212 may begin to cure (and/or melt or soften) to an extent that a fusing bond may form between the material of thecircuit trace 212 and the electrical contact terminals (not shown) on thedie 220. This bond further assists in separating theunpackaged die 220 from thewafer tape 218, as well as simultaneously affixing thedie 220 to theproduct substrate 210. Additionally, thelaser 236 may cause some heat transfer on thewafer tape 218, thereby reducing adhesion of the die 220 to thewafer tape 218 and thus assisting in the transfer operation. - In other instances, die may be released and fixed to the product substrates in many ways, including using a laser having a predetermined wavelength or a focused light (e.g., IR, UV, broadband/multi spectral) for heating/activating circuit traces to thereby cure an epoxy or phase change bond materials, or for deactivating/releasing a die from wafer tape, or for initiating some combination of reactions. Additionally, or alternatively, a specific wavelength laser or light may be used to pass through one layer of the system and interact with another layer. Furthermore, a vacuum may be implemented to pull a die from the wafer tape, and air pressure may be implemented to push the die onto a product substrate, potentially including a rotary head between the die wafer substrate and the product substrate. In yet another instance, ultrasonic vibration may be combined with pressure to cause the die to bond to the circuit traces.
- Similar to the
needle retraction support 230, the fixing mechanism may also include aproduct substrate support 238, which may be disposed between thelaser 236 and the bottom surface of theproduct substrate 210. Thesupport 238 may include anopening 240 at a base end thereof and anopening 242 at an upper end thereof. For example, thesupport 238 may be formed as a ring or hollow cylinder. The support may further include structure to secure a lens (not shown) to assist in directing the laser. Thelaser 236 emits the light through theopenings product substrate 210. Furthermore, the upper end of the sidewalls of thesupport 238 may be disposed in direct contact with or closely adjacent to the bottom surface of theproduct substrate 210. Positioned as such, thesupport 238 may help to prevent damage from occurring to theproduct substrate 210 during the stroke of theneedle 226 at the time of a transfer operation. In some instances, during the transfer operation, the portion of the bottom surface of theproduct substrate 210 that is aligned with thesupport 238 may contact thesupport 238, which thereby provides resistance against the incoming motion of thedie 220 being pressed by theneedle 226. Moreover, thesupport 238 may be movable in a direction of the vertical axis to be able to adjust a height thereof so as to raise andlower support 238 as necessary, including to a height of theproduct substrate 210. - In addition to the above features,
apparatus 200 may further include afirst sensor 244, from whichapparatus 200 receives information regarding thedie 220 on thewafer tape 218. In order to determine which die is to be used in the transfer operation, thewafer tape 218 may have a bar code (not shown) or other identifier, which is read or otherwise detected. The identifier may provide die map data to theapparatus 200 via thefirst sensor 244. - As shown in
FIGS. 2A and 2B , thefirst sensor 244 may be positioned near the transfer mechanism 206 (or theneedle 226 specifically), spaced apart from thetransfer mechanism 206 by a distance d, which may range from about 1-5 inches, so as to enhance the accuracy of location detection. In an alternative embodiment,first sensor 244 may be disposed adjacent the tip of theneedle 226 in order to sense the exact position of the die 220 in real time. During the transfer process, thewafer tape 218 may be punctured and or further stretched over time, which may alter the previously mapped, and thus expected, locations of thedie 220 on thewafer tape 218. As such, small changes in the stretching of thewafer tape 218 could add up to significant errors in alignment of thedie 220 being transferred. Thus, real time sensing may be implemented to assist in accurate die location. - In some instances, the
first sensor 244 may be able to identify the precise location and type ofdie 220 that is being sensed. This information may be used to provide instructions to the wafertape conveyor frame 222 indicating the exact location to which thewafer tape 218 should be conveyed in order to perform the transfer operation.Sensor 244 may be one of many types of sensors, or a combination of sensor types to better perform multiple functions.Sensor 244 may include, but is not limited to: a laser range finder, or an optical sensor, such as a non-limiting example of a high-definition optical camera having micro photography capabilities. - Moreover, in some instances, a
second sensor 246 may also be included inapparatus 200. Thesecond sensor 246 may be disposed with respect to theproduct substrate 210 so as to detect the precise position of thecircuit trace 212 on theproduct substrate 210. This information may then be used to determine any positional adjustment needed to align theproduct substrate 210 between thetransfer mechanism 206 and thefixing mechanism 208 so that the next transfer operation occurs in the correct location on thecircuit trace 212. This information may further be relayed to theapparatus 200 to coordinate conveying theproduct substrate 210 to a correct position, while simultaneously conveying instructions to the wafertape conveyor frame 222. A variety of sensors are also contemplated forsensor 246 including optical sensors, such as one non-limiting example of a high-definition optical camera having micro photography capabilities. -
FIGS. 2A and 2B further illustrate that thefirst sensor 244, thesecond sensor 246, and thelaser 236 may be grounded. In some instances, thefirst sensor 244, thesecond sensor 246, and thelaser 236 may all be grounded to the same ground (G), or alternatively, to a different ground (G). - Depending on the type of sensor used for the first and
second sensors apparatus 200 to test individual die before removing theproduct substrate 210 from theapparatus 200. - Furthermore, in some examples, multiple independently-actuatable needles and/or lasers may be implemented in a machine in order to transfer and fix multiple die at a given time. The multiple needles and/or lasers may be independently movable within a three-dimensional space. Multiple die transfers may be done synchronously (multiple needles going down at the same time), or sequentially (e.g., one needle going down while the other is going up, which arrangement may balance better the components and minimize vibration). Control of the multiple needles and/or lasers may be coordinated to avoid collisions between the plurality of components. Moreover, in other examples, the multiple needles and/or lasers may be arranged in fixed positions relative to each other.
- As mentioned above, a profile shape of the
tip 300 of a needle is discussed with respect toFIG. 3 , which shows a schematic example profile shape of thetip 300. In an embodiment, thetip 300 may be defined as the end of the needle, includingsidewalls 302 adjoining taperedportion 304,corner 306, andbase end 308, which may extend transversely to the opposing side of the needle. The specific size and shape of thetip 300 may vary according to factors of the transfer process such as, for example, the size of thedie 220 being transferred and the speed and the impact force, of a transfer operation. For example, the angle θ seen inFIG. 3 , as measured between a longitudinal direction of the central axis of the needle and the taperedportion 304 may range from about 10 to 15°; the radius r of thecorner 306 may range from about 15 to 50+ microns; the width w of thebase end 308 may range from about 0 to 100+ microns (μm), where w may be less than or equal to the width of thedie 220 being transferred; the height h of the taperedportion 304 may range from about 1 to 2 mm, where h may be greater than a distance traveled by needle during a stroke of a transfer operation; and the diameter d of theneedle 226 may be approximately 1 mm. - Other needle tip profiles are contemplated and may have different advantages depending on various factors associated with the transfer operation. For example, the
needle tip 300 may be more blunt to mirror the width of the die or more pointed so as to press in a smaller area of the wafer tape. Thetransfer mechanism 206 may include one or more needles with the same or different needle profiles. - Illustrated in
FIG. 4 is an embodiment of a needle actuation performance profile. That is,FIG. 4 depicts an example of the stroke pattern performed during a transfer operation by displaying the height of the needle tip with respect to the plane of thewafer tape 218 as it varies with time. As such, the “0” position inFIG. 4 may be the upper surface of thewafer tape 218. Further, inasmuch as the idle time of the needle and the ready time of the needle may vary depending on the programmed process or the varying duration of time between transferring a first die and the time it takes to reach a second die for transfer, the dashed lines shown at the idle and ready phases of the stroke pattern indicate that the time is approximate, but may be longer or shorter in duration. Moreover, it is to be understood that the solid lines shown for use of the laser are example times for an embodiment illustrated herewith, however, the actual duration of laser on and off time may vary depending on the materials used in forming the circuit (such as the material choice of the circuit trace), the type of product substrate, the desired effect (pre-melting circuit trace, partial bond, complete bond, etc.), the distance of the laser from the bond point (i.e., the upper surface of the product substrate), the size of the die being transferred, and the power/intensity/wavelength of the laser, etc. Accordingly, the following description of the profile shown inFIG. 4 may be an example embodiment of a needle profile. - In some instances, prior to a transfer operation, a fully retracted needle tip may be idle at approximately 2000 μm above the surface of the wafer tape. After a varying amount of time, the needle tip may descend rapidly to rest in the ready state at approximately 750 μm above the surface of the wafer tape. After another undetermined amount of time at the ready state, the needle tip may descend again to contact the die and press the wafer tape with the die down to a height of approximately −1000 μm, where at the die may be transferred to the product substrate. The dotted vertical line at the start of the laser on section indicates that the laser may come on at some point between the beginning of the descent from the ready phase and the bottom of the stroke of the needle tip. For example, the laser may turn on at approximately 50% of the way through the descent. In some instances, by turning the laser on early, for example before the needle begins to descend, the circuit trace may begin to soften prior to contact with the die so as to form a stronger bond, or additionally, the die wafer may be affected or prepared during this time. The phase in which the laser turns on may last approximately 20 ms (“milliseconds”). At the bottom of the stroke, where the laser is on, that phase may be a bonding phase between the die and the product substrate. This bonding phase may allow the circuit trace to attach to the die contacts, which stiffens quickly after the laser is turned off. As such, the die may be bonded to the product substrate. The bonding phase may last approximately 30 ms. Thereafter, the laser may be turned off and the needle may ascend to the ready phase rapidly. Conversely, the laser may be turned off before the needle begins to ascend, or at some point during the ascent of the needle tip back to the ready phase, the laser may be turned off After the ascent of the needle tip to the ready phase, the height of the needle tip may overshoot and bounce back under the height of the ready phase somewhat buoyantly. While some of the buoyancy may be attributed to the speed at which the needle tip ascends to the ready phase, the speed and the buoyancy may be intentional in order to assist in retracting a tip of the needle from a surface of the wafer tape in the case where the needle has pierced the wafer tape and may be stuck therein.
- As depicted in
FIG. 4 , the timing in which the laser is turned off may be longer than the timing in which the laser is turned on, where a slower speed of the descent may assist in preventing damage to the die, and as mentioned above, the rapid rate of ascent may assist in extracting the needle tip from the wafer tape more effectively. Nevertheless, as previously stated, the timing shown onFIG. 4 is approximate, particularly with respect to the idle and ready periods. Therefore, the numerical values assigned along the bottom edge of theFIG. 4 are for reference and should not be taken literally, except when otherwise stated. -
FIG. 5 illustrates an example embodiment of a processedproduct substrate 500. Aproduct substrate 502 may include a first portion of acircuit trace 504A, which may perform as a negative or positive power terminal when power is applied thereto. A second portion of thecircuit trace 504B may extend adjacent to the first portion of thecircuit trace 504A, and may act as a corresponding positive or negative power terminal when power is applied thereto. - As similarly described above with respect to the wafer tape, in order to determine where to convey the
product substrate 502 to perform the transfer operation, theproduct substrate 502 may have a bar code (not shown) or other identifier, which is read or otherwise detected. The identifier may provide circuit trace data to the apparatus. Theproduct substrate 502 may further include datum points 506. Datum points 506 may be visual indicators for sensing by the product substrate sensor (for example,second sensor 246 inFIG. 2 ) to locate the first and second portions of thecircuit trace circuit trace product substrate 502 to the proper alignment position for the transfer operation. - Additionally, die 508 are depicted in
FIG. 5 as straddling between the first and second portions of thecircuit trace die 508 may be bonded to theproduct substrate 502 during a transfer operation. Accordingly, power may be applied to run between the first and second portions of thecircuit trace die 508. For example, the die may be unpackaged LEDs that were directly transferred from a wafer tape to the circuit trace on theproduct substrate 502. Thereafter, theproduct substrate 502 may be processed for completion of theproduct substrate 502 and used in a circuit or other final product. Further, other components of a circuit may be added by the same or other means of transfer to create a complete circuit, and may include control logic to control LEDs as one or more groups in some static or programmable or adaptable fashion. - A simplified example of an embodiment of a
direct transfer system 600 is illustrated inFIG. 6 . Thetransfer system 600 may include a personal computer (PC) 602 (or server, data input device, user interface, etc.), adata store 604, awafer tape mechanism 606, aproduct substrate mechanism 608, atransfer mechanism 610, and afixing mechanism 612. Inasmuch as a more detailed description of thewafer tape mechanism 606, theproduct substrate mechanism 608, thetransfer mechanism 610, and thefixing mechanism 612 has been given heretofore, specific details about these mechanisms is not repeated here. However, a brief description of how thewafer tape mechanism 606, theproduct substrate mechanism 608, thetransfer mechanism 610, and thefixing mechanism 612 relate to interactions between thePC 602 and thedata store 604 is described hereafter. - In some instances, the
PC 602 communicates withdata store 604 to receive information and data useful in the transfer process of directly transferring die from a wafer tape inwafer tape mechanism 606 using thetransfer mechanism 610 on to a product substrate in theproduct substrate mechanism 608 whereat the die may be fixed upon the product substrate via actuation of a laser or other energy-emitting device located in thefixing mechanism 612.PC 602 may also serve as a receiver, compiler, organizer, and controller of data being relayed to and from each of thewafer tape mechanism 606, theproduct substrate mechanism 608, thetransfer mechanism 610, and thefixing mechanism 612.PC 602 may further receive directed information from a user of thetransfer system 600. - Note that, while
FIG. 6 depicts directional movement capability arrows adjacent to thewafer tape mechanism 606 and theproduct substrate mechanism 608, those arrows merely indicate general directions for mobility, however, it is contemplated that both thewafer tape mechanism 606 and theproduct substrate mechanism 608 may also be able to move in other directions including rotation in plane, pitch, roll, and yaw, for example. - Additional details of the interaction of the components of the
transfer system 600 are described with respect toFIG. 7 below. - A schematic of the communication pathways between the respective elements of a
transfer system 700 may be described as follows. - The direct transfer system may include a personal computer (PC) 702 (or server, data input device, user interface, etc.), which may receive communication from, and provide communication to a
data store 704. ThePC 702 may further communicate with a first cell manager 706 (illustrated as “Cell Manager 1”) and a second cell manager 708 (illustrated as “Cell Manager 2”). Therefore, thePC 702 may control and synchronize the instructions between thefirst cell manager 706 and thesecond cell manager 708. -
PC 702 may include processors and memory components with which instructions may be executed to perform various functions with respect to the first andsecond cell managers data store 704. In some instances,PC 702 may include aproject manager 710 and a needle profile definer 712. -
Project manager 710 may receive input from the first andsecond cell managers data store 704 to organize the direct transfer process and maintain smooth functioning with respect to orientation and alignment of the product substrate with respect to the wafer tape and the die thereon. - Needle profile definer 712 may contain data regarding the needle stroke performance profile, which may be used to instruct the transfer mechanism regarding the desired needle stroke performance according to the specific die on the loaded wafer tape and the pattern of the circuit trace on the product substrate. Additional details of the needle profile definer 712 are discussed further herein below.
- Turning back to
data store 704,data store 704 may include memory containing data such as adie map 714, which may be specific to the wafer tape loaded in the wafer tape mechanism. As explained previously, a die map may describe the relative locations of each die on the wafer tape and the quality thereof for the purpose of providing a pre-organized description of the location of specific die. Further,data store 704 may also include memory containing circuit CAD files 716. Circuit CAD files 716 may contain data regarding a specific circuit trace pattern on the loaded product substrate. -
Project manager 710 may receive thedie map 714 and circuit CAD files 716 from thedata store 704, and may relay the respective information to the first andsecond cell managers - In an embodiment, the
first cell manager 706 may use thedie map 714 fromdata store 704 via adie manager 718. More specifically, diemanager 718 may compare diemap 714 with the information received by asensor manager 720, and based thereon, may provide instructions to amotion manager 722 regarding the location of a particular die.Sensor manager 720 may receive data regarding the actual location of die on the wafer tape from adie detector 724.Sensor manager 720 may also instruct thedie detector 724 to look for a particular die in a particular location according to diemap 714. Thedie detector 724 may include a sensor such as thesecond sensor 244 inFIGS. 2A and 2B . Based on the received data of the actual location (either a confirmation or an update regarding a shift in position) of the die on the wafer tape, themotion manager 722 may instruct a first robot 726 (illustrated as “Robot 1”) to convey the wafer tape to an alignment position with the needle of the transfer mechanism. - Upon reaching the instructed location, the
first robot 726 may communicate the completion of its movement to a needlecontrol board manager 728. Additionally, the needlecontrol board manager 728 may directly communicate with thePC 702 to coordinate the execution of the transfer operation. At the time of the execution of the transfer operation, thePC 702 may instruct the needlecontrol board manager 728 to activate the needle actuator/needle 730, thereby causing the needle to perform a stroke in accordance with the loaded needle profile in the needle profile definer 712. The needlecontrol board manager 728 may also activate the laser control/laser 732, thereby causing the laser to emit a beam toward the product substrate as the needle presses down a die via the wafer tape to execute the transfer operation. As indicated above, the activation of the laser control/laser 732 may occur prior to, simultaneously, during, or after activation, or even a complete actuation, of the needle stroke. - Accordingly, the
first cell manager 706 may pass through a plurality of states including: determining where to tell thefirst robot 726 to go; telling thefirst robot 726 to go to the determined location; turning on the needle; activating the fixing device; and resetting. - Prior to execution of the transfer operation, the
project manager 710 may relay the data of the circuit CAD files 716 to thesecond cell manager 708. Thesecond cell manager 708 may include asensor manager 734 and amotion manager 736. Using the circuit CAD files 716, thesensor manager 734 may instruct thesubstrate alignment sensor 738 to find the datum points on the product substrate and thereby detect and orient the product substrate according to the location of the circuit trace thereon. Thesensor manager 734 may receive confirmation or updated location information of the circuit trace pattern on the product substrate. Thesensor manager 734 may coordinate with themotion manager 736 to provide instructions to a second robot 740 (illustrated as “Robot 2”) to convey the product substrate to an alignment position (i.e., a transfer fixing position) for execution of the transfer operation. Thus, the circuit CAD files 716 may assist theproject manager 710 in aligning the product substrate with respect to the wafer tape such that the die may be accurately transferred to the circuit trace thereon. - Accordingly, the
second cell manager 708 may pass through a plurality of states including: determining where to tell thesecond robot 740 to go; telling thesecond robot 740 to go to the determined location; and resetting. - It is understood that additional and alternative communication pathways between all or fewer than all of the various components of the
direct transfer system 700 described above are possible. - A
method 800 of executing a direct transfer process, in which one or more die is directly transferred from a wafer tape to a product substrate, is illustrated inFIG. 8 . The steps of themethod 800 described herein may not be in any particular order and as such may be executed in any satisfactory order to achieve a desired product state. Themethod 800 may include a step of loading transfer process data into a PC and/or adata store 802. The transfer process data may include data such as die map data, circuit CAD files data, and needle profile data. - A step of loading a wafer tape into a wafer
tape conveyor mechanism 804 may also be included inmethod 800. Loading the wafer tape into the wafer tape conveyor mechanism may include controlling the wafer tape conveyor mechanism to move to a load position, which is also known as an extract position. The wafer tape may be secured in the wafer tape conveyor mechanism in the load position. The wafer tape may be loaded so that the die of the semiconductor are facing downward toward the product substrate conveyor mechanism. - The
method 800 may further include a step of preparing the product substrate to load into the productsubstrate conveyor mechanism 806. Preparing the product substrate may include a step of screen printing a circuit trace on the product substrate according to the pattern of the CAD files being loaded into the PC or data store. Additionally, datum points may be printed onto the circuit substrate in order to assist in the transfer process. The product substrate conveyor mechanism may be controlled to move to a load position, which is also known as an extraction position, whereat the product substrate may be loaded into the product substrate conveyor mechanism. The product substrate may be loaded so that the circuit trace faces toward the die on the wafer. In some instances, for example, the product substrate may be delivered and placed in the load position by a conveyor (not shown) or other automated mechanism, such as in the style of an assembly line. Alternatively, the product substrate may be manually loaded by an operator. - Once the product substrate is properly loaded into the product substrate conveyor mechanism in the wafer tape is properly loaded into the wafer tape conveyor mechanism, a program to control the direct transfer of the die from the wafer tape to the circuit trace of the product substrate may be executed via the PC to commence the
direct transfer operation 808. The details of the direct transfer operation are described below. - A
method 900 of the direct transfer operation of causing die to be transferred directly from the wafer tape (or other substrate holding die, also called a “die substrate” for simplified description ofFIG. 9 ) to the product substrate is illustrated inFIG. 9 . The steps of themethod 900 described herein may not be in any particular order and as such may be executed in any satisfactory order to achieve a desired product state. - In order to determine which die to place on the product substrate and where to place the die on the product substrate, the PC may receive input regarding the identification of the product substrate and the identification of the die substrate containing the die to be transferred 902. This input may be entered manually by a user, or the PC may send a request to the cell managers in control, respectively, of the product substrate alignment sensor and the die detector. The request may instruct the sensor to scan the loaded substrate for an identification marker, such as a barcode or QR code; and/or the request may instruct the detector to scan the loaded die substrate for an identification marker, such as a barcode or QR code.
- Using the product substrate identification input, the PC may query the data store or other memory to match the respective identification markers of the product substrate and the die substrate and retrieve the associated data files 904. In particular, the PC may retrieve a circuit CAD file associated with the product substrate that describes the pattern of the circuit trace on the product substrate. The circuit CAD file may further contain data such as the number of, relative positions of, and respective quality requirement of, the die to be transferred to the circuit trace. Likewise, the PC may retrieve a die map data file associated with the die substrate that provides a map of the relative locations of the specific die on the die substrate.
- In the process of executing a transfer of a die to the product substrate, the PC may determine the initial orientation of the product substrate and the die substrate relative to the transfer mechanism and the
fixing mechanism 906. Withinstep 906, the PC may instruct the substrate alignment sensor to locate datum points on the product substrate. As discussed above, the datum points may be used as reference markers for determining the relative location and orientation of the circuit trace on the product substrate. Further, the PC may instruct the die detector to locate one or more reference points on the die substrate to determine the outlay of the die. - Once the initial orientation of the product substrate and die substrate are determined, the PC may instruct the respective product substrate and die substrate conveyance mechanisms to orient the product substrate and die substrate, respectively, into a position of alignment with the transfer mechanism and the
fixing mechanism 908. - The
alignment step 908 may include determining the location of the portion of the circuit trace to which a die is to be transferred 910, and where the portion is located relative to the transfer fixing position 912. The transfer fixing position may be considered to be the point of alignment between the transfer mechanism and the fixing mechanism. Based on the data determined insteps 910 and 912, the PC may instruct the product substrate conveyance mechanism to convey the product substrate so as to align the portion of the circuit trace to which a die is to be transferred with thetransfer fixing position 914. - The
alignment step 908 may further include determining which die on the die substrate will be transferred 916, and where the die is located relative to thetransfer fixing position 918. Based on the data determined insteps transfer fixing position 920. - Once the die to be transferred from the die substrate and the portion of the circuit trace to which a die is to be transferred are aligned with the transfer mechanism and the fixing mechanism, the needle, and/or needles, and the fixing device (e.g., laser) may be actuated 922 to effectuate the transfer of the die from the die substrate to the product substrate.
- After a die is transferred, the PC may determine whether additional die are to be transferred 924. In the case where another die is to be transferred, the PC may revert to step 908 and realign the product and die substrates accordingly for a subsequent transfer operation. In the case where there will not be another die transferred, the transfer process is ended 926.
- In an embodiment described with respect to
FIG. 10 , several of the components of the direct transfer apparatus described above may be implemented in a conveyor/assembly line system 1000 (hereinafter “conveyor system”). In particular,FIGS. 2A and 2B depict theproduct substrate 210 being held by the productsubstrate conveyor frame 214 and tensioned by the productsubstrate tensioner frame 216. As an alternative to securing a productsubstrate conveyor frame 214 in a confined area via a system of motors, rails, and gear as indicated with respect toapparatus 200,FIG. 10 illustrates the productsubstrate conveyor frame 214 being conveyed through theconveyor system 1000 in which the product substrate goes through an assembly line style process. As the actual means of conveyance between operations being performed on the product substrate being conveyed, theconveyor system 1000 may include a series of tracks, rollers, andbelts 1002 and/or other handling devices to sequentially convey a plurality of product substrate conveyor frames 214, each holding a product substrate. - In some instances, operation stations of the
conveyor system 1000 may include one ormore printing stations 1004. As blank product substrates are conveyed to the printing station(s) 1004, a circuit trace may be printed thereon. In the case that there aremultiple printing stations 1004, themultiple printing stations 1004 may be arranged serially, and may be configured to perform one or more printing operations each so as to form a complete circuit trace. - Additionally, in the
conveyor system 1000, the productsubstrate conveyor frame 214 may be conveyed to one or moredie transfer stations 1006. In the event that there are multipledie transfer stations 1006, the multipledie transfer stations 1006 may be arranged serially, and may be configured to perform one or more die transfers each. At the transfer station(s), the product substrates may have one or more die transferred and affixed thereto via a transfer operation using one or more of the direct transfer apparatus embodiments described herein. For example, eachtransfer station 1006 may include a wafer tape conveyance mechanism, a transfer mechanism, and a fixing mechanism. In some instances, a circuit trace may have been previously prepared on the product substrate, and as such, the product substrate may be conveyed directly to the one ormore transfer stations 1006. - In the
transfer stations 1006, the wafer tape conveyance mechanism, the transfer mechanism, and the fixing mechanism may be aligned with respect to the conveyed productsubstrate conveyor frame 214 upon entering the station. In this situation, thetransfer station 1006 components may repeatedly perform the same transfer operation in the same relative position on each product substrate as the plurality of product substrates are conveyed through theconveyor system 1000. - Moreover, the
conveyor system 1000 may further include one ormore finishing stations 1008 to which the product substrate may be conveyed to have final processing performed. The type, amount, and duration of the final processing may depend on the features of the product and the properties of the materials used to make the product. For example, the product substrate may receive additional curing time, a protective coating, additional components, etc., at the finishing station(s) 1008. - In another embodiment of a direct transfer apparatus, as seen in
FIGS. 11A and 11B , a “light string” may be formed. While many of the features ofapparatus 1100 may remain substantially similar to those ofapparatus 200 ofFIGS. 2A and 2B , productsubstrate conveyance mechanism 1102, as depicted inFIGS. 11A and 11B , may be configured to convey aproduct substrate 1104 that is different than theproduct substrate 212. Specifically, inFIGS. 2A and 2B , the productsubstrate conveyance mechanism 202 includes theconveyor frame 214 and thetensioner frame 216, which secure the sheet-like product substrate 212 under tension. In the embodiment ofFIGS. 11A and 11B , however, the productsubstrate conveyance mechanism 1102 may include a product substrate reel system. - The product substrate reel system may include one or two
circuit trace reels 1106 that are wound with a “string circuit,” which may include a pair of adjacently wound conductive strings or wires as theproduct substrate 1104. In an instance with only one reel, thereel 1106 may be located on a first side of the transfer position, and the pair of conductive strings (1104) may be wound around thesingle reel 1106. Alternatively, there may be twocircuit trace reels 1106 located on the first side of the transfer position, where eachreel 1106 contains a single strand of the string circuit and the strands are then brought together to pass through the transfer position. - Regardless of whether one
reel 1106 or tworeels 1106 are implemented, the die transfer process of forming the string circuit may be substantially similar in each case. In particular, the conductive strings of theproduct substrate 1104 may be threaded from the reel(s) 1106 across the transfer position and may be fed into afinishing device 1108. In some instances, thefinishing device 1108 may be: a coating device to receive a protective coating, for example, of a translucent or transparent plastic; or a curing apparatus, which may finish curing the string circuit as a part of final processing of the product. Additionally, or alternatively, the circuit string may be fed onto another reel, which may wind up the string circuit thereon before final processing of the string circuit. As the conductive strings of theproduct substrate 1104 are pulled through the transfer position, thetransfer mechanism 206 may be actuated to perform a needle stroke (as described above) to transfer die 220 to the conductive strings of theproduct substrate 1104 so that electrical contact terminals of thedie 220 are placed, respectively, on the adjacent strings, and thefixing mechanism 208 may be actuated to affix thedie 220 in position. - Furthermore,
apparatus 1100 may includetensioning rollers 1110 on which the conductive strings of theproduct substrate 1104 may be supported and further tensioned against. Thus, thetensioning rollers 1110 may assist in maintaining tension in the formed string circuit so as to enhance the die transfer accuracy. - In
FIG. 11B , die 220 are depicted as having been transferred to the conductive strings of theproduct substrate 1104, thereby uniting (to some extent) the conductive strings of theproduct substrate 1104 and forming a string circuit. - In an additional embodiment of a direct transfer apparatus, as seen in
FIG. 12 ,apparatus 1200 may include a wafertape conveyance mechanism 1202. In particular, in lieu of the wafertape conveyor frame 222 and thetensioner frame 224 shown inFIGS. 2A and 2B , the wafertape conveyance mechanism 1202 may include a system of one ormore reels 1204 to convey die 220 through the transfer position of theapparatus 1200 to transfer die to a single substrate. In particular, eachreel 1204 may include asubstrate 1206 formed as a narrow, continuous, elongated strip having die 220 attached consecutively along the length of the strip. - In the case where a
single reel 1204 is used, a transfer operation may include conveying theproduct substrate 210 via the productsubstrate conveyance mechanism 202 substantially as described above, using motors, tracks, and gears. However, the wafertape conveyance mechanism 1202 may include a substantially static mechanism, in that, while thedie 220 may be fed continuously through the transfer position by unrolling thesubstrate 1206 fromreel 1204, thereel 1204 itself main remain in a fixed position. In some instances, the tension of thesubstrate 1206 may be maintained for stability purposes by tensioningrollers 1208, and/or atensioning reel 1210, which may be disposed on a side of theapparatus 1200 opposite thereel 1204. Thetensioning reel 1210 may roll up thesubstrate 1206 after the die have been transferred. Alternatively, the tension may be maintained by any other suitable means to secure thesubstrate 1206 so as to assist in pulling it through the transfer position after each transfer operation to cycle through thedie 220. - In an embodiment where
multiple reels 1204 are used, eachreel 1204 may be disposed laterally adjacent toother reels 1204. Eachreel 1204 may be paired with aspecific transfer mechanism 206 and aspecific fixing mechanism 208. In this case, each respective set of transfer mechanisms and fixing mechanisms may be arranged with respect to theproduct substrate 210 such that multiple die may be placed in multiple locations on thesame product substrate 210 simultaneously. For example, in some instances, the respective transfer positions (i.e., the alignment between a transfer mechanism and a corresponding fixing mechanism) may be in a line, offset, or staggered so as to accommodate various circuit trace patterns. - Regardless of whether one
reel 1204 or a plurality ofreels 1204 are implemented, the die transfer operation may be relatively similar to the transfer operation as described above with respect to the first example embodiment of thedirect transfer apparatus 200. For instance, theproduct substrate 210 may be conveyed to a transfer position (die fixing position) in the same manner as described above via the productsubstrate conveyance mechanism 202, the transfer mechanism(s) 206 may perform a needle stroke to transfer the die 220 from thedie substrate 1206 to theproduct substrate 210, and thefixing mechanism 208 may be actuated to assist in affixing thedie 220 to theproduct substrate 210. - Note that in an embodiment with a plurality of
reels 1204, a circuit trace pattern may be such that not every transfer mechanism may need to be actuated simultaneously. Accordingly, multiple transfer mechanisms may be actuated intermittently as the product substrate is conveyed to various positions for transfer. -
FIG. 13 depicts an embodiment of adirect transfer apparatus 1300. As inFIGS. 2A and 2B , the productsubstrate conveyance mechanism 202 may be disposed adjacent to the wafertape conveyance mechanism 204. However, there is a space between theconveyance mechanisms transfer mechanism 1302 may be disposed to effectuate the transfer of the die 220 from thewafer tape 218 to theproduct substrate 210. - The
transfer mechanism 1302 may include acollet 1304 that picks thedie 220, one or more at a time, from thewafer tape 218 and rotates about an axis A that extends througharm 1306. For example,FIG. 13 depicts thewafer tape 218 facing theproduct substrate 210 such that thecollet 1304 may pivot 180 degrees about pivot point 1308 (see directional pivot arrows) between the die-carrying surface of thewafer tape 218 and the transfer surface of theproduct substrate 210. That is, the direction of extension of thecollet 1304 pivots in a plane that is orthogonal to the surface or plane of transfer of both thewafer tape 218 and theproduct substrate 210. Alternatively, in some embodiments, the arm structure of the collet may be arranged to pivot between two parallel surfaces, and the arm of the collet may pivot along parallel plane. Thus, when facing thewafer tape 218, thecollet 1304 may pick thedie 220 and then immediately pivot to the surface of theproduct substrate 210 to be in line with thefixing mechanism 208. Thecollet 1304 then releases thedie 220 so as to transfer thedie 220 to be affixed to thecircuit trace 212 on theproduct substrate 210. - In some instances, the
transfer mechanism 1302 may include two or more collets (not shown) extending from the arm in different directions. In such an embodiment, the collets may be indexed rotatingly 360 degrees through the collet stop locations and picking and transferring a die every time a collet passes thewafer tape 218. - Additionally, the one or
more collets 1304 may pick and release the die 220 from the wafer tape using positive and negative vacuum pressure through thecollet 1304. - In another embodiment of a direct transfer apparatus, as seen in
FIG. 14 , a plurality of needles may be used. While many of the features ofapparatus 1400 may remain substantially similar to those ofapparatus 200 inFIGS. 2A and 2B ,multiple needles 226 may be implemented in a machine in order to transfer multiple die 220 simultaneously or substantially simultaneously (e.g., within microseconds or milliseconds of each other. Though depicting a set of threeneedles 226 inFIG. 14 , a machine implementing multiple needles technology may include two or more. For example,multiple needles 226 may include needles in quantities of 2, 3, 9, 24, etc., and anywhere in between or greater than the example quantities. - Regardless of the quantity, the individual needles of
multiple needles 226 may be independently-actuatable, enabling individual needles of themultiple needles 226 to be actuated solitarily and/or sequentially, as well as in one or more groups. For example, themultiple needles 226 may be independently movable within a three-dimensional space, allowing themultiple needles 226 to articulate independently from one another. In such an embodiment, the implementation of a head or a cluster ofmultiple needles 226 allows the machine to transfer die in a manner that may be more efficient than a machine implementing asingle needle 226. For example, as thetransfer mechanism 206 moves over theproduct substrate 210, a machine implementingmultiple needles 226 may be able to transfer more than one die 220 at a time. Transferring multiple die 220 via a head containingmultiple needles 226 or a cluster ofmultiple needles 226 may significantly reduce total transfer time, as well as the circuit substrate formation time, as it would reduce the travel distance that thetransfer mechanism 206 would otherwise need to move. In an embodiment, themultiple needles 226 may actuate synchronously or sequentially. However, in other embodiments, one or more than one, but fewer than all, of themultiple needles 226 may be actuated at a same time or substantially the same time, as mentioned above. - In an embodiment, control of the
multiple needles 226 may be coordinated to avoid collisions between the plurality of components of theapparatus 1400. To this end, themultiple needles 226 may actuate via aneedle actuator 228. Theneedle actuator 228 may include a motor connected to themultiple needles 226 to drive themultiple needles 226 towards thewafer tape 218 at predetermined/preprogrammed times. In an embodiment, theneedle actuator 228 may include an electromechanical actuator. However, other types of actuators may be implemented in other embodiments. For example, theneedle actuator 228 may include one or more return springs (not shown) in order to assist themultiple needles 226 to return to a neutral position, as shown inFIG. 14 . - In an embodiment, the
multiple needles 226 may be arranged in fixed positions relative to each other. For example, themultiple needles 226 may be clustered in a predefined pattern. Each needle of themultiple needles 226 may be formed of a same material and/or have a same shape. For example, eachneedle 226 of themultiple needles 226 may be of a size and shape similar to the needle described with respect toFIG. 3 above. In an embodiment, themultiple needles 226 may comprise a uniform plurality ofneedles 226, meaning that all needles selected for use may be substantially identical in material and size. Alternatively, in a different embodiment, one or more of themultiple needles 226 may be formed of dissimilar materials, and have dissimilar sizes and/or shapes than one or more other needles within the same plurality of needles to be implemented. In such an embodiment, thetransfer mechanism 206 may have a plurality of types ofneedles 226 for different applications without having to change the needles 226 (or head/cluster of needles) in thetransfer mechanism 206. - In an embodiment, the
transfer mechanism 206 may include a configuration similar to the needle/head configuration used in a dot-matrix printer device, such that thetransfer mechanism 206 may include a plurality of needles converging to predetermined positions in a given matrix, carried by a single head unit. For example, thetransfer mechanism 206 may include two ormore needles 226 positioned in a pattern, which pattern may be circular, rectangular, linear, etc. Frame 1402 (also referred to as a needle guide or a needle guide with housing) may act to guide themultiple needles 226 to specific positions in a matrix configuration. For example, a transfer mechanism may include sevenneedles 226 that converge in a 7×1 matrix, wherein the matrix includes 7 rows of needles and 1 column. However, it is contemplated, that any variation of matrix may be used in atransfer mechanism 206, (i.e., thetransfer mechanism 206 may comprise any number of columns and rows comprising any number ofneedles 226; themultiple needles 226 may be offset and/or staggered with respect to each other so as to not be in rows and columns). - In an embodiment, the
frame 1402 may guide each respective needle of themultiple needles 226 to arespective opening 1404 in theframe 1402. Additionally, and/or alternatively, in an embodiment, thetransfer mechanism 206 may not include aframe 1402. In such an embodiment, themultiple needles 226 may actuate in a straight up and down direction, rather than being driven from a cluster and guided to a specific alignment out of the cluster formation withrespective openings 1404 as shown inFIG. 14 . - In some embodiments, the
transfer mechanism 206 may exhibit a scanning behavior as it transfers die 220. For example, thetransfer mechanism 206 may move continuously relative to theproduct substrate 210 to predetermined places and positions to transfercorresponding die 220. In such an example embodiment, theproduct substrate 210 may remain stationary while thetransfer mechanism 206 is free to move. However, in other embodiments, theproduct substrate 210 may move relative to thetransfer mechanism 206, while thetransfer mechanism 206 remains stationary. In still further embodiments, both thetransfer mechanism 206 and theproduct substrate 210 may be configured to move relative to each other. Thetransfer mechanism 206 may be able to move in any direction relative to any one of the substrates. For example, thetransfer mechanism 206 may be able to move in X, Y, and Z directions, and/or in more than one direction simultaneously. - In an embodiment, the
transfer mechanism 206 may employ one or more of themultiple needles 226 to ensure that theproduct substrate 210 remains stationary or the semiconductor die 220 remains in the correct orientation while multiple die 220 are transferred. For example, twonon-adjacent needles 226 may be actuated (i.e., lowered from a neutral or terminal state) to hold theproduct substrate 210 in place while one or moreother needles 226 are used to transfer one or more die 220 either simultaneously or synchronously. Furthermore, thetransfer mechanism 206 may implementspecific needles 226 to hold theproduct substrate 210 each time. Additionally, and/or alternatively, thetransfer mechanism 206 may be configured and/or programmed to designatedifferent needles 226 to hold the product substrate each time adie 220 is transferred. In such an embodiment, theneedles 226 used may be chosen based on the location and/or configuration of the die 220 to be transferred. - Although several embodiments have been described in language specific to structural features and/or methodological acts, it is to be understood that the claims are not necessarily limited to the specific features or acts described. Rather, the specific features and acts are disclosed as illustrative forms of implementing the claimed subject matter. Furthermore, the use of the term “may” herein is used to indicate the possibility of certain features being used in one or more various embodiments, but not necessarily in all embodiments.
Claims (20)
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US16/551,131 US20190378748A1 (en) | 2018-05-12 | 2019-08-26 | Method and apparatus for multiple direct transfers of semiconductor devices |
Applications Claiming Priority (2)
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US15/978,094 US10410905B1 (en) | 2018-05-12 | 2018-05-12 | Method and apparatus for direct transfer of multiple semiconductor devices |
US16/551,131 US20190378748A1 (en) | 2018-05-12 | 2019-08-26 | Method and apparatus for multiple direct transfers of semiconductor devices |
Related Parent Applications (1)
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US15/978,094 Division US10410905B1 (en) | 2018-05-12 | 2018-05-12 | Method and apparatus for direct transfer of multiple semiconductor devices |
Publications (1)
Publication Number | Publication Date |
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US20190378748A1 true US20190378748A1 (en) | 2019-12-12 |
Family
ID=67845127
Family Applications (2)
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US15/978,094 Active US10410905B1 (en) | 2018-05-12 | 2018-05-12 | Method and apparatus for direct transfer of multiple semiconductor devices |
US16/551,131 Abandoned US20190378748A1 (en) | 2018-05-12 | 2019-08-26 | Method and apparatus for multiple direct transfers of semiconductor devices |
Family Applications Before (1)
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US15/978,094 Active US10410905B1 (en) | 2018-05-12 | 2018-05-12 | Method and apparatus for direct transfer of multiple semiconductor devices |
Country Status (7)
Country | Link |
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US (2) | US10410905B1 (en) |
EP (1) | EP3794636A4 (en) |
JP (1) | JP2021523573A (en) |
KR (2) | KR20230100753A (en) |
CN (2) | CN112020765B (en) |
TW (2) | TWI768482B (en) |
WO (1) | WO2019221909A1 (en) |
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Also Published As
Publication number | Publication date |
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US10410905B1 (en) | 2019-09-10 |
KR20210008348A (en) | 2021-01-21 |
EP3794636A4 (en) | 2022-01-26 |
KR20230100753A (en) | 2023-07-05 |
CN112020765A (en) | 2020-12-01 |
CN112020765B (en) | 2022-02-01 |
JP2021523573A (en) | 2021-09-02 |
TWI768482B (en) | 2022-06-21 |
KR102548832B1 (en) | 2023-07-03 |
TW202119534A (en) | 2021-05-16 |
TWI709191B (en) | 2020-11-01 |
EP3794636A1 (en) | 2021-03-24 |
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